CN104324551A - Device and method for cleaning ceramic plates - Google Patents
Device and method for cleaning ceramic plates Download PDFInfo
- Publication number
- CN104324551A CN104324551A CN201410597963.4A CN201410597963A CN104324551A CN 104324551 A CN104324551 A CN 104324551A CN 201410597963 A CN201410597963 A CN 201410597963A CN 104324551 A CN104324551 A CN 104324551A
- Authority
- CN
- China
- Prior art keywords
- nitric acid
- ceramic wafer
- acid cleaning
- air hose
- liquid pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D41/00—Regeneration of the filtering material or filter elements outside the filter for liquid or gaseous fluids
- B01D41/04—Regeneration of the filtering material or filter elements outside the filter for liquid or gaseous fluids of rigid self-supporting filtering material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2201/00—Details relating to filtering apparatus
- B01D2201/08—Regeneration of the filter
- B01D2201/085—Regeneration of the filter using another chemical than the liquid to be filtered
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention provides a device for cleaning ceramic plates. The device comprises a cleaning tank, a nitric acid preparation tank and a nitric acid cleaning liquid pump; the device is characterized in that the bottom of the cleaning tank is connected with an air pipe which is provided with a connector and connected with an air cabinet, the nitric acid preparation tank is connected with the nitric acid cleaning liquid pump, and the nitric acid cleaning liquid pump is connected with the cleaning tank. When the device is in use, ceramic plates to be soaked and cleaned are vertically arranged inside the cleaning tank by use of the connector on the air pipe, the nitric acid cleaning liquid pump is turned on to feed the nitric acid cleaning liquid into the cleaning tank, and then a valve on the air pipe is switched on so that air can be introduced into the ceramic plates to bubble; as a result, the ceramic plates are cleaned continuously under the actions of soaking in the nitric acid cleaning liquid and air bubbling. The device for cleaning the ceramic plates is simple in structure, low in manufacturing cost, convenient to mount and capable of solving the regeneration problem of the ceramic plates. The device for cleaning the ceramic plates is applicable to the field of cleaning ceramic filters.
Description
Technical field
The present invention relates to material filtering isolation technics, particularly relate to a kind of cleaning device and cleaning method of ceramic wafer.
Background technology
Ceramic filter is used for vacuum dehydration and the filtration of material, and ceramic wafer relates to the crucial portion of filter efficiency
One of part.For obtaining the lower phosphorus concentrate of moisture, ceramic filter is adopted to carry out processed to phosphorus concentrate slurry.The ceramic wafer of ceramic filter often runs 7 hours and will clean the time being not less than 1 hour.Enter in ceramic wafer with the nitric acid cleaning fluid that nitric acid hybrid technique water after measuring pump pumps of about 40% is 5% during prior art cleaning and discharged by blowback with sucking after ore deposit or impurity react, thus make the unimpeded driving entering next circulation of ceramic wafer inner capillary tube net, to improve equipment capacity.Because phosphorus concentrate particle is thin, ceramic wafer regeneration effect after the above-mentioned cleaning of employing is poor, and namely occur not inhaling the phenomenons such as ore pulp, blockage of the micro orifice be serious after ceramic filter long-play, finally directly cause yielding poorly, energy consumption is high.
Adopt a ceramic filter to use the method for two cover ceramic wafers to carry out the process of phosphorus essence mine dehydration, two cover ceramic wafers carry out production after being used alternatingly the nitric acid cleaning fluid immersion of 5% and can partly solve the problem.But finding in actual production process, cleaning performance or not obvious, still there is large area stopping state in ceramic wafer.
For solving the problem, inventor, through repetition test, investigated a kind of device and cleaning method of ceramic wafer soaking and washing.
Summary of the invention
It is poor that the present invention is intended to for ceramic wafer regeneration effect in phosphorus essence mine dehydration processing procedure, the feelings that life cycle is short
Condition, provides a kind of device and cleaning method of ceramic wafer soaking and washing; Ceramic wafer regeneration can be realized preferably.
Technical scheme of the present invention is as follows:
A kind of device of ceramic wafer soaking and washing, comprise service sink, nitric acid make-up tank, nitric acid cleaning liquid pump, it is characterized in that being connected to air hose bottom described service sink, air hose there is interface, air hose connects with buoyance chamber, described nitric acid make-up tank is connected to nitric acid cleaning liquid pump, and described nitric acid cleaning liquid pump connects service sink.
Ceramic wafer can vertically be placed in service sink by air hose interface, and this service sink can meet the needs of a ceramic filter ceramic wafer soaking and washing.
Use the cleaning method of the device of this ceramic wafer soaking and washing: it is characterized in that comprising following steps:
1, will treat that soaking and washing ceramic wafer is vertically positioned in service sink by interface on air hose, and fixing;
2, nitric acid in nitric acid make-up tank is formulated as the nitric acid cleaning fluid that concentration is 5%;
3, open nitric acid cleaning liquid pump, nitric acid cleaning fluid is delivered in service sink, ensures that cleaning fluid floods whole ceramic wafer in pond;
4, opening valve on air hose, is 0.5 m by flow
3/ min ~ 1m
3/ min, pressure are that the air of 0.3Mpa ~ 0.5 Mpa passes into bubbling in ceramic wafer; Make ceramic wafer nitric acid cleaning fluid soak and air bubbling effect under constantly clean, and constantly adjust air inflow;
Whether have dirty block go out, and whether observe ceramic wafer micropore gas output even if 5, constantly observing ceramic wafer top in cleaning process;
6, when ceramic wafer top is gone out without dirty block, after ceramic wafer micropore gas output is even, show that ceramic wafer cleans up; Taking out ceramic wafer after closing valve on air hose, emptying nitric acid cleaning fluid can be for the production of.
The operation principle of this method utilizes the phosphorus concentrate in low concentration nitric acid and ceramic wafer and other impurity to occur
Reaction, generates the material being soluble in salpeter solution, and is blown out under the air effect of certain pressure, thus better realizes ceramic wafer regeneration.
By above-mentioned soaking and washing, solve the regeneration issues of ceramic wafer, improve the product of ceramic filter
Can, reduce consumption.
Structure of the present invention is simple, and low cost of manufacture is easy to install, can solve ceramic wafer regeneration issues.
The present invention is applicable to the cleaning field of ceramic filter.
Accompanying drawing explanation
Fig. 1 is the apparatus structure schematic diagram of ceramic wafer soaking and washing of the present invention;
In accompanying drawing: 1, nitric acid cleaning liquid pump; 2, ceramic wafer; 3, service sink; 4, air hose; 5, buoyance chamber; 6, nitric acid accumulator tank; 7, nitric acid make-up tank.
Detailed description of the invention
Below in conjunction with accompanying drawing and embodiment, the invention will be further described.
embodiment:
As shown in Figure 1, one of embodiment of the present invention, a kind of device of ceramic wafer soaking and washing, comprise service sink 3, nitric acid make-up tank 7, nitric acid cleaning liquid pump 1, it is characterized in that being connected to air hose 4 bottom described service sink 3, air hose 4 has interface, and air hose 4 connects with buoyance chamber 5, described nitric acid make-up tank 7 connects nitric acid cleaning liquid pump 1, and described nitric acid cleaning liquid pump 1 connects service sink 3.
During use, the serious ceramic wafer 2 of blocking is vertically positioned in service sink 3 by air hose 4 interface, ensures that ceramic wafer 2 interface direction is positioned at bottom; After whole placement, pumped into by the nitric acid cleaning fluid of prepared 5% until ceramic wafer 2 all floods by cleaning fluid in service sink 3, liquid level is apart from 5 centimetres, ceramic wafer 2 top; Then opening the valve of air hose 4, is 0.5 m by flow
3/ min ~ 1m
3/ min, pressure are that the air of 0.3Mpa ~ 0.5 Mpa passes into bubbling in ceramic wafer 2, and constantly adjust air inflow; Ceramic wafer 2 to be soaked and the situation of the continuous bubbling of air is cleaned at nitric acid cleaning fluid, and in cleaning process, constantly whether observation ceramic wafer top has dirty block to go out, and whether observe ceramic wafer micropore gas output even; When ceramic wafer top is gone out without dirty block, after ceramic wafer micropore gas output is even, show that ceramic wafer 2 cleans up; Close the valve on air hose 4, nitric acid cleaning fluid is drained into nitric acid accumulator tank 6, then take out ceramic wafer 2, realize the good regeneration of ceramic wafer 2.
The present embodiment uses in subordinate phosphate fertilizer plant of certain group, solves the regeneration issues of ceramic wafer, improves the production capacity of ceramic filter.
Claims (2)
1. the device of a ceramic wafer soaking and washing, comprise service sink (3), nitric acid make-up tank (7), nitric acid cleaning liquid pump (1), what it is characterized in that described service sink (3) bottom is connected to air hose (4), (4) have interface to air hose, air hose (4) connects with buoyance chamber (5), described nitric acid make-up tank (7) connects nitric acid cleaning liquid pump (1), and described nitric acid cleaning liquid pump (1) connects service sink (3).
2. one kind uses the cleaning method of the device of ceramic wafer soaking and washing described in claim 1: it is characterized in that comprising following steps:
1, ceramic wafer to be cleaned is vertically positioned in service sink by interface on air hose, and fixing;
2, nitric acid in nitric acid make-up tank is formulated as the nitric acid cleaning fluid that concentration is 5%;
3, open nitric acid cleaning liquid pump, nitric acid cleaning fluid is delivered in service sink, ensures that cleaning fluid floods whole ceramic wafer in pond;
4, opening the valve on air hose, is 0.5 m by flow
3/ min ~ 1m
3/ min, pressure are that the air of 0.3Mpa ~ 0.5 Mpa passes into bubbling in ceramic wafer; Make ceramic wafer nitric acid cleaning fluid soak and air bubbling effect under constantly clean, and constantly adjust air inflow;
Whether have dirty block go out, and whether observe ceramic wafer micropore gas output even if 5, constantly observing ceramic wafer top in cleaning process;
6, when ceramic wafer top is gone out without dirty block, after ceramic wafer micropore gas output is even, show that ceramic wafer cleans up; Close on air hose and take out ceramic wafer after valve, emptying nitric acid cleaning fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410597963.4A CN104324551A (en) | 2014-10-31 | 2014-10-31 | Device and method for cleaning ceramic plates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410597963.4A CN104324551A (en) | 2014-10-31 | 2014-10-31 | Device and method for cleaning ceramic plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104324551A true CN104324551A (en) | 2015-02-04 |
Family
ID=52399430
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410597963.4A Pending CN104324551A (en) | 2014-10-31 | 2014-10-31 | Device and method for cleaning ceramic plates |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104324551A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010052494A1 (en) * | 1999-10-25 | 2001-12-20 | Pierre Cote | Chemical cleaning backwash for normally immersed membranes |
| CN102485328A (en) * | 2010-12-02 | 2012-06-06 | 东丽纤维研究所（中国）有限公司 | Cleaning method of immersion membrane filtration system |
| CN103752175A (en) * | 2014-01-22 | 2014-04-30 | 浙江卓锦工程技术有限公司 | Immersed type on-line cleaning method and device for slab ceramic membrane |
| CN203634942U (en) * | 2014-01-14 | 2014-06-11 | 会理县鹏晨废渣利用有限公司 | Cleaning tank for ceramic filter |
| CN204233872U (en) * | 2014-10-31 | 2015-04-01 | 瓮福（集团）有限责任公司 | A kind of cleaning device of ceramic wafer |
-
2014
- 2014-10-31 CN CN201410597963.4A patent/CN104324551A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010052494A1 (en) * | 1999-10-25 | 2001-12-20 | Pierre Cote | Chemical cleaning backwash for normally immersed membranes |
| CN102485328A (en) * | 2010-12-02 | 2012-06-06 | 东丽纤维研究所（中国）有限公司 | Cleaning method of immersion membrane filtration system |
| CN203634942U (en) * | 2014-01-14 | 2014-06-11 | 会理县鹏晨废渣利用有限公司 | Cleaning tank for ceramic filter |
| CN103752175A (en) * | 2014-01-22 | 2014-04-30 | 浙江卓锦工程技术有限公司 | Immersed type on-line cleaning method and device for slab ceramic membrane |
| CN204233872U (en) * | 2014-10-31 | 2015-04-01 | 瓮福（集团）有限责任公司 | A kind of cleaning device of ceramic wafer |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20150204 |