CN104317107A - Orienting ultraviolet optical radiation machine - Google Patents
Orienting ultraviolet optical radiation machine Download PDFInfo
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- CN104317107A CN104317107A CN201410505217.8A CN201410505217A CN104317107A CN 104317107 A CN104317107 A CN 104317107A CN 201410505217 A CN201410505217 A CN 201410505217A CN 104317107 A CN104317107 A CN 104317107A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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Abstract
The invention relates to an orienting ultraviolet optical radiation machine, which comprises a probe bar, a base plate and a power source, wherein the power source is electrically connected with the probe bar, the probe bar comprises at least one first sub-probe and at least one second sub-probe, and the base plate comprises at least one sub-interface (CF-COM (compact flash - common)) and at least one sub-interface (Array-COM). The orienting ultraviolet optical radiation machine has the advantages that when the probe bar is arranged on the base plate, the first sub-probe is in aligned electric contact with the sub-interface (CF-COM), and the second sub-probe is in aligned electric contact with the sub-interface (Array-COM), so electric signals provided by the power source are transmitted to each sub-interface; meanwhile, the transmitted electric signals of the power source are shunted by the first sub-probe and the second sub-probe.
Description
Technical field
The present invention relates to LCD alignment field, particularly relate to a kind of orientation ultraviolet optics irradiating machine.
Background technology
UVM (Ultraviolet Meter) i.e. orientation ultraviolet optics irradiating machine, pass through UV-irradiation under the condition powered up, the Monomer (monomer) adding liquid crystal is made to form polymer, and at polyimide (polyimide, PI) alignment film surface forms liquid crystal pretilt angle, thus completes LCD alignment.It is by print being added the probe on electrometallurgy tool (Probe Bar) and the interface contraposition electrical contact on substrate that UVM powers up mode, then powers up tool by computing machine control power supply to print and powers, thus power to substrate.
Print powers up tool when powering to substrate, and electric current flows into the wire in substrate by probe.Experiment proves that the size of electric current can affect the life-span of probe, and electric current is larger, and the life-span of probe is shorter; Electric current is less, and the probe life-span is longer.But the too small meeting of electric current causes board warning sensitivity poor, thus board probe and substrate contacts bad time may can not report to the police, cause orientation abnormal; Otherwise when electric current is excessive, probe can be caused aging too fast, and detecting probe surface Gold plated Layer comes off, and the interface contact on probe and substrate also can be caused bad, the phenomenon of orientation exception.Therefore the electric current on probe need control in the reasonable scope.
Current industry, the wire in substrate adopts aluminium (Al) material to make usually, but Al material resistance is comparatively large, and energy consumption is bigger than normal.In order to reduce energy consumption, people attempt adopting copper (Cu) material substitute for Al material to make the wire in substrate, i.e. so-called Cu processing procedure.The resistance of Cu is less relative to Al, is conducive to reducing energy consumption, and the aperture opening ratio of product is also relatively better.But the wire that Cu material is made is less relative to Al due to its resistance, when adopting same voltage to power up substrate, the electric current flowing through probe can be larger.Experiment proves in same substrate size, the electric current flowing through probe under Cu processing procedure is 2 ~ 3 times under Al processing procedure, so causes the life-span of probe under Cu processing procedure shorter, causes consumptive material expense too high, production capacity reduces and easily occurs that orientation is abnormal, and then affects the series of problems such as quality of product.
Summary of the invention
For the problems referred to above, the object of the present invention is to provide a kind of orientation ultraviolet optics irradiating machine, for the situation of Cu processing procedure, shunted by the number increasing probe, make the electric current flowing through each probe less, prevent probe from causing the lost of life because electric current is excessive.
The invention provides a kind of orientation ultraviolet optics irradiating machine, comprise print and add electrometallurgy tool, substrate and add the power supply that electrometallurgy electric property is connected with described print, described print adds on electrometallurgy tool and comprises the first probe, at least one first sub-probe, second probe and at least one the second sub-probe, described substrate comprises interface (CF-COM), at least one sub-interface (CF-COM), interface (Array-COM) and at least one sub-interface (Array-COM), described print adds electrometallurgy tool when being installed on described substrate, described first probe and described interface (CF-COM) contraposition electrical contact, described first sub-probe and described sub-interface (CF-COM) contraposition electrical contact, described second probe and described interface (Array-COM) contraposition electrical contact, described second sub-probe and described sub-interface (Array-COM) contraposition electrical contact, to transmit the electric signal that described power supply provides to each interface, simultaneously, described first sub-probe and the electric signal of the second sub-probe to described power delivery are shunted.
Wherein, described substrate also has interface (EVEN), interface (ODD), interface (B), interface (G) and interface (R), described print adds electrometallurgy tool and also has the 3rd probe, four point probe, 5th probe, 6th probe and the 7th probe, described probe is all electrically connected with described power supply, and when described print add electrometallurgy tool be installed on described substrate time, described 3rd probe and described interface (EVEN), described four point probe and described interface (ODD), described 5th probe and described interface (B), described 6th probe and described interface (G) and the 7th probe and described interface (R) corresponding electrical contact respectively, with to these interface transmission of electric signals.
Wherein, described power supply comprises alternating voltage module.Described alternating voltage module is electrically connected with described first probe, the first sub-probe, the second probe and the second sub-probe respectively, and provide ac signal to described probe, described 5th probe, the 6th probe and the 7th probe ground connection, and when after the electrical contact corresponding to interface of described probe, described first probe, the first sub-probe, the second probe and the second sub-probe are electrically connected by the wire in substrate with described 5th probe, the 6th probe and the 7th probe, and form loop.
Wherein, described power supply also comprises DC voltage module, described DC voltage module is electrically connected with described 3rd probe and four point probe respectively, and provide described DC signal to described 3rd probe and four point probe, described DC signal passes through the wire transmission in substrate, to be opened by the Thin Film Transistor-LCD crystal switch in substrate.
Wherein, described wire is copper conductor.
Wherein, described orientation ultraviolet optics irradiating machine also comprises controller, and described controller is connected with described power electric, to control described power supply, makes described power supply send predetermined electric signal to each probe.
Wherein, described orientation ultraviolet optics irradiating machine also comprises uviol lamp group, and described uviol lamp group comprises several uviol lamps, to launch ultraviolet light.
Wherein, described first sub-probe is equal or unequal with the number of the second sub-probe.Wherein, what described print added that electrometallurgy tool also comprises in the 3rd sub-probe, the 4th sub-probe, the 5th sub-probe, the 6th sub-probe, the 7th sub-probe, the 8th sub-probe, the 9th sub-probe is one or more; Described substrate also have corresponding sub-interface (EVEN) with the 3rd sub-probe, the sub-interface (ODD) corresponding to the 4th sub-probe, the sub-interface (B) corresponding to the 5th sub-probe, corresponding to the 6th sub-probe sub-interface (G) and to correspond in the sub-interface (R) of the 7th sub-probe one or more.
Orientation ultraviolet optics irradiating machine provided by the invention, adopts the wire that material is made in substrate, reduces energy consumption.Be provided with at least one sub-interface and sub-interface on the substrate simultaneously, and add on electrometallurgy tool in described print and be provided with at least one first sub-probe and the second sub-probe, thus the electric current that described power supply provides is shunted, and then the electric current flowing through described first probe, the first sub-probe, the second probe and the second sub-probe reduces, and ensures that described first probe, the first sub-probe, the second probe and the second sub-probe can have the longer life-span.The design of described orientation ultraviolet optics irradiating machine, can effectively promote the probe life-span, reduces consumptive material expense, reduces costs; Simultaneously lifting production capacity save human cost, reduces that orientation is abnormal occurs, and increases production stability.
Accompanying drawing explanation
In order to be illustrated more clearly in technical scheme of the present invention, be briefly described to the accompanying drawing used required in embodiment below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the structural representation of the orientation ultraviolet optics irradiating machine that the embodiment of the present invention provides.
Fig. 2 is the circuit diagram of the orientation ultraviolet optics irradiating machine that the embodiment of the present invention provides.
Fig. 3 is the circuit diagram of the orientation ultraviolet optics irradiating machine of prior art.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
Refer to Fig. 1 and Fig. 2, the invention provides a kind of orientation ultraviolet optics irradiating machine 100, described orientation ultraviolet optics irradiating machine 100 comprises print and adds electrometallurgy tool 20, substrate 40 and power supply 50, described print adds on electrometallurgy tool 20 and comprises the first probe 21, at least one first sub-probe 22, second probe 23 and at least one sub-probe 24, and described power supply 50 and each above-mentioned probe are all electrically connected.Described substrate 40 comprises interface CF-COM 41, at least one sub-interface CF-COM 42, interface Array-COM 43 and at least one sub-interface Array-COM 44, wherein, described interface CF-COM 41, sub-interface CF-COM 42, interface Array-COM 43 and sub-interface Array-COM 44 are connected in parallel to each other.When described print add electrometallurgy tool 20 be installed on described substrate 40 time, described first probe 21 and described interface CF-COM 41 contraposition electrical contact, described first sub-probe 22 and described first sub-interface CF-COM 42 contraposition electrical contact, described second probe 23 and described interface Array-COM 43 contraposition electrical contact, described second sub-probe 24 and described second sub-interface Array-COM 44 contraposition electrical contact, thus when described power supply 50 adds electrometallurgy tool 20 to described substrate 40 transmission of electric signals by described print, described first sub-probe 22 and the second sub-probe 24 can be shunted described electric signal, to reduce the electric current flowing through described first probe 21 and described second probe 23.
In embodiments of the present invention, described substrate 40 also has interface EVEN 45, interface ODD 46, interface B 47, interface G 48 and interface R 49, accordingly, described print adds electrometallurgy tool 20 and also has the 3rd probe 25, four point probe 26, 5th probe 27, 6th probe 28 and the 7th probe 29, described probe is all electrically connected with described power supply 50, and when described print add electrometallurgy tool 20 be installed on described substrate 40 time, described 3rd probe 25, four point probe 26, 5th probe 27, 6th probe 28 and the 7th probe 29 respectively with interface EVEN 45, interface ODD 46, interface B 47, interface G 48 and interface R 49 contraposition electrical contact, to transmit corresponding electric signal to these interfaces.Wherein, described interface CF-COM 41 and sub-interface CF-COM42 is for receiving CF-COM signal, described interface Array-COM 43 and described sub-interface Array-COM44 is for receiving Array-COM signal, described interface EVEN 45 and described interface ODD 46 is for receiving Gate Line signal, and described interface B 47, interface G 48 and interface R 49 are for receiving Date Line signal.
As shown in Figure 2, in embodiments of the present invention, described power supply 50 comprises alternating voltage module 51 and DC voltage module 52.Described alternating voltage module 51 is electrically connected with described first probe 21 and the second probe 23 respectively, and provide Array-COM signal (ac signal) to described first probe 21 and provide CF-COM signal (ac signal) to described second probe 23, described 5th probe 27, 6th probe 28 and the 7th probe 29 ground connection, and when described probe is electrically connected with corresponding interface, described first probe 21 and the second probe 23 (the first probe 21 and the parallel connection of the second probe 23) and described 5th probe 27, 6th probe 28 and the 7th probe 29 (the 5th probe 27, 6th probe 28 and the parallel connection of the 7th probe 29) by the Cu wire electrical connection in described substrate 40, and form loop, thus described first probe 21 and the second probe 23 and described 5th probe 27, 6th probe 28 and the 7th probe 29 form pressure reduction.See also Fig. 3, under present technology, because the quantity of the branch road at described first probe 21 and the second probe 23 place is two, and the quantity of the branch road at described 5th probe 27, the 6th probe 28 and the 7th probe 29 place is three, from circuit analysis, the size flowing through the electric current of described first probe 21 and the second probe 23 is 1.5 times of the electric current flowing through described 5th probe 27, the 6th probe 28 and the 7th probe 29.As the total current in loop is I as described in supposing, then the size flowing through the branch current of described first probe 21 and the second probe 23 is I/2, and the size flowing through the branch current of described 5th probe 27, the 6th probe 28 and the 7th probe 29 is I/3.When being thus Cu wire for the wire in described substrate 40, the electric current flowing through described first probe 21 and the second probe 23 may being caused excessive, and then cause described first probe 21 and second probe 23 lost of life.And in embodiments of the present invention, described substrate 40 is provided with further at least one sub-interface CF-COM 42 and sub-interface Array-COM 44, and described print adds on electrometallurgy tool 20 and is provided with at least one first sub-probe 22 and second sub-probe 24 further, thus electric current is shunted.As when as described in the quantity of the first sub-probe 22 and the second sub-probe 24 be respectively one time, then now, the way of the branch road at described first sub-probe 22, second probe 23 of probe 21, first and the second sub-probe 24 place is 4 tunnels, and then the electric current flowing through described first sub-probe 22, second probe 23 of probe 21, first and the second sub-probe 24 is I/4, thus described first sub-probe 22, second probe 23 of probe 21, first and the second sub-probe 24 can have the longer life-span.
Be understandable that, in other embodiments of the invention, the number of described first sub-probe 22 and the second sub-probe 24 can design according to the actual needs, as two the first sub-probes 22 and two second sub-probes 24 or other quantity can be designed with, or described first sub-probe 22 only can be set and described second sub-probe 24 is not set, the number of described first sub-probe 22 and the second sub-probe 24 can equal also can be unequal, the present invention does not do concrete restriction.
In embodiments of the present invention, described DC voltage module 52 is electrically connected with described 3rd probe 25 and four point probe 26 respectively, and provide described Gate Line signal (DC signal) to described 3rd probe 25 and four point probe 26, described Gate Line signal transmits into the wire in described substrate 40 by the interface EVEN 45 that is electrically connected with described 3rd probe 25 and four point probe 26 and interface ODD 46, described Gate Line signal is used for Thin Film Transistor-LCD (Thin Film Transistor, the TFT) crystal switch in substrate 40 to open.The DC signal provided due to described DC voltage module 52 only needs the crystal switch of TFT to open, thus voltage do not need very large (as general for as described in alternating voltage module 51 provide about 1/4 ~ 1/3 of ac signal), when TFT semiconductor devices insulativity is good, the current value flowing through described 3rd probe 25 and four point probe 26 is less, and described 3rd probe 25 and four point probe 26 can not cause the lost of life because electric current is excessive.
It should be noted that, in other embodiments of the invention, when electric current is larger, corresponding the 3rd sub-probe (corresponding to the 3rd probe 23) also can be set, the sub-probe of 4th sub-probe (corresponding to four point probe 24) the 5th (corresponding to the 3rd probe 25), 6th sub-probe (corresponding to four point probe 26), 7th sub-probe (corresponding to the 5th probe 27), 8th sub-probe (corresponding to the 6th probe 28), any one or more in 9th sub-probe (corresponding to the probe 29 for a long time), to shunt, ensure that the life-span of probe can not shorten because electric current is excessive, these structural designs are all within protection scope of the present invention, do not repeat them here.
It should be noted that, the structural design of the embodiment of the present invention is not limited only to the wire under Cu processing procedure, and it is equally applicable to other and has the wire that low electrical resistant material makes, and the present invention is not specifically limited.
In embodiments of the present invention, described orientation ultraviolet optics irradiating machine 100 also comprises controller 60, described controller 60 can be computing machine or single-chip microcomputer etc., itself and described print add electrometallurgy tool 20 and are electrically connected, and for controlling described power supply 50, make described power supply 50 send predetermined electric signal to each probe.
In embodiments of the present invention, described orientation ultraviolet optics irradiating machine 100 also comprises uviol lamp group 70, described uviol lamp group 70 comprises several uviol lamps, to launch ultraviolet light, described ultraviolet light irradiates the Monomer (monomer) adding liquid crystal under the condition powered up, and makes described monomer form polymer, with at polyimide (polyimide, PI) alignment film surface forms liquid crystal pretilt angle, thus completes LCD alignment.
See also Fig. 1 to Fig. 2, during use, described print is added electrometallurgy tool 20 and be installed on described substrate 40, and make probe and described interface contraposition electrical contact.Now, described controller 60 controls described power supply 50 and adds electrometallurgy tool 20 to described print and power, electric signal (comprising Array-COM signal, CF-COM signal, Gate Line signal and Date Line signal) flows to corresponding interface by corresponding probe, and the Cu wire transmission in substrate 40, to form loop, thus electric signal loading is carried out to substrate 40.Open described uviol lamp group 70, described uviol lamp group 70 launches ultraviolet light, described ultraviolet light irradiates the Monomer (monomer) adding liquid crystal under the condition powered up, and make described monomer form polymer, with at polyimide (polyimide, PI) alignment film surface forms liquid crystal pretilt angle, thus completes LCD alignment.
In sum, the orientation ultraviolet optics irradiating machine 100 that the embodiment of the present invention provides, the wire adopting Cu material to make in substrate 40, reduces energy consumption.On described substrate 40, be provided with at least one sub-interface CF-COM 42 and sub-interface Array-COM 44 simultaneously, and add on electrometallurgy tool 20 in described print and be provided with at least one first sub-probe 22 and second sub-probe 24, thus the electric current that described power supply 50 provides is shunted, and then the electric current flowing through described first sub-probe 22, second probe 23 of probe 21, first and the second sub-probe 24 reduces, and ensures that described first sub-probe 22, second probe 23 of probe 21, first and the second sub-probe 24 can have the longer life-span.The design of described orientation ultraviolet optics irradiating machine 100, can effectively promote the probe life-span, reduces consumptive material expense, reduces costs; Simultaneously lifting production capacity save human cost, reduces that orientation is abnormal occurs, and increases production stability.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications are also considered as protection scope of the present invention.
Claims (9)
1. an orientation ultraviolet optics irradiating machine, comprise print and add electrometallurgy tool, substrate and add the power supply that electrometallurgy electric property is connected with described print, described print adds on electrometallurgy tool and comprises the first probe and the second probe, described substrate comprises interface (CF-COM) and interface (Array-COM), it is characterized in that, described print adds electrometallurgy tool and also comprises at least one first sub-probe and at least one the second sub-probe, described substrate also comprises at least one sub-interface (CF-COM) and at least one sub-interface (Array-COM), and described interface (CF-COM), sub-interface (CF-COM), be connected in parallel to each other between sub-interface (Array-COM) and interface (Array-COM), described print adds electrometallurgy tool when being installed on described substrate, described first probe and described interface (CF-COM) contraposition electrical contact, described first sub-probe and described sub-interface (CF-COM) contraposition electrical contact, described second probe and described interface (Array-COM) contraposition electrical contact, described second sub-probe and described sub-interface (Array-COM) contraposition electrical contact, to transmit the electric signal that described power supply provides to described interface or sub-interface, meanwhile, described first sub-probe and the electric signal of the second sub-probe to described power delivery are shunted.
2. orientation ultraviolet optics irradiating machine according to claim 1, it is characterized in that, described substrate also has interface (EVEN), interface (ODD), interface (B), interface (G) and interface (R), described print adds electrometallurgy tool and also has the 3rd probe, four point probe, 5th probe, 6th probe and the 7th probe, described probe is all electrically connected with described power supply, and when described print add electrometallurgy tool be installed on described substrate time, described 3rd probe and described interface (EVEN), described four point probe and described interface (ODD), described 5th probe and described interface (B), described 6th probe and described interface (G) and the 7th probe and described interface (R) corresponding electrical contact respectively, to transmit the electric signal that described power supply provides to these interfaces.
3. orientation ultraviolet optics irradiating machine according to claim 2, it is characterized in that, described power supply comprises alternating voltage module.Described alternating voltage module is electrically connected with described first probe, the first sub-probe, the second probe and the second sub-probe respectively, and provide ac signal to described probe, described 5th probe, the 6th probe and the 7th probe ground connection, and when after the electrical contact corresponding to interface of described probe, described first probe, the first sub-probe, the second probe and the second sub-probe are electrically connected by the wire in substrate with described 5th probe, the 6th probe and the 7th probe, and form loop.
4. orientation ultraviolet optics irradiating machine according to claim 3, it is characterized in that, described power supply also comprises DC voltage module, described DC voltage module is electrically connected with described 3rd probe and four point probe respectively, and provide described DC signal to described 3rd probe and four point probe, described DC signal passes through the wire transmission in substrate, to be opened by the Thin Film Transistor-LCD crystal switch in substrate.
5. orientation ultraviolet optics irradiating machine according to claim 4, is characterized in that, described wire is copper conductor.
6. orientation ultraviolet optics irradiating machine according to claim 2, it is characterized in that, described orientation ultraviolet optics irradiating machine also comprises controller, and described controller is connected with described power electric, to control described power supply, described power supply is made to send predetermined electric signal to each probe.
7. orientation ultraviolet optics irradiating machine according to claim 1, is characterized in that, described orientation ultraviolet optics irradiating machine also comprises uviol lamp group, and described uviol lamp group comprises several uviol lamps, to launch ultraviolet light.
8. orientation ultraviolet optics irradiating machine according to claim 1, is characterized in that, described first sub-probe is equal or unequal with the number of the second sub-probe.
9. orientation ultraviolet optics irradiating machine according to claim 2, it is characterized in that, it is one or more that described print adds that electrometallurgy tool also comprises in the 3rd sub-probe, the 4th sub-probe, the 5th sub-probe, the 6th sub-probe, the 7th sub-probe, the 8th sub-probe, the 9th sub-probe; Described substrate also have the sub-interface (EVEN) corresponding to described 3rd sub-probe, the sub-interface (ODD) corresponding to the 4th sub-probe, the sub-interface (B) corresponding to the 5th sub-probe, the sub-interface (G) corresponding to the 6th sub-probe and correspond to the 7th sub-probe sub-interface (R) in one or more.
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| CN107908032A (en) * | 2017-12-28 | 2018-04-13 | 深圳市华星光电技术有限公司 | Power supply unit and orientation ultraviolet optics irradiating machine for LCD alignment |
| WO2019127802A1 (en) * | 2017-12-28 | 2019-07-04 | 深圳市华星光电技术有限公司 | Power supply device for liquid crystal alignment and aligned ultraviolet optical irradiator |
| CN108873490A (en) * | 2018-08-27 | 2018-11-23 | 惠科股份有限公司 | Ultraviolet light orientation irradiation system and its detection device |
| WO2020042326A1 (en) * | 2018-08-27 | 2020-03-05 | 惠科股份有限公司 | Ultraviolet alignment illumination system and detection apparatus thereof |
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|---|---|
| CN104317107B (en) | 2017-05-24 |
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