CN104301067B - DM-RS patterns indicating means and device - Google Patents

DM-RS patterns indicating means and device Download PDF

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Publication number
CN104301067B
CN104301067B CN201310306798.8A CN201310306798A CN104301067B CN 104301067 B CN104301067 B CN 104301067B CN 201310306798 A CN201310306798 A CN 201310306798A CN 104301067 B CN104301067 B CN 104301067B
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patterns
mcs
channel quality
pattern
specific fields
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CN104301067A (en
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张兴炜
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Huawei Technologies Co Ltd
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Huawei Technologies Co Ltd
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Priority to PCT/CN2014/081057 priority patent/WO2015007152A1/en
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L1/00Arrangements for detecting or preventing errors in the information received
    • H04L1/0001Systems modifying transmission characteristics according to link quality, e.g. power backoff
    • H04L1/0002Systems modifying transmission characteristics according to link quality, e.g. power backoff by adapting the transmission rate
    • H04L1/0003Systems modifying transmission characteristics according to link quality, e.g. power backoff by adapting the transmission rate by switching between different modulation schemes
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L1/00Arrangements for detecting or preventing errors in the information received
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L1/00Arrangements for detecting or preventing errors in the information received
    • H04L1/0001Systems modifying transmission characteristics according to link quality, e.g. power backoff
    • H04L1/0023Systems modifying transmission characteristics according to link quality, e.g. power backoff characterised by the signalling
    • H04L1/0025Transmission of mode-switching indication
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04LTRANSMISSION OF DIGITAL INFORMATION, e.g. TELEGRAPHIC COMMUNICATION
    • H04L1/00Arrangements for detecting or preventing errors in the information received
    • H04L1/12Arrangements for detecting or preventing errors in the information received by using return channel
    • H04L1/16Arrangements for detecting or preventing errors in the information received by using return channel in which the return channel carries supervisory signals, e.g. repetition request signals
    • H04L1/18Automatic repetition systems, e.g. Van Duuren systems
    • H04L1/1867Arrangements specially adapted for the transmitter end
    • H04L1/1896ARQ related signaling

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  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Signal Processing (AREA)
  • Quality & Reliability (AREA)
  • Mobile Radio Communication Systems (AREA)

Abstract

Demodulated reference signal DM RS patterns indicating means and device, wherein method include:Obtain the specific fields in Downlink Control Information DCI;Corresponding DM RS patterns are determined according to specific fields.In implementation by reducing reference signal come during reducing pilot tone and control signaling expense, in this application, UE by DCI with the relevant field of down channel quality, or, there is the field of redundancy shape to be inferred to the selected DM RS patterns of eNB, without as in the prior art, needing eNB to indicate to use the DM RS patterns on UE by additionally increasing new field, and then reduce the expense of pilot tone and control signaling.

Description

DM-RS patterns indicating means and device
Technical field
The invention belongs to field of communication technology more particularly to DM-RS patterns indicating means and device.
Background technology
Third generation partner program(3rd Generation Partnership Project, 3GPP)It is advanced to drill for a long time Into(Long Term Evolution-Advanced, LTE-A)Rel-10/11/12 versions are long term evolutions(Long Term Evolution, LTE)The enhancing of Rel-8/9 versions, lte-a system have bandwidth requirement more higher than LTE system, support to be up to The peak data rate of 1G/s.In order to meet the requirement of LTE-A, lte-a system is by carrier convergence(Component Aggregation, CA)Method of the technology as its expansion system bandwidth, and largely multiple antennas is used to enhance technology(Enter more more Go out, Multiple-Input Multiple-Output, MIMO)With link adaptation techniques to improve data transfer rate and systematicness Energy.
In LTE-A Rel-12 versions, the enhancing for hot spot region becomes a heat subject.Hot spot region includes Indoor and outdoors scene has the micro-base station of multiple low-power(Pico eNodeB, abbreviation Pico eNB)Covering forms multiple slight Area (Small Cell Network, SCN).Indoor Pico eNB only support the user equipment that low speed moves(User Equipment, abbreviation UE), outdoor Pico eNB also to be supported other than the UE that low speed to be supported moves middling speed move UE, two kinds of Pico eNB do not support the UE of high-speed mobile.It is moved in general, movement speed is known as low speed between 0km/h-15km/h Dynamic, movement speed is known as middling speed movement between 15km/h-60km/h, and movement speed is in 60km/h referred above to high-speed mobile.
Since micro-base station is only the UE services of middle low speed movement, the quality of wireless channel between micro-base station and UE is relatively Well, coverage area is smaller, the UE quantity of service is fewer, thus can reduce the expense of pilot tone and control signaling.
As shown in Figure 1, resource block(Resource Block, RB)By multiple resource units(Resource Element, RE)Composition, in a RB or RB couples, the position of some RE is used for transmission DM-RS, and so-called DM-RS patterns refer to using In the graph-based for transmitting quantity and position of the RE of DM-RS in RB.According to being used for transmission numbers of the RE of DM-RS in RB The difference of amount and position, DM-RS patterns can have multiple, these DM-RS patterns are respectively stored in eNB and UE, and UE passes through The data transmitted by eNB are demodulated using DM-RS patterns identical with eNB.
The expense for reducing pilot tone and control signaling can be by reducing demodulated reference signal(Demodulation Reference Signal, DM-RS)Mode, specifically, the DM-RS patterns of more sparse time domain or/and frequency domain may be used To achieve the purpose that reduce pilot-frequency expense;Meanwhile it in order to be compatible with existing DM-RS patterns, needing that different DM-RS is used to scheme Sample;In this way, it is necessary to which eNB notifies UE, and eNB uses any DM-RS patterns, in order to which UE can be used according to eNB DM-RS patterns determine DM-RS patterns that the UE should be used.
In the prior art, eNB notices UE includes by the Downlink Control Information in physical layer using the mode of DM-RS patterns (Downlink Control Information, DCI)Signaling increases newer field to indicate DM-RS patterns;Inventor is by grinding Discovery is studied carefully, since this mode needs additionally to increase new field, so Physical Downlink Control Channel(Physical Downlink Control Channel, PDCCH)Expense it is bigger.
Invention content
In view of this, the present invention provides DM-RS patterns indicating means and device, down control channel expense is saved to realize Purpose.
What the application was realized in:
In a first aspect, an embodiment of the present invention provides a kind of demodulated reference signal DM-RS pattern indicating means, including:
Obtain the specific fields in Downlink Control Information DCI;The specific fields include relevant with down channel quality Field, or, there is the field of redundant state;
It is determined using the corresponding DM-RS patterns on UE according to the specific fields.
In the first possible realization method of first aspect, the specific fields include:Modulation and Coding Scheme MCS, New data indicates NDI or one kind in redundancy versions RV or arbitrary combination.
It is described according to the spy when the specific fields include MCS in the realization method of the first of first aspect Determine field to determine using the corresponding DM-RS patterns on UE, including:
According to the mapping relations of the MCS values and DM-RS patterns, DM-RS patterns corresponding with the MCS are determined.
It is described according to the spy when the specific fields include NDI in the realization method of the first of first aspect Determine field to determine using the corresponding DM-RS patterns on UE, including:
When the NDI indicates to retransmit, for retransmitting DM- of the data using density not less than original DM-RS pattern densities RS patterns;
When the NDI indicates new biography, the DM-RS pattern smaller than original DM-RS pattern densities is used for new biography data.
It is described according to the spy when the specific fields include RV in the realization method of the first of first aspect Determine field to determine using the corresponding DM-RS patterns on UE, including:
According to the mapping relations of the value of the RV and DM-RS patterns, the corresponding DM-RS patterns of the RV are determined.
It is described according to institute when the specific fields include MCS and RV in the realization method of the first of first aspect Specific fields are stated to determine using the corresponding DM-RS patterns on UE, including:
According to the mapping relations of the MCS values and DM-RS pattern densities, the corresponding DM-RS patterns of the MCS are determined Density;
By the mapping relations of the value and DM-RS patterns of the RV, in the DM-RS patterns of determined density, determine The corresponding DM-RS patterns of RV.
It is described according to institute when the specific fields include NDI and RV in the realization method of the first of first aspect Specific fields are stated to determine using the corresponding DM-RS patterns on UE, including:
According to the value of the NDI, the density of corresponding DM-RS patterns is determined;
By the mapping relations of the value and DM-RS patterns of the RV, in the DM-RS patterns of determined density, determine The corresponding DM-RS patterns of RV.
In the realization method of the first of first aspect, when the specific fields include MCS and RV, further include:
The subsequent child frame number using same DM-RS patterns is determined according to the numerical value of the RV.
In the realization method of the first of first aspect, when the specific fields include NDI and RV, further include:
The subsequent child frame number using same DM-RS patterns is determined according to the numerical value of the RV.
In the realization method of the first of first aspect, described determined according to the numerical value of the RV is schemed using same DM-RS The subsequent child frame number of sample includes:
The subsequent child frame number is the numerical value of the RV, or, the product of the numerical value of the RV and preset value.
Second aspect, an embodiment of the present invention provides a kind of DM-RS patterns instruction devices, including:
Specific fields acquisition module, for obtaining the specific fields in Downlink Control Information DCI;The specific fields include With the relevant field of down channel quality, or, have the field of redundant state;
Pattern determining module, for determining use corresponding DM-RS patterns on UE according to the specific fields.
In the first possible realization method of second aspect, the specific fields include:Modulation and Coding Scheme MCS, Downlink distribution index NDI or one kind in redundancy versions RV or arbitrary combination.
In the first possible realization method of second aspect, when the specific fields include MCS, the pattern is true Cover half block is used for:
According to the mapping relations of the MCS values and DM-RS patterns, DM-RS patterns corresponding with the MCS are determined.
In the first possible realization method of second aspect, when the specific fields include NDI, the pattern is true Cover half block is used for:
When the NDI indicates to retransmit, for retransmitting DM- of the data using density not less than original DM-RS pattern densities RS patterns;
When the NDI indicates new biography, the DM-RS pattern smaller than original DM-RS pattern densities is used for new biography data.
In the first possible realization method of second aspect, when the specific fields include RV, the pattern is true Cover half block is used for:
According to the mapping relations of the value of the RV and DM-RS patterns, the corresponding DM-RS patterns of the RV are determined.
In the first possible realization method of second aspect, when the specific fields include MCS and RV, the figure Sample determining module includes:
Pattern density determination unit determines institute for the mapping relations according to the MCS values and DM-RS pattern densities State the density of the corresponding DM-RS patterns of MCS;
Pattern identifies unit, for the mapping relations of value and DM-RS patterns by the RV, in determined density In DM-RS patterns, the corresponding DM-RS patterns of the RV are determined.
In the first possible realization method of second aspect, when the specific fields include NDI and RV, the figure Sample determining module includes:
Pattern density determination unit determines the density of corresponding DM-RS patterns for the value according to the NDI;
Pattern identifies unit, for the mapping relations of value and DM-RS patterns by the RV, in determined density In DM-RS patterns, the corresponding DM-RS patterns of the RV are determined.
In the first possible realization method of second aspect, when the specific fields include MCS and RV, further include Subsequent child frame number determining module;
For determining the subsequent child frame number using same DM-RS patterns according to the numerical value of the RV.
In the first possible realization method of second aspect, when the specific fields include NDI and RV, further include Subsequent child frame number determining module;
For determining the subsequent child frame number using same DM-RS patterns according to the numerical value of the RV.
In the first possible realization method of second aspect,
The numerical value or the numerical value of the RV and the product of preset value that the subsequent child frame number is the RV.
It can be seen from the above technical scheme that implementing to open to reduce pilot tone and control signaling by reducing reference signal During pin, the UE in the application is inferred to the selected DM-RS patterns of eNB by the specific fields in DCI, to not As in the prior art, eNB being needed to indicate to use the DM-RS patterns on UE by additionally increasing new field, And then reduce the expense of pilot tone and control signaling.
Description of the drawings
It, below will be to embodiment or the prior art in order to illustrate more clearly of the present invention or technical solution in the prior art Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only the present invention's Some embodiments for those of ordinary skill in the art without having to pay creative labor, can also basis These attached drawings obtain other attached drawings.
Fig. 1 is the schematic diagram of DM-RS patterns described herein;
Fig. 2 is the flow diagram of DM-RS patterns indicating means described herein;
Fig. 3 is the another schematic diagram of DM-RS patterns described herein;
Fig. 4 is the another schematic diagram of DM-RS patterns described herein;
Fig. 5 is the another schematic diagram of DM-RS patterns described herein;
Fig. 6 is the another schematic diagram of DM-RS patterns described herein;
Fig. 7 is the structural schematic diagram of DM-RS patterns instruction device described herein;
Fig. 8 is the another structural schematic diagram of DM-RS patterns instruction device described herein;
Fig. 9 is the another structural schematic diagram of DM-RS patterns instruction device described herein;
Figure 10 is the structural schematic diagram of user equipment described herein.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, those of ordinary skill in the art are obtained every other without creative efforts Embodiment shall fall within the protection scope of the present invention
To realize that the purpose for reducing PDCCH expenses when eNB notifies UE to use DM-RS patterns, the present invention provide a kind of DM- RS pattern indicating means, as shown in Fig. 2, including step:
Specific fields in S11, acquisition Downlink Control Information DCI;
In this application, it in order to realize the purpose for reducing PDCCH expenses when eNB notices UE uses DM-RS patterns, uses Utilize the specific fields in existing DCI.
Specific fields in the application refer to, and the relevant field of down channel quality, or, there is the word of redundant state Section.
Specifically, the density for the DM-RS that eNB is used is relevant with down channel quality, as target Block Error Rate BLER (Block Error Rate)One timing theoretically should use more highdensity DM-RS when down channel quality difference, work as downlink The DM-RS of less dense can be used when channel quality is good, and in existing DCI, the numerical value of some fields is also to believe with downlink Road quality is relevant, for example, according to the principle of link adaptation techniques, eNB selects different according to different down channel qualities Modulation and Coding Scheme (Modulation and Coding Scheme, MCS);This is because in LTE, down channel matter Amount is obtained by the feedback measurement of UE, is indicated by UE reporting channel qualities(Channel Quality Indicator, CQI)To eNB, the CQI of 4 bits corresponds to different Signal to Interference plus Noise Ratio(Signal-to-Interference and Noise Ratio, SINR), channel quality is better, and the value of CQI is bigger, and channel quality is poorer, and the value of CQI is with regard to smaller.ENB is being received After CQI, suitable MCS can be selected to be used for downlink according to CQI, specifically, better channel quality eNB can be used MCS more corresponding to the modulation system of high-order and higher code check, poorer channel quality eNB can then use the modulation of more low order MCS corresponding to mode and lower code check.
In addition, new data indicates(New Data Indicator, NDI)The quality of reflection down channel is can be used for, For example, as NDI=0, indicate that information, meaning refer to that is sent out is the data of re-transmission according to original NDI, this is indicated before It is primary through being transmitted across, but UE is not received by or is not properly received, and illustrates that channel condition is bad at this time;And work as NDI=1 When, according to original NDI instruction information its meaning refer to hair it is the data just passed, illustrates that channel quality is not deteriorated.
In order to reduce the expense of PDCCH, eNB can use different time domains or/and frequency according to the quality of channel quality The DM-RS patterns of domain degree of rarefication;Specifically, channel quality is better, so that it may to use time domain or/and frequency-domain sparse degree bigger DM-RS patterns, that is, the smaller DM-RS patterns of RS density are used, to reduce demodulated reference signal(Demodulation Reference Signal, DM-RS)Resource occupation amount in subframe;In addition, channel quality is poorer, it is necessary to use time domain Or/and the DM-RS patterns that frequency-domain sparse degree is smaller, that is, the DM-RS patterns for using RS density biggers, to ensure transmission quality.
By upper it is known that eNB selects suitable DM-RS patterns that can have certain association with channel quality;And UE passes through Obtain in Downlink Control Information DCI with the relevant field of down channel quality, it is also possible to obtain some and down channel quality phase The information of pass, so, it can be used for judging the DM-RS patterns indicated by eNB.
In this application, the field for including redundant state refers in certain fields in DCI, includes not use State can refer to UE without additionally increasing specific field to by using the state not used in these fields Show DM-RS patterns.
For example, when certain field using 3 bits come when identifying 5 carrier waves, 3 bits have 8 states, and identify 5 A carrier wave has only used 5 states therein, and in addition 3 states that do not use can be referred to as redundant state.
In this application, including the field of redundant state can be but simultaneously not only limit each field for arriving mentioned by this paper, As long as in DCI, and including redundant state.
S12, corresponding DM-RS patterns are determined according to the specific fields.
In practical applications, in specific fields, the most common relevant field of down channel quality may include MCS and NDI, specifically:
Since after receiving the CQI information of UE reported, eNB selects suitable MCS, and eNB also can be according to channel The quality of quality selects suitable DM-RS patterns, it is possible to obtain, the DM-RS patterns of MCS and the eNB selection of eNB selections There is corresponding association with channel quality;That is, after acquisition eNB selected MCS, it is selected can be also derived by eNB The RS density of DM-RS patterns.
In the application, as shown in Fig. 3 to Fig. 5, eNB and UE are stored there are many DM-RS patterns, each DM-RS pattern with There are one mapping relations for one MCS value range.ENB can carry MCS fields in the DL grant of PDCCH/EPDCCH, be used for Indicate MCS used in PDSCH.It can be mapped to from MCS when DL grant in the PDCCH/EPDCCH that UE is received corresponding DM-RS patterns, the DM-RS patterns are used for PDSCH.For example, when MCS is 0 to 9, the DM-RS patterns in corresponding diagram 3 work as MCS At 10 to 16, the DM-RS patterns in corresponding diagram 4, when MCS is 17 to 31, the DM-RS patterns in corresponding diagram 5.
In this way, being based on link adaptation techniques, eNB is arrived according to the CQI information reported for receiving UE, the MCS of selection 0 When 9;Meanwhile according to current channel quality, eNB should select DM-RS patterns as shown in Figure 3, so that ensureing data Under the premise of transmission demand, pilot-frequency expense is reduced to reach using the DM-RS patterns of more sparse time domain or/and frequency domain as possible Purpose.
Since the DM-RS patterns of MCS and the eNB selection of eNB selections have corresponding association with channel quality, so, UE exists Obtain after the field of MCS information, learning the MCS selected by eNB in DCI 10 to 16, so as to according to the mapping relations It is inferred to the RS density of the DM-RS patterns selected by eNB, when each RS density only corresponds to a kind of DM-RS patterns, is inferred to The RS density of DM-RS patterns is also it is concluded that it is DM-RS patterns as shown in Figure 4 to go out DM-RS patterns.
In addition, in this application, can also be, UE obtains in DCI after the field of NDI information, by the value of NDI judging Whether channel quality is deteriorated, and then infers whether eNB can select the DM-RS patterns of density bigger.Specifically, when the value of NDI is 0 When, it indicates that NDI instructions retransmit, illustrates that channel quality is deteriorated, and then also it is concluded that going out eNB will not select for retransmitting data The smaller DM-RS patterns of density need close not less than original DM-RS patterns using density at this point it is possible to according to preset agreement The DM-RS patterns of degree.In addition, when the value of NDI is 0, indicates that NDI indicates new biography, illustrate that channel quality is fine, at this point it is possible to According to preset agreement, the DM-RS pattern smaller than original DM-RS pattern densities can be used, to save down control channel Expense.
In the application, include redundant state field it is most typical can be RV fields, that is, can be by RV fields Value indicate corresponding DM-RS patterns.Specifically, the mapping relations of the value and DM-RS patterns of RV can be preset, this Sample, so that it may to determine corresponding DM-RS patterns according to the value of RV fields.
By upper it is known that implementing by reducing reference signal come during reducing pilot tone and control signaling expense, In this application, UE by DCI with the relevant field of down channel quality, or, there is the field of redundancy shape to be inferred to eNB Selected DM-RS patterns, without as in the prior art, needing to indicate by additional increase newer field DM-RS patterns, so reducing the expense of pilot tone and control signaling.
Further, in this application, field RV can also be used in combination with field MCS or field NDI.
Specifically, when field RV and field MCS are used in combination, when the corresponding DM-RS pattern densities packet of a MCS field When having included multiple DM-RS patterns, this multiple DM-RS pattern can be identified by the different value of field RV, so that UE can With the required DM-RS patterns of further determination.For example, DM-RS patterns as shown in Figure 6, scheme with DM-RS illustrated in fig. 5 Sample has same density, at this point it is possible to as field RV=0, corresponding DM-RS patterns shown in fig. 5 are corresponding as field RV=1 DM-RS patterns shown in fig. 6.
In addition, field RV and MCS is used in combination, it is also possible that UE judges required DM-RS patterns according to MCS fields, so Afterwards by the value of field RV, the number of sub frames that can subsequently use the DM-RS patterns is obtained;The specific can be that when UE is being obtained In DCI after the field of MCS information, the MCS selected by eNB is learnt 10 to 16, to which required DM-RS patterns are as shown in Figure 4 DM-RS patterns after, will also according to the value of field RV come judge subsequently can use DM-RS patterns shown in Fig. 4 number of sub frames, Specific subsequent child frame number either RV value itself, for example, when the value of RV is equal to 0, DM-RS patterns only have this frame Effect;When the value of RV is equal to 1, subsequent child frame number can be 1k;When the value of RV is equal to 2, subsequent child frame number can be 2k;This Outside, can also be that the value of the RV is multiplied by preset value, for example, when the value of RV is equal to 1, subsequent child frame number can be 1k, work as RV Value be equal to 2 when, subsequent child frame number can be 2k, that is, can preset value be set as 1k;The determination of the preset value can be according to reality Border application it needs to be determined that, do not do specific number herein and limit.
In this application, the number of sub frames that can subsequently use same DM-RS patterns is determined by RV values, so that Same DM-RS patterns can be used in certain subframe, and then also avoid the frequent changes of DM-RS patterns.
In addition, being used in combination for field RV and NDI is specifically as follows, UE judges required DM-RS patterns according to NDI fields When, when corresponding same RS density includes multiple DM-RS patterns, it is multiple this can be identified by the different value of field RV DM-RS patterns, so that UE can accurately judge required DM-RS patterns.
In addition, being used in combination for field RV and NDI can also be specifically, UE judges that required DM-RS schemes according to NDI fields Sample obtains the number of sub frames that can subsequently use the DM-RS patterns then by the value of field RV;The effect of RV herein with answer Similar with being used in combination for MCS with RV with principle, purpose is also that same DM-RS patterns can be used in certain subframe, And then avoid the frequent changes of DM-RS patterns.
The present invention provides a kind of DM-RS patterns instruction devices 10, as shown in fig. 7, the DM-RS patterns instruction device 10 is wrapped It includes:
Specific fields acquisition module 01, for obtaining the specific fields in DCI;Specific fields include and down channel quality Relevant field, or, there is the field of redundant state;
Pattern determining module 02, for being determined using the corresponding DM-RS patterns on UE according to specific fields.
In this application, it in order to realize the purpose for reducing PDCCH expenses when eNB notices UE uses DM-RS patterns, utilizes Specific fields in existing DCI.
Specific fields in the application refer to, and the relevant field of down channel quality, or, there is the word of redundant state Section.
In practical applications, the DM-RS patterns instruction device 10 in the application can be set in UE, in this way, when eNB to After UE sends DCI, DCI that specific fields acquisition module 01 is received according to UE, so that it may to obtain specific fields therein.
In the application can be specifically MCS or NDI with the relevant field of down channel quality;For example, better channel Quality can use the MCS corresponding to the more modulation system of high-order and higher code check, poorer channel quality that can then use more MCS corresponding to the modulation system of low order and lower code check.
In addition, the quality that NDI can be used for reflection down channel refers to for example, as NDI=0 according to original NDI Show information, it is the data retransmitted that meaning, which refers to hair, this be transmitted across before indicating it is primary, but UE be not received by or It is not properly received, illustrates that channel condition is bad at this time;And as NDI=1, according to original NDI instructions information, it is meant that Refer to hair is the data just passed, illustrates that channel quality is not deteriorated.
For example, by taking specific fields include field MCS as an example, in the application, as shown in Fig. 3 to Fig. 5, eNB and UE are stored There are many DM-RS patterns;Since eNB can select suitable MCS to be used for downlink according to the fine or not degree of channel quality, with And eNB can also indicate that UE determines corresponding DM-RS patterns according to the fine or not degree of channel quality, for this purpose, being set in the application The mapping relations that each DM-RS pattern and a MCS value range have;Such as can be, when MCS is 0 to 9, corresponding diagram 3 In DM-RS patterns, when MCS is 10 to 16, the DM-RS patterns in corresponding diagram 4, when MCS is 17 to 31, in corresponding diagram 5 DM-RS patterns.
Because of above-mentioned mapping relations, pattern determining module 02 can determine that use exists according to the mapping relations Corresponding DM-RS patterns on UE.For example, when its value of MCS fields that specific fields acquisition module 01 is got is 5, figure Sample determining module 02 can should select DM-RS patterns as shown in Figure 3 according to above-mentioned mapping relations to be inferred to eNB, It is also assured that the DM-RS patterns as shown in Figure 3 that UE should also be as using thus.And so on, when specific fields obtain mould When its value of field MCS that block 01 is got is 12, pattern determining module 02 is assured that use corresponding DM-RS figures on UE Sample is DM-RS patterns as shown in Figure 4.
By taking specific fields include field NDI as an example, in the application, corresponding DM-RS patterns are determined according to field NDI, are had Body determines that scheme is:
When the field NDI that specific fields acquisition module 01 is got is 0, that is, when NDI indicates to retransmit, pattern determines Module 02 is assured that the DM-RS patterns for retransmitting data using density not less than original DM-RS pattern densities;With current For the DM-RS patterns as shown in Figure 4 used, after the field NDI that specific fields acquisition module 01 is got is 0, for Retransmitting data can continue to use DM-RS patterns as shown in Figure 4 according to default agreement, or, using DM-RS as shown in Figure 3 Pattern.
When the field NDI that specific fields acquisition module 01 is got is 1, that is, when NDI indicates new biography, for new biography Data use the DM-RS pattern smaller than original DM-RS pattern densities.It is with currently used DM-RS patterns as shown in Figure 4 Example, after the field NDI that specific fields acquisition module 01 is got is 1, DM-RS that can be as shown in Figure 5 for new biography data The principle of the pattern determination schemes is, when the value of NDI is 0, indicates that NDI instructions retransmit, illustrates that channel quality is deteriorated, in turn Also it is concluded that the smaller DM-RS patterns of density will not be selected for retransmitting data by going out eNB, at this point it is possible to according to preset Agreement needs the DM-RS patterns for being not less than original DM-RS pattern densities using density.In addition, when the value of NDI is 1, indicate NDI indicates new biography, illustrates that channel quality is fine, at this point it is possible to according to preset agreement, can use than original DM-RS patterns The small DM-RS patterns of density, to save the expense of down control channel.
In this application, the field for including redundant state refers in certain fields, includes the state not used, To which by using the state not used in these fields, DM-RS can be indicated to UE by not having to the additional specific field that increases Pattern.
For example, when certain field using 3 bits come when identifying 5 carrier waves, 3 bits have 8 states, and identify 5 A carrier wave has only used 5 states therein, and in addition 3 states that do not use can be referred to as redundant state.
In this application, including the field of redundant state can be but simultaneously not only limit each field for arriving mentioned by this paper, As long as in DCI, and including redundant state.
In the application, include redundant state field it is most typical can be RV fields, that is, can be by RV fields Value indicate corresponding DM-RS patterns.Specifically, the mapping relations of the value and DM-RS patterns of RV can be preset, this Sample, pattern determining module 02 can be used according to the value of the RV fields acquired in specific fields acquisition module 01 to determine Corresponding DM-RS patterns on UE.
By upper it is known that implementing by reducing reference signal come during reducing pilot tone and control signaling expense, In this application, DM-RS patterns instruction device passes through word related to down channel quality or including redundant state in DCI Section is inferred to the selected DM-RS patterns of eNB, without as in the prior art, needing through additional increase Newer field indicates DM-RS patterns, so the further expense for reducing pilot tone and control signaling.
Further, as shown in figure 8, in this application, pattern determining module 02 can also include that pattern density determines list Member 021 and pattern identify unit 022;Specially:
Pattern density determination unit 021 is used for the mapping relations according to the MCS values and DM-RS pattern densities, determines The density of the corresponding DM-RS patterns of MCS;
Pattern identifies the mapping relations of value and DM-RS patterns that unit 022 is used for through the RV, determines the RV phases The DM-RS patterns answered.
Specifically, when field RV and MCS are used in combination, when the corresponding RS density of a MCS field includes multiple DM- When RS patterns, one of them can be determined in this multiple DM-RS pattern, so that UE can by the different value of field RV Accurately to judge required DM-RS patterns.For example, DM-RS patterns as shown in Figure 5, DM-RS patterns tool as shown in fig. 4 There is same density.
At this point, first, being closed according to the mapping of MCS values and DM-RS pattern densities by pattern density determination unit 021 System, it may be determined that the density of the corresponding DM-RS patterns of MCS, to be determined that the density of DM-RS patterns includes Fig. 5 and Fig. 6 two For DM-RS patterns;Due to including two DM-RS patterns in the density, it still can not accurately determine that use exists at this time Which DM-RS pattern DM-RS patterns on UE should be, also need to identify unit 022 further really by pattern thus Recognize.
As field RV=0, pattern mark unit 022, can be true by the mapping relations of the value and DM-RS patterns of RV The fixed DM-RS patterns using on UE should be DM-RS patterns shown in fig. 5;Can also include, as field RV=1, pattern Identify mapping relations of the unit 022 by the value and DM-RS patterns of RV, it may be determined that answer using the DM-RS patterns on UE This is DM-RS patterns shown in fig. 6.
In this application, pattern determining module 02 includes pattern density determination unit 021 and pattern identifies unit 022, also It may include another embodiment;Specially:
Pattern density determination unit 021 determines the density of corresponding DM-RS patterns according to the value of the NDI;
Pattern identifies mapping relations of the unit 022 by the value and DM-RS patterns of the RV, determines that the RV is corresponding DM-RS patterns.
Present embodiment is similar with the upper principle of an embodiment, when pattern density determination unit 021 is according to the NDI's Value and determine in the density of corresponding DM-RS patterns, when including multiple DM-RS patterns, unit can be identified by pattern 022 according to the value of RV come specific it is determined that being which DM-RS pattern from multiple DM-RS patterns.
Fig. 9 is the DM-RS patterns instruction device 11 that another embodiment of the present invention provides, the DM-RS pattern instruction devices 22 include:Specific fields acquisition module 01, pattern determining module 02 and subsequent child frame number determining module 03;Wherein, specific fields Acquisition module 01 and the embodiment effect corresponding with Fig. 7 and Fig. 8 of pattern determining module 02 are identical, are obtained in the present embodiment to determining field It will not go into details for modulus block 01 and pattern determining module 02.
By taking the specific fields that specific fields acquisition module 01 obtains are MCS as an example, specific fields acquisition module 01 obtains word Section MCS, pattern determining module 02 determine use corresponding DM-RS patterns on UE according to the value of MCS,
Then, for subsequent child frame number determining module 03 by the value of field RV, the DM-RS patterns can subsequently be used by obtaining Number of sub frames;For example, after the specific fields acquisition module 01 in UE obtains the field of MCS information in DCI, learn selected by eNB MCS 10 to 16, so that it is determined that use DM-RS patterns on UE should be DM-RS patterns shown in Fig. 4, in addition, also to lead to Later continue number of sub frames determining module 03 and judge can subsequently to use according to the value of field RV of DM-RS patterns shown in Fig. 4 Frame number;Specific subsequent child frame number either RV value itself, for example, when the value of RV is equal to 0, DM-RS patterns are only to this Frame is effective;When the value of RV is equal to 1, subsequent child frame number can be 1k;When the value of RV is equal to 2, subsequent child frame number can be 2k; In addition it is also possible to be that the value of the RV is multiplied by preset value, for example, when the value of RV is equal to 1, subsequent child frame number can be 1k, when When the value of RV is equal to 2, subsequent child frame number can be 2k, that is, can preset value be set as 1k;The determination of the preset value can basis Practical application it needs to be determined that, do not do specific number herein and limit.
In this application, the number of sub frames that can subsequently use same DM-RS patterns is determined by RV values, so that Same DM-RS patterns can be used in certain subframe, and then also avoid the frequent changes of DM-RS patterns.
The specific fields obtained with specific fields acquisition module 01 are NDI, and specific fields acquisition module 01 obtains field NDI, pattern determining module 02 determine use corresponding DM-RS patterns on UE according to the value of NDI,
Then, for subsequent child frame number determining module 03 by the value of field RV, the DM-RS patterns can subsequently be used by obtaining Number of sub frames;
The effect of RV is similar with being used in combination for MCS with application principle with RV herein, and purpose is also can be certain Subframe in use same DM-RS patterns, and then avoid the frequent changes of DM-RS patterns.
Further corresponding method embodiment, the embodiment of the present invention additionally provides a kind of user equipment 20, for realizing right The parsing of the DM-RS patterns instruction of eNB.As shown in Figure 10, which includes:
Receiver 2101 obtains the specific fields in Downlink Control Information DCI;The specific fields include and down channel The relevant field of quality, or, there is the field of redundant state;
Processor 2102, for being determined using the corresponding DM-RS patterns on UE according to the specific fields.
In this application, it in order to realize the purpose for reducing PDCCH expenses when eNB notices UE uses DM-RS patterns, utilizes Specific fields in existing DCI.
In practical applications, after eNB sends DCI to UE, DCI that receiver 2101 is received according to UE, so that it may to obtain Take specific fields therein.Due to further including the mapping relations for having specific fields and DM-RS patterns in user equipment, so, it deposits Reservoir 2103 can be determined according to the mapping relations using the corresponding DM-RS patterns on UE.
Specifically, in the application can be specifically MCS or NDI with the relevant field of down channel quality;Include superfluous The field of remaining state can be RV fields.
Further, in embodiments of the present invention, processor 2102, can also be specific for according to the MCS values With the mapping relations of DM-RS pattern densities, the density of the corresponding DM-RS patterns of the MCS is determined;Then, pass through the RV's The mapping relations of value and DM-RS patterns determine the corresponding DM-RS patterns of the RV.
Similar, in embodiments of the present invention, processor 2102 can also be specific for the value according to the NDI To determine the density of corresponding DM-RS patterns;Then, by the mapping relations of the value and DM-RS patterns of the RV, institute is determined State the corresponding DM-RS patterns of RV.
By upper it is known that implementing by reducing reference signal come during reducing pilot tone and control signaling expense, In this application, eNB institutes are inferred to by field related to down channel quality or including redundant state in DCI The DM-RS patterns of selection, without as in the prior art, needing to indicate DM- by additional increase newer field RS patterns, so the further expense for reducing pilot tone and control signaling.
Further, in embodiments of the present invention, processor 2102 can be also used for the value according to field RV, obtain follow-up The number of sub frames of the DM-RS patterns can be used;In this application, can subsequently be schemed using same DM-RS to determine by RV values The number of sub frames of sample so that can use same DM-RS patterns in certain subframe, and then also avoids DM-RS figures The frequent changes of sample.
It is apparent to those skilled in the art that for convenience and simplicity of description, only with above-mentioned each function The division progress of module, can be as needed and by above-mentioned function distribution by different function moulds for example, in practical application Block is completed, i.e., the internal structure of device is divided into different function modules, to complete all or part of work(described above Energy.The specific work process of the system, apparatus, and unit of foregoing description can refer to corresponding in preceding method embodiment Journey, details are not described herein.
In several embodiments provided herein, it should be understood that disclosed system, device and method can be with It realizes by another way.For example, the apparatus embodiments described above are merely exemplary, for example, the module or The division of unit, only a kind of division of logic function, formula that in actual implementation, there may be another division manner, such as multiple units Or component can be combined or can be integrated into another system, or some features can be ignored or not executed.Another point, institute Display or the mutual coupling, direct-coupling or communication connection discussed can be by some interfaces, device or unit INDIRECT COUPLING or communication connection can be electrical, machinery or other forms.
The unit illustrated as separating component may or may not be physically separated, aobvious as unit The component shown may or may not be physical unit, you can be located at a place, or may be distributed over multiple In network element.Some or all of unit therein can be selected according to the actual needs to realize the mesh of this embodiment scheme 's.
In addition, each functional unit in each embodiment of the application can be integrated in a processing unit, it can also It is that each unit physically exists alone, it can also be during two or more units be integrated in one unit.Above-mentioned integrated list The form that hardware had both may be used in member is realized, can also be realized in the form of SFU software functional unit.
If the integrated unit is realized in the form of SFU software functional unit and sells or use as independent product When, it can be stored in a computer read/write memory medium.Based on this understanding, the technical solution of the application is substantially The all or part of the part that contributes to existing technology or the technical solution can be in the form of software products in other words It embodies, which is stored in a storage medium, including some instructions are used so that a computer Equipment(Can be personal computer, server or the network equipment etc.)Or processor(processor)It is each to execute the application The all or part of step of embodiment the method.And storage medium above-mentioned includes:USB flash disk, mobile hard disk, read-only memory (ROM, Read-Only Memory), random access memory(RAM, Random Access Memory), magnetic disc or CD Etc. the various media that can store program code.
It is provided for the embodiments of the invention the method for user equipment switching above and including source network device, Yong Hushe Device including standby and target radio network control node is described in detail, but the explanation of above example is only intended to sides Assistant solves the method and its core concept of the present invention, should not be construed as limiting the invention.Those skilled in the art In the technical scope disclosed by the present invention, the change or replacement that can be readily occurred in, should all cover protection scope of the present invention it It is interior.

Claims (19)

1. a kind of demodulated reference signal DM-RS pattern indicating means, which is characterized in that including:
Obtain the specific fields in Downlink Control Information DCI;The specific fields include and the relevant field of down channel quality;
According to the down channel quality represented by the relevant field of down channel quality described in the specific fields, determines and use DM-RS patterns on UE.
2. according to the method described in claim 1, which is characterized in that the specific fields include:Modulation and Coding Scheme MCS or New data indicates NDI.
3. according to the method described in claim 2, which is characterized in that described according to institute when the specific fields include MCS The down channel quality represented by the relevant field of down channel quality described in specific fields is stated, is determined using on UE DM-RS patterns, including:
According to the mapping relations of the MCS values and DM-RS patterns, DM-RS patterns corresponding with the MCS are determined, under described Row channel quality is better, uses the MCS corresponding to the modulation system of more high-order and higher code check;The down channel quality is got over Difference uses the MCS corresponding to the modulation system of more low order and lower code check.
4. according to the method described in claim 2, which is characterized in that described according to institute when the specific fields include NDI The down channel quality represented by the relevant field of down channel quality described in specific fields is stated, is determined using on UE DM-RS patterns, including:
When the NDI indicates to retransmit, scheme for retransmitting DM-RS of the data using density not less than original DM-RS pattern densities Sample;
When the NDI indicates new biography, the DM-RS pattern smaller than original DM-RS pattern densities is used for new biography data.
5. according to the method in claim 2, which is characterized in that described according to down channel quality described in the specific fields Down channel quality represented by relevant field determines the DM-RS patterns used on UE, including:
According to the mapping relations of the MCS values and DM-RS pattern densities, the close of the corresponding DM-RS patterns of the MCS is determined Degree, the down channel quality is better, uses the MCS corresponding to the modulation system of more high-order and higher code check;The downlink Channel quality is poorer, uses the MCS corresponding to the modulation system of more low order and lower code check;
By the mapping relations of the value and DM-RS patterns of RV, in the DM-RS patterns of determined density, the RV phases are determined The DM-RS patterns answered.
6. according to the method in claim 2, which is characterized in that described according to down channel quality described in the specific fields Down channel quality represented by relevant field determines the DM-RS patterns used on UE, including:
According to the value of the NDI, the density of corresponding DM-RS patterns is determined, when the NDI indicates to retransmit, for retransmitting Data are not less than the DM-RS patterns of original DM-RS pattern densities using density;When the NDI indicates new biography, for new biography number According to using the DM-RS pattern smaller than original DM-RS pattern densities;
By the mapping relations of the value and DM-RS patterns of RV, in the DM-RS patterns of determined density, the RV phases are determined The DM-RS patterns answered.
7. according to the method in claim 3, which is characterized in that this method further includes:
The subsequent child frame number using same DM-RS patterns is determined according to the numerical value of RV.
8. according to the method in claim 4, which is characterized in that this method further includes:
The subsequent child frame number using same DM-RS patterns is determined according to the numerical value of RV.
9. the method according to claim 7 or 8, which is characterized in that
The subsequent child frame number is the numerical value of the RV, or, the product of the numerical value of the RV and preset value.
10. a kind of DM-RS patterns instruction device, which is characterized in that including:
Specific fields acquisition module, for obtaining the specific fields in Downlink Control Information DCI;The specific fields include under The relevant field of row channel quality;
Pattern determining module, for the downlink represented by the relevant field of down channel quality described in the specific fields Channel quality determines use corresponding DM-RS patterns on UE.
11. according to the device described in claim 10, which is characterized in that the specific fields include:Modulation and Coding Scheme MCS Or new data indicates NDI.
12. according to the device described in claim 11, which is characterized in that when the specific fields include MCS, the pattern Determining module is used for:
According to the mapping relations of the MCS values and DM-RS patterns, DM-RS patterns corresponding with the MCS are determined, under described Row channel quality is better, uses the MCS corresponding to the modulation system of more high-order and higher code check;The down channel quality is got over Difference uses the MCS corresponding to the modulation system of more low order and lower code check.
13. according to the device described in claim 11, which is characterized in that when the specific fields include NDI, the pattern Determining module is used for:
When the NDI indicates to retransmit, scheme for retransmitting DM-RS of the data using density not less than original DM-RS pattern densities Sample;
When the NDI indicates new biography, the DM-RS pattern smaller than original DM-RS pattern densities is used for new biography data.
14. according to the device in claim 11, which is characterized in that the pattern determining module includes:
Pattern density determination unit determines the MCS for the mapping relations according to the MCS values and DM-RS pattern densities The density of corresponding DM-RS patterns,
The down channel quality is better, uses the MCS corresponding to the modulation system of more high-order and higher code check;The downlink Channel quality is poorer, uses the MCS corresponding to the modulation system of more low order and lower code check;
Pattern identifies unit, for the mapping relations of value and DM-RS patterns by RV, schemes in the DM-RS of determined density In sample, the corresponding DM-RS patterns of the RV are determined.
15. according to the device in claim 11, which is characterized in that the pattern determining module includes:
Pattern density determination unit determines the density of corresponding DM-RS patterns, when described for the value according to the NDI When NDI instructions retransmit, for retransmitting DM-RS pattern of the data using density not less than original DM-RS pattern densities;When described When NDI indicates new biography, the DM-RS pattern smaller than original DM-RS pattern densities is used for new biography data;
Pattern identifies unit, for the mapping relations of value and DM-RS patterns by RV, schemes in the DM-RS of determined density In sample, the corresponding DM-RS patterns of the RV are determined.
16. according to the device in claim 12, which is characterized in that the device further includes subsequent child frame number determining module;
For determining the subsequent child frame number using same DM-RS patterns according to the numerical value of RV.
17. according to the device in claim 13, which is characterized in that the device further includes:Subsequent child frame number determining module;
For determining the subsequent child frame number using same DM-RS patterns according to the numerical value of RV.
18. the device according to claim 16 or 17, which is characterized in that
The numerical value or the numerical value of the RV and the product of preset value that the subsequent child frame number is the RV.
19. a kind of computer read/write memory medium, for storing program, described program when being executed, such as claim 1 to 9 Any one of described in method be implemented.
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