CN104276756B - A kind of alkali-free glass - Google Patents
A kind of alkali-free glass Download PDFInfo
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- CN104276756B CN104276756B CN201310528672.5A CN201310528672A CN104276756B CN 104276756 B CN104276756 B CN 104276756B CN 201310528672 A CN201310528672 A CN 201310528672A CN 104276756 B CN104276756 B CN 104276756B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/10—Doped silica-based glasses containing boron or halide containing boron
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Abstract
The invention discloses a kind of alkali-free glass, the molar content of each chemical composition is in described glass：SiO268.5 72%, Al2O312.6 15%, B2O31 3.7%, MgO 0.1 5.5%, CaO 4 7%, ZnO 0.05 4%, SrO 1 3.5%, SnO 0.05 0.1%.There is high chemical stability, high strain-point, high Young's modulus, low-expansion coefficient, low melting temperature, low liquidus temperature, ZnO, MgO in formula composition can significantly reduce high temperature viscosity, with relatively low fusion temperature.This material is widely portable to make the glass substrate of flat-panel screens, photovoltaic device or other photoelectric devices, glass substrate of TFT LCD, OEL of particularly suitable use low temperature polycrystalline silicon LTPS technology etc..
Description
Technical field
The invention belongs to field of glass production technology, be related to one kind be widely portable to make plane show, illuminate, photovoltaic
The formula of the glass substrate of device or other photoelectric devices, specifically a kind of alkaline earth aluminates glass of not alkali metal containing
Glass.
Background technology
With the fast development of photovoltaic industry, the demand to various display devices constantly increases, such as active matrix
The active matrix liquid crystal display LTPS of liquid crystal display AMLCD, Organic Light Emitting Diode OLED and application low-temperature polysilicon silicon technology
TFT-LCD devices, these display devices are all based on using thin film semiconductor material to produce thin film transistor (TFT) TFT technology.Main flow
Silicon substrate TFT can be divided into non-crystalline silicon (a-Si) TFT, polysilicon (p-Si) TFT and monocrystalline silicon（SCS）TFT, wherein non-crystalline silicon (a-Si)
TFT is the technology of present main flow TFT-LCD application, non-crystalline silicon (a-Si) TFT technology, and the treatment temperature in procedure for producing can be with
Completed at a temperature of 300-450 DEG C.LTPS polysilicons (p-Si) TFT needs at relatively high temperatures repeatedly place during processing procedure
Reason, substrate must can not deform in multiple high temp processing procedure, and this just proposes requirement higher to base plate glass performance,
Preferred strain point is higher than 650 DEG C, more preferably above 670 DEG C, 700 DEG C.Simultaneously glass substrate the coefficient of expansion need with
The expansion coefficient similar of silicon, reduces stress and destruction as far as possible, therefore the preferred thermal linear expansion coefficient of base plate glass is in 28-39
Between × 10-7/ DEG C.For the ease of production, production cost is reduced, should had as the glass of display base plate relatively low
Fusion temperature and liquidus temperature.
The glass substrate shown for plane is, it is necessary to pass through sputtering, chemical vapor deposition（CVD）Etc. technology in underlying substrate
Glass surface forms nesa coating, dielectric film, semiconductor（Polysilicon, amorphous silicon etc.）Film and metal film, then by light
Etching（Photo-etching）Technology forms various circuits and figure, if glass contains alkali metal oxide（Na2O, K2O,
Li2O）, alkali metal ion diffuses into deposited semiconductor material in heat treatment process, damages semiconductor film characteristic, therefore, glass
Glass should be free of alkali metal oxide, it is preferred that with SiO2、Al2O3、B2O3, alkaline earth oxide RO（RO=Mg、Ca、Sr）Deng
It is the alkaline earth aluminates glass of principal component.
The strain point of most of silicate glasses is with the increase of glass former content and the reduction of modifier content
Increase.But can cause high temperature melting and clarification difficult simultaneously, cause refractory corrosion to aggravate, increase energy consumption and production cost.
Therefore, improved by component so that low temperature viscosity will also ensure that high temperature viscosity is not in big lifting while increase, or even
Reduction is only the optimal breach for improving strain point.
In the process of glass substrate, base plate glass is horizontal positioned, and glass has certain journey under Gravitative Loads
That spends is sagging, and sagging degree is directly proportional to the density of glass and the elastic modelling quantity of glass is inversely proportional.With substrate manufacture towards
Large scale, the development in slimming direction, the sagging of glass plate must draw attention in manufacture.Therefore composition should be designed, makes substrate
Glass has alap density and elastic modelling quantity as high as possible.
With the popularization of smart mobile phone and panel computer, the epoch of intelligent mobile are opened.Conventional mobile phone is confined to lead to
Communication function, but the performance of the smart machine including smart mobile phone and panel computer is close with notebook at present so that allow people
Convenience by radio communication is not performing and is enjoying the commercial affairs and recreation of higher level all the time.It is such become
Under gesture, display performance requirement is also improved constantly, image quality especially to intelligent movable equipment, visuality out of doors
Can require also lifted, while the use burden in order to mitigate portable equipment, weight, thickness are thinning as can not keep away
The main trend exempted from.Under the guiding of this trend, the direction that display panel is showing to lightening, ultra high-definition is developed, face
Plate making technology manages temperature development to higher height；Simultaneously monolithic glass by PROCESS FOR TREATMENT, thickness reach 0.25mm, 0.2mm,
0.1mm is even more thin.Make the thinning mode of glass presently mainly chemical reduction, specifically, use hydrofluoric acid or hydrofluoric acid
Buffer solution corrodes to glass substrate, and its thinning principle is as follows：
Main chemical reactions：4HF+SiO2=SiF4+2H2O
Secondary chemical reaction：RO+2H+=R2++H2O（R represents alkaline-earth metal etc.）
Surface quality after chemical reduction technique and thinning glass substrate has certain relation with parent glass composition, existing
TFT-LCD base plate glass frequently occurs the bad deficient point such as " pit ", " sags and crests " during chemical reduction, increased and is produced into
This.Glass with chemical stability high has more preferable surface quality after thinning, therefore researches and develops high chemical stability
TFT-LCD base plate glass, it is possible to reduce the production cost such as second polishing, lifts product quality and yields, for large scale industry
Metaplasia is produced larger benefit.
With the development of lightening trend, in the more advanced lines glass substrate productions such as G5 generations, G6 generations, G7 generations, G8 generations, water
The glass substrate of placing flat due to deadweight produce it is sagging, be warped into important subject.For the glass substrate producer,
Will be by various links such as annealing, cutting, processing, inspection, cleanings after glass board material shaping, the sagging of sized rectangular glass substrate will
Influence the ability for loading, taking out and separating in the casing for transported between processing stand glass.It is similar for counter plate manufacturer
Problem is equally existed.Larger sag or warpage can cause fragment rate to improve and the alarm of CF making technologies, have a strong impact on product
Yield.If at two ends supporting substrate both sides, the maximum sag of chain of glass substrate（S）Can be expressed as follows：
K is constant, and ρ is density, and E is elastic modelling quantity, and l is spaced for support, and t is thickness of glass substrate.Wherein, (ρ/E) is
Than the inverse of modulus.Than the ratio that modulus refers to elasticity modulus of materials and density, also known as " than elastic modelling quantity " or " specific stiffness ",
It is structure design to one of important requirement of material.Material weight is lighter under explanation same stiffness higher than modulus, or phase homogeneity
The lower rigidity of amount is bigger.From above formula, when the timing of l, t mono-, ρ diminishes after E is increased can reduce sag of chain, therefore should make substrate
The as far as possible low density of glass tool and elastic modelling quantity as far as possible high, i.e., with as far as possible big ratio modulus.Glass after thinning is due to thickness
That spends strongly reducing and mechanical strength reduction occurs, it is easier to deform.Density, increase are reduced than modulus and intensity, glass is reduced
Fragility turns into the factor that glass production person needs emphasis to consider.
In order to obtain still alkali-free glass, using fining gases, produced when expelling glass reaction from glass melts
Gas, in addition when fusing is homogenized, it is necessary to reuse the fining gases of generation, increase alveolar layer footpath makes it float, and thus takes
Go out the small bubble of participation.
But, the viscosity of the glass melts as glass substrate for plane display device is high, need to be with higher temperature melting.
In this kind of glass substrate, generally cause Vitrification in 1300-1500 degree, more than 1500 degree at a high temperature of deaeration,
Matter.Therefore, in fining agent, widely using can be in temperature range wide（1300-1700 degree scopes）Produce fining gases
As2O3。
But, As2O3Toxicity it is very strong, glass manufacturing process or cullet treatment when, it is possible to pollute environment
With the problem for bringing health, it is using being restricted.
Once trial is clarified with antimony clarification come substitute for arsenic.However, in terms of antimony there is a problem of causing environment and health in itself.Though
Right Sb2O3Toxicity unlike As2O3It is high like that, but Sb2O3It is still poisonous.And compared with arsenic, antimony produces fining gases
Temperature it is relatively low, the validity for removing this kind of glass blister is relatively low.
The content of the invention
It is an object of the invention to provide a kind of group of the more perfect flat-panel screens glass substrate of environmentally friendly, performance
Set up meter separately, there is provided even if a kind of fining agent does not use As2O3And/or Sb2O3, also in the absence of the glass substrate as surface defect
Formula, devise alkali-free glass, meet environmental requirement using glass substrate obtained in the formula, without As2O3、Sb2O3And its
Compound, while the glass is free of heavy metal barium and its compound, with chemical stability higher, with strain higher
Point, with Young's modulus higher, with transmitance higher, with relatively low fusion temperature, with relatively low liquidus curve temperature
Degree, with relatively low density, meets FPD industry development trend.It is suitable for various shaping sides such as fusion glass tube down-drawing, float glass process
Formula is manufactured.
The technical solution adopted by the present invention is：A kind of alkali-free glass, the Mole percent of each chemical composition in described glass
Content is：
SiO268.5-72%,
Al2O312.6-15%,
B2O31-3.7%,
MgO 0.1-5.5%,
CaO 4-7%,
ZnO 0.05-4%,
SrO 1-3.5%,
SnO 0.05-0.1%。
The beneficial effects of the invention are as follows：1）, the present invention there is environment friendly, without any poisonous and harmful substance, clarification
Agent is readily available material using stannous oxide SnO, SnO, and known without detrimental nature, and it is used alone as glass clarifying
During agent, there is the temperature range of generation fining gases higher, be adapted to the elimination of this kind of glass blister；2）, by controlling SiO2+
Al2O3>83%、SrO/R’O<0.25、(MgO+ZnO)/R’O>0.35、0.8<R’O/Al2O3<1.2, glass can be made and meanwhile have compared with
The good characteristic such as chemical stability high, strain point, Young's modulus and relatively low fusion temperature, liquidus temperature；3）, by means of
The glass substrate of the glass ingredient formula production that the present invention is provided can reach following technical indicator after testing：10%HF acid is molten
Liquid（22℃/20min）Erosion amount<4.8mg/cm2；It is 28~34 × 10 in 50~350 degree of thermal coefficient of expansions-7/℃；Strain point
More than 700 DEG C；Density is less than 2.5g/cm3, less than 1150 DEG C, bubble diameter is in ＞ in per kilogram glass substrate for liquidus temperature
Bubbles number in 0.1mm is invisible；4）, SiO higher due to containing in instant component2With Al2O3Resultant, it is ensured that
Resistance to chemical corrosion is excellent, while a certain proportion of MgO+ZnO that arranges in pairs or groups can effectively reduce fusion temperature, producing line yield is carried
Rise and bring larger space, while the production cost such as fuel, electric power is minimized.
Specific embodiment
A kind of alkali-free glass, the molar content of each chemical composition is in described glass：
SiO268.5-72%,
Al2O312.6-15%,
B2O31-3.7%,
MgO 0.1-5.5%,
CaO 4-7%,
ZnO 0.05-4%,
SrO 1-3.5%,
SnO 0.05-0.1%。
Preferably, SiO2With Al2O3Molar content sum be more than 83%.
Preferably, SrO/（MgO+CaO+ZnO+SrO）<0.25.
Preferably, (MgO+ZnO)/（MgO+CaO+ZnO+SrO）>0.35.
Preferably, 0.8<（MgO+CaO+ZnO+SrO）/Al2O3<1.2。
Preferably, Al2O3Molar content be 13-14.5%.
Preferably, the molar content of ZnO is 0.5-3%.
Preferably, B2O3Molar content be 1.5-3.5%.
Preferably, SiO2Molar content be 69-71%.
Preferably, the molar content of SrO is 1.5-3.0%.
When implementing, the raw material that will first include above-mentioned each glass substrate correspondence oxide molar percent composition is uniformly stirred
After mixing mixing, then by mixed material melt-processed, stir discharge bubble with platinum rod and be homogenized glass metal, then by its temperature
Glass substrate forming temperature range required for being reduced to shaping, by annealing theory, produces the glass of flat-panel screens needs
The thickness of glass substrate, then to be molded glass substrate carry out simple cold work, finally to the basic physics of glass substrate
Characteristic carries out test turns into qualified products.
In the present invention, SiO2Molar content be 68.5~72%.SiO2It is glass former, it is unfavorable if content is too low
In the corrosive enhancing of endurance, the coefficient of expansion can be made too high, the easy devitrification of glass；Improve SiO2Content contributes to glass light weight
Change, thermal coefficient of expansion reduces, strain point increases, and chemical resistance increases, but high temperature viscosity is raised, and is so unfavorable for melting, typically
Kiln be difficult to meet, so SiO2Content be 68.5~72%, SiO2Preferred molar content be 69-71%.
Al2O3Molar content be 12.6~15%, be used to improve the intensity of glass structure, if content be less than 12.6%, glass
Easy devitrification, is also easily corroded by extraneous aqueous vapor and chemical reagent.The A1 of high content2O3Contribute to strain point of glass, bending resistance
Intensity increases, but crystallization easily occurs in too high glass, while can cause that glass is difficult to melt, therefore A12O3Content be
12.6~15%, A12O3Preferred molar content be 13-14.5%.
B2O3Content be 1~3.7mol%, B2O3Effect it is more special, it can be individually created glass, be also it is a kind of very
Good flux, B under the conditions of high temperature melting2O3It is difficult to form [BO4], it is possible to decrease high temperature viscosity, B has and captures free oxygen during low temperature
Form [BO4] trend, structure is tended to tight, improve glass low temperature viscosity, prevent the generation of crystallization.But it is excessive
B2O3Strain point of glass can be greatly reduced, therefore B2O3Content be 1~3.7%, B2O3Preferred molar content be
1.5-3.5%。
MgO makes glass be easy to the spy of fusing with glass Young's modulus is substantially improved and than modulus, high temperature viscosity is reduced
Point.When alkaline-earth metal resultant is less in alkali-free silicate glass, the larger network-modifying ion Mg of electric-field intensity is introduced2+, hold
Local accumulation effect is easily produced in the structure, increases nearest neighbour distance.More Al is introduced in this case2O3、B2O3
Deng oxide, with [AlO4]、[BO4] in the presence of state, because these polyhedrons carry negative electricity, attracted the outer sun of subnetwork from
Son, declines the accumulation degree of glass, crystallization ability；When alkaline-earth metal resultant is more, network fracture than in the case of more serious,
MgO is introduced, the silicon-oxy tetrahedron of fracture can be made to reconnect and decline devitrification of glass ability.Therefore to be noted when MgO is added
Meaning and Al2O3、B2O3Mixing ratio.Relative to other alkaline earth oxides, the presence of MgO can bring relatively low expansion system
Number and density, chemically-resistant higher, strain point and elastic modelling quantity.If MgO is more than 5.5mol%, glass endurance can be deteriorated, together
When the easy devitrification of glass.Too low content of MgO contrast modulus improves unfavorable.Therefore its content is 0.1-5.5mol%.
The molar content of CaO is 4~7%, and calcium oxide is used to promote the melting of glass and adjustment glass mouldability.If oxygen
Change calcium content and be less than 4%, will be unable to reduce the viscosity of glass, content is excessive, and glass would tend to occur crystallization, thermal coefficient of expansion
The big amplitude variation of meeting is big, unfavorable to successive process.So the content of CaO is 4~7%.
The molar content of SrO is 1~3.5%, and strontium oxide strontia is as flux and prevents glass from crystallization occur, if content mistake
Many, glass density can be too high, causes the mole overweight of product.So the content of SrO is defined as 1~3.5%.
The molar content of ZnO be 0.05-4%, bivalent metal oxide according to it in the periodic table of elements status with to property
Influence is different, can be divided into two classes：One class is the alkaline earth oxide for being located at main group, its ion R2+With 8 exoelectron knots
Structure；Equations of The Second Kind is located at periodic table subgroup（Such as ZnO, CdO）, its ion R2+With 18 outer electronic structures, in glass two
The configuration state of person from glass property influence be different.ZnO can reduce glass high temperature viscosity（Such as 1500 degree）, be conducive to
Eliminate bubble；The chemical resistance for have lifting intensity, hardness below softening point simultaneously, increasing glass, reduces glass thermal expansion system
Several effects.In alkali-free glass system, adding appropriate ZnO helps to suppress crystallization, can reduce recrystallization temperature.In theory
On, ZnO is general with [ZnO under high temperature after introducing glass as network outer body in alkali-free glass4] form exist, compared with
[ZnO6] glass structure is more loose, is under the identical condition of high temperature with the glass without ZnO and compared, the glass containing ZnO glues
Degree is smaller, and atomic motion speed is bigger, it is impossible to forms nucleus, it is necessary to further reduce temperature, is just conducive to the formation of nucleus, because
And, reduce the crystallization ceiling temperature of glass.ZnO content excessively can be greatly lowered the strain point of glass.So ZnO's contains
Amount is defined as 0.05-4 moles of %, it is highly preferred that the molar content of ZnO is 0.5-3%.
0.05~0.1% stannous oxide SnO can also be added with the present invention, in glass composition, when being melted as glass
Fining agent or defrother, to improve the melting mole of glass.If content is excessive, glass substrate devitrification can be caused, so its
Addition is no more than 0.1mol%.
The specific embodiment that each component is measured with Mole percent in being formulated is given below, referring to table 1,2：
Table 1
Table 2
By table 1, table 2 as can be seen that inventive formulation is prepared that alkali-free glass meets environmental requirement, with chemically stable high
The advantages of property, high strain-point, high Young's modulus, low-expansion coefficient, low melting temperature, low liquidus temperature.
Claims (9)
1. a kind of alkali-free glass, it is characterised in that：The molar content of each chemical composition is in described glass：
SiO268.5-72%,
Al2O312.6-15%,
B2O31-3.7%,
MgO 3.21-5.5%,
CaO 4-6.77%,
ZnO 0.05-4%,
SrO 1-3.5%,
SnO 0.05-0.1%,
0.8<（MgO+CaO+ZnO+SrO）/Al2O3<1.2, strain point temperature is molten in 22 DEG C of 10%HF acid more than or equal to 704 DEG C
20min erosion amounts≤4.45mg/cm is impregnated in liquid2。
2. a kind of alkali-free glass according to claim 1, it is characterised in that：SiO2With Al2O3Molar content sum
More than 83%.
3. a kind of alkali-free glass according to claim 1, it is characterised in that：SrO /（MgO+CaO+ZnO+SrO）<0.25.
4. a kind of alkali-free glass according to claim 1, it is characterised in that：(MgO+ZnO)/ （MgO+CaO+ZnO+SrO）
>0.35。
5. a kind of alkali-free glass according to claim 1, it is characterised in that：Al2O3Molar content be 13-
14.5%。
6. a kind of alkali-free glass according to claim 1, it is characterised in that：The molar content of ZnO is 0.5-3%.
7. a kind of alkali-free glass according to claim 1, it is characterised in that：B2O3Molar content be 1.5-3.5%.
8. a kind of alkali-free glass according to claim 1, it is characterised in that：SiO2Molar content be 69-71%.
9. a kind of alkali-free glass according to claim 1, it is characterised in that：The molar content of SrO is 1.5-3.0%.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2018025727A1 (en) * | 2016-08-05 | 2018-02-08 | 旭硝子株式会社 | Alkali-free glass substrate, laminated substrate, and glass substrate production method |
| JP2022539144A (en) * | 2019-06-26 | 2022-09-07 | コーニング インコーポレイテッド | Alkali-free glass that is less susceptible to heat history |
| CN110746111A (en) * | 2019-09-29 | 2020-02-04 | 彩虹显示器件股份有限公司 | Glass substrate and application thereof as glass substrate |
| CN110818251A (en) * | 2019-11-19 | 2020-02-21 | 蚌埠中光电科技有限公司 | Glass composition and preparation method of glass |
| CN117105526B (en) * | 2023-08-28 | 2024-03-19 | 北京工业大学 | High-stability long-service-life substrate glass for liquid crystal display |
| CN117209139A (en) * | 2023-09-19 | 2023-12-12 | 北京工业大学 | Preparation method of alkali-free low-boron high-aluminum substrate glass batch |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1303829A (en) * | 2000-01-12 | 2001-07-18 | 肖特玻璃制造厂 | Silicate glass containing boron and aluminium without alkali and its use |
| CN101568495A (en) * | 2007-06-08 | 2009-10-28 | 日本电气硝子株式会社 | Alkali-free glass and alkali-free glass substrate |
| CN102584008A (en) * | 2011-12-20 | 2012-07-18 | 东旭集团有限公司 | Formula for light environment-friendly alkali-free boron-alumina silicate glass used in liquid crystal display (LCD) |
| CN103347830A (en) * | 2011-01-25 | 2013-10-09 | 康宁股份有限公司 | Glass compositions having high thermal and chemical stability |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6508083B1 (en) * | 1996-08-21 | 2003-01-21 | Nippon Electric Glass Co., Ltd. | Alkali-free glass and method for producing the same |
| CN104220388B (en) * | 2012-04-10 | 2017-05-03 | 旭硝子株式会社 | Glass plate |
-
2013
- 2013-10-31 CN CN201310528672.5A patent/CN104276756B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1303829A (en) * | 2000-01-12 | 2001-07-18 | 肖特玻璃制造厂 | Silicate glass containing boron and aluminium without alkali and its use |
| CN101568495A (en) * | 2007-06-08 | 2009-10-28 | 日本电气硝子株式会社 | Alkali-free glass and alkali-free glass substrate |
| CN103347830A (en) * | 2011-01-25 | 2013-10-09 | 康宁股份有限公司 | Glass compositions having high thermal and chemical stability |
| CN102584008A (en) * | 2011-12-20 | 2012-07-18 | 东旭集团有限公司 | Formula for light environment-friendly alkali-free boron-alumina silicate glass used in liquid crystal display (LCD) |
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