CN104233200A - Method for preparing polarization eliminating beam splitting film - Google Patents
Method for preparing polarization eliminating beam splitting film Download PDFInfo
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- CN104233200A CN104233200A CN201310247081.0A CN201310247081A CN104233200A CN 104233200 A CN104233200 A CN 104233200A CN 201310247081 A CN201310247081 A CN 201310247081A CN 104233200 A CN104233200 A CN 104233200A
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- evaporation
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Abstract
The invention discloses a method for preparing a polarization eliminating beam splitting film. The method comprises the following steps: preheating a filming diffusion pump, adding zinc sulfide into an electronic gun crucible, adding silver into a thermal evaporation crucible or a thermal evaporation boat, putting a cleaned optical element substrate into a vacuum chamber, sucking till being rough vacuum, sucking to be high vacuum, subsequently filling argon to bombard the optical element substrate so as to remove organic substances to improve the surface activity, performing zinc sulfide vacuum evaporation on the bombarded optical element substrate by using an electronic gun with Kaufmann ion assistance, performing heat evaporation on the optical element substrate subjected to vacuum evaporation with the electronic gun for vacuum evaporation of silver under the assistance of an ion source, performing zinc sulfide vacuum evaporation on the optical element substrate subjected to thermal evaporation with the electronic gun with Kaufmann ion assistance, subsequently aerating, and taking out the optical element substrate. According to the method, a Kaufmann ion source is adopted to bombard the surface of the optical element, the surface adhesion of zinc sulfide and the substrate is improved, a Kaufmann technology is adopted to fill an Ar gas to assist zinc sulfide evaporation, and thus the zinc sulfide is very high in adhesion and film hardness.
Description
Technical field
The present invention relates to spectro-film preparing technical field, refer to a kind of preparation method of depolarization spectro-film especially.
Background technology
Optical coating device has been widely used in the every field such as optics, electronics, information, communication, military affairs, biology, medical science, environmental protection, material, plays very important effect.Flourish particularly due to optical communication industry, almost each optical communication device be unable to do without optical coating, and the function requiring optical coating to realize is more and more.Depolarization spectro-film is widely used in the various optical systems such as microscope.Be light splitting with pure metal film in the past, because the absorption of metal is excessive, optical energy loss too many, weak effect.And do very difficult polarization effect of eliminating by the method for prefect dielectric, spectro-film requires that the ratio of light splitting is very accurate, otherwise light path both sides have light and shade difference and aberration, and this just requires that the deielectric-coating specific refractory power selected will be stablized very much, otherwise precision is difficult to control, and yield rate can be very low.Require that selected abrasive material has enough large specific refractory power, zinc sulphide is a good selection simultaneously, but zinc sulphide is mantle is difficult to the firmness ensureing rete.
Summary of the invention
The present invention proposes a kind of preparation method of depolarization spectro-film, solves that optical energy loss in prior art is too many, the problem of weak effect.
Technical scheme of the present invention is achieved in that
A preparation method for depolarization spectro-film, comprising:
The preheating of plated film diffusion pump;
Add zinc sulphide in electron beam gun crucible, in thermal evaporation crucible or thermal evaporation boat, add silver;
Optical element substrate after clean is put into vacuum chamber, takes out rough vacuum≤5Pa, pumping high vacuum≤2 × 10
-3pa; Applying argon gas bombards described optical element substrate organics removal afterwards increases surfactivity;
Above-mentioned described optical element substrate after bombardment processing is opened electron beam gun evaporation zinc sulphide, and Kaufman ion is assisted;
Above-mentioned described optical element substrate after electron beam gun evaporation is opened thermal evaporation evaporation silver, ion source is assisted;
Above-mentioned described optical element substrate after thermal evaporation evaporation is opened electron beam gun evaporation zinc sulphide, and Kaufman ion is assisted; Inflate pickup afterwards and get final product.
As preferred technical scheme, described in take out rough vacuum be 3-5Pa.
As preferred technical scheme, described pumping high vacuum is 1-2 × 10
-3pa.
As preferred technical scheme, described bombardment adopts ion source line to be 60-80mA, voltage > 500V.
As preferred technical scheme, described bombarding voltage is 500-600V.
As preferred technical scheme, by brilliant control thin and thick instrument controlling coating film thickness when described evaporation zinc sulphide or thermal evaporation evaporation silver.
As preferred technical scheme, described thermal evaporation evaporation silver is set as 6A/s.
Beneficial effect
(1) preparation method of the present invention is simple, and cost is low, is suitable for suitability for industrialized production;
(2) the depolarization spectro-film that the present invention obtains reduces light loss in a large number, has good depolarization effect simultaneously, can in widespread use light path system;
(3) the present invention's Kaufman ion source bombards optical element surface, adds zinc sulphide and substrate surface sticking power;
(4) the present invention's Kaufman fills Ar gas and carrys out assisted evaporative zinc sulphide, makes zinc sulphide have very strong sticking power and film hardness;
(5) preparation method of the present invention accurately controls the thickness of silver and repeated and homogeneity.
Accompanying drawing explanation
In order to be illustrated more clearly in embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only embodiments more of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the process flow sheet of the embodiment of the present invention 1.
Embodiment
Be clearly and completely described to the technical scheme in the embodiment of the present invention below, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment 1
A preparation method for depolarization spectro-film, the equipment that this preparation uses is commercially available vacuum plating unit, comprising:
S1: preheating plated film diffusion pump; For vacuumizing;
S2: add zinc sulphide in electron beam gun crucible, adds silver in thermal evaporation crucible;
S3: clean optical element substrate, puts into coating clamp afterwards, then puts into vacuum chamber, take out rough vacuum 5Pa, pumping high vacuum 2 × 10
-3pa; The optical element of applying argon gas bombardment afterwards substrate organics removal increases surfactivity;
S4: the optical element substrate of S3 after bombardment processing is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein ion source line 60mA, voltage 500V.Crystalline substance control thin and thick instrument in equipment accurately can control the thickness of plated film;
S5: the optical element substrate of S4 after electron beam gun evaporation is opened thermal evaporation evaporation silver, ion source is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein setting silver is 6A/s;
S6: the optical element substrate of S5 after thermal evaporation evaporation is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Inflate pickup afterwards and get final product.
Embodiment 2
A preparation method for depolarization spectro-film, the equipment that this preparation uses is commercially available vacuum plating unit, comprising:
S1: preheating plated film diffusion pump; For vacuumizing;
S2: add zinc sulphide in electron beam gun crucible, adds silver in thermal evaporation crucible;
S3: clean optical element substrate, puts into coating clamp afterwards, then puts into vacuum chamber, take out rough vacuum 3Pa, pumping high vacuum 2 × 10
-3pa; The optical element of applying argon gas bombardment afterwards substrate organics removal increases surfactivity;
S4: the optical element substrate of S3 after bombardment processing is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein ion source line 80mA, voltage 600V.Crystalline substance control thin and thick instrument in equipment accurately can control the thickness of plated film;
S5: the optical element substrate of S4 after electron beam gun evaporation is opened thermal evaporation evaporation silver, ion source is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein setting silver is 6A/s;
S6: the optical element substrate of S5 after thermal evaporation evaporation is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Inflate pickup afterwards and get final product.
Embodiment 3
A preparation method for depolarization spectro-film, the equipment that this preparation uses is commercially available vacuum plating unit, comprising:
S1: preheating plated film diffusion pump; For vacuumizing;
S2: add zinc sulphide in electron beam gun crucible, adds silver in thermal evaporation crucible;
S3: clean optical element substrate, puts into coating clamp afterwards, then puts into vacuum chamber, take out rough vacuum 4Pa, pumping high vacuum 1 × 10
-3pa; The optical element of applying argon gas bombardment afterwards substrate organics removal increases surfactivity;
S4: the optical element substrate of S3 after bombardment processing is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein ion source line 70mA, voltage 500V.Crystalline substance control thin and thick instrument in equipment accurately can control the thickness of plated film;
S5: the optical element substrate of S4 after electron beam gun evaporation is opened thermal evaporation evaporation silver, ion source is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Wherein setting silver is 6A/s;
S6: the optical element substrate of S5 after thermal evaporation evaporation is opened electron beam gun evaporation zinc sulphide, Kaufman ion is assisted, now by brilliant control thin and thick instrument controlling coating film thickness; Inflate pickup afterwards and get final product.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (7)
1. a preparation method for depolarization spectro-film, comprising:
The preheating of plated film diffusion pump;
Add zinc sulphide in electron beam gun crucible, in thermal evaporation crucible or thermal evaporation boat, add silver;
Optical element substrate after clean is put into vacuum chamber, takes out rough vacuum≤5Pa, pumping high vacuum≤2 × 10
-3pa; Applying argon gas bombards described optical element substrate organics removal afterwards increases surfactivity;
Above-mentioned described optical element substrate after bombardment processing is opened electron beam gun evaporation zinc sulphide, and Kaufman ion is assisted;
Above-mentioned described optical element substrate after electron beam gun evaporation is opened thermal evaporation evaporation silver, ion source is assisted;
Above-mentioned described optical element substrate after thermal evaporation evaporation is opened electron beam gun evaporation zinc sulphide, and Kaufman ion is assisted; Inflate pickup afterwards and get final product.
2. the preparation method of a kind of depolarization spectro-film according to claim 1, is characterized in that, described in take out rough vacuum be 3-5Pa.
3. the preparation method of a kind of depolarization spectro-film according to claim 1, is characterized in that, described pumping high vacuum is 1-2 × 10
-3pa.
4. the preparation method of a kind of depolarization spectro-film according to claim 1, is characterized in that, described bombardment adopts ion source line to be 60-80mA, voltage > 500V.
5. the preparation method of a kind of depolarization spectro-film according to claim 4, is characterized in that, described bombarding voltage is 500-600V.
6. the preparation method of a kind of depolarization spectro-film according to claim 1, is characterized in that, by brilliant control thin and thick instrument controlling coating film thickness when described evaporation zinc sulphide or thermal evaporation evaporation silver.
7. the preparation method of a kind of depolarization spectro-film according to the arbitrary claim of claim 1-6, is characterized in that, described thermal evaporation evaporation silver is set as 6A/s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310247081.0A CN104233200B (en) | 2013-06-19 | 2013-06-19 | The preparation method of depolarization spectro-film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310247081.0A CN104233200B (en) | 2013-06-19 | 2013-06-19 | The preparation method of depolarization spectro-film |
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| CN104233200A true CN104233200A (en) | 2014-12-24 |
| CN104233200B CN104233200B (en) | 2016-07-06 |
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| CN201310247081.0A Active CN104233200B (en) | 2013-06-19 | 2013-06-19 | The preparation method of depolarization spectro-film |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114180857A (en) * | 2021-12-16 | 2022-03-15 | 长春博信光电子有限公司 | Silver film preparation method and substrate with silver film |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102762762A (en) * | 2010-02-22 | 2012-10-31 | 株式会社爱发科 | Vacuum processing device |
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2013
- 2013-06-19 CN CN201310247081.0A patent/CN104233200B/en active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102762762A (en) * | 2010-02-22 | 2012-10-31 | 株式会社爱发科 | Vacuum processing device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114180857A (en) * | 2021-12-16 | 2022-03-15 | 长春博信光电子有限公司 | Silver film preparation method and substrate with silver film |
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| CN104233200B (en) | 2016-07-06 |
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