CN104213146A - Composition for surface cleaning of platinum-osmium alloy - Google Patents

Composition for surface cleaning of platinum-osmium alloy Download PDF

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Publication number
CN104213146A
CN104213146A CN201410493834.0A CN201410493834A CN104213146A CN 104213146 A CN104213146 A CN 104213146A CN 201410493834 A CN201410493834 A CN 201410493834A CN 104213146 A CN104213146 A CN 104213146A
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parts
composition
surface cleaning
platinum
osmium alloy
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CN201410493834.0A
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Chinese (zh)
Inventor
陈凌
王琰
任琪
程晓
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KPS Wuxi Machinery Technology Co Ltd
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KPS Wuxi Machinery Technology Co Ltd
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Priority to CN201410493834.0A priority Critical patent/CN104213146A/en
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  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

A composition for surface cleaning of a platinum-osmium alloy comprises the following ingredients by weight: 10-30 parts of dihydroxymethyl benzoic acid, 30-50 parts of diethylene glycol dimethyl ether, 5-10 parts of N-methyl pyrrolidone, 50-70 parts of aluminum silicate, 20-30 parts of sodium dodecyl sulfonate, 30-40 parts of 2-ethyl hexanol, 20-30 parts of dimethyl imidazole, 5-10 parts of a surface active agent and 100-200 parts of ionic liquid. Compared with the conventional cleaning agent, the composition for surface cleaning of the platinum-osmium alloy, provided by the invention, has a good cleaning effect on grease, ensures that the residual quantity of a solvent is lower than the conventional technical standard, doesn't produce poisonous and volatile ingredients, and cannot react with metal.

Description

For the composition of platinum osmium alloy surface cleaning
  
Technical field
The invention belongs to metallic substance cleaning technique field, particularly a kind of composition for platinum osmium alloy surface cleaning.
  
Background technology
Conventional matting medicament can have different sorting techniques.For example can be divided into inorganic chemistry clean-out system and organic chemistry clean-out system by its chemical constitution; May there is different effects to different dirts by the clean-out system wherein having, or same dirt is had to two or more effect, should sort out by its Main Function in the ordinary course of things.Clean-out system classification is many times all classified according to material: aluminum component clean-out system, steel clean-out system, copper material clean-out system, plastic cleaning agent.Water and non-aqueous solvent: the solvent of dirt refers to that those can strip down the dirt of cleaning object with the form of dissolving or disperse, and the material that does not have novel substance stable, that chemical constitution is definite to generate.It comprises water and non-aqueous solvent.Water is that nature exists, and is also most important solvent.In industry cleaning link, water is the solvent of most chemicals, is again the solvent of many dirts.In cleaning, every occasion of can water removing dirt, just without non-aqueous solvent and various additive.Non-aqueous solvent comprises that hydrocarbon and halon, alcohol, ether, ketone, ester, phenol etc. and composition thereof are mainly used in dissolving organic dirt in it, as grease and some organic compound dirt; Tensio-active agent: simultaneously there is hydrophilic polar group and the non-polar group of oleophylic in its molecule, in the time that its add-on is little, can greatly reduce surface tension and the liquid/liquid interface tension force of solvent (being generally water), and there is the effects such as lubricated, solubilising, emulsification, dispersion and washing.Tensio-active agent has multiple sorting technique.The generally ionic type of the ionized state in solvent and the hydrophilic radical classification according to it.The most frequently used have anion surfactant, cats product, amphoterics and a nonionogenic tenside etc.First three class is ionogenic surfactant.Tensio-active agent, in family life and industrial cleaning, has been widely used.Acid-alkali clean-out system: by means of with dirt generation acid-base reaction (sometimes also with reactions such as oxidation-reductions), make dirt change solubilized into or be scattered in the clean-out system of scavenging solution, after being mostly mineral acid, alkali and hydrolysis, be acid or alkaline salt, sometimes also use organic acid.Most of acid-alkaline cleaners are all added by the aqueous solution of acid, alkali that necessary auxiliary agent forms.Another kind of under hot conditions with acid or the alkali of molten state and dirt digestion, make originally not dissolve or be difficultly dissolved in the dirt in cleaning medium, be converted into diffluent compound, this class acid is commonly referred to melting agent with alkali.This clean-out system for be difficult to solvent or solution remove dirt time, have good effect.Oxidation-reduction agent: main by the preparation taking out stains with dirt generation redox reaction, be and clean with oxygenant or reductive agent, comprise melting agent.Oxygenant is in order to remove the dirt that has reductibility, as many organic dirts.Reductive agent is for removing the dirt of oxidisability, as rust deposite.Metal ion chelation agent: by with dirt in metal ion generation complex reaction, dirt is changed be soluble in into the inner complex of clean-out system, this clean-out system or auxiliary agent are sequestrant.It is commonly used in the cleaning of rust deposite and inorganic salt crust.Sorbent material: the material taking out stains by the physical adsorption to dirt or chemisorption is the sorbent material that cleans use.Should select has the sorbent material of very strong avidity for cleaning to dirt.Sterilization algae removal and mud stripper: can kill the bacterium algae of surface to be cleaned, peel off the chemical agent of microorganism mud, be sterilization algae removal and mud stripper.It has a mineral-type with organic, mineral-type be again strong oxidizer conventionally.Zymin: zymin, by animal, plant and microorganisms, has the protein of catalytic capability.In the cleaning of dirt, can there is corresponding biochemical reaction with organic dirt in it, promotes the decomposition of dirt and come off.For example proteolytic enzyme, lipase, amylase, cellulase etc. are added in scavenging solution, can accelerate the removing of corresponding dirt.The molecular formula HOOCCH2COOH of oxyacetic acid clean-out system, its molecular formula 76.05.Oxyacetic acid is soluble in water, methyl alcohol, acetic acid and ethyl acetate, but is dissolved in hardly hydrocarbon cosolvent, 78 ~ 79 DEG C of fusing points, and boiling point decomposes.Oxyacetic acid has that corrodibility is low, nonflammable, odorless, toxicity is low, Biodegradable is strong, good water solubility, the feature such as non-volatile, therefore easy to use, of many uses.Oxyacetic acid has good dissolving power to the dirty thing of alkaline-earth metal class, comparatively violent with the compound effects such as calcium, magnesium.Calcium Glycolate, the magnesium salts solubleness in water is larger.So oxyacetic acid is applicable to clean calcium, magnesium salts dirt.In process of the test, find, if rust deposite accounting anharmonic ratio is larger, simple oxyacetic acid solute effect is not remarkable, use 2%(massfraction instead) oxyacetic acid+1%(massfraction) mixing acid of formic acid, its cleaning performance is good, and formic acid has strong and stimulating, in application, is restricted.Oxyacetic acid with the comparison of EDTA boiler rinsing scale removal ability: oxyacetic acid+1% formic acid solution of every 1000mL 2% can be removed the ferric oxide dirt of 13.4g, 1000mL12%EDTA divalence sodium salt can be removed the dirt of 6.23g, the ammonium salt solution of 1000 mL3% and 6%EDTA, can remove respectively the dirt of 3.0g and 6.0g.Platinum osmium alloy is the binary alloy of platinum base containing osmium.Osmium has the alloy rigidity of raising and specific resistance effect; In oxidizing atmosphere, heat, starve and generate poisonous volatile matter OsO 4.With high frequency furnace argon shield melting, cold rolling becoming a useful person after hot rolling, the very difficult processing of alloy that is greater than 10% containing osmium.PtOs 7alloy can be made contact material.Ternary or more complicated alloy can be made sparking-plug electrode, anti-corrosion and wear-resisting nib and phonograph pin.
  
Summary of the invention
the technical problem solving:the invention provides a kind of composition for platinum osmium alloy surface cleaning, the cleaning performance of comparing existing clean-out system is good, and can not produce poisonous volatile component, does not also produce chemical reaction with metal itself.
technical scheme:for the composition of platinum osmium alloy surface cleaning, consist of the following composition by weight: dihydroxymethyl phenylformic acid 10-30 part, diethylene glycol dimethyl ether 30-50 part, N-Methyl pyrrolidone 5-10 part, pure aluminium silicate 50-70 part, sodium laurylsulfonate 20-30 part, 2-ethylhexanol 30-40 part, methylimidazole 20-30 part, 5 ~ 10 parts, tensio-active agent, ionic liquid 100-200 part.
Preferably, described tensio-active agent is cats product.
Preferably, described cats product is quaternary ammonium salt.
Preferably, described tensio-active agent is anion surfactant.
Preferably, described anion surfactant is stearic acid, Sodium dodecylbenzene sulfonate.
Preferably, described ionic liquid is [Hmim] [HSO 4], [Bmim] [Tf 2n], [Bmim] [PF 6], [Bmin] [BF 4], [Emim] [TfOH], [Toma] Cl, [Toma] [Tf 2n] or [Omim] [BF 4].
For the composition of platinum osmium alloy surface cleaning, preferably, consist of the following composition by weight: 30 parts, dihydroxymethyl phenylformic acid, 30 parts of diethylene glycol dimethyl ethers, 10 parts of N-Methyl pyrrolidone, 50 parts of pure aluminium silicate, 30 parts of sodium laurylsulfonates, 30 parts of 2-ethylhexanols, 30 parts of methylimidazoles, 5 parts of Sodium dodecylbenzene sulfonatees, [Bmin] [BF 4] 200 parts.
beneficial effect:the composition of platinum osmium alloy surface cleaning provided by the invention, compares existing clean-out system good to the cleaning performance of grease, and solvent residual amount is lower than prior art standard, and can not produce poisonous volatile component, does not also produce chemical reaction with metal itself.
  
Embodiment
following examples further illustrate content of the present invention, but should not be construed as limitation of the present invention.Without departing from the spirit and substance of the case in the present invention, the amendment that the inventive method, step or condition are done and replacement, all belong to scope of the present invention.
if do not specialize, the conventional means that in embodiment, technique means used is well known to those skilled in the art.
  
Embodiment 1
For the composition of platinum osmium alloy surface cleaning, mixed by following composition by weight: 10 parts, dihydroxymethyl phenylformic acid, 30 parts of diethylene glycol dimethyl ethers, 5 parts of N-Methyl pyrrolidone, 50 parts of pure aluminium silicate, 20 parts of sodium laurylsulfonates, 30 parts of 2-ethylhexanols, 20 parts of methylimidazoles, 5 parts of quaternary ammonium salts, [Hmim] [HSO 4] 100 parts.
  
Embodiment 2
For the composition of platinum osmium alloy surface cleaning, mixed by following composition by weight: 30 parts, dihydroxymethyl phenylformic acid, 50 parts of diethylene glycol dimethyl ethers, 10 parts of N-Methyl pyrrolidone, 70 parts of pure aluminium silicate, 30 parts of sodium laurylsulfonates, 40 parts of 2-ethylhexanols, 30 parts of methylimidazoles, 10 parts of stearic acid, [Bmim] [Tf 2n] 200 parts.
  
Embodiment 3
For the composition of platinum osmium alloy surface cleaning, consist of the following composition by weight: 20 parts, dihydroxymethyl phenylformic acid, 40 parts of diethylene glycol dimethyl ethers, 8 parts of N-Methyl pyrrolidone, 60 parts of pure aluminium silicate, 25 parts of sodium laurylsulfonates, 35 parts of 2-ethylhexanols, 25 parts of methylimidazoles, 8 parts of Sodium dodecylbenzene sulfonatees, [Bmim] [PF 6] 150 parts.
  
Embodiment 4
For the composition of platinum osmium alloy surface cleaning, mixed by following composition by weight: 25 parts, dihydroxymethyl phenylformic acid, 40 parts of diethylene glycol dimethyl ethers, 10 parts of N-Methyl pyrrolidone, 65 parts of pure aluminium silicate, 25 parts of sodium laurylsulfonates, 40 parts of 2-ethylhexanols, 20 parts of methylimidazoles, 10 parts of Sodium dodecylbenzene sulfonatees, [Bmin] [BF 4] 200 parts.
  
Embodiment 5
For the composition of platinum osmium alloy surface cleaning, mixed by following composition by weight: 30 parts, dihydroxymethyl phenylformic acid, 30 parts of diethylene glycol dimethyl ethers, 10 parts of N-Methyl pyrrolidone, 50 parts of pure aluminium silicate, 30 parts of sodium laurylsulfonates, 30 parts of 2-ethylhexanols, 30 parts of methylimidazoles, 5 parts of Sodium dodecylbenzene sulfonatees, [Bmin] [BF 4] 200 parts.
  
Table 1 platinum osmium alloy surface cleaning effect
? Oil residue Solvent residual amount Corrodibility Gas generated
Embodiment 1 0.15mg/m 3 0.14mg/m 3 Not corrosion 0.3mL/m 2
Embodiment 2 0.23mg/m 3 0.02mg/m 3 Not corrosion 0.2mL/m 2
Embodiment 3 0.16mg/m 3 0.05mg/m 3 Not corrosion 0.1mL/m 2
Embodiment 4 0.32mg/m 3 0.07mg/m 3 Not corrosion 0.1mL/m 2
Embodiment 5 0.01mg/m 3 0.004mg/m 3 Not corrosion 0.05mL/m 2
Comparative example 1.1mg/m 3 3.1mg/m 3 Slight corrosion 1mL/m 2
Comparative example adopts the special clean LT-II cleaner for metal in Rec.

Claims (7)

1. for the composition of platinum osmium alloy surface cleaning, it is characterized in that consisting of the following composition by weight: dihydroxymethyl phenylformic acid 10-30 part, diethylene glycol dimethyl ether 30-50 part, N-Methyl pyrrolidone 5-10 part, pure aluminium silicate 50-70 part, sodium laurylsulfonate 20-30 part, 2-ethylhexanol 30-40 part, methylimidazole 20-30 part, 5 ~ 10 parts, tensio-active agent, ionic liquid 100-200 part.
2. the composition for platinum osmium alloy surface cleaning according to claim 1, is characterized in that described tensio-active agent is cats product.
3. the composition for platinum osmium alloy surface cleaning according to claim 2, is characterized in that described cats product is quaternary ammonium salt.
4. the composition for platinum osmium alloy surface cleaning according to claim 1, is characterized in that described tensio-active agent is anion surfactant.
5. the composition for platinum osmium alloy surface cleaning according to claim 4, is characterized in that described anion surfactant is stearic acid, Sodium dodecylbenzene sulfonate.
6. the composition for platinum osmium alloy surface cleaning according to claim 1, is characterized in that described ionic liquid is [Hmim] [HSO 4], [Bmim] [Tf 2n], [Bmim] [PF 6], [Bmin] [BF 4], [Emim] [TfOH], [Toma] Cl, [Toma] [Tf 2n] or [Omim] [BF 4].
7. the composition for platinum osmium alloy surface cleaning according to claim 1, it is characterized in that consisting of the following composition by weight: 30 parts, dihydroxymethyl phenylformic acid, 30 parts of diethylene glycol dimethyl ethers, 10 parts of N-Methyl pyrrolidone, 50 parts of pure aluminium silicate, 30 parts of sodium laurylsulfonates, 30 parts of 2-ethylhexanols, 30 parts of methylimidazoles, 5 parts of Sodium dodecylbenzene sulfonatees, [Bmin] [BF 4] 200 parts.
CN201410493834.0A 2014-09-25 2014-09-25 Composition for surface cleaning of platinum-osmium alloy Withdrawn CN104213146A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112301350A (en) * 2019-07-25 2021-02-02 杭州悦山科技有限公司 Environment-friendly universal rust remover
CN114606508A (en) * 2022-03-16 2022-06-10 四川大学 Environment-friendly ionic liquid degreasing fluid and using method thereof
CN114854507A (en) * 2022-03-31 2022-08-05 浙江奥首材料科技有限公司 Acidic ionic liquid, cleaning agent containing acidic ionic liquid and semiconductor substrate cleaning method

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CN102449131A (en) * 2009-03-27 2012-05-09 伊士曼化工公司 Compositions and methods for removing organic substances
US20130324455A1 (en) * 2012-06-05 2013-12-05 Ecolab Usa Inc. Solidification mechanism incorporating ionic liquids
CN103614265A (en) * 2013-12-04 2014-03-05 宁波赛茵特科技服务有限公司 Adlet cleanser

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CN102449131A (en) * 2009-03-27 2012-05-09 伊士曼化工公司 Compositions and methods for removing organic substances
US20130324455A1 (en) * 2012-06-05 2013-12-05 Ecolab Usa Inc. Solidification mechanism incorporating ionic liquids
CN103614265A (en) * 2013-12-04 2014-03-05 宁波赛茵特科技服务有限公司 Adlet cleanser

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112301350A (en) * 2019-07-25 2021-02-02 杭州悦山科技有限公司 Environment-friendly universal rust remover
CN114606508A (en) * 2022-03-16 2022-06-10 四川大学 Environment-friendly ionic liquid degreasing fluid and using method thereof
CN114854507A (en) * 2022-03-31 2022-08-05 浙江奥首材料科技有限公司 Acidic ionic liquid, cleaning agent containing acidic ionic liquid and semiconductor substrate cleaning method

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Application publication date: 20141217