CN104198383A - Multi-light-path near-ultraviolet simulator - Google Patents
Multi-light-path near-ultraviolet simulator Download PDFInfo
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- CN104198383A CN104198383A CN201410312785.6A CN201410312785A CN104198383A CN 104198383 A CN104198383 A CN 104198383A CN 201410312785 A CN201410312785 A CN 201410312785A CN 104198383 A CN104198383 A CN 104198383A
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Abstract
A disclosed multi-light-path near-ultraviolet irradiation simulator comprises a xenon lamp, a condenser, an integrator, a long-focal-length lens and a collimating mirror; light emitted by the xenon lamp is converged by the condenser and passes through an opening at the sidewall of a chamber I and enters a chamber II, the integrator is arranged at the other sidewall of the chamber II, and light is uniformized by the integrator, is emitted in a divergent way, then meets a reflector at the hypotenuse of a right-angled-triangle chamber, then is reflected at 45 DEG and meets the long-focal-length lens, and is uniformly irradiated by the long-focal-length lens in a divergent way. The multi-light-path near-ultraviolet simulator has the advantages of large irradiation area, high irradiance and usage agility. Aiming at a test piece with the area less than an area with the diameter of 180 mm, a large-irradiance work module with collimation type 10 ultraviolet constant is employed for tests, test time is saved. Aiming at an integral or spliced test piece with the area close to an area with the diameter of 300 mm, a work module with 5 ultraviolet constant is employed, the irradiation scope is amplified and test efficiency is improved.
Description
Technical field
The invention belongs to ultraviolet irradiation analogue technique field, be specifically related to a kind of for sensitive material, components and parts and parts being carried out to the simulator of ultraviolet irradiation test.
Background technology
Conventionally, ultraviolet irradiation simulator is for the ultraviolet solar irradiation of analog operation spectral coverage within the scope of 200nm～400nm, it is mainly used in sensitive material, components and parts and parts to carry out ultraviolet irradiation test, thereby study electricity, optics and the mechanical property degradation rule of these materials under ultraviolet irradiation environment, therefore, having wide range of applications of ultraviolet irradiation simulator.
Multi-pass near ultraviolet simulator is changed and is used by collimating mirror and long focus lens, obtain collimated light or diverging light, in Φ 300mm irradiated area, reach 5 ultraviolet constants, within the scope of Φ 180mm, reach 10 ultraviolet constants, realize and switching within the scope of different irradiated area and irradiance, separate unit ultraviolet simulator reaches many indexs and high performance object.
Traditional ultraviolet irradiation analog machine, adopts single light path, and general irradiated area is within the scope of Φ 150mm, and irradiation intensity is 5-6 ultraviolet constant, and irradiated area is less, and irradiance is not high.Larger test area can be tested larger, more test specimen simultaneously, and stronger irradiation intensity, can reduce test period at double.Large irradiated area and high irradiance are the development trends of ultraviolet irradiation analog machine.
Summary of the invention
The object of the present invention is to provide a kind of multi-pass near ultraviolet simulator, this ultraviolet irradiation simulator has the performance index such as irradiation non-uniformity, degree of stability excellence, feature flexible and convenient to use.
To achieve these goals, the present invention has adopted following technical scheme:
Multi-pass near ultraviolet radiation simulator of the present invention, comprise xenon lamp, condenser, integrator, catoptron, long focus lens and collimating mirror, the xenon lamp being arranged in chamber one will enter chamber two by the open pore on chamber one sidewall after convergence of rays by condenser, on chamber two another sidewalls, correspondence is provided with integrator, entering light in chamber two is divergent after by the even light of integrator, incide on the catoptron of isosceles right triangle chamber hypotenuse, light incides on the long focus lens on base, right angle after 45 degree reflections, light incides on the long focus lens on base, right angle after 45 degree reflections, form and disperse Uniform Irradiation through long focus lens, remove long focus lens at the outside collimating mirror of installing of chamber, form collimation Uniform Irradiation.
Wherein, long focus lens and collimating mirror switch, and realize two kinds of mode of operations of 10 ultraviolet constants within the scope of interior 5 the ultraviolet constants of Φ 300mm irradiated area and Φ 180mm.
Wherein, xenon lamp is high-power short arc xenon lamp.
Wherein, data acquisition system (DAS) gathers the irradiance value of silicon photocell and regulates and controls the power of xenon lamp by the output of adjusting programmable power supply, thereby regulates the irradiation of emergent light.
Wherein, long focus lens refers to that focal length is greater than the lens of collimating mirror.
Wherein, integrator is by lower support backplanes support.
Multi-pass near ultraviolet radiation simulator of the present invention has that irradiated area is large, irradiance is high and use advantage flexibly.The test specimen that can cover for Φ 180mm irradiated area, can adopt the mode of operation of the large irradiance of 10 ultraviolet constants of collimation-type to test, and saves test period.For the single test specimen that approaches Φ 300mm area, can adopt the mode of operation of 5 ultraviolet constants of divergence form, the less irradiation face of test capability equipment significantly improves.Approach the test specimen of Φ 300mm for multiple splicings, can adopt equally the mode of operation of 5 ultraviolet constants, give full play to raising test efficiency, reduce the advantage of test period.
Brief description of the drawings
Fig. 1 is the structural representation of multi-pass near ultraviolet radiation simulator of the present invention;
In figure, 1, xenon lamp; 2, condenser; 3, integrator; 4, catoptron; 5, long focus lens; 6, collimating mirror.
Embodiment
Referring to accompanying drawing, the structure of multi-pass near ultraviolet radiation simulator of the present invention is elaborated, but this description is only exemplary, is not intended to protection scope of the present invention to carry out any restriction.
With reference to Fig. 1, Fig. 1 has shown multi-pass near ultraviolet radiation simulator of the present invention, and this multi-pass near ultraviolet radiation simulator comprises xenon lamp 1, condenser 2, integrator 3, catoptron 4, long focus lens 5, collimating mirror 6.The xenon lamp 1 being arranged in chamber one will enter chamber two by the open pore on chamber one sidewall after convergence of rays by condenser 2, on chamber two another sidewalls, correspondence is provided with integrator 3, entering light in chamber two is divergent after by the even light of integrator 3, incide on the catoptron 4 of isosceles right triangle chamber hypotenuse, light incides on the long focus lens 5 on base, right angle after 45 degree reflections, forms and disperses Uniform Irradiation through long focus lens; Remove long focus lens 5 at the outside collimating mirror 6 of installing of chamber, can form collimation Uniform Irradiation.
1,, by conversion collimating mirror, realize the switching of two kinds of mode of operations of 10 ultraviolet constants within the scope of interior 5 the ultraviolet constants of Φ 300mm irradiated area and Φ 180mm;
2, optimize by optical mirror plane shapes such as collimating mirrors, realize two irradiation face internal irradiation unevenness to be all better than ± 1%.
The key technical indexes that multi-pass near ultraviolet simulator of the present invention reaches comprises:
A) spectral range 200nm～400nm;
B), when irradiated area Φ 300mm, 1 ultraviolet constant～5 of irradiance ultraviolet constant is adjustable; (1 ultraviolet constant represents 200nm～400nm irradiance 118W/m
2);
C), when irradiated area Φ 180mm, 5 ultraviolet constant～10 of irradiance ultraviolet constant is adjustable;
D) near ultraviolet radiation unevenness be better than ± 1%, be better than ± 3% (10h) of degree of stability.
As shown in Figure 1, light source is selected high-power short arc xenon lamp for multi-pass near ultraviolet simulator optics of the present invention and optical-mechanical system, and the light sending is through condenser reflection, and incident integrator utilizes the even light action of integrator, is divergent; Catoptron in system plays the effect of optical filter simultaneously, and it is greater than 0.9 in 200-400nm spectral range internal reflection rate, is less than 0.1 at the above reflectivity of 500nm; Light, after catoptron reflection, only by long focus lens, will form the Uniform Irradiation of dispersing of Φ 300mm at irradiation face, 5 ultraviolet constants of maximum irradiance, and 200nm-400nm spectral range internal irradiation degree is greater than 590W/m
2; Only, by collimating mirror, will form the collimation Uniform Irradiation of Φ 180mm at irradiation face, 10 ultraviolet constants of maximum irradiance, 200nm-400nm spectral range internal irradiation degree is greater than 1180W/m
2.In two light path handoff procedures, only need to change lens, not need other optical elements of conditioning equipment, just can ensure irradiation non-uniformity be better than ± 1%.Long focus lens refers to that focal length is greater than the lens of collimating mirror, and catoptron is horizontal by 45° angle.The optional use of long focus lens and collimating mirror, is supported with integrator on lower shoe.
Multi-pass near ultraviolet simulator has the performance index such as irradiation non-uniformity, degree of stability excellence, feature flexible and convenient to use, can meet various material surfaces, sensitive material, parts and the components and parts ultraviolet irradiation test demand to different irradiated area and irradiance simultaneously, promote the development of the basic science technology such as material, components and parts, there is wide application prospect.
Although above the specific embodiment of the present invention has been given to describe in detail and explanation; but what should indicate is; we can carry out various equivalences to above-mentioned embodiment according to conception of the present invention and change and amendment; when its function producing does not exceed spiritual that instructions and accompanying drawing contain yet, all should be within protection scope of the present invention.
Claims (6)
1. multi-pass near ultraviolet radiation simulator, comprise xenon lamp, condenser, integrator, catoptron, long focus lens and collimating mirror, the xenon lamp being arranged in chamber one will enter chamber two by the open pore on chamber one sidewall after convergence of rays by condenser, on chamber two another sidewalls, correspondence is provided with integrator, entering light in chamber two is divergent after by the even light of integrator, incide on the catoptron of isosceles right triangle chamber hypotenuse, light incides on the long focus lens on base, right angle after 45 degree reflections, forms and disperses Uniform Irradiation through long focus lens; Remove long focus lens at the outside collimating mirror of installing of chamber, can form collimation Uniform Irradiation.
2. multi-pass near ultraviolet radiation simulator as claimed in claim 1, wherein, long focus lens and collimating mirror switch, and realize two kinds of mode of operations of 10 ultraviolet constants within the scope of interior 5 the ultraviolet constants of Φ 300mm irradiated area and Φ 180mm.
3. multi-pass near ultraviolet radiation simulator as claimed in claim 1, wherein, xenon lamp is high-power short arc xenon lamp, emergent ray is continuous ultraviolet spectrum.
4. multi-pass near ultraviolet radiation simulator as claimed in claim 1, wherein, data acquisition system (DAS) gathers the irradiance value of silicon photocell and regulates and controls the power of xenon lamp by the output of adjusting programmable power supply, thereby regulates the irradiation of emergent light.
5. multi-pass near ultraviolet radiation simulator as claimed in claim 1, wherein, long focus lens refers to that focal length is greater than the lens of collimating mirror.
6. multi-pass near ultraviolet radiation simulator as claimed in claim 1, wherein, integrator is by lower support backplanes support.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410312785.6A CN104198383B (en) | 2014-07-02 | 2014-07-02 | Multi-light-path near-ultraviolet simulator |
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| CN201410312785.6A CN104198383B (en) | 2014-07-02 | 2014-07-02 | Multi-light-path near-ultraviolet simulator |
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| CN104198383A true CN104198383A (en) | 2014-12-10 |
| CN104198383B CN104198383B (en) | 2017-04-26 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105242570A (en) * | 2015-10-12 | 2016-01-13 | 哈尔滨工业大学 | Aircraft-to-sun relationship ground simulation device |
| CN114302537A (en) * | 2021-12-27 | 2022-04-08 | 中国人民解放军军事科学院国防工程研究院 | Output irradiation intensity control method for all-weather solar simulator |
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| CN114302537A (en) * | 2021-12-27 | 2022-04-08 | 中国人民解放军军事科学院国防工程研究院 | Output irradiation intensity control method for all-weather solar simulator |
| CN114302537B (en) * | 2021-12-27 | 2024-02-23 | 中国人民解放军军事科学院国防工程研究院 | Output irradiation intensity control method for all-weather solar simulator |
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| CN104198383B (en) | 2017-04-26 |
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Inventor after: Li Fusong Inventor after: Xiang Yanhong Inventor after: Liu Gaotong Inventor after: Xu Jie Inventor after: Li Gao Inventor after: Zhang Pengsong Inventor after: Chen Jinming Inventor before: Xu Jie Inventor before: Li Fusong Inventor before: Xiang Yanhong Inventor before: Liu Gaotong Inventor before: Li Gao Inventor before: Zhang Pengsong Inventor before: Chen Jinming |
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Free format text: CORRECT: INVENTOR; FROM: XU JIE LI HONGSONG XIANG YANHONG LIU GAOTONG LI GAO ZHANG PENGSONG CHEN JINMING TO: LI HONGSONG XIANG YANHONG LIU GAOTONG XU JIE LI GAO ZHANG PENGSONG CHEN JINMING |
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