CN104120407B - A kind of for chemical vapour deposition (CVD) liquid charging stock vaporization feed device and using method - Google Patents
A kind of for chemical vapour deposition (CVD) liquid charging stock vaporization feed device and using method Download PDFInfo
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Abstract
A kind of for chemical vapour deposition (CVD) liquid charging stock vaporization feed device and using method, its feedway includes fluid reservoir, electronic scale, vaporizer, air supply system, pipeline, adjustment valve, stop valve, vacuum pump and vacuometer；Its using method includes: 1, the preproduction phase；2, the Flow-rate adjustment stage；3, the steady supply stage；4, shut down the stage.The present invention vaporizes compared with feed system with existing liquid charging stock, this device can measure the flow of liquid charging stock boil-off exactly in real time, and can according to the change of process parameter in CVD production system, the aperture of real-time regulable control feeding valve, the vaporization flow making liquid material is adjustable, controlled, keep uniformly, thus producing, for chemical vapor deposition (CVD), the liquid material vaporization feed device that equipment provides favourable.
Description
Technical field
The present invention relates to chemical vapour deposition technique field, particularly to a kind of for chemical vapour deposition (CVD), flow can the liquid charging stock vaporization feed device of real-time monitoring and using method thereof.
Background technology
Chemical vapor deposition (CVD) technology, has a wide range of applications at present in preparation nano material, semi-conducting material, thin-film material etc..The operation principle of CVD technology is usually, it is continuously introduced into one or more gaseous feeds in a reative cell being evacuated in advance, under suitable condition (heating, microwave, laser, plasma etc.), gaseous feed generation chemical reaction, generate unique a kind of solid product, depositing with the form such as thin film, powder body, other product and surplus stock then must exist in a gaseous form, and taken away by vacuum pump.Therefore people can obtain pure, to have specific physical structure solidified chemical product by CVD, for instance diamond thin, silicon nitride nano powder, CNT, Nanocrystalline Barium Titanate etc..
Chemical reaction in CVD reative cell is very complicated, various deposition parameters, such as pressure, temperature, gas flow rate and fluidised form, gas componant and various composition proportions etc., product composition and physical arrangement suffers from very big impact, it is necessary to strictly control.Wherein strict, the steady of the flow of various gases controls to be a key issue.Owing to introducing the states of matter that the reactant feed of reative cell must be gas phase, so, when reactant feed is liquid under normal conditions, it is necessary to first vaporized.Therefore, in the production equipment of CVD except having chemical reaction system, being often equipped with the vaporization feed device of liquid charging stock, concrete gasification method includes heating evaporation and other gas such as carries at the mode.But, in feedway, the measurement of liquid material steam flow and control, be always up insoluble technical problem.Because liquid material steam also exists and requires high temperature conveying, meet and cold condense, be likely to problems such as being corrosive, it is impossible to the conventional instruments such as mass-flow gas meter can be utilized as common permanent gases to be measured and control.At present, the conventional liq feed vaporization feed system used in CVD production equipment, to the vaporization many employings of unstrpped gas supply flow rate is period control, and is difficult to real-time control.The so-called period controls to refer to when response system and liquid charging stock vaporization feed system are in fixing temperature, pressure, regulate steam supply valve and reach suitable aperture, the flow of vaporization raw material in certain period is made to keep relative stability, when after end-of-job, by weighing liquid material mass change within this period, thus calculating the average discharge of liquid material steam in this period.
Conventional liquid material vaporization feed system has a disadvantage in that in actual applications
1, can not measure in real time.Owing to heated vaporizer has pipeline to connect, it is impossible to directly measuring the mass change of storing liquid raw material in it in real time, can only complete fore-and-aft survey in operation, the period that namely can only realize liquid charging stock average discharge calculates, and can not realize the real-time measurement of steam flow.But, CVD production technology there is several factors can affect carburation by evaporation and the supply conveying of liquid material, therefore very easily occur pilot process liquid charging stock steam flow unstable.
2, can not regulable control in real time.Owing to the real-time measurement of liquid charging stock steam flow can not be realized, therefore also cannot realize liquid material steam flow according to the actual deposition Parameters variation in CVCD production process controlling in real time and regulating.
3, the total consumption of liquid material is limited.When the chemical time length of CVD technique, liquid material make consumption big, once feed if adopted, then early stage preheating time is partially long, and in the whole working cycle, front and back vapor state difference is very big；If adopting midway reinforced, then can change the pressure in feed system, temperature, during this, it is difficult to keep the steady of liquid charging stock steam flow.
4, the poor repeatability repeatedly produced.Owing to flow control regulating valve door exists the factors such as neutral, it is difficult to accomplishing that position adjustments each time is all strict accurately, repeatability is difficult to ensure that.When lacking liquid charging stock steam flow monitor in real time, the technological parameter concordance that different batches produces is difficult to ensure that.
Summary of the invention
For prior art Problems existing, the present invention provides a kind of liquid charging stock vaporization feed device for chemical vapour deposition (CVD) and using method.Compared with existing liquid charging stock vaporization feed system, this device can measure the flow of liquid charging stock boil-off exactly in real time, and can according to the change of process parameter in CVD production system, the aperture of real-time regulable control feeding valve, the vaporization flow making liquid material is adjustable, controlled, keep uniformly, thus producing, for chemical vapor deposition (CVD), the liquid material vaporization feed device that equipment provides favourable.
To achieve these goals, the present invention adopts the following technical scheme that a kind of liquid charging stock vaporization feed device for chemical vapour deposition (CVD), including fluid reservoir, electronic scale, vaporizer, air supply system, pipeline, adjustment valve, stop valve, vacuum pump and vacuometer.
Described fluid reservoir is uiform section vertical type columnar container, contains the liquid charging stock needing to be vaporized, can add liquid storage cover above fluid reservoir in it, and fluid reservoir lid is provided with charge door, and fluid reservoir sidewall is provided with liquidometer, and fluid reservoir is placed on electronic scale；Having suction tube to be suspended at fluid reservoir inner upper, but be not stamped any contact with fluid reservoir and fluid reservoir, suction tube lower end is inserted among liquid charging stock, and suction tube upper end is connected with liquid feeding pipeline；Liquid feeding pipeline is connected with the liquid injection pipe upper end of vaporizer with liquid stop valve by liquid control valve.
Described vaporizer is an airtight vacuum container, and its outside having heaters and heat-insulation layer, vaporizer top is connected to vacuometer, liquid injection pipe, steam outlet pipe and air inlet pipe, is provided with tilted-putted cloth stream plate in vaporizer；Cloth stream plate top connects with liquid injection pipe lower end, and bottom connects with vaporizer bottom surface；Air inlet pipe lower end stretches in vaporizer below middle part, and upper end is connected with the supply air line of air supply system；Steam outlet pipe is picked out by vaporizer tank deck, is connected with the air inlet of the first tee T；One side outlet of the first tee T communicates with feeding pipe through supply valve, feeding pipe produces the reative cell air inlet of equipment by being access to CVD, the opposite side outlet of the first tee T communicates through a side-inlet of vacuum line valve and the second tee T, the opposite side air inlet of the second tee T is connected to vent valve, and the gas outlet of the second tee T is connected with the air inlet of vacuum pump through roughing pipe.
Described air supply system includes gas bomb, gas stop valve, mass-flow gas meter and supply air line, gas bomb outlet the supply air line drawn, and after being sequentially connected with gas stop valve and mass-flow gas meter, is connected with the air inlet pipe upper end of vaporizer.
A kind of using method for the liquid charging stock vaporization feed device of chemical vapour deposition (CVD) is as follows:
1. the preproduction phase.Device starts front supply valve, liquid stop valve, gas stop valve, vacuum line valve and vent valve and is completely in closed mode；Start vacuum pump, open vacuum line valve, to the thick evacuation of vaporizer；Slightly open liquid stop valve, make liquid charging stock in fluid reservoir enter suction tube under atmospheric pressure effect, until closing liquid stop valve after the full liquid feeding pipeline of liquid charging stock；Continue vaporizer evacuation is reached work background vacuum, start heater and vaporizer is preheated, reach to make the rapid temperature crossing thermal evaporation of liquid charging stock.
2. the Flow-rate adjustment stage.After vaporizer reaches design temperature, be again turned on liquid stop valve, make the liquid charging stock in fluid reservoir flow into vaporizer by suction tube, liquid feeding pipeline and liquid injection pipe, liquid injection pipe lower end the liquid raw materials flow flowed out is to cloth stream plate.Cloth stream plate can overcome surface tension effects, makes liquid at cloth stream plate unfolded surface, is formed without pendent droplet.The temperature of vaporizer, pressure make liquid charging stock be in superheat state, once have liquid raw materials flow to cloth stream plate, vaporize immediately, and this just makes fluid flow (namely liquid is by the transfer velocity of fluid reservoir to vaporizer) equal to vaporizing liquid speed.By the quality of electronic scale automatic real-time measurement fluid reservoir and internal liquid raw material thereof, following formula calculate fluid flow:
In formulaLiquid charging stock exists~Mean mass flux (kg/s) in period；Liquid level area (m between fluid reservoir inwall and suction tube outer wall2)；Suction tube endoporus cross-sectional area (m2)；Generation moment (s) that first time measures automatically；Generation moment (s) that second time is measured automatically；The electronic scale reading (kg) in the first moment；The electronic scale reading (kg) in the second moment.Shorten the interval time of adjacent double measurement as far as possible, just can obtain as far as possible accurately fluid flow calculating value in real time.Producing being actually needed of equipment according to CVD, regulate the aperture of liquid control valve in real time, the fluid flow that control foundation measured data calculates is equal to the value of system requirements.
3. the steady supply stage.After adjustment fluid flow reaches required value, close vacuum line valve, stop vacuum pump, open vent valve simultaneously, after inflating to vacuum pump, be again switched off vent valve；Open supply valve, start to produce equipment conveying liquid charging stock steam to CVD by feeding pipe；Hereafter according to the measurement of step 2, calculating and control method, liquid control valve is regulated in real time, it is ensured that the steady output of fluid flow；If needing assist gas to carry boil-off flow to CVD production equipment, then open air supply system, open gas stop valve, mass-flow gas meter is utilized to control the flow of assist gas, make assist gas be entered vaporizer by gas bomb by the air inlet pipe of supply air line and vaporizer, more together supply CVD production equipment with liquid charging stock steam.
4. shut down the stage.Closing liquid stop valve, closes gas stop valve, closes supply valve, stops producing equipment conveying liquid charging stock steam to CVD；Start vacuum pump, open vacuum line valve, to vaporizer evacuation；Close heater, stop vaporizer being heated；After vaporizer is lowered the temperature, close vacuum line valve, stop vacuum pump, open vent valve simultaneously, after inflating to vacuum pump, be again switched off vent valve.
The invention has the beneficial effects as follows:
1, the fluid reservoir of liquid charging stock there is no heater or other connection member, therefore can directly utilize electronic scale weighing, such that it is able to measure the quality readings of pot liquid raw material in real time, then calculate the flow of liquid charging stock in real time；Vaporizer adopted thermal evaporation methods, and no liquid raw material accumulates, and made the flow flow equal to feed vaporization steam at that time of liquid charging stock, namely achieved the real-time monitoring of liquid charging stock steam flow.
2, liquid charging stock steam flow, the i.e. transfer amount of unit interval liquid charging stock, only relevant with the limit flow regulating valve, not by the impact of heating-up temperature.Formal after gas mixer chamber supply, regulating valve and remain stationary as, liquid charging stock steam flow just no longer fluctuates.
3, Liquid ingredient containers is not airtight, when chemical reaction requires that raw material makes large usage quantity, can while keeping supplying to chemical reaction system, in Liquid ingredient containers, directly add raw material, liquid charging stock steam flow steady can be kept, being particularly suitable for the response time long, the CVD that reaction raw materials consumption is big produces equipment.
4, after adjustment valve is fixed, no longer change.As long as chemical reaction is constant, this regulates valve and just need not readjust again, can guarantee that every time strict accurately control liquid charging stock steam flow, it is ensured that the concordance that different batches produces.
Accompanying drawing explanation
Fig. 1 is for the structural representation of the liquid charging stock vaporization feed device embodiment of chemical vapour deposition (CVD)；
In figure, 1-vacuum pump, 2-fluid reservoir, 3-electronic scale, 4-suction tube, 5-liquid charging stock, 6-heater, 7-vaporizer, 8-cloth stream plate, 9-liquid injection pipe, 10-vacuometer, 11-feeding pipe, 12-supply valve, 13-steam outlet pipe, 14-vacuum line valve, 15-the first tee T, 16-liquid stop valve, 17-liquid control valve, 18-liquid feeding pipeline, 19-the second tee T, 20-vent valve, 21-roughing pipe, 22-charge door, 23-liquid storage cover, 24-liquidometer, 25-air inlet pipe, 26-gas bomb, 27-gas stop valve；28-mass-flow gas meter, 29-supply air line.
Detailed description of the invention:
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Embodiment:
A kind of liquid charging stock vaporization feed device for chemical vapour deposition (CVD) provided by the present invention, including vacuum pump 1, fluid reservoir 2, electronic scale 3, vaporizer 7, vacuometer 10 and air supply system and pipe valve.
Described fluid reservoir 2 is uiform section vertical type columnar container, contains the liquid charging stock 5 needing to be vaporized, set liquid storage cover 23 above fluid reservoir 2 in it, and liquid storage cover 23 is provided with charge door 22, and fluid reservoir 2 sidewall is provided with liquidometer 24, and fluid reservoir 2 is placed on electronic scale 3；Having suction tube 4 to be suspended at above fluid reservoir 2, but do not have any contact with fluid reservoir 2 and liquid storage cover 23, suction tube 4 lower end is inserted among liquid charging stock 5, and suction tube 4 upper end is connected with liquid feeding pipeline 18；Liquid feeding pipeline 18 is connected with liquid injection pipe 9 upper end of vaporizer 7 with liquid stop valve 16 by liquid control valve 17.
Described vaporizer 7 is an airtight vacuum container, and its outside having heaters 6 and heat-insulation layer, vaporizer 7 top is connected to vacuometer 10, liquid injection pipe 9, steam outlet pipe 13 and air inlet pipe 25, is provided with tilted-putted cloth stream plate 8 in vaporizer 7；Cloth stream plate 8 top connects with liquid injection pipe 9 lower end, and bottom connects with vaporizer 7 bottom surface；Air inlet pipe 25 lower end stretches in vaporizer 7 below middle part, and upper end is connected with the supply air line 29 of air supply system；Steam outlet pipe 13 is picked out by vaporizer 7 tank deck, is connected with the air inlet of the first tee T 15；One side outlet of the first tee T 15 communicates with feeding pipe 11 through supply valve 12, feeding pipe 11 produces the reative cell air inlet of equipment by being access to CVD, the opposite side outlet of the first tee T 15 communicates through a side-inlet of vacuum line valve 14 with the second tee T 19, the opposite side air inlet of the second tee T 19 is connected to vent valve 20, and the gas outlet of the second tee T 19 is connected through the air inlet of roughing pipe 21 with vacuum pump 1.
Described air supply system includes gas bomb 26, gas stop valve 27, mass-flow gas meter 28 and supply air line 29, the supply air line 29 of extraction is exported by gas bomb 26, after being sequentially connected with gas stop valve 27 and mass-flow gas meter 28, it is connected with air inlet pipe 25 upper end of vaporizer 7.
The using method of the present invention is described below in conjunction with drawings and Examples:
1, the preproduction phase.Device starts front supply valve 12, liquid stop valve 16, gas stop valve 27, vacuum line valve 14 and vent valve 20 and is completely in closed mode；Start vacuum pump 1, open vacuum line valve 14, to the thick evacuation of vaporizer 7；Slightly open liquid stop valve 16, make liquid charging stock 5 in fluid reservoir 2 enter suction tube 4 under atmospheric pressure effect, until liquid charging stock 5 is full of closing liquid stop valve 16 after liquid feeding pipeline 18；Continue vaporizer 7 evacuation is reached work background vacuum, start heater 6 and vaporizer 7 is preheated, reach to make the rapid temperature crossing thermal evaporation of liquid charging stock 5.
2, the Flow-rate adjustment stage.After vaporizer 7 reaches design temperature, be again turned on liquid stop valve 16, make the liquid charging stock 5 in fluid reservoir 2 flow into vaporizer 7 by suction tube 4, liquid feeding pipeline 18 and liquid injection pipe 9, liquid injection pipe 9 lower end the liquid charging stock 5 flowed out flows on cloth stream plate 8.Cloth stream plate 8 can overcome surface tension effects, makes liquid charging stock 5 at cloth stream plate 8 unfolded surface, is formed without pendent droplet.The temperature of vaporizer 7, pressure make liquid charging stock 5 be in superheat state, and liquid charging stock 5, once stream is to cloth stream plate 8, is vaporized immediately, and this just makes Fluid transport rate be equal to vaporizing liquid speed.By the quality of electronic scale 3 automatic real-time measurement fluid reservoir 2 internal liquid raw material 5, following formula calculate fluid flow:
In formulaLiquid charging stock 5 exists~Mean mass flux (kg/s) in period；Liquid level area (m between fluid reservoir 2 inwall and suction tube 4 outer wall2)；Suction tube 4 endoporus cross-sectional area (m2)；Generation moment (s) that electronic scale 3 first time measures automatically；Generation moment (s) that electronic scale 3 second time is measured automatically；The reading (kg) of the electronic scale 3 in the first moment；The reading (kg) of the electronic scale 3 in the second moment.Shorten the interval time of adjacent double measurement as far as possible, just can obtain as far as possible accurately fluid flow calculating value in real time.
Producing being actually needed of equipment according to CVD, regulate the aperture of liquid control valve 17 in real time, the fluid flow that control foundation measured data calculates produces the value of equipment requirements equal to CVD.
3, the steady supply stage.After adjustment fluid flow reaches required value, close vacuum line valve 14, stop vacuum pump 1, open vent valve 20 simultaneously, after inflating to vacuum pump 1, be again switched off vent valve 20；Open supply valve 12, start to produce to CVD the steam of equipment conveying liquid charging stock 5 by feeding pipe 11；Hereafter according to above-mentioned measurement, calculating and control method, liquid control valve 17 is regulated in real time, it is ensured that the steady output of fluid flow；If needing assist gas to carry boil-off flow to CVD production equipment, then open air supply system, open gas stop valve 27, mass-flow gas meter 28 is utilized to control the flow of assist gas, make assist gas be entered vaporizer 7 by gas bomb 26 by the air inlet pipe 25 of supply air line 29 and vaporizer 7, more together supply CVD with the steam of liquid charging stock 5 and produce equipment.
4, shut down the stage.Closing liquid stop valve 16, closes gas stop valve 27, closes supply valve 12, stops producing the steam of equipment conveying liquid charging stock 5 to CVD；Start vacuum pump 1, open vacuum line valve 14, to vaporizer 7 evacuation；Close heater 6, stop vaporizer 7 is heated；After vaporizer 7 is lowered the temperature, close vacuum line valve 14, stop vacuum pump 1, open venting simultaneously, 20, it is again switched off vent valve 20 after inflating to vacuum pump 1.
Claims (2)
1. one kind is used for chemical vapour deposition (CVD) liquid charging stock vaporization feed device, including fluid reservoir, electronic scale, vaporizer, air supply system, pipeline, adjustment valve, stop valve, vacuum pump and vacuometer, it is characterized in that: described fluid reservoir is uiform section vertical type columnar container, the liquid charging stock needing to be vaporized is contained in it, liquid storage cover can be added above fluid reservoir, fluid reservoir lid is provided with charge door, and fluid reservoir sidewall is provided with liquidometer, and fluid reservoir is placed on electronic scale；Having suction tube to be suspended at fluid reservoir inner upper, but be not stamped any contact with fluid reservoir and fluid reservoir, suction tube lower end is inserted among liquid charging stock, and suction tube upper end is connected with liquid feeding pipeline；Liquid feeding pipeline is connected with the liquid injection pipe upper end of vaporizer with liquid stop valve by liquid control valve；Described vaporizer is an airtight vacuum container, and its outside having heaters and heat-insulation layer, vaporizer top is connected to vacuometer, liquid injection pipe, steam outlet pipe and air inlet pipe, is provided with tilted-putted cloth stream plate in vaporizer；Cloth stream plate top connects with liquid injection pipe lower end, and bottom connects with vaporizer bottom surface；Air inlet pipe lower end stretches in vaporizer below middle part, and upper end is connected with the supply air line of air supply system；Steam outlet pipe is picked out by vaporizer tank deck, is connected with the air inlet of the first tee T；One side outlet of the first tee T communicates with feeding pipe through supply valve, feeding pipe produces the reative cell air inlet of equipment by being access to CVD, the opposite side outlet of the first tee T communicates through a side-inlet of vacuum line valve and the second tee T, the opposite side air inlet of the second tee T is connected to vent valve, and the gas outlet of the second tee T is connected with the air inlet of vacuum pump through roughing pipe；Described air supply system includes gas bomb, gas stop valve, mass-flow gas meter and supply air line, gas bomb outlet the supply air line drawn, and after being sequentially connected with gas stop valve and mass-flow gas meter, is connected with the air inlet pipe upper end of vaporizer.
2. for a using method for the liquid charging stock vaporization feed device of chemical vapour deposition (CVD), it is characterized in that: (1), preproduction phase: device starts front supply valve, liquid stop valve, gas stop valve, vacuum line valve and vent valve and is completely in closed mode；Start vacuum pump, open vacuum line valve, to the thick evacuation of vaporizer；Slightly open liquid stop valve, make liquid charging stock in fluid reservoir enter suction tube under atmospheric pressure effect, until closing liquid stop valve after the full liquid feeding pipeline of liquid charging stock；Continue vaporizer evacuation is reached work background vacuum, start heater and vaporizer is preheated, reach to make the rapid temperature crossing thermal evaporation of liquid charging stock；(2), the Flow-rate adjustment stage: after vaporizer reaches design temperature, it is again turned on liquid stop valve, make the liquid charging stock in fluid reservoir flow into vaporizer by suction tube, liquid feeding pipeline and liquid injection pipe, liquid injection pipe lower end the liquid raw materials flow flowed out is to cloth stream plate；Cloth stream plate can overcome surface tension effects, makes liquid at cloth stream plate unfolded surface, is formed without pendent droplet；The temperature of vaporizer, pressure make liquid charging stock be in superheat state, once have liquid raw materials flow to cloth stream plate, vaporize immediately, and this just makes fluid flow (namely liquid is by the transfer velocity of fluid reservoir to vaporizer) equal to vaporizing liquid speed；By the quality of electronic scale automatic real-time measurement fluid reservoir and internal liquid raw material thereof, following formula calculate fluid flow:
In formula, q liquid charging stock is at t1～t2Mean mass flux (kg/s) in period；Liquid level area (m between S fluid reservoir inwall and suction tube outer wall2)；A suction tube endoporus cross-sectional area (m2)；T1Generation moment (s) that first time measures automatically；T2Generation moment (s) that second time is measured automatically；M1The electronic scale reading (kg) in the first moment；M2The electronic scale reading (kg) in the second moment；Shorten the interval time of adjacent double measurement as far as possible, just can obtain as far as possible accurately fluid flow calculating value in real time；Producing being actually needed of equipment according to CVD, regulate the aperture of liquid control valve in real time, the fluid flow that control foundation measured data calculates is equal to the value of system requirements；(3), the steady supply stage: after adjustment fluid flow reaches required value, close vacuum line valve, stop vacuum pump, open vent valve simultaneously, be again switched off vent valve after inflating to vacuum pump；Open supply valve, start to produce equipment conveying liquid charging stock steam to CVD by feeding pipe；Hereafter according to the measurement of step 2, calculating and control method, liquid control valve is regulated in real time, it is ensured that the steady output of fluid flow；If needing assist gas to carry boil-off flow to CVD production equipment, then open air supply system, open gas stop valve, mass-flow gas meter is utilized to control the flow of assist gas, make assist gas be entered vaporizer by gas bomb by the air inlet pipe of supply air line and vaporizer, more together supply CVD production equipment with liquid charging stock steam；(4), shut down the stage: closing liquid stop valve, close gas stop valve, close supply valve, stop producing equipment conveying liquid charging stock steam to CVD；Start vacuum pump, open vacuum line valve, to vaporizer evacuation；Close heater, stop vaporizer being heated；After vaporizer is lowered the temperature, close vacuum line valve, stop vacuum pump, open vent valve simultaneously, after inflating to vacuum pump, be again switched off vent valve.
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| CN108128771B (en) * | 2018-01-29 | 2024-01-30 | 常州检验检测标准认证研究院 | Parameter online value guaranteeing system and method for cold wall CVD method graphene preparation device |
| CN111560597B (en) * | 2020-06-18 | 2022-07-01 | 湖南铠欣新材料科技有限公司 | Air inlet device of silicon carbide chemical vapor deposition furnace |
| CN111995402A (en) * | 2020-08-27 | 2020-11-27 | 上海大学绍兴研究院 | Chemical vapor deposition/permeation device and method for preparing ceramic matrix composite material |
| CN112626490B (en) * | 2020-12-14 | 2022-09-20 | 湖南顶立科技有限公司 | Method and equipment for automatically controlling air inflow of MTS (methanol to sulfur) process |
| CN114152322B (en) * | 2021-12-06 | 2022-12-30 | 中国科学院光电技术研究所 | Monitoring device for chemical vapor deposition liquid source material |
| CN115505899A (en) * | 2022-08-16 | 2022-12-23 | 湖南顶立科技有限公司 | Process gas source input device of deposition equipment and use method thereof |
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