CN104117501A - Tank arrangement structure of ultrasonic washing unit - Google Patents
Tank arrangement structure of ultrasonic washing unit Download PDFInfo
- Publication number
- CN104117501A CN104117501A CN201410295368.5A CN201410295368A CN104117501A CN 104117501 A CN104117501 A CN 104117501A CN 201410295368 A CN201410295368 A CN 201410295368A CN 104117501 A CN104117501 A CN 104117501A
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- Prior art keywords
- valve
- drying
- rinsing
- tank
- tanks
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
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- Drying Of Solid Materials (AREA)
Abstract
The invention relates to a tank arrangement structure of an ultrasonic washing unit. The tank arrangement structure comprises a washing area, a rinsing area, a dehydrating area and a drying area which are sequentially connected. The washing area comprises a plurality of independent washing tanks, wherein each washing tank is connected with a first water supplementation valve, a first water drainage valve and a first return valve. The rinsing area comprises a plurality of rinsing tanks which are connected in series, wherein each rinsing tank is connected with a second water drainage valve, the rinsing tank located at the front end is connected with a second water supplementation valve, and the rinsing tank located at the tail end is connected with a second return valve. The dehydrating area comprises a plurality of dehydrating tanks, wherein each dehydrating tank is connected with a third water drainage valve. The drying area comprises a plurality of drying tanks, wherein a vibrating filtering plate is arranged in each drying tank. The tank arrangement structure is compact in structure and reasonable in arrangement; sheet glass is washed and rinsed through the independent washing tanks and the rinsing tanks arranged in series, and therefore the washing effect is good, and the rinsing effect is good; the two dehydrating tanks are prepared for drying, and the effect of removing moisture on the surface of the glass sheet is improved.
Description
Technical field
The present invention relates to the technical field of processing equipment of glass, relate in particular to the cleaning equipment of glass.
Background technology
Glass cleaning machine be glass as the grinding of the flat-type glasses such as mobile phone faceplate, touch panel, liquid crystal panel after, clean, the dry special equipment of processing of cleaning after strengthening etc.Traditional glass cleaning machine adopts water to rinse or Ultrasonic Cleaning, after cleaning, passes through dehydration, drying and processing.Ultrasonic Cleaning is that ultrasonic wave rinses with water the cleaning way combining, and in traditional ultrasonic cleaning apparatus, the topology layout of rinse bath, drench pit and drying tank and number are set unreasonable, cause cleaning efficiency and cleaning performance not good.
Summary of the invention
The applicant, for the above-mentioned shortcoming of existing glass cleaning machine, provides a kind of cell body layout structure of supersonic wave cleaning machine, and for cleaning, dehydration and the oven dry of sheet glass, it has reasonable structural arrangement, the feature little, operating efficiency is high takes up room.
The technical solution adopted in the present invention is as follows:
A cell body layout structure for supersonic wave cleaning machine, this structure comprises the cleaning area, rinsing district, drying zone and the baking zone that are connected and arrange successively;
Described cleaning area comprises multiple independently rinse baths, is connected with the first water compensating valve, first row water valve and the first return valve on each rinse bath;
Described rinsing district comprises the potcher of multiple series connection, is connected with respectively second row water valve on each potcher, is positioned on the potcher of front end and connects the second water compensating valve, is positioned on the potcher of end and connects the second return valve;
Described drying zone comprises multiple drench pits, connects respectively the 3rd draining valve on drench pit;
Described baking zone comprises multiple drying tanks, and in drying tank, device has vibration filtering plate respectively.
Further improvement as technique scheme:
Described rinse bath comprises four; Described potcher comprises three; Described drench pit comprises two; Described drying tank comprises two.
Beneficial effect of the present invention is as follows:
Compact conformation of the present invention, rationally distributed; By the multiple rinse baths that independently arrange and the potcher arranging of connecting, sheet glass is cleaned and rinsing, its cleaning performance is good, wash effect good; Two drench pits are set and prepare for drying, improve the removing effect to glass sheet surface moisture.
Brief description of the drawings
Fig. 1 is front view of the present invention.
Fig. 2 is the top view of Fig. 1.
In figure: 1, cleaning area; 11, rinse bath; 12, the first water compensating valve; 13, first row water valve; 14, the first return valve; 2, rinsing district; 21, potcher; 22, the second water compensating valve; 23, second row water valve; 24, the second return valve; 3, drying zone; 31, drench pit; 32, the 3rd draining valve; 4, baking zone; 41, drying tank; 42, vibration filtering plate.
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described.
As shown in Figures 1 and 2, the cell body layout structure of the supersonic wave cleaning machine of the present embodiment, this structure comprises the cleaning area 1, rinsing district 2, drying zone 3 and the baking zone 4 that are connected and arrange successively;
Cleaning area 1 comprises multiple independently rinse baths 11, and rinse bath 11 is traditionally arranged to be four, is connected with the first water compensating valve 12, first row water valve 13 and the first return valve 14 on each rinse bath 11; In rinse bath 11, enter pure water by the first water compensating valve 12, and increase there is cleaning fluid; Discharge sewage by first row water valve 13; By the first return valve 14, the pure water cleaning is circulated.Independently rinse bath 11 cleans successively to sheet glass, has improved cleaning performance.
Rinsing district 2 comprises the potcher 21 of multiple series connection, potcher 21 is generally made as three, on each potcher 21, be connected with respectively second row water valve 23, be positioned on the potcher 21 of front end and connect the second water compensating valve 22, be positioned on the potcher 21 of end and connect the second return valve 24.Three potcher 21 series connection arrange sheet glass are carried out to rinsing, save water resource.
Drying zone 3 comprises multiple drench pits 31, and drench pit 31 is generally made as two, connects respectively the 3rd draining valve 32 on each drench pit 31;
Baking zone 4 comprises multiple drying tanks 41, and drying tank 41 is generally made as two, and in each drying tank 41, device has vibration filtering plate 42 respectively, and vibration filtering plate 42 drives by vibrator (not shown), improves drying effect.
Compact conformation of the present invention, rationally distributed; By the multiple rinse baths that independently arrange and the potcher arranging of connecting, sheet glass is cleaned and rinsing, its cleaning performance is good, wash effect good; Two drench pits are set and prepare for drying, improve the removing effect to glass sheet surface moisture.
More than describing is explanation of the invention, is not the restriction to invention, and limited range of the present invention is referring to claim, and without prejudice to spirit of the present invention in the situation that, the present invention can do any type of amendment.
Claims (5)
1. a cell body layout structure for supersonic wave cleaning machine, is characterized in that: this structure comprises the cleaning area (1), rinsing district (2), drying zone (3) and the baking zone (4) that are connected and arrange successively;
Described cleaning area (1) comprises multiple independently rinse baths (11), is connected with the first water compensating valve (12), first row water valve (13) and the first return valve (14) on each rinse bath (11);
Described rinsing district (2) comprises the potcher (21) of multiple series connection, on each potcher (21), be connected with respectively second row water valve (23), be positioned at upper second water compensating valve (22) that connects of potcher (21) of front end, be positioned at upper second return valve (24) that connects of potcher (21) of end;
Described drying zone (3) comprises multiple drench pits (31), connects respectively the 3rd draining valve (32) on drench pit (31);
Described baking zone (4) comprises multiple drying tanks (41), and in drying tank (41), device has vibration filtering plate (42) respectively.
2. according to the cell body layout structure of supersonic wave cleaning machine described in claim 1, it is characterized in that: described rinse bath (11) comprises four.
3. according to the cell body layout structure of supersonic wave cleaning machine described in claim 1, it is characterized in that: described potcher (21) comprises three.
4. according to the cell body layout structure of supersonic wave cleaning machine described in claim 1, it is characterized in that: described drench pit (31) comprises two.
5. according to the cell body layout structure of supersonic wave cleaning machine described in claim 1, it is characterized in that: described drying tank (41) comprises two.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410295368.5A CN104117501A (en) | 2014-06-26 | 2014-06-26 | Tank arrangement structure of ultrasonic washing unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410295368.5A CN104117501A (en) | 2014-06-26 | 2014-06-26 | Tank arrangement structure of ultrasonic washing unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104117501A true CN104117501A (en) | 2014-10-29 |
Family
ID=51763266
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410295368.5A Pending CN104117501A (en) | 2014-06-26 | 2014-06-26 | Tank arrangement structure of ultrasonic washing unit |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104117501A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104550114A (en) * | 2014-12-31 | 2015-04-29 | 彩虹（合肥）液晶玻璃有限公司 | Liquid crystal glass overflow brick cleaning tool and cleaning method |
| TWI571320B (en) * | 2015-07-27 | 2017-02-21 | 盟立自動化股份有限公司 | Basin for washing a plate member |
| CN108704894A (en) * | 2018-05-25 | 2018-10-26 | 安徽尚忠活塞环有限公司 | A kind of piston ring cleaning line of high degree of automation |
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| CN102836842A (en) * | 2012-08-08 | 2012-12-26 | 晶海洋半导体材料（东海）有限公司 | Multi-groove circulating silicon wafer cleaning machine |
| KR20130068912A (en) * | 2011-12-16 | 2013-06-26 | 동우 화인켐 주식회사 | Cleaning solution composition for electronic material and cleaning method for electronic material using the same |
| CN203936071U (en) * | 2014-06-26 | 2014-11-12 | 苏州一合光学有限公司 | The cell body layout structure of supersonic wave cleaning machine |
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2014
- 2014-06-26 CN CN201410295368.5A patent/CN104117501A/en active Pending
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| JP2002523906A (en) * | 1998-08-27 | 2002-07-30 | アノン インコーポレイテッド | How to remove organic substances from a substrate |
| US20080156347A1 (en) * | 2006-12-27 | 2008-07-03 | Siltronic Ag | Cleaning Liquid And Cleaning Method For Electronic Material |
| CN101695700A (en) * | 2009-07-28 | 2010-04-21 | 上海明兴开城超音波科技有限公司 | Ultrasonic wave cleaner for coating of optical lens and treatment method thereof |
| CN101966524A (en) * | 2010-09-01 | 2011-02-09 | 杭州杭氧股份有限公司 | Automatic cleaning method and device for aluminium alloy composite boards |
| CN101947524A (en) * | 2010-09-19 | 2011-01-19 | 南车株洲电机有限公司 | Ultrasonic cleaning method and equipment of high-speed overloaded alternating current traction motor stator stand |
| CN102125914A (en) * | 2011-01-18 | 2011-07-20 | 中信戴卡轮毂制造股份有限公司 | Ultrasonic surface cleaning process for forged workpiece |
| CN102366750A (en) * | 2011-11-21 | 2012-03-07 | 沈阳仪表科学研究院 | Ultrasonic cleaning drying method for deep curved glass reflector |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104550114A (en) * | 2014-12-31 | 2015-04-29 | 彩虹（合肥）液晶玻璃有限公司 | Liquid crystal glass overflow brick cleaning tool and cleaning method |
| TWI571320B (en) * | 2015-07-27 | 2017-02-21 | 盟立自動化股份有限公司 | Basin for washing a plate member |
| CN108704894A (en) * | 2018-05-25 | 2018-10-26 | 安徽尚忠活塞环有限公司 | A kind of piston ring cleaning line of high degree of automation |
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| C06 | Publication | ||
| PB01 | Publication | ||
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| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20141029 |