CN104035231B - Liquid crystal display panel and liquid crystal display device comprising same - Google Patents
Liquid crystal display panel and liquid crystal display device comprising same Download PDFInfo
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- CN104035231B CN104035231B CN201310073373.7A CN201310073373A CN104035231B CN 104035231 B CN104035231 B CN 104035231B CN 201310073373 A CN201310073373 A CN 201310073373A CN 104035231 B CN104035231 B CN 104035231B
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Abstract
The invention relates to a liquid crystal display panel. The liquid crystal display panel comprises a first substrate, a first protective layer, a color filter layer, a first electrode layer, a second protective layer, a second electrode layer, a second substrate and a shading layer. The first substrate is provided with a metal layer; the first protective layer is arranged on the metal layer; the color filter layer is provided with a first opening and arranged on the first protective layer; the first electrode layer is arranged on the color filter layer; the second protective layer is provided with a second opening and arranged on the first electrode layer and covers parts of the side wall of the first opening, and the second opening corresponds to the first opening to expose the metal layer; the second electrode layer is arranged on the second protective layer and electrically connected with the metal layer; the shading layer is arranged between the first substrate and the second substrate and comprises a filling unit and a support unit, wherein the filling unit is arranged inside the second opening and covers the color filter layer, which is exposed on the second protective layer and the second electrode layer, and the support unit enables the first protective layer or the second protective layer to form a space from the second substrate.
Description
Technical field
The present invention is with regard to a kind of display panels and the liquid crystal display comprising which, espespecially a kind of to have high opening
The display panels of rate and the liquid crystal display comprising which.
Background technology
As display technology constantly improves, all of device towards the trend development such as small volume, thickness of thin, lightweight,
Therefore the display equipment of main flow develops into liquid crystal display by conventional cathode ray tube on the market at present.Particularly, liquid
The applicable field of crystal display device is quite a lot of, mobile phone, notebook computer used in every daily life, camera, photograph
The display devices such as machine, music player, action navigation device, TV, use display panels its display floater more.
With the development of liquid crystal display, the display floater in current main flow or exploitation can be divided into：Twisted nematic
(TN), vertical orientation type (VA), planar alignment type (1PS) isotype.Liquid crystal display mainly includes a LCD
Plate and a backlight module, and backlight module is mainly provided in below display panels, i.e. thin film transistor base plate side
(that is, TFT side), to provide a light source to display panels；And via the display of control display panels pixel, and can be in
The opposition side (observer position, i.e. colored filter substrate side) of backlight module is presented image.
However, in known conventional display panels, mainly by the infrabasal plate (TFT side) including thin film transistor (TFT)
With upper substrate (CF sides) institute including colored filter to a group formation；And wherein, upper and lower plates are respectively provided with pattern.Prevent to reach
To the light leak produced by grouping error, often need to design wider light shield layer (such as：Black matrix").However, this design can but be sacrificed
Aperture opening ratio, and cause penetrance to decline.
Therefore, need badly at present and develop a kind of display panels, the phase can solve the problems, such as aforesaid to grouping error and to improve
Aperture opening ratio, with suitable on medium and small escope.
The content of the invention
The main object of the present invention is to provide a kind of display panels and the liquid crystal display comprising which, so as to energy
Improve the aperture opening ratio of display floater, to be applied on medium and small escope.
To reach above-mentioned purpose, the display panels of the present invention, including：One first substrate, is provided with a metal above which
Layer；One first protective layer, on metal level；One chromatic filter layer, on the first protective layer, and chromatic filter layer has one
First opening；One first electrode layer, on chromatic filter layer；One second protective layer, in first electrode layer and covers coloured silk
The partial sidewall of the first opening of color filtering optical layer, and the second protective layer is that, with one second opening, the second opening is correspondence first
It is open to appear metal level；One the second electrode lay, is provided on the second protective layer and covers the second opening of the second protective layer
Side wall and with metal level be electrically connected with；One second substrate, is arranged with respect to first substrate；And a light shield layer, located at first substrate
And between second substrate and including a filling part and a supporting part, filling part is provided in the second opening of the second protective layer, and is covered
Lid does not receive the chromatic filter layer that the second protective layer and the second electrode lay are covered, and supporting part is to make the first protective layer or the second protection
A predetermined space is formed between layer and second substrate so that a liquid crystal cells are in predetermined space.
In the display panels of the present invention, first substrate is that, used as an infrabasal plate, and second substrate is then as on one
Substrate.The liquid crystal display of upper substrate is provided at compared to conventional chromatic filter layer, in the display panels of the present invention
In, chromatic filter layer is provided on infrabasal plate, and light shield layer is substituted for known black matrix".Accordingly, the present invention can be solved
Certainly known chromatic filter layer is located at the problem of the bit errors easily produced during upper substrate, and without using wider light shield layer is
The situation of light leak generation can be reduced, and then improves the aperture opening ratio of panel.Additionally, in the display panels of the present invention, shading
The filling part of layer is inserted in the opening formed by chromatic filter layer and the second protective layer, therefore can be reduced because chromatic filter layer is exposed
And cause the risk that liquid crystal cells are contaminated.Meanwhile, the filling part of light shield layer can more solve the reflected light caused by metal level
Problem, and lifted contrast.Furthermore, light shield layer also includes a supporting part, and which more can be by shape between first substrate and second substrate
Into a predetermined space for arranging liquid crystal cells, and need not another supporting part be set in addition.Accordingly, light shield layer of the invention may replace
Black matrix" is simultaneously simultaneously as the support component between first substrate and second substrate.
In an enforcement aspect of the present invention, display panels can also include an active member area.Wherein, active member
Area includes：One grid layer, an insulating barrier, semi-conductor layer and the source/drain electrode layer formed by metal level, wherein grid
Layer is provided on first substrate, and insulating barrier is provided on first substrate and covers grid layer, and semiconductor layer is provided on insulating barrier,
And source/drain layer is provided at the opposite sides on semiconductor layer.More specifically, the display panels of this enforcement aspect,
The filling part of light shield layer is the caused liquid of the exposed institute of chromatic filter layer in the source/drain layer region for solving active member area
The problem that brilliant unit is contaminated.
In this enforcement aspect, the supporting part of light shield layer is preferably corresponding to active member area；And more preferably correspond to half
Conductor layer.Accordingly, the supporting part of light shield layer can reach effect of known black matrix".
Additionally, in this enforcement aspect, first electrode layer is that, used as a common electrode layer, and the second electrode lay is as a picture
Plain electrode layer.Here, common electrode layer can be the plate electrode layer that the art is commonly used, and pixel electrode layer can be led for this technology
The conventional patterned electrode layer in domain, such as rice word electrode or zigzag electrode；However, the present invention is not limited to this.
In another aspect of the present invention, display panels can also include：One insulating barrier, wherein insulating barrier are to set
On first substrate and cover metal level, metal level is that, used as a shared electrode, insulating barrier is to appear with one the 3rd opening
Shared electrode, and the second electrode lay is as a common electrode layer.More specifically, the display panels of this enforcement aspect, hide
The filling part of photosphere is to solve caused exposed with the chromatic filter layer in the shared electrode region of common electrode layer electric connection
The problem that is contaminated of liquid crystal cells.
In this enforcement aspect, display panels also can also include an active member area.Wherein, active member area bag
Include：One grid layer, semi-conductor layer and source/drain electrode layer, wherein grid layer are provided on first substrate, and insulating barrier is to cover
Lid grid layer, semiconductor layer are provided on insulating barrier, and source/drain layer is provided on semiconductor layer.
Additionally, in this enforcement aspect, first electrode layer can electrically connect as a pixel electrode layer and with source/drain layer
Connect.Here, pixel electrode layer can be the plate electrode layer that the art is commonly used, and common electrode layer can be conventional for the art
Patterned electrode layer, such as rice word electrode or zigzag electrode；However, the present invention is not limited to this.
Furthermore, in this enforcement aspect, the supporting part of light shield layer is preferably corresponding to active member area；And more preferably be correspondence
In semiconductor layer.Accordingly, the supporting part of light shield layer can reach effect of known black matrix".
Aforesaid all display panels for implementing aspect, optionally also include：One flatness layer, is provided at colour
Filter layer and first electrode interlayer.Wherein, flatness layer optionally covers the side wall of the first opening of chromatic filter layer.When flat
When smooth layer covers the side wall of the first opening of chromatic filter layer so that when flatness layer is with an opening, the second protective layer is also optional
The side wall of the opening of the covering flatness layer of selecting property.In other enforcement aspects, active member area can be not provided with chromatic filter layer
And flatness layer；Or chromatic filter layer is not provided with active member area and to be provided only with flatness layer electric with first in the first protective layer
Pole interlayer；Or it is provided with chromatic filter layer on the first protective layer in active member area and flatness layer is provided at chromatic filter layer
With first electrode interlayer.
Additionally, in aforesaid all display panels for implementing aspect, the material of light shield layer can be arbitrary absorbable
The material of backlight, such as black polystyrene (Black PS) resin.
Additionally, the present invention more provides a kind of liquid crystal display, including aforesaid display panels；And can also include one
Backlight module, is disposed on below display panels, i.e. first substrate side；And can also include a driver element.Wherein, backlight
Module and driver element can be backlight module known in the art and driver element, therefore will not be described here.
Description of the drawings
It is that the features described above and advantage of the present invention can be become apparent, special embodiment below, and it is detailed to coordinate accompanying drawing to make
Carefully it is described as follows, wherein：
Fig. 1 is the generalized section of the display panels of the embodiment of the present invention 1.
Fig. 2 is the generalized section of the display panels of the embodiment of the present invention 1.
Fig. 3 is the generalized section of the display panels of the embodiment of the present invention 2.
Fig. 4 is the generalized section of the display panels of the embodiment of the present invention 3.
Fig. 5 is the generalized section of the display panels of the embodiment of the present invention 4.
Fig. 6 is the generalized section of the display panels of the embodiment of the present invention 5.
Fig. 7 is the schematic diagram of the liquid crystal display of the embodiment of the present invention 6.
Fig. 8 is the schematic diagram of the mobile phone of the present invention.
Fig. 9 is the schematic diagram of the TV of the present invention.
Figure 10 is the schematic diagram of the tablet PC of the present invention.
Specific embodiment
The following is and embodiments of the present invention are illustrated by particular specific embodiment, the personage for being familiar with this technology can be by this
Content disclosed in description understands other advantages and effect of the present invention easily.The present invention can also pass through other different tools
Body embodiment is implemented or is applied, and the every details in this specification also can not depart from this for different viewpoints and application
Various modifications and change are carried out under the spirit of creation.
Embodiment 1
As shown in figure 1, the display panels of the present embodiment include：One first substrate 11, is provided with one as source above which
The patterning second metal layer 14 of pole/drain electrode；One first protective layer 16, in second metal layer 14, and the first protective layer 16
161a be open using the second metal layer 14 of exposed portion as electrical connection part with one first protective layer first；One colorized optical filtering
Layer 17, on the first protective layer 16, and chromatic filter layer 17 is open 171a to should first with a chromatic filter layer first
The opening 161a of protective layer first；The first electrode layer 181 of one patterning, on chromatic filter layer 17, first electrode layer 181 with
Second metal layer 14 has no electric connection；One second protective layer 19, in first electrode layer 181 and covers chromatic filter layer
The partial sidewall of one opening 171a, and the second protective layer 19 is that, with one second protective layer the first opening 191a, correspondence first is protected
Sheath first is open the 161a and opening 171a of chromatic filter layer first to appear the second metal layer 14 of part；The of one patterning
Two electrode layers 182, are provided on the second protective layer 19 and cover second the first opening 191a of protective layer and the first protective layer first
The partial sidewall of opening 161a, and is electrically connected with the second metal layer 14, the second electrode lay 182 and first electrode layer
181 is to electrically isolate；One second substrate 21, is arranged with respect to first substrate 11；One light shield layer 41, located at first substrate 11 and second
Between substrate 21 and including a filling part 411 and a supporting part 412, filling part 411 is provided at the second opening of the second protective layer 19
In 191, the area of filling part 411 is greater than the area of second protective layer the first opening 191a and the second protective layer can be completely covered
First opening 191a and exposed layer below are other, such as chromatic filter layer 17, the first protective layer 16 or the second electrode lay 182
Exposed part, in other words, filling part 411 can fill up first protective layer the first opening 161a, chromatic filter layer 17 first and be open
171a and second protective layer the first opening 191a.Supporting part 412 is to make formation one between the second protective layer 19 and second substrate 21 pre-
Space 31 is determined so that a liquid crystal cells are in this predetermined space 31, its height is cell-gap (cellgap).Filling part 411
And a connecting portion 413 between supporting part 412, is can be chosen with, connect adjacent filling part 411 and supporting part 412, and can cover
Electrode trace portions.
Next, will be described in the liquid crystal panel structure of the present embodiment.Refer to Fig. 1, the liquid crystal display of the present embodiment
Panel also includes that an active member area T, wherein active member area T include；One patterned first metal layer 12 includes a grid
121st, an insulating barrier 13 (also referred to as gate insulator), a patterned semiconductor layer 15, and as a figure of source/drain
Case second metal layer 14, wherein the first metal layer 12 are provided on first substrate 11, and insulating barrier 13 is provided at first substrate 11
The grid 121 of the first metal layer 12 is gone up and covered, semiconductor layer 15 is provided on insulating barrier 13, and second metal layer 14 is provided at
On semiconductor layer 15.Wherein, a segment distance more apart (is located at semiconductor layer 15 between the source electrode of second metal layer 14 and drain electrode
Opposite sides), to define channel region 144, so far complete the primary structure of a thin film transistor (TFT) active member.Here, actively
Each element manufacture method of element region can adopt known thin film transistor (TFT) technique, therefore will not be described here.
Additionally, as shown in figure 1, the first metal layer 12 more may include in a visible area C-shaped into a shared electrode 122, this
Shared electrode 122 provides share voltage signal and gives the first electrode layer 181.Furthermore, in the insulating barrier 13 for forming active member area T
While, more make insulating barrier 13 cover shared electrode 122.
In the present embodiment, first substrate 11 is that, as an infrabasal plate, which can be a glass substrate, plastic base, silicon substrate
The conventional infrabasal plate material of plate, ceramic substrate or other the art.Additionally, the first metal layer 12 and second metal layer 14
Material can use the art commonly use conductive material, such as metal, alloy, metal-oxide, metal oxynitride or its
The electrode material that his the art is commonly used；And preferably metal material.Particularly, second metal layer 14 can be for one by molybdenum nitride
(MoN) three-decker formed by layer 141, aluminum (Al) layer 142 and molybdenum nitride (MoN) layer 143, as shown in Figure 2；However, in this
In the other embodiment of invention, the first metal layer 12 and second metal layer 14 also can be by single metal materials (for example：Cu) institute's shape
Into.Furthermore, the material of insulating barrier 13, then the gate insulating layer material that the art can be adopted to commonly use, such as silicon nitride (SiNx)
Or silicon oxide (SiOx)。
After the active member for forming active member area T, the first protective layer 16 above the second metal 14, is further coated with.Its
In, the first protective layer 16 more covers visible area C and its insulating barrier 13 in shared electrode 122 simultaneously, and through the art
After conventional Patternized technique, one first protective layer first is formed in the first protective layer 16 and be open 161a and one first protective layer the
Two opening 161b, and an insulating layer openings 131 are formed in insulating barrier 13.First protective layer first is open 161a positioned at active member
Area T, the source/drain part of the second metal 14 of correspondence.First the second opening 161b of protective layer and insulating layer openings 131 are located at can
Vision area C, and correspondence shared electrode 122.It is preferred that the first protective layer second is open the bottom area (diameter) of 161b more than or wait
In the central shaft of the topside area (diameter) of insulating layer openings 131, first the second opening 161b of protective layer and insulating layer openings 131
Line is substantially overlapped.Insulating layer openings 131 can be open when 161b is etched in the first protective layer second and synchronously complete.
After the first protective layer 16 and its associated openings are formed, re-form a chromatic filter layer 17 and be covered in the first protection
Layer 16 it is upper.Similarly, after the Patternized technique that the art is commonly used, form chromatic filter layer the first opening 171a
And one chromatic filter layer second be open 171b.The opening 171a of chromatic filter layer first corresponds to the first protective layer first and is open
161a, makes the source/drain partial denudation of corresponding second metal layer 14；And the opening 171b of chromatic filter layer second is then corresponded to
First the second opening 161b of protective layer and insulating layer openings 131, make corresponding shared electrode 122 exposed.Chromatic filter layer second
Opening 171b can also be either synchronously or asynchronously etched and be completed with first the second opening 161b of protective layer and insulating layer openings 131.Preferably
Ground, the bottom area (diameter) of the opening 171a of chromatic filter layer the firstth are open 161a's more than or equal to the first protective layer first
Topside area (diameter), the bottom area (diameter) of the opening 171b of chromatic filter layer second is more than or equal to the first protective layer second
The topside area (diameter) of opening 161b, the opening 171b of chromatic filter layer second and first the second opening 161b of protective layer and insulation
The central axis of layer opening 131 is substantially overlapped.Here, the technique of chromatic filter layer 17 can adopt the figure that the art is commonly used
Case chemical industry skill, and form the chromatic filter layer 17 with red, green with blue pixel.However, in other embodiment, it is colored
The color of filter layer 17 is not limited to that.
Then, formed patterning first electrode layer 181, wherein first electrode layer 181 be on chromatic filter layer 17,
And in visible area C first electrode layer 181 more to the opening 171b of chromatic filter layer second, the first protective layer second be open 161b and
Insulating layer openings 131 are extended and are electrically connected with shared electrode 122.
Then, the second protective layer 19 is formed, makes the second protective layer 19 cover first electrode layer 181 and 17 table of chromatic filter layer
Face；Recycle already known processes (such as：Gold-tinted lithography process) the second protective layer 19 of etching, form the second protection in active member area T
Second protective layer the first opening 191a of layer 19, second protective layer the first opening 191a correspondences the first protective layer the first opening 161a
And the opening 171a of chromatic filter layer first, to appear the source/drain part of second metal layer 14.It is noted that in order to contract
Little aperture area and guaranteeing etches inclined-plane seriality (relevant with electrode connection yield), and the second protective layer first 191a that is open makes
Designed with lateral off-axis, that is, the second protective layer first central axis of 191a that is open is opened with the chromatic filter layer first of lower section
The central axis non-overlapped (non co axial) of mouth 171a.By Fig. 1, the central shaft of second protective layer the first opening 191a is about slightly toward coloured silk
The left side of the central axis of the opening 171a of color filtering optical layer first so that inclined-plane is continuously and without undercutting (undercut) on the right side of open region
Situation, upper electrode are able to successfully be electrically connected with lower electrode.And inclined-plane is then due to the second protective layer 19 on the left of open region
And first protective layer 16 it is different from the etch-rate of chromatic filter layer 17 (under etching protection layer environment, chromatic filter layer 17
Etch-rate is slower), (the first protective layer first is open to cause the phenomenon that first protective layer the first opening 161a has lateral erosion to produce
The left border of 161a surmounts the left border of the opening 171a of chromatic filter layer first) so that partial colour filter layer 17 is not received
Second protective layer 19 coat and it is exposed outside.It is preferred that the bottom area (diameter) that the second protective layer first is open 191a is less than
Or the topside area (diameter) of the 171a that is open equal to chromatic filter layer first.
Another technique is the technique for omitting first protective layer the first opening 16la.First protective layer 16 initial only first is protected
The opening 161b of sheath second, and first is completed in the lump when second protective layer the first opening 191a of the second protective layer 19 is etched
Protective layer first is open 161a, and in other words the second protective layer first is open the 191a correspondence opening 171a of chromatic filter layer first
(off-axis) synchronously removes the second protective layer 19 and the first protective layer 16, exposed corresponding second metal layer 14.This omits first and protects
The technique of the opening 161a of sheath first still has undercutting and chromatic filter layer 17 not to be coated by the second protective layer 19 and exposed
Situation.
Here, the material of the first protective layer 16, the second protective layer 19 and insulating barrier 13 can be the art commonly use as
The passivation material of silicon oxide or silicon nitride is constituted with single or multiple lift form, and the first protective layer 16, the second protective layer 19 with
The material of insulating barrier 13 can be identical or differs.In the present embodiment, the first protective layer 16, the second protective layer 19 and insulating barrier 13
From identical silicon nitride material；However, in other embodiment, then can select different materials.
Then, as shown in figure 1, forming a second electrode lay 182.In active member area T and visible area C.Active member
In area T, the second electrode lay 182 is open 191a opening extension simultaneously electrically towards the second protective layer first by 19 upper table of the second protective layer
It is connected to second metal layer 14.Wherein, when second metal layer 14 is for by Molybdenum nitride layers 141, aluminium lamination 142 and Molybdenum nitride layers 143
During the electrode layer of the three-decker for being formed, in order to form electrically connecting for preferably the second electrode lay 182 and second metal layer 14
Binding structure, before the second electrode lay 182 is formed, is open prior to first the first opening 161a of protective layer or the second protective layer first
The Molybdenum nitride layers 143 of the superiors are etched to form an opening 1431 to appear after aluminium lamination 142, before re-forming during 191a etch process
The second electrode lay 182 stated, so that the second electrode lay 182 is electrically connected with aluminium lamination 142, as shown in Figure 2.
The second electrode lay 182 of the present embodiment is electrically connected with second metal layer 14, thus the second electrode lay 182 i.e. as
Pixel electrode layer, and first electrode layer 181 is then as common electrode layer, the voltage formation horizontal edge electric field between two electrodes
(fringe field) shows grey-tone image to guide the direction of the liquid crystal cells 2 in predetermined space 31.Here, common electrode layer
(i.e. first electrode layer 181) can be the art commonly use flat board pattern or finger patterns, and pixel electrode layer (i.e. second is electric
Pole layer 182) can be the art commonly use finger patterns,<Word pattern, rice word pattern or saw-tooth like pattern；However, of the invention
It is not limited to that.Additionally, first electrode layer 181 and the material of the second electrode lay 182 can be the art commonly use it is transparent
The transparent electrode material of the metal-oxides such as conductive material, such as ITO, IZO.
Then, a light shield layer 41 is re-formed, which includes a filling part 411 and a supporting part 412.Wherein, filling part 411 is
May be selected in second protective layer the first opening 191a of active member area T or the chromatic filter layer second of visible area C is open
In 171b.Particularly, in active member area T, foregoing partial colour filter layer 17 does not receive the second protective layer 19 or the
Two electrode layers 182 coat and it is exposed 17 composition of chromatic filter layer or impurity will gradually penetrate into liquid crystal cells outside, will cause for a long time
The problem of image branding (imagesticking), 191a and is covered by filling part 411 to be filled in the second protective layer first and be open
In the correlation of lid shared electrode 122, it is able to prevent liquid crystal cells to be subject to polluting for exposed chromatic filter layer 17, while can solve
The metallic reflection light of second metal layer 14 or the first metal layer 12 causes to contrast the problem for declining.It is preferred that being located at active member
411 bottom area of filling part of area T can be completely covered more than second protective layer the first opening 191a topside areas, and its volume
Below second protective layer the first opening 191a topside areas, whole exposed layers not, must especially cover exposed chromatic filter layer 17
To completely cut off the path of its pollution liquid crystal.It is preferred that 411 bottom area of filling part positioned at visible area C is more than shared electrode bottom
Area simultaneously can cover it.In the present embodiment, filling part 411 is inserted in the opening of visible area C simultaneously；However, in other enforcements
In example, the opening of visible area C might not need to arrange this filling part 411.
Additionally, the supporting part 412 of light shield layer 41 be make the second protective layer 19 (more specifically, be the second electrode lay 182)
A predetermined space 31 is formed between second substrate 21 so that a liquid crystal cells are in this predetermined space 31, and form fixed liquid
Brilliant element thickness (cell gap).Additionally, supporting part 412 more can reach effect of known black matrix".Therefore, supporting part 412
Thin film need to be affected to prevent light leakage current from producing corresponding to active member area T, the particularly semiconductor layer 15 of active member area T
The switching characteristic of transistor active member.
Furthermore, in the present embodiment, the material of light shield layer 41 can be arbitrary absorbable backlight and pollute liquid crystal low degree
The black resin of material, such as black polystyrene (BlackPS) resin or the acryl (polymer+ of addition carbon (carbon)
Monomer), however, the present invention is not limited to this.Additionally, the technique of light shield layer 41, can adopt twice light shield technique or half tune
Formula light shield technique.When using twice light shield technique, then filling part 411 can be formed with first light shield first, then with second light
Cover forms supporting part 412；And when using half mode light shield technique, then filling part 411 and supporting part 412 can be formed simultaneously.This
Outward, connecting portion 413 is can be chosen between filling part 411 and supporting part 412, as connection, shading, the effect filled and led up.
In the present embodiment, second substrate 21 is oppositely arranged with first substrate 11, and its material can be the art
Conventional upper substrate material, such as the light-permeable substrate such as glass substrate, quartz base plate, plastic base.Additionally, in second substrate 21 more
One cover electrode (maskingelectrode) 22 can be set, and its material can select the material similar to the second electrode lay 182 to aforesaid first electrode layer 181
Material, cover electrode (maskingelectrode) 22 can cover electrostatic to avoid liquid crystal cells or electrode layer short circuit from damaging.
Additionally, the display panels provided by the present embodiment, be used as planar alignment type (1PS) display floater,
Super planar alignment type (super IPS) display floater is advanced into planar alignment type (advancedsuperIPS)；And especially
It is suitable as on the display floater of middle-size and small-size aforesaid kind.
Embodiment 2
As shown in figure 3, the display panels of the present embodiment include：One first substrate 11, enjoys electrode above which altogether
122；An insulating barrier 13 is covered in shared electrode 122, with an insulating layer openings 131；Arrange one first to protect on insulating barrier 13
Layer 16, is covered in shared electrode 122, and is open 161b to should insulating layer openings 131 with the first protective layer second；One is color
Color filtering optical layer 17, on the first protective layer 16, and chromatic filter layer 17 is with chromatic filter layer the second opening 171b correspondences
First protective layer second opening 161b and insulating layer openings 131；One first electrode layer 181, on chromatic filter layer 17；One
Second protective layer 19, in first electrode layer 181 and covers chromatic filter layer second and is open the partial sidewall of 171b, and second
Protective layer 19 is that second protective layer the second opening 191b is correspondence chromatic filter layer with one second protective layer the second opening 191b
Second is open 171b, first the second opening 161b of protective layer and insulating layer openings 131 to appear shared electrode 122；One second is electric
Pole layer 182, is provided on the second protective layer 19 and covers the side wall of second protective layer the second opening 191b of the second protective layer 19
And be electrically connected with shared electrode 122, the second electrode lay 182 is electrically isolated with first electrode layer 181；One second substrate 21, phase
First substrate 11 is arranged；One light shield layer 41, located between first substrate 11 and second substrate 21 and including a filling part 411 and
Supporting part 412, filling part 411 are provided in the second opening 191b of the second protective layer 19, and coat chromatic filter layer 17 completely
Exposed part, supporting part 412 is to make to form a predetermined space 31 between the second protective layer 19 and second substrate 21 so that a liquid crystal
Unit is in this predetermined space 31.
Next, will be described in the liquid crystal panel structure of the present embodiment.Refer to Fig. 3, the liquid crystal display of the present embodiment
Panel also includes that an active member area T, wherein active member area T include：One grid layer 121, an insulating barrier 13, semi-conductor layer
15th, and a second metal layer 14, wherein grid layer 121 is provided on first substrate 11, and insulating barrier 13 is provided at first substrate 11
Grid layer 121 is gone up and covered, semiconductor layer 15 is provided on insulating barrier 13, and the second metal layer 14 as source/drain is
Opposite sides side on semiconductor layer 15.Wherein, more apart there is a segment distance between the source electrode of second metal layer 14 and drain electrode,
To define channel region 144.Here, each element manufacture method of active member area T can adopt known thin film transistor (TFT) technique,
Therefore will not be described here.
Additionally, as shown in figure 3, the grid layer 121 of active member area T uses same work with the shared electrode 122 of visible area C
Skill.Furthermore, while insulating barrier 13 of active member area T are formed, insulating barrier 13 is more made while covering grid layer 121 and sharing
Electrode 122.
After the active member for forming active member area T, the first protective layer 16 above second metal layer 14, is further coated with.Its
In, the first protective layer 16 more covers visible area C and its insulating barrier 13 in shared electrode 122 simultaneously, and through the art
After conventional Patternized technique, in making visible area C, insulating barrier 13 has an insulating layer openings 131 and has the first protective layer 16
One first protective layer second is open 161b to manifest shared electrode 122, and insulating layer openings 131 and the first protective layer second are open
161b can be completed with step etching, and the bottom area that the first protective layer second is open 161b is pushed up more than or equal to insulating layer openings 131
Portion's area.Insulating layer openings 131 and first protective layer the second opening 161b also asynchronous can be completed, and be completed in insulating barrier 13 by another
Patternized technique afterwards first completes insulating layer openings 131, after complete the first protective layer second then at position thereon and be open 161b.
The central axis that insulating layer openings 131 and the first protective layer second are open 161b is substantially overlapped.After Patternized technique, active element
The first protective layer 16 in part area T is open 161a to manifest second as source/drain with one first protective layer first
Metal level 14.
After the first protective layer 16 and its opening is formed, the chromatic filter layer 17 of patterning is re-formed.Chromatic filter layer 17
A wherein chromatic filter layer first 171a that is open correspond to second metal layer 14；And another chromatic filter layer second is open
171b then corresponds to shared electrode 122, particularly corresponding with aobvious with first the second opening 161b of protective layer and insulating layer openings 131
Dew shared electrode 122.The opening of chromatic filter layer second 171b can be with first the second opening 161b of protective layer and insulating layer openings 131
Either synchronously or asynchronously etching program is completed.It is preferred that chromatic filter layer second is open, 171b bottom areas are protected more than or equal to first
The opening 161b topside areas of sheath second.Then, first electrode layer 181 is formed, wherein first electrode layer 181 is to cover colored filter
Photosphere 17, and the first electrode layer 181 in active member T is more open 171a and the first protective layer first to chromatic filter layer first
Opening 161a is extended and is electrically connected with second metal layer 14.
Then, the second protective layer 19 is formed, makes the second protective layer 19 cover first electrode layer 181 and 17 table of chromatic filter layer
Face；Recycle already known processes (such as：Gold-tinted lithography process) the second protective layer 19 of etching, so that one second protection in visible area C
Layer the second opening 191b is able to appear shared electrode 122.It is noted that in order to reduce open region area, the second protective layer
Layout methods of the two opening 191b using the 171b non co axials that are open with chromatic filter layer second, i.e. chromatic filter layer second are open
The central axis of 171b and first protective layer the second opening 161b, insulating layer openings 131 and second protective layer the second opening 191b
Do not overlap, and first protective layer the second opening 161b, insulating layer openings 131 and second protective layer the second opening 191b can be using same
One etch process, the central axis of three are overlapped, and this design makes the second electrode lay being subsequently formed carry out side with shared electrode 122
Galvanotropism connects, and in visible area C, as the second protective layer 19 is different from the etch-rate of chromatic filter layer 17, causes first
The opening 161b of protective layer second and insulating layer openings 131 have the phenomenon of lateral erosion (undercutting) and produce (a left side of the opening 161b of Fig. 2 the 4th
Side part) so that partial colour filter layer 17 not by the second protective layer 19 coat and it is exposed outside.
Then, as shown in figure 3, forming a second electrode lay 182.In visible area C, the second electrode lay 182 is protected by second
19 upper table of sheath extends and is electrically connected to shared electrode 122 towards second protective layer the second opening 191b.
The second electrode lay 182 of the present embodiment is electrically connected with shared electrode 122, thus the second electrode lay 182 i.e. as
Common electrode layer, and first electrode layer 181 is then as pixel electrode layer.Here, common electrode layer (i.e. the second electrode lay 182) can be this
The conventional patterned electrode layer of technical field, and pixel electrode layer (i.e. first electrode layer 181) can be what the art was commonly used
Plate electrode layer (non-patterned electrode layer)；However, the present invention is not limited to this.
Then, a light shield layer 41 is re-formed, which includes a filling part 411 and a supporting part 412.Wherein, filling part 411 is
The second protective layer second located at active member area T and visible area C is open in 191b.Particularly, in visible area C, such as front institute
The partial colour filter layer 17 stated is not coated and exposed problem by the second protective layer 19, by filling part 411 is filled
In the second protective layer second is open 191b and exposed chromatic filter layer 17 is covered, be able to prevent liquid crystal cells to be subject to exposed
Chromatic filter layer 17 pollution, while the reflected light caused by metal level can be solved the problems, such as in active member area T and partly led
The 144 light leakage current problem of channel region of body layer 15.In the present embodiment, filling part 411 also inserts opening for active member area T simultaneously
In mouthful；However, in other embodiment, the opening 191 of active member area T might not need to arrange this filling part 411.
Additionally, the supporting part 412 of light shield layer 41 be make the second protective layer 19 (more specifically, be the second electrode lay 182)
A predetermined space is formed between the second substrate 21 being oppositely arranged so that a liquid crystal cells 31 are in this predetermined space.Additionally,
Supporting part 412 more can reach effect of known black matrix".Therefore, supporting part 412 need to be corresponding to active member area T, particularly
The semiconductor layer 15 of active member area T.
In the present embodiment, the material and its technique of each element is same as Example 1, therefore will not be described here.
Embodiment 3
As shown in figure 4, the structure of the display panels of the present embodiment is same as Example 1, its difference is as follows.
Flatness layer 5 of the display panels of the present embodiment also including a patterning.In visible area C, flatness layer 5 is provided at colorized optical filtering
Between layer 17 and first electrode layer 181.Additionally, chromatic filter layer 17 is formed without on active member area T, the first protective layer 16,
But flatness layer 5 is directly formed on the first protective layer 16.Here, flatness layer 5 can be the material that the art is commonly used, it is such as poly-
(ethylene naphthalate) (PEN), acrylic (PMMA), polyimides (P1), aluminium oxide, the oxide of silicon oxide, or such as nitrogen
Nitride of SiClx etc..
Embodiment 4
As shown in figure 5, the structure of the display panels of the present embodiment is same as Example 1, its difference is：
The display panels of the present embodiment also include a flatness layer 5；And no matter in visible area C and active member area T, flatness layer 5 is equal
Located between chromatic filter layer 17 and first electrode layer 181.Here, the material of flatness layer 5 is identical with described in embodiment 3, therefore
This repeats no more.
Embodiment 5
As shown in fig. 6, the structure of the display panels of the present embodiment is same as Example 1, its difference is as follows.
The display panels of the present embodiment have no chromatic filter layer 17 and the second electrode lay 182 in active member area T, and light shield layer 41 is straight
Connect the channel region 144 of the chromatic filter layer 17, part first electrode layer 181 and semiconductor layer 15 that cover exposed.Here, light shield layer
41 material is identical with described in embodiment 3, therefore be will not be described here.
In Fig. 6, the only profile of a wherein hatching of the display panels an of the present embodiment is to emphasize
Lateral erosion (undercutting) phenomenon between chromatic filter layer 17 and the first protective layer 16.However, in the display panels of the present embodiment,
When other directions are seen, the second electrode lay 182 is still to being open towards the second protective layer first by 19 upper table of the second protective layer
191a openings extend and are electrically connected to second metal layer 14.
Embodiment 6
Liquid crystal display schematic diagrams of the Fig. 7 for the present embodiment, the liquid crystal display 7 of wherein the present embodiment is bag
Include the display panels of previous embodiment 1-5, and the element such as the outside accommodating structure of correlation, driver element, back light unit
Form display device system.
Additionally, the display panels of previous embodiment 1-5 also can be used for producing except other electronics of liquid crystal display
On product, tablet PC 8c shown in TV 8b and Figure 10 shown in mobile phone 8a, Fig. 9 as shown in Figure 8 etc..
Above-described embodiment explanation merely for convenience and illustrate, the interest field advocated of the present invention in vain should be with right
It is defined described in claimed range, rather than is only limitted to above-described embodiment.
Claims (18)
1. a kind of display panels, including：
One first substrate, is provided with a metal level above which；
One first protective layer, on the metal level；
One chromatic filter layer, on first protective layer, and the chromatic filter layer is with one first opening；
One first electrode layer, on the chromatic filter layer；
One second protective layer, in the first electrode layer and cover the chromatic filter layer this first opening partial sidewall,
And second protective layer is with one second opening, second opening to should the first opening appearing the metal level；
One the second electrode lay, on second protective layer and cover second protective layer this second opening side wall and with this
Metal level is electrically connected with；
One second substrate, is arranged with respect to the first substrate；And
One light shield layer, located between the first substrate and the second substrate and including a filling part and a supporting part, the filling part sets
In second opening of second protective layer, and cover the colour for not covered by second protective layer and the second electrode lay
Filter layer, the supporting part make to form a predetermined space so that one between first protective layer or second protective layer and the second substrate
Liquid crystal cells are in the predetermined space.
2. display panels as claimed in claim 1, also including an active member area, the wherein active member area includes：
One grid layer, an insulating barrier, semi-conductor layer and the source/drain electrode layer formed by the metal level, the wherein grid layer set
On the first substrate, the insulating barrier is on the first substrate and covers the grid layer, and the semiconductor layer is located at the insulating barrier
On, and opposite sides of the source/drain layer on the semiconductor layer.
3. display panels as claimed in claim 2, the wherein supporting part of the light shield layer correspond to the semiconductor layer.
4. display panels as claimed in claim 2, the wherein first electrode layer is used as a common electrode layer, and this is second electric
Pole layer is used as a pixel electrode layer.
5. display panels as claimed in claim 1, also include：One insulating barrier, the wherein insulating barrier are located at first base
On plate and the metal level is covered, the metal level used as a shared electrode, share to appear this with one the 3rd opening by the insulating barrier
Electrode, and the second electrode lay is used as a common electrode layer.
6. display panels as claimed in claim 5, also including an active member area, the wherein active member area includes：
, on the first substrate, the insulating barrier is covered for one grid layer, semi-conductor layer and source/drain electrode layer, the wherein grid layer
The grid layer, on the insulating barrier, the source/drain layer is on the semiconductor layer for the semiconductor layer.
7. display panels as claimed in claim 6, the wherein first electrode layer as a pixel electrode layer and with the source
Pole/drain electrode layer is electrically connected with.
8. display panels as claimed in claim 6, the wherein supporting part of the light shield layer correspond to the semiconductor layer.
9. display panels as claimed in claim 1, the wherein material of the light shield layer are a black resin.
10. display panels as claimed in claim 1, also include：One flatness layer, located at the chromatic filter layer with this first
Electrode interlayer.
11. display panels as claimed in claim 2, wherein the active member area are not provided with the chromatic filter layer.
A kind of 12. liquid crystal displays, including：
One driver element；
One back light unit；And
One display panels, including：
One first substrate, is provided with a metal level above which；
One first protective layer, on the metal level；
One chromatic filter layer, on first protective layer, and the chromatic filter layer is with one first opening；
One first electrode layer, on the chromatic filter layer；
One second protective layer, in the first electrode layer and cover the chromatic filter layer this first opening partial sidewall,
And second protective layer is with one second opening, second opening to should the first opening appearing the metal level；
One the second electrode lay, on second protective layer and cover second protective layer this second opening side wall and with this
Metal level is electrically connected with；
One second substrate, is arranged with respect to the first substrate；And
One light shield layer, located between the first substrate and the second substrate and including a filling part and a supporting part, the filling part sets
In second opening of second protective layer, and cover the colour for not covered by second protective layer and the second electrode lay
Filter layer, the supporting part makes to form a predetermined space between second protective layer and the second substrate so that a liquid crystal cells are located at this
In predetermined space.
13. liquid crystal displays as claimed in claim 12, also including an active member area, wherein the active member area wraps
Include：One grid layer, an insulating barrier, semi-conductor layer and the source/drain electrode layer formed by the metal level, the wherein grid
, on the first substrate, the insulating barrier is on the first substrate and covers the grid layer, and the semiconductor layer is exhausted located at this for layer
In edge layer, and the source/drain layer is on the semiconductor layer.
The supporting part of 14. liquid crystal displays as claimed in claim 13, the wherein light shield layer corresponds to the semiconductor layer.
15. liquid crystal displays as claimed in claim 12, also include：One insulating barrier, the wherein insulating barrier located at this first
On substrate and the metal level is covered, used as a shared electrode, the insulating barrier is with one the 3rd opening appearing this altogether for the metal level
Electrode, and the second electrode lay are enjoyed as a common electrode layer.
16. liquid crystal displays as claimed in claim 15, also including an active member area, wherein the active member area wraps
Include：One grid layer, semi-conductor layer and source/drain electrode layer, the wherein grid layer are located on the first substrate, the insulating barrier
The grid layer is covered, on the insulating barrier, the source/drain layer is on the semiconductor layer for the semiconductor layer.
The supporting part of 17. liquid crystal displays as claimed in claim 16, the wherein light shield layer corresponds to the semiconductor layer.
18. liquid crystal displays as claimed in claim 12, also include：One flatness layer, located at the chromatic filter layer with this
One electrode interlayer.
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| CN104216186B (en) * | 2014-08-15 | 2018-01-26 | 京东方科技集团股份有限公司 | Array base palte and its manufacture method, display device |
| CN104299942A (en) | 2014-09-12 | 2015-01-21 | 京东方科技集团股份有限公司 | Via hole manufacturing method, array substrate manufacturing method, array substrate and display device |
| CN105842929B (en) * | 2015-01-12 | 2020-12-29 | 群创光电股份有限公司 | Display device |
| CN105404048A (en) * | 2015-12-17 | 2016-03-16 | 武汉华星光电技术有限公司 | Liquid crystal display apparatus |
| CN105655290B (en) * | 2016-01-05 | 2018-11-23 | 深圳市华星光电技术有限公司 | Liquid crystal display panel, array substrate and its manufacturing method |
| CN106681071A (en) * | 2016-12-29 | 2017-05-17 | 惠科股份有限公司 | Liquid crystal display panel and preparation method thereof |
| CN106842744B (en) * | 2017-02-14 | 2019-10-25 | 深圳市华星光电技术有限公司 | A kind of array substrate and preparation method thereof |
| CN109216902B (en) * | 2017-07-06 | 2021-03-16 | 群创光电股份有限公司 | Microwave device |
| CN108333845A (en) * | 2018-02-26 | 2018-07-27 | 武汉华星光电技术有限公司 | The production method of array substrate, display panel and array substrate |
| CN109712994B (en) * | 2019-01-22 | 2020-08-11 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and manufacturing method thereof |
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| KR101350430B1 (en) * | 2007-04-02 | 2014-01-14 | 엘지디스플레이 주식회사 | An array substrate for IPS-LCD with color-filter on array |
| CN100498487C (en) * | 2007-05-17 | 2009-06-10 | 友达光电股份有限公司 | Liquid crystal panel and its producing method |
| CN102116960B (en) * | 2009-12-30 | 2013-01-09 | 京东方科技集团股份有限公司 | Color film substrate and manufacturing method thereof |
| CN102385196A (en) * | 2011-10-25 | 2012-03-21 | 深圳市华星光电技术有限公司 | Liquid crystal display (LCD) panel and formation method thereof |
| CN202472188U (en) * | 2012-02-06 | 2012-10-03 | 京东方科技集团股份有限公司 | Liquid crystal display device |
| CN202512549U (en) * | 2012-03-23 | 2012-10-31 | 京东方科技集团股份有限公司 | Touch liquid crystal display device, liquid crystal display panel and upper part substrate |
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