CN103901623B - A kind of heat effect for refraction-reflection projection objective controls device - Google Patents
A kind of heat effect for refraction-reflection projection objective controls device Download PDFInfo
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- CN103901623B CN103901623B CN201210581990.3A CN201210581990A CN103901623B CN 103901623 B CN103901623 B CN 103901623B CN 201210581990 A CN201210581990 A CN 201210581990A CN 103901623 B CN103901623 B CN 103901623B
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Abstract
A kind of heat effect for refraction-reflection projection objective controls device, beam generated device is corrected including heat effect, reflecting mirror and light barrier, the numerical aperture of the correction light beam of heat effect correction beam generated device outgoing is consistent with projection objective object-side numerical aperture, correction light beam is incident to first eyeglass of front group of projection objective, on this eyeglass, the position of correction light beam, shape and the position of the effective imaging beam through mask, shape is symmetrical about X-axis, and it is non-overlapping, the light energy on eyeglass is made to be symmetric, the deformation that lens surface produces due to heat effect is also symmetric state, correction light beam is stopped by light barrier, and be not incident in the reflecting mirror group of projection objective.
Description
Technical field
The present invention relates to field of lithography, the heat effect particularly for the refraction-reflection projection objective of lithographic equipment controls device.
Background technology
Along with improving constantly of projection objective resolution, the requirement controlling aberration is more and more stricter.General projection objective controls aberration and relies primarily on adjustment moving element position, and this method can only control low order aberration, for higher order aberratons especially because the asymmetric formula higher order aberratons that causes of heat effect is helpless.
Article Thermal aberration control in SPIE
For low k1 lithography(Proc. Of
SPIE Vol.6520 1-11) in propose one and utilize infrared radiating light to be radiated to treat on prism sheet, to offset owing to rotation asymmetry illuminates, such as 2 grades of illuminations, the astigmatism of generation.For high NA projection objective, light illumination mode can have tradition, annular, two grades, the multiple light illumination mode such as level Four.The heat effect situation of every kind of light illumination mode generation is different, and wherein two grades of light beam centralized lightings illuminated near pupil are in two symmetrical territories, circular cell, so will produce thermic astigmatism in image planes.Using a kind of infra-red radiation generator, the infrared radiating light producing two bundles symmetrical is radiated near pupil, and direction is vertical with two grades of illumination regions, and the illumination region of such pupil location is rotationally symmetrical, can effectively correct the astigmatism of position of focal plane.But, this method is only applicable to full refraction type projection objective system, for refraction-reflection projection objective inapplicable.
United States Patent (USP) US20100172019 proposes a kind of refraction-reflection projection objective, numerical aperture is more than 0.85, image space 26*5.5mm, using off-axis visual field. incident beam hot spot on front group of eyeglass is only distributed in the first half or the lower half of eyeglass, thus cause eyeglass top half and the latter half Energy distribution uneven, it is easy to cause the Asymmetrical deformation of lens surface, produces coma in image planes.
For high NA projection objective, requirement for picture element correction is more and more higher, heat effect is to cause picture element under projection objective duty to produce the major reason of change, if heat effect can effectively be controlled just can effectively reduce the picture element change of object lens under duty, and owing to moving element need not be adjusted, also save eyeglass and adjust the time, improve productivity.But, existing heat effect alignment technique is just for full refraction type projection objective, and correction beam landing position is near pupil.Incident beam may have influence on the face type distribution of follow-up eyeglass.
Summary of the invention
In order to solve the problems referred to above, the present invention proposes a kind of heat effect for refraction-reflection projection objective and controls device, described heat effect controls device and includes that heat effect corrects beam generated device, reflecting mirror and light barrier, the numerical aperture of the correction light beam of heat effect correction beam generated device outgoing is consistent with projection objective object-side numerical aperture, correction light beam is incident to first eyeglass of front group of projection objective, on this eyeglass, the position of correction light beam, shape and the position of the effective imaging beam through mask, shape is symmetrical about X-axis, and it is non-overlapping, the light energy on described eyeglass is made to be symmetric, the deformation that described lens surface produces due to heat effect is also symmetric state, described correction light beam is stopped by light barrier, and be not incident in the reflecting mirror group of projection objective.
Wherein, described heat effect correction beam generated device includes light source cell, even smooth unit, TU Trunk Unit.
Wherein, described light source cell includes light source and condenser lens group, and described light source includes luminescence unit and lamp house.
Wherein, described luminescence unit is mercury lamp, xenon lamp or halogen tungsten lamp, and described lamp house is ellipsoidal mirror.
Wherein, the end of described ellipsoidal mirror is a plane mirror.
Wherein, described condenser lens group is positive light coke mirror group, including an attenuator.
Wherein, described even smooth unit is quartz pushrod.
Wherein, the distance between light beam convergent point and the incident end face of quartz pushrod after described light focusing unit optically focused is less than 8mm.
Wherein, described even smooth unit is the quartz pushrod that incident end face is combined with microlens array.
Wherein, the distance between light beam convergent point and the plane of incidence of microlens array after described light focusing unit optically focused is less than 5mm.
Wherein, described light source cell includes tunable laser sources and expand unit, described in expand the laser beam that LASER Light Source sends by unit and carry out beam-expanding collimation.
Wherein, described even smooth unit includes microlens array.
Wherein, described reflecting mirror is rectangle eyeglass.
Wherein, described light barrier is arranged between front group of battery of lens and the reflecting mirror group of described projection objective.
Wherein, described light barrier is used for absorption correction light beam, it is to avoid produce veiling glare.
nullThe correction light beam light spot shape on front group of the first eyeglass that heat effect according to the present invention controls device is identical with by the light spot shape being incident on the first eyeglass through mask plane，Position is symmetrical about X-axis，Now the light energy on the first eyeglass of object lens is symmetric，Owing to before eyeglass, group uses double gauss structure，Effective imaging beam and heat effect correction light beam by mask are symmetric position on same eyeglass，And there is not the phenomenon of juxtaposition，So on the every a piece of eyeglass of front group，Heat effect correction light beam can effectively change luminous energy distribution situation on eyeglass，The deformation that lens surface produces due to heat effect is symmetric state，This is greatly lowered the eyeglass caused due to off-axis field illumination and is heated the eyeglass asymmetry deformation that inequality causes，Reduce focal plane coma，And do not interfere with the distribution situation of effective imaging beam or introduce veiling glare.
Owing to also placed a light barrier between the first mirror group and reflecting mirror group, heat effect correction light beam is prevented to incide reflecting mirror rear surface and cause reflecting mirror deformation.
The heat effect alignment technique that the present invention proposes for having the refraction-reflection projection objective of two panels reflecting mirror, the correction light beam produced by Optical devices, be incident on front group, before only changing, the face type distribution of group eyeglass, does not affect eyeglass below.
Accompanying drawing explanation
Can be described in detail by invention below about the advantages and spirit of the present invention and institute's accompanying drawings is further understood.
Fig. 1 show the heat effect according to the present invention and controls the structural representation that device is used in combination with refraction-reflection projection objective；
Fig. 2 show the structural representation of heat effect correction beam generated device according to an embodiment of the present invention；
Fig. 3 show the structural representation of the even smooth unit according to another embodiment of the present invention；
Fig. 4 show the structural representation of the heat effect correction beam generated device according to another embodiment of the present invention.
Detailed description of the invention
Describe the specific embodiment of the present invention below in conjunction with the accompanying drawings in detail.
Fig. 1 show heat effect according to the present invention and controls the structural representation that device is used in combination with refraction-reflection projection objective 100, wherein refraction-reflection projection objective 100 include front group 101, reflecting mirror group 102 and after organize 103, wherein before group be class double gauss structure；Heat effect controls device and includes that heat effect correction beam generated device 200(is containing light source, illuminator), reflecting mirror 300 and light barrier 400, reflecting mirror 300 for inciding front group 101 of refraction-reflection projection objective 100 by the heat effect produced by heat effect correction beam generated device 200 correction Beam rotation 90 degree.
Fig. 2 show the structural representation of heat effect correction beam generated device according to an embodiment of the present invention.In the present embodiment, heat effect correction beam generated device 200 includes light source 210, condenser lens group 220, quartz pushrod 230, relay lens group 240 and outlet 250, and wherein condenser lens group 220, quartz pushrod 230 and relay lens group 240 constitute the illuminator of heat effect correction beam generated device.In the present embodiment, light source includes luminescence unit 211 and lamp house 212, luminescence unit 211 can use has the mercury lamp of certain energy or xenon lamp or halogen tungsten lamp, lamp house 212 can be an ellipsoidal mirror, preferably its end is a plane mirror, the most preferred lamp house 212 is the combination of plane mirror and ellipsoidal mirror, luminescence unit is positioned in a focus of ellipsoidal reflector, the light sent from luminescence unit, after ellipsoidal reflector and plane mirror, converges in another focus of ellipsoid.Condenser lens group 220 includes 4-6 sheet optical glass, for positive light coke mirror group, its role is to converge to the light beam being focused at ellipsoid position of focal plane at a certain angle the porch of quartz pushrod 230, condenser lens group 220 preferably includes an attenuator 221, in order to control heat effect correction beam energy by attenuator；Quartz pushrod 230 plays even light action in the present embodiment, through the beam convergence of light focusing unit to quartz pushrod entrance, quartz pushrod entrance outside beam convergence point, its distance preferably smaller than 8mm, light beam is multiple reflections in quartz pushrod, can well realize even light effect；Relay lens group 240 includes 6-12 sheet eyeglass, its role is to incide on reflecting mirror 300 uniform beam through quartz pushrod outgoing through outlet 250 with certain numerical aperture and shape.
Reflecting mirror 300 is for correcting, from the heat effect exporting 250 outgoing, the first eyeglass that Beam rotation 90 degree incides front group 101 of refraction-reflection projection objective 100.The numerical aperture of correction light beam is consistent with projection objective object-side numerical aperture, error is less than 10%, now the light spot shape on the first eyeglass is identical with by the light spot shape being incident on the first eyeglass through mask plane, its position is symmetrical and non-overlapping about X-axis (being perpendicular to optical axis direction) with the effective imaging beam position through mask.Owing to front group 101 uses class double gauss structure, when correcting light beam and passing sequentially through front group of each eyeglass, the position on each eyeglass all and is also symmetric through effective imaging beam of mask.
Light barrier 400 is between front group 101 and reflecting mirror group 102 of projection objective, deviation optical axis is placed, optical axis does not pass through light barrier, the blacking of light barrier surface, its role is to the light energy on absorption correction light beam, it is to avoid correction light beam direct irradiation, in reflecting mirror group 102, causes reflecting mirror deformation, the most also avoid producing veiling glare, system imaging light beam is produced impact.
According to another embodiment of the present invention, difference with a upper embodiment is, have employed structure 2301 that microlens array 232 as shown in Figure 3 combines with quartz pushrod 231 as even smooth unit, in this even smooth unit, microlens array acts on jointly with quartz pushrod, play more preferable even light effect, wherein microlens array 232 is positioned at quartz pushrod 231 leading portion, and its position preferred distance light beam is within light focusing unit post-concentration point 5mm.
According to another embodiment of the present invention, have employed heat effect correction beam generated device as shown in Figure 4 and replace the heat effect correction beam generated device shown in Fig. 2.Wherein light source have employed the adjustable LASER Light Source of luminous energy 501, and illuminator includes expanding unit 502, even smooth unit 503 and relay lens group 504.Expand unit 502 and include 1-3 sheet optical glass, for the laser beam enlarging heavy caliber that will be sent by light source 501, and with nearly collimated light outgoing.Even smooth unit 503 can include one to two panels microlens array, for making by the light beam optical power detection expanding unit outgoing.Relay lens group 504 includes 6-12 sheet eyeglass, for inciding reflecting mirror through the uniform beam of even smooth unit with certain numerical aperture and shape.
In the present embodiment, reflecting mirror 300 uses rectangle eyeglass, and diaphragm is positioned near reflecting mirror.Reflecting mirror 300 will be corrected Beam rotation 90 degree by the heat effect of relay lens group outgoing, organizes on first eyeglass before inciding projection objective.
The preferred embodiment of the simply present invention described in this specification, above example is only in order to illustrate technical scheme rather than limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (13)
1. the heat effect for refraction-reflection projection objective controls a device, and described heat effect controls device bag
Include heat effect correction beam generated device, reflecting mirror and light barrier, described heat effect correction beam generated device bag
Include light source cell, even smooth unit and TU Trunk Unit, the correction light beam of heat effect correction beam generated device outgoing
Numerical aperture is consistent with projection objective object-side numerical aperture, and correction light beam is incident to front group of battery of lens of projection objective
First eyeglass, on this eyeglass, the correction position of light beam, shape with through effective imaging beam of mask
Position, shape symmetrical about X-axis and non-overlapping, make the light energy on described eyeglass symmetrically
Distribution, described lens surface is also symmetric state due to the deformation that heat effect produces, described correction light beam by
Light barrier stops, and is not incident in the reflecting mirror group of projection objective, and wherein, described light barrier is arranged on described
Between front group of battery of lens and the reflecting mirror group of projection objective.
Heat effect the most according to claim 1 controls device, and wherein, described light source cell includes light source
With condenser lens group, described light source includes luminescence unit and lamp house.
Heat effect the most according to claim 2 control device, wherein, described luminescence unit be mercury lamp,
Xenon lamp or halogen tungsten lamp, described lamp house is ellipsoidal mirror.
Heat effect the most according to claim 3 controls device, wherein, the end of described ellipsoidal mirror
Portion is a plane mirror.
5. controlling device according to the heat effect one of claim 2-4 Suo Shu, wherein, described condenser lens group is
Positive light coke mirror group, including an attenuator.
Heat effect the most according to claim 2 controls device, and wherein, described even smooth unit is quartz pushrod.
Heat effect the most according to claim 6 controls device, and wherein, light beam gathers through described condenser lens group
The distance between convergent point and the incident end face of quartz pushrod after light is less than 8mm.
8. control device, wherein, described even smooth unit according to the heat effect one of claim 2 or 7 Suo Shu
The quartz pushrod of microlens array it is combined with for incident end face.
Heat effect the most according to claim 8 controls device, and wherein, light beam gathers through described condenser lens group
The distance between convergent point and the plane of incidence of microlens array after light is less than 5mm.
Heat effect the most according to claim 1 controls device, and wherein, described light source cell includes adjustable
LASER Light Source and expand unit, described in expand the laser beam that LASER Light Source sends by unit and carry out beam-expanding collimation.
11. heat effects according to claim 10 control device, and wherein, described even smooth unit includes micro-
Lens arra.
12. heat effects according to claim 11 control device, and wherein, described reflecting mirror is rectangular mirror
Sheet.
13. heat effects according to claim 1 control device, and wherein, described light barrier is used for absorbing school
Positive light beam, it is to avoid produce veiling glare.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210581990.3A CN103901623B (en) | 2012-12-28 | 2012-12-28 | A kind of heat effect for refraction-reflection projection objective controls device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210581990.3A CN103901623B (en) | 2012-12-28 | 2012-12-28 | A kind of heat effect for refraction-reflection projection objective controls device |
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| CN103901623A CN103901623A (en) | 2014-07-02 |
| CN103901623B true CN103901623B (en) | 2016-08-24 |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105807410B (en) * | 2014-12-31 | 2018-11-09 | 上海微电子装备（集团）股份有限公司 | A kind of refraction-reflection projection objective based on high-NA |
| KR20160091085A (en) * | 2015-01-23 | 2016-08-02 | 삼성전자주식회사 | Cata-dioptric system |
| CN108345179B (en) * | 2017-01-25 | 2019-08-23 | 上海微电子装备（集团）股份有限公司 | A kind of exposure sources and exposure method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH06167705A (en) * | 1992-11-30 | 1994-06-14 | Sanyo Electric Co Ltd | Single plate liquid crystal projector |
| JPH0817719A (en) * | 1994-06-30 | 1996-01-19 | Nikon Corp | Projection aligner |
| US7250237B2 (en) * | 2003-12-23 | 2007-07-31 | Asml Netherlands B.V. | Optimized correction of wafer thermal deformations in a lithographic process |
| CN101000409A (en) * | 2006-12-30 | 2007-07-18 | 上海微电子装备有限公司 | Variable multi-power projection optical system |
| CN101231378B (en) * | 2007-12-21 | 2010-11-10 | 上海微电子装备有限公司 | Complete refraction type projection optical system |
| CN101290389B (en) * | 2008-05-20 | 2010-06-23 | 上海微电子装备有限公司 | All-refraction type projection optical system |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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