CN103885108A - Attenuation band-pass filter and manufacturing method of attenuation band-pass filter - Google Patents
Attenuation band-pass filter and manufacturing method of attenuation band-pass filter Download PDFInfo
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- CN103885108A CN103885108A CN201410144128.5A CN201410144128A CN103885108A CN 103885108 A CN103885108 A CN 103885108A CN 201410144128 A CN201410144128 A CN 201410144128A CN 103885108 A CN103885108 A CN 103885108A
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Abstract
The invention relates to the technical field of optical thin films, in particular to an attenuation band-pass filter. The attenuation band-pass filter comprises a substrate. The structure of the attenuation band-pass filter is alphaM(0.5H L0.5H)m/the substrate/(0.5L H0.5L)n, wherein the (0.5L H0.5L)n is a long-wave-pass filter film system, the (0.5H L0.5H)m is a short-wave-pass filter film system, the M is an attenuation matching layer, the H represents a high refraction index material TiO2 layer lambda/4 in optical thickness, the refraction index of the TiO2 layer ranges from 2.0 to 2.5, the L represents a low refraction index SiO2 layer lambda/4 in optical thickness, the refraction index of the SiO2 layer ranges from 1.4 to 1.6, the alpha is the film thickness index, and the m and the n are integers. The attenuation band-pass filter is used in the technical field of the optical thin films, and has the advantages of being compact in structure, low in manufacturing cost and capable of meeting the attenuation transmittance requirements to a wide extent.
Description
Technical field
The present invention relates to optical film technology field, especially a kind of attenuation band pass filter.
Background technology
Bandpass filter is a kind of application thin-film device very widely, and its Main Function is that light is carried out to spectrum selection, and the light needing is passed through, unwanted light cut-off, and conventional bandpass filter is divided into narrow band pass filter and broad band pass filter.Light beam is by optical filter, to requiring printing opacity energy to decay in specific proportions in the free transmission range of bandpass filter, obtain certain numerical value transmitance stable, the filter effect of good in optical property, we agreement are called attenuation band pass filter this optical filter.
Current attenuation band pass filter, is generally used in combination by bandpass filter and optical attenuator, reach the object that decay filters, but this series products mainly has the following disadvantages:
(1) bandpass filter adds optical attenuator and is used in combination, and increases system burden and makes system not compact, makes the optical loss of system increase simultaneously;
(2) two are used in combination increase manufacturing cost;
(3) transmitance of decay is easier to preparation at 50%～90% optical filter ratio requiring, but the transmitance of decay is difficult to realize at 10%～50% optical filter requiring, for the transmitance of decay lower than 10% just more difficult realization.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of attenuation band pass filter, and this attenuation band pass filter compact conformation, cost of manufacture are low, and satisfied decay transmitance requirement that can be wider.
In order to solve the problems of the technologies described above, the present invention includes substrate, described attenuation band pass filter structure is:
α M (0.5H L0.5H)
m/ substrate/(0.5L H0.5L)
n
Wherein (0.5L H0.5L)
nfor long-pass filter coating system, (0.5H L0.5H)
mfor short-pass filter coating, M is decay matching layer, and H represents that optical thickness is the high-index material TiO of λ/4
2layer, its refractive index is between 2.0-2.5; L represents that optical thickness is the low-refraction SiO of λ/4
2layer, its refractive index is between 1.4-1.6; α is thicknesses of layers coefficient, and m, n are integer.
Preferably, described substrate is glass sheet.
Preferably, described decay matching layer is nickel-chrome layer.
The present invention also provides a kind of preparation method of attenuation band pass filter, comprises the following steps:
Step 1, is coated with respectively long-pass filter coating system and short-pass filter coating system on the two sides of substrate according to conventional thermal evaporation process conditions;
Step 2, is cooled to room temperature by having plated the substrate that long-pass filter coating system and short-pass filter coating be, will plate the one side wiped clean of long-pass filter coating with alcohol ether mixed liquor;
Step 3, is less than and under 9.0E-3Pa environment, toasts substrate and heat to 130 ℃～150 ℃ in vacuum tightness, and continues 40 minutes;
Step 4, is coated with decay matching layer in long-pass filter coating one side, and the time that is coated with is determined according to the evaporation rate of vacuum coating equipment and decay matching layer thickness;
Step 4, takes out substrate cooling, obtains required attenuation band pass filter.
The present invention, under the prerequisite of basic structure that does not change bandpass filters, adds one deck decay matching layer, has realized the object in pass band damping transmitance, and the decay bandpass filters of design has the insensitive characteristic of thickness error, is convenient to preparation.
Accompanying drawing explanation
Fig. 1 is the structural representation of attenuation band pass filter;
Embodiment
Below in conjunction with accompanying drawing, the present invention will be described in detail; cited embodiment; just for helping to understand the present invention; should not be construed as the restriction to invention protection domain; for those skilled in the art; do not departing under the prerequisite of the principle of the invention and thought, also can the present invention improved and be modified, these improvement and modification also fall into the scope of the claims in the present invention protection.
As shown in Figure 1, the present invention includes substrate 1, described substrate 1 is preferably the glass sheet such as K9, BK7, described basic 1 two sides be coated with respectively long-pass filter coating be 2 and short-pass filter coating be 3, described long-pass filter coating is that 2 one side has been coated with decay matching layer 4, described decay matching layer 4 is preferably nickel-chrome layer, forms the attenuation band pass filter of following structure:
α M (0.5H L0.5H)
m/ substrate/(0.5L H0.5L) n
Wherein (0.5L H0.5L)
nfor long-pass filter coating is 2, (0.5H L0.5H)
mfor short-pass filter coating is that 3, M is decay matching layer 4, H represents that optical thickness is the high-index material TiO of λ/4
2layer, its refractive index is between 2.0-2.5; L represents that optical thickness is the low-refraction SiO of λ/4
2layer, its refractive index is between 1.4-1.6; α is thicknesses of layers coefficient, can be according to formula
estimate and verification experimental verification, wherein T
0for the transmitance that attenuation band pass filter of the present invention requires, T
1for the present invention is not coated with the transmitance of decay matching layer 4 front requirements, the extinction coefficient that k is damping layer and the increase along with thickness become large; M, n value, according to the cut-off Depth determination of bandpass filter, are generally got the integer between 5-12.
The preparation method of described attenuation band pass filter, comprises the following steps:
Step 1, be coated with respectively long-pass filter coating according to conventional thermal evaporation process conditions on the two sides of substrate and be 2 and short-pass filter coating be 3;
Step 2, by plated long-pass filter coating be 2 and short-pass filter coating be that 3 substrate 1 is cooled to room temperature, the alcohol ether mixed liquor that is 1:3 by ratio is by the one side wiped clean of long-pass filter coating 2;
Step 3, is less than and under 9.0E-3Pa environment, toasts substrate 1 and heat to 130 ℃～150 ℃ in vacuum tightness, and continues 40 minutes;
Step 4, is that 2 one sides are coated with decay matching layer 4 at long-pass filter coating, and the time that is coated with is determined according to the evaporation rate of vacuum coating equipment and decay matching layer 4 thickness;
Step 4, takes out substrate 1 cooling, obtains required attenuation band pass filter.
Claims (4)
1. attenuation band pass filter, comprises substrate (1), it is characterized in that, described attenuation band pass filter structure is:
α M (0.5H L0.5H)
m/ substrate/(0.5L H0.5L) n
Wherein (0.5L H0.5L)
nfor long-pass filter coating system (2), (0.5H L0.5H)
mfor short-pass filter coating system (3), M is decay matching layer (4), and H represents that optical thickness is the high-index material TiO of λ/4
2layer, its refractive index is between 2.0-2.5; L represents that optical thickness is the low-refraction SiO of λ/4
2layer, its refractive index is between 1.4-1.6; α is thicknesses of layers coefficient, and m, n are integer.
2. attenuation band pass filter according to claim 1, is characterized in that, described substrate (1) is glass sheet.
3. attenuation band pass filter according to claim 1 and 2, is characterized in that, described decay matching layer (4) is nickel-chrome layer.
4. the preparation method of attenuation band pass filter described in claim 1, is characterized in that, comprises the following steps:
Step 1, is coated with respectively long-pass filter coating system (2) and short-pass filter coating system (3) on the two sides of substrate (1) according to conventional thermal evaporation process conditions;
Step 2, is cooled to room temperature by the substrate that has plated long-pass filter coating system (2) and short-pass filter coating system (3), uses alcohol ether mixed liquor by the one side wiped clean of long-pass filter coating (2);
Step 3, is less than and under 9.0E-3Pa environment, toasts substrate (1) and heat to 130 ℃～150 ℃ in vacuum tightness, and continues 40 minutes;
Step 4, is coated with decay matching layer (4) in long-pass filter coating (1) one side, and the time that is coated with is determined according to the evaporation rate of vacuum coating equipment and decay matching layer (4) thickness;
Step 4, takes out substrate (1) and is cooled to normal temperature, obtains required attenuation band pass filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201410144128.5A CN103885108A (en) | 2014-04-10 | 2014-04-10 | Attenuation band-pass filter and manufacturing method of attenuation band-pass filter |
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| CN201410144128.5A CN103885108A (en) | 2014-04-10 | 2014-04-10 | Attenuation band-pass filter and manufacturing method of attenuation band-pass filter |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104849788A (en) * | 2015-04-28 | 2015-08-19 | 苏州奥科辉光电科技有限公司 | Somatosensory filter |
| CN109212647A (en) * | 2018-10-31 | 2019-01-15 | 天津津航技术物理研究所 | A kind of adjustable ultra-wide band stop filter of passband |
| CN110927963A (en) * | 2019-11-18 | 2020-03-27 | 中国科学院上海光学精密机械研究所 | Design and preparation method of short-wave broadband cut-off medium-wave transmission film |
| CN111552019A (en) * | 2020-05-29 | 2020-08-18 | 无锡奥夫特光学技术有限公司 | Narrow-band filter with high-quality surface shape deviation |
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| CN203012173U (en) * | 2012-12-17 | 2013-06-19 | 晋谱（福建）光电科技有限公司 | Near infrared narrow-band optical filter used in body sensing recognition system |
| CN203178510U (en) * | 2013-03-29 | 2013-09-04 | 杭州科汀光学技术有限公司 | Cut-off filter |
| CN203786316U (en) * | 2014-04-10 | 2014-08-20 | 江苏北方湖光光电有限公司 | Attenuation band-pass optical filter |
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| CN1955764A (en) * | 2005-10-27 | 2007-05-02 | 亚洲光学股份有限公司 | Three-way optical filter |
| US20110155972A1 (en) * | 2009-12-30 | 2011-06-30 | Hong Tai Trade Limited | One silicon-aluminate light-conversion fluorescence material co-activated with halogen for white-light led |
| CN102590918A (en) * | 2012-03-12 | 2012-07-18 | 杭州麦乐克电子科技有限公司 | 10560 nano bandpass infrared filter and making method of same |
| CN203012173U (en) * | 2012-12-17 | 2013-06-19 | 晋谱（福建）光电科技有限公司 | Near infrared narrow-band optical filter used in body sensing recognition system |
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| CN203786316U (en) * | 2014-04-10 | 2014-08-20 | 江苏北方湖光光电有限公司 | Attenuation band-pass optical filter |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104849788A (en) * | 2015-04-28 | 2015-08-19 | 苏州奥科辉光电科技有限公司 | Somatosensory filter |
| CN109212647A (en) * | 2018-10-31 | 2019-01-15 | 天津津航技术物理研究所 | A kind of adjustable ultra-wide band stop filter of passband |
| CN109212647B (en) * | 2018-10-31 | 2021-05-11 | 天津津航技术物理研究所 | Ultra-wideband cut-off filter with adjustable pass band |
| CN110927963A (en) * | 2019-11-18 | 2020-03-27 | 中国科学院上海光学精密机械研究所 | Design and preparation method of short-wave broadband cut-off medium-wave transmission film |
| CN111552019A (en) * | 2020-05-29 | 2020-08-18 | 无锡奥夫特光学技术有限公司 | Narrow-band filter with high-quality surface shape deviation |
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Application publication date: 20140625 |