CN103881537B - A kind of preparation method of photocuring antistatic coating - Google Patents
A kind of preparation method of photocuring antistatic coating Download PDFInfo
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- CN103881537B CN103881537B CN201210556188.9A CN201210556188A CN103881537B CN 103881537 B CN103881537 B CN 103881537B CN 201210556188 A CN201210556188 A CN 201210556188A CN 103881537 B CN103881537 B CN 103881537B
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Abstract
A preparation method for photocuring antistatic coating, belongs to ultraviolet-curing paint technical field.The present invention adopts the method for radical polymerization, sodium p styrene sulfonate (SSS) and Hydroxyethyl acrylate (HEA) is made to carry out copolymerization, the macromole performed polymer obtained again with acroleic acid esterification, then introduce 3,4-rthylene dioxythiophene and prepare photocurable type antistatic coating.This antistatic coating has good performance in weathering resistance, thermostability, wear resistance, sticking power, all respects such as antistatic, is widely used in the fields such as indicating meter, electrical equipment, Communication Equipment, electronic product.
Description
Technical field
A preparation method for photocuring antistatic coating, belongs to ultraviolet-curing paint field.
Background technology
Antistatic coating is the functional coating having conduction and get rid of accumulate static charge ability.Antistatic coating develops with modern science and technology, about has the developing history of over half a century so far.The 1950's Japan to start to produce with silver system and carbon be main antistatic coating, the sixties American and Britain, Deng state develops antistatic coating in succession, after the eighties, antistatic technology and electric-heating coatings technology obtain and develop rapidly.
Antistatic coating is divided into addition type and eigenmode two class, and eigenmode antistatic coating technology is still immature, and a large amount of antistatic coating used is generally addition type coating at present.Addition type antistatic coating is in nonconducting base-material, add the function that certain conductive filler material realizes static conductive, only have the volume fraction of conductive filler material to reach certain degree and could form conductive network or path, embody the character of conduction, the shortcoming of this method is that the density of conducting coat is large, conducts electricity uneven.The present invention adopts UV-curing technology to synthesize a kind of eigenmode antistatic coating, and can solve the difficult problem that density is large and conduction is uneven, and method is convenient, cost is lower, is widely used in the fields such as indicating meter, electrical equipment, Communication Equipment, electronic product.
Summary of the invention
The object of the invention is to design in sticking power, weathering resistance, wear resistance, thermostability, the all respects such as antistatic have the photocuring eigenmode antistatic coating of better performance, and this antistatic coating is widely used in the fields such as indicating meter, electrical equipment, Communication Equipment, electronic product.
Technical scheme of the present invention: a kind of preparation method of photocuring antistatic coating, concrete steps are:
(1) preparation of sodium p styrene sulfonate (SSS)-Hydroxyethyl acrylate (HEA) performed polymer: add a certain amount of SSS in the there-necked flask that agitator is housed, add appropriate amount of deionized water, stirring makes it dissolve, and starts heating simultaneously; Taking quantitative HEA adds in dropping funnel, n (SSS): n (HEA)=1: 2, then takes the initiator ammonium persulfate accounting for monomer mass mark 5% and add in another dropping funnel.When temperature rises to 70 DEG C, drip HEA and ammonium persulfate solution, controlling rate of addition is that 2 ~ 3s/ drips simultaneously, and reaction 4h terminates, put into baking oven dry solid product, be designated as A.
(2) preparation of performed polymer and acroleic acid esterification reaction product: add a certain amount of product A in the dry there-necked flask that agitator, thermometer are housed, add appropriate amount of deionized water, stirs and makes it dissolve.After it dissolves, add a certain amount of vinylformic acid successively, the tosic acid of monomer mass mark 1.4%, the Resorcinol of 4% and a certain amount of toluene, 110 DEG C of reaction 2h, products therefrom is designated as B.
(3) preparation of the antistatic prepolymer of photocuring: add a certain amount of 3 in the there-necked flask that product B is housed, 4-ethene dioxythiophene (EDOT), the mol ratio of the two is 1: 2, add a certain amount of oxygenant ammonium persulphate, catalyst sulfuric acid iron, Virahol again, constant temperature rapid stirring reaction 24h at 30 DEG C, the mazarine water dispersion obtained is designated as product C.
(4) preparation of photocuring antistatic coating: add appropriate light trigger phenyl two (2 in C; 4; 6-trimethylbenzoyl) phosphine oxide (819), color stuffing, flow agent etc. i.e. obtained eigenmode photocuring antistatic coating, can through uv radiation curing film forming.
Embodiment
Embodiment 1:
In the there-necked flask that agitator is housed, add 5.15g sodium p styrene sulfonate (SSS), add 100g deionized water, stir and make it dissolve, start heating simultaneously; Taking 5.8gHEA adds in dropping funnel, n (SSS): n (HEA)=1: 2, then takes 0.55g ammonium persulphate and add in another dropping funnel.When temperature rises to 70 DEG C, drip HEA and ammonium persulfate solution, controlling rate of addition is that 2 ~ 3s/ drips simultaneously, and reaction 4h terminates, put into baking oven dry solid product, be designated as A.In the dry there-necked flask that agitator, thermometer are housed, add 4.2g product A, add 20g deionized water, stir and make it dissolve.After it dissolves, add 3g vinylformic acid successively, 0.22g tosic acid, 0.2g Resorcinol, 6g toluene, 110 DEG C of reaction 2h, products therefrom is designated as B.7g3 is added in the there-necked flask that product B is housed, 4-ethene dioxythiophene (EDOT), add 2.5g oxygenant ammonium persulphate, 0.005g catalyst sulfuric acid iron, 1.2g Virahol again, constant temperature rapid stirring reaction 24h at 30 DEG C, the mazarine water dispersion obtained is designated as product C.Take 40g product C, in C, add two (2,4, the 6-trimethylbenzoyl) phosphine oxide (819) of 2g light trigger phenyl, i.e. obtained eigenmode photocuring antistatic coating, can through uv radiation curing film forming.
Embodiment 2:
In the there-necked flask that agitator is housed, add 6.18g sodium p styrene sulfonate (SSS), add 120g deionized water, stir and make it dissolve, start heating simultaneously; Taking 6.96gHEA adds in dropping funnel, n (SSS): n (HEA)=1: 2, then takes the initiator ammonium persulfate accounting for monomer mass mark 5% and add in another dropping funnel.When temperature rises to 70 DEG C, drip HEA and ammonium persulfate solution, controlling rate of addition is that 2 ~ 3s/ drips simultaneously, and reaction 4h terminates, put into baking oven dry solid product, be designated as A.In the dry there-necked flask that agitator, thermometer are housed, add 5g product A, add 30g deionized water, stir and make it dissolve.After it dissolves, add 4g vinylformic acid successively, 0.26g tosic acid, 0.25g Resorcinol, 8g toluene, 110 DEG C of reaction 2h, products therefrom is designated as B.8g3 is added in the there-necked flask that product B is housed, 4-ethene dioxythiophene (EDOT), add 2.6g oxygenant ammonium persulphate, 0.01g catalyst sulfuric acid iron, 2.5g Virahol again, constant temperature rapid stirring reaction 24h at 30 DEG C, the mazarine water dispersion obtained is designated as product C.Take 60g product C, in C, add two (2,4, the 6-trimethylbenzoyl) phosphine oxide (819) of 3g light trigger phenyl, i.e. obtained eigenmode photocuring antistatic coating, can through uv radiation curing film forming.
Claims (1)
1. a preparation method for photocuring antistatic coating, is characterized in that, comprises the steps:
(1) preparation of sodium p styrene sulfonate (SSS)-Hydroxyethyl acrylate (HEA) performed polymer: add 5.15g sodium p styrene sulfonate (SSS) in the there-necked flask that agitator is housed, add 100g deionized water, stirring makes it dissolve, and starts heating simultaneously; Taking 5.8gHEA adds in dropping funnel, n (SSS): n (HEA)=1: 2, then takes 0.55g ammonium persulphate and add in another dropping funnel; When temperature rises to 70 DEG C, drip HEA and ammonium persulfate solution, controlling rate of addition is that 2-3s/ drips simultaneously, and reaction 4h terminates, put into baking oven dry solid product, be designated as A;
(2) preparation of performed polymer and acroleic acid esterification reaction product: add 4.2g product A in the dry there-necked flask that agitator, thermometer are housed, add 20g deionized water, stirs and makes it dissolve; After it dissolves, add 3g vinylformic acid, 0.22g tosic acid, 0.2g Resorcinol, 6g toluene successively, 110 DEG C of reaction 2h, products therefrom is designated as B;
(3) preparation of the antistatic prepolymer of photocuring: add 7g3 in the there-necked flask that product B is housed, 4-ethene two thiophene (EDOT), add 2.5g oxygenant ammonium persulphate, 0.005g catalyst sulfuric acid iron, 1.2g Virahol again, constant temperature rapid stirring reaction 24h at 30 DEG C, the mazarine water dispersion obtained is designated as product C;
(4) preparation of photocuring antistatic coating: take 40g product C; two (2,4, the 6-trimethylbenzoyl) phosphine oxide (819) of 2g light trigger phenyl is added in C; i.e. obtained eigenmode photocuring antistatic coating, can through uv radiation curing film forming.
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| CN201210556188.9A CN103881537B (en) | 2012-12-20 | 2012-12-20 | A kind of preparation method of photocuring antistatic coating |
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| CN201210556188.9A CN103881537B (en) | 2012-12-20 | 2012-12-20 | A kind of preparation method of photocuring antistatic coating |
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| CN103881537A CN103881537A (en) | 2014-06-25 |
| CN103881537B true CN103881537B (en) | 2016-02-03 |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1453309A (en) * | 2002-04-22 | 2003-11-05 | 三星电子株式会社 | Photocureable resin composition with antistatic character |
| CN1552781A (en) * | 2003-06-02 | 2004-12-08 | 深圳市海川实业股份有限公司 | Ultraviolet photocurable anti-static paint |
| CN1552778A (en) * | 2003-06-06 | 2004-12-08 | 深圳市海川实业股份有限公司 | Ultraviolet photocurable anti-static printing ink |
| CN101955726A (en) * | 2010-09-29 | 2011-01-26 | 中国科学院长春应用化学研究所 | Aqueous system conductive polyaniline ultraviolet curing antistatic coating and preparation method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001077234A1 (en) * | 2000-04-10 | 2001-10-18 | Sekisui Chemical Co., Ltd. | Composition for antistatic hard coat, antistatic hard coat, process for producing the same, and multilayered film with antistatic hard coat |
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- 2012-12-20 CN CN201210556188.9A patent/CN103881537B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1453309A (en) * | 2002-04-22 | 2003-11-05 | 三星电子株式会社 | Photocureable resin composition with antistatic character |
| CN1552781A (en) * | 2003-06-02 | 2004-12-08 | 深圳市海川实业股份有限公司 | Ultraviolet photocurable anti-static paint |
| CN1552778A (en) * | 2003-06-06 | 2004-12-08 | 深圳市海川实业股份有限公司 | Ultraviolet photocurable anti-static printing ink |
| CN101955726A (en) * | 2010-09-29 | 2011-01-26 | 中国科学院长春应用化学研究所 | Aqueous system conductive polyaniline ultraviolet curing antistatic coating and preparation method thereof |
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