CN103877833A - Treatment method of benzyl chloride, chlorine and hydrogen chloride-containing mixed waste gas - Google Patents
Treatment method of benzyl chloride, chlorine and hydrogen chloride-containing mixed waste gas Download PDFInfo
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- CN103877833A CN103877833A CN201410056418.4A CN201410056418A CN103877833A CN 103877833 A CN103877833 A CN 103877833A CN 201410056418 A CN201410056418 A CN 201410056418A CN 103877833 A CN103877833 A CN 103877833A
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- Prior art keywords
- chlorine
- hydrogen chloride
- solvent
- bian
- waste gas
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- Granted
Links
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 91
- 239000000460 chlorine Substances 0.000 title claims abstract description 91
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 91
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 title claims abstract description 85
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 title claims abstract description 53
- 229910000041 hydrogen chloride Inorganic materials 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000007789 gas Substances 0.000 title claims abstract description 22
- 239000010812 mixed waste Substances 0.000 title abstract description 4
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 title abstract 4
- 229940073608 benzyl chloride Drugs 0.000 title abstract 4
- 239000002904 solvent Substances 0.000 claims abstract description 45
- 239000002912 waste gas Substances 0.000 claims abstract description 33
- 238000000926 separation method Methods 0.000 claims abstract description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 34
- 239000007921 spray Substances 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 31
- 229920006395 saturated elastomer Polymers 0.000 claims description 30
- 239000006096 absorbing agent Substances 0.000 claims description 26
- 238000003795 desorption Methods 0.000 claims description 24
- BQFCCCIRTOLPEF-UHFFFAOYSA-N chembl1976978 Chemical compound CC1=CC=CC=C1N=NC1=C(O)C=CC2=CC=CC=C12 BQFCCCIRTOLPEF-UHFFFAOYSA-N 0.000 claims description 21
- 238000010521 absorption reaction Methods 0.000 claims description 12
- 239000002250 absorbent Substances 0.000 claims description 9
- 230000002745 absorbent Effects 0.000 claims description 9
- 239000007788 liquid Substances 0.000 claims description 9
- 239000007791 liquid phase Substances 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 claims description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 8
- 239000010935 stainless steel Substances 0.000 claims description 8
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 8
- CAHQGWAXKLQREW-UHFFFAOYSA-N Benzal chloride Chemical compound ClC(Cl)C1=CC=CC=C1 CAHQGWAXKLQREW-UHFFFAOYSA-N 0.000 claims description 7
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 7
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims description 6
- 239000004743 Polypropylene Substances 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 claims description 6
- 239000012071 phase Substances 0.000 claims description 6
- 229920001155 polypropylene Polymers 0.000 claims description 5
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 4
- 229940094933 n-dodecane Drugs 0.000 claims description 4
- 238000003672 processing method Methods 0.000 claims description 4
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 claims description 4
- HDMHBHNRWDNNCD-UHFFFAOYSA-N 1-[(2-hydroxyethoxy)methyl]-6-(phenylsulfanyl)thymine Chemical compound OCCOCN1C(=O)NC(=O)C(C)=C1SC1=CC=CC=C1 HDMHBHNRWDNNCD-UHFFFAOYSA-N 0.000 claims description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims description 3
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 235000011187 glycerol Nutrition 0.000 claims description 3
- -1 polypropylene Polymers 0.000 claims description 3
- 239000005049 silicon tetrachloride Substances 0.000 claims description 3
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 claims description 3
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 claims description 3
- 239000000945 filler Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 230000008901 benefit Effects 0.000 abstract description 4
- 238000001179 sorption measurement Methods 0.000 abstract description 2
- 238000005507 spraying Methods 0.000 abstract 3
- 238000004519 manufacturing process Methods 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 5
- 239000000809 air pollutant Substances 0.000 description 5
- 231100001243 air pollutant Toxicity 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 3
- NPDACUSDTOMAMK-UHFFFAOYSA-N 4-Chlorotoluene Chemical compound CC1=CC=C(Cl)C=C1 NPDACUSDTOMAMK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- VEXZGXHMUGYJMC-IGMARMGPSA-N chlorine-35 Chemical compound [35ClH] VEXZGXHMUGYJMC-IGMARMGPSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003344 environmental pollutant Substances 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 231100000719 pollutant Toxicity 0.000 description 2
- AVPYQKSLYISFPO-UHFFFAOYSA-N 4-chlorobenzaldehyde Chemical compound ClC1=CC=C(C=O)C=C1 AVPYQKSLYISFPO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 239000002920 hazardous waste Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003317 industrial substance Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Abstract
The invention belongs to the field of waste gas treatment, and relates to a treatment method of a benzyl chloride, chlorine and hydrogen chloride-containing mixed waste gas. According to the treatment method, the mixed waste gas passes through a benzyl chloride spraying and absorbing tower, a chorine spraying and absorbing tower and a hydrochloric acid spraying and absorbing tower in sequence, and separation of benzyl chloride, chlorine and hydrogen chloride is successfully realized by adsorption of solvents A, B and C. The treatment method has the advantages of simplicity in operation, low treatment cost, high additional value of recovered products, small device investment and the like.
Description
Technical field
The invention belongs to exhaust-gas treatment field, relate to the processing method of a kind of chloride Bian, chlorine and hydrogen chloride mix waste gas.
Background technology
It is a kind of important process in Chemical Manufacture that chlorination replaces, be usually used in the intermediate such as agricultural chemicals, medicine, for example, 4-chloro-benzaldehyde is as a kind of important industrial chemicals, at present conventional process using parachlorotoluene after superchlorination, hydrolysis makes, in this art production process, can produce and have the chlorine Bian of strong and stimulating, tearing property and inorganic chlorine and hydrogen chloride gas, not only environment be caused to serious pollution, more have a strong impact on site operation personnel and resident around.
At present, due to the complicated component of inorganic organic exhaust gas, intractability is large, most of enterprise adopts simple water to absorb or alkali absorbs treatment process, not only weak effect, also can produce a large amount of high slat-containing wastewaters and spent acid simultaneously, belong to hazardous waste, greatly increase the weight of environmental protection pressure and the processing cost of enterprise.Therefore avoid in process of production evaporating, emitting, dripping or leaking of liquid or gas as far as possible, inorganization gas sampling is become in a organized way and focused on after waste gas, reduced the discharge of pollutant.To the inorganic organic mixed waste gas of inevitable generation, must be purified or be recycled.
In addition other treatment technologies, the absorption process of for example burning, active carbon adsorption, compression freezing etc.,, in these methods, most results can only reduce pollutant, and resource rate is low, and processing cost is high, of poor benefits, not only can cause the waste of resource, more aggravate the burden of enterprise.
The key technology of processing organic-inorganic mix waste gas is to be effectively isolated according to the character of each component, substep purifying.Owing to containing more organic impurities in inorganic component, the sour added value of making is very low, can only be as industries such as acid washing phosphorizations.So, in the urgent need to good separating effect, and simple to operate, the treatment process that resource purity is high, one-time investment is little, can avoid the pollution to environment on the one hand, even can bring profit for enterprise on the other hand.
Summary of the invention
The technical issues that need to address of the present invention are: for current chloride Bian, chlorine, hydrogen chloride emission treatment technology efficiency is low, cost is high, have secondary pollution problems, and provide a kind of method that can process efficiently, at low cost chloride Bian, chlorine, hydrogen chloride emission.
A processing method that contains chlorine Bian, chlorine and hydrogen chloride mix waste gas, the method comprises the following steps:
(1) described contain chlorine Bian, chlorine and hydrogen chloride mix waste gas are passed into the spray absorber take solvent orange 2 A as absorbent, organic component chlorine Bian in mix waste gas is absorbed in liquid phase, separate with chlorine with the inorganic component hydrogen chloride of gas phase, the solvent orange 2 A absorbing after saturated obtains through desorb the chlorine Bian separating again;
(2) remaining inorganic mix waste gas is passed into the spray absorber take solvent B as absorbent, by the chlorine absorption in remaining inorganic mix waste gas in liquid phase, with the HCl separation of gas phase, absorb solvent B after saturated and obtain through desorb the more free chlorine of purifying;
(3) the remaining discarded spray absorber passing into take solvent C as absorbent, absorbs hydrogen chloride gas in liquid phase, absorbs solvent orange 2 A after saturated and obtain through desorb the hydrogen chloride gas of purifying;
Wherein, described solvent orange 2 A is selected from any one in the sub-phosphoric triamide HMPT of hexamethyl, the sub-phosphoric triamide HEPT of Hexaethyl, sulfolane, pertroleum wax; Solvent B is selected from any one in carbon tetrachloride, silicon tetrachloride, n-dodecane; Solvent C is selected from any one in n-butanol, glycerine, diethyl carbonate, trimethyl phosphate.
Described contain chlorine Bian, chlorine and hydrogen chloride mix waste gas consist of monochlor(in)ate benzyl 0.5～4wt%, benzyl dichloride 5～18wt%, chlorine 15～35wt%, hydrogen chloride 43～79.5wt%.
Described spray absorber is packed tower, and filler material is any one in pottery, polypropylene PP, stainless steel; Sprinkle density scope is 4～8m
3/ (m
2, h).
In the inventive method, the spray temperature of solvent orange 2 A is 30～50 ℃.
In the inventive method, absorb after solvent orange 2 A heating desorption after saturated goes out chlorine Bian and recycle, wherein, monochlor(in)ate Bian desorption temperature is 175～185 ℃, and dichloride Bian desorption temperature is 200～210 ℃.Absorb after solvent B heating desorption after saturated goes out chlorine and recycle, desorption temperature is 50～80 ℃; The NaOH aqueous solution that the chlorine obtaining is 6～15wt% through concentration absorbs prepares clorox.The solvent C heating desorption absorbing after saturated goes out hydrogen chloride, and desorption temperature is 50～70 ℃, and the hydrogen chloride of gained absorbs and makes hydrochloric acid through falling liquid film water.
Method of the present invention, the chlorine Bian of recovery can be back to production, and hypochlorite and hydrochloric acid can be used as technical-grade hydrochloric acid.
Beneficial effect:
(1) the inventive method is comformed in multi-solvent, select again the combination of solvent orange 2 A, B, C, adopt multistage substep to absorb chloride Bian, chlorine, hydrogen chloride emission, the method can effectively realize separating of organic component chlorine Bian and inorganic component, and separation between two kinds of inorganic components, exhaust-gas treatment is thorough, can all realize resource and reclaim, and organic efficiency is high.
(2) solvent for use of the present invention can recycle, non-secondary pollution, and operating cost is low.
(3) to reclaim the reagent added value obtaining high in the present invention, avoided the wasting of resources, has obvious economic benefit.
(4) the invention provides one and process efficiently, at low cost chloride Bian, chlorine, hydrogen chloride emission, there is the advantages such as simple to operate, processing cost is low, reclaims added value of product high, and plant investment is little.
Accompanying drawing explanation
A kind of process flow figure that contains chlorine Bian, chlorine and hydrogen chloride mix waste gas of Fig. 1 the present invention.
The specific embodiment
Following examples contain the processing of chlorine Bian, chlorine and hydrogen chloride mix waste gas by the following method:
(1) described contain chlorine Bian, chlorine and hydrogen chloride mix waste gas are passed into the spray absorber take solvent orange 2 A as absorbent, organic component chlorine Bian in mix waste gas is absorbed in liquid phase, separate with chlorine with the inorganic component hydrogen chloride of gas phase, the solvent orange 2 A absorbing after saturated obtains through desorb the chlorine Bian separating in rectifying column;
(2) remaining inorganic mix waste gas is passed into the spray absorber take solvent B as absorbent, by the chlorine absorption in remaining inorganic mix waste gas in liquid phase, with the HCl separation of gas phase, absorb solvent B after saturated and obtain through desorb the free chlorine of purifying in rectifying column; The NaOH aqueous solution that the chlorine obtaining is 6～15wt% through concentration absorbs prepares clorox.
(3) the remaining discarded spray absorber passing into take solvent C as absorbent, absorbs hydrogen chloride gas in liquid phase, absorbs solvent orange 2 A after saturated and obtain through desorb in stripping vessel the hydrogen chloride gas of purifying; The hydrogen chloride of gained absorbs and makes hydrochloric acid through falling liquid film water.
Embodiment 1
Process and contain chlorine Bian, chlorine and hydrogen chloride mix waste gas according to the method described above.The main device that the present embodiment adopts comprises: Bian chlorine spray absorber, chlorine spray absorber, hydrochloric acid spray absorber, be stainless steel packed tower, and ceramic packing is inside housed.Sprinkle density is respectively 4m
3/ (m
2, h), 5m
3/ (m
2, h), 4m
3/ (m
2, h).
Contain consisting of of chlorine Bian, chlorine and hydrogen chloride mix waste gas: monochlor(in)ate benzyl 0.5%(mass fraction), benzyl dichloride 18%(mass fraction), chlorine 30%(mass fraction), hydrogen chloride 52.5%(mass fraction).
Solvent for use A is the sub-phosphoric triamide of HMPT(hexamethyl), its spray temperature is 40 ℃.Solvent B is silicon tetrachloride; Solvent C is n-butanol.
Absorb the solvent orange 2 A desorb in rectifying column after saturated, do not get 175 ℃ of cuts and 200 ℃ of cuts, obtaining respectively product purity is 95% monochlor(in)ate Bian, 98% dichloride Bian, and the HMPT after desorb is cycled to used in Bian chlorine spray-absorption, and monochlor(in)ate Bian and the dichloride Bian of preparation can be back to production; Absorb the solvent B desorb in rectifying column after saturated, desorption temperature is 50 ℃, and after desorb, free purity of chlorine gas feeding reaches 99%, and the NaOH solution that the absorption alkali lye of selecting is 6%, makes liquor natrii hypochloritis; Absorb the solvent C desorb in stripping vessel after saturated, desorption temperature is 60 ℃, adopts falling liquid film water to absorb the hydrochloric acid of making 31%, its quality meet GB320 ?1993 technical requirements.Exhaust emissions after treatment meets " discharge standard of air pollutants " (GB16297 ?1996) secondary standard.
Embodiment 2
Process and contain chlorine Bian, chlorine and hydrogen chloride mix waste gas according to the method described above.The main device that the present embodiment adopts comprises: Bian chlorine spray absorber, chlorine spray absorber, hydrochloric acid spray absorber, be stainless steel packed tower, and stainless steel helices is inside housed, sprinkle density is respectively 8m
3/ (m
2, h), 6m
3/ (m
2, h), 8m
3/ (m
2, h).
Contain consisting of of chlorine Bian, chlorine and hydrogen chloride mix waste gas: monochlor(in)ate benzyl 3.5%(mass fraction), benzyl dichloride 15%(mass fraction), chlorine 35%(mass fraction), hydrogen chloride 46.5%(mass fraction).
Solvent for use A is sulfolane, and its spray temperature is 30 ℃; Solvent B is carbon tetrachloride; Solvent C is diethyl carbonate.
Absorb the solvent orange 2 A desorb in rectifying column after saturated, do not get 180 ℃ and 205 ℃ of cuts, obtaining respectively product purity is 97% monochlor(in)ate Bian, 99% dichloride Bian, and the HMPT after desorb is cycled to used in Bian chlorine spray-absorption, and monochlor(in)ate Bian and the dichloride Bian of preparation can be back to production; The solvent B desorption temperature absorbing after saturated is 60 ℃, and after desorb, free purity of chlorine gas feeding reaches 99%, and the NaOH solution that the absorption alkali lye of selecting is 10%, makes liquor natrii hypochloritis; The solvent C desorption temperature absorbing after saturated is 60 ℃, adopts falling liquid film water to absorb the hydrochloric acid of making 31%, its quality meet GB320 ?1993 technical requirements.Exhaust emissions after treatment meets " discharge standard of air pollutants " (GB16297 ?1996) secondary standard.
Embodiment 3
Process and contain chlorine Bian, chlorine and hydrogen chloride mix waste gas according to the method described above.The main device that the present embodiment adopts comprises: chlorine spray absorber, chlorine spray absorber, hydrochloric acid spray absorber, be stainless steel packed tower, and stainless steel helices is inside housed, sprinkle density is respectively 4m
3/ (m
2, h), 6m
3/ (m
2, h), 6m
3/ (m
2, h).
Contain consisting of of chlorine Bian, chlorine and hydrogen chloride mix waste gas: monochlor(in)ate benzyl 4%(mass fraction), benzyl dichloride 12%(mass fraction), chlorine 17%(mass fraction), hydrogen chloride 67%(mass fraction).
Solvent for use A is the sub-phosphoric triamide of HEPT(Hexaethyl), its spray temperature is 40 ℃; Solvent B is n-dodecane; Solvent C is glycerine.
Absorb the solvent orange 2 A desorb in rectifying column after saturated, do not get 175 ℃ and 205 ℃ of cuts, obtaining respectively product purity is 96% monochlor(in)ate Bian, 99% dichloride Bian, and the HMPT after desorb is cycled to used in Bian chlorine spray-absorption, and monochlor(in)ate Bian and the dichloride Bian of preparation can be back to production; The solvent B desorption temperature absorbing after saturated is 80 ℃, and after desorb, free purity of chlorine gas feeding reaches 98%, and the NaOH solution that the absorption alkali lye of selecting is 8%, makes liquor natrii hypochloritis; The solvent C desorption temperature absorbing after saturated is 60 ℃, adopts falling liquid film water to absorb the hydrochloric acid of making 31%, its quality meet GB320 ?1993 technical requirements.Exhaust emissions after treatment meets " discharge standard of air pollutants " (GB16297 ?1996) secondary standard.
Embodiment 4
Process and contain chlorine Bian, chlorine and hydrogen chloride mix waste gas according to the method described above.The main device that the present embodiment adopts comprises: Bian chlorine spray absorber, chlorine spray absorber, hydrochloric acid spray absorber, and in-built polypropylene (PP), sprinkle density is respectively 5m
3/ (m
2, h), 7.5m
3/ (m
2, h), 7m
3/ (m
2, h).
Contain consisting of of chlorine Bian, chlorine and hydrogen chloride mix waste gas: monochlor(in)ate benzyl 0.5%(mass fraction), benzyl dichloride 5%(mass fraction), chlorine 15%(mass fraction), hydrogen chloride 79.5%(mass fraction).
Solvent for use A is pertroleum wax, and its spray temperature is 45 ℃; Solvent B is carbon tetrachloride; Solvent C is trimethyl phosphate.
Absorb the solvent orange 2 A desorb in rectifying column after saturated, do not get 180 ℃ and 200 ℃ of cuts, obtaining respectively product purity is 98% monochlor(in)ate Bian, 97% dichloride Bian, can reuse and production; The solvent B desorption temperature absorbing after saturated is 60 ℃, and after desorb, free purity of chlorine gas feeding reaches 99%, and the NaOH solution that the absorption alkali lye of selecting is 15%, makes liquor natrii hypochloritis; The solvent C desorption temperature absorbing after saturated is 70 ℃, adopts falling liquid film water to absorb the hydrochloric acid of making 31%, its quality meet GB320 ?1993 technical requirements.Exhaust emissions after treatment meets " discharge standard of air pollutants " (GB16297 ?1996) secondary standard.
Embodiment 5
Process and contain chlorine Bian, chlorine and hydrogen chloride mix waste gas according to the method described above.The main device that the present embodiment adopts comprises: Bian chlorine spray absorber, chlorine spray absorber, hydrochloric acid spray absorber, be stainless steel packed tower, and in-built ceramic packing, sprinkle density is respectively 6m
3/ (m
2, h), 5m
3/ (m
2, h), 5.5m
3/ (m
2, h).
Contain consisting of of chlorine Bian, chlorine and hydrogen chloride mix waste gas: monochlor(in)ate benzyl 4%(mass fraction), benzyl dichloride 18%(mass fraction), chlorine 35%(mass fraction), hydrogen chloride 46.5%(mass fraction).
Solvent for use A is sulfolane, and its spray temperature is 30 ℃; Solvent B is n-dodecane; Solvent C is n-butanol.
Absorb the solvent orange 2 A desorb in rectifying column after saturated, do not get 185 ℃ and 210 ℃ of cuts, obtaining respectively product purity is 95% monochlor(in)ate Bian, 98% dichloride Bian, can reuse and production; The solvent B desorption temperature absorbing after saturated is 80 ℃, and after desorb, free purity of chlorine gas feeding reaches 99%, and the NaOH solution that the absorption alkali lye of selecting is 10%, makes liquor natrii hypochloritis; The solvent C desorption temperature absorbing after saturated is 60 ℃, adopts falling liquid film water to absorb the hydrochloric acid of making 31%, its quality meet GB320 ?1993 technical requirements.Exhaust emissions after treatment meets " discharge standard of air pollutants " (GB16297 ?1996) secondary standard.
Claims (7)
1. contain a processing method for chlorine Bian, chlorine and hydrogen chloride mix waste gas, it is characterized in that the method comprises the following steps:
(1) described contain chlorine Bian, chlorine and hydrogen chloride mix waste gas are passed into the spray absorber take solvent orange 2 A as absorbent, organic component chlorine Bian in mix waste gas is absorbed in liquid phase, separate with chlorine with the inorganic component hydrogen chloride of gas phase, the solvent orange 2 A absorbing after saturated obtains through desorb the chlorine Bian separating again;
(2) remaining inorganic mix waste gas is passed into the spray absorber take solvent B as absorbent, by the chlorine absorption in remaining inorganic mix waste gas in liquid phase, with the HCl separation of gas phase, absorb solvent B after saturated and obtain through desorb the more free chlorine of purifying;
(3) the remaining discarded spray absorber passing into take solvent C as absorbent, absorbs hydrogen chloride gas in liquid phase, absorbs solvent orange 2 A after saturated and obtain through desorb the hydrogen chloride gas of purifying;
Wherein, described solvent orange 2 A is selected from any one in the sub-phosphoric triamide HMPT of hexamethyl, the sub-phosphoric triamide HEPT of Hexaethyl, sulfolane, pertroleum wax; Solvent B is selected from any one in carbon tetrachloride, silicon tetrachloride, n-dodecane; Solvent C is selected from any one in n-butanol, glycerine, diethyl carbonate, trimethyl phosphate.
2. method according to claim 1, it is characterized in that described contain chlorine Bian, chlorine and hydrogen chloride mix waste gas consist of monochlor(in)ate benzyl 0.5～4wt%, benzyl dichloride 5～18wt%, chlorine 15～35wt%, hydrogen chloride 43～79.5wt%.
3. method according to claim 1, is characterized in that described spray absorber is packed tower, and filler material is any one in pottery, polypropylene PP, stainless steel; Sprinkle density scope is 4～8m
3/ (m
2, h).
4. method according to claim 1, the spray temperature that it is characterized in that solvent orange 2 A is 30～50 ℃.
5. method according to claim 1, is characterized in that absorbing after solvent orange 2 A heating desorption after saturated goes out chlorine Bian and recycles, and wherein, monochlor(in)ate Bian desorption temperature is 175～185 ℃, and dichloride Bian desorption temperature is 200～210 ℃.
6. method according to claim 1, is characterized in that absorbing after solvent B heating desorption after saturated goes out chlorine and recycles, and desorption temperature is 50～80 ℃; The NaOH aqueous solution that the chlorine obtaining is 6～15wt% through concentration absorbs prepares clorox.
7. method according to claim 1, the solvent C heating desorption that it is characterized in that absorbing after saturated goes out hydrogen chloride, and desorption temperature is 50～70 ℃, and the hydrogen chloride of gained absorbs and makes hydrochloric acid through falling liquid film water.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410056418.4A CN103877833B (en) | 2014-02-19 | 2014-02-19 | The processing method of a kind of chloride Bian, chlorine and hydrogen chloride mix waste gas |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410056418.4A CN103877833B (en) | 2014-02-19 | 2014-02-19 | The processing method of a kind of chloride Bian, chlorine and hydrogen chloride mix waste gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103877833A true CN103877833A (en) | 2014-06-25 |
| CN103877833B CN103877833B (en) | 2015-11-04 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN106925079A (en) * | 2017-03-17 | 2017-07-07 | 烟台国邦化工机械科技有限公司 | One kind reclaims HCl and Cl2Apparatus and method |
| CN111111411A (en) * | 2019-12-31 | 2020-05-08 | 南京工大环境科技有限公司 | Treatment method of chlorotoluene rectification tail gas |
| CN111333032A (en) * | 2020-03-12 | 2020-06-26 | 江苏维尤纳特精细化工有限公司 | Environment-friendly recovery method of hydrogen chloride tail gas in chlorothalonil production |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104478151A (en) * | 2014-12-18 | 2015-04-01 | 重庆海洲化学品有限公司 | Environment-friendly treatment method of caustic-soda-containing sodium hypochlorite waste liquor |
| CN104478151B (en) * | 2014-12-18 | 2016-08-24 | 重庆海洲化学品有限公司 | Environment-friendly treatment method containing Caustic soda sodium hypochlorite waste liquid |
| CN106925079A (en) * | 2017-03-17 | 2017-07-07 | 烟台国邦化工机械科技有限公司 | One kind reclaims HCl and Cl2Apparatus and method |
| CN111111411A (en) * | 2019-12-31 | 2020-05-08 | 南京工大环境科技有限公司 | Treatment method of chlorotoluene rectification tail gas |
| CN111333032A (en) * | 2020-03-12 | 2020-06-26 | 江苏维尤纳特精细化工有限公司 | Environment-friendly recovery method of hydrogen chloride tail gas in chlorothalonil production |
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