CN103854723A

CN103854723A - Device with orderly-conductive film

Info

Publication number: CN103854723A
Application number: CN201410058174.3A
Authority: CN
Inventors: 杨柏儒; 韩宋佳; 谢汉萍
Original assignee: National Sun Yat Sen University
Current assignee: National Sun Yat Sen University
Priority date: 2014-02-20
Filing date: 2014-02-20
Publication date: 2014-06-11
Anticipated expiration: 2034-02-20
Also published as: CN103854723B

Abstract

Disclosed is a device with an orderly-conductive film. The device comprises a substrate and the conductive film arranged on the substrate, wherein the conductive film has a certain picture structure and is formed by orderly distributing conductive fillers. Compared with a traditional conductive film with conductive fillers irregularly distributed, the light transmittance of the transparent conductive film structure can reach 95% or higher, the square resistance value is lower than 45 omega, conductivity is doubled, and therefore the good light-admitting quality and good conductivity can be achieved at the same time. The manufacturing process of the device is simpler, manufacturing cost can be effectively reduced, good performance of the device can be guaranteed through the good light-admitting quality and good conductivity, and large-size flexible devices can be manufactured as well.

Description

A kind of device of applying orderly conductive film

Technical field

The present invention relates to a kind of device of applying orderly conductive film.

Background technology

Transparent conductive film refers to when having superior electrical conductivity energy to have the film of higher light transmittance at visible light wave range.Often be applied to contact panel, the transparency electrode of solar film battery, flat-panel monitor, can electroluminescence device etc.And the advantage such as along with various devices are towards the development of lightening, flexibleization, flexible transparent conductive film is owing to having flexible, frivolous and obtain the extensive concern of all circles.

Making at present transparent conductive film generally adopts metal-oxide film to do conductive coating structure, applying maximum is that ITO is indium zinc metal oxide, shows to form the conductive indium-zinc oxide film of one deck by the method for evaporation or sputter at transparent glass or plastic.But whole coating process need to carry out under condition of high vacuum degree, and coating temperature and after annealing all will at high temperature carry out, very high to equipment requirement.And metal oxide is in the time being subject to extraneous effect of stress or bending, is easy to be damaged, and has limited its development in flexible device field.

Now mainly contain for the electric conducting material of making transparent conductive film: metal nanometer line, metal nanoparticle, conducting high polymers thing, Graphene, carbon nano-tube etc.The transparent conductive film that wherein adopts linear conductance filler to make has excellent electric conductivity and light transmittance, after repeatedly bending, still can keep lower sheet resistance value.Therefore there are most potentiality and substitute ITO for making transparent conductive film.

In traditional transparent conductive film, linear conductance filler forms network configuration by random and realizes electric conductivity, and as shown in Figure 6 and Figure 7, therefore conductive layer need to have and reaches a certain amount of linear conductance filler and have lower sheet resistance to guarantee it.But increasing of linear conductance filer content can cause that film light transmittance declines, mist degree improves, and affects using value.Therefore need a kind of new technique of making, only use a small amount of linear conductance filler to form the network configuration of orderly distribution, the transparent conductive film of making high transmission rate, low sheet resistance, is widely used for liquid crystal display (LCD), solar cell, microelectronics ITO electropane, photoelectron and various optical field.

Summary of the invention

The invention reside in the shortcoming that overcomes prior art in deficiency, a kind of device of applying orderly conductive film is provided, comprise and be applied to liquid crystal display (LCD), solar cell, microelectronics ITO electropane, photoelectron and various optical field.

The present invention realizes by following technical scheme: a kind of device of applying orderly conductive film, comprises substrate and on this substrate, have the conductive film of certain graphic structure; This conductive film is formed by the orderly cross-distribution of conductive filler.Than prior art, a kind of device of applying orderly conductive film of the present invention, its conductive layer is distributed and forms in order by conductive filler, thereby forms the structure distributing in order.Utilize this technique, only use a small amount of linear conductance filler to form the network configuration of orderly distribution, just can make the transparent conductive film of high transmission rate, low sheet resistance.The light transmittance of membrane of conducting layer can reach more than 95%, and its square resistance is low to moderate 45 Ω/below mouth, can simultaneously realize good light transmission and conductivity.For device, manufacture craft is simpler, can effectively reduce cost of manufacture, can reduce the loss of optics simultaneously, has good optical effect.

Further, described conductive filler is metal nanometer line, carbon nano-tube, metal nanoparticle, Graphene, conducting polymer or oxidized metal.

The present invention also proposes another kind of technical scheme: a kind of device of applying orderly conductive film, the orientation rete of the conductive film and that comprise substrate, has certain graphic structure on this substrate for being orientated; Described conductive film is coated on alignment film and forms in order by conductive filler.

Further, this device comprises insulating barrier, gate electrode, active layer, source electrode and drain electrode, to form tft active matrix; This gate electrode is formed by the orderly conductive film being arranged on this substrate.This conductive film is applied to tft active matrix, replaces traditional ITO to make tft active matrix by the transparent conductive film of orderly distribution, can either effectively reduce cost of manufacture, simultaneously can be for making flexible TFT device.

Further, this device comprises sensor layer and transparent covering layer, to form contact panel; This sensor layer is formed by the orderly conductive film being arranged on this substrate, and this transparent covering layer is arranged on sensor layer.This conductive film is applied to individual layer contact panel, replaces traditional ITO to make contact panel by the transparent conductive film of orderly distribution, can either effectively reduce cost of manufacture, simultaneously can be for making flexible touch screen.

Further, this device comprises the first sensor layer and the second sensor layer that are formed by conductive film respectively; This second sensor layer is arranged on this first sensor layer, and separates by insulating barrier and this first sensor layer; And in this first sensor layer and this second sensor layer, at least one is further coated with transparent covering layer, to form contact panel.This conductive film is applied to double-deck contact panel, replaces traditional ITO to make the sensor layer of contact panel by the transparent conductive film of orderly distribution, can either effectively reduce cost of manufacture, simultaneously can be for making flexible touch screen.

Further, this device comprises anode electrode, organic luminous layer and cathode electrode, to form OLED device; Wherein, in this male or female electrode, have at least and a kind ofly formed by the orderly conductive film being arranged on substrate.This conductive film can be applied to OLED device, makes the transparency electrode of OLED by the transparent conductive film of orderly distribution, can reduce device optical loss, improves equipment luminous efficiency, simultaneously can be for making the flexible OLED device of large scale.

Further, this device comprises bottom electrode, semiconductor diode and top electrodes, to form solar cell; This semiconductor diode is positioned on bottom electrode; This top electrodes is positioned on this semiconductor diode; Wherein, in this bottom electrode and this top electrodes, at least one is formed by the conductive film being arranged on substrate.This conductive film can be applied to solar cell, and the transparent conductive film by orderly distribution is made solar cell, can production large scale flexible solar hull cell, improve the absorption efficiency of solar cell simultaneously.

Further, pick out a transparency electrode by source electrode or the drain electrode of TFT device; Wherein, this transparency electrode is formed by this orderly conductive film.

Further, this device comprises that top electrode, bottom electrode, to form capacitive means, wherein have at least one to be formed by this orderly conductive film in top electrode or bottom electrode.

The pixel electrode of the active driving backboard that further, this transparency electrode is active display.

Further, this transparency electrode is the pixel electrode of the active driving backboard of passive type display.

Further, in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 30 °.

Further, in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 20 °.

Further, in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 10 °.

The present invention also provides a kind of device with electro-magnetic screen function, and it comprises the substrate that needs electromagnetic shielding, is provided with a conductive film on this substrate; This conductive film is distributed and forms in order by conductive filler.By adding the orderly conductive film of last layer, can effectively improve the effectiveness of device.

The present invention also proposes another kind of technical scheme: a kind of device of applying orderly conductive film, comprises substrate and the conductive film on this substrate; This conductive film comprises conductive region and insulating regions, and wherein said two kinds of region substrate surfaces have respectively hydrophily and hydrophobicity, and in described conductive region, conductive filler distributes in order.

Accompanying drawing explanation

Fig. 1 is the section of structure of the tft active matrix of the orderly conductive film of application

Fig. 2 is the section of structure of the contact panel of the orderly conductive film of application

Fig. 3 is the section of structure of the solar cell of the orderly conductive film of application

Fig. 4 is the section of structure of the OLED device of the orderly conductive film of application

Fig. 5 is the section of structure of the LCD device of the orderly conductive film of application

Fig. 6 is the random figure of conductive filler of the prior art

Fig. 7 is the experimental data figure in Fig. 6

Fig. 8 is electric conducting material in the present invention one-way orientation distribution map in the same direction

Fig. 9 is the experimental data figure in Fig. 8

Figure 10 is the two-dimentional square crossing distribution of orientations figure of the electric conducting material in the present invention

Figure 11 is electric conducting material in the present invention two-dimentional crossed orientation distribution map along different directions

Figure 12 is the experimental data figure in Figure 10

Figure 13 is patterned conducting membrane structure schematic diagram

Referring to drawings and the specific embodiments, the invention will be further described.

Embodiment

Embodiment 1:

As shown in Figure 1, orderly conductive film is applied to making tft active matrix by the present invention.This tft active matrix comprises substrate 11, gate electrode 12, insulating barrier 13, active layer 14, source electrode 15, drain electrode 16 and protective layer 17.This gate electrode 12 is arranged on substrate 11, and it is formed by orderly conductive film.This insulating barrier 13 covers on this gate electrode 12.This active layer 14 covers on this insulating barrier 13.This source electrode 15 and this drain electrode 16 are separately positioned on the both sides of the upper surface of this active layer 14.This protective layer 17 covers upper surface and the source electrode 15 of this active layer 14 and drains 16 around.

The manufacture method that orderly conductive film is applied to making tft active matrix is as follows:

By adopting wet method film-forming process that solution is evenly applied to substrate surface, realize subsequently the graphical making of interlayer film by the method for photoetching, development, finally produce tft active matrix.First on the pet substrate cleaning up, form the conductive membrane layer that one deck nano-silver thread distributes in order, wherein in conductive film, contain light-sensitive material, after drying before hot plate, it is exposed, makes grid electrode layer after development, baking-curing; Be coated with layer of cloth organic film, IGZO dissolved glue film, AgNW conducting film, insulating barrier organic film as insulating barrier in grid electrode layer surface distributed subsequently, active layer, source, drain electrode and protective layer.All realize graphical treatment by front baking, photoetching, development, rear baking for every layer.So far, tft active matrix completes.Replace traditional ITO to make tft active matrix by the transparent conductive film of orderly distribution, can either effectively reduce cost of manufacture, simultaneously can be for making flexible TFT device.

In the present embodiment, make orderly conductive film and comprise following seven kinds of methods:

Method one: the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 2 Mayer rods that this suspension is coated on glass substrate.Subsequently glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, makes Nano Silver transparent conductive film.Test sample surface resistivity, light transmittance.After the loss of deduction glass substrate light transmittance, membrane of conducting layer is 95.2% at the light transmittance of 550 nano wave lengths, and the square resistance that four probe method records is 75 Ω/mouths.

Method two: the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 1 Mayer rod that this suspension is coated on glass substrate, glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, and then use Mayer rod along the parallel direction that applies for the first time, this suspension to be coated on the conductive film after dry solidification, and be again transferred on 90 ℃ of hot plates dry solidification 2 minutes, make Nano Silver transparent conductive film.As Fig. 8 and Fig. 9, Fig. 8 is electric conducting material in the present invention one-dimension oriented distribution map in the same direction, and Fig. 9 is the experimental data figure in Fig. 8.Test sample surface resistivity, light transmittance.After the loss of deduction glass substrate light transmittance, membrane of conducting layer is 95.53% at the light transmittance of 550 nano wave lengths, and the square resistance that four probe method records is 78 Ω/mouths.

Method three: the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 1 Mayer rod that this suspension is coated on glass substrate, glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, and then use Mayer rod along vertically applying for the first time direction, this suspension to be coated on the conductive film after dry solidification, and be again transferred on 90 ℃ of hot plates dry solidification 2 minutes, make Nano Silver transparent conductive film.As shown in figure 12, it is the two-dimentional square crossing distribution of orientations figure of the electric conducting material in the present invention.Test sample surface resistivity, light transmittance.After the loss of deduction glass substrate light transmittance, membrane of conducting layer is 96.37% at the light transmittance of 550 nano wave lengths, and the square resistance that four probe method records is 70 Ω/mouths.

Method four: the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 0 Mayer rod that this suspension is coated on glass substrate, glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, and then use Mayer rod along the parallel direction that applies for the first time, this suspension to be coated on the conductive film after dry solidification, and be again transferred on 90 ℃ of hot plates dry solidification 2 minutes, again repeat, after previous step, to make Nano Silver transparent conductive film.Fig. 8 is electric conducting material in the present invention one-dimension oriented distribution map in the same direction.Test sample surface resistivity, light transmittance.After the loss of deduction glass substrate light transmittance, membrane of conducting layer is 94.54% at the light transmittance of 550 nano wave lengths, and the square resistance that four probe method records is 90 Ω/mouths.

Method five: the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 0 Mayer rod that this suspension is coated on glass substrate, glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, and then use Mayer rod along the vertical last direction that applies, this suspension to be coated on the conductive film after dry solidification, and be again transferred on 90 ℃ of hot plates dry solidification 2 minutes, again repeat, after previous step, to make Nano Silver transparent conductive film.Refer to Figure 12, it is the two-dimentional square crossing distribution of orientations figure of the electric conducting material in the present invention.Test sample surface resistivity, light transmittance.After the loss of deduction glass substrate light transmittance, membrane of conducting layer is 95.07% at the light transmittance of 550 nano wave lengths, and the square resistance that four probe method records is 45 Ω/mouths.

Method six: the high molecular polymer of orientation use is dissolved in organic solvent, and is configured to certain density suspension with nano-silver thread.This suspension is coated in substrate surface by mode by wet method film forming, prepares conductive layer.The orientating type high molecular polymer using is chain type high molecular polymer, has cumarin or other photosensitive functional group of light sensitive characteristic on side chain with the carbochain section link of certain length.Utilize high pressure hernia lamp to obtain the UV polarised light of some strength under photosensitive group sensitive wave length by filter and polarizer, and by this UV polarised light vertical sand shooting to substrate surface, irradiate certain time length, will there is cross-linking reaction in photosensitive group in UV light polarization direction, form orientation texture.

Method seven: first alignment liquid is coated to substrate surface, use hairbrush to rub in a certain direction and make alignment film, alignment film surface can be brushed out the microcosmic order structure of arranging in a certain direction because of the filoplume friction of the friction cloth on orientation roller bearing, at alignment film surface-coated conductive nano filler, the conductive filler on alignment film can reach directional orientation effect because of intermolecular force.

As variant embodiment, the direction that electric conducting material is arranged can be along certain angle cross-distribution, as shown in Figure 10 and Figure 11.Figure 10 is that the electric conducting material in the present invention distributes along the two-dimentional crossed orientation of mutually perpendicular direction, and Figure 12 is the experimental data figure in Figure 10.

Refer to following table, it is respectively random, one-dimensional order and intersection when orderly, the comparison sheet of its sheet resistor and light transmittance for conductive filler of conductive film.

?	Random	One-dimensional order	Intersect in order
				Sheet resistor Ω/sq.	75	90	45
Light transmittance %	95.2	94.54	95.07

Embodiment 2:

As shown in Figure 2, orderly conductive film is applied to making contact panel by the present invention.This contact panel comprises two groups of substrates 21 with sensor layer 22; This two group substrate 21 just, to arranging, is provided with a layer insulating 23 between two sensors layer 22, and a substrate that is positioned at upper strata is provided with layer protective layer 24.

While using orderly conductive film to make contact panel, specifically comprise the following steps:

Use the method for wet method film forming to form sensor layer at substrate surface, wherein conductive filler is orderly shape distribution.Then sensor layer is carried out to graphical treatment, for example: at conductive film surface-coated one deck photoresist, through overexposure, development, non-reserve area is come out, then use chemistry or electrochemical method to be eroded, finally wash away photoresist, obtain the sensor layer of predetermined pattern.Fitting in outside touch-control IC by FPC connects.Finally paste optical cement, cover plate as protective layer at substrate surface.Replace traditional ITO to make the sensor layer of contact panel by the transparent conductive film of orderly distribution, can either effectively reduce cost of manufacture, simultaneously can be for making flexible touch screen.

As variant embodiment, the direction that electric conducting material is arranged can be along certain angle cross-distribution, as shown in Figure 10 and Figure 11.Figure 10 is that the electric conducting material in the present invention distributes along the two-dimentional crossed orientation of mutually perpendicular direction, and Figure 12 is the experimental data figure in Figure 10.。

?	Random	One-dimensional order	Intersect in order
				Sheet resistor Ω/sq.	75	90	45

Light transmittance %

95.2

94.54

95.07

Embodiment 3:

As shown in Figure 3, the present invention is applied to orderly conductive film to make OLED device.This OLED device comprises substrate 31, conductive layer 32, organic luminous layer 33, negative electrode 34 and protective layer 35.This conductive layer 32 covers on this substrate 31, and in OLED device, this conductive layer 32 is anode.This organic luminous layer 33 covers on this conductive layer 32.This negative electrode 34 is arranged on this organic luminous layer 33.This protective layer 35 covers on this negative electrode 34.

Orderly conductive film is applied to and makes OLED device, mainly pass through following steps:

Orderly conductive film on substrate is carried out to photolithography patterning processing, subsequently film is cleaned, after plasma treatment, sent in vacuum coating equipment, evaporation OLED organic luminous layer, then evaporation OLED negative electrode.Finally by transmission lever, OLED device is delivered in the glove box that is filled with high pure nitrogen and encapsulated.The transparency electrode of making OLED by the transparent conductive film of orderly distribution, can reduce device optical loss, improves equipment luminous efficiency, simultaneously can be for making the flexible OLED device of large scale.

Embodiment 4:

As shown in Figure 4, orderly conductive film is applied to making solar cell by the present invention.This solar cell comprises substrate 41, conductive layer 42, p type semiconductor layer 43, n type semiconductor layer 44 and metal electrode 45.This conductive layer covers on this substrate.This p type semiconductor layer covers on this conductive layer.This n type semiconductor layer covers on this p type semiconductor layer.This metal electrode is arranged on this n type semiconductor layer.

Orderly conductive film is applied to making solar cell, and concrete steps are as follows:

On transparency carrier, deposit the transparent conductive film that one deck conductive filler distributes in order, form conductive, transparent Ag/PET, then adopt gel method at conductive layer surface deposition one deck pzt thin film, annealed processing, form polycrystalline pzt thin film, then on PZT, use magnetron sputtering deposition P type a-Si, form solar energy film.Finally, adopt magnetron sputtering at film surface depositing electrode Al, make solar cell.Transparent conductive film by orderly distribution is made solar cell, can production large scale flexible solar hull cell, improve the absorption efficiency of solar cell simultaneously.

Embodiment 5:

As shown in Figure 5, the present invention is applied to orderly conductive film to make LCD device.This LCD device comprises two groups of substrates 51 with conductive layer 52, on every layer of conductive layer 52, is coated with respectively oriented film 53; This two group substrate 51 just, to arranging, is provided with a liquid crystal layer 54 between two oriented films 53.

Orderly conductive film is applied to and makes LCD device, and concrete steps are as follows: the pet substrate of the orderly conducting film of surface-coated makes through gold-tinted the Ag electrode that obtains having certain pattern.On the substrate with Ag electrode, apply PI oriented film, and baking and curing.Carry out directional process to completing curing PI oriented film.By upper and lower flexible pet substrate combinations of pairs, make LCD sylphon, then pour into liquid crystal, and sealing sealing.Finally by crossing subsides polaroid, bubble removing processing, makes flexible LCD.The transparency electrode of making LCD by the transparent conductive film of orderly distribution, manufacture craft is simple, and the LCD device making has good optics display effect, simultaneously can be for making flexible LCD device.

Embodiment 6:

This conductive film can be applied to switching device.This device comprises transparency electrode, thin-film transistor and storage capacitance hearth electrode, to form switching device; This thin-film transistor comprises substrate, grid, insulating barrier, active layer, source electrode and drain electrode; Wherein, this transparency electrode is formed by this conductive film.This grid and this storage capacitance hearth electrode are arranged on this substrate and isolation mutually; This insulating barrier covers on this grid and this storage capacitance hearth electrode; This active layer is arranged on this insulating barrier; This source electrode and this drain electrode are arranged on the both sides of this insulating barrier upper surface; This transparency electrode is arranged on this insulating barrier upper surface, and it is positioned on this storage capacitance hearth electrode and with this drain electrode and contacts.This conductive film can be applied to switching device, makes the transparency electrode of LCD by the transparent conductive film of orderly distribution, and manufacture craft is simple, and the switching device making has good switch performance.

Embodiment 7:

Adopt the method for plated film to carry out preliminary treatment to substrate surface, make it form super hydrophilic region and super-hydrophobic region, the HPMC aqueous solution of the Nano silver solution of concentration 10mg/ml and concentration 1wt% is mixed to nano-silver thread average diameter 35nm, length 10um according to the mass ratio of 1:6.The suspension of gained is mixed to 10 minutes on eddy blending machine, thereby obtain finely dispersed suspension.Use No. 0 Mayer rod that this suspension is coated on glass substrate, glass substrate is transferred to rapidly on 90 ℃ of hot plates to dry solidification 2 minutes, and then use Mayer rod along the vertical last direction that applies, this suspension to be coated on the conductive film after dry solidification, and be again transferred on 90 ℃ of hot plates dry solidification 2 minutes, again repeat after previous step, make there is patterned structures Nano Silver transparent conductive film as shown in figure 13, wherein 131 is super-hydrophobic region, surface does not have Nano Silver structure to cover formation insulating regions, 132 is the super hydrophilic region of substrate, formation has the conductive region of ordered structure.

Below be only the preferred embodiment of the present invention, it should be pointed out that above-mentioned preferred implementation should not be considered as limitation of the present invention, protection scope of the present invention should be as the criterion with claim limited range.For those skilled in the art, without departing from the spirit and scope of the present invention, can also make some improvements and modifications, these improvements and modifications also should be considered as protection scope of the present invention.

Claims

1. a device for the orderly conductive film of application, is characterized in that: comprise

Substrate; And

On this substrate, there is the conductive film of certain graphic structure; This conductive film is formed by the orderly cross-distribution of conductive filler.

2. a kind of device according to claim 1, is characterized in that: described conductive filler is metal nanometer line, carbon nano-tube, metal nanoparticle, Graphene, conducting polymer or oxidized metal.

3. a device for the orderly conductive film of application, is characterized in that: the orientation rete of the conductive film and that comprise substrate, has certain graphic structure on this substrate for being orientated; Described conductive film is coated on alignment film and forms in order by conductive filler.

4. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises insulating barrier, gate electrode, active layer, source electrode and drain electrode, to form tft active matrix; This gate electrode is formed by the orderly conductive film being arranged on this substrate.

5. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises sensor layer and transparent covering layer, to form contact panel; This sensor layer is formed by the orderly conductive film being arranged on this substrate, and this transparent covering layer is arranged on sensor layer.

6. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises the first conductive layer and the second conductive layer that are formed by orderly conductive film respectively; This second conductive layer is arranged on this first conductive layer, and separates by insulating barrier and this first conductive layer; And in this first conductive layer and this second conductive layer, at least one is further coated with transparent covering layer, to form contact panel.

7. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises anode electrode, organic luminous layer and cathode electrode, to form OLED device; Wherein, in this male or female electrode, have at least and a kind ofly formed by the orderly conductive film being arranged on substrate.

8. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises bottom electrode, semiconductor diode and top electrodes, to form solar cell; This semiconductor diode is positioned on bottom electrode; This top electrodes is positioned on this semiconductor diode; Wherein, in this bottom electrode and this top electrodes, at least one is formed by the orderly conductive film being arranged on substrate.

9. according to claim 1, a kind of device described in 3, is characterized in that: source electrode or drain electrode by TFT device pick out a transparency electrode; Wherein, this transparency electrode is formed by this orderly conductive film.

10. according to claim 1, a kind of device described in 3, is characterized in that: this device comprises that top electrode, bottom electrode, to form capacitive means, wherein have at least one to be formed by this orderly conductive film in top electrode or bottom electrode.

11. according to claim 1, and a kind of device described in 3, is characterized in that: the pixel electrode of the active driving backboard that this transparency electrode is active display.

12. according to claim 1, and a kind of device described in 3, is characterized in that: this transparency electrode is the pixel electrode of the active driving backboard of passive type display.

13. according to claim 1, and a kind of device in 3 described in arbitrary claim, is characterized in that: in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 30 °.

14. according to claim 1, and a kind of device in 3 described in arbitrary claim, is characterized in that: in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 20 °.

15. according to claim 1, and a kind of device in 3 described in arbitrary claim, is characterized in that: in described conductive filler, exceed 50% conductive filler and the minimum angle of horizontal or vertical direction and be less than 10 °.

16. 1 kinds have the device of electro-magnetic screen function, comprise the substrate that needs electromagnetic shielding, it is characterized in that: on this substrate, be provided with a conductive film; This conductive film is formed by the orderly cross-distribution of conductive filler.

The device of 17. 1 kinds of orderly conductive films of application, is characterized in that: comprise substrate and the conductive film on this substrate; This conductive film comprises conductive region and insulating regions, and wherein said two kinds of region substrate surfaces have respectively hydrophily and hydrophobicity, in described conductive region, and the orderly cross-distribution of conductive filler.