CN103777308B - 光刻机双频激光干涉仪垂向测量光路反射镜调整装置 - Google Patents
光刻机双频激光干涉仪垂向测量光路反射镜调整装置 Download PDFInfo
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- CN103777308B CN103777308B CN201410051637.3A CN201410051637A CN103777308B CN 103777308 B CN103777308 B CN 103777308B CN 201410051637 A CN201410051637 A CN 201410051637A CN 103777308 B CN103777308 B CN 103777308B
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CN201410051637.3A CN103777308B (zh) | 2014-02-14 | 2014-02-14 | 光刻机双频激光干涉仪垂向测量光路反射镜调整装置 |
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CN103777308A CN103777308A (zh) | 2014-05-07 |
CN103777308B true CN103777308B (zh) | 2016-08-24 |
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Families Citing this family (2)
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CN111751949B (zh) * | 2020-07-06 | 2021-09-21 | 中国科学院长春光学精密机械与物理研究所 | 高精度球头光学装调装置 |
CN113917794B (zh) * | 2021-09-22 | 2022-12-06 | 哈尔滨工业大学 | 一种反射镜架及反射装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US6020964A (en) * | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
CN101216590A (zh) * | 2008-01-21 | 2008-07-09 | 上海微电子装备有限公司 | 三自由度反射镜调整装置 |
CN102221787A (zh) * | 2010-04-16 | 2011-10-19 | 上海微电子装备有限公司 | 高精度曝光镜头单元的集成装校装置 |
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JP2000049066A (ja) * | 1998-07-27 | 2000-02-18 | Canon Inc | 露光装置およびデバイス製造方法 |
CN103149664B (zh) * | 2013-02-21 | 2015-01-21 | 海信集团有限公司 | 反射镜调整装置 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US6020964A (en) * | 1997-12-02 | 2000-02-01 | Asm Lithography B.V. | Interferometer system and lithograph apparatus including an interferometer system |
CN101216590A (zh) * | 2008-01-21 | 2008-07-09 | 上海微电子装备有限公司 | 三自由度反射镜调整装置 |
CN102221787A (zh) * | 2010-04-16 | 2011-10-19 | 上海微电子装备有限公司 | 高精度曝光镜头单元的集成装校装置 |
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