CN1037702Y - Coating - Method and Apparatus for Glass Substrates - Google Patents
Coating - Method and Apparatus for Glass SubstratesInfo
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- CN1037702Y CN1037702Y CN94190191.2 CN1037702Y CN 1037702 Y CN1037702 Y CN 1037702Y CN 1037702 Y CN1037702 Y CN 1037702Y
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Abstract
将一涂层涂到一基片上的设备(10),包括一带有出口(30)的气体分配器(14),出口(30)位于基片附近并用以将一气态反应物混合体导向基片的表面。设置有一组相通且沿分配器的长度隔开的下降管(24),用以将气态反应物混合体供给到分配器。该设备包括用以测定沿宽度涂到基片上的涂层(38)的厚度均匀性的装置。最后,设有将一种或多种反应物或一惰性气体供给到一个或多个下降管的装置,以改变流经一个或多个下降管的气态反应物混合体中一种或多种反应物的浓度。所以就改变了在该下降管附近涂层的沉积速率,从而改善了沉积涂层的均匀性。Apparatus (10) for applying a coating to a substrate, comprising a gas distributor (14) with an outlet (30) located adjacent to the substrate for directing a gaseous reactant mixture to the substrate s surface. A set of downcomers (24) communicating and spaced along the length of the distributor are provided for supplying the gaseous reactant mixture to the distributor. The apparatus includes means for determining the thickness uniformity of the coating (38) applied to the substrate along the width. Finally, means are provided for supplying one or more reactants or an inert gas to the one or more downcomers to alter one or more reactions in the gaseous reactant mixture flowing through the one or more downcomers concentration of the substance. Consequently, the deposition rate of the coating near the downcomer is varied, thereby improving the uniformity of the deposited coating.
Description
发明背景1.发明领域本发明涉及一种涂敷一基片,特别是一玻璃基片,的方法和设备。更具体说,本发明涉及一种用以生产车辆或建筑门窗所用涂层玻璃的连续化学气相沉积(CVD)工艺,及生产该涂层玻璃的设备。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for coating a substrate, particularly a glass substrate. More particularly, the present invention relates to a continuous chemical vapor deposition (CVD) process for producing coated glass for use in vehicle or architectural doors and windows, and an apparatus for producing the coated glass.
2.相关技术概述在涂敷基片的领域中化学气相沉积工艺是众所周知的。通过将一气态反应物混合体束流导向基片的表面以使反应物混合体将所需涂层沉积在基片表面上,而涂敷基片。在此工艺中所采用的涂料反应物的物理形式可以是液体、气化物,分散在气体混合物中的液体或固体,悬浮颗粒,或者分散在气体混合物中的气化或雾状涂料反应物。2. Overview of the Related Art Chemical vapor deposition processes are well known in the field of coating substrates. The substrate is coated by directing a beam of gaseous reactant mixture onto the surface of the substrate such that the reactant mixture deposits the desired coating on the surface of the substrate. The physical form of the coating reactants employed in this process can be liquids, vapors, liquids or solids dispersed in a gaseous mixture, suspended particles, or vaporized or aerosolized coating reactants dispersed in a gaseous mixture.
与CVD工艺相关的问题之一涉及沿基片的宽度产生一均匀厚度的涂层。在某些情况中,例如将一反射性金属氧化涂层涂到一玻璃板上,涂层厚度必须均匀这一要求特别重要,因为涂层厚度的很小变化就会导致玻璃板有不均匀的颜色。例如,金属氧化涂层上百万分之一英寸的变化可在玻璃上产生一种不美的外观。One of the problems associated with the CVD process involves producing a coating of uniform thickness along the width of the substrate. In some cases, such as applying a reflective metal oxide coating to a glass sheet, the requirement that the coating thickness must be uniform is particularly important because small variations in coating thickness can result in non-uniform glass sheet thicknesses. color. For example, a millionth of an inch variation in metal oxide coating can create an unattractive appearance on glass.
一般说,为了产生具有恒定厚度的涂层,必须将气态反应物混合体均匀地涂在整个玻璃板上。业已提出了用来以均匀方式将气态反应物混合体涂在一玻璃板上的各种装置。例如,美国专利No.4,504,526公开了一种设备,它包括一组系列设置的,单独的通道,这些通道相互连接一入口和一位于玻璃板附近的出口。每个单独的通道包括一个横截面积与相邻通道的横截面积不同的部分,使得流体流经通道的速度改变。Generally speaking, in order to produce a coating of constant thickness, the gaseous reactant mixture must be uniformly spread over the entire glass sheet. Various devices have been proposed for coating a glass plate with a mixture of gaseous reactants in a uniform manner. For example, US Patent No. 4,504,526 discloses an apparatus comprising a series of individual passages interconnecting an inlet and an outlet located adjacent to a glass sheet. Each individual channel includes a portion with a cross-sectional area that differs from that of an adjacent channel, so that the velocity of fluid flowing through the channel varies.
在美国专利NO.4,535,000中,Gordon描述了一种用以将一金属氮化物薄膜涂在一玻璃基片上的化学气相沉积工艺。Gordon建议采用多个涂敷装置作为获得一均匀涂层的手段,这是因为一个涂敷装置的不均匀性通常比不过其它涂敷装置的不均匀性,并且往往会抵消来自不同涂敷装置的厚度误差。In US Patent No. 4,535,000, Gordon describes a chemical vapor deposition process for coating a metal nitride film on a glass substrate. Gordon suggests using multiple applicators as a means of obtaining a uniform coating, since the non-uniformity of one applicator is usually not as good as that of the other applicators and tends to cancel out the differences from the different applicators Thickness error.
正如Sopko等在美国专利No.3,580,679中所教导的,一个气化物集气管使一气态混合体沿基片分配,该集气管包括一组在它们的出口端相互隔开的气化物通道,但这些气化物通道在它们的入口处汇集在一共同通道中。为提高气化物沉积的均匀性,建议每个通道包括至少两个相对的曲面,这样流经通道的气化物就至少两次改变方向。此外,Sopko注意到可在通道内设置导流板,以进一步干扰气化物流束并沿气化物集气管的长度分配气化物。As taught by Sopko et al. in US Pat. No. 3,580,679, a gaseous mixture is distributed along the substrate by a gaseous manifold comprising a set of gaseous passages spaced from each other at their outlet ends, but these The vapor passages converge in a common passage at their inlets. To improve the uniformity of vapor deposition, it is recommended that each channel includes at least two opposing curved surfaces so that the vapor flowing through the channel changes direction at least twice. In addition, Sopko noted that baffles can be placed within the channels to further disrupt the gaseous flow stream and distribute the gasification along the length of the gasification manifold.
尽管以前提出的各种装置,其中一些例子列举如上,仍然存在关于用化学气相沉积工艺将厚度均匀的涂层涂到基片上的问题。产生这种不均匀性的原因是不定的,但可能包括排气平衡,待涂基片上的温度差,受热时涂敷设备中的尺寸变化,进入区域雷诺数的变化及随之总流量的变化,以及涂敷装置中积垢的积累等问题。无论是什么原因,最有利的是提供一种方法和设备,用以在化学气相沉积工艺中消除涂到基片上的涂层厚度的任何均匀性欠佳问题。Despite the various devices previously proposed, some examples of which are listed above, there are still problems associated with applying a uniform thickness coating to a substrate using a chemical vapor deposition process. The reasons for this non-uniformity are variable, but may include exhaust gas balance, temperature differences across the substrate to be coated, dimensional changes in the coating equipment when heated, changes in the Reynolds number of the entry zone and consequent changes in total flow , and the accumulation of fouling in the applicator. Whatever the reason, it would be most advantageous to provide a method and apparatus to eliminate any problems of poor uniformity of coating thickness applied to a substrate in a chemical vapor deposition process.
本发明概述本发明涉及一种用化学气相沉积工艺将一涂层涂到一基片上的设备。该设备包括一个气体分配器,它带有一个位于待涂基片附近的出口,用以将一气态反应物混合体导向基片的表面。气态反应物混合体包括一种或多种反应物和一惰性载气。设置有一组相通且沿分配器长度隔开的下降管,用以将气态反应物混合体供给到分配器。该设备包括用以测定沿宽度涂到基片上的涂层的厚度均匀性的装置。最后,还设有一个将一种或多种反应物或一惰性气体供给到一个或多个下降管的装置,以改变流经该下降管的气态反应物混合体中一种或多种反应物的浓度,即在横跨基片的涂料气体分配中产生故意的不均匀性,以提供所需的均匀涂层。在该下降管附近的涂层的沉积速率因此被改变,以改善沉积涂层的厚度均匀性。SUMMARY OF THE INVENTION The present invention relates to an apparatus for applying a coating to a substrate using a chemical vapor deposition process. The apparatus includes a gas distributor with an outlet located adjacent the substrate to be coated for directing a gaseous reactant mixture to the surface of the substrate. The gaseous reactant mixture includes one or more reactants and an inert carrier gas. A set of downcomers communicating and spaced along the length of the distributor is provided for supplying the gaseous reactant mixture to the distributor. The apparatus includes means for determining the thickness uniformity of the coating applied to the substrate along the width. Finally, there is also a means for supplying one or more reactants or an inert gas to one or more downcomers to alter one or more reactants in the gaseous reactant mixture flowing through the downcomer concentration, that is, creates deliberate non-uniformity in the distribution of coating gas across the substrate to provide the desired uniform coating. The deposition rate of the coating near the downcomer is thus varied to improve the thickness uniformity of the deposited coating.
本发明还涉及一种将厚度大致均匀的涂层涂到一基片的表面上的方法。借助于一组相通且沿分配器长度隔开的下降管,将包括一种或多种反物及一惰性载气的气态反应物混合体供给到一气体分配器。通过将气态反应物混合体从分配器上邻近基片表面的出口导向基片表面,而在基片上形成一涂层。然后,测定在沿基片宽度的各种位置涂到基片上的涂层的厚度均匀性,并将一种或多种反应物或一惰性气体供给到一个或多个个别的下降管,以改变流经该下降管的气态反应物混合体中一种或多种反应物的浓度。这样就改变了在该下降管附近涂层的沉积速率,以改善沉积涂层的厚度均匀性。此外将足够数量的一惰性气体引入一下降管将使得该下降管内静态压力增加,从而增加了流到其余下降管的气态反应物混合体的总流量。The present invention also relates to a method of applying a coating of substantially uniform thickness to the surface of a substrate. A gaseous distributor is supplied with a gaseous reactant mixture including one or more reactants and an inert carrier gas by means of a set of communicating downcomers spaced along the length of the distributor. A coating is formed on the substrate by directing the gaseous reactant mixture from the outlet of the dispenser adjacent the substrate surface to the substrate surface. Then, the thickness uniformity of the coating applied to the substrate at various locations along the width of the substrate is determined and one or more reactants or an inert gas are supplied to one or more individual downcomers to vary The concentration of one or more reactants in the gaseous reactant mixture flowing through the downcomer. This changes the deposition rate of the coating near the downcomer to improve the thickness uniformity of the deposited coating. In addition, introducing a sufficient amount of an inert gas into a downcomer will increase the static pressure within the downcomer, thereby increasing the overall flow of the gaseous reactant mixture to the remaining downcomers.
所以,本发明提供了一种较为简单且便宜的装置,用以修正在CVD工艺中所得的涂层厚度的变化。此外,不论均匀性欠佳的原始原因如何,都可获得一更为均匀的涂层。Therefore, the present invention provides a relatively simple and inexpensive apparatus for correcting for variations in coating thickness obtained in a CVD process. Furthermore, regardless of the original cause of poor uniformity, a more uniform coating can be obtained.
参照附图,本领域技术人员从以下的详细描述中可更容易地看出本发明的上述以及其它优点,其中:图1是略带示意性的,部分被剖去的透视图,示出了本发明的涂敷设备,和图2是本发明设备的示意性方框图。The above and other advantages of the present invention will be more readily apparent to those skilled in the art from the following detailed description with reference to the accompanying drawings, in which: Figure 1 is a somewhat schematic, partially cutaway perspective view showing The coating apparatus of the present invention, and FIG. 2 is a schematic block diagram of the apparatus of the present invention.
根据本发明,提供了一种将一涂层涂到一运动的热玻璃带的表面上的方法,包括:a)设置一个横跨待涂玻璃带的宽度延伸的涂料气体分配器,b)在沿该分配器的长度隔开的两个或更多个供给位置将一包括至少一种气态反应物的气态涂料混合体从集气管供给到所述分配器,c)将气态涂料混合体从分配器导向运动的热玻璃带的表面上,以在热玻璃表面上形成一个涂层;d)在横跨所涂宽度的隔开位置检测已涂产品的至少一种光学性质,所述的光学性质随所述涂层的厚度变化而变化;以及e)根据通过对所述光学性质的测定而检测出的涂层的不佳均匀性,在一个或多个所述隔开的供给位置供给的气态涂料混合体中,有选择地改变所述至少一种气态反应物相对于其它一个或多个所说隔开的供给位置供给的该至少一种气态反应物的浓度,以改善所述均匀性。According to the present invention there is provided a method of applying a coating to the surface of a moving heated glass ribbon, comprising: a) providing a coating gas distributor extending across the width of the glass ribbon to be coated, b) in Two or more supply locations spaced along the length of the distributor supply a gaseous paint mixture comprising at least one gaseous reactant from the manifold to the distributor, c) supply the gaseous paint mixture from the distribution d) detecting at least one optical property of the coated product at spaced locations across the coated width, said optical property as a function of the thickness of said coating; and e) the gaseous state supplied at one or more of said spaced supply locations based on poor uniformity of the coating as detected by measurements of said optical properties In the coating mixture, the concentration of the at least one gaseous reactant supplied relative to the other one or more of said spaced supply locations is selectively varied to improve said uniformity.
根据本发明还提供了一种通过化学气相沉积工艺将一涂层涂到一基片上的设备,包括:a)一气体分配器,带有一个位于待涂基片附近的出口,用以将包括一种或多种反应物及一惰性载气的气态反应物混合体导向基片的表面;b)一组相通且沿所述分配器的长度隔开的下降管,用以将气态反应物混合体供给到所述分配器;c)检测装置,用以测定沿基片宽度涂到基片上的涂层的厚度的均匀性;和d)流量控制装置,用以将一种或多种反应物或一惰性气体供给到一个或多个所述下降管,以改变流经所述下降管的气态反应物混合体中一种或多种反应物的浓度,从而改变在该下降管附近涂层的沉积速率,以改善沉积涂层的厚度的均匀性。There is also provided in accordance with the present invention an apparatus for applying a coating to a substrate by a chemical vapor deposition process, comprising: a) a gas distributor with an outlet located near the substrate to be coated for applying a coating comprising A gaseous reactant mixture of one or more reactants and an inert carrier gas directed to the surface of the substrate; b) a set of downcomers communicating and spaced along the length of the distributor for mixing the gaseous reactants body is supplied to the dispenser; c) detection means for determining the uniformity of the thickness of the coating applied to the substrate along the width of the substrate; and d) flow control means for introducing one or more reactants Or an inert gas is supplied to one or more of the downcomers to alter the concentration of one or more reactants in the gaseous reactant mixture flowing through the downcomers, thereby altering the properties of the coating in the vicinity of the downcomer. deposition rate to improve the uniformity of the thickness of the deposited coating.
最佳实施例的描述可结合各种基片及涂料采用本发明的方法及设备,并且本发明的方法和设备可用以涂敷一连续的板片或一系列分离的基片。在本发明的最佳实施例中,是涂敷一连续玻璃板。该玻璃板可以是由玻璃板生产工艺,任何平板玻璃生产工艺,或者浮法玻璃生产工艺制得的玻璃板。以下的描述涉及对移动中的浮法玻璃带的涂敷,该浮法玻璃带为或是在窑池中或是其次在附装的退火炉中刚刚形成的浮法玻璃带。DESCRIPTION OF THE PREFERRED EMBODIMENTS The method and apparatus of the present invention may be employed in conjunction with various substrates and coatings, and may be used to coat a continuous sheet or a series of discrete substrates. In the preferred embodiment of the invention, a continuous glass sheet is coated. The glass sheet can be a glass sheet produced by a glass sheet production process, any flat glass production process, or a float glass production process. The following description refers to the coating of a moving float glass ribbon that has just been formed, either in the kiln or secondly in an attached lehr.
此外,本发明的方法和设备可应用于任何一种或多种反应物或涂料前体的化学气相沉积。在最佳实施例中,本发明的方法和设备用于在一刚形成的浮法玻璃带上,当它被支承在熔融的锡浴上时,沉积一氮化钛膜。使四卤化钛和最好为四氯化钛和无水氨之类的还原剂的混合体在待沉积氮化钛涂层的玻璃板表面上或附近反应。最好在作为隋性载气的氦中供给这两种反应物。制备氮化钛涂层的此方法更充分地公开于美国专利Nos.4,545,000和5,087,525中,两者作为一个整体结合在本文中作为参考。Furthermore, the methods and apparatus of the present invention may be applied to chemical vapor deposition of any one or more reactants or coating precursors. In the preferred embodiment, the method and apparatus of the present invention is used to deposit a titanium nitride film on a freshly formed float glass ribbon while it is supported on a molten tin bath. A mixture of titanium tetrahalide and preferably a reducing agent such as titanium tetrachloride and anhydrous ammonia is reacted on or near the surface of the glass plate on which the titanium nitride coating is to be deposited. The two reactants are preferably supplied in helium as an inert carrier gas. This method of making titanium nitride coatings is more fully disclosed in US Patent Nos. 4,545,000 and 5,087,525, both of which are incorporated herein by reference in their entirety.
现在参照图1,其中示出了一个通常用10表示的设备,用以将一涂层涂到一连续玻璃带或板12之类的基片上。玻璃板12通常被支承于一熔融的锡浴上(如果在退火炉中完成涂敷则支承在辊子上)并沿如图中右下方箭头所示的轨迹移动。生产工艺要求通常在浮法玻璃生产过程中形成一玻璃基片,并当其热的时候连续进给玻璃板12,使之通过图中所示的涂敷设备10。涂敷设备通常位于一个密封区内,在该密封区保持一种无氧化性的气氛。该无氧化性气氛通常是一种气体,包括约99%体积的氮和1%体积的氢。然而,只要能获得所需的结果,即防止锡浴氧化,可用其它惰性气体代替氮,或者增加或减少氮的比例。Referring now to FIG. 1, an apparatus, generally designated 10, is shown for applying a coating to a substrate such as a continuous glass ribbon or sheet 12. As shown in FIG. The glass sheet 12 is typically supported on a molten tin bath (or rollers if coating is done in an annealing furnace) and moves along the trajectory shown by the lower right arrow in the figure. The production process requires that a glass substrate is typically formed during float glass production, and the glass sheet 12 is continuously fed while it is hot through the coating apparatus 10 shown in the figures. The coating equipment is usually located in a sealed area in which a non-oxidizing atmosphere is maintained. The non-oxidizing atmosphere is typically a gas comprising about 99% nitrogen by volume and 1% hydrogen by volume. However, other inert gases can be used in place of nitrogen, or the proportion of nitrogen can be increased or decreased, as long as the desired result, ie, prevention of oxidation of the tin bath, can be obtained.
更具体说涂敷设备10包括一个气化物分配器14,它面对玻璃板12定位并横跨玻璃板12的宽度。借助于下面将详细描述的供给组件将气化反应物混合体供给到气化物分配器14。通常与氮或氦之类的惰性载气混合的第一气化反应物经供给管线16供给到一混合装置18。在混合装置18内,第一气化反应物与经供给管线20供给到混合装置18内的第二气化反应物混合。在被引入混合装置18之前,第二气化反应物也通常与惰性载气混合。对两种反应物最好采用同一载气。More specifically, the coating apparatus 10 includes a vapor dispenser 14 positioned facing the glass sheet 12 and spanning the width of the glass sheet 12 . The gasification reactant mixture is supplied to the gasification distributor 14 by means of a supply assembly, which will be described in detail below. The first gasification reactant, usually mixed with an inert carrier gas such as nitrogen or helium, is supplied via supply line 16 to a mixing device 18 . In the mixing device 18 , the first gasification reactant is mixed with the second gasification reactant fed into the mixing device 18 via a supply line 20 . The second gasification reactant is also typically mixed with an inert carrier gas before being introduced into the mixing device 18 . Preferably the same carrier gas is used for both reactants.
由第一和第二反应物以及载气(单数)或载气(复数)的混合体构成的气化物混合体从混合装置18通到一个加套集气管22。可以传统方式使用加套集气管22将气化物混合体的温度保持在任何特定场合的具体涂敷条件所需的范围内,并沿集气管的长度提供恒定成分的混合体。借助于一系列相互连通的下降管24将气化物混合体从集气管22供给到气化物分配器14。下降管24通常沿集气管22和分配器14大致均匀地间隔开。A gaseous mixture consisting of the first and second reactants and a carrier gas (singular) or a mixture of carrier gases (plural) passes from the mixing device 18 to a jacketed manifold 22 . The jacketed manifold 22 can be used in a conventional manner to maintain the temperature of the gaseous compound mixture within the range required for the specific application conditions of any particular application and to provide a constant composition mixture along the length of the manifold. The gaseous compound mixture is supplied from the gas header 22 to the gaseous compound distributor 14 by means of a series of interconnected downcomers 24 . The downcomers 24 are generally spaced approximately evenly along the manifold 22 and the distributor 14 .
从下降管24,气化物混合体流入一个在分配器14上形成的通道26。通道26最好设有一组导流板28,它们迫使气化物混合体经过一系列的方向改变,以便更均匀地沿分配器14的长度分配气化物混合体。这样就改善了沉积在玻璃板12上的涂层的均匀性。气化物混合体流过导流板28并经出口30流出分配器14,出口30位于玻璃板12附近。在气化物混合体内的第一和第二反应物在玻璃板12的表面上或附近反应,当玻璃板12通过分配器14时连续地将所需涂层沉积在玻璃板12上。From the downcomer 24 , the gaseous mixture flows into a channel 26 formed in the distributor 14 . Channel 26 is preferably provided with a set of baffles 28 which force the gaseous compound mixture through a series of directional changes to distribute the gaseous compound mixture more uniformly along the length of distributor 14. This improves the uniformity of the coating deposited on the glass plate 12 . The gaseous mixture flows through the baffles 28 and out of the distributor 14 through the outlet 30, which is located adjacent to the glass plate 12. The first and second reactants within the gas mixture react on or near the surface of the glass sheet 12 , continuously depositing the desired coating on the glass sheet 12 as the glass sheet 12 passes through the distributor 14 .
尽管设置了一系列将气化物混合体供给到分配器14的隔开下降管24,及一系列导流板28,沉积在玻璃板12上的涂层的厚度在玻璃板12的宽度上常常并不均匀。如上所述,这可能起因于许多因素,诸如排气平衡,待涂基片上的温度差,受热时涂敷设备中的尺寸变化,进入区域雷诺数的变化及随之总流量的变化,以及涂敷设备上积垢的积累。当在玻璃板12上沉积一反射性涂层时,这种不均匀性可在玻璃板12的宽度上导致透射性和反射颜色方面不可接受的变化。The thickness of the coating deposited on the glass sheet 12 often varies across the width of the glass sheet 12, despite the provision of a series of spaced down pipes 24 that supply the gaseous compound mixture to the distributor 14, and a series of baffles 28 uneven. As mentioned above, this can be due to a number of factors, such as exhaust balance, temperature differences across the substrate to be coated, dimensional changes in the coating equipment when heated, changes in the Reynolds number of the entry zone and consequent changes in total flow, and build-up of scale on the equipment. When depositing a reflective coating on glass sheet 12, this non-uniformity can result in unacceptable variations in transmission and reflected color across the width of glass sheet 12.
为改善涂层厚度的任何可检测出的不均匀性,在涂敷设备10的一组下降管24上设有一连接臂或侧臂32。在最佳实施例中,所有下降管24都设有一个侧臂32。每个侧臂32都经过一单独的供给管线34与一流量控制装置36连通。流量控制装置36可连接于一种或多种反应物的一供给源。作为另一种选择,流量控制装置36也可连接于一惰性气体(最好是作为反应物的载气所用的同一惰性气体)的供给源。在最佳实施例中,流量控制装置36即连接于一种或多种反应物的一供给源,也连接于一惰性气体的一供给源。流量控制装置36控制一种或多种反应物或者一惰性气体(或两者)通过单独的供给管线34(示意性地示出)的流量。流量控制装置36可以是控制此流量的任何适当装置,例如从加利福尼亚Montetey的Sierra仪器公司可购得的Dierra质量流量控制器。To ameliorate any detectable non-uniformity in coating thickness, a connecting arm or side arm 32 is provided on a set of downcomers 24 of the coating apparatus 10 . In the preferred embodiment, all downpipes 24 are provided with a side arm 32 . Each side arm 32 communicates with a flow control device 36 via a separate supply line 34 . The flow control device 36 may be connected to a supply of one or more reactants. Alternatively, flow control device 36 may also be connected to a supply of inert gas (preferably the same inert gas used as the carrier gas for the reactants). In the preferred embodiment, flow control device 36 is connected to both a supply of one or more reactants and a supply of inert gas. Flow control device 36 controls the flow of one or more reactants or an inert gas (or both) through separate supply lines 34 (shown schematically). Flow control device 36 may be any suitable device for controlling this flow, such as a Dierra mass flow controller available from Sierra Instruments, Inc. of Montetey, California.
如果确定在一特定区域沉积在玻璃板12上的涂层太薄,就启动流量控制装置36以便将一种或多种反应物经相关的供给管线34和侧臂32供给到位于该特定区域的一个或多个下降管24。由于玻璃板12上薄膜形成的反应速率取决于玻璃板12上方气相反应物的浓度,所以其中一种反应物浓度的有效增加就会增加沉积速率及沉积在该特定区域的涂层的厚度。以这种方式,可在玻璃板12的整个宽度上获得一更均匀的涂层厚度及颜色,和透光和/或阳光系数。If it is determined that the coating deposited on the glass sheet 12 in a particular area is too thin, the flow control device 36 is activated to supply one or more reactants via the associated supply lines 34 and sidearms 32 to the chamber located at that particular area. One or more downcomers 24 . Since the reaction rate of film formation on the glass sheet 12 depends on the concentration of gas phase reactants above the glass sheet 12, an effective increase in the concentration of one of the reactants increases the deposition rate and thickness of the coating deposited in that particular area. In this manner, a more uniform coating thickness and color, and light transmission and/or solar coefficient, can be obtained over the entire width of the glass sheet 12 .
另一方面,如果确定在一特定区域沉积在玻璃板12上的涂层太厚,就启动流量控制装置36以将一惰性气体经相关的供给管线34和侧臂32供给到位于该特定区域的一个或多个下降管24。将一惰性气体引入一个别的下降管24就降低了穿过该下降管24的气化物混合体中反应物的浓度,从而在该下降管24的区域中减小了在玻璃板12上的沉积速率。此外,将附加的惰性气体引入一下降管24,如果体积足够,就会在它被引入的下降管24内导致一定的静态压力增加。这就会减小到该下降管24的气化物混合体的总流量,并使得到周围下降管24的气化物混合体的总流量增加。这再次导致在惰性气体被引入的下降管24附近沉积一较薄的涂层。On the other hand, if it is determined that the coating deposited on the glass sheet 12 in a particular area is too thick, the flow control device 36 is activated to supply an inert gas via the associated supply line 34 and side arm 32 to the glass plate 32 located at that particular area. One or more downcomers 24 . Introducing an inert gas into a separate downcomer 24 reduces the concentration of reactants in the gaseous mixture passing through the downcomer 24, thereby reducing deposition on the glass sheet 12 in the area of the downcomer 24 rate. Furthermore, the introduction of additional inert gas into a downcomer 24, if sufficient in volume, will result in a certain static pressure increase in the downcomer 24 into which it is introduced. This reduces the total flow of gaseous-matter mixture to that downcomer 24 and increases the total flow of gaseous-matter mixture to the surrounding downcomers 24 . This again results in the deposition of a thinner coating near the downcomer 24 where the inert gas is introduced.
图2示意性地示出了本发明的方法。气化反应物经供给管线16和20供给到加套集气管22,经下降管24下降到分配器14。气化物混合体经位于玻璃板12附近的一个出口流出分配器14。气化物混合体中的第一和第二反应物在玻璃板12的表面或其附近反应,当玻璃板12通过分配器14时就在其上连续地沉积所需的涂层。Figure 2 schematically shows the method of the present invention. The gasification reactants are supplied to jacketed header 22 via supply lines 16 and 20 and descend to distributor 14 via downcomer 24 . The gaseous mixture exits the distributor 14 through an outlet located near the glass plate 12. The first and second reactants in the gaseous mixture react at or near the surface of the glass sheet 12 , depositing the desired coating continuously thereon as the glass sheet 12 passes through the distributor 14 .
最好设置一个厚度检测装置38,用以检测沉积在玻璃板12上的涂层的厚度。当沉积一反射性涂层时,最好借助于一个位于涂敷设备10下游的光度计38来检测厚度。较薄的反射性涂层会导致较高的透射系数并改变反射的颜色,这可由光度计来检测。在于玻璃板上沉积氮化钛涂层的情况下,一较薄的涂层会导致被反射颜色的b*成分的值更负,其中b*测定CIE-Lab色标中黄一篮颜色的量。这样,就可通过检测在玻璃板12整个宽度上的b*成分来间接地确定涂层厚度的均匀性。在一最佳实施例中,采用了一个外形扫描光度计来确定沿玻璃板12的宽度沉积的涂层的厚度。A thickness detection device 38 is preferably provided for detecting the thickness of the coating deposited on the glass plate 12. When depositing a reflective coating, the thickness is preferably detected by means of a photometer 38 located downstream of the coating apparatus 10. Thinner reflective coatings result in higher transmission coefficients and change the color of the reflection, which can be detected by a photometer. In the case of a titanium nitride coating deposited on a glass plate, a thinner coating results in a more negative value for the b* component of the reflected color, where b* measures the amount of color in the yellow basket on the CIE-Lab color scale . In this way, the uniformity of the coating thickness can be indirectly determined by measuring the b* component across the width of the glass sheet 12 . In a preferred embodiment, a profile scanning photometer is used to determine the thickness of the coating deposited along the width of the glass sheet 12.
根据由用以确定沉积涂层之厚度的任何适当装置38所提供的可视输出信号,可利用手动控制装置40手动地启动流量控制装置。在另一种最佳实施例中,厚度检测装置48连接于一个程序控制器42,它连接于流量控制器36并响应收到来自厚度检测装置38的一个信号自动地启动流量控制装置36。当该信号表示涂层厚度的不均匀性超出了编制在控制器42内的一预定可接受范围时,控制器42就启动流量控制装置36,以将一种或多种反应物或一惰性气体供给到一个或多个个别的下降管24,以改变流经该下降管24的气化反应物混合体中一种或多种反应物的浓度。因此,在该下降管附近涂层的沉积速率被改变,从而改善了基片上涂层的厚度均匀性。The flow control device may be manually activated using manual control device 40 according to a visual output signal provided by any suitable device 38 for determining the thickness of the deposited coating. In another preferred embodiment, the thickness sensing device 48 is connected to a programmed controller 42 which is connected to the flow controller 36 and automatically activates the flow control device 36 in response to receiving a signal from the thickness sensing device 38. When the signal indicates that the non-uniformity of the coating thickness is outside a predetermined acceptable range programmed into the controller 42, the controller 42 activates the flow control device 36 to transfer one or more reactants or an inert gas Feed to one or more individual downcomers 24 to vary the concentration of one or more reactants in the gasification reactant mixture flowing through the downcomer 24 . Thus, the deposition rate of the coating near the downcomer is altered, thereby improving the thickness uniformity of the coating on the substrate.
在本申请和附图中,示出并描述了本发明的一个最佳实施例,并建议了各种改动和变化,但应理解它们无意完全覆盖,并且在本发明的范围内可实现其它改动和变化。这里所含的建议被选择及包括来达到说明的目的,以便本领域技术人员可更充分地理解本发明及其原理,并能够以最适合某一特定情况的条件的各种方式改动它并实施它。例如,应当理解根据本发明可采用多于一个的任何数量的下降管和相关侧臂,这取决于特定的场合。In this application and the drawings, a preferred embodiment of the present invention is shown and described, and various modifications and changes are suggested, but it should be understood that they are not intended to be exhaustive and that other modifications may be implemented within the scope of the present invention and change. The recommendations contained herein have been chosen and included for purposes of illustration, so that those skilled in the art may more fully understand the invention and its principles, and be able to modify and implement it in various ways that are best suited to the conditions of a particular situation it. For example, it should be understood that any number of drop tubes and associated side arms, more than one, may be employed in accordance with the present invention, depending on the particular application.
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