CN103759848B - A kind of vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment - Google Patents
A kind of vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment Download PDFInfo
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- CN103759848B CN103759848B CN201410058389.5A CN201410058389A CN103759848B CN 103759848 B CN103759848 B CN 103759848B CN 201410058389 A CN201410058389 A CN 201410058389A CN 103759848 B CN103759848 B CN 103759848B
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Abstract
The invention discloses a kind of vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment, temperature measuring equipment is inserted with two thermocouples in high temperature resistant quartz outer tube, axial distance of the measurement end of two thermocouples along outer tube is between initial setting height(from bottom) of the outer tube in oxidation furnace between its stroke height, the present invention is by there is the thermocouple of certain distance and outer tube to be applied in combination two measurement ends, it effectively compensate for drawing Wen Shidan branch thermocouple in the blind area of oxidation furnace reaction chamber bottom measurement temperature, realize the accurate measurement and control to temperature in heat treatment, improve and draw warm efficiency and equipment capacity.
Description
Technical field
The present invention relates to a kind of vertical oxidation of semiconductor heat processing, is used for vertical oxidation furnace more particularly to one kind
Flat-temperature zone carry out temperature measurement correction temperature deviation drawing temperature device.
Background technology
To ensure the uniform heating of reaction cavity in vertical oxidation, in body of heater multiple flat-temperature zones can be divided to carry out segmentation control
System, for example, point five flat-temperature zones.Wherein, equal fixed configurations have two groups of thermocouples in every section of body of heater, and one group claims in reaction chamber
Be Profile thermocouples, its temperature measured is closer to the temperature of silicon chip in itself；Another group is then referred to as close to heating element heater
Spike thermocouples, its temperature measured are closer to the temperature of heating element heater in itself.
After vertical oxidation finishes technique every time, the attachment or other objects that might have a small amount of gas remain in instead
Answer in chamber, after carrying out repeatedly some techniques, be further continued for heating up, reality just occurs with Profile thermocouples and Spike thermocouple thermometrics
Border temperature and measurement temperature have the situation of small size deviation.Therefore, in order to compensate this deviation, after technical process several times, lead to
The drawing temperature measurement of flat-temperature zone of progress is often needed, to correct temperature deviation.This, which just needs to use one, individually draws warm thermometric
Device.The thermocouple of this device can vertically move always with the top of its outside quartzy outer tube self-supporting oxidation furnace reaction chamber
Move to bottom, carry out the multipoint temperature measuring of whole stroke height.Multi-point temp and oxidation furnace itself the thermometric heat measured
The data occasionally measured are compared, it is possible to must be deviated, as long as deviation compensation is entered just to reach La Wen in control software
Purpose.
Single branch thermocouple is inserted with the outer tube of the existing warm temperature measuring equipment of drawing, its measurement end is located at the top of outer tube.
Before drawing temperature, the top that the outer tube equipped with single branch thermocouple is first inserted into reaction chamber from the bottom of oxidation furnace reaction chamber is attached
Closely, and in order to keep balancing, outer tube is made stably to move up and down, it is necessary to outer tube is had suitably in reaction chamber
After such insertion, the bottom away from reaction chamber will leave certain installation balance height on the top of initial setting height(from bottom), i.e. outer tube.
Therefore, when drawing warm, when outer tube is moved to setting height(from bottom), i.e. outer tube in oxygen from top to bottom at the top of oxidation furnace reaction chamber
When changing the terminal of vertical stroke in stove, because outer tube can not continue to move down, cause single branch thermocouple in outer tube can not
Measure the temperature in position to reaction chamber bottom section since then.So in the reaction chamber of the oxidation furnace with five sections of warm areas,
The effect that it draws warm area to realize is limited, larger a part of thermometric blind area in reaction chamber bottom be present, therefore can not verify and be in
Influence of the heat-preserving container of 5th warm area to four-temperature region or even whole warm area.Single branch thermocouple draws warm efficiency too low simultaneously, Zhi Nengtong
Cross and repeatedly draw temperature to carry out temperature comparisons, expend overlong time.This can cause quickly set temperature parameter, precise calibration temperature
Deviation, therefore reduce and draw warm efficiency, consume equipment capacity.
The content of the invention
The purpose of the present invention is in view of the foregoing defects the prior art has, there is provided a kind of to be used for half containing temperature measuring equipment
The vertical oxidation of conductor heat treatment, it, which contains, can quickly set temperature parameter, and the new thermocouple of precise calibration temperature deviation is surveyed
Warm device, by there is the thermocouple of certain distance and outer tube to be applied in combination two measurement ends, overcome the list of prior art
Branch thermocouple covers complete flat-temperature zone and the in the blind area of reaction chamber bottom measurement temperature, by being measured while two thermocouples
Five warm areas, the overlapping region that can pass through to two thermocouples when drawing warm enter the contrast of trip temperature, reduce and draw warm number, improve and draw
Warm efficiency.
The present invention solves prior art weak point and adopted the technical scheme that：It is a kind of to be used to partly lead containing temperature measuring equipment
The vertical oxidation of body heat processing, every section of warm area of oxidation furnace reaction chamber are equipped with the oxidation furnace itself for measuring and controlling temp
Spike thermocouples and Profile thermocouples, temperature measuring equipment enters the first thermocouple in outer tube interpolation and measurement end is located at outer tube top
Prior art temperature measuring equipment on the basis of, in outer tube increase be inserted with the second thermocouple, also, make two thermocouples in outer tube
Axial distance of the measurement end along outer tube between initial setting height(from bottom) of the outer tube in oxidation furnace between its stroke height；
Wherein, by when drawing warm, making the top of outer tube rise to the drawing temperature starting point in oxidation furnace reaction chamber inner top region, and make
First, second thermocouple is displaced downwardly to drawing temperature of the outer tube in oxidation furnace reaction chamber at initial setting height(from bottom) eventually with outer tube
Point, and thermometric simultaneously, to eliminate in the blind area of reaction chamber bottom measurement temperature, precise calibration temperature deviation.This design is more
Single branch thermocouple has been mended in the blind area of oxidation furnace reaction chamber bottom measurement temperature, by two thermocouples warm area frock can have been drawn to set
Count in stroke, it is ensured that cover complete flat-temperature zone and the 5th warm area, the overlapping region that can pass through to two thermocouples when drawing warm is entered
The contrast of trip temperature, it ensure that highest draws warm efficiency.
If the axial distance of two thermocouples to be arranged to the half of operable drawing warm area stroke, list both can overcome the disadvantages that
Branch thermocouple is in the blind area of oxidation furnace reaction chamber bottom measurement temperature, while and can covering needs most the four-temperature region and the of understanding
The profiling temperatures of five warm areas.
If moreover, the axial height that the axial height of the second thermocouple is arranged to first thermocouple subtracts initial installation
Highly, it can make it that the overlapping region that two thermocouples pass through when drawing warm is most long, temperature comparisons' point is most, highest drawing can be obtained
Warm efficiency.
The outer tube is that its top can be inserted perpendicularly into by the patchhole of oxidation furnace reaction chamber bottom, and is slided with patchhole
The high temperature resistant quartz outer tube of dynamic connection.Quartz ampoule should be able to be resistant to 950~1000 DEG C of high temperature, to play guarantor to thermocouple therein
Shield acts on.
The outer tube has is fixedly connected with mechanism with two thermocouples, so as to the synchronizing moving when drawing warm.
The outer tube is inserted perpendicularly into by the patchhole of oxidation furnace reaction chamber bottom, and with reaction chamber inwall and insulation
Bucket has gap.Ensure that outer tube and chamber inner wall and heat-preserving container have appropriately distance, so as not to occur in assembly and disassembly friction and
Collision.
Further, it is fixed in the outer tube to be inserted with two R type thermocouples, and the measurement end axial distance of two thermocouples is situated between
In initial setting height(from bottom) of the outer tube in oxidation furnace between its stroke height.
The temperature-measuring range of the R types thermocouple is 0~1300 DEG C, to meet the needs of oxidation technology.
The outer wall of the outer tube has the indentation of some display stroke heights.According to it in different oxidations on outer tube
Stroke demand in stove, carves the position of the characteristic size needed to use, and this characteristic size is in outer tube intercalation reaction chamber
The remaining distance outside chamber afterwards.
A link gear outside the external oxidation furnace reaction chamber bottom of outer tube, the steady shifting of temperature measuring equipment can be achieved
Dynamic and accurate control.
The beneficial effects of the invention are as follows：The thermocouple that the present invention has certain distance using two measurement ends combines with outer tube
It the new design used, effectively compensate for that position can be verified in the blind area of reaction chamber bottom measurement temperature when single branch thermocouple draws warm
In influence of the heat-preserving container to four-temperature region or even whole warm area of the 5th warm area, it is ensured that cover complete flat-temperature zone and when drawing warm
Five warm areas, and the contrast of trip temperature is entered in the overlapping region that can pass through to two thermocouples when drawing warm, reduces and draws warm number, improves and draw
Warm efficiency.
Brief description of the drawings
Fig. 1 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is that outer tube is first in vertical oxidation
It is in during beginning setting height(from bottom) and in vertical oxidation structural representation when drawing warm final position
Fig. 2 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is that outer tube is first in vertical oxidation
It is in during beginning setting height(from bottom) and in vertical oxidation structural representation when drawing warm start position
Fig. 3 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is row of the outer tube in vertical oxidation
It is in during Cheng Gaodu and in vertical oxidation structural representation when drawing warm final position
Fig. 4 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is row of the outer tube in vertical oxidation
It is in during Cheng Gaodu and in vertical oxidation structural representation when drawing warm start position
Embodiment
Below in conjunction with the accompanying drawings, the embodiment of the present invention is described in further detail.
Embodiment one
In the present embodiment, Fig. 1 is referred to, Fig. 1 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is
In structure when drawing warm final position during initial setting height(from bottom) of the outer tube in vertical oxidation and in vertical oxidation
Schematic diagram.As shown in figure 1, temperature measuring equipment of the present invention, including a quartzy outer tube 1 for being resistant to 950~1000 DEG C of high temperature, its
Interior to be inserted with two thermocouples, preferably R types thermocouple from opening direction, the temperature-measuring range of this R type thermocouple is 0~1300 DEG C, to meet oxygen
The needs of chemical industry skill.Wherein, the measurement end of the first thermocouple 3 is inserted into the top of outer tube, and the measurement end of the second thermocouple 2 is inserted into
It is outer tube at the initial setting height(from bottom) in oxidation furnace with the axial distance of the measurement end of thermocouple 3 along outer tube.From resistance to height
The purpose of fire stons English outer tube is to be played a protective role to thermocouple therein.After two thermocouple insertions in place, i.e., in overcoat
Tube opening portion is connected with a fixed mechanism, so as to the synchronizing moving when drawing warm.
During drawing temperature measurement is carried out, there are the quartz boat for putting silicon chip 6 and the following guarantor of boat in the reaction chamber 8 in body of heater
Warm bucket 7, chamber are divided into five sections of warm areas, and every section of warm area is equipped with the Spike thermocouples 4 and Profile thermocouples 5 of oxidation furnace itself, use
Carry out measuring and controlling temp.Before temperature is drawn, outer tube is first inserted perpendicularly into reaction chamber from the patchhole of oxidation furnace reaction chamber bottom,
And in order to keep balancing, outer tube is stably moved up and down, it is necessary to make outer tube have in reaction chamber it is appropriate just
Beginning setting height(from bottom), now the distance of outer tube autoreaction cavity bottom to outer tube upper end is initial setting height(from bottom).Outside
A link gear 10 outside the external oxidation furnace reaction chamber bottom of sleeve pipe, the steady mobile and accurate control of temperature measuring equipment can be achieved
System.
Referring to Fig. 2, Fig. 2 reflections is position of the outer tube of temperature measuring equipment in the warm starting point of drawing in vertical oxidation
Put, now the top of outer tube has risen to the top area of reaction chamber.Outer tube is in stroke, it is ensured that outer tube with it is anti-
The inwall and heat-preserving container for answering chamber have appropriately distance, in order to avoid friction and collision occurs in assembly and disassembly.Because this temperature measuring equipment can
Different size of oxidation furnace is common to, to accurately hold its stroke, in outer ferrule openings end side surface according to it in different oxidation furnaces
In stroke demand, carve the position indentation 9 of the characteristic size needed to use, this characteristic size is outer tube intercalation reaction chamber
The remaining distance outside chamber afterwards.When drawing warm, two thermocouples move down with outer tube, until drawing warm terminal, i.e. outer tube to exist
At initial setting height(from bottom) in oxidation furnace, and thermometric simultaneously.It will be seen from figure 1 that when outer tube is moved to and draws warm terminal, the
One thermocouple 3 can not move still further below, therefore can not carry out thermometric to region below.And the position of the second thermocouple 2 is extremely
Outside reaction chamber, so this design compensate for single branch thermocouple in oxidation furnace reaction chamber bottom because the initial installation of outer tube is high
The blind area of measurement temperature caused by degree, it is ensured that cover complete flat-temperature zone and the 5th warm area.Moreover, draw warm overlapping region most long,
The contrast of trip temperature is entered in the overlapping region that can pass through to two thermocouples when drawing warm, ensure that highest draws warm efficiency.
Embodiment two
Fig. 3 and Fig. 4 are referred to, Fig. 4 is that the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention exists for outer tube
In structural representation when drawing warm start position during stroke height in vertical oxidation and in vertical oxidation.Fig. 3 is
When the measurement end axial distance of two thermocouples of temperature measuring equipment of the present invention is stroke height of the outer tube in vertical oxidation and
In structural representation when drawing warm final position in vertical oxidation.As shown in figure 4, the outer tube 1 of temperature measuring equipment of the present invention
It is located at the top of oxidation furnace reaction chamber 8 in warm start position, i.e. outer tube is drawn.Unlike embodiment one, the second heat
It is row of the outer tube in oxidation furnace that even 2 measurement end, which is inserted into axial distance of the measurement end of the first thermocouple 3 along outer tube,
At Cheng Gaodu, i.e. height of the measurement end of the second thermocouple 2 in reaction chamber, equal to outer tube in Fig. 3 in reaction chamber
Highly.When drawing warm, two thermocouples move down with outer tube, until drawing warm terminal, i.e. initial peace of the outer tube in oxidation furnace
At dress height, and thermometric simultaneously.From fig. 4, it can be seen that when drawing temperature beginning, the height of the second thermocouple 2 completely covers in Fig. 3
The thermometric gap height of outer tube first thermocouple 3 when drawing warm terminal.Therefore, in case of the present embodiment, the present invention is also very
The blind area of single branch thermocouple measurement temperature caused by initial setting height(from bottom) of the oxidation furnace reaction chamber bottom because of outer tube is made up well,
Complete flat-temperature zone and the 5th warm area can be covered by ensuring to draw during temperature.
Embodiment three
, can be by the first thermocouple and when technique needs to be primarily upon the profiling temperatures of four-temperature region and the 5th warm area
The axial distance of two thermocouples is arranged to the half of operable drawing warm area stroke, then both can overcome the disadvantages that single branch thermocouple in oxidation furnace reaction chamber
The blind area of room bottom measurement temperature, while and can covering needs most the four-temperature region of understanding and the Temperature Distribution feelings of the 5th warm area
Condition.The more drawing temperature time can so be saved.
It should be noted that the distance of two thermocouple measurement ends is set between embodiment one, two, can be according to reality
Border forms many thermocouple allocation plans using needs.Closer to the drawing temperature overlapping region that embodiment one, two thermocouples are formed
Wider, the contrast points of temperature are more, while thermometric blind spot is eliminated, draw warm efficiency higher.Those skilled in the art is all
It is appreciated that here is omitted.
Above-described is only the preferred embodiments of the present invention, the embodiment and the patent guarantor for being not used to the limitation present invention
Scope, therefore the equivalent variations that every specification and accompanying drawing content with the present invention is made are protected, similarly should be included in this hair
In bright protection domain.
Claims (10)
1. a kind of vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment, every section of warm area of oxidation furnace reaction chamber
The Spike thermocouples and Profile thermocouples of the oxidation furnace itself for measuring and controlling temp are equipped with, it is outer that temperature measuring equipment includes an insertion
Sleeve pipe and measurement end are located at first thermocouple on outer tube top, it is characterized in that：The second thermocouple is also inserted with the outer tube, outside
In sleeve pipe axial distance of the measurement end of two thermocouples along outer tube between initial setting height(from bottom) of the outer tube in oxidation furnace extremely
Between its stroke height；
Wherein, by when drawing warm, making the top of outer tube rise to the drawing temperature starting point in oxidation furnace reaction chamber inner top region,
And first, second thermocouple is set to be displaced downwardly to drawing of the outer tube in oxidation furnace reaction chamber at initial setting height(from bottom) with outer tube
Warm terminal, and thermometric simultaneously, to eliminate in the blind area of reaction chamber bottom measurement temperature, precise calibration temperature deviation；It is meanwhile logical
The contrast that trip temperature is entered in the overlapping region passed through to first, second thermocouple when drawing warm is crossed, warm efficiency is drawn to improve.
2. the vertical oxidation according to claim 1 that be used for semiconductor heat processing containing temperature measuring equipment, its feature exist
In：The axial distance of two thermocouples is the operable half for drawing warm area stroke.
3. the vertical oxidation according to claim 1 that be used for semiconductor heat processing containing temperature measuring equipment, its feature exist
In：The axial height of second thermocouple subtracts initial setting height(from bottom) for the axial height of first thermocouple.
4. the vertical oxidation according to claim 1 that be used for semiconductor heat processing containing temperature measuring equipment, its feature exist
In：The outer tube is that its top can be inserted perpendicularly into by the patchhole of oxidation furnace reaction chamber bottom, and slides and connect with patchhole
The high temperature resistant quartz outer tube connect.
5. the vertical oxidation according to claim 1 that be used for semiconductor heat processing containing temperature measuring equipment, its feature exist
In：The outer tube has is fixedly connected with mechanism with two thermocouples.
6. the vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment according to claim 1 to 5 any one
Stove, it is characterized in that：The outer tube is inserted perpendicularly into by the patchhole of oxidation furnace reaction chamber bottom, and with reaction chamber inwall and
Heat-preserving container has gap.
7. the vertical oxidation according to claim 1 or 2 that be used for semiconductor heat processing containing temperature measuring equipment, its feature
It is：It is fixed in the outer tube to be inserted with two R type thermocouples, and the measurement end axial distance of two thermocouples between outer tube in oxygen
Change the initial setting height(from bottom) in stove between its stroke height.
8. the vertical oxidation according to claim 7 that be used for semiconductor heat processing containing temperature measuring equipment, its feature exist
In：The temperature-measuring range of the R types thermocouple is 0~1300 DEG C.
9. the vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment according to claim 1 to 5 any one
Stove, it is characterised in that：The outer wall of the outer tube has the indentation of some display stroke heights.
10. the vertical oxidation for being used for semiconductor heat processing containing temperature measuring equipment according to claim 1 to 5 any one
Stove, it is characterised in that：A link gear outside the external oxidation furnace reaction chamber bottom of outer tube.
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| CN111650236A (en) * | 2020-05-21 | 2020-09-11 | 西部超导材料科技股份有限公司 | Method for measuring titanium alloy beta transition temperature by adopting vertical tube furnace |
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| US5622639A (en) * | 1993-07-29 | 1997-04-22 | Tokyo Electron Kabushiki Kaisha | Heat treating apparatus |
| CN2755536Y (en) * | 2003-10-14 | 2006-02-01 | 武东胜 | Thermoelectric inspection charger |
| JP2006245202A (en) * | 2005-03-02 | 2006-09-14 | Denso Corp | Heat treatment apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0555155A (en) * | 1991-08-28 | 1993-03-05 | Toshiba Corp | Semiconductor thermal treatment apparatus |
| US6550963B2 (en) * | 2001-04-26 | 2003-04-22 | Daily Instruments | Multipoint thermocouple |
| CN101281000A (en) * | 2007-04-04 | 2008-10-08 | 中国矿业大学 | High temperature furnace capable of displaying and controlling flat-temperature zone |
| CN201421376Y (en) * | 2009-04-27 | 2010-03-10 | 绍兴春晖自动化仪表有限公司 | Multi-section temperature-measuring armored thermocouple |
| CN202420706U (en) * | 2012-01-17 | 2012-09-05 | 上海甫研电子科技有限公司 | Noble-metal thermocouple for semiconductor diffusion furnace |
| CN203396504U (en) * | 2013-08-30 | 2014-01-15 | 重庆迪洋仪表有限责任公司 | Thermocouple dedicated to blast furnace body |
| CN203719787U (en) * | 2014-02-20 | 2014-07-16 | 北京七星华创电子股份有限公司 | Vertical oxidation furnace temperature measuring device for semiconductor heat treatment |
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2014
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5622639A (en) * | 1993-07-29 | 1997-04-22 | Tokyo Electron Kabushiki Kaisha | Heat treating apparatus |
| CN2755536Y (en) * | 2003-10-14 | 2006-02-01 | 武东胜 | Thermoelectric inspection charger |
| JP2006245202A (en) * | 2005-03-02 | 2006-09-14 | Denso Corp | Heat treatment apparatus |
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