CN103668348A - Plating method of total-sulfate trivalent chromium plating solution - Google Patents
Plating method of total-sulfate trivalent chromium plating solution Download PDFInfo
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- CN103668348A CN103668348A CN201210324693.0A CN201210324693A CN103668348A CN 103668348 A CN103668348 A CN 103668348A CN 201210324693 A CN201210324693 A CN 201210324693A CN 103668348 A CN103668348 A CN 103668348A
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Abstract
The invention discloses a plating method of a total-sulfate trivalent chromium plating solution. The trivalent chromium plating solution comprises the following components: 275-325g/L of chromium sulfate, 100-120g/L of potassium sulfate, 100-120g/L of sodium sulfate, 90-110g/L of boric acid, 30-50g/L of sodium borate, 0.25-0.35mol/L of potassium citrate, 0.40-0.50mol/L of sodium tartrate, 5-7g/L of vinyl diamine acetic acid, 2-3g/L of benzoic sulfimide, 0.5-1.5g/L of glycerol and the balance of water. The plating method is characterized in that the pH value of the plating solution is 2.0-2.8, the temperature is 45-55 DEG C, the cathode current density is 12-14A/dm<2>, and the plating time is 25-35 minutes.
Description
Technical field
The present invention relates to electroplating technology field, relate in particular to a kind of electro-plating method of whole sulphate type trivalent chromium electroplate liquid.
Background technology
Chromium coating is applied very extensive because having the features such as light, hard, anti-discolouring, wear-corrosion resistance be good in industry.Chrome-plated process is all to adopt chromic acid as the sexavalent chrome chrome-plated process in chromium source for a long time.As a kind of electroplating technology, there are some defects in hexavalent chromium plating technically, as extremely low in cathode efficiency; Dispersion and the covering power of chromium plating are poor; And in chrome-plating process, do not allow center-off etc.The more important thing is, sexavalent chrome be in electroplating industry the most seriously, one of the most unmanageable source of pollution.
Along with the enhancing of people's environmental consciousness, sexavalent chrome is subject to more and more stricter restriction as harmful source of pollution in electroplating industry.The countries and regions such as the World Health Organization, the U.S., Japan, Europe have been made strict restriction to sexavalent chrome and have been used regulation, as the U.S. changed chromic emission standard into 0.01mg/L by 0.05mg/L from 1997, and forbid adopting hexavalent chromium plating technique before being specified in 2010; The < < ROHS > > that European Parliament and board of management promulgate also required from 1 day July in 2006, and the new electronics and the electric installation that are invested in market must not contain sexavalent chrome.And along with the establishment of China as international production Central Position, the Electroplating Operations of China not only will be followed National Environment Policy Act rule about the regulation (Cr of sexavalent chrome discharge
6+discharge be no more than 0.5mg/L), also to face the challenge of the green barrier of international commodity in exchanging.
In order to replace the hexavalent chromium plating of heavily contaminated, people have carried out much research, comprise the chromium plating of lower concentration sexavalent chrome, alloy chromium replacement electroplating and trivalent chromium chrome plating etc.Wherein, development is abroad very fast owing to having the advantages such as low toxicity, low pollution for trivalent chromium chrome plating technique, and many developed countries just progressively replace sexavalent chrome chromium plating by trivalent chromium chrome plating technique, and the research of recent years trivalent chromium chrome plating also becomes one of focus gradually.
The solution system of trivalent chromium chrome plating is various both at home and abroad, mainly contains sulfate system and chloride system, and chloride soln system trivalent chromium bath is separated out chlorine at electroplating process Anodic and is difficult to recycling, also can be to environment; And adopt sulfate liquor system, be a kind of production technique of clean environment firendly, there is great application prospect.But, the defect that the method ubiquity of trivalent chromium chrome plating can not continue to thicken at present.For example Chinese patent CN1880512A discloses a kind of trivalent chromium bath system, this for electroplate liquid chromium sulphate, sodium sulfate, boric acid, Tai-Ace S 150, sodium lauryl sulphate, complexing agent, stablizer with certain proportion, form, all the other are water.It has the following disadvantages: the one, and adopt static plating solution to electroplate, near the pH of negative electrode raises too fast, cannot obtain the coating that thickness surpasses 5 μ m; The 2nd, plating solution adopts Tai-Ace S 150 as conducting salt, because its both sexes feature easily causes bath stability poor.
Summary of the invention
The object of the invention is to propose a kind of electro-plating method of whole sulphate type trivalent chromium electroplate liquid, by the method, can obtain the coating with practical value that surpasses 30 μ m.
For reaching this object, the present invention by the following technical solutions:
A kind of electro-plating method of whole sulphate type trivalent chromium electroplate liquid, consisting of of wherein said trivalent chromium plating solution: chromium sulphate 275-325g/L, potassium sulfate 100-120g/L, sodium sulfate 100-120g/L, boric acid 90-110g/L, Sodium Tetraborate 30-50g/L, Tripotassium Citrate 0.25-0.35mol/L, sodium tartrate 0.40-0.50mol/L, vinyl diamines acetic acid 5-7g/L, o-benzoic sulfimide 2-3g/L, glycerol 0.5-1.5g/L, surplus is water, described electro-plating method is that the pH value of electroplate liquid is 2.0-2.8, temperature is 45-55 ℃, cathode current density is 12-14A/dm
2, electroplating time is 25-35 minute.
Preferably, consisting of of wherein said trivalent chromium plating solution: chromium sulphate 300g/L, potassium sulfate 110g/L; sodium sulfate 110g/L, boric acid 100g/L, Sodium Tetraborate 40g/L; Tripotassium Citrate 0.30mol/L, sodium tartrate 0.45mol/L, vinyl diamines acetic acid 6g/L; o-benzoic sulfimide 2.5g/L; glycerol 1.0g/L, surplus is water, the pH value that described electro-plating method is electroplate liquid is 2.4; temperature is 50 ℃, and cathode current density is 13A/dm
2, electroplating time is 30 minutes.
The present invention has following beneficial effect:
1) optimized the component of electroplate liquid; make its not chloride; except conventional ingredient chromium sulphate; outside conducting salt sodium sulfate and potassium sulfate; determined that especially buffer reagent is boric acid, Sodium Tetraborate; complexing agent is that Tripotassium Citrate and tartrate are received; and three kinds of additive vinyl diamines acetic acid, o-benzoic sulfimide and glycerol have been selected; and on the basis of orthogonal experiment; optimized the selection of the content of these several components; make to reach synergistic action technique effect between chromium sulphate, sodium sulfate and the potassium sulfate of itself and basic plating solution, thereby guarantee to obtain thicker coating.
2) electro-plating method of the present invention is also to have carried out suitable adjustment for electroplating bath components, reduce the pH value of plating solution, in stronger sour environment, electroplate, improve a little current density, and the time of proper extension plating, coating is thickened, can reach 30-40 μ m, and make the metallurgical binding that is combined into of coating and matrix and the outward appearance of coating and excellent combination property.
Embodiment
Embodiment mono-
An electro-plating method for whole sulphate type trivalent chromium electroplate liquid, the consisting of of wherein said trivalent chromium plating solution: chromium sulphate 275g/L, potassium sulfate 120g/L; sodium sulfate 100g/L, boric acid 110g/L, Sodium Tetraborate 30g/L; Tripotassium Citrate 0.35mol/L, sodium tartrate 0.40mol/L, vinyl diamines acetic acid 7g/L; o-benzoic sulfimide 2g/L; glycerol 1.5g/L, surplus is water, the pH value that described electro-plating method is electroplate liquid is 2.0; temperature is 55 ℃, and cathode current density is 12A/dm
2, electroplating time is 35 minutes.
Embodiment bis-
An electro-plating method for whole sulphate type trivalent chromium electroplate liquid, the consisting of of wherein said trivalent chromium plating solution: chromium sulphate 325g/L, potassium sulfate 100g/L; sodium sulfate 120g/L, boric acid 90g/L, Sodium Tetraborate 50g/L; Tripotassium Citrate 0.25mol/L, sodium tartrate 0.50mol/L, vinyl diamines acetic acid 5g/L; o-benzoic sulfimide 3g/L; glycerol 0.5g/L, surplus is water, the pH value that described electro-plating method is electroplate liquid is 2.8; temperature is 45 ℃, and cathode current density is 14A/dm
2, electroplating time is 25 minutes.
Embodiment tri-
An electro-plating method for whole sulphate type trivalent chromium electroplate liquid, the consisting of of wherein said trivalent chromium plating solution: chromium sulphate 300g/L, potassium sulfate 110g/L; sodium sulfate 110g/L, boric acid 100g/L, Sodium Tetraborate 40g/L; Tripotassium Citrate 0.30mol/L, sodium tartrate 0.45mol/L, vinyl diamines acetic acid 6g/L; o-benzoic sulfimide 2.5g/L; glycerol 1.0g/L, surplus is water, the pH value that described electro-plating method is electroplate liquid is 2.4; temperature is 50 ℃, and cathode current density is 13A/dm
2, electroplating time is 30 minutes.
Claims (2)
1. the electro-plating method of a whole sulphate type trivalent chromium electroplate liquid, it is characterized in that, consisting of of wherein said trivalent chromium plating solution: chromium sulphate 275-325g/L, potassium sulfate 100-120g/L, sodium sulfate 100-120g/L, boric acid 90-110g/L, Sodium Tetraborate 30-50g/L, Tripotassium Citrate 0.25-0.35mol/L, sodium tartrate 0.40-0.50mol/L, vinyl diamines acetic acid 5-7g/L, o-benzoic sulfimide 2-3g/L, glycerol 0.5-1.5g/L, surplus is water, described electro-plating method is that the pH value of electroplate liquid is 2.0-2.8, temperature is 45-55 ℃, cathode current density is 12-14A/dm
2, electroplating time is 25-35 minute.
2. the electro-plating method of a kind of whole sulphate type trivalent chromium electroplate liquid as claimed in claim 1; it is characterized in that; consisting of of wherein said trivalent chromium plating solution: chromium sulphate 300g/L; potassium sulfate 110g/L; sodium sulfate 110g/L; boric acid 100g/L, Sodium Tetraborate 40g/L, Tripotassium Citrate 0.30mol/L; sodium tartrate 0.45mol/L; vinyl diamines acetic acid 6g/L, o-benzoic sulfimide 2.5g/L, glycerol 1.0g/L; surplus is water; described electro-plating method is that the pH value of electroplate liquid is 2.4, and temperature is 50 ℃, and cathode current density is 13A/dm
2, electroplating time is 30 minutes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201210324693.0A CN103668348A (en) | 2012-09-04 | 2012-09-04 | Plating method of total-sulfate trivalent chromium plating solution |
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| CN201210324693.0A CN103668348A (en) | 2012-09-04 | 2012-09-04 | Plating method of total-sulfate trivalent chromium plating solution |
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| CN103668348A true CN103668348A (en) | 2014-03-26 |
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| CN201210324693.0A Pending CN103668348A (en) | 2012-09-04 | 2012-09-04 | Plating method of total-sulfate trivalent chromium plating solution |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105018974A (en) * | 2015-08-21 | 2015-11-04 | 无锡桥阳机械制造有限公司 | Trivalent chromium electroplate liquid and preparing method thereof |
| EP3725920A4 (en) * | 2017-12-13 | 2021-04-21 | JCU Corporation | Trivalent chromium plating solution and method for chromium-plating using same |
-
2012
- 2012-09-04 CN CN201210324693.0A patent/CN103668348A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105018974A (en) * | 2015-08-21 | 2015-11-04 | 无锡桥阳机械制造有限公司 | Trivalent chromium electroplate liquid and preparing method thereof |
| EP3725920A4 (en) * | 2017-12-13 | 2021-04-21 | JCU Corporation | Trivalent chromium plating solution and method for chromium-plating using same |
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Application publication date: 20140326 |