CN103646843A - Particle material surface plasma processing device - Google Patents
Particle material surface plasma processing device Download PDFInfo
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- CN103646843A CN103646843A CN201310605804.XA CN201310605804A CN103646843A CN 103646843 A CN103646843 A CN 103646843A CN 201310605804 A CN201310605804 A CN 201310605804A CN 103646843 A CN103646843 A CN 103646843A
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- reactor chamber
- surface plasma
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Abstract
The invention relates to particle material surface plasma processing device, which comprises a reactor chamber shell, a drum, a rod electrode and a power supply, wherein one end part of the drum is provided with an end cover, the rod electrode is fixed at the center of the end cover, the drum and the rod electrode are both arranged in the reactor chamber shell, the reactor chamber shell is a conductive shell, and the reactor chamber shell and the rod electrode are connected to a positive electrode and a negative electrode of the power supply respectively. According to the invention, a particle material is processed by adopting drum type plasmas, the plasmas are generated by discharging of the reactor chamber shell and the rod electrode, the drum rotates continuously so as to enable the particle material not easy to stack and cover, the particle material turns over continuously in the drum, thereby being capable of enabling each surface of the particle material to be exposed in the plasmas, enabling each surface of the particle material to be fully processed, and being good in processing effect.
Description
Technical field
The invention belongs to plasma processing apparatus, be specifically related to a kind of granule materials surface plasma processing unit.
Background technology
Material surface modifying treatment technology is one of current material preparation technology of generally using, it is under certain external condition, material exterior materials and material surface generation physics or chemical reaction, thereby material surface state changed or produce new element and new group at material surface, finally meeting the needs of practical application.
But, the fast development of modern industry is had higher requirement to material wear-resistant wiping, wearing and tearing and the performance such as anticorrosive, meanwhile, also more and more higher to the requirement of environmental protection, thus effectively promote to be called as the development of the material plasma process for modifying surface of green production process.
Yet, for graininess or granular material, the characteristic with accumulation, when adopting plate electrode plasma treatment material, granule materials remains static, and often easily piles up, and cause graininess or granular material not to be exposed to completely in the middle of plasma, therefore, at least certain simultaneously can not be processed completely to make graininess or granular material, causes the effect of processing so desirable.
Summary of the invention
In order to solve the above-mentioned problems in the prior art, provide a kind of granule materials surface plasma processing unit.
The technical solution adopted in the present invention is: a kind of granule materials surface plasma processing unit, comprise reactor chamber housing, rotary drum, bar electrode and power supply, one end of above-mentioned rotary drum is provided with end cap, above-mentioned bar electrode is fixed on described end cap center, above-mentioned rotary drum and bar electrode are all located in above-mentioned reactor chamber housing, above-mentioned reactor chamber housing is conductive shell, and above-mentioned reactor chamber housing and above-mentioned bar electrode are connected respectively the both positive and negative polarity of above-mentioned power supply.
Preferably, above-mentioned rotary drum is netted columnar structured, and above-mentioned rotary drum rotates along central axis.
Preferably, above-mentioned drum inner wall is also provided with at least one baffle plate vertically.
Preferably, above-mentioned drum inner wall is provided with four baffle plates vertically, above-mentioned four baffle plates at above-mentioned drum inner wall along circumference spaced set.
Preferably, above-mentioned bar electrode adopts conducting circular cylinder electrode.
Preferably, above-mentioned conducting circular cylinder electrode adopts metallic conduction cylinder electrode.
Preferably, above-mentioned reactor chamber housing is vacuum reaction chamber.
Preferably, on above-mentioned bar electrode, at least two paddles are also installed.
Preferably, above-mentioned paddle adopts insulation oar.
Adopt the beneficial effect of the technical program to be: a kind of granule materials surface plasma processing unit, comprise reactor chamber housing, rotary drum, bar electrode and power supply, one end of described rotary drum is provided with end cap, described bar electrode is fixed on described end cap center, described rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, and described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of described power supply.The present invention adopts rotary drum plasma treatment granular material, utilize reactor chamber housing and bar electrode discharge generation plasma, and rotary drum constantly rotates, making granular material be not easy to pile up covers, granular material is ceaselessly rolling in rotary drum, each face of granular material can be taken turns to be exposed in plasma, each face of surface of granular material is all processed fully, the present invention has excellent treatment effect.
Accompanying drawing explanation
For content of the present invention is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the present invention is further detailed explanation below, wherein:
Fig. 1 is the structural representation of the embodiment of the present invention 1;
Fig. 2 is the structural representation of the embodiment of the present invention 2;
Fig. 3 is the structural representation of the embodiment of the present invention 3;
In figure, 1. reactor chamber housing 2. bar electrode 3. power supply 4. baffle plate 5. rotary drum 6. paddles.
Embodiment
Below in conjunction with accompanying drawing, describe specific embodiments of the invention in detail.
As shown in Figure 1, a kind of granule materials surface plasma processing unit, comprise reactor chamber housing 1, rotary drum 5, bar electrode 2 and power supply 3, bar electrode 2 adopts metallic conduction electrode, it is netted columnar structured that rotary drum 5 is, one end of rotary drum 5 is provided with an end cap, bar electrode is fixed on end cap center, bar electrode 2 is fixed on the center of above-mentioned end cap, bar electrode 2 adopts metallic conduction cylinder electrode, rotary drum 5 and bar electrode 2 are all located in reactor chamber housing 1, reactor chamber housing 1 is conductive shell, reactor chamber housing 1 and described bar electrode 2 are electrically connected to respectively the both positive and negative polarity of described power supply 3 by wire, in reative cell, adopt vacuum.When power connection, between reactor chamber housing 1 and bar electrode 2, just carry out vacuum discharge, produce plasma, rotary drum 5 rotates simultaneously, granular material is constantly rolling in rotary drum 5, make each face of granular material take turns to be exposed in plasma, each face of surface of granular material is all processed fully.
As shown in Figure 2, all the other are identical with embodiment 1, difference is, at drum inner wall, be provided with vertically four baffle plates 4, above-mentioned four baffle plates 4 at above-mentioned drum inner wall along circumference spaced set, baffle plate has played the effect of a stirring in the present embodiment, can better make each surface of processed granular material be exposed in plasma.
As shown in Figure 3, all the other are identical with embodiment 2, difference is, on bar electrode 2, be provided with 6 paddles 6, paddle 6 adopts insulation oar, for stirring particles shape material, plays good peptizaiton, can better make each surface of processed granular material be exposed in plasma, granular material can be fully stirred.
The invention has the beneficial effects as follows: a kind of granule materials surface plasma processing unit, comprise reactor chamber housing, rotary drum, bar electrode and power supply, one end of described rotary drum is provided with end cap, described bar electrode is fixed on described end cap center, described rotary drum and bar electrode are all located in described reactor chamber housing, described reactor chamber housing is conductive shell, and described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of described power supply.The present invention adopts rotary drum plasma treatment granular material, utilize reactor chamber housing and bar electrode discharge generation plasma, and rotary drum constantly rotates, making granular material be not easy to pile up covers, granular material is ceaselessly rolling in rotary drum, each face of granular material can be taken turns to be exposed in plasma, each face of surface of granular material is all processed fully, the present invention has excellent treatment effect.
Above-described is only the preferred embodiment of the present invention, it should be pointed out that for the person of ordinary skill of the art, without departing from the concept of the premise of the invention, can also make some distortion and improvement, and these all belong to protection scope of the present invention.
Claims (9)
1. a granule materials surface plasma processing unit, comprise reactor chamber housing, rotary drum, bar electrode and power supply, it is characterized in that, one end of described rotary drum is provided with end cap, described bar electrode is fixed on described end cap center, described rotary drum and bar electrode are all located in described reactor chamber housing, and described reactor chamber housing is conductive shell, and described reactor chamber housing and described bar electrode are connected respectively the both positive and negative polarity of described power supply.
2. granule materials surface plasma processing unit according to claim 1, is characterized in that, described rotary drum is netted columnar structured, and described rotary drum rotates along central axis.
3. granule materials surface plasma processing unit according to claim 1 and 2, is characterized in that, described drum inner wall is also provided with at least one baffle plate vertically.
4. granule materials surface plasma processing unit according to claim 3, is characterized in that, described drum inner wall is provided with four baffle plates vertically, described four baffle plates at described drum inner wall along circumference spaced set.
5. granule materials surface plasma processing unit according to claim 1, is characterized in that, described bar electrode adopts conducting circular cylinder electrode.
6. granule materials surface plasma processing unit according to claim 5, is characterized in that, described conducting circular cylinder electrode adopts metallic conduction cylinder electrode.
7. granule materials surface plasma processing unit according to claim 1, is characterized in that, described reactor chamber housing is conductive vacuum reative cell.
8. granular material plasma processing apparatus according to claim 1, is characterized in that, at least two paddles are also installed on described bar electrode.
9. granular material plasma processing apparatus according to claim 8, is characterized in that, described paddle adopts insulation oar.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310605804.XA CN103646843A (en) | 2013-11-26 | 2013-11-26 | Particle material surface plasma processing device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310605804.XA CN103646843A (en) | 2013-11-26 | 2013-11-26 | Particle material surface plasma processing device |
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| CN103646843A true CN103646843A (en) | 2014-03-19 |
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| CN201310605804.XA Pending CN103646843A (en) | 2013-11-26 | 2013-11-26 | Particle material surface plasma processing device |
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Citations (10)
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| US4286166A (en) * | 1978-09-07 | 1981-08-25 | Glukhikh Vasily A | Device for electron irradiation of rolled materials |
| CN1285253A (en) * | 1999-08-18 | 2001-02-28 | 日新电机株式会社 | Electric arc type ion plating device |
| US6486593B1 (en) * | 2000-09-29 | 2002-11-26 | The United States Of America As Represented By The United States Department Of Energy | Plasma accelerator |
| CN101297064A (en) * | 2005-09-13 | 2008-10-29 | 李·R·威廉斯 | Method of and apparatus for treating particulate materials for improving the surface characteristics thereof |
| CN201335477Y (en) * | 2008-12-17 | 2009-10-28 | 周志杰 | Centrifugal atomizing humidifier without white powder phenomenon |
| CN102625729A (en) * | 2009-06-09 | 2012-08-01 | 创新碳有限公司 | Methods and apparatus for particle processing with plasma |
| CN102665894A (en) * | 2009-11-23 | 2012-09-12 | 3M创新有限公司 | Methods of surface treating porous particles |
| CN103596351A (en) * | 2013-11-26 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma processing device for granular materials |
| CN203590583U (en) * | 2013-11-26 | 2014-05-07 | 苏州市奥普斯等离子体科技有限公司 | Granular material plasma processing apparatus |
| CN203588969U (en) * | 2013-11-26 | 2014-05-07 | 苏州市奥普斯等离子体科技有限公司 | Granular material surface plasma processing apparatus |
-
2013
- 2013-11-26 CN CN201310605804.XA patent/CN103646843A/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4286166A (en) * | 1978-09-07 | 1981-08-25 | Glukhikh Vasily A | Device for electron irradiation of rolled materials |
| CN1285253A (en) * | 1999-08-18 | 2001-02-28 | 日新电机株式会社 | Electric arc type ion plating device |
| US6486593B1 (en) * | 2000-09-29 | 2002-11-26 | The United States Of America As Represented By The United States Department Of Energy | Plasma accelerator |
| CN101297064A (en) * | 2005-09-13 | 2008-10-29 | 李·R·威廉斯 | Method of and apparatus for treating particulate materials for improving the surface characteristics thereof |
| CN201335477Y (en) * | 2008-12-17 | 2009-10-28 | 周志杰 | Centrifugal atomizing humidifier without white powder phenomenon |
| CN102625729A (en) * | 2009-06-09 | 2012-08-01 | 创新碳有限公司 | Methods and apparatus for particle processing with plasma |
| CN102665894A (en) * | 2009-11-23 | 2012-09-12 | 3M创新有限公司 | Methods of surface treating porous particles |
| CN103596351A (en) * | 2013-11-26 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma processing device for granular materials |
| CN203590583U (en) * | 2013-11-26 | 2014-05-07 | 苏州市奥普斯等离子体科技有限公司 | Granular material plasma processing apparatus |
| CN203588969U (en) * | 2013-11-26 | 2014-05-07 | 苏州市奥普斯等离子体科技有限公司 | Granular material surface plasma processing apparatus |
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Application publication date: 20140319 |