CN103645613B - A kind of method for the polishing of litho machine connection edge of angle mirror - Google Patents
A kind of method for the polishing of litho machine connection edge of angle mirror Download PDFInfo
- Publication number
- CN103645613B CN103645613B CN201310652352.0A CN201310652352A CN103645613B CN 103645613 B CN103645613 B CN 103645613B CN 201310652352 A CN201310652352 A CN 201310652352A CN 103645613 B CN103645613 B CN 103645613B
- Authority
- CN
- China
- Prior art keywords
- angle mirror
- framework
- edge
- edge fit
- molectron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The invention discloses a kind of method for the connection edge of angle mirror polishing of substep projection mask aligner, including: the 1. structure according to angle mirror to be processed, process edge fit framework; 2. clean room and 1 grade of marble precision stage are set up; 3. on precision stage, staff's wear gloves, dip in the upper ethanol polished face to angle mirror with optics glass wiping cloth and carry out wiping; 4. angle mirror to be processed is embedded in the inner edge of described edge fit framework, make polished with edge fit framework bottom surface in approximately the same plane; 5. with filler by glued to edge fit framework and angle mirror, framework angle mirror molectron is become; 6. polished of the framework angle mirror molectron described in reconditioning; 7. polish and revise; 8. edge fit framework and angle mirror are separated. The present invention effectively reduces finished edge and subsides size, expands the clear aperature of burnishing surface, improves polishing efficiency, and the angle mirror of processing meets the high-quality requirement of substep projection mask aligner.
Description
Technical field
The present invention relates to photoetching machine technique field, a kind of particularly method for the connection edge of angle mirror polishing of substep projection mask aligner, this angle mirror is mainly used in the position alignment of substep projection mask aligner labelling, and the silicon chip that this achievement directly influences in substep projection mask aligner is directed at automatically to position grating.
Background technology
Traditional finishing method is in polishing process, polishing liquid and residual polishing powder in large quantities are easily piled up by burnishing surface edge, cause that burnishing surface edge grinding removal amount increases so that burnishing surface edge occurs that subsiding is turned-down edge, thus causing that burnishing surface surface roughness and surface precision reduce. In order to obtain burnishing surface surface roughness and surface precision preferably, it is typically only capable to sacrifice effective polishing area, reduces clear aperature and obtain, or realized by edge correction repeatedly. Seriously reduce production efficiency, it is very difficult to reach desirable table variable mass.
Summary of the invention
It is an object of the invention to overcome above-mentioned the deficiencies in the prior art, it is provided that a kind of method for the connection edge of angle mirror polishing of substep projection mask aligner, make angle mirror meet required surface roughness and surface precision, meet litho machine to position grating automatically to alignment request.
To achieve these goals, the technical solution of the present invention is:
A kind of method for the connection edge of angle mirror polishing of substep projection mask aligner, it is characterized in that, the method comprises the following steps:
1. the structure according to angle mirror to be processed, processes edge fit framework;
It is three-back-shaped that described edge fit framework is parallel four limits, and the three-back-shaped inner edge size in these parallel four limits is equal to the overall dimensions of angle mirror to be processed;
2. set up clean room and 1 grade of marble precision stage, precision stage carries out the glued work of following angle mirror and edge fit framework;
3. on precision stage, staff's wear gloves, dip in the upper ethanol polished face to angle mirror with optics glass wiping cloth and carry out wiping, butt joint edge framework carries out wiping, carefully watch surface dirt, until without the visible dust of human eye, in one, work top upper berth cleaning wiping cloth, being put on precision stage by edge fit framework good for wiping, it is domatic upward;
4. angle mirror to be processed is embedded in the inner edge of described edge fit framework, the angle faces of angle mirror and planes overlapping on edge fit framework, make polished with edge fit framework bottom surface in approximately the same plane;
5. with filler by glued to edge fit framework and angle mirror, framework angle mirror molectron is become, this angle mirror molectron of eye-observation, must not occur that seam forms seamless link;
6. polished of the framework angle mirror molectron described in reconditioning, it is desired to burnishing surface flatness is better than 0.005mm, and roughness Ra is better than 0.4 micron;
7. framework angle mirror molectron is lain in a horizontal plane on the work top of buffing machine, open buffing machine Incision Machine's so that under framework angle mirror molectron, datum level and buffing machine work top are combined closely, and polished horizontal positioned is polished and is revised;
8. the framework angle mirror molectron completing polishing is invaded thawing agent, separate edge fit framework and angle mirror.
Described filler is to be mixed according to a certain percentage by double; two combination epoxide-resin glues and reinforcing raw material, and this reinforcing raw material needs the physical characteristic according to institute's polish parts material to select the raw material of similar nature.
Compared with prior art, the invention has the beneficial effects as follows:
�� passes through edge fit framework, and the collapsing of the edges peak width of angle mirror polishing is of a size of the angle mirror being not added with edge fit framework and subsides the 1/3 1/4 of peak width size;
��, under identical appearance size condition, expands the clear aperature of burnishing surface, alleviates workpiece quality;
��, at the surface roughness reached needed for angle mirror and surface precision, improves polishing efficiency;
�� reduces production cost and improves conforming product rate, meets high-quality requirement.
�� guarantees that angle mirror complies fully with steppers to position grating automatically to alignment request.
Accompanying drawing explanation
Fig. 1 is the front view of middle frame angle mirror molectron of the present invention.
Fig. 2 is the sectional view of middle frame angle mirror molectron of the present invention.
Fig. 3 is the edge fit angle mirror polishing assay using the inventive method.
Fig. 4 is the edge fit angle mirror polishing assay not using the inventive method.
In figure: 1-edge fit framework, 2-angle mirror.
In Fig. 3, Fig. 4: X-measures length, Y-measures some vertical height
Detailed description of the invention
Below in conjunction with drawings and Examples, the invention will be further described, but should not limit the scope of the invention with this.
Preparing two glass angle mirror, polishing requires that flatness is better than 0.005mm, and roughness Ra is better than 0.4 micron. One glass angle mirror part is for the polishing of edge fit framework, and another part glass angle mirror part not edge fit framework polishes. Two kinds of polishings are measured parameter and are carried out Contrast on effect.
1. the structure according to angle mirror to be processed, processes edge fit framework;
It is three-back-shaped that described edge fit framework is parallel four limits, and the three-back-shaped inner edge size in these parallel four limits is equal to the overall dimensions of angle mirror to be processed, and this edge fit framework has one domatic, and this domatic angle of inclination is suitable with the angle of angle mirror to be processed;
2. set up clean room and 1 grade of marble precision stage, precision stage carries out the glued work of following angle mirror and edge fit framework;
3. on precision stage, staff's wear gloves, dip in the upper ethanol polished face to angle mirror with optics glass wiping cloth and carry out wiping, butt joint edge framework carries out wiping, carefully watch surface dirt, until without the visible dust of human eye, in one, work top upper berth cleaning wiping cloth, being put on precision stage by edge fit framework good for wiping, it is domatic upward;
4. press shown in Fig. 1, edge fit framework 1 good for wiping is horizontally placed on work top, then angle mirror 2 to be processed is placed in edge fit framework, keep burnishing surface and edge fit framework in approximately the same plane;
5. with filler by glued to edge fit framework and angle mirror, framework angle mirror molectron is become, this angle mirror molectron of eye-observation, must not occur that seam forms seamless link;
Described filler be a kind of use double; two combination epoxide-resin glue and two kinds reinforce the bonded adhesives that raw material mixes, the present embodiment adopts 320#H-K9L and 400#4J29 for reinforcing raw material. Open packing element outlet protection lid, in packing element outlet, mixed glue head is installed. Moving double-tube glue to rob, mixed glue head outflow glue 2��3g. mixes all the other two kinds reinforcing raw material stirring and is formed uniformly filler. and fill the continuous uniform painting of angle mirror surrounding with filler and form framework angle mirror molectron.
6. polished of the framework angle mirror molectron described in reconditioning, it is desired to burnishing surface flatness is better than 0.005mm, and roughness Ra is better than 0.4 micron;
7. framework angle mirror molectron is lain in a horizontal plane on the work top of QED buffing machine, open QED buffing machine Incision Machine's, datum level and QED buffing machine work top under framework angle mirror molectron are combined closely, polished horizontal positioned is polished and revises;
The angle mirror that 8. another part is not installed edge fit framework lies in a horizontal plane on the work top of QED buffing machine, open QED buffing machine Incision Machine's, datum level and QED buffing machine work top under angle mirror molectron are combined closely, and burnishing surface horizontal positioned is polished with identical technological parameter and revises;
10. the framework angle mirror molectron completing polishing is invaded thawing agent, separate edge fit framework and angle mirror.
Measure the part through two kinds of method processing respectively with TaylorHobsonPGI-1250A aspherical profile instrument, use the angle mirror assay of edge fit framework to see Fig. 3, do not use the angle mirror assay of edge fit framework to see Fig. 4. Boundary curve sudden change peak width size of subsiding is about 5.9mm as can be seen from Figure 3, and the degree of depth of subsiding is about 0.03mm, and all the other region curve are smooth without sudden change. Can be seen that boundary curve sudden change peak width size of subsiding is about 1.6mm from chart 4, it is smooth without sudden change that the degree of depth of subsiding is about all the other region curve of 0.021mm.. The above-mentioned edge fit framework angle mirror collapsing of the edges degree of depth is about 0.021 0.03, if the removal edge-protected chamfered region of 0.5mm and the angle mirror being not added with edge fit framework subside, depth disparity is little; Described edge fit framework angle mirror collapsing of the edges peak width is of a size of the angle mirror being not added with edge fit framework and subsides the 1/3 1/4 of peak width size.
Claims (2)
1. the method for the connection edge of angle mirror polishing of substep projection mask aligner, it is characterised in that the method comprises the following steps:
1. the structure according to angle mirror to be processed, processes edge fit framework;
It is three-back-shaped that described edge fit framework is parallel four limits, and the three-back-shaped inner edge size in these parallel four limits is equal to the overall dimensions of angle mirror to be processed;
2. set up clean room and 1 grade of marble precision stage, precision stage carries out the glued work of following angle mirror and edge fit framework;
3. on precision stage, staff's wear gloves, dip in the upper ethanol polished face to angle mirror with optics glass wiping cloth and carry out wiping, butt joint edge framework carries out wiping, carefully watch surface dirt, until without the visible dust of human eye, in one, work top upper berth cleaning wiping cloth, being put on precision stage by edge fit framework good for wiping, it is domatic upward;
4. angle mirror to be processed is embedded in the inner edge of described edge fit framework, the angle faces of angle mirror and planes overlapping on edge fit framework, make polished with edge fit framework bottom surface in approximately the same plane;
5. with filler by glued to edge fit framework and angle mirror, framework angle mirror molectron is become, this angle mirror molectron of eye-observation, must not occur that seam forms seamless link;
6. polished of the framework angle mirror molectron described in reconditioning, it is desired to burnishing surface flatness is better than 0.005mm, and roughness Ra is better than 0.4 micron;
7. framework angle mirror molectron is lain in a horizontal plane on the work top of buffing machine, open buffing machine Incision Machine's so that under framework angle mirror molectron, datum level and buffing machine work top are combined closely, and polished horizontal positioned is polished and is revised;
8. the framework angle mirror molectron completing polishing is invaded thawing agent, separate edge fit framework and angle mirror.
2. the method for the connection edge of angle mirror polishing of substep projection mask aligner according to claim 1, it is characterized in that, described filler is to be mixed according to a certain percentage by double; two combination epoxide-resin glues and reinforcing raw material, and this reinforcing raw material needs the physical characteristic according to institute's polish parts material to select the raw material of similar nature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310652352.0A CN103645613B (en) | 2013-12-05 | 2013-12-05 | A kind of method for the polishing of litho machine connection edge of angle mirror |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310652352.0A CN103645613B (en) | 2013-12-05 | 2013-12-05 | A kind of method for the polishing of litho machine connection edge of angle mirror |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103645613A CN103645613A (en) | 2014-03-19 |
| CN103645613B true CN103645613B (en) | 2016-06-08 |
Family
ID=50250851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310652352.0A Active CN103645613B (en) | 2013-12-05 | 2013-12-05 | A kind of method for the polishing of litho machine connection edge of angle mirror |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103645613B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108000245B (en) * | 2017-11-30 | 2019-05-10 | 东莞长盈精密技术有限公司 | Hole polishing turned-down edge means of defence |
| CN109551311A (en) * | 2018-12-12 | 2019-04-02 | 大连理工大学 | Reduce the method for turned-down edge phenomenon in a kind of mechanical lapping or polishing process |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1515776A (en) * | 1996-04-11 | 2004-07-28 | �ձ�������ʽ���� | Heat reinforcing sheet glass |
| CN1541151A (en) * | 2002-04-18 | 2004-10-27 | 株式会社荏原制作所 | Polishing method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004283962A (en) * | 2003-03-20 | 2004-10-14 | Noritake Co Ltd | Plane polishing method and plane polishing machine of plate work |
| JP5446250B2 (en) * | 2008-12-25 | 2014-03-19 | 凸版印刷株式会社 | Color filter substrate polishing method |
| TWI396003B (en) * | 2009-07-30 | 2013-05-11 | Au Optronics Corp | Display panel and methods for narrowing edge and increasing edge strength thereof |
-
2013
- 2013-12-05 CN CN201310652352.0A patent/CN103645613B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1515776A (en) * | 1996-04-11 | 2004-07-28 | �ձ�������ʽ���� | Heat reinforcing sheet glass |
| CN1541151A (en) * | 2002-04-18 | 2004-10-27 | 株式会社荏原制作所 | Polishing method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103645613A (en) | 2014-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105834859A (en) | Cold-machining technology for high-precision optical lenses | |
| JP6888476B2 (en) | Substrate manufacturing method | |
| CN103645613B (en) | A kind of method for the polishing of litho machine connection edge of angle mirror | |
| CN104440497A (en) | Polishing device and method for cambered surfaces of mobile phone panels | |
| CN109824249A (en) | A kind of 3D glass making procedures | |
| CN204183355U (en) | Optical mirror slip cold forming rigid plate | |
| CN105751012A (en) | Sealing surface grinding technology | |
| CN106337544B (en) | A kind of production method of marble parquets metope | |
| CN102059747A (en) | Method for forming sapphire square hole | |
| CN205600447U (en) | Planar pin -connected panel coping instrument of coping area boss annular | |
| CN104070466B (en) | A kind of resin finish dish | |
| JP2009107089A (en) | Lens holder and curved surface polishing method for lens | |
| CN107759056A (en) | A kind of cover-plate glass mould | |
| CN114193239B (en) | Mold core processing technology | |
| CN105345613B (en) | One kind is used for the precision machined method of angle mirror deep hole | |
| CN112476164B (en) | Method for manually correcting defects of convex surface of die | |
| CN104090469B (en) | Bonding and positioning method applied to precision machining of strip glass mirror in asymmetric structure | |
| CN207240963U (en) | A kind of molding die | |
| CN110539208B (en) | Ceramic cover plate processing method and ceramic cover plate | |
| CN208358502U (en) | A kind of full-automatic sander up and down | |
| CN101966682B (en) | Metal pot polishing process | |
| US1438100A (en) | Lens grinding | |
| CN207014144U (en) | A kind of marble line sander | |
| CN114310495B (en) | Sapphire optical element processing method based on lower-swinging machine | |
| CN214519372U (en) | Polisher with constant voltage mechanism floats |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |