CN103639089A - Developing agent spraying device and method - Google Patents
Developing agent spraying device and method Download PDFInfo
- Publication number
- CN103639089A CN103639089A CN201310567462.7A CN201310567462A CN103639089A CN 103639089 A CN103639089 A CN 103639089A CN 201310567462 A CN201310567462 A CN 201310567462A CN 103639089 A CN103639089 A CN 103639089A
- Authority
- CN
- China
- Prior art keywords
- developer
- nozzle
- cover body
- accumulator tank
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
- B05B14/30—Arrangements for collecting, re-using or eliminating excess spraying material comprising enclosures close to, or in contact with, the object to be sprayed and surrounding or confining the discharged spray or jet but not the object to be sprayed
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Abstract
The invention provides a developing agent spraying device and method. The developing agent spraying device is used for spraying a developing agent on a substrate. The developing agent spraying device comprises a reaction cavity, at least one spray nozzle, a recovery trough and a movable spray nozzle connecting device, wherein the reaction cavity is used for containing the substrate, the spray nozzle is located inside the reaction cavity and used for spraying the developing agent on the substrate, the recovery trough is located outside the reaction cavity and used for recovering the remaining developing agent, and the movable spray nozzle connecting device is located between the spray nozzle and the recovery trough. The movable spray nozzle connecting device comprises at least one cover, a connecting pipe and a driving part, wherein the cover is provided with a liquid inlet, one end of the connecting pipe is connected to the cover, the other end of the connecting pipe is connected to the recovery trough, the driving part is used for driving the cover to ascend and descend, and the developing agent sprayed out of the spray nozzle enters the recovery trough through the connecting pipe when the cover ascends till the liquid inlet of the cover corresponds to the spray nozzle.
Description
Technical field
The disclosure generally relates to a kind of developer spray equipment and method, and in particular to a kind of developer spray equipment and method, it can avoid developer solution to contact with air as far as possible, keeps the stability of concentration of developer.
Background technology
In the photoetching process of manufacturing at semiconductor devices and panel display board, circuitous pattern need to be after substrate surface be coated with photoresist, by exposing and development obtains.Wherein, needing to apply photoresist layer on the substrate of etching, exposure, however on photoresist layer, spray developer, by developer and photoresist layer, react, unwanted photoresist layer is removed; Take photoresist layer more afterwards as mask, etch the significant dimensions (Critical Dimension CD) needing.
Wherein, developer is that main component is the alkaline aqueous solution of tetramethylammonium hydroxide (TMAH).TMAH can with airborne CO
2reaction, and produce CO
3.CO
3concentration increase means that in developer, TMAH concentration declines and causes required development capability not enough.
Fig. 1 shows existing developer spray equipment, and wherein, it is upper that developer is ejected to substrate S via the nozzle 1 in reaction chamber 2, and unnecessary developer, after receiving tube 3 enters the interior recovery of accumulator tank 4, enters in nozzle 1 again.
In above-mentioned prior art, developer can frequently contact with air.For example, when not spraying, the part developer solution of nozzle periphery is exposed to the external world, can contact with air.In addition, there is crystallization in the developer going out for fear of nozzle, often need to carry out developer and spray in advance, so that nozzle is unobstructed, when pre-spray, developer directly sprays in reaction chamber, then flows into accumulator tank, therefore, can in reaction chamber, contact with air.
Visible, in prior art, developer frequently contacts with air, cause thus TMAH concentration in developer to decline, thereby this developer reclaims and directly uses and will have a strong impact on the stability, uniformity of CD.For overcoming this problem, must in accumulator tank, supplement the new liquid of TMAH.And, for the accurate CD that controls, need strictly according to CO
3concentration rising ratio is carried out the lifting revisal of TMAH concentration.Therefore the operation that, supplements new liquid not only improves developer cost but also very complicated, wayward.
Therefore there is following defect in existing developer spray equipment:
Developer in developer spray equipment is frequently exposed to air, with air haptoreaction, causes thus TMAH concentration to decline, and the developer of concentration deficiency will affect the stability of CD control.As supplemented new liquid for this reason, will make developer cost promote, make the complicated and developer rate of recovery of development operation to reduce.
In the disclosed above-mentioned information of described background technology part, only for strengthening the understanding to background of the present disclosure, so it can comprise the information not forming prior art known to persons of ordinary skill in the art.
Summary of the invention
Disclose a kind of developer spray equipment and method, can avoid developer solution to contact with air as far as possible, kept the stability of concentration of developer, and the stability, uniformity of CD.
Additional aspect of the present disclosure and advantage will partly be set forth in the following description, and partly will from describe, become obviously, or can the acquistion by practice of the present disclosure.
According to an aspect of the present disclosure, a kind of developer spray equipment is provided, for spraying developer to substrate, this spray equipment comprises: reaction chamber, for receiving this substrate; At least one nozzle, is positioned at this reaction chamber, for spraying developer to this substrate; Accumulator tank, is positioned at outside this reaction chamber, for receiving remaining developer; And movable jet nozzle connector, between this nozzle and accumulator tank, comprising: at least one cover body, it has inlet; Tube connector, one end is connected in cover body, and the other end is connected in accumulator tank; Drive division, for driving cover body lifting; Wherein, when cover body rises to its inlet and nozzle at once, from the developer of nozzle ejection, via this tube connector, enter this accumulator tank.
According to another aspect of the present disclosure, a kind of developer spraying method is provided, it utilizes developer spray equipment to spray developer to substrate, and this spray equipment comprises: reaction chamber, for receiving this substrate; At least one nozzle, is positioned at this reaction chamber, for spraying developer to this substrate; Accumulator tank, is positioned at outside this reaction chamber, for receiving remaining developer; And movable jet nozzle connector, between this nozzle and accumulator tank, comprising: at least one cover body, it has inlet; Tube connector, one end is connected in cover body, and the other end is connected in accumulator tank; Drive division, for driving cover body lifting; Wherein, when cover body rises to its inlet and nozzle at once, from the developer of nozzle ejection, via this tube connector, enter this accumulator tank;
Wherein, this developer spraying method comprises the following steps:
This cover body is risen to corresponding with its inlet and nozzle, spray in advance developer, make the developer of this nozzle ejection enter this accumulator tank via this tube connector;
This cover body is declined, transmit substrate, the substrate spraying developer to nozzle below; And
Complete after spraying, make this cover body rise to its inlet corresponding with nozzle.
In sum, by using developer spray equipment of the present disclosure and method, can avoid developer solution to contact with air as far as possible, effectively suppress CO
3generate, keep the stability of concentration of developer, and the stability, uniformity of CD, and higher developer rate of recovery benefit, thereby the consumption of minimizing TMAH.
Accompanying drawing explanation
By describe its example embodiment in detail with reference to accompanying drawing, above-mentioned and further feature of the present disclosure and advantage will become more obvious.
Fig. 1 illustrates the schematic diagram of existing developer spray equipment.
Fig. 2 illustrates the schematic diagram of the developer spray equipment of the disclosure the first embodiment, and wherein, developer spray equipment is in spraying state.
Fig. 3 illustrates the schematic diagram of the developer spray equipment of the disclosure the first embodiment, and wherein, developer spray equipment is not in spraying state.
Fig. 4 illustrates the nozzle of developer spray equipment and the local enlarged diagram of cover body.
Fig. 5 illustrates the schematic diagram of the developer spray equipment of the disclosure the second embodiment.
The specific embodiment
Referring now to accompanying drawing, example embodiment is more fully described.Yet example embodiment can be implemented in a variety of forms, and should not be understood to be limited to embodiment set forth herein; On the contrary, provide these embodiments to make the disclosure by comprehensive and complete, and the design of example embodiment is conveyed to those skilled in the art all sidedly.In the drawings, for clear, exaggerated the thickness of region and layer.Identical in the drawings Reference numeral represents same or similar structure, thereby will omit their detailed description.
Described feature, structure or characteristic can be combined in one or more embodiments in any suitable manner.In the following description, thus provide many details to provide fully understanding embodiment of the present disclosure.Yet, one of skill in the art will appreciate that and can put into practice technical scheme of the present disclosure and there is no one or more in described specific detail, or can adopt other method, constituent element, material etc.In other cases, be not shown specifically or describe known configurations, material or operation to avoid fuzzy each side of the present disclosure.
Present embodiment provides a kind of developer spray equipment, and for spraying developer to substrate S, spray equipment comprises: reaction chamber 2, at least one nozzle 1, accumulator tank 4 and movable jet nozzle connector 5.
As shown in Figure 2,3, 4, movable jet nozzle connector 5, between nozzle 1 and accumulator tank 4, comprising: at least one cover body 51, and it has inlet 511; Tube connector 52, one end is connected in cover body 51, and the other end is connected in accumulator tank 4, and wherein, cover body 51 can at primary importance and second place intercropping reciprocating type mobile, that is, move between primary importance and the second place according to action need.As shown in Figure 3,4, when cover body 51 moves to the second place, from the developer of nozzle 1 ejection, via tube connector 52, enter accumulator tank 4.When cover body 51 moves to primary importance, cover body 51 leaves nozzle 1.Like this, in the process of pre-spray developer, developer can directly enter tube connector by cover body, and then is recovered groove reception, avoids contacting, reacting with air, affects the concentration of developer.And, in the idle process transmitting without substrate, for preventing that the developer that nozzle crystallization is regularly ejected from also can directly enter in accumulator tank via this movable jet nozzle connector, makes developer recovery utilization rate high.
In present embodiment, the quantity of cover body 51 is corresponding with nozzle 1, and as shown in Figure 2, developer spray equipment is provided with two nozzles 1, and corresponding, the quantity of cover body 51 is two.Certainly, the quantity of cover body 51 also can be one, has a plurality of inlets corresponding with nozzle 1 511 and contact site 512 in cover body 51.
Preferably, cover body 51 be positioned at nozzle 1 under, and there is the contact site consistent with the surface configuration of nozzle 1 512.As shown in Figure 4, when cover body 51, by its primary importance, to rise to its inlet 511 seasonable with 1 pair, nozzle, that is the 2nd put Time, and contact site 512 contact coated nozzles 1, all enter in cover body 51 liquid spraying from nozzle 1.In addition, in the idle process transmitting without substrate, because contact site 512 covers nozzle 1, thereby can prevent that the developer of nozzle periphery from exposing, and contacts with air.Therefore,, in off working state, cover body plays the effect of avoiding developer to contact with air.
Wherein, contact site 512 is preferably by alkali-proof cushion and makes, and therefore, while contacting with nozzle 1, can prevent alkaline developer corrosion cover body.
In present embodiment, two cover bodies 51 connect by connecting rod 513.Developer spray equipment also comprises drive division 53, and drive division 53 can be cylinder, and the piston rod 531 of cylinder is connected with connecting rod 513, by flexible drive two cover body 51 synchronization liftings of piston rod 531.
In present embodiment, this reaction chamber 2 has perforate 21, and tube connector 52 is arranged in perforate 21, and tube connector 52 can stretch along with the lifting of cover body, and in flexible process, keeps being connected with the sealing of perforate 21 peripheries, prevents liquid leakage.
Preferably, tube connector 52 comprises inner tube 521 and is set in the outer tube 522 outside inner tube 521, and the mouth of pipe of inner tube 521 is communicated with inlet 511, and inner tube 521 can stretch along with the lifting of cover body 51, and outer tube 522 and perforate 21 peripheries seal combinations.
In present embodiment, developer spray equipment also comprises receiving tube 3 and recovery tube 6.Receiving tube 3 is connected between reaction chamber 2 and accumulator tank 4, when cover body 51 is when covering nozzle 1, from the developer of nozzle 1, via receiving tube 3, enters accumulator tank 4.Recovery tube 6 is connected in accumulator tank 4 and nozzle 1, for by the developer replenishing nozzle 1 in accumulator tank 4.
As shown in Figure 5, present embodiment and embodiment 1 are roughly the same, difference part is only: present embodiment drive division 53 is positioned at the outside of reaction chamber 2, be specially, the drive division 53 of cylinder form, its piston rod 531 parts stretch in reaction chamber 2, are connected with reaction chamber 2 sealings, and drive cover body 1 lifting, and cylinder body 532 is positioned at reaction chamber 2 outsides.Like this, without using the drive division in embodiment 1 with water proofing property, can apply the general drive units such as cylinder.
Other structures of developer spray equipment are identical with embodiment 1, therefore do not repeat at this.
The disclosure also provides a kind of developer spraying method, and it utilizes developer spray equipment to spray developer to substrate.Spray equipment comprises: reaction chamber 2, at least one nozzle 1, accumulator tank 4 and movable jet nozzle connector 5.
Movable jet nozzle connector 5, between nozzle 1 and accumulator tank 4, comprising: at least one cover body 51, and it has inlet 511; Tube connector 52, one end is connected in cover body 51, and the other end is connected in accumulator tank 4; Drive division 53, for driving cover body 51 liftings.
Wherein, this developer spraying method comprises the following steps:
Before formally spraying, carry out pre-spouted work, making to be developed the developer that nozzle that agent crystallization blocks sprayed in advance dredges, to spray smoothly, be specially: make cover body 51 rise to its inlet 511 corresponding with nozzle 1, pre-spray developer, makes the developer of nozzle 1 ejection enter accumulator tank 4 via tube connector 52;
Complete after spraying, make cover body 51 again rise to its inlet 511 corresponding with nozzle 1, thereby cover nozzle.
Wherein, on the transfer roller 7 of substrate S below nozzle 1, transmit, cover body 51 drops to and stops behind the below of transfer roller 7 mobilely, and substrate S receives the developer from nozzle in mobile process.
Preferably, complete after spraying, in the idle process transmitting without substrate, regularly spray developing agent, the developer ejecting enters in accumulator tank via movable jet nozzle connector, thereby not only prevents the developer crystallization at nozzle place, also can further prevent that developer from contacting with air.
Preferably, also comprise: by the developer replenishing nozzle 1 in accumulator tank 4.
Preferably, also comprise: detect the concentration of accumulator tank 4 interior developers, for example, if this concentration, lower than desired concn, fills into developer (, supplementing the new liquid of 25%TMAH), until reach desired concn in accumulator tank 4.
In sum, by using developer spray equipment of the present disclosure and method, can avoid developer solution to contact with air as far as possible, effectively suppress CO
3generate, keep the stability of concentration of developer, and the stability, uniformity of CD, and higher developer rate of recovery benefit, thereby the consumption of minimizing TMAH.
Below illustrate particularly and described illustrative embodiments of the present disclosure.Should be appreciated that, the disclosure is not limited to disclosed embodiment, and on the contrary, disclosure intention contains various modifications and the equivalent arrangements in the spirit and scope that are included in claims.
Claims (10)
1. a developer spray equipment, for to substrate spraying developer, this spray equipment comprises:
Reaction chamber, for receiving this substrate;
At least one nozzle, is positioned at this reaction chamber, for spraying developer to this substrate;
Accumulator tank, is positioned at outside this reaction chamber, for receiving remaining developer; And
Movable jet nozzle connector, between this nozzle and accumulator tank, comprising:
At least one cover body, it has inlet;
Tube connector, one end is connected in cover body, and the other end is connected in accumulator tank, and wherein, described cover body can be in primary importance and second place intercropping reciprocating type mobile;
Wherein, when described cover body moves to this bis-Wei Zhi Time, from the developer of nozzle ejection, via this tube connector, enter this accumulator tank, when cover body moves to this primary importance, this cover body leaves this nozzle.
2. developer spray equipment as claimed in claim 1, wherein, the quantity of this cover body and nozzle is two, this cover body be positioned at this nozzle under, and there is the contact site consistent with the surface configuration of this nozzle.
3. developer spray equipment as claimed in claim 1, wherein, this at least one Ge cover body connects by connecting rod.
4. developer spray equipment as claimed in claim 2, wherein, has also comprised a drive division, and this drive division is cylinder, and the piston rod of this cylinder is connected with this connecting rod, by this two cover bodies synchronization lifting of flexible drive of piston rod.
5. developer spray equipment as claimed in claim 2, wherein, this contact site is made by alkali-proof cushion.
6. developer spray equipment as claimed in claim 1, wherein, also comprises receiving tube, and it is connected in this reaction chamber and accumulator tank, and the remaining developer of part enters this accumulator tank via this receiving tube.
7. developer spray equipment as claimed in claim 1, wherein, also comprises recovery tube, and it is connected in this accumulator tank and this nozzle, for by this nozzle of the developer replenishing in this accumulator tank.
8. a developer spraying method, it utilizes developer spray equipment to spray developer to substrate, and this spray equipment comprises:
Reaction chamber, for receiving this substrate;
At least one nozzle, is positioned at this reaction chamber, for spraying developer to this substrate;
Accumulator tank, is positioned at outside this reaction chamber, for receiving remaining developer; And
Movable jet nozzle connector, between this nozzle and accumulator tank, comprising:
At least one cover body, it has inlet;
Tube connector, one end is connected in cover body, and the other end is connected in accumulator tank, and wherein, described cover body can be in primary importance and second place intercropping reciprocating type mobile;
Wherein, when described cover body moves to this second place, from the developer of nozzle ejection, via this tube connector, enter this accumulator tank, when cover body moves to this primary importance, this cover body leaves this nozzle;
Wherein, this developer spraying method comprises the following steps:
Make this cover body move to this second place, spray in advance developer, make the developer of this nozzle ejection enter this accumulator tank via this tube connector;
Make this cover body move to this primary importance, transmit substrate, the substrate spraying developer to nozzle below; And
Complete after spraying, make this cover body to this second place.
9. developer spraying method as claimed in claim 8, wherein, transmits on the transfer roller of this substrate below nozzle, and this cover body declines and stops behind the below of this transfer roller mobilely, and this substrate receives the developer from this nozzle in mobile process.
10. developer spraying method as claimed in claim 8, also comprises: detect the concentration of developer in this accumulator tank, if this concentration, lower than desired concn, fills into developer in this accumulator tank, until reach desired concn.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310567462.7A CN103639089A (en) | 2013-11-14 | 2013-11-14 | Developing agent spraying device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310567462.7A CN103639089A (en) | 2013-11-14 | 2013-11-14 | Developing agent spraying device and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN103639089A true CN103639089A (en) | 2014-03-19 |
Family
ID=50244449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310567462.7A Pending CN103639089A (en) | 2013-11-14 | 2013-11-14 | Developing agent spraying device and method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN103639089A (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5335681A (en) * | 1991-06-26 | 1994-08-09 | Gebr. Schmid Gmbh & Co. | Apparatus for the treatment of board-like articles, particularly printed circuit boards |
| JP2001170527A (en) * | 1999-12-20 | 2001-06-26 | Matsushita Electric Works Ltd | Method for collecting paint mist |
| CN1628191A (en) * | 2002-02-07 | 2005-06-15 | 苏拉有限及两合公司 | Method and device for wetting a running filament strand |
| US7246758B2 (en) * | 2003-07-22 | 2007-07-24 | Muh-Rong Wang | Metal atomizing device |
| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| US20110126915A1 (en) * | 2009-11-27 | 2011-06-02 | Hon Hai Precision Industry Co., Ltd. | Fluid recovery device and recovery method using the same |
| CN102272680A (en) * | 2009-04-24 | 2011-12-07 | 旭化成电子材料株式会社 | Developing apparatus, method for processing developer liquid, method for producing printing plate, and filtration device |
-
2013
- 2013-11-14 CN CN201310567462.7A patent/CN103639089A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5335681A (en) * | 1991-06-26 | 1994-08-09 | Gebr. Schmid Gmbh & Co. | Apparatus for the treatment of board-like articles, particularly printed circuit boards |
| JP2001170527A (en) * | 1999-12-20 | 2001-06-26 | Matsushita Electric Works Ltd | Method for collecting paint mist |
| CN1628191A (en) * | 2002-02-07 | 2005-06-15 | 苏拉有限及两合公司 | Method and device for wetting a running filament strand |
| US7246758B2 (en) * | 2003-07-22 | 2007-07-24 | Muh-Rong Wang | Metal atomizing device |
| CN101060069A (en) * | 2006-04-18 | 2007-10-24 | 东京毅力科创株式会社 | Liquid treatment device |
| CN102272680A (en) * | 2009-04-24 | 2011-12-07 | 旭化成电子材料株式会社 | Developing apparatus, method for processing developer liquid, method for producing printing plate, and filtration device |
| US20110126915A1 (en) * | 2009-11-27 | 2011-06-02 | Hon Hai Precision Industry Co., Ltd. | Fluid recovery device and recovery method using the same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100583389C (en) | Method and device for removing material from semiconductor wafer | |
| CN103963470B (en) | Aspirator, suction method, liquid discharging device | |
| CN106042642A (en) | Liquid discharge apparatus, imprint apparatus and part manufacturing method | |
| US20040070651A1 (en) | Droplet discharge device and liquid filling method therefor, and device manufacturing apparatus, device manufacturing method and device | |
| KR100740969B1 (en) | Pattern of film and method of forming the same, device, electro-optical device, electronic apparatus, and method of manufacturing active matrix substrate | |
| CN105499080B (en) | Glue supply system and glue supply method | |
| CN102145584B (en) | Liquid ejecting apparatus and cleaning method in liquid ejecting apparatus | |
| JP4556838B2 (en) | Bank forming method and film pattern forming method | |
| CN107809854A (en) | The manufacture method of circuit board | |
| TW200619033A (en) | Pattern forming method, method of manufacturing electronic apparatus, and method of manufacturing substrate | |
| CN104125718A (en) | Vertical substrate detachment system | |
| CN103084290B (en) | Nozzle unit, substrate board treatment and substrate processing method using same | |
| CN103639089A (en) | Developing agent spraying device and method | |
| CN101329518A (en) | Developing device and developing method thereof | |
| CN103943539A (en) | Substrate treatment device and treatment method | |
| TW200618876A (en) | Method of forming a metal thin film with micro holes by ink-jet printing | |
| CN206716576U (en) | Wet etching cleaning device and wet etching equipment | |
| JP2003211687A (en) | Cleaning method for inkjet apparatus and inkjet apparatus with cleaning mechanism | |
| CN100517078C (en) | Method for forming pattern and method for fabricating LCD device using the same | |
| CN104097399A (en) | Liquid ejection head and liquid ejection apparatus | |
| JP2007303402A (en) | Tubephragm pump | |
| CN101962774B (en) | Etching device and etching method | |
| CN101907834A (en) | Vacuum developing mechanism | |
| JP6593903B2 (en) | Waterproof method and apparatus for electronic device, and electronic device | |
| JP2009206393A (en) | Surface treating apparatus, surface treating method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20140319 |