CN103572231B - Sputter equipment - Google Patents
Sputter equipment Download PDFInfo
- Publication number
- CN103572231B CN103572231B CN201310205274.XA CN201310205274A CN103572231B CN 103572231 B CN103572231 B CN 103572231B CN 201310205274 A CN201310205274 A CN 201310205274A CN 103572231 B CN103572231 B CN 103572231B
- Authority
- CN
- China
- Prior art keywords
- drive shaft
- turning axle
- rotates
- tubular target
- driving part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to and make part replacement easy to make to reduce the maintenance time of device and the sputter equipment of expense, according to sputter equipment of the present invention, comprising: operation chamber, operation space is provided; Tubular target, is arranged at described operation space; Magnet module, inserts the inside being arranged at described tubular target; Driving part, is installed in the interior wall of described operation chamber, is incorporated into described tubular target and described magnet module; Rotary driving part, is arranged at the outside of described operation chamber, provides first and second different rotary motion; And gear module portion, to support described rotary driving part in the exterior wall being installed on described operation chamber, first and second rotary motion described is passed to described driving part, wherein, described driving part, rotate described tubular target according to described first rotary motion, swing described magnet module at a certain angle according to described second rotary motion.
Description
Technical field
The present invention relates to sputter equipment, more particularly relate to make easy the making of part replacement reduce the maintenance time of device and the sputter equipment of expense.
Background technology
Sputtering (Sputtering) device representatively physical vapor deposition (PhysicalVaporDeposition) device, is mainly used in depositing the thin film metal layer made needed for semi-conductor and display device etc. or metal oxide layer.
Sputter equipment as above is after in operation chamber, the target (Target) be made up of thin-film material deposited is carried out in setting, after relatively substrate being set with target, Ionized argon (Ar) particle is made to collide target by plasma discharge, by this crash energy, thin-film material is come off from target thus, and then be deposited on substrate, thus on substrate, form the device of thin film layer.This sputter equipment can form film at short notice with fairly simple structure, is therefore widely used in the making of semiconducter device, solar cell, display panel.
On the other hand, No. 10-2007-0108907th, Korean Patent Laid discloses tubulose magnetic control sputtering device.
Described tubulose magnetic control sputtering device possesses terminal block, is installed in the vacuum chamber wall of sputter equipment, for Rotational Coronary target.
Described terminal block, according to the rotation of the driving synchronous belt of drive unit, is rotatably mounted on the tubular target on mounting flange.
But described tubulose magnetic control sputtering device, is use Timing Belt to be passed to mounting flange to make the revolving force of drive unit, therefore needs periodically to change Timing Belt.When changing this Timing Belt, needing vacuum and the described terminal block entirety of removing vacuum chamber, therefore existing and increase maintenance (Maintenance) time of device and the problem of expense.
Summary of the invention
(technical problem that will solve)
The present invention creates to solve problem as above, its object is to provide sputter equipment, makes part replacement easy with the maintenance time and the expense that make to reduce device.
In addition, another object of the present invention is to provide sputter equipment, simplify the structure of the driving part being used for Rotational Coronary target.
In addition, another object again of the present invention is to provide sputter equipment, while increasing the service efficiency of tubular target, makes the thickness of the film be deposited on substrate even.
(means of dealing with problems)
In order to reach object as above, according to sputter equipment of the present invention, comprising: operation chamber, operation space is provided; Tubular target, is arranged at described operation space; Magnet module, inserts the inside being arranged at described tubular target; Driving part, is installed in the interior wall of described operation chamber, in conjunction with described tubular target and described magnet module; Rotary driving part, is arranged at the outside of described operation chamber, provides first and second different rotary motion; And comprise gear module portion, to support described rotary driving part in the exterior wall being installed on described operation chamber, first and second rotary motion described is passed to described driving part, described driving part rotates described tubular target according to described first rotary motion, swings the described magnet module into feature at a certain angle according to described second rotary motion.
In order to reach object as above, according to sputter equipment of the present invention, comprising: operation chamber, operation space is provided; Tubular target, is arranged at described operation space; Magnet module, inserts the inside being arranged at described tubular target; Driving part, is installed in the interior wall of described operation chamber, comprises the first turning axle for rotating described tubular target and second turning axle of inside for the described magnet module of rotation inserting described first turning axle; Rotary driving part, is arranged at the outside of described operation chamber, is provided for independent first and second rotary motion rotating first and second turning axle described respectively; And gear module portion, to support described rotary driving part in the exterior wall being installed on described operation chamber, first and second rotary motion described is passed to described driving part, wherein, described gear module portion, its structure comprises: the first spurn wheel, is incorporated into described first turning axle; Second spurn wheel, is incorporated into described second turning axle; 3rd spurn wheel, is formed by the material of wear resistance lower than described first spurn wheel, rotates described first spurn wheel according to described first rotary motion; And the 4th spurn wheel, formed by the material of wear resistance lower than described second spurn wheel, rotate described first spurn wheel according to described second rotary motion.
In order to reach object as above, according to sputter equipment of the present invention, comprise the tubular target that is arranged at described operation space and to insert in the magnet module being arranged at the inside of described tubular target and the interior wall being installed on described operation chamber and to be incorporated into the driving part of described tubular target and described magnet module, wherein, described driving part comprises: the first turning axle, rotates according to the first rotary motion that the first drive unit along with the outside being arranged on described operation chamber drives; Second turning axle, is inserted in the inside of described first turning axle, rotates to make the second rotary motion driven according to the second drive unit along with the outside being arranged on described operation chamber; First drive shaft, according to the rotation of described first turning axle, rotates described tubular target; And second drive shaft, according to the rotation of described second turning axle of inside being inserted in described first drive shaft, swing described magnet module at a certain angle in the inside of described tubular target.
(effect of invention)
By above-mentioned means of dealing with problems, sputter equipment according to the present invention has following effect.
The first, utilize the rotary motion of gear, Rotational Coronary target also swings magnet module, thus when gear is changed, need not remove the vacuum of operation chamber and can change under atmospheric condition, therefore can reduce maintenance time and expense.
The second, utilize and there is the turning axle of dual structure and drive shaft Rotational Coronary target and swing magnet module portion, therefore can simplify the structure of driving part.
3rd, link to make magnet module straight line back and forth movement with the rotation of tubular target, thus the service efficiency of tubular target can be increased, in addition, swing magnet module at a certain angle, thus the thickness of the film be deposited on substrate can be made even.
Accompanying drawing explanation
Fig. 1 is the figure of the part schematically showing sputter equipment according to an embodiment of the invention.
Fig. 2 is the sectional view of the part schematically showing sputter equipment according to an embodiment of the invention.
Fig. 3 is the orthographic plan of the inside schematically showing the gear module portion be illustrated in Fig. 2.
Fig. 4 is the stereographic map of the part schematically showing the magnet module portion be illustrated in Fig. 2.
Fig. 5 is the figure of the translational motion of link plate in order to the explanatory view rotation according to eccentric gear shown in Figure 4.
Fig. 6 schematically shows the sectional view along I-I line be illustrated in Fig. 2.
Fig. 7 is the figure of the etching pattern of tubular target in order to the straight line back and forth movement according to magnet module portion of the present invention is described.
Fig. 8 is the figure in order to the swing according to magnet module portion of the present invention is described.
Embodiment
Below, reference accompanying drawing is to being described in detail according to a preferred embodiment of the invention.
The sectional view of Fig. 1 to be the figure of the part schematically showing sputter equipment according to an embodiment of the invention, Fig. 2 be part schematically showing sputter equipment according to an embodiment of the invention.
With reference to Fig. 1 and Fig. 2, sputter equipment comprises according to an embodiment of the invention: operation chamber 100, tubular target 200, magnet module portion 300, driving part 400, gear module portion 500 and rotary driving part 600.
Described operation chamber 100 provides operation space, performs control sputtering process for use tubular target 200 and magnet module portion 300.Now, described operation space, maintains certain vacuum by pumping installation (not shown).The magnetron sputtering operation that this operation space performs, performs under the state that can stop at substrate or performs under the state of substrate movement.
The inside of described operation chamber 100 is provided with substrate supporting portion with supporting substrates (not shown).
Now, when described magnetron sputtering operation performs under the state that substrate stops, described substrate supporting portion can be the operation post of the inside being fixedly installed on described operation chamber 100.On the other hand, when described magnetron sputtering operation performs under the state of substrate movement, described substrate supporting portion can be, will move into the substrate substrate moved on another sidewall being arranged at described operation chamber 100 that mouth (not shown) moves into and take out of the substrate mobile module of mouth (not shown) side from the substrate on the sidewall being arranged at described operation chamber 100.Now, described substrate mobile module can be conveying belt or multiple roller drive shaft.
Described tubular target 200, is incorporated into described driving part 400 and is arranged on described substrate.Described tubular target 200, according to the driving of driving part 400 with certain direction, such as, rotates in a clockwise direction.
Described tubular target 200 comprises: cylindrical duct 210, is formed as certain length to make having hollow bulb; Target substance layer 220, is formed at the periphery of cylindrical duct 210.
The side end of described cylindrical duct 210, is supported on described driving part 400, the opposite side end of described cylindrical duct 210, be rotatably supported in be arranged on operation chamber 100 interior wall on rotary support member (not shown).
Described target substance layer 220, comprises the material of the film be deposited on substrate.Such as, by sputtering process, on substrate during the film of deposited copper material, described target substance layer 220 can be made up of copper material or the alloy material comprising copper material.
Described tubular target 200, substrate is arranged at certain intervals multiple.
Described magnet module portion 300, is incorporated into described driving part 400, and inserts the inside being arranged at described tubular target 200, that is, the hollow bulb of described cylindrical duct 210.The side end bearing in described magnet module portion 300 is in described driving part 400, and the opposite side end in described magnet module portion 300 is rotatably supported in described rotary support member (not shown).
Described magnet module portion 300, in the formation magnetic field, surface of tubular target 200, to increase the plasma density be formed on tubular target 200, thus makes film substrate or target substance effectively release from tubular target 200.
Described magnet module portion 300, according to the driving of described driving part 400, link in the rotation of described tubular target 200, the length direction along described tubular target 200 carries out straight line back and forth movement.In addition, described magnet module portion 300, according to sputtering process mode, can carry out described straight line back and forth movement or carry out at a certain angle while carrying out described straight line back and forth movement swinging (Swing), that is, can repeatedly carry out rotating forward and retrograde rotation.
As embodiment, when performing described sputtering process under the state of substrate movement, described magnet module portion 300 according to the driving of described driving part 400, can link in the rotation of described tubular target 200 and carries out straight line back and forth movement.
As another example, when performing described sputtering process under the state that substrate stops, described magnet module portion 300 can, according to the driving of described driving part 400, link in the rotation of described tubular target 200, can carry out at a certain angle swinging (Swing) while carrying out straight line back and forth movement.Now, the swing in described magnet module portion 300 can be, corresponding with the sense of rotation of described tubular target 200 rotates forward and the retrograde rotation contrary with the sense of rotation of described tubular target 200.Herein, the pendulum angle in described magnet module portion 300, with the Z-axis between described substrate and described tubular target 200 for benchmark is set as ± 45 ° of scopes, but be not limited thereto, can change according to the distance between described substrate and described tubular target 200 and/or the distance between described tubular target 200.
In above-mentioned explanation, although carry out swinging when being and only performing described sputtering process under the state that substrate stops with magnet module portion 300 and be illustrated, but be not limited thereto, also can swing when magnet module portion 300 performs described sputtering process under the state of substrate movement.
Described driving part 400, is installed in the interior wall of operation chamber 100, with the side end of the side end and described magnet module portion 300 that support described tubular target 200.In addition, described driving part 400, according to the driving of rotary driving part 600 by the rotary motion that gear module portion 500 transmits, rotate described tubular target 200 with certain orientation or swing described magnet module portion 300 at a certain angle while rotating described tubular target 200 with certain orientation.Now, the swing in described magnet module portion 300 carries out selective control according to above-mentioned sputtering process mode.
Described driving part 400 comprises: housing 410, housing closed tube 415, mounting flange 420, first drive shaft 430, second drive shaft 440, first turning axle 450 and the second turning axle 460.
Housing 410 is arranged at the interior wall of operation chamber 100, such as top ceiling.This housing 410 has the internal space of the operation spatial isolation from operation chamber 100.
Housing closed tube 415, inserts and is arranged in the external wall of upper portion of the operation chamber 100 overlapping with housing 410, to make UNICOM in the internal space of housing 410.
Described mounting flange 420, is incorporated into the side end of described tubular target 200, to make rotatably to support described tubular target 200.
First drive shaft 430 is formed as cylinder form to have hollow bulb, and the inside being arranged at housing 410 is incorporated into described mounting flange 420.That is, the side of the first drive shaft 430 is arranged at the internal space of housing 410, and the side of the through housing of opposite side 410 of the first drive shaft 430 is to be incorporated into described mounting flange 420.
The side end of described first drive shaft 430 is in conjunction with the first cone gear 432.Therefore, described first drive shaft 430, according to the rotation of described first cone gear 432, can rotate using X-direction as central shaft.For this reason, clutch shaft bearing 434 is set between the periphery and housing 410 of described first drive shaft 430, is in rotatable state by clutch shaft bearing 434 to make the first drive shaft 430.
Described second drive shaft 440, inserts the hollow bulb of described first drive shaft 430, is combined with described magnet module portion 300.That is, the second drive shaft 440 side from be arranged on housing 410 internal space the first drive shaft 430 end protrude certain length.The hollow bulb of the through described tubular target 200 of opposite side of the second drive shaft 440, is rotatably supported in above-mentioned rotary support member.
The side end of the second drive shaft 440 is combined with the second cone gear 442.Therefore, described second drive shaft 440, according to the rotation of described second cone gear 442, can rotate as central shaft using X-direction in the inside of described first drive shaft 430.For this reason, the second bearing 444 is set between the periphery and the first drive shaft 430 hollow bulb of the second drive shaft 440, is in rotatable state by the second bearing 444 to make the second drive shaft 440.
Described first turning axle 450, while being inserted in the internal space of housing closed tube 415, is contacted with gear module portion 500, thus rotates according to the rotary motion of transmitting from gear module portion 500, and then rotates described first drive shaft 430.For this reason, described first turning axle 450 is formed as cylinder form to have hollow bulb, is vertically arranged at the internal space of housing closed tube 415 along Z-direction.The upper side of the first turning axle 450 is arranged at the internal space of housing 410, to make to be contacted with the first drive shaft 430 by the lower side that the internal space of housing closed tube 415 is contacted with gear module portion 500, first turning axle 450.
The lower side of the first turning axle 450 is combined with third hand tap gear 452, engages with the first cone gear 432 of described first drive shaft 430.Therefore, described third hand tap gear 452, according to the rotation of described first turning axle 450, rotates using Z-direction as central shaft, thus rotates the first cone gear 432, and then according to the rotation of the first cone gear 432, first drive shaft 430 is rotated.Now, the 3rd bearing 454 is set between the periphery of the first turning axle 450 and the inside face of housing closed tube 415, is in rotatable state by the 3rd bearing 454 to make the first turning axle 450.
Described second turning axle 460, while being inserted in the hollow bulb of described first turning axle 450, is contacted with gear module portion 500, thus rotates according to the rotary motion of transmitting from gear module portion 500, and then rotates described second drive shaft 440.The upper side of the second turning axle 460 is contacted with the lower side protrusion certain length of lower side from the first turning axle 450 of gear module portion 500, second turning axle 460 by the hollow bulb of described first turning axle 450, to make to be contacted with the second drive shaft 440.
The lower side of the second turning axle 460 is combined with the 4th cone gear 462, engages with the second cone gear 442 of described second drive shaft 440.Therefore, described 4th cone gear 462, according to the rotation of described second turning axle 460, rotates using Z-direction as central shaft, thus rotates the second cone gear 442, and then according to the rotation of the 4th cone gear 432, second drive shaft 440 is rotated.Now, between the periphery of the second turning axle 460 and the hollow bulb of described first turning axle 450, the 4th bearing 464 is set, is in rotatable state by the 4th bearing 464 to make the second turning axle 460.
Described gear module portion 500, is arranged at the outside of operation chamber 100, to make to contact with driving part 400, thus the rotary motion provided from described rotary driving part 600 is passed to driving part 400.For this reason, as shown in Figures 2 and 3, described gear module portion 500 comprises: cabinet 510; First to the 4th spurn wheel (SpurGear) 520,530,540,550; And lid 560.
Described cabinet 510 combines and is supported on, the upper side of the housing closed tube 415 of the driving part 400 protruded from the top wall of operation chamber 100.Now, a part of region of the bottom surface of described cabinet 510 is formed inserts sky, and the upper side of described housing closed tube 415 is inserted.Thus, insert above-mentioned first and second turning axle 450,460 points of other upper side of the internal space of described housing closed tube 415, inserted the inside of described cabinet 510 by described patchhole.Herein, the upper side of the second turning axle 460 is protruded from the upper side of the first turning axle 450 with certain altitude.
Described lid 560 is formed as plate morphology to cover above cabinet 510.
First spurn wheel 520 is incorporated into the upper side of the first turning axle 450 protruded from the internal space of described cabinet 510.
Second spurn wheel 530 is arranged on described first spurn wheel 520, to make the upper side being incorporated into the second turning axle 460 protruded from the internal space of described cabinet 510.Now, described second spurn wheel 530 has the external diameter being less than described first spurn wheel 520.
First and second spurn wheel 520,530 described is preferably respectively, is made up of the carbon alloy material or molybdenum-chrome steel (SteelChromiumMolybdenum, referred to as SCM) material with outstanding intensity and/or wear resistance.
3rd spurn wheel 540 is arranged on the internal space of described cabinet 510 to make to engage with described first spurn wheel 520.
4th spurn wheel 550 is arranged on the internal space of described cabinet 510 to make to engage with described second spurn wheel 530.
Described 3rd and the 4th spurn wheel 540,550 is preferably respectively, is relatively made up of lower than the material of first and second spurn wheel 520,530 described intensity and/or wear resistance.Particularly, described 3rd and the 4th spurn wheel 540,550 is preferably respectively, by insulativity material, namely engineering plastics (Engineeringplastic) are formed, cause rotary driving part 600 impaired to prevent the adverse current of the electric current being applied to target 200, prevent other wearing and tearing of described first and second spurn wheel 520,530 points simultaneously.Such as, the described 3rd and the 4th spurn wheel 540,550 can be made up of monomer moulding casting nylon (MonomerCastNylon, referred to as MCNylon) or acetal (ACETAL) material respectively.
Be below that formed by carbon alloy material respectively for first and second spurn wheel 520,530 described, the reason that the described 3rd and the 4th spurn wheel 540,550 is formed by insulativity material is respectively described as follows.
Such as, because first and the 3rd spurn wheel 520,540 rotate with engaging each other, when being therefore made up of identical material, first and the 3rd spurn wheel 520,540 respectively can impaired or wearing and tearing, cause thus first and the 3rd spurn wheel 520,540 all need to carry out periodic replacement, and then the increase of maintenance time and expense can be caused.But, as mentioned above, when the first spurn wheel 520 is formed by carbon alloy material, when 3rd spurn wheel 540 is formed by insulativity material on the contrary, only have the 3rd spurn wheel 540 impaired or wearing and tearing, cause thus only needing replacing the 3rd spurn wheel 540, and then maintenance time and the expense of gear can be reduced.
With reference to Fig. 2 and Fig. 3, rotary driving part 600 is arranged in gear module portion 500, and comprises: first and second drive unit 610,620, is respectively used to Rotational Coronary target 200 and magnet module portion 300 independently.
Described first drive unit 610 provides the first rotary motion, for the 3rd spurn wheel 540 in certain orientation (such as, clockwise direction) swing pinion module portion 500.This first drive unit 610 is made up of drive-motor, and the lid 560 in the through gear module portion 500 of axle 612 of drive-motor is also incorporated into the 3rd spurn wheel 540.Now, described 3rd spurn wheel 540, can be incorporated into the axle 612 of described first drive unit 610, and engage with the first spurn wheel 520.
Described 3rd spurn wheel 540, the first rotary motion according to described first drive unit 610 rotates, and rotates the first spurn wheel 520 thus, and then Rotational Coronary target 200.Namely, tubular target 200 basis, the subordinate that first spurn wheel 520, first turning axle 450, third hand tap gear 452, first cone gear 432, first drive shaft 430 and mounting flange 420 carry out according to the driving of described first drive unit 610 rotates, thus rotates with certain orientation.
Described second drive unit 620 provides the second rotary motion, for the 4th spurn wheel 550 of forward and retrograde rotation gear module portion 500.This second drive unit 620 is made up of drive-motor, and the lid 560 in the through gear module portion 500 of axle 622 of drive-motor is also incorporated into the 4th spurn wheel 550.Now, described 4th spurn wheel 550 can be incorporated into the axle 622 of described second drive unit 620, and engages with the second spurn wheel 530.
Described 4th spurn wheel 550, according to the second rotary motion of described second drive unit 620, carries out the retrograde rotation with certain angle that rotates forward of certain angle repeatedly, thus swings the second spurn wheel 530, and then swings magnet module portion 300 at a certain angle.Namely, magnet module portion 300 basis, the subordinate that second spurn wheel 530, second turning axle 460, the 4th cone gear 462, second cone gear 442 and the second drive shaft 440 carry out according to the driving of described second drive unit 620 swings, thus swings at a certain angle.
Fig. 4 is the stereographic map of the part schematically showing the magnet module portion be illustrated in Fig. 2.
With reference to Fig. 2 and Fig. 4, according to magnet module portion 300 of the present invention, according to the driving of driving part 400, namely, according to the rotation of mounting flange 420, the X-direction corresponding to tubular target 200 length direction carries out straight line back and forth movement, and the swing according to the second drive shaft 440 is carried out at a certain angle.For this reason, described magnet module portion 300 comprises: rotary flange 310, binding modules 320, transfer module 330, magnet transferred unit 340, support cap 350, multiple magnet tilting member 360 and magnet array 370.
Rotary flange 310, is incorporated into the mounting flange 420 of driving part 400, link in mounting flange 420 rotation and rotate.The central part of this rotary flange 310 is formed with communicating pores, makes the second drive shaft 440 of above-mentioned driving part 400 through.
With described X-direction for benchmark, be provided with multiple protruding pin 312 at certain intervals in the side of described rotary flange 310.Described multiple protruding pin 312 is formed as certain length along described X-direction respectively, and provides revolving force according to the rotation of rotary flange 310 to magnet transferred unit 340, thus makes magnet array 370 carry out straight line back and forth movement along described X-direction.
Binding modules 320, is combined with the second drive shaft 440 of through rotary flange 310, thus the rotation linked in the second drive shaft 440 swings at a certain angle.
Transfer module 330, can be arranged on from the second drive shaft 440 that the side of described binding modules 320 is separated by certain intervals with transferring.In addition, module 330 supports magnets array 370 is transferred.This transfer module 330, according to the driving of magnet transferred unit 340 along with the guiding edge ± X-direction of the second drive shaft 440 is transferred, thus makes magnet array 370 carry out straight line back and forth movement along X-direction.
Magnet transferred unit 340, respectively from the revolving force that multiple protruding pins 312 transmits, makes transfer module 330 carry out straight line back and forth movement according to the rotation by described rotary flange 310.For this reason, magnet transferred unit 340 comprises: eccentric gear 342, stuck-module 344 and link plate 346.
Eccentric gear 342, can be rotatably set in above binding modules 320, thus be arranged on described rotary flange 310 protruding pin 312 and engage.This eccentric gear 342, engages with the multiple protruding pins 312 carrying out movement with certain rotational trajectory according to described rotary flange 310 successively, thus carries out eccentric rotary with certain orientation.Now, the rotation center transposition of eccentric gear 342 is in the position offseted to one side from central part.
Stuck-module 344, arranges and is fixed on above transfer module 330.
Link plate 346, be arranged between described eccentric gear 342 and described stuck-module 344, the eccentric rotary according to eccentric gear 342 carries out translational motion, thus edge ± X-direction transfer stuck-module 344.That is, described link plate 346 plays the effect eccentric rotational motion of eccentric gear 342 being converted to translational motion.Such as, as shown in a, b and c of Fig. 5, when described eccentric gear 342 is rotated in a clockwise direction 180 degree, described link plate 346 carries out translational motion along+X-direction.In addition, although not shown, but under the state of revolving turnback at described eccentric gear 342, when further rotating 180 degree along clockwise direction, described link plate 346 carries out translational motion along-X-direction.
Illustrate eccentric gear 342 in Fig. 5 and be rotated in a clockwise direction 90 degree, but the eccentric rotary of described eccentric gear 342, can according to the sawtooth number of eccentric gear 342 or the number of teeth and protruding pin number ratio and determine.
Again in Fig. 2 and Fig. 4, make described support cap 350 be formed as having the end face of " ∩ " font state, thus be arranged on and can be arranged at transferring in the transfer module 330 of the second drive shaft 440, and then cover the top of the second drive shaft 440.In addition, support cap 350, can be supported by the multiple partitions (not shown) being arranged on the second drive shaft 440 at certain intervals.
As shown in Figure 6, described multiple magnet tilting member 360 is combined with the second drive shaft 440 respectively at certain intervals, thus according to the swing of the second drive shaft 440, and then swinging mounting lid 350.For this reason, multiple magnet tilting member 360 comprises respectively: axle communicating pores 361, makes the second drive shaft 440 through; Top salient 363, is formed as around support cap 350, through support cap 350 above and protrude with certain altitude; Bottom salient 365, is formed in the bottom of top salient 363, to make the semicircle form of cylindrical duct 210 internal diameter had corresponding to tubular target 200; Neck 367, is formed between top salient 363 and bottom salient 365; And magnet through slot 369, be hollowly formed in below bottom salient 367, make magnet array 370 through.
This multiple magnet tilting member 360 respectively, is arranged at the binder bolt 368 of the two sides of neck 367, is combined with the second drive shaft 440 by through second drive shaft 440.Thus, multiple magnet tilting member 360 respectively, according to the swing of the second drive shaft 440, thus swings the magnet array 370 of through magnet through slot 369.
With reference to Fig. 4 and Fig. 6, described magnet array 370 is incorporated into below above-mentioned transfer module 330 and multiple partition divides below other, thus in the formation magnetic field, surface of tubular target 200.For this reason, magnet array 370 comprises: supporting plate 372, magnet support strip 374 and multiple magnet 376.
Supporting plate 372, is incorporated into below transfer module 330 and multiple partition divides below other, with supports magnets support strip 374.This supporting plate 372, links in the straight line back and forth movement of transfer module 330, carries out straight line back and forth movement along X-direction.
Magnet support strip 374 is incorporated into below supporting plate 372, to support multiple magnet 376.
Multiple magnet 376, is arranged on the bottom of magnet support strip 374 at certain intervals.That is, multiple magnet 376 is vertically arranged on central part below magnet support strip 374, with the two sides of certain obliquity in magnet support strip 374.This multiple magnet 376 in the formation magnetic field, surface of tubular target 200, thus increases the plasma density being formed at tubular target 200, and then makes effectively to release film substrate or target substance from tubular target 200.Now, described multiple magnet 376 links in the straight line back and forth movement of the transfer module 330 of the driving according to magnet transferred unit 340, thus carry out straight line back and forth movement, and then form uniform magnetic field in whole region, the surface of tubular target 200, to make the service efficiency increasing tubular target 200.In addition, the magnet tilting member 360 that described multiple magnet 376 swings according to the swing of the second drive shaft 440 by driving part 400, thus swing at a certain angle in the inside of tubular target 200, and then increase the uniformity coefficient of the film be deposited on substrate.
Specifically, as shown in Figure 7, the straight line back and forth movement along X-direction is carried out in the rotation linked in tubular target 200 of described magnet array 370, thus at two stub areas dispersion consumptions of tubular target 200, and then increase the service efficiency of tubular target 200.
As shown in Figure 7a, during described tubular target 200 rotates, when described magnet array 370 carries out a back and forth movement along ± X-direction, the erosion areas of tubular target 200 can have rough form.Thus, although at two stub area dispersion consumptions of tubular target 200, the target substance in the region of the protrusion of tubular target 200 can cannot be used, the service efficiency of tubular target 200 therefore can be made low.
Thus, as shown in Figure 7a, tubular target 200 sets with different speed of rotation from eccentric gear 342 by the present invention, makes the erosion areas of tubular target 200 can not be uneven thus, and is distributed to whole region equably.For this reason, the number of above-mentioned eccentric gear 342 sawtooth or the number of teeth and the protruding pin 312 that is formed in rotary flange 310 is set as certain proportion.Now, the sawtooth number of eccentric gear 342 is set as relatively more than the number of protruding pin 312 being formed in rotary flange 310.Such as, the sawtooth number of the number and eccentric gear 342 that are formed in the protruding pin 312 of rotary flange 310 is set as 17:21 by the present inventor, carry out the result display of testing, when described magnet array 370 needs tubular target 200 to rotate 21 times, the path of straight line back and forth movement that could be repeatedly identical.
As shown in Figure 8, described magnet array 370 swings in the inside of tubular target 200 at a certain angle according to the swing of the second drive shaft 440 of driving part 400, thus be increased in the releasing angle (input angle) of the target substance that tubular target 200 sputters, and then increase the uniformity coefficient of the film deposited on substrate S.
Specifically, as shown in Figure 8 a, described magnet array 370 not when the inside of tubular target 200 swings, the releasing angle of target substance of sputtering in tubular target 200 or input angle by limited, therefore cannot on substrate S the film of depositing homogeneous thickness.
On the contrary, as shown in Figure 8 b, described magnet array 370 is when the inside of tubular target 200 swings at a certain angle, and the releasing angle of target substance or the input angle of sputtering in tubular target 200 will increase, therefore can on substrate S the film of depositing homogeneous thickness.
Described magnet array 370 according to the movement of substrate S whether sputtering process mode, optionally can swing.Namely, as mentioned above, the present invention utilize the driving of the first drive unit 610 with make tubular target 200 rotate while, make magnet array 370 straight line back and forth movement, magnet array 370 is swung by the driving of the second drive unit 620, therefore by the control of the second drive unit 620, optionally magnet array 370 can be swung.
Sputter equipment according to an embodiment of the invention as above, utilize the rotary motion Rotational Coronary target 200 of gear, swing magnet module portion 300, and then when more gear changing, without the need to removing the vacuum of operation chamber 100, also can change under atmospheric condition, therefore can the maintenance time of cutting device and expense.In addition, the present invention utilizes turning axle and the drive shaft Rotational Coronary target 200 with dual structure, swings magnet module portion 300, and then simplifies the structure of driving part 400.
In addition, the the 3rd and the 4th spurn wheel 540,550 carrying out rotating according to rotary driving part 600 of the present invention is formed by insulativity material, first and second spurn wheel 520,530 engaged with the 3rd and the 4th spurn wheel 540,550 is respectively formed by carbon alloy material, therefore only can wear and tear the 3rd and the 4th spurn wheel 540,550, thus can only change the 3rd and the 4th spurn wheel 540,550 being arranged at airspace, thus easily can carry out part replacement.In addition, the present invention, make magnet module portion 300 link in tubular target 200 rotation and carry out straight line back and forth movement, the service efficiency of tubular target 200 can be increased, so by swinging magnet module portion 300 and make the thickness of the film be deposited on substrate even.
The practitioner of the technical field of the invention should be appreciated that the present invention is not when changing its technological thought or essential feature, can implement with other concrete forms.Therefore should be understood to, the embodiment of above record is the illustration gone up in all respects, is not used to limit.Scope of the present invention, compared to above-mentioned detailed description, can be revealed in whole technical scope, and the form of all changes of deriving from the meaning of technical scope, scope and equivalent concept thereof or distortion should be interpreted as being included in scope of the present invention.
Claims (14)
1. a sputter equipment, comprising:
Operation chamber, provides operation space;
Tubular target, is arranged at described operation space;
Magnet module, inserts the inside being arranged at described tubular target;
Driving part, is installed in the interior wall of described operation chamber, is incorporated into described tubular target and described magnet module;
Rotary driving part, is arranged at the outside of described operation chamber, provides first and second different rotary motion; And
Gear module portion, to support described rotary driving part in the exterior wall being installed on described operation chamber, is passed to described driving part by first and second rotary motion described,
Described driving part, rotates described tubular target according to described first rotary motion, and described magnet module is carried out straight line back and forth movement along described tubular target length direction, swings described magnet module at a certain angle according to described second rotary motion;
Described driving part comprises: the first drive shaft, rotates described tubular target; Second drive shaft, rotates described magnet module; First turning axle, according to described first rotary motion of transmitting from described gear module portion, rotates described first drive shaft; And second turning axle, according to described second rotary motion of transmitting from described gear module portion, swing described second drive shaft;
Described first drive shaft is formed as cylinder form to have hollow bulb,
Described second drive shaft, is inserted in the hollow bulb of described first drive shaft, is attached to described first drive shaft and can rotates;
Described first turning axle is formed as cylinder form to have hollow bulb,
Described second turning axle, is inserted in the hollow bulb of described first turning axle, is attached to described first turning axle and can rotates.
2. sputter equipment according to claim 1, wherein, described gear module portion comprises:
First spurn wheel, is incorporated into described first turning axle;
Second spurn wheel, is incorporated into described second turning axle;
3rd spurn wheel, rotates described first spurn wheel according to described first rotary motion; And
4th spurn wheel, rotates described second spurn wheel according to described second rotary motion.
3. sputter equipment according to claim 2, wherein, described first and the 3rd spurn wheel formed by different material,
Described second and the 4th spurn wheel formed by different material.
4. sputter equipment according to claim 2, wherein,
The wear resistance of first and second spurn wheel described is higher than the described 3rd and the 4th spurn wheel.
5. sputter equipment according to claim 2, wherein, described rotary driving part comprises:
First drive unit, for rotating described 3rd spurn wheel; And
Second drive unit, for rotating described 4th spurn wheel.
6. the sputter equipment according to any one in claim 1 to 5, wherein,
Described magnet module,
Link in the rotary motion of described first drive shaft, carry out straight line back and forth movement at a certain distance,
To link rotating forward and retrograde rotation in described second drive shaft, swing at a certain angle.
7. sputter equipment according to claim 6, wherein, described magnet module comprises:
Rotary flange, link in described first drive shaft rotation and rotate, and there is multiple protruding pin protruded at certain intervals;
Binding modules, is combined in described second drive shaft adjacent with described rotary flange to make, and rotates according to the rotation of described second drive shaft;
Transfer module, is arranged on described second drive shaft movably, keeps at a certain distance away from described binding modules;
Magnet transferred unit, is arranged between described binding modules and described transfer module, the rotary motion of described rotary flange is converted to translational motion, thus makes described transfer module carry out straight line back and forth movement;
Support cap, is incorporated into described transfer module, to cover described second drive shaft;
Magnet tilting member, is arranged on the inside of described support cap, to make described second drive shaft through, rotates according to the rotation of described second drive shaft; And
Magnet array, be incorporated into below described transfer module, to make through described magnet tilting member, in the formation magnetic field, surface of described tubular target, carry out straight line back and forth movement according to the transfer of described transfer module, swing according to the rotation of described magnet tilting member.
8. sputter equipment according to claim 7, wherein, described magnet transferred unit comprises:
Eccentric gear, has the multiple sawtooth engaged with described protruding pin, and is rotatably incorporated into described binding modules, thus rotates according to the rotation of described rotary flange;
Stuck-module, secure bond is in described transfer module; And
Link plate, is arranged on described eccentric gear and described stuck-module, makes described transfer module carry out translational motion according to the eccentric rotary of described eccentric gear.
9. a sputter equipment, comprising:
Operation chamber, provides operation space;
Tubular target, is arranged at described operation space;
Magnet module, inserts the inside being arranged at described tubular target;
Driving part, is installed in the interior wall of described operation chamber, comprises the first turning axle for rotating described tubular target and second turning axle of inside for the described magnet module of rotation being inserted in described first turning axle;
Rotary driving part, is arranged at the outside of described operation chamber, is provided for independent first and second rotary motion rotating first and second turning axle described respectively; And
Gear module portion, to support described rotary driving part in the exterior wall being installed on described operation chamber, is passed to described driving part by first and second rotary motion described,
Wherein, described gear module portion comprises:
First spurn wheel, is incorporated into described first turning axle;
Second spurn wheel, is incorporated into described second turning axle;
3rd spurn wheel, is formed by the material of wear resistance lower than described first spurn wheel, rotates described first spurn wheel according to described first rotary motion; And
4th spurn wheel, is formed by the material of wear resistance lower than described second spurn wheel, rotates described first spurn wheel according to described second rotary motion;
Described driving part comprises: the first drive shaft, rotates described tubular target; Second drive shaft, rotates described magnet module;
Described first turning axle, according to described first rotary motion of transmitting from described gear module portion, rotates described first drive shaft, is formed as cylinder form to have hollow bulb;
Described second turning axle, according to described second rotary motion of transmitting from described gear module portion, swings described second drive shaft, is inserted in the hollow bulb of described first turning axle, be attached to described first turning axle and can rotate;
Described first drive shaft is formed as cylinder form to have hollow bulb,
Described second drive shaft, is inserted in the hollow bulb of described first drive shaft, is attached to described first drive shaft and can rotates.
10. the sputter equipment according to claim the 2 to any one in the 5th and the 9th, wherein,
Described 3rd and the 4th spurn wheel is formed by insulativity material or engineering plastics (Engineeringplastic) material.
11. sputter equipments according to claim the 2 to any one in the 5th and the 9th, wherein,
First and second spurn wheel described is formed by carbon alloy material or molybdenum-chrome steel (SteelChromiumMolybdenum, referred to as SCM) material.
12. sputter equipments according to claim the 2 to any one in the 5th and the 9th, wherein
Described 3rd and the 4th spurn wheel is formed by monomer moulding casting nylon (MonomerCastNylon, referred to as MCNylon) or acetal (ACETAL) material.
13. 1 kinds of sputter equipments, comprise, and are arranged at the tubular target in operation space and insert on the magnet module being arranged at the inside of described tubular target and the interior wall being installed on operation chamber and to be incorporated into the driving part of described tubular target and described magnet module,
Wherein, described driving part comprises:
First turning axle, rotates according to the first rotary motion that the first drive unit along with the outside being arranged on described operation chamber drives;
Second turning axle, is inserted in the inside of described first turning axle, rotates to make the second rotary motion driven according to the second drive unit along with the outside being arranged on described operation chamber;
First drive shaft, according to the rotation of described first turning axle, rotates described tubular target; And
Second drive shaft, according to the rotation of described second turning axle of inside being inserted in described first drive shaft, swings described magnet module at a certain angle in the inside of described tubular target;
Described first drive shaft is formed as cylinder form to have hollow bulb,
Described second drive shaft, is inserted in the hollow bulb of described first drive shaft, is attached to described first drive shaft and can rotates;
Described first turning axle is formed as cylinder form to have hollow bulb,
Described second turning axle, is inserted in the hollow bulb of described first turning axle, is attached to described first turning axle and can rotates.
14. sputter equipments according to claim 13, wherein,
Described magnet module,
Link in the rotary motion of described first drive shaft, carry out straight line back and forth movement at a certain distance,
According to rotating forward and retrograde rotation of described second drive shaft, swing at a certain angle.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020120080454A KR101352379B1 (en) | 2012-07-24 | 2012-07-24 | Sputtering apparatus |
| KR10-2012-0080454 | 2012-07-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103572231A CN103572231A (en) | 2014-02-12 |
| CN103572231B true CN103572231B (en) | 2016-02-03 |
Family
ID=50044927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310205274.XA Expired - Fee Related CN103572231B (en) | 2012-07-24 | 2013-05-29 | Sputter equipment |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR101352379B1 (en) |
| CN (1) | CN103572231B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT14912U1 (en) | 2015-05-06 | 2016-08-15 | Plansee Se | Connection piece for pipe target |
| CN109295430B (en) * | 2017-07-25 | 2022-07-12 | 索莱尔有限责任公司 | Apparatus and method for adjusting rotation angle of magnet system of tubular magnetron |
| WO2023186295A1 (en) * | 2022-03-30 | 2023-10-05 | Applied Materials, Inc. | Deposition source, deposition source arrangement and deposition apparatus |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5188717A (en) * | 1991-09-12 | 1993-02-23 | Novellus Systems, Inc. | Sweeping method and magnet track apparatus for magnetron sputtering |
| CN1462348A (en) * | 2000-09-21 | 2003-12-17 | 安托万·菲斯特 | Movement transforming device |
| KR20050090723A (en) * | 2004-03-09 | 2005-09-14 | 엘지.필립스 엘시디 주식회사 | An sputtering apparatus |
| CN101956169A (en) * | 2009-07-20 | 2011-01-26 | 北儒精密股份有限公司 | Rotating target for vacuum sputtering equipment |
| CN102239276A (en) * | 2008-12-03 | 2011-11-09 | 佳能安内华股份有限公司 | Plasma processing apparatus, apparatus for manufacturing magnetoresistive element, method for forming magnetic thin film and program for controlling film formation |
-
2012
- 2012-07-24 KR KR1020120080454A patent/KR101352379B1/en active IP Right Grant
-
2013
- 2013-05-29 CN CN201310205274.XA patent/CN103572231B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5188717A (en) * | 1991-09-12 | 1993-02-23 | Novellus Systems, Inc. | Sweeping method and magnet track apparatus for magnetron sputtering |
| CN1462348A (en) * | 2000-09-21 | 2003-12-17 | 安托万·菲斯特 | Movement transforming device |
| KR20050090723A (en) * | 2004-03-09 | 2005-09-14 | 엘지.필립스 엘시디 주식회사 | An sputtering apparatus |
| CN102239276A (en) * | 2008-12-03 | 2011-11-09 | 佳能安内华股份有限公司 | Plasma processing apparatus, apparatus for manufacturing magnetoresistive element, method for forming magnetic thin film and program for controlling film formation |
| CN101956169A (en) * | 2009-07-20 | 2011-01-26 | 北儒精密股份有限公司 | Rotating target for vacuum sputtering equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103572231A (en) | 2014-02-12 |
| KR101352379B1 (en) | 2014-01-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2855729B1 (en) | Method for coating a substrate and coater | |
| CN100392147C (en) | Pair target twin magnetic controlled sputtering ion plating deposition device | |
| EP2306489A1 (en) | Method for coating a substrate and coater | |
| EP2437280A1 (en) | Systems and methods for forming a layer of sputtered material | |
| CN103572231B (en) | Sputter equipment | |
| CN101208767B (en) | A module for coating both sides of a substrate in a single pass | |
| EP1630260A2 (en) | Magnetic latch for a vapour deposition system | |
| CN103119191B (en) | End block and sputter equipment | |
| KR101160680B1 (en) | A cylindrical sputtering cathode | |
| EP2742539B1 (en) | Sputtering systems for liquid target materials | |
| CN101638774B (en) | Rotatable sample position of magnetron sputtering device | |
| CN103114272A (en) | Cylindrical magnetron sputtering cathode | |
| US20050139467A1 (en) | Sputtering device | |
| CN211734462U (en) | Curved surface screen magnetron sputtering subassembly | |
| CN102191470A (en) | Magnetron sputtering source and plasma treatment device | |
| CN106319465A (en) | Rotating target and magnetron sputtering device | |
| CN212316232U (en) | Sputtering coating equipment compatible with substrates of different shapes | |
| CN212335274U (en) | Cathode sputtering target and sputtering coating device | |
| CN202157113U (en) | Magnetic-control sputtering coating device | |
| CN108385079A (en) | magnetron sputtering atomic layer deposition vacuum coating system | |
| CN101988188B (en) | Magnetic control device for sputtering | |
| CN208791746U (en) | Equipment for coated substrates | |
| KR101913791B1 (en) | Target arrangement, processing apparatus therewith and manufacturing method thereof | |
| CN109457225A (en) | Battery material filming equipment | |
| CN213596386U (en) | Lid vacuum coating device behind 3D battery |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20160203 Termination date: 20200529 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |