CN103540965A - Electroplating solution with high production efficiency - Google Patents

Electroplating solution with high production efficiency Download PDF

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Publication number
CN103540965A
CN103540965A CN201310517133.1A CN201310517133A CN103540965A CN 103540965 A CN103540965 A CN 103540965A CN 201310517133 A CN201310517133 A CN 201310517133A CN 103540965 A CN103540965 A CN 103540965A
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China
Prior art keywords
production efficiency
electroplate liquid
accounts
high production
agent
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Pending
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CN201310517133.1A
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Chinese (zh)
Inventor
殷惠良
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Big Reaching In Changshu City Electroplated LLC
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Big Reaching In Changshu City Electroplated LLC
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Application filed by Big Reaching In Changshu City Electroplated LLC filed Critical Big Reaching In Changshu City Electroplated LLC
Priority to CN201310517133.1A priority Critical patent/CN103540965A/en
Publication of CN103540965A publication Critical patent/CN103540965A/en
Pending legal-status Critical Current

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Abstract

The invention discloses an electroplating solution with high production efficiency. The electroplating solution with high production efficiency is formed by combining an antistatic agent, a deinking agent and a smooth agent, wherein the antistatic agent is barium sulphide, the deinking agent is nitrilotriacetic acid, the smooth agent is sodium phosphate, barium sulphide accounts for 2-10% of the total weight of the electroplating solution with high production efficiency, nitrilotriacetic acid accounts for 40-50% of the total weight of the electroplating solution with high production efficiency, and sodium phosphate accounts for 45-49% of the total weight of the electroplating solution with high production efficiency. The electroplating solution with high production efficiency has the advantages of high production efficiency, high electroplating speed and low operation cost.

Description

The electroplate liquid that production efficiency is high
Technical field
The present invention relates to a kind of electroplate liquid, relate in particular to the electroplate liquid that a kind of production efficiency is high.
Background technology
In mechanical processing process, the antirust grease that component surface adheres to, cutting fluid, machinery oil, lubricating grease, grinding fluid, releasing agent etc. mix and stick together with dust, polishing dust, form thicker dirt.If, not by above soil release, after its quenching sinters obstinate solid grease into, degreasing and rust removal is difficult to clean up before thermal treatment, during plating, bubble adheres to and on it, makes coating form gas hold-up type pin hole.Heat treated part surface inevitably can adhere to one deck greasy dirt, when dust falls from the teeth outwards, and sticks together with grease is mixed, of long duration is difficult to clean up, thereby makes workpiece surface form unconspicuous tiny oil mark, and during plating, bubble is detained formation pin hole it on.While adopting in addition mesh band type resistor furnace to quench; the impurity particles such as the greasy dirt of workpiece surface and dust are mixed to stick together; sinter obstinate solid grease into; during salt made from earth containing a comparatively high percentage of sodium chloride tempering; above grease again with the thermopolymer of nitro salt formation stubbornness; during plating, be difficult to the thorough Ex-all of above dirt; bubble hydrogen easily sticks to above dirt; be difficult to discharge, thereby make coating produce pin hole and pit phenomenon, and along with bubble is grown up gradually; coating can burst automatically; produce decortication phenomenon, thereby cause under electroplate liquid production efficiency, electroplating velocity is slow, the shortcoming that operating cost is high.
Summary of the invention
The invention provides and a kind ofly have that production efficiency is high, electroplating velocity is high, the high electroplate liquid of production efficiency of the low advantage of operating cost.
Technical scheme of the present invention is: the electroplate liquid that a kind of production efficiency is high, the electroplate liquid that described production efficiency is high comprises that static inhibitor, deinking agent and slipping agent combine, described static inhibitor is barium sulfate, described deinking agent is nitrilotriacetic acid(NTA), described slipping agent is sodium phosphate, described barium sulfate accounts for the 2%-10% of the overall component of electroplate liquid that production efficiency is high, described nitrilotriacetic acid(NTA) accounts for the 40%-50% of the overall component of electroplate liquid that production efficiency is high, and described sodium phosphate accounts for the 45%-49% of the overall component of electroplate liquid that production efficiency is high.
In a preferred embodiment of the present invention, described barium sulfate comprises barium and sulfate radical.
In a preferred embodiment of the present invention, described barium sulfate accounts for 8% of the overall component of electroplate liquid that production efficiency is high, described nitrilotriacetic acid(NTA) accounts for 43% of the overall component of electroplate liquid that production efficiency is high, and described sodium phosphate accounts for 49% of the overall component of electroplate liquid that production efficiency is high.
The high electroplate liquid of a kind of production efficiency of the present invention, has that production efficiency is high, electroplating velocity is high, the advantage that operating cost is low.
Embodiment
Below preferred embodiment of the present invention is described in detail, thereby so that advantages and features of the invention can be easier to be it will be appreciated by those skilled in the art that, protection scope of the present invention is made to more explicit defining.
Wherein, the electroplate liquid that described production efficiency is high comprises that static inhibitor, deinking agent and slipping agent combine, described static inhibitor is barium sulfate, described deinking agent is nitrilotriacetic acid(NTA), described slipping agent is sodium phosphate, described barium sulfate accounts for the 2%-10% of the overall component of electroplate liquid that production efficiency is high, described nitrilotriacetic acid(NTA) accounts for the 40%-50% of the overall component of electroplate liquid that production efficiency is high, described sodium phosphate accounts for the 45%-49% of the overall component of electroplate liquid that production efficiency is high, and described barium sulfate comprises barium and sulfate radical.
Further illustrate, described barium sulfate accounts for 8% of the overall component of electroplate liquid that production efficiency is high, and described nitrilotriacetic acid(NTA) accounts for 43% of the overall component of electroplate liquid that production efficiency is high, and described sodium phosphate accounts for 49% of the overall component of electroplate liquid that production efficiency is high.Barium sulfate is colourless rhombic system crystal or white unformed powder.When dry, easily lump.Relative density 4.50(15 ℃), fusing point is 1580 ℃.Water-soluble, ethanol and acid hardly.Be dissolved in hot concentrated sulfuric acid.At about 1150 ℃, there is polymorphic transition change.At approximately 1400 ℃, start significantly to decompose.Stable chemical nature.Reducible with carbon in the time of 600 ℃ is barium sulphide.During 20 ° of C, solubleness is 2.4 * 10^-4g, and during 25 ° of C, Ksp is 1.1 * 10^-10[1].The water-soluble part of barium sulfate all ionizes, and is strong electrolyte.
Further illustrating, nitrilotriacetic acid(NTA) has very strong Biodegradable.NTA is by bacteriological action decomposition run, and its final product is CO2 and NH3.Evidence: NTA is in river, and at the temperature of 2 ℃, rate of decomposition is 82-88% after two weeks, and several weeks afterwards just can complete biodegradable, adds NTA, adjustable its viscosity in printing-ink and other industrial slurry.As stablizer, NTA can add in the pharmaceutical chemicalss such as metal anti-corrosive paint, paper waterproof paint, agricultural chemicals, household chemicals, Pyranton, can make the stability of product improve.
Further illustrating, sodium phosphate is important have dodecahydrate and anhydride.Anhydride is white crystals.Density 2.536g/cm3.1340 ℃ of fusing points.12 water things are colourless cube of crystallization or white powder.Density 1.62g/cm3.73.3 ℃ of fusing points.76.7 ℃ decomposition.Being heated to 100 ℃ loses 12 crystal water and forms anhydride.Easy-weathering in dry air.All soluble in water, solubleness 20 degree-120g/L; 30 degree-163g/L.Its aqueous solution is strong basicity.Be insoluble to dithiocarbonic anhydride and ethanol.By phosphoric acid and sodium carbonate solution, carry out neutralization reaction, control pH value 8~8.4, through elimination filter cake residue, after concentrating filter liquor, add liquid caustic soda to make Na/P ratio reach 3.24~3.26, then through crystallisation by cooling, solid-liquid separation, is dried and makes.Anhydrous system is dissolved in ten phosphate dihydrate sodium crystallizations after the water (10%~15%) that is heated to 85~90 ℃, through dehydrating, makes.All can be used as water-softening chemicals and washing composition, boilercomposition, laking agent during printing and dyeing, the mercerising toughener of fabric, metallic corrosion stopping agent and metal antirusting agent, fusing assistant and discoloring agent in enamel production, the rawhide degreasing agent in process hides and degumming agent etc.The invention provides the electroplate liquid that a kind of production efficiency is high, have that production efficiency is high, electroplating velocity is high, the advantage that operating cost is low.
The specific embodiment of the present invention; but protection scope of the present invention is not limited to this; any those of ordinary skill in the art are in the disclosed technical scope of the present invention, and the variation that can expect without creative work or replacement, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain that claims were limited.

Claims (3)

1. the electroplate liquid that production efficiency is high, it is characterized in that: the electroplate liquid that described production efficiency is high comprises that static inhibitor, deinking agent and slipping agent combine, described static inhibitor is barium sulfate, described deinking agent is nitrilotriacetic acid(NTA), described slipping agent is sodium phosphate, described barium sulfate accounts for the 2%-10% of the overall component of electroplate liquid that production efficiency is high, described nitrilotriacetic acid(NTA) accounts for the 40%-50% of the overall component of electroplate liquid that production efficiency is high, and described sodium phosphate accounts for the 45%-49% of the overall component of electroplate liquid that production efficiency is high.
2. the high electroplate liquid of production efficiency according to claim 1, is characterized in that: described barium sulfate comprises barium and sulfate radical.
3. the high electroplate liquid of production efficiency according to claim 1, it is characterized in that: described barium sulfate accounts for 8% of the overall component of electroplate liquid that production efficiency is high, described nitrilotriacetic acid(NTA) accounts for 43% of the overall component of electroplate liquid that production efficiency is high, and described sodium phosphate accounts for 49% of the overall component of electroplate liquid that production efficiency is high.
CN201310517133.1A 2013-10-29 2013-10-29 Electroplating solution with high production efficiency Pending CN103540965A (en)

Priority Applications (1)

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CN201310517133.1A CN103540965A (en) 2013-10-29 2013-10-29 Electroplating solution with high production efficiency

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CN201310517133.1A CN103540965A (en) 2013-10-29 2013-10-29 Electroplating solution with high production efficiency

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1046198A (en) * 1990-05-26 1990-10-17 冶金工业部钢铁研究总院 Process for producing cyanogenless continuous copper plating
CN1880512A (en) * 2006-05-11 2006-12-20 武汉大学 Trivalent chromium electroplating solution in sulfate system and method for preparing same
CN101665959A (en) * 2008-09-03 2010-03-10 中国科学院宁波材料技术与工程研究所 Trivalent chromium electroplating solution of sulfate system and electroplating method thereof
JP2013044035A (en) * 2011-08-25 2013-03-04 Ishihara Chem Co Ltd Method of filling copper, and electronic component using the same
US20130112564A1 (en) * 2008-05-15 2013-05-09 Solopower, Inc. Electroplating Solutions and Methods For Deposition of Group IIIA-VIA Films
KR101271587B1 (en) * 2012-12-28 2013-06-11 주식회사 포스코 Mono-fluid type metal nano coating composition and preparation method of the same
CN103173797A (en) * 2011-12-24 2013-06-26 李振萍 Bright chrome plating solution

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1046198A (en) * 1990-05-26 1990-10-17 冶金工业部钢铁研究总院 Process for producing cyanogenless continuous copper plating
CN1880512A (en) * 2006-05-11 2006-12-20 武汉大学 Trivalent chromium electroplating solution in sulfate system and method for preparing same
US20130112564A1 (en) * 2008-05-15 2013-05-09 Solopower, Inc. Electroplating Solutions and Methods For Deposition of Group IIIA-VIA Films
CN101665959A (en) * 2008-09-03 2010-03-10 中国科学院宁波材料技术与工程研究所 Trivalent chromium electroplating solution of sulfate system and electroplating method thereof
JP2013044035A (en) * 2011-08-25 2013-03-04 Ishihara Chem Co Ltd Method of filling copper, and electronic component using the same
CN103173797A (en) * 2011-12-24 2013-06-26 李振萍 Bright chrome plating solution
KR101271587B1 (en) * 2012-12-28 2013-06-11 주식회사 포스코 Mono-fluid type metal nano coating composition and preparation method of the same

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Application publication date: 20140129