CN103489977A - 具有全方位反射镜的发光二极管及其相应的制造方法 - Google Patents
具有全方位反射镜的发光二极管及其相应的制造方法 Download PDFInfo
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- CN103489977A CN103489977A CN201310455672.7A CN201310455672A CN103489977A CN 103489977 A CN103489977 A CN 103489977A CN 201310455672 A CN201310455672 A CN 201310455672A CN 103489977 A CN103489977 A CN 103489977A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/405—Reflective materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
- H01L33/42—Transparent materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0025—Processes relating to coatings
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
Abstract
Description
Claims (15)
Priority Applications (1)
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CN201310455672.7A CN103489977A (zh) | 2013-09-29 | 2013-09-29 | 具有全方位反射镜的发光二极管及其相应的制造方法 |
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CN201310455672.7A CN103489977A (zh) | 2013-09-29 | 2013-09-29 | 具有全方位反射镜的发光二极管及其相应的制造方法 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106129206A (zh) * | 2016-07-29 | 2016-11-16 | 天津三安光电有限公司 | 具有全镜面结构的发光二极管及其制作方法 |
CN106653986A (zh) * | 2016-12-18 | 2017-05-10 | 佛山市国星半导体技术有限公司 | 一种具有反射电流阻挡层的led芯片及其制作方法 |
CN108417569A (zh) * | 2018-05-11 | 2018-08-17 | 深圳市方宇鑫材料科技有限公司 | Led基板及led光源模组 |
WO2020107782A1 (zh) * | 2018-11-30 | 2020-06-04 | 武汉华星光电技术有限公司 | 一种面光源芯片及其发光二极管 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6492661B1 (en) * | 1999-11-04 | 2002-12-10 | Fen-Ren Chien | Light emitting semiconductor device having reflection layer structure |
CN101807650A (zh) * | 2010-03-19 | 2010-08-18 | 厦门市三安光电科技有限公司 | 具有分布布拉格反射层的氮化镓基高亮度发光二极管及其制作工艺 |
CN202094166U (zh) * | 2011-06-03 | 2011-12-28 | 广东银雨芯片半导体有限公司 | 一种具有反射型电流阻挡层的led芯片 |
CN102856459A (zh) * | 2012-09-06 | 2013-01-02 | 安徽三安光电有限公司 | 发光二极管反射电极的钝化方法 |
CN103078023A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种双反射发光二极管 |
CN103078027A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种具有电流阻挡层的发光二极管 |
-
2013
- 2013-09-29 CN CN201310455672.7A patent/CN103489977A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6492661B1 (en) * | 1999-11-04 | 2002-12-10 | Fen-Ren Chien | Light emitting semiconductor device having reflection layer structure |
CN101807650A (zh) * | 2010-03-19 | 2010-08-18 | 厦门市三安光电科技有限公司 | 具有分布布拉格反射层的氮化镓基高亮度发光二极管及其制作工艺 |
CN202094166U (zh) * | 2011-06-03 | 2011-12-28 | 广东银雨芯片半导体有限公司 | 一种具有反射型电流阻挡层的led芯片 |
CN102856459A (zh) * | 2012-09-06 | 2013-01-02 | 安徽三安光电有限公司 | 发光二极管反射电极的钝化方法 |
CN103078023A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种双反射发光二极管 |
CN103078027A (zh) * | 2013-01-31 | 2013-05-01 | 武汉迪源光电科技有限公司 | 一种具有电流阻挡层的发光二极管 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106129206A (zh) * | 2016-07-29 | 2016-11-16 | 天津三安光电有限公司 | 具有全镜面结构的发光二极管及其制作方法 |
WO2018019037A1 (zh) * | 2016-07-29 | 2018-02-01 | 厦门三安光电有限公司 | 具有全镜面结构的发光二极管及其制作方法 |
CN106653986A (zh) * | 2016-12-18 | 2017-05-10 | 佛山市国星半导体技术有限公司 | 一种具有反射电流阻挡层的led芯片及其制作方法 |
CN108417569A (zh) * | 2018-05-11 | 2018-08-17 | 深圳市方宇鑫材料科技有限公司 | Led基板及led光源模组 |
WO2020107782A1 (zh) * | 2018-11-30 | 2020-06-04 | 武汉华星光电技术有限公司 | 一种面光源芯片及其发光二极管 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent of invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Li Zhiyong Inventor after: Zhang Lei Inventor after: Li Qiming Inventor after: Zhang Yu Inventor after: Xu Huiwen Inventor after: Yu Tingting Inventor after: Zhang Cunlei Inventor after: Zhang Qiong Inventor before: Li Zhiyong |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: LI ZHIYONG TO: LI ZHIYONG ZHANG LEI LI QIMING ZHANG YU XU HUIWEN YU TINGTING ZHANG CUNLEI ZHANG QIONG |
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C12 | Rejection of a patent application after its publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20140101 |