CN103454721A - Optical fiber circuit board and manufacturing method thereof - Google Patents

Optical fiber circuit board and manufacturing method thereof Download PDF

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Publication number
CN103454721A
CN103454721A CN2012101762018A CN201210176201A CN103454721A CN 103454721 A CN103454721 A CN 103454721A CN 2012101762018 A CN2012101762018 A CN 2012101762018A CN 201210176201 A CN201210176201 A CN 201210176201A CN 103454721 A CN103454721 A CN 103454721A
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CN
China
Prior art keywords
circuit board
substrate
flexible substrate
photoresistance
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2012101762018A
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Chinese (zh)
Inventor
李秉衡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Original Assignee
Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hongfujin Precision Industry Shenzhen Co Ltd, Hon Hai Precision Industry Co Ltd filed Critical Hongfujin Precision Industry Shenzhen Co Ltd
Priority to CN2012101762018A priority Critical patent/CN103454721A/en
Publication of CN103454721A publication Critical patent/CN103454721A/en
Pending legal-status Critical Current

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Abstract

The invention provides an optical fiber circuit board comprising a flexible base material and a flexible optical waveguide. The flexible optical waveguide is arranged on the flexible base material and used for transmitting optical signals. The invention further provides a manufacturing method of the optical fiber circuit board.

Description

The manufacture method of optical circuit board and optical circuit board
Technical field
The present invention is about the manufacture method of a kind of optical circuit board and optical circuit board.
Background technology
Due to current interior of mobile phone core processor processing speed, with Fast Growth, and outside each spare part is also because the raising of core processor usefulness, also is inconjunction with to drive outside spare part specification and improve.As camera model, improved picture element, volume of transmitted data that also relatively must be larger; The LCD display module, promoted LCD and shown picture element, makes the more careful perfection of picture, volume of transmitted data that also must be larger.
How to solve the more more substantial volume of transmitted data than in the past, the general employing increases the data transmission channel number of traditional flexible circuit board connecting line, and then strengthens outside transmission quantity.In addition, because optical fiber is with optical signal transmission, optical signal transmission obtains major advantage, can not be subject to Electromagnetic Interference (EMI), and ray velocity is faster than electric speed, so use optical fiber fast doubly a lot of more than adopting copper cash to transmit on data transmission.
Summary of the invention
In view of this, be necessary to provide a kind of whole height is little and the loss light transmission is lower optical circuit board and the manufacture method of optical circuit board.
A kind of optical circuit board, comprise flexible substrate, following layer and copper layer on described flexible substrate comprises substrate and is positioned on described substrate, described copper layer is located on described substrate by described following layer, the etched rear setting of the described copper layer of part, described soft optical waveguide is used for transmitting optical signal.
A kind of manufacture method of optical circuit board comprises step: flexible substrate is provided and cuts flexible substrate, described flexible substrate comprises substrate and is arranged on the copper layer on institute's substrate; On flexible substrate perforate and on the inwall in described hole plated film; On flexible substrate after plated film completes, photographic layer is set; The exposure imaging photographic layer is to form the naked copper district; Copper floor in etching naked copper district is to form waveguide section; Remove the photographic layer of many Yus; Soft optical waveguide is set and sticks insulation course in waveguide section; Corresponding soft optical waveguide is offered optical window to appear soft optical waveguide.
Compared to prior art, the optical circuit board of the present embodiment utilizes the mode of optical waveguide transmission signal to adapt to the ability of high speed transmission of signals; In addition, soft optical waveguide with can to reach volume together with flexible substrate is manufactured less, reduce the separately contraposition problem when cost of assembling and assembling and then reduce loss of photoelectricity.
The accompanying drawing explanation
Fig. 1 to Figure 11 is the schematic diagram of embodiment of the present invention fiber optic circuit board fabrication method.
The main element symbol description
Flexible substrate 10
Substrate 11
Solid 12
The copper layer 13
Through hole 14
The first rete 15
Photographic layer 16
The naked copper district 17
The electrode opening district 18
Waveguide section 19
Electrode district 20
Soft optical waveguide 21
Insulation course 22
The second rete 23
Optical window 24
Light shield 30
Drafting department 31
Following embodiment further illustrates the present invention in connection with above-mentioned accompanying drawing.
Embodiment
As shown in Figure 1, provide flexible substrate and shear flexible substrate to be applicable to the optical circuit board of needs size.
Flexible substrate 10 is doubling plate, and it comprises substrate 11 and is arranged on 11 two lip-deep solids 12 of substrate and copper layer 13.Solid 12 is used for copper layer 13 is incorporated on substrate 11 between substrate 11 and copper layer 13.
The material of substrate 11 can be selected from polyimide (Polyimide, PI), Teflon (Teflon), poly-thiamines (Polyamide), polymethylmethacrylate (Polymethylmethacrylate), polycarbonate (Polycarbonate), polyethylene terephthalate (Polyethylene Terephtalate, PET), polyimide-tygon-terephthaldehyde's ester copolymer (Polyamide Polyethylene-Terephthalate copolymer) or above-mentioned two or more composition.
Certainly, flexible substrate 10 can be also lamina, on a surface of substrate 11, utilizes solid 12 that copper layer 13 is set.
The doubling plate of below take is introduced the manufacture process of optical circuit board as example.
Refer to Fig. 2, bore a hole on flexible substrate.
Utilize mechanical system to form through hole 14 on flexible substrate 10 so that be arranged on copper layer 13 conducting on 11 two surfaces of substrate.
In other structure, blind hole can certainly be set to be communicated with 11 two lip-deep copper layers 13 of substrate.
As shown in Figure 3, plated film on the inwall in hole.
On the inwall of through hole 14, plated film is to form the first rete 15.The material of the first rete 15 is conductive material, for example copper.
Certainly, can adopt the modes such as sputter or evaporation to form the first rete 15.
As shown in Figure 4, stick photosensitive material on the flexible substrate after plated film completes.
Flexible substrate 10 after the cleaning plated film, then the mode with hot pressing arranges photographic layer 16 on copper layer 13.
It is that photoresistance or epoxy acrylate are that photoresistance, polyester acrylate are that the upgrading acryl resins such as photoresistance, polycarbamate acrylic ester photoresistance are that photoresistance, pi are that photoresistance, siloxane-based photoresistance or fluorine are photoresistance that the material of photographic layer 16 can be selected from acryl resin.
Certainly, in alternate manner, also can utilize any one method in rotary coating (Spin Coat), crack coating (Slit Coat), crack rotary coating (Slit and Spin Coat) or dry film rubbing method (Dry Film Lamination) that photosensitive material is coated on copper layer 13 to form photographic layer 16.
Refer to Fig. 5, the exposure photographic layer.
30 pairs of photographic layers 16 of light shield that utilization has drafting department 31 are exposed, and light shines on photographic layer 16 through drafting department 31, thereby the zone of corresponding pattern section 31 on photographic layer 16 is changed.
The distribution of drafting department 31 and structures shape distribution and the structure of the photographic layer 16 that changes.
As shown in Figure 6, the development photographic layer is to obtain the naked copper district.
Flexible substrate 10 after exposure is placed in to developer solution, etches away with the photographic layer 16 by corresponding pattern section 31, thereby exposed copper floor 13 is to produce naked copper district 17 and electrode opening district 18.
Refer to Fig. 7, etch away the unnecessary copper floor in naked copper district.
Flexible substrate 10 after developing is put into to the etching solution of etch copper, waveguide section 19 and electrode district 20 are removed and then formed in copper floor 13 etching in naked copper district 17 and electrode opening district 18.
As shown in Figure 8, remove the photographic layer of many Yus.
Flexible substrate 10 is put into to the solution of etching photosensitive material, the photographic layer of many Yus 16 is removed.
Refer to Fig. 9, in waveguide section, place soft optical waveguide and stick insulation course.
Place on soft optical waveguide 21 two surfaces at flexible substrate 10 and stick insulation course 22 in waveguide section 19, then utilize the mode of heating pressurization to make insulation course 22 tightr with flexible substrate 10 laminatings.
Preferably, on soft optical waveguide 21, be coated with solid, make soft optical waveguide 21 tightr with the combination of flexible substrate 10.
The material of insulation course 22 is peelable type printing ink, specifically can be comprised of thermoplastic polyurethane (TPU), dipropylene glycol monomethyl ether (Dipropylene Glycol Monomethyl Ether), butyl cellosolve (Butyl cellosolve), titania (TiO2) and mould release.
As shown in figure 10, at electrode district place plated film.
If insulation course 22 coated electrode districts 20, can first remove the insulation course 22 on electrode district 20, now need to retain insulation course 22 on soft optical waveguide 21 and damage soft optical waveguide 21 when preventing plated film.The material that then can utilize sputter or evaporation mode plated film on electrode district 20 to form the second rete 23, the second retes 23 can be nickel, gold, tin or lead etc.
Refer to Figure 11, offer optical window.
Remove the insulation course 22 of the light inlet of soft optical waveguide 21 and bright dipping place to form optical window 24, make light to enter in soft optical waveguide 21 by optical window 24, so far optical circuit board has been manufactured.
The optical circuit board of the present embodiment utilizes the mode of optical waveguide transmission signal to adapt to the ability of high speed transmission of signals; In addition, soft optical waveguide with can to reach volume together with flexible substrate is manufactured less, reduce the separately cost of assembling of photoelectricity.
Be understandable that, those skilled in the art also can do other variation etc. and be used in design of the present invention in spirit of the present invention, as long as it does not depart from technique effect of the present invention and all can.The variation that these are done according to spirit of the present invention, within all should being included in the present invention's scope required for protection.

Claims (8)

1. an optical circuit board, comprise flexible substrate, following layer and copper layer on described flexible substrate comprises substrate and is positioned on described substrate, described copper layer is located on described substrate by described following layer, after the described copper layer of part is etched, soft optical waveguide is set, described soft optical waveguide is used for transmitting optical signal.
2. optical circuit board as claimed in claim 1, is characterized in that, described substrate comprises relative first surface and second surface, and described copper layer is arranged on described first surface and second surface, and described soft optical waveguide is positioned at described first surface.
3. optical circuit board as claimed in claim 2, it is characterized in that, the material of described substrate is selected from polyimide, Teflon, poly-thiamines, polymethylmethacrylate, polycarbonate, polyethylene terephthalate or polyimide-tygon-terephthaldehyde's ester copolymer.
4. the manufacture method of an optical circuit board comprises step:
Flexible substrate is provided and cuts flexible substrate, described flexible substrate comprises substrate and is arranged on the copper layer on institute's substrate;
On flexible substrate perforate and on the inwall in described hole plated film;
On flexible substrate after plated film completes, photographic layer is set;
The exposure imaging photographic layer is to form the naked copper district;
Copper floor in etching naked copper district is to form waveguide section;
Remove the photographic layer of many Yus;
Soft optical waveguide is set and sticks insulation course in waveguide section;
Corresponding soft optical waveguide is offered optical window to appear soft optical waveguide.
5. the manufacture method of optical circuit board as claimed in claim 4, it is characterized in that, the material of described substrate is selected from polyimide, Teflon, poly-thiamines, polymethylmethacrylate, polycarbonate, polyethylene terephthalate or polyimide-tygon-terephthaldehyde's ester copolymer.
6. the manufacture method of optical circuit board as claimed in claim 4, it is characterized in that, it is that photoresistance or epoxy acrylate are that photoresistance, polyester acrylate are that the upgrading acryl resins such as photoresistance, polycarbamate acrylic ester photoresistance are that photoresistance, pi are that photoresistance, siloxane-based photoresistance or fluorine are photoresistance that the material of described photographic layer is selected from acryl resin.
7. the manufacture method of optical circuit board as claimed in claim 6, is characterized in that, described photographic layer is arranged on described flexible substrate by rotary coating, crack coating, crack rotary coating, dry film rubbing method or hot-press method.
8. the manufacture method of optical circuit board as claimed in claim 4, is characterized in that, the material of described insulation course is comprised of thermoplastic polyurethane, dipropylene glycol monomethyl ether, butyl cellosolve, titania and mould release.
CN2012101762018A 2012-05-31 2012-05-31 Optical fiber circuit board and manufacturing method thereof Pending CN103454721A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2012101762018A CN103454721A (en) 2012-05-31 2012-05-31 Optical fiber circuit board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2012101762018A CN103454721A (en) 2012-05-31 2012-05-31 Optical fiber circuit board and manufacturing method thereof

Publications (1)

Publication Number Publication Date
CN103454721A true CN103454721A (en) 2013-12-18

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CN2012101762018A Pending CN103454721A (en) 2012-05-31 2012-05-31 Optical fiber circuit board and manufacturing method thereof

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CN (1) CN103454721A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1657988A (en) * 2004-02-16 2005-08-24 日东电工株式会社 Optical waveguide and production method thereof
CN101340775A (en) * 2007-07-06 2009-01-07 鸿富锦精密工业(深圳)有限公司 Flexible circuit board and manufacturing method thereof
US20090016671A1 (en) * 2004-10-22 2009-01-15 Ibiden Co., Ltd Multilayer printed circuit board
CN101571610A (en) * 2008-04-28 2009-11-04 日立电线株式会社 Flexible optical waveguide and process for its production
CN100586259C (en) * 2007-04-13 2010-01-27 富葵精密组件(深圳)有限公司 Method for manufacturing circuit board with differential break structure
KR20100066155A (en) * 2008-12-09 2010-06-17 삼성전기주식회사 Printed circuit board for optical waveguides and method of manufacturing the same
CN102223764A (en) * 2010-04-16 2011-10-19 富葵精密组件(深圳)有限公司 Manufacturing method of flexible circuit boards

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1657988A (en) * 2004-02-16 2005-08-24 日东电工株式会社 Optical waveguide and production method thereof
US20090016671A1 (en) * 2004-10-22 2009-01-15 Ibiden Co., Ltd Multilayer printed circuit board
CN100586259C (en) * 2007-04-13 2010-01-27 富葵精密组件(深圳)有限公司 Method for manufacturing circuit board with differential break structure
CN101340775A (en) * 2007-07-06 2009-01-07 鸿富锦精密工业(深圳)有限公司 Flexible circuit board and manufacturing method thereof
CN101571610A (en) * 2008-04-28 2009-11-04 日立电线株式会社 Flexible optical waveguide and process for its production
KR20100066155A (en) * 2008-12-09 2010-06-17 삼성전기주식회사 Printed circuit board for optical waveguides and method of manufacturing the same
CN102223764A (en) * 2010-04-16 2011-10-19 富葵精密组件(深圳)有限公司 Manufacturing method of flexible circuit boards

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
陈福深等: "《集成光学器件导论》", 31 January 2010, 机械工业出版社 *

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Application publication date: 20131218