CN103425821B - A kind of method for designing of free form surface grayscale mask - Google Patents
A kind of method for designing of free form surface grayscale mask Download PDFInfo
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Abstract
The method for designing of a kind of free form surface grayscale mask, belongs to micro-fabrication technology field.It is characterized in that utilizing the process that computer aided design software sets up target surface model indirectly to control gray shade unit absorbance in grayscale mask；Utilize the simulation of the cutter track in computer aided manufacturing that target surface model is carried out Surface tessellation；The cutter track simulation in computer aided manufacturing is utilized indirectly to control the arrangement mode of gray shade unit in grayscale mask figure；Utilize the method for paving the way after improving longitudinally to pave the way along fixing node of paving the way and gradually generate gray shade unit；Under Visual Studio development environment, use C Plus Plus, AutoCAD secondary development tool ObjectARX, AutoCAD is carried out secondary development, carries out free form surface gray scale mask design.The invention have the advantages that: computer assistant product modeling design, computer aided manufacturing and gray-coded correlation theory are combined by the present invention, achieve the Design of digital of free form surface gray scale mask first.
Description
Technical field
The invention belongs to micro-fabrication technology field, relate to three-dimensional microstructures and manufacture class, be related specifically to the method for designing of a kind of free form surface gray scale mask.
Background technology
Gray scale photoetching is the effective ways that a kind of three-dimensional microstructures mass makes, and one of its key technology is the design of gray scale mask figure.Gray-level light lithography just can complete the batch making of three-dimensional microstructures by single exposure, can simplify preparation technology, reduce cost of manufacture, have broad application prospects, receive the concern of scientific research personnel gradually in three-dimensional microstructures making.nullC.M.Waits et al. utilizes the gray scale mask version of gray value gradual change along its length first to produce wedge shape photoresist structure，Then silicon wedged microstructures has been made using the plastic structure that obtains as the masking layer of silicon deep reaction ion etching，And utilize gray-level light lithography that traditional micro-compressor has successfully carried out structure optimization (list of references [1]: C.M.Waits,B.Morgan,M.Kastantin,R.Ghodssi.Microfabricationof3DsiliconMEMSstructuresusing gray-scalelithographyanddeepreactiveionetching [J] .SensorsandActuatorsA119 (2005): 245-253).nullBrianMorgan et al. utilizes gray-level light lithography and deep reaction ion etching technology to make fresnel diffraction lens on a silicon substrate，The grayscale mask version profile that it adopts is circle，The gray value of mask plate is oscillatory type change to the periphery from center，Equal (list of references [2]: the BrianMorgan of gray value on the circumference of same diameter,ChristopherM.WaitsDevelopmentofaDeepSiliconPhaseFresnelLensUsingGray-ScaleLithographyandDeepReactiveIonEtching.JournalOfMicroelectromechanicalSystems,2004，13(1): 113-120).Zhang Xinyu et al. discusses gray-level light lithography application prospect in the integrated optics camera lens of near field, giving contour shape is that the circular lenticule gray scale mask with rectangle designs, its gray value is from mask plate center gradual change to the periphery (list of references [3]: Zhang Xinyu, Pei Xiandeng, thank long-living. for the technique of gray-scale mask [J] of integrated near field optical head lenticule device. optical technology, 2002,28 (4): 291-295).In the research of gray-level light lithography, the design of mask artwork is all merely resting on the level of elementary analytic surface (such as sphere, anchor ring, plane) at present, the design of free form surface grayscale mask could not be realized, so gray-level light lithography can only process the three-dimensional microstructures that surface is elementary analytic surface, its range of application receives a definite limitation.One width free form surface grayscale mask figure comprises tens thousand of to hundreds thousand of gray shade unit, the difficult point of its design is in that how to realize the control of different gray shade unit gray values in grayscale mask, existing gray scale mask method for designing cannot realize the design of free form surface grayscale mask always.
At present in micro electro mechanical system field, it is badly in need of realizing the making of the three-dimensional microstructures of free form surface, to widen the range of application of three-dimensional micro device.
Summary of the invention
The method that it is an object of the invention to provide the design of a kind of free form surface grayscale mask, solves the mask plate design problem during three-dimensional microstructures making complex free curved surface.
The technical scheme is that utilizing computer-aided design (CAD) to set up target surface model controls the absorbance of zones of different gray shade unit in grayscale mask indirectly；Utilize cutter rail analogy method in computer aided manufacturing (CAM) that target surface model surface is carried out discrete to obtain orderly curved surface features point；The cutter track simulation in computer aided manufacturing is utilized indirectly to control the arrangement mode of gray shade unit in grayscale mask figure；Utilize the method for paving the way after improving longitudinally to pave the way along fixing node of paving the way and gradually generate gray shade unit；Then using VisualStudio2008(VS2008) as development environment, under VS2008 development environment, call the secondary development tool ObjectARX of AutoCAD development platform, use C++ programming language AutoCAD to carry out secondary development to realize the design of free form surface gray scale mask.The gray scale mask G-Design program that the present invention obtains can be directly embedded in AutoCAD and run, and can call the core function of AutoCAD and access AutoCAD data base, having stronger versatility.
The method designing free form surface gray scale mask based on computer-aided design, computer aided manufacturing and AutoCAD secondary development that the present invention proposes, concretely comprises the following steps:
Step one, require to set up target surface model according to the technology of device to be processed；
Step 2, determine the basic design parameters of grayscale mask figure: gray shade unit is paved the way step-length, gray shade unit transmittance calculation formula, node optimization coefficient, minimum step-length of paving the way, whirl coating height value and convergent-divergent multiple M；
The characteristic point that step 3, Discrete Surfaces are orderly to obtain target surface；
Step 4, the cutting edge rail three-dimensional coordinate point extracted in cutter rail file；
Step 5, characteristic point error are checked；
Step 6, configuration AutoCAD secondary development environment；
Step 7, coding, set up ObjectArx type project file, selects ObjectARX/DBX/OMFProject template, then log-in command.
Step 8, the fixing node of paving the way of generation；
Step 9, generation gray shade unit absorbance chained list；
Method of paving the way after step 10, utilization improvement generates gray shade unit and is submitted to gray shade unit chained list；
Step 11, compiler, AutoCAD program can start automatically, loads compiling and obtains the file of suffix arx by name, inputs the order of above-mentioned registration and run, obtaining grayscale mask figure, finally again its equal proportion convergent-divergent M times being obtained grayscale mask figure.
The detailed process of described step one is: utilize 3 d modeling software (such as UG, Pro/E etc.) to carry out curved surface modeling, and its characteristic size suitably amplifies a number of level so that modeling (as putting three orders of magnitude greater).
In described step 2, the concrete defining method of each parameter is as follows:
1. gray shade unit is paved the way step-length defining method
The size P that paves the way of unit of paving the way must is fulfilled for PMAX<RC, wherein PMAXFor the maximum that the size P that paves the way is desirable.Litho machine resolution RCComputing formula is shown below:
In formula, λ to be litho machine optical source wavelength, σ be partial coherence factor, NA are the numerical aperture of photolithographic imaging system.
2. gray shade unit transmittance calculation formula defining method
List of references [2], adopts demarcation mask plate a certain photoresist to carry out engineer testing to determine gray shade unit transmittance calculation formula.Detailed description of the invention is: demarcate mask plate first with AutoCAD Software on Drawing, on mask plate, gray shade unit transmission ranges is set to (0.2-0.8), absorbance value increases from minima successively with increment 0.1, the gray shade unit of absorbance of the same race, with 10 × 10 for one group, forms independent square area；Then utilize demarcation mask plate that a certain photoresist is carried out engineer testing, obtain photoresist height value corresponding under different absorbance；Carry out curve fitting, obtain the curvilinear equation between photoresist height and absorbance, finally obtain the transmittance calculation formula under this process conditions.
3. node optimization coefficient and minimum step-length defining method of paving the way
Minimum feature that node optimization coefficient mainly can be processed by mask manufacturer, mask plate make price and the technology of three-dimensional microstructures to make requires decision, generally take (0.4-0.6)；
Minimum step-length of paving the way=step-length of paving the way × node optimization coefficient.
4. whirl coating height value defining method
Whirl coating height value is required by the technology of three-dimensional microstructures to be processed, actual process condition comprehensively determines.
5. convergent-divergent multiple M defining method
Assume to be exaggerated multiple M when modeling, then convergent-divergent multiple is exactly M.
The detailed process of described step 3 is: utilize the CAM software curved surface to setting up to carry out tool path simulation, select fixed-lag Kalman smoother, cutter adopts ball head knife, cutting way is unidirectional, stride value step-length of paving the way with gray shade unit is equal, maximum stride value is the step-length of paving the way of gray shade unit, and the movement output of Machine-Tool Control is linear, and cutting edge rail and non-cutting cutter rail are set as different colours；After having emulated, preserving cutter rail file, tool path simulation schematic diagram is as shown in Figure 1.
The detailed process of described step 4 is: as it is shown in figure 1, the cutter rail of curved surface is cutting edge rail, and the cutter rail outside curved surface is non-cutting cutter rail；By being set to different colours, then utilizing its color difference to write code, extract the three-dimensional coordinate point of cutting edge rail, these points are the characteristic point of curved surface, are saved as text document file.
The detailed process of described step 5 is: surface model and curved surface features point are imported reverse engineering software, utilizes some cloud to distance of curved surface function, obtains the error between cloud and curved surface, and Error Calculation result schematic diagram is as shown in Figure 3.
The detailed process of described step 6 is: check the version number of AutoCAD, installs the AutoCADObjectArx kit of respective version, and inc catalogue and the interpolation of lib catalogue of ObjectARX are comprised in VisualStudio.
The detailed process of described step 8 is: the text of the three-dimensional coordinate point obtained in read step four, is written into characteristic node chained list；Using internodal spacing and minimum step-length of paving the way, maximum step-length of paving the way magnitude relationship as the foundation optimized, concrete optimization method is as shown in Figure 4；Optimization process is as shown in Figure 5: because N2-N3 is less than minimum step-length of paving the way in Fig. 5 (a), and N2-N4 is between the minimum step-length and maximum pave the way between step-length of paving the way, and is rejected according to Fig. 4, node N3, and the node optimized is shown in Fig. 5 (b)；In fig. 5 (c), the distance between N2-N4, more than maximum step-length of paving the way, according to Fig. 4, is given up origin node N3, is taken the midpoint of N2, N4 as new N3 node；Newly-built fixing node chained list of paving the way, copies to the characteristic node chained list after optimizing and newly-built fixing paves the way in node chained list, finally by all Z coordinate value zero setting of node chained list of paving the way.
The detailed process of described step 9 is: read the characteristic node chained list after optimizing, and calculates absorbance according to the Z coordinate value of coordinate points each in chained list and transmittance calculation formula, and is sequentially stored in newly-built absorbance chained list.
The detailed process of described step 10 is: is first according to order and reads the fixing node (in Fig. 6 shown in N1, N2) of paving the way of fixing pave the way in chained list two, then along X-direction positive direction, with N1 point for starting point, pave the way the 3rd node M 1 of unit in mono-P place generation of distance N1, in Fig. 6 shown in M1, in like manner can invocation point M2；Link tetra-nodes of N1, N2, M1, M2 and can form unit of paving the way；Determine the center point coordinate of unit of paving the way, the center point coordinate of gray shade unit can be obtained；The absorbance size of the area according to unit of paving the way and this node place gray shade unit calculates the likelihood ratio of the two, can calculate according to the likelihood ratio and obtain gray shade unit node coordinate, in Fig. 6 (c) shown in n2, n1, m1, m2；It is subsequently filled and can obtain gray shade unit, as shown in Fig. 6 (d)；The gray shade unit of generation is submitted to newly-built gray shade unit chained list, then reads two nodes of N2, N3, repeat the above steps, generate new gray shade unit and be submitted to chained list；Pave the way when program determines certain string, then started to continue to pave the way from secondary series, as shown in Figure 6 (e)；After gray shade unit all generates, deleting the some line element of all auxiliary, the grayscale mask figure finally given is such as shown in Fig. 6 (f).
The invention have the advantages that: computer assistant product modeling design, computer aided manufacturing and AutoCAD secondary development are combined by the present invention, achieve the Design of digital of free form surface gray scale mask first；The modulation of grayscale mask optical amplitude encoding is combined with computer aided manufacturing cathetus interpolation cutter orbit making principle, gray shade unit is made to realize adaptive refinement according to target surface Curvature varying, under equal requirement, reduce the quantity of gray shade unit in grayscale mask figure, save sequential operation time and mask plate manufacturing cost.
Accompanying drawing explanation
Accompanying drawing 1 is tool path simulation result schematic diagram.
Accompanying drawing 2 is FREEFORM SURFACE MODEL schematic diagram.
Accompanying drawing 3 is Error Calculation result schematic diagram.
Accompanying drawing 4 is node optimization method flow diagram.
Accompanying drawing 5 is node optimization process schematic, and wherein Fig. 5 (a) and Fig. 5 (c) is for optimizing front nodal point schematic diagram, Fig. 5 (b) and Fig. 5 (d) for optimizing posterior nodal point schematic diagram.
The method of paving the way that accompanying drawing 6 is after improving is paved the way process schematic, wherein Fig. 6 (a) is fixing node schematic diagram of paving the way, Fig. 6 (b) generates process schematic for unit of paving the way, Fig. 6 (c) generates process schematic for gray shade unit node, Fig. 6 (d) fills schematic diagram for gray shade unit, Fig. 6 (e) generates process schematic for other gray shade unit, and Fig. 6 (f) is the grayscale mask figure schematic diagram ultimately produced.
Accompanying drawing 7 is free form surface grayscale mask example schematic diagram.
Detailed description of the invention
The specific embodiment of the present invention is described in detail below in conjunction with technical scheme and accompanying drawing.
Design for the complex free curved surface grayscale mask of Mickey types of facial makeup in Beijing operas model and specifically comprise the following steps that
Step one, utilizing Imageware reverse warping software to set up FREEFORM SURFACE MODEL Mickey, as in figure 2 it is shown, its characteristic size is long 781.6mm, wide 697.4mm, high 50mm, characteristic size is exaggerated 1000 times.
Step 2, require according to the technology of device to be processed and minimum step-length of paving the way that actual process condition is determined be 2.8 μm, node optimization coefficient 0.4, whirl coating height 66 μm, zoom factor 0.001, transmittance calculation formula is shown below:
HPIt it is target light photoresist height value after development.
Step 3, utilize UG/CAM software Discrete Surfaces
1. open UG software, open surface model Mickey, enter cooked mode；
2. create processor, select face profile milling type；
3. creating cutter, select ball head knife, tool diameter is 1.0mm, length 15mm, cone angle 0 °, edge length 10mm, blade number 2；
4. driving method selects area milling, and cutting mode is unidirectional, and stride value perseverance is for paving the way step value and stride value is applied in plane, and cutter axis orientation is positive Z axis；
5. the movement output of Machine-Tool Control is chosen as " only linear "；
6. cutter rail sets and centers maximum step-length as 2.8mm, and surplus is set to 0, and component tolerance and marginal tolerances are set to 0.15mm；
7. cutting edge rail is separately configured to light blue, distinguishes mutually with other cutter rails；
8. generate cutter rail, list cutter rail, then save as " Mickey cutter rail .txt " text.
Step 4, the cutting edge rail three-dimensional coordinate point extracted in cutter rail file: read cutter rail text line by line by python scripting language's program, using the corresponding code light blue in the cutter rail file recognition marks as cutting edge rail, and then extract the three-dimensional coordinate point of cutting edge rail, save as " Mickey Surface tessellation point .txt " file.
Step 5, characteristic point error are checked: open surface model Mickey with UG software, save as " Mickey.igs " file；Opening ImageWare software, be first directed to " Mickey.igs " file and " Mickey Surface tessellation point .txt " file, then select Surface-Surfacetoclouddifference successively, Error Calculation result is as shown in Figure 3；Calculating the profile elevations h mean error obtaining Surface tessellation point after error equal proportion convergent-divergent 1000 times is 0.0374 μm, and standard deviation is 0.0260 μm.
Step 6, configuration development environment: select AutoCADObjectARX2010 kit, and coordinate VS2008 to use.VS2008 installs kit, then carries out configuration as follows: instrument-option-project and solution-VC++ catalogue, select " comprising catalogue ", add the inc catalogue of ObjectARX；In like manner, in " library file ", add the lib catalogue of ObjectARX.
Step 7, new construction file: newly-built ObjectARX type project file in VS2008, select ObjectARX/DBX/OMFProject template, registers newer command Spring.Property pages at new construction file selects attribute configuration-debugging-order, adds the startup file of AutoCAD2010.
Step 8, generate fixing node of paving the way: read step 4) in " Mickey Surface tessellation point .txt " file of obtaining, it is written into chained list List_3D, and according to the magnitude relationship of internodal spacing and minimum step-length of paving the way, maximum step-length of paving the way, List_3D is optimized, chained list after optimizing as shown in Figure 4, is stored in newly-built chained list List_3D_OPT by concrete optimization method；The newly-built fixing node chained list List_2D that paves the way, copies to the chained list List_3D_OPT after optimizing and newly-built paves the way in node chained list List_2D, finally by all Z coordinate value zero setting of the node chained list List_2D that paves the way.
Step 9, generation gray shade unit absorbance chained list: read the chained list List_3D_OPT after optimizing, Z coordinate value and transmittance calculation formula (1) according to coordinate points each in chained list calculate absorbance, and are sequentially stored in newly-built absorbance chained list List_TSL.
Step 10, generating gray shade unit and be submitted to gray shade unit chained list: being first according to order and read the fixing nodes of paving the way of two in chained list List_2D, then generate two other node of unit of paving the way, four nodes compositions are paved the way unit；Open absorbance chained list List_TSL, read the transmittance values at first node place, calculate the likelihood ratio obtaining gray shade unit and unit of paving the way, the central point being gray shade unit with unit center point of paving the way, in conjunction with cell node coordinate figure and the likelihood ratio generation gray shade unit node of paving the way, it is subsequently filled unit of paving the way and can obtain gray shade unit；The gray shade unit of generation is submitted to newly-built filling chained list, then reads second, third two nodes, repeat the above steps, generate new gray shade unit and be submitted to chained list；Pave the way when program determines certain string, then started to continue to pave the way from secondary series；After gray shade unit all generates, delete the some line element of all auxiliary.
Step 11, compiler, start AutoCAD program, then loads the arx file that compiling obtains, input mentioned order " spring " also runs program, by the grayscale mask figure that obtains according to equal proportion convergent-divergent 1000 times, finally give Mickey free form surface grayscale mask figure, as shown in Figure 7；The Mickey free form surface grayscale mask figure transmission ranges generated is (0.3-0.867), comprises 39637 gray shade unit altogether, and mask file size is 3.02MB, and program runtime is 525s, and graphics area is 0.31mm2, profile elevations h mean error is 0.0374 μm, and standard deviation is 0.0260 μm.
The grayscale mask method for designing that the present invention proposes, it is achieved that the design of free form surface grayscale mask, and design error is less, consuming time shorter, the grayscale mask figure of generation is AutoCAD file format, it is simple to the post-production of mask makes.The grayscale mask program designed possesses very strong versatility, for different target surface and processing request, the parameter such as absorbance formula in change program, step-length of paving the way, node optimization coefficient need only can realize the design of grayscale mask.
Claims (2)
1. a free form surface grayscale mask method for designing, its feature includes five parts:
Part I: utilize the process that computer aided design software sets up target surface model indirectly to control the absorbance of zones of different gray shade unit in grayscale mask；
Part II: utilize the simulation of the cutter track in computer aided manufacturing that target surface model is carried out Surface tessellation；
Part III: utilize the cutter track simulation in computer aided manufacturing indirectly to control the arrangement mode of gray shade unit in grayscale mask figure；
Part IV: utilize the method for paving the way after improving longitudinally to pave the way along fixing node of paving the way and gradually generate gray shade unit；Method of paving the way after described improvement is realized by following three steps:
1) fixing node of paving the way is generated；
2) gray shade unit absorbance chained list is generated；
3) generate gray shade unit and be submitted to gray shade unit chained list；
Part V: use C Plus Plus, AutoCAD secondary development tool ObjectARX under VisualStudio development environment, AutoCAD is carried out secondary development, carries out free form surface grayscale mask design.
2. a kind of free form surface grayscale mask method for designing according to claim 1, it is characterised in that grayscale mask G-Design program is directly embedded in AutoCAD and runs.
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Non-Patent Citations (4)
| Title |
|---|
| Development of a Deep Silicon Phase Fresnel Lens;Brian Morgan.etc;《Journal of Microelectromechanical System》;20041231;第13卷(第1期);第113-120页 * |
| Investigation of gray-scale technology for large area 3D silicon MEMS structures;Christopher M Waits.etc;《Journal of Micromechanics and Microengineering》;20031231;第170-177页 * |
| 数字光刻及其制作微光学元件的模拟研究;段茜;《中国优秀硕士学位论文全文数据库 信息科技辑 》;20070315(第3期);第I135-43页 * |
| 灰度掩膜图的设计***研究;冼宗明;《中国优秀硕士学位论文全文数据库 工程科技Ⅱ辑 》;20121015(第10期);第C030-5页 * |
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