CN103424065A - Small distance measuring method - Google Patents
Small distance measuring method Download PDFInfo
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- CN103424065A CN103424065A CN2013103210079A CN201310321007A CN103424065A CN 103424065 A CN103424065 A CN 103424065A CN 2013103210079 A CN2013103210079 A CN 2013103210079A CN 201310321007 A CN201310321007 A CN 201310321007A CN 103424065 A CN103424065 A CN 103424065A
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Abstract
The invention discloses a small distance measuring method. The method includes loading a target film on a target film support, loading a stop-resisting film on a stop-resisting film support, enabling the target film and the stop-resisting film to form a parallel plate capacitor, measuring a capacitance value of the parallel plate capacitor, and calculating to acquire distance between the target film and the stop-resisting film according to the capacitance value. According to the small distance measuring method, distance measuring is performed by utilizing a capacitance method, and the small distance between the target film and the stop-resisting film can be accurately measured by measuring the capacitance of the parallel plate capacitor between the target film and the stop-resisting film.
Description
Technical field
The present invention relates to atomic nucleus lifetime measurement technical field, be specifically related to a kind of assay method of slight distance.
Background technology
In atomic nucleus lifetime measurement field, for measuring the life-span of picosecond magnitude, to the target film in picosecond atomic nucleus lifetime measurement experimental provision, with the accuracy requirement that resistance stops the film range observation, be micron dimension, this just requires the Plunger device of design is that picosecond atomic nucleus lifetime measurement experimental provision can be realized accurate displacement.
Measurement for distance between two films, require measuring method to stop film to target film and resistance and there is no the impacts such as deformation, mechanics method can't reach this requirement substantially, and can adopt optics and electrical method, such as by measuring diffraction fringe, determining distance, but requirement can also be at measuring distance when bundle is tested, and the design of optical means is just too complicated, and consider that the special-purpose target chamber itself of high vacuum for laying the Plunger device is very little, do not have too many remaining space to load optical device.
Summary of the invention
For the defect existed in prior art, the object of the present invention is to provide a kind of assay method of slight distance, improve the measuring accuracy that target film and resistance stop slight distance between film.
For achieving the above object, the technical solution used in the present invention is as follows:
A kind of assay method of slight distance comprises the following steps:
(1) the target film is loaded on the target membrane support, resistance is stopped to film and be loaded into resistance and stop on membrane support, target film and resistance stop film and form plane-parallel capacitor;
(2) measure the capacitance of described plane-parallel capacitor;
(3) calculate the target film and hinder and stop the distance between film according to described capacitance, theoretical calculation formula is:
Wherein, for the target film and the resistance stop the distance between film, be the vacuum dielectric constant, be the medium relative dielectric constant, be the useful area of described plane-parallel capacitor, described capacitance.
Further, the assay method of a kind of slight distance as above, in step (1), stop target film and resistance before film is loaded into respectively target membrane support and resistance and stops membrane support, respectively target film and resistance stopped to film and flatten, and guarantee that two films are parallel.
Further, the assay method of a kind of slight distance as above, adopt pressed film method that target film and resistance are stopped to the film flattening.
Further, the assay method of a kind of slight distance as above, in step (2), before measuring described capacitance, stop film to target film and resistance and carry out insulation processing.
Further, the assay method of a kind of slight distance as above, in step (2), measure the capacitance of described plane-parallel capacitor by digital electric bridge.
Further, the assay method of a kind of slight distance as above, adopt the accurate LCR digital electric bridge of TH2817A type to measure described capacitance.
Further again, the assay method of a kind of slight distance as above, plane-parallel capacitor and digital electric bridge by thunder not line be connected.
Further, the assay method of a kind of slight distance as above, plane-parallel capacitor is connected by single core envelope with digital electric bridge.
Beneficial effect of the present invention is: slight distance assay method of the present invention, and utilize capacitance method to adjust the distance and measured, stop the electric capacity of the plane-parallel capacitor between film by measuring target film and resistance and can well measure accurate distance between two films.
The accompanying drawing explanation
The process flow diagram that Fig. 1 is a kind of assay method of slight distance in embodiment;
The structural representation that Fig. 2 is picosecond atomic nucleus lifetime measurement device in embodiment;
The schematic diagram that Fig. 3 is pressed film method in embodiment;
The connection diagram that Fig. 4 is plane-parallel capacitor and digital electric bridge in embodiment;
The measurement result schematic diagram that Fig. 5 is electric capacity and distance in embodiment;
Fig. 6 is the electric capacity schematic diagram that concerns with distance reciprocal in embodiment;
Fig. 7 is the electric capacity schematic diagram that concerns with distance reciprocal under slight distance in embodiment;
Fig. 8 is the electric capacity schematic diagram that concerns with distance reciprocal under slight distance in embodiment.
Embodiment
Below in conjunction with Figure of description and embodiment, the present invention is described in further detail.
Fig. 1 shows the process flow diagram of a kind of assay method of slight distance in the specific embodiment of the invention, and the method comprises the following steps:
Step S11: target film and resistance stop between film to form plane-parallel capacitor;
Step S12: the capacitance of measuring plane-parallel capacitor;
The target film is loaded on the target membrane support, by resistance stop film be loaded into the resistance stop on membrane support, target film and resistance stop between film to form plane-parallel capacitor.In atomic nucleus lifetime measurement experiment, the Plunger device is that the target film of picosecond atomic nucleus lifetime measurement device and accuracy requirement that resistance stops range observation between film are micron dimension, is to improve measuring accuracy, and the present invention adopts the distance between capacitance measurement two films.
Fig. 2 shows the structural representation of the Plunger device in present embodiment, mainly comprises that chassis 1, target membrane support 2, the resistance for load bearing component stops membrane support 3 and hexagonal bracing frame 4 etc.During experiment, the target film is installed on target membrane support 2 by hexagonal bracing frame 4, the resistance stop film by hexagonal bracing frame 4 be installed to the resistance stop on membrane support 3, the concrete mode that in present embodiment, the target film is installed to target membrane support 2 is: the target film is loaded between two circular ring plates, as shown in Figure 3, then two circular ring plates are screwed in to the hexagonal bracing frame, then the hexagonal bracing frame is loaded on the target membrane support.Resistance is stopped to film and be installed to that resistance stops mode on membrane support and above-mentioned that the target film is installed to the mode of target membrane support is identical.After completing target film and resistance and stopping the loading of film, by adjusting target membrane support 2, with resistance, stop membrane support 3, make target film and resistance stop good plane-parallel capacitor of self-assembling formation between two metal films of film.
For the measuring accuracy of the capacitance that improves described plane-parallel capacitor, measure the capacitance of plane-parallel capacitor in present embodiment by digital electric bridge, preferably adopt the accurate LCR digital electric bridge of TH2817A type.The TH2817A test lead is the high-end HD of electric current, the high-end HS of voltage, electric current low side LD, voltage low side LS, when plane-parallel capacitor is connected with digital electric bridge, the electric current of digital electric bridge high-end with receive electric capacity one utmost point together with voltage is high-end, the electric current low side is received another utmost point of electric capacity together with the voltage low side.
Although the accurate LCR digital electric bridge of TH2817A type can accurately be measured electric capacity, the precision of capacitance method is also relevant with several factors, is at first the electric capacity itself that target film and resistance stop forming between film, is secondly the connecting line of electric capacity.In order further to improve the accuracy of measuring, be loaded into respectively between the target film and resistance while stopping on membrane support target film and resistance being stopped to film, two films carried out to insulation processing at first respectively, and target film and resistance are stopped to the film flattening, and guarantee that two films are parallel, when two films are flattened, can adopt pressed film method that two films are flattened, certainly, the mode of flattening is not unique, can adopt other mode to be flattened yet.Wherein, the insulation processing of two films comprised the target film and hinder the insulation processing of stopping film itself and the insulation processing of target membrane support and resistance being stopped to membrane support.
When target film and dielectric film itself being done to insulation and process, the connected mode of plane-parallel capacitor and digital electric bridge is: two electric capacity connecting lines are connected on the target film, two other electric capacity line is connected on resistance and stops on film, while being connected with digital electric bridge, two electric capacity lines on the target film are connected with voltage is high-end with the electric current of digital electric bridge is high-end respectively, two electric capacity lines that resistance stops on film are connected with the voltage low side with the electric current low side of digital electric bridge respectively, perhaps two electric capacity lines on the target film are connected with the voltage low side with the electric current low side of digital electric bridge respectively, two electric capacity lines that resistance stops on film are connected with voltage is high-end with the electric current of digital electric bridge is high-end respectively.
It is to carry out in the flattening process of film that target film and resistance are stopped to the insulation processing that film itself carries out, in present embodiment, adopting pressed film method to stop film to target film and resistance is flattened, the target film of take describes as example: when being loaded on the target membrane support by the target film, at first by pressed film method, the target film is flattened, the cardinal principle of pressed film method is to push to flatten film by the boss of hexagonal bracing frame and compressing tablet, as shown in Figure 3, when flattening, the target film is loaded between two circular ring plates, then two circular ring plates are enclosed within on the boss of hexagonal bracing frame, boss is smooth by the top of the target film between two circular ring plates.In this process, the connecting clamp of electric capacity, between circular ring plate, is contacted with the target film, and with plastic sheeting, target film and circular ring plate are insulated.Can adopt uses the same method stops film to resistance and carries out insulation processing.This mode of employing to the insulation processing of film own, its benefit is that the electric capacity measured is the contribution of two films, more accurate, but shortcoming is insulation mode complexity and fragile, in installation process, dielectric film easily breaks.
Target membrane support and resistance are being stopped to membrane support while carrying out insulation processing, the connected mode of plane-parallel capacitor and digital electric bridge is: two electric capacity connecting lines are connected on the target film, two other electric capacity connecting line is connected on the bottom that resistance stops membrane support, while being connected with digital electric bridge, two electric capacity lines on the target film are connected with voltage is high-end with the electric current of digital electric bridge is high-end respectively, two electric capacity lines that resistance stops the membrane support bottom are connected with the voltage low side with the electric current low side of digital electric bridge respectively, perhaps two electric capacity lines on the target film are connected with the voltage low side with the electric current low side of digital electric bridge respectively, two electric capacity lines that resistance stops the membrane support bottom are connected with voltage is high-end with the electric current of digital electric bridge is high-end respectively.
Stop the insulation processing of membrane support for target membrane support and resistance: insulate by plastic sheeting between target membrane support and hexagonal bracing frame, target membrane support and hexagonal bracing frame are fixed by the plastics screw, in resistance, stop by plastic sheeting, insulating between membrane support and chassis, resistance stops membrane support and chassis is fixed by the plastics screw.
In present embodiment plane-parallel capacitor and digital electric bridge can by thunder not line be connected, thunder not line has good shield effectiveness, vacuum adapter aft section also all with thunder not line with digital electric bridge, be connected.Although this connected mode has been introduced the area of target film edge part, has increased useful area, the film that the fine processing film applicator coating loads, can drop to lower level.For the relation between the electric capacity of accurately portraying plane-parallel capacitor and distance, in the process of test plane-parallel capacitor electric capacity, zero point can be by the stray capacitance of support and line deduction by choosing suitable electric capacity, the variation that makes electric capacity is mainly caused by the variation of two film distances.
Due to thunder, line is very not thick, contacts with target chamber and can produce larger deformation to target film and target membrane support, therefore can adopt a kind of softer thinner single core envelope to replace the electric capacity connecting line in target chamber.Single core envelope also requires to have good shielding properties, while adopting single core envelope, the insulation mode of target membrane portions is still target membrane support and the insulation of hexagonal bracing frame, and resistance stops membrane portions and changes into and stop membrane support and junction, chassis loading plastic insulation film in resistance, and fix with the plastics screw, the electric capacity line that resistance stops membrane portions also is fixed on frame bottom, this mode is mainly must use CARBURIZING FURNACE FOR STAINLESS FASTENER connection hexagonal bracing frame and resistance to stop membrane support because the depth of parallelism is regulated, support can produce stray capacitance, but equally can be by choosing to get rid of this part impact the zero point after scale.
Step S13: according to described capacitance, calculate the target film and hinder and stop the distance between film.
Calculate the target film and hinder and stop the distance between film according to the capacitance recorded in step S12, theoretical calculation formula is:
Wherein, for the target film and the resistance stop the distance between film, be the vacuum dielectric constant, be the medium relative dielectric constant, be the useful area of described plane-parallel capacitor, described capacitance.
After measuring the electric capacity of described plane-parallel capacitor, can calculate the target film and hinder and stop the distance between film according to above-mentioned formula.Stop by present embodiment described capacitance measurement target film and resistance the requirement that distance method between film can meet the precision measurement distance, below in conjunction with specific embodiment, method of the present invention is further described.
Embodiment
Target film and resistance are stopped to film is loaded into respectively the target membrane support and resistance stops on membrane support, form plane-parallel capacitor.
The accuracy requirement that target film and resistance stop range observation between film is 0.1 μ m, high-precision like this measurement is relatively high to the resolution requirement of electric capacity, in the present embodiment, adopt the accurate LCR digital electric bridge of the TH2817A type of producing with favour company to measure electric capacity, this digital electric bridge accuracy of measurement reaches 0.05%, and the resolution of electric capacity is 0.00001pF.This enforcement adopts parallel way to measure the electric capacity between two films, because measure to reduce error for high value impedance original paper (being low value capacitance and high value inductance) parallel way.
The TH2817A test lead is the high-end HD of electric current, the high-end HS of voltage, electric current low side LD, voltage low side LS, the high-end utmost point with receiving plane-parallel capacitor together with voltage is high-end of electric current, the electric current low side is received another utmost point of plane-parallel capacitor together with the voltage low side, as shown in Figure 4.This product also provides a simple software, to help the user, completes some simple measurement tasks.Such as, together with controlling software, the Primary Study of finish relation.By controlling the distance between meticulous adjusting two films of software, digital electric bridge is measured the capacitance under each distance, and sample record, just obtains the raw data of a large amount of electric capacity distances, convenient further research.This product also provides multiple interfaces, comprises the RS232C serial ports, convenient and compunication and operated from a distance.Interface command is used international program-controlled standard of instruments order (SCPI), facilitates user program.
Measure the capacitance under two film different distance, and calculate corresponding distance value according to the capacitance of measuring, the result obtained as shown in Figure 5 and Figure 6, the schematic diagram that concerns that Fig. 5 is capacitor C and distance B, the schematic diagram that concerns that Fig. 6 is electric capacity 1/C reciprocal and distance B, in figure, curve A is measured value, and curve B is theoretical value.As can be seen from Figure, when target film and resistance stop distance between film when the small distance (approximately being less than 1mm), theoretical and measured value meets better, and large apart from the time meet undesirable, this illustrates that capacitance method of the present invention is more accurate when small distance, and is not suitable for large distance range.In theory, the plane-parallel capacitor formula is applicable to the situation of significant surface diameter much larger than distance between two plates.For the lifetime measurement of picosecond magnitude, what need to measure is the distance of micron dimension, and this yardstick is much smaller than the diameter dimension of target film, so capacitance method can meet the demands.
Under slight distance, to the further validation test of capacitance method, as shown in Figure 7 and Figure 8, as can be seen from the figure, in the time of several to dozens of micron, electric capacity inverse and distance have reasonable linear relationship to the result obtained.Apart from being determined by the electric capacity collapse point zero point.Under slight distance, capacitance method can meet the requirement of range observation.
Obviously, those skilled in the art can carry out various changes and modification and not break away from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technology thereof, the present invention also is intended to comprise these changes and modification interior.
Claims (8)
1. the assay method of a slight distance comprises the following steps:
(1) the target film is loaded on the target membrane support, resistance is stopped to film and be loaded into resistance and stop on membrane support, target film and resistance stop film and form plane-parallel capacitor;
(2) measure the capacitance of described plane-parallel capacitor;
(3) calculate the target film and hinder and stop the distance between film according to described capacitance, theoretical calculation formula is:
Wherein, for the target film and the resistance stop the distance between film, be the vacuum dielectric constant, be the medium relative dielectric constant, be the useful area of described plane-parallel capacitor, described capacitance.
2. the assay method of a kind of slight distance as claimed in claim 1, is characterized in that, in step (1), target film and resistance stopped before film is loaded into respectively target membrane support and resistance and stops membrane support, respectively target film and resistance stopped to film and flatten, and guarantee that two films are parallel.
3. the assay method of a kind of slight distance as claimed in claim 2, is characterized in that, adopts pressed film method that target film and resistance are stopped to the film flattening.
4. the assay method of a kind of slight distance as claimed in claim 3, is characterized in that, in step (2), before measuring described capacitance, target film and resistance stopped to film and carry out insulation processing.
5. the assay method of a kind of slight distance as claimed in claim 4, is characterized in that, in step (2), measures the capacitance of described plane-parallel capacitor by digital electric bridge.
6. the assay method of a kind of slight distance as claimed in claim 5, is characterized in that, adopts the accurate LCR digital electric bridge of TH2817A type to measure described capacitance.
7. the assay method of a kind of slight distance as claimed in claim 6, is characterized in that, plane-parallel capacitor and digital electric bridge by thunder not line be connected.
8. the assay method of a kind of slight distance as claimed in claim 6, is characterized in that, plane-parallel capacitor is connected by single core envelope with digital electric bridge.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108195407A (en) * | 2017-12-29 | 2018-06-22 | 维沃移动通信有限公司 | The detection method and device of a kind of distance state |
| US10802063B2 (en) | 2018-03-02 | 2020-10-13 | Boe Technology Group Co., Ltd. | Detection device and detection method |
| US10983376B2 (en) | 2017-06-20 | 2021-04-20 | Boe Technology Group Co., Ltd. | Measuring device and a measuring system |
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Application publication date: 20131204 |