CN103403614A - Photo-alignment exposure apparatus and photo-alignment exposure method - Google Patents
Photo-alignment exposure apparatus and photo-alignment exposure method Download PDFInfo
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- CN103403614A CN103403614A CN2010800704457A CN201080070445A CN103403614A CN 103403614 A CN103403614 A CN 103403614A CN 2010800704457 A CN2010800704457 A CN 2010800704457A CN 201080070445 A CN201080070445 A CN 201080070445A CN 103403614 A CN103403614 A CN 103403614A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133753—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle
- G02F1/133757—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers with different alignment orientations or pretilt angles on a same surface, e.g. for grey scale or improved viewing angle with different alignment orientations
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Abstract
The object of the invention is to provide a photo-alignment exposure apparatus and a photo-alignment exposure method, whereby an alignment film having excellent characteristics can be formed. A photo-alignment exposure apparatus (1) of the present invention is characterized in being provided with: a radiation optical system (11), which includes a polarization light radiating means (12) and a polarization control element (14), and which radiates a beam to a substrate (2) having an alignment film on the surface; and a scanning means (15), which moves at least the substrate (2) or a part of the radiation optical system (11), and scans the substrate (2) in the predetermined scanning direction with the beam. The photo-alignment exposure apparatus is also characterized in that the polarization light radiating means (12) outputs linear polarization light to the polarization control element (14), the polarization control element (14) has unit polarization control regions disposed in the direction that orthogonally intersects the scanning direction, and the polarization direction of the beam radiated from the unit polarization control regions periodically changes by the predetermined number of unit polarization control regions, and within the period, the polarization direction is substantially symmetric with respect to the flat surface that is parallel to the scanning direction and is substantially symmetric with respect to the flat surface that orthogonally intersects the substrate.
Description
Technical field
The present invention uses in LCD panel manufacturing field, relates in particular to for giving orientation to alignment films on the substrate that uses at liquid crystal indicator so that the light of the angle and direction that liquid crystal molecule is positioned to wish orientation exposure device and light orientation exposure method.
Background technology
Demand increases along with the utilization expansion of field of liquid crystal display in recent years, and the deficiency that strong request improves liquid crystal indicator in the past is visual angle, contrast, demonstration animation performance etc.Particularly on liquid crystal display substrate, liquid crystal molecule is being given on the alignment films of orientation, make direction of orientation unified, give tilt angle, form the various improvement such as a plurality of zones (multidomain) be pushed in single pixel.
Now, give the advantage of orientation characteristic and technology for this purpose by likewise known to being formed at polymeric layer (alignment films) on liquid crystal display substrate.Have as such method of giving the orientation characteristic method that is called the cloth rubbing manipulation, still, while the method is to make the roller that is wrapped with cloth rotate, substrate is moved, the processing of the polymeric layer on unidirectional strong friction surface.
Yet this cloth rubbing manipulation is noted and produces static, the various deficiencies such as cut, generation dust appear in alignment layer surface.Be known as the problem of avoiding this cloth rubbing manipulation, to alignment films, shine the polarized light of ultraviolet region and give the light rubbing manipulation that is orientated characteristic.
In patent documentation 1,, about using the method for such light rubbing manipulation, disclose and utilized exposed mask, separately form the manufacture method of the liquid crystal display of the different a plurality of orientation area of direction of orientation with substrate.
In patent documentation 2, disclose by shining simultaneously from the 1st polarized light of the 1st regional outgoing of wire grid polarization light microscopic with from the 2nd polarized light of the 2nd regional outgoing, thereby carried out the manufacture method of the electro-optical device of light orientation process.
The prior art document
Patent documentation
Patent documentation 1: Japanese Patent Publication 2007-219191 communique;
Patent documentation 2: Japanese Patent Publication 2010-91906 communique.
Summary of the invention
The problem that invention will solve
In the method for patent documentation 1, need multiexposure, multiple exposure to process, therefore spent the time on treatment process.And, still needing to carry out the contraposition of exposed mask, it is complicated that operation becomes.
In addition, in the method for patent documentation 2, can't make the orientation intensity in the 1st zone and the 2nd zone unified, particularly can't seek to improve viewing angle properties.And, shining plate-shaped member from the polarized light of wire grid polarization light microscopic outgoing via convergent lens, the picture on wire grid polarization light microscopic surface is not in plate-shaped member surface imaging.
For solving the scheme of problem
therefore, light orientation exposure device involved in the present invention is characterized in that possessing: illuminating optical system, comprise polarizing light irradiation unit and polarized light control element, and have the substrate illumination beam of alignment films to surface, and scanning element, at least a portion of described substrate or described illuminating optical system is moved, along set direction of scanning, described substrate is scanned described light beam, described polarizing light irradiation unit penetrates rectilinearly polarized light to described polarized light control element, described polarized light control element has the unit polarized light control area of along the direction with described direction of scanning quadrature, arranging, the cyclical variation by the unit polarized light control area of every both determined number of the polarization direction of the light beam that penetrates from described unit polarized light control area, and within the described cycle about parallel with described direction of scanning and roughly symmetrical with the plane of described substrate quadrature.
And then, in light orientation exposure device involved in the present invention, it is characterized in that, the rectilinearly polarized light of the direction of described polarized light injection unit ejaculation and described direction of scanning almost parallel, described polarized light control element forms with 1/2 wave plate, the cyclical variation by the unit polarized light control area of every both determined number of the fast axle of described unit polarized light control area, and within the described cycle about parallel with described direction of scanning and roughly symmetrical with the plane of described substrate quadrature.
And then, in light orientation exposure device involved in the present invention, it is characterized in that, described illuminating optical system, have with described polarized light control element surface along at least with described direction of scanning roughly the direction of quadrature be imaged onto imaging optical system on described substrate.
And then, in light orientation exposure device involved in the present invention, it is characterized in that described illuminating optical system has the picture on described polarized light control element surface along shrinking with the roughly the same direction in described direction of scanning at least or can coalescence shining contraction optical system on described substrate.
And then, in light involved in the present invention orientation exposure device, it is characterized in that, described contraction optical system has at least 1 cylindrical lens, and the caustic surface that is formed by described cylindrical lens and described substrate are crossing and form at least one caustics.
in addition, light orientation exposure method involved in the present invention, the substrate that will have alignment films to surface by the light beam irradiates of illuminating optical system, described illuminating optical system comprises the polarized light control element, described light orientation exposure method is characterised in that, at least a portion of described substrate or described illuminating optical system is moved, along set direction of scanning, described substrate is scanned described light beam, and, described polarized light control element has the unit polarized light control area of along the direction with described direction of scanning quadrature, arranging, the cyclical variation by the unit polarized light control area of every both determined number of the polarization direction of the light beam that shines from described unit polarized light control area, and within the described cycle about parallel with described direction of scanning and roughly symmetrical with the plane of described substrate quadrature.
The effect of invention
In the present invention,, by making polarization direction from the light beam of unit polarized light control area irradiation by often both determined number is roughly symmetrical about direction of scanning, can form to make and be orientated the consistent alignment films of intensity.And then by state of orientation, have symmetry, can realize the liquid crystal indicator of viewing angle properties excellence.
And then, in the present invention, by utilize 1/2 wave plate, the simplification that can seek to form on the polarized light control element.
And then, in the present invention, by at illuminating optical system, being provided with imaging optical system, can with polarized light control element surface along with direction of scanning roughly the direction of quadrature be imaged onto the surface of substrate, can suppress the impacts such as the polarized light control element occurs between the unit polarized light control area of adjacency diffracted wave, scattering wave, form good orientation characteristic.
And then, in the present invention, by be provided with the contraction optical system at illuminating optical system, light that can be by the polarized light control element is along the surface of shrinking or can coalescence shine described substrate with the roughly the same direction in direction of scanning, can be suppressed at the impact that there is the situation of the defects such as cut in polarized light control element surface, form good orientation characteristic.
Description of drawings
Fig. 1 is the figure that the formation of the related light orientation exposure device of embodiments of the present invention is shown;
Fig. 2 is the figure that the polarization direction of the related polarized light control element of embodiments of the present invention is shown;
Fig. 3 is the figure that the relation of the related polarization direction of embodiments of the present invention and pixel is shown;
Fig. 4 is the figure that the relation of the related polarization direction of other embodiments of the present invention and pixel is shown;
Fig. 5 is the figure that the relation of the related polarization direction of other embodiments of the present invention and pixel is shown;
Fig. 6 is the figure that describes about the problem that produces in the polarized light control element;
Fig. 7 is the figure that is illustrated in the illuminating optical system that uses in other embodiments of the present invention;
Fig. 8 is the figure that is illustrated in the illuminating optical system that uses in other embodiments of the present invention;
Fig. 9 is the figure that is illustrated in the illuminating optical system that uses in other embodiments of the present invention;
Figure 10 is the figure that is illustrated in the illuminating optical system that uses in other embodiments of the present invention.
Embodiment
Fig. 1 is the figure that the formation of the related light orientation exposure device of embodiments of the present invention is shown.The light orientation exposure device of present embodiment has illuminating optical system 11, scanning element 15 as the main composition important document.Illuminating optical system 11 is by to being formed at the alignment films irradiation ultraviolet radiation light beam on substrate 2 surfaces, to the alignment films that is equipped on substrate 2, gives the unit of orientation characteristic, in the present embodiment, polarizing light irradiation unit 12, polarized light control element 14, consists of.
Scanning element 15 be substrate 2 by making surface disposed thereon along set direction of scanning (along Y direction in figure) mobile, the light beam by illuminating optical system 11 irradiations is scanned on substrate 2 unit.As scan method, so making beyond substrate 2 moves, illuminating optical system 11 is moved, substrate 2 and illuminating optical system 11 both sides are moved., to the irradiation light C of substrate 2 direct irradiations from polarized light control element 14, still, also can be provided with the mask that irradiation area is restricted to slit-shaped between polarized light control element 14 and substrate 2 in the present embodiment.By being provided with mask, can only expose and effectively shine light at substrate 2, can seek to improve orientation characteristic.
Be provided with the substrate 2 that becomes exposure object on scanning element 15.Vertical or horizontal when in the present embodiment, the direction of scanning of substrate 2 is arranged to utilize as liquid crystal indicator.On the surface of the substrate 2 that becomes exposure object, the photosensitive polymers such as polyimide are formed membranaceous.Make the polymeric membrane modification to irradiation rectilinearly polarized light on this polymeric membrane, if at not shown subsequent handling coated with liquid crystal molecule on polymeric membrane, liquid crystal molecule is subjected to polymeric membrane effect and location (orientation) to become specific direction.The polymeric membrane that originally will have this orientation characteristic is called alignment films, and still, the polymeric membrane that generally also will give before the orientation characteristic is called alignment films, will also comprise the polymeric membrane given before the orientation characteristic in the interior alignment films that is called in instructions.
Polarizing light irradiation unit 12 consists of light source 12a, catoptron 12b, polariscope 12c.Be organized into directional light from the ultraviolet ray of the light source 12a such as UV-lamp irradiation with catoptron 12b such as paraboloidal mirror etc., as light source light A, to polariscope 12c side, shine.Polariscope 12c takes out the unit of the rectilinearly polarized light component of set direction from light source light A.In the present embodiment, utilize this polariscope 12c from the rectilinearly polarized light B of light source light A taking-up with Y direction (direction of scanning) almost parallel.In addition, also can utilize the rectilinearly polarized light substantially vertical with Y direction (direction of scanning).
Polarized light control element 14 is to make the polarization direction of the rectilinearly polarized light of incident rotate the element of set angle, consists of 1/2 wave plate in the present embodiment.Fig. 2 illustrates the figure that controls the situation of polarization direction in this polarized light control element 14.Fig. 2 (a) is the figure that the polarization direction of the incident light that incides polarized light control element 14 is shown, and B is suitable with it at Fig. 1 cathetus polarized light.Fig. 2 (b) is the figure that the partial enlarged drawing of polarized light control element 14 is shown.Fig. 2 (c) is the figure that illustrates from the output polarisation of light direction of polarized light control element 14 ejaculations, and irradiation light C is suitable with it in Fig. 1.Fig. 2 (a)～(c) in fact overlaps in Z-direction, still, staggers in order to illustrate to show as in Y direction herein.
As shown in Fig. 2 (b), polarized light control element 14 X-direction, namely with the direction of direction of scanning quadrature, form and have unit polarized light control area 14a, 14b, this unit polarized light control area 14a, 14b have set width.The width of the X-direction of unit polarized light control area 14a, 14b is a few μ m～tens μ m left and right, and the direction of the fast axle in zone of each adjacency is different.Particularly in the present embodiment, the unit's of forming polarized light control area 14a, 14b have repeat patterns take both determined number (in the case as 2) as the cycle.In the example shown in Fig. 2 (b), by 2 unit polarized light control area 14a, 14b, form one-period A1, A2.
And then, these unit polarized light control area 14a, 14b in each cycle A1, A2 form its fast axle about Y direction, to be that direction of scanning becomes roughly symmetrical.In addition, here said symmetry, say exactly refer to as both determined number (being in the case 2) unit polarized light control area 14a, 14b like that the direction (X-direction) of edge and direction of scanning quadrature be split up into a plurality ofly, and the quick shaft direction of polarization direction or wave plate is about parallel with direction of scanning and with the plane of not shown substrate 2 quadratures, become roughly symmetry herein.Observation cycle A1, in unit polarized light control area 14a, fast axle is with respect to Y-axis tilt angle theta in the counterclockwise direction, and is relative with it, and in unit polarized light control area 14b, fast axle is with respect to Y-axis tilt angle theta along clockwise direction.
If the polarized light control element 14 that rectilinearly polarized light incident so forms, plane of polarization rotates to become symmetrical mode about fast axle.That is, as shown in Fig. 2 (c), from the irradiation polarisation of light face of unit polarized light control area 14a output with respect to the Y-axis anglec of rotation 2 θ in the counterclockwise direction.On the other hand, the irradiation light that penetrates from unit polarized light control area 14b is rotated in a clockwise direction angle 2 θ with respect to Y-axis.The irradiation light that so by polarized light control element 14, is shone, the irradiation light C that namely shines substrate 2, by often both the unit polarized light control area 14a of determined number, its polarization direction of 14b became roughly symmetrical with respect to Y direction.Particularly, can will shine the polarisation of light direction and be made as 2 θ=45 ° by setting θ=22.5 °, make the plane of polarization mutually orthogonal (90 °) between unit polarized light control area 14a, the 14b of adjacency.
Irradiation light C give the orientation characteristic to the alignment films of substrate 2, and so the polarization direction between unit polarized light control area 14a, the 14b of adjacency becomes symmetry about direction of scanning, therefore, can make the orientation intensity of alignment films of substrate 2 consistent.Usually, Y direction become liquid crystal indicator vertically or laterally, therefore, can make polarization direction with respect to liquid crystal indicator vertically or laterally roughly symmetrical, can form the orientation characteristic of viewing angle characteristic excellence.In addition, the polarization direction of the incident light shown in Fig. 2 (a), not only be made as parallelly with direction of scanning as in the present embodiment, even be made as vertically also, irradiation polarisation of light direction can be made as symmetry.
Fig. 3 is the figure that one example of the position relationship of substrate 2 and pixel while packing liquid crystal indicator into is shown.In the present embodiment, each cycle A is configured to corresponding with 1 pixel 21.The polarization direction of the irradiation light C that orientation uses is shown in the drawings, and pixel 21a, 21b, 21c are corresponding with the orientation area of cycle A1, A2, A3 respectively.Each orientation area, as illustrated with Fig. 2, by both unit polarized light control area 14a, the 14b of determined number (2) formed.
Preferably make in this embodiment the direction of orientation in each cycle mutually orthogonal.In the situation that in the polarization direction of irradiation light C and liquid crystal indicator, the direction of orientation during actual the use is consistent, as with illustrated θ=22.5 that are made as of Fig. 2, getting final product, in polarization direction and the inconsistent situation of direction of orientation, adjust the fast axle of polarized light control element 14, so that the direction of orientation quadrature.The parameter of using in adjustment only has angle θ, therefore can adjust simply.
Above, in the present embodiment, the unit polarized light control area of pressing every both determined number from the irradiation polarisation of light direction of polarized light control element 14 is roughly symmetrical about direction of scanning, therefore can form the alignment films of good orientation characteristic.
In embodiment shown in Figure 3, make cycle A with 2 orientation area corresponding with 1 pixel 21 and configure, still, orientation area can be made as suitable zone according to performance or the use of liquid crystal indicator.Fig. 4, Fig. 5 are the figure that the position relationship of other embodiments related substrate 2 and pixel is shown.
Fig. 4 makes cycle A with 4 orientation area and the embodiment of configuration corresponding with 1 pixel 21.Even the polarization direction of each cycle A is also to become symmetry with respect to direction of scanning in this embodiment.For example, by setting polarization direction so that in each cycle A the direction of orientation of substrate 2 with respect to Y-axis become ± 30 °, ± relation of 60 °, thereby can form the alignment films of viewing angle properties excellence.
Fig. 5 makes 1 orientation area corresponding with each pixel, by 2 pixel 21a, 21b of adjacency, forms 1 cycle A.So, also passable even the relation of pixel 21 and cycle A is not man-to-man relation.In such embodiment, the polarization direction quadrature of the orientation area by making adjacency, can use at the liquid crystal indicator that is used for stereoscopic vision.With the pixel 21a in figure, 21c as left eye with pixel, pixel 21b, 21d are used with pixel as right eye, use the polarising glass with polarizing filter corresponding with each pixel 21, can observe stereopsis.
Next, use Fig. 6～Fig. 9 to describe about other embodiments of the present invention.In the embodiment with Fig. 1 explanation, from the irradiation light C direct irradiation substrate 2 of polarized light control element 14.Under present situation, manufacturing can the large-sized polarized light control element 14 corresponding with large-scale liquid crystal indicator be difficult, therefore, as shown in Figure 6, becomes the polarized light control element unit 14A～14C that connects a plurality of width 30cm left and right and the formation that forms.The connecting portion of the polarized light control element unit 14A～14C of adjacency is discontinuous border, so, diffracted wave, scattering wave etc. occur at connecting portion,, due to the wave interference with transmission-polarizing light control element unit 14A～14C, produce fuzzy, interference fringe etc. on substrate 2.Even this phenomenon also can produce between the unit polarized light control area of adjacency.In the present embodiment,, in order to tackle such problem, at illuminating optical system 11, be provided with imaging optical system.
Fig. 7 is the figure of the part of the illuminating optical system in schematically illustrated present embodiment.Imaging optical system in present embodiment, consist of the 1st lens 16a and the 2nd lens 16b that are configured between polarized light control element 14 and substrate 2.The 1st lens 16a is the lens with focal distance f 1, from the surface of polarized light control element 14 to as side partition distance f1, configuring.On the other hand, the 2nd lens 16b is the lens with focal distance f 1, from substrate 2 to thing side partition distance f1, configures.Distance between the 1st lens 16a and the 2nd lens 16b is set as 2 * f1.
Utilize such formation, by the directional light of polarized light control element 14, through the 1st lens 16a, temporarily assemble, through the 2nd lens 16b, be re-used as directional light irradiated substrate 2, the picture that makes polarized light control element 14 on substrate 2 with equimultiple imaging.
Like this imaging optical system of present embodiment, at least X-direction, namely with the direction (Y direction: direction of scanning) the roughly direction imaging of quadrature of the connecting portion of polarized light control element unit 14A～14C.Thereby, can be suppressed between the polarized light control element unit 14A～14C of adjacency the impact of the diffracted wave that perhaps produces, scattering wave etc. between the unit polarized light control area of adjacency.In addition, in Fig. 7, indicate the arrow of the quick shaft direction that wave plate is shown at the end face of polarized light control element 14, indicate the arrow of the polarization direction that regional is shown at the end face of substrate 2.Originally, these arrows should be documented on X-Y plane, but here in order to illustrate that record on paper.
In the present embodiment, all be chosen to be f1 by the focal length with the 1st lens 16a, the 2nd lens 16b, and the distance between polarized light control element 14, the 1st lens 16a, the 2nd lens 16b and substrate 2 is made as f1:2f1:f1, thereby make polarized light control element 14 surfaces on substrate 2 with equimultiple imaging, but, also the picture of polarized light control element 14 can be amplified or shrinks and project on substrate 2.For example, just can realize by following setting, the focal length that is about to the 2nd lens 16b is chosen to be f5(f5=α * f1, α: magnification or shrinkage factor), the distance between polarized light control element 14, the 1st lens 16a, the 2nd lens 16b and substrate 2 is made as f1:(f1+f5): f5.If need not in addition the light of irradiated substrate 2 is made as directional light, the distance between the 1st lens 16a and the 2nd lens 16b can Set arbitrarily.
Fig. 8 is the figure that schematically shows the part of the illuminating optical system in other embodiments, in the present embodiment, makes illuminating optical system 11 have simultaneously the function of imaging optical system and contraction optical system.Particularly, as shown in Fig. 8 (a) and (b), similarly dispose the 1st lens 16a and the 2nd lens 16b with Fig. 7, and then, between polarized light control element 14 and the 1st lens 16a, dispose the recessed cylindrical lens 17 that does not have magnification and have negative magnification in the X-Z face in the Y-Z face." cylindrical lens " in this recessed cylindrical lens 17(the present invention) be the lens with focal length-f2, from polarized light control element 14 partition distance f2, configure.
As shown in Fig. 8 (a), the surface of polarized light control element 14 in the X-Z face as with the explanation of the embodiment of Fig. 7 in the surperficial imaging of substrate 2.On the other hand, as shown in Figure 8 (b) shows in the Y-Z face directional light by polarized light control element 14 dispersed by recessed cylindrical lens 17.The 1st lens 16a is converted to directional light with this diverging light and to the 2nd lens 16b side, penetrates.The 2nd lens 16b shrinks this directional light and shines on substrate 2.In the present embodiment, by the rear side focal position placement substrate 2 at the 2nd lens 16b, directional light is assembled.
So in the present embodiment, with the following feature that constitutes, namely be provided with along with the direction of direction of scanning almost parallel, irradiation light from polarized light control element 14 is shunk or converges to contraction optical system on substrate 2.In such formation,, even such as in the situation that there are the defects such as cut in polarized light control element 14 grades, by being provided with contractile function, also can suppress impact on plane of exposure.
In addition, in the present embodiment, be made as the formation that is provided with recessed cylindrical lens 17 in the thing side of the 1st lens 16a, still, its allocation position also can be the picture side.In addition, in the situation that with as the side focus, the comparing and be configured in more close substrate 2 sides of the 1st lens 16a, realize using projection face lens in the situation of contractile function.
Fig. 9 is the figure that schematically shows the part of the illuminating optical system in other embodiments, and is same with the embodiment of Fig. 8, makes illuminating optical system 11 have simultaneously the function of imaging optical system and contraction optical system.The 1st lens 16a and the 2nd lens 16b and aforementioned embodiments are similarly as imaging optical system performance function.Projection face lens 17 do not have magnification and have positive amplification ratio (focal distance f 3) in the Y-Z faces in the X-Z face, and are configured in the picture side of the 2nd lens 16b.Projection face lens 18 do not have magnification and have positive amplification ratio (side focal distance f 4) in the Y-Z faces in the X-Z face, and are configured between projection face lens 17 and substrate 2.Be configured to: the focal distance f 4 that the distance of projection face lens 18 and projection face lens 17 becomes projection face lens 18 and the focal distance f 3 of projection face lens 17 and, namely form confocal system.
Directional light from the 2nd lens 16b penetrates, again form directional light by the projection face lens 17,18 that form this confocal system and shine on substrate 2.Be set as focal distance f 4 greater than projection face lens by the focal distance f 3 with projection face lens 17, can have simultaneously the function of shrinking optical system and parallel optical system.So, by with directional light, exposing, can seek further to improve the orientation characteristic.In addition, even the combination that these projection face lens 17 and projection face lens 18 are projection face lens and recessed cylindrical lens also can realize same function.
Figure 10 is the figure that schematically shows the part of the illuminating optical system in other embodiments.In order to simplify, use the conduct that the most simply forms to shrink the projection face lens 17 of optical system, be configured to its focus 31 and compare with substrate 2 more by a distant place.Projection face lens 17 do not have magnification and have positive amplification ratio in the Y-Z faces in the X-Z face, and are disposed at the picture side of the 2nd lens 16b.Therefore as shown in Figure 10 (a) shows, at X-Z face inner cylinder lens 17, do not have lensing, with border imaging on substrate 2 of the same unit of above-mentioned embodiment polarized light zone 14a, 14b.
On the other hand, in the Y-Z face shown in Figure 10 (b), by near the light 32a optical axis, in the focus 31 of substrate 2 front ends, assemble.If desirable lens, the light 32b that from optical axis, departs from a little also can assemble in focus 31, but there is aberration in actual lens, and therefore its focal length of light from optical axis deviation is shorter in common convex lens, compare with focus 31 in the position of more close cylindrical lens 17 and assemble.And then from the light 32c of optical axis deviation, compare with light 32b in the convergence of the position of more close cylindrical lens 17.
Like this, form enveloping surface 33a, 33b(caustic surface by light 32a, 32b, 32c, 32d in the Y-direction both sides of optical axis).In fact this enveloping surface and light 32a, 32b, 32c, 32d join, but be depicted as in the illustrated case a little, separate.If observe the position of each light on substrate 2, with light 32a, compare light 32b, 32c and be positioned at more in the outer part, light 32d compares the position that is positioned near optical axis with light 32b, 32c.That is, press the light of the order of light 32a, 32b, 32c, 32d from optical axis deviation during incident, turning back as boundary take near light 32b, 32c on substrate 2.Thereby, concentrate because turning back at the enveloping surface glazed thread, so intensity is high.
The intersection of this enveloping surface and substrate 2 is in the situation that spherical lens is circular, is the straight line of pair of parallel during cylindrical lens as in the present embodiment.In this manual, the intersection of this enveloping surface (caustic surface) and substrate is defined as " caustics ".The beam intensity of the Y-direction on substrate 2 is: so the centre of caustics is very bright on caustics because convergence is bright, and the external side light beam intensity of caustics is zero.That is, if utilize caustics can access light beam on the very steep straight line in border.Consequently can effectively give the orientation characteristic to alignment films.
In the present embodiment, be made as and form 2 caustics 34a, 34b by projection face lens 17 on base material 2, still, other optical systems that illustrate before this, therefore have too and can utilize the light beam that comprises caustics, can obtain in addition the advantage of the steeper linear beam in border etc.
In addition, the present invention is not limited to these embodiments, the formation of each embodiment of appropriate combination and the embodiment that forms also becomes category of the present invention.
Claims (6)
1. a light is orientated exposure device, it is characterized in that possessing:
Illuminating optical system, comprise polarizing light irradiation unit and polarized light control element, has the substrate illumination beam of alignment films to surface; And
Scanning element, move at least a portion of described substrate or described illuminating optical system, along set direction of scanning, described substrate scanned described light beam,
Described polarizing light irradiation unit penetrates rectilinearly polarized light to described polarized light control element,
Described polarized light control element has the unit polarized light control area of along the direction with described direction of scanning quadrature, arranging,
The cyclical variation by the unit polarized light control area of every both determined number of the polarization direction of the light beam that penetrates from described unit polarized light control area, and within the described cycle about parallel with described direction of scanning and roughly symmetrical with the plane of described substrate quadrature.
2. light orientation exposure device as claimed in claim 1, is characterized in that,
Described polarized light injection unit penetrates and described direction of scanning almost parallel or the rectilinearly polarized light of the direction of quadrature roughly,
Described unit polarized light control area forms with 1/2 wave plate,
The cyclical variation by the unit polarized light control area of every both determined number of the fast axle of described unit polarized light control area, and within the described cycle about parallel with described direction of scanning and roughly symmetrical with the plane of described substrate quadrature.
3., as claim 1 or light claimed in claim 2 orientation exposure device, it is characterized in that,
Described illuminating optical system, have with described polarized light control element surface along at least with described direction of scanning roughly the direction of quadrature be imaged onto imaging optical system on described substrate.
As claim 1 to the described light orientation of any one in claim 3 exposure device, it is characterized in that,
Described illuminating optical system, have the light beam by described polarized light control element along shrinking with the roughly the same direction in described direction of scanning at least or can coalescence shining contraction optical system on described substrate.
5. light orientation exposure device as claimed in claim 4, is characterized in that,
Described contraction optical system has at least 1 cylindrical lens,
The caustic surface that is formed by described cylindrical lens and described substrate intersect and form at least one caustics.
6. a light is orientated exposure method, the substrate that will have alignment films to surface by the light beam irradiates of illuminating optical system, and described illuminating optical system comprises the polarized light control element, and described light is orientated exposure method and is characterised in that,
Described substrate or described illuminating optical system are moved, along set direction of scanning, described substrate is scanned described light beam, and,
Described polarized light control element has the unit polarized light control area of along the direction with described direction of scanning quadrature, arranging,
The polarization direction of the light beam that penetrates from described unit polarized light control area, about the border by both unit polarized light control area institute adjacency of determined number and roughly symmetrical with the plane of described substrate quadrature.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2010/005915 WO2012042577A1 (en) | 2010-10-01 | 2010-10-01 | Photo-alignment exposure apparatus and photo-alignment exposure method |
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| CN103403614A true CN103403614A (en) | 2013-11-20 |
| CN103403614B CN103403614B (en) | 2016-06-29 |
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| Country | Link |
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| JP (1) | JP5564695B2 (en) |
| KR (1) | KR101462272B1 (en) |
| CN (1) | CN103403614B (en) |
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| CN104267542A (en) * | 2014-09-26 | 2015-01-07 | 京东方科技集团股份有限公司 | Optical alignment device, control device and optical alignment method |
| CN113031349A (en) * | 2021-03-22 | 2021-06-25 | 惠科股份有限公司 | Photo-alignment device and photo-alignment method |
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| CN103765303B (en) * | 2012-04-19 | 2016-06-29 | 信越工程株式会社 | Light directional illumination device |
| KR101462274B1 (en) * | 2012-04-19 | 2014-11-17 | 가부시키가이샤 에프케이 코우카쿠 겐큐쇼 | Light illuminating apparatus for photo-alignment |
| JP5953512B2 (en) * | 2012-07-05 | 2016-07-20 | 株式会社ブイ・テクノロジー | Photo-alignment exposure apparatus and photo-alignment exposure method |
| KR102387205B1 (en) * | 2015-07-31 | 2022-04-15 | 엘지디스플레이 주식회사 | Photo Alignment Apparatus And Photo Alignment Method Using The Same |
| JP7415545B2 (en) * | 2019-12-24 | 2024-01-17 | ウシオ電機株式会社 | Polarized light irradiation device and polarized light irradiation method |
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Also Published As
| Publication number | Publication date |
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| KR101462272B1 (en) | 2014-11-17 |
| JPWO2012042577A1 (en) | 2014-02-03 |
| KR20130069773A (en) | 2013-06-26 |
| CN103403614B (en) | 2016-06-29 |
| WO2012042577A1 (en) | 2012-04-05 |
| JP5564695B2 (en) | 2014-07-30 |
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