CN103391260B - 降低无线干扰的方法和无线终端 - Google Patents
降低无线干扰的方法和无线终端 Download PDFInfo
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CN103391260B true CN103391260B (zh) | 2018-03-13 |
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EP2919542B1 (en) * | 2014-03-11 | 2019-05-08 | BlackBerry Limited | Dynamically managing band capability |
CN105450439A (zh) * | 2014-09-25 | 2016-03-30 | 联想(北京)有限公司 | 一种控制方法、控制器及电子设备 |
CN106412945A (zh) * | 2015-07-30 | 2017-02-15 | 西安中兴新软件有限责任公司 | 一种优化终端信号的方法及装置 |
WO2018102999A1 (zh) * | 2016-12-07 | 2018-06-14 | 深圳前海达闼云端智能科技有限公司 | 调制解调器控制方法、装置、电子设备和计算机程序产品 |
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CN102378195A (zh) * | 2010-08-23 | 2012-03-14 | ***通信集团公司 | 一种终端共存干扰的抑制方法和设备 |
CN102547731A (zh) * | 2010-12-21 | 2012-07-04 | 中兴通讯股份有限公司 | 避免共存干扰的方法及*** |
CN103002450A (zh) * | 2011-09-13 | 2013-03-27 | 中兴通讯股份有限公司 | 一种频段间载波聚合自干扰的处理方法和装置 |
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US20140248877A1 (en) * | 2011-09-25 | 2014-09-04 | Lg Electronics Nc. | Method and apparatus for avoiding interference due to in-device coexistence |
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CN102378195A (zh) * | 2010-08-23 | 2012-03-14 | ***通信集团公司 | 一种终端共存干扰的抑制方法和设备 |
CN102547731A (zh) * | 2010-12-21 | 2012-07-04 | 中兴通讯股份有限公司 | 避免共存干扰的方法及*** |
CN103002450A (zh) * | 2011-09-13 | 2013-03-27 | 中兴通讯股份有限公司 | 一种频段间载波聚合自干扰的处理方法和装置 |
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Effective date of registration: 20171027 Address after: Metro Songshan Lake high tech Industrial Development Zone, Guangdong Province, Dongguan City Road 523808 No. 2 South Factory (1) project B2 -5 production workshop Applicant after: Huawei terminal (Dongguan) Co.,Ltd. Address before: 518129 Longgang District, Guangdong, Bantian HUAWEI base B District, building 2, building No. Applicant before: HUAWEI DEVICE Co.,Ltd. |
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Address after: 523808 Southern Factory Building (Phase I) Project B2 Production Plant-5, New Town Avenue, Songshan Lake High-tech Industrial Development Zone, Dongguan City, Guangdong Province Patentee after: HUAWEI DEVICE Co.,Ltd. Address before: 523808 Southern Factory Building (Phase I) Project B2 Production Plant-5, New Town Avenue, Songshan Lake High-tech Industrial Development Zone, Dongguan City, Guangdong Province Patentee before: Huawei terminal (Dongguan) Co.,Ltd. |
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Effective date of registration: 20210425 Address after: Unit 3401, unit a, building 6, Shenye Zhongcheng, No. 8089, Hongli West Road, Donghai community, Xiangmihu street, Futian District, Shenzhen, Guangdong 518040 Patentee after: Honor Device Co.,Ltd. Address before: Metro Songshan Lake high tech Industrial Development Zone, Guangdong Province, Dongguan City Road 523808 No. 2 South Factory (1) project B2 -5 production workshop Patentee before: HUAWEI DEVICE Co.,Ltd. |