CN103294307A - Improved method for manufacturing OGS (one glass solution) touch screen - Google Patents
Improved method for manufacturing OGS (one glass solution) touch screen Download PDFInfo
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Abstract
The invention discloses an improved method for manufacturing an OGS (one glass solution) touch screen. The improved method includes directly manufacturing a transparent electrode layer on a glass cover plate, patterning the transparent electrode layer and connecting a flexible printed circuit FPC onto pins of the electrode layer by a hot-pressing process; setting black shading layers on a second polarizer of an LCD (liquid crystal display) screen and finally forming an LCD screen with a multi-point touch function. The improved method has the advantages that the technical problem that shading layers made of printing ink are not high-temperature-resistant when an existing OGS product is manufactured can be solved, the performance and the reliability of the OGS touch screen are improved, the manufacturing yield is increased, the manufacturing efficiency is improved, and bottlenecks in aspects of manufacture and manufacture procedures of the existing OGS touch screen are broken through.
Description
Technical field
The present invention relates to the touch-screen field, refer more particularly to a kind of improved OGS touch-screen method for making.
Background technology
Touch-screen is as a kind of intelligentized human-computer interaction interface product, the a lot of fields in social production and life have obtained application more and more widely, and are especially with the fastest developing speed in consumer electronics sector (as fields such as smart mobile phone, panel computers).
Capacitive touch screen is touch-screen product of new generation after resistive touch screen, and its product than previous generation on performance has had qualitative leap, not only shows to be quick on the draw, and support multi-point touch, and the life-span is long.And the OGS product of a new generation is the new developing direction of capacitive touch screen, and from technological layer, the OGS technology is simple in structure than the G/G touch technology of present main flow, and is light, thin, light transmission is good; Owing to save a slice glass baseplate and bonding process, be beneficial to and reduce production costs, improve the product yield.
At present, common OGS touch-screen module method for making as shown in Figure 1, at first on glass cover-plate 11 painting black photosensitive material (BM) 12 as light shield layer, cover organic leveling layer (OC) 16 afterwards more in the above, so that follow-up making ito transparent electrode, make graphical ito transparent electrode layer 13 then, flexible circuit board FPC 14(is had touch-control IC 15) be connected to by hot pressing and form OGS touch-screen module 1 on the pin of ITO pattern electrode layer 13, at last OGS touch-screen module 1 and LCD 2 are fitted, form the display with multi-point touch function.
The disadvantage of this OGS module method for making is:
(1) because the self reason of material, the BM film must thicker (thickness is 2 μ m generally speaking) just can reach the blackness requirement of shading region, and thicker BM film will produce harsh requirement to subsequent technique, increase the difficulty of subsequent technique enforcement;
(2) the BM material can not be high temperature resistant, because technological process subsequently need be at its surface coverage OC layer, carbonization phenomenon namely can take place greater than 250 ℃ in temperature, and this will cause very big difficulty to follow-up ITO plated film, form free electrode simultaneously, can disturb the capacitance signal of normal touch.
Summary of the invention
Purpose of the present invention is exactly the problem at above-mentioned BM non-refractory, proposes a kind of improved OGS touch-screen method for making.
The technical solution used in the present invention is:
A kind of improved OGS touch-screen method for making is characterized in that, may further comprise the steps:
(1) makes the ito transparent electrode layer in glass cover plate surfaces
Utilize the method for vacuum magnetic-control sputtering to make the ITO nesa coating as the sensor electrode layer at glass cover-plate, concrete technological parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
(2) the ito transparent electrode layer is carried out graphical treatment
The ITO nesa coating is finished the graphical of ito transparent electrode layer through operations such as cleaning, gluing, exposure, development, post bake, stripings, concrete technology and parameter:
The coating photoresist covers etched ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;
To photoresist developing and sclerosis, adopt NaOH solution, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;
Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last;
(3) flexible circuit board FPC is connected to the wire pin of walking of ito transparent electrode layer
By heat pressing process, at first anisotropic conducting film (ACF) is pressed on the pin of ito transparent electrode layer, the FPC that will have touch-control IC then presses on the ACF, finishes FPC and is connected with the electricity of ito transparent electrode layer pin, concrete technological parameter:
The connection of ACF: 90 ℃ of hot pressing temperatures, hot pressing time 3s, hot pressing pressure 0.154MPa;
The connection of FPC: 290 ℃ of hot pressing temperatures, hot pressing time 10s, hot pressing pressure 0.21MPa;
(4) making of black light shield layer
Method on the polaroid surface by the serigraphy black ink forms the polaroid that has the black light shield layer,
Concrete technological parameter:
The distance of half tone and polaroid: net distance: 3.0-4.0mm, glue scrape height 20-30mm, and glue is scraped angle: 60-85 degree, glue are scraped pressure 3.0-4.0Mpa;
The baking sintering: the glass that silk-screen is good is put into baking box; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 ℃, and the temperature difference is not more than 5 ℃;
(5) attaching process
The polaroid of making that has the black light shield layer is attached to the upper surface of LCD screen by the optical clear sticker, the cover-plate glass that will have sensor then attaches to the upper surface of LCD screen by optical glue, the black light shield layer is over against the sensor electrode layer, by the final LCD screen with multi-point touch function that forms of above-mentioned applying.
Described improved OGS touch-screen method for making is characterized in that, described FPC surface-coated black protective seam is consistent with the light shield layer color.
Described improved OGS touch-screen method for making is characterized in that, described glass cover-plate adopts protection tempered glass.
Described improved OGS touch-screen method for making is characterized in that described optical lens gelatin can adopt the OCA optical cement.
Described improved OGS touch-screen method for making is characterized in that described optical glue can adopt glue.
Advantage of the present invention is:
With respect to existing technology, OGS touch-screen method for making provided by the invention, black light shield layer on the cover-plate glass is transferred on second polaroid of LCD, on the one hand, the black light shield layer is produced on the polaroid by the method for ink for screen printing, do not need too high temperature (about tens degree), therefore can not cause the high temperature cabonization problem and cause product bad; On the other hand, owing to be that the performance of sensor and stability access good assurance at direct making ITO pattern electrode layer on glass.
Description of drawings
Fig. 1 is the structural representation of existing OGS touch-screen.
Fig. 2 is the structural representation of LCD panel plate.
Fig. 3 is the structural representation of the OGS touch-screen after improving.
Fig. 4 is the structural representation after OGS touch-screen and the applying of LCD screen after improving.
Embodiment
For technical matters, the technical scheme that the present invention is solved makes those of ordinary skill in the art clearer, below in conjunction with description of drawings, the present invention is described in further detail.Should be appreciated that specific embodiment described herein only in order to explaining the present invention, and be not used in restriction the present invention.
At first introduce the panel construction of LCD screen 2, as shown in Figure 2, comprise first substrate 21, second substrate 22, liquid crystal layer 23, first polaroid 24 and second polaroid 25, wherein, liquid crystal layer 23 is formed between first substrate 21 and second substrate 22, first polaroid 24 invests the outside surface of first substrate 21, and second polaroid 25 invests the outside surface of second substrate 22.
As shown in Figure 3, a kind of improved OGS touch-screen method for making, the concrete grammar step:
1, at glass cover-plate 31(protection tempered glass) surface making ito transparent electrode layer 32
Utilize the method for vacuum magnetic-control sputtering to make the ITO nesa coating as the sensor electrode layer at glass cover-plate 31, concrete technological parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
2, ito transparent electrode layer 32 is carried out graphical treatment
The ITO nesa coating is finished the graphical of ito transparent electrode layer through operations such as cleaning, gluing, exposure, development, post bake, stripings, concrete technological parameter:
The coating photoresist covers etched ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;
To photoresist developing and sclerosis, adopt NaOH, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;
Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last;
3, flexible circuit board FPC 33 is connected to the wire pin of walking of ito transparent electrode layer 32
Pass through heat pressing process, at first anisotropic conducting film (ACF) is pressed on the pin of ito transparent electrode layer 32, the FPC 33 that will have touch-control IC 34 then presses on the ACF, finishes FPC 33 and is connected with the electricity of ito transparent electrode layer 32 pin, concrete technological parameter:
The connection of ACF: 90 ℃ of hot pressing temperatures, hot pressing time 3s, hot pressing pressure 0.154MPa;
The connection of FPC: 290 ℃ of hot pressing temperatures, hot pressing time 10s, hot pressing pressure 0.21MPa;
4, the making of black light shield layer
Method on polaroid 35 surfaces by the serigraphy black ink forms the polaroid 35 that has black light shield layer 36,, concrete technological parameter:
The distance of half tone and polaroid 35: net distance: 3.0-4.0mm, glue scrape height 20-30mm, and glue is scraped angle: 60-85 degree, glue are scraped pressure 3.0-4.0Mpa;
The baking sintering: the glass that silk-screen is good is put into baking box; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 ℃, and the temperature difference is not more than 5 ℃.
5, attaching process
The polaroid of making that has black light shield layer 36 35 is attached to the upper surface of LCD screen by optical lens gelatin (as the OCA optical cement), the cover-plate glass 31 that will have sensor then attaches to the upper surface of LCD screen by optical glue (as glue), black light shield layer 36 is over against the sensor electrode layer, by the final LCD screen with multi-point touch function that forms of above-mentioned applying.
Fig. 4 is the LCD with touch controllable function after fitting, second upper surface of base plate that the above-mentioned polaroid that has the black light shield layer is fitted to LCD screen 45 forms the LCD screen that has the black light shield layer, to have the cover-plate glass 41 of sensor then by optical lens gelatin 47(such as glue) fit the final LCD 4 that has touch controllable function that forms with the LCD screen.
Claims (5)
1. an improved OGS touch-screen method for making is characterized in that, may further comprise the steps:
(1) makes the ito transparent electrode layer in glass cover plate surfaces
Utilize the method for vacuum magnetic-control sputtering to make the ITO nesa coating as the sensor electrode layer at glass cover-plate, concrete technological parameter: plated film vacuum tightness: 0.01 ~ 0.5Pa, temperature: 220 ~ 300 ℃, the thickness 10nm ~ 20nm of ito thin film layer;
(2) the ito transparent electrode layer is carried out graphical treatment
The ITO nesa coating is finished the graphical of ito transparent electrode layer through operations such as cleaning, gluing, exposure, development, post bake, stripings, concrete technology and parameter:
The coating photoresist covers etched ito thin film layer, the thickness 1600 ~ 2000nm of photoresist, and in the homogeneity 5%, preliminary drying temperature: 80 ~ 90 ℃;
Photoresist is exposed, i.e. photoetching electrode pattern on photoresist, conditions of exposure is: ultraviolet wavelength: 365nm, luminous flux: 100 ~ 120mj, the light shield of ITO electrode pattern is chromium plate, apart from the size 100um ~ 200um of substrate;
To photoresist developing and sclerosis, adopt NaOH solution, concentration 0.1 ~ 0.08MOL/L, temperature: 20 ~ 35 ℃, 50 seconds ~ 120 seconds time, hardening temperature: 100 ~ 120 ℃, 30 ~ 35 minutes time;
Etching ito thin film layer forms ito thin film layer electrode pattern, and material: HCL60% ~ 6,5%+,HO2 40% ~ 35% is used in etching, temperature: 40 ~ 45 ℃, and the time: 120 ~ 220 seconds;
Remove photoresist, form the ITO electrode, use material: NaOH, concentration 2.0 ~ 1.5MOL/L, temperature: 30 ~ 35 ℃, 100 seconds ~ 120 seconds time, use the pure water rinsing at last;
(3) flexible circuit board FPC is connected to the wire pin of walking of ito transparent electrode layer
By heat pressing process, at first anisotropic conducting film (ACF) is pressed on the pin of ito transparent electrode layer, the FPC that will have touch-control IC then presses on the ACF, finishes FPC and is connected with the electricity of ito transparent electrode layer pin, concrete technological parameter:
The connection of ACF: 90 ℃ of hot pressing temperatures, hot pressing time 3s, hot pressing pressure 0.154MPa;
The connection of FPC: 290 ℃ of hot pressing temperatures, hot pressing time 10s, hot pressing pressure 0.21MPa;
(4) making of black light shield layer
Method on the polaroid surface by the serigraphy black ink forms the polaroid that has the black light shield layer,
Concrete technological parameter:
The distance of half tone and polaroid: net distance: 3.0-4.0mm, glue scrape height 20-30mm, and glue is scraped angle: 60-85 degree, glue are scraped pressure 3.0-4.0Mpa;
The baking sintering: the glass that silk-screen is good is put into baking box; The baking box heating-up time is 15-30min, and constant temperature time is 25-35min, and temperature is 70 ~ 80 ℃, and the temperature difference is not more than 5 ℃;
(5) attaching process
The polaroid of making that has the black light shield layer is attached to the upper surface of LCD screen by the optical clear sticker, the cover-plate glass that will have sensor then attaches to the upper surface of LCD screen by optical glue, the black light shield layer is over against the sensor electrode layer, by the final LCD screen with multi-point touch function that forms of above-mentioned applying.
2. improved OGS touch-screen method for making as claimed in claim 1 is characterized in that, described FPC surface-coated black protective seam is consistent with the light shield layer color.
3. improved OGS touch-screen method for making as claimed in claim 1 is characterized in that, described glass cover-plate adopts protection tempered glass.
4. improved OGS touch-screen method for making as claimed in claim 1 is characterized in that described optical lens gelatin can adopt the OCA optical cement.
5. improved OGS touch-screen method for making as claimed in claim 1 is characterized in that described optical glue can adopt glue.
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| CN109683753B (en) * | 2018-12-25 | 2021-09-17 | 黄石瑞视光电技术股份有限公司 | Anti-deformation processing method for touch display module |
| CN109709707A (en) * | 2019-01-31 | 2019-05-03 | 武汉天马微电子有限公司 | Display panel and display device |
| CN109709707B (en) * | 2019-01-31 | 2022-04-12 | 武汉天马微电子有限公司 | Display panel and display device |
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