CN103253868B - The thining method of the thinning pretreatment fluid of liquid crystal display and liquid crystal display - Google Patents
The thining method of the thinning pretreatment fluid of liquid crystal display and liquid crystal display Download PDFInfo
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- CN103253868B CN103253868B CN201210036847.6A CN201210036847A CN103253868B CN 103253868 B CN103253868 B CN 103253868B CN 201210036847 A CN201210036847 A CN 201210036847A CN 103253868 B CN103253868 B CN 103253868B
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Abstract
The thinning pretreatment fluid of a kind of liquid crystal display, comprise weight percentage be the silanol of 5% ~ 20%, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing; Surplus is water; Wherein, alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt.The thinning pretreatment fluid of above-mentioned liquid crystal display is by the inside of the fine crack on filling glass surface, and be combined with the siloxane bond of glass surface, before glass substrate carries out chemical reduction in HF solution, first chemical substrate is soaked in containing weight percentage be the silanol of 5% ~ 20%, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing the thinning pretreatment fluid of liquid crystal display in, prevent the amplification of the crackle in HF solution in chemical reduction process on glass substrate, thus improve the good article rate of liquid crystal display.In addition, there is a need to the thining method that a kind of liquid crystal display is provided.
Description
[technical field]
The present invention relates to the etching thining method of liquid crystal display, particularly the thining method of the thinning pretreatment fluid of a kind of liquid crystal display and liquid crystal display.
[background technology]
The thining method of current liquid crystal display has two kinds usually, and a kind of is the method for physics polishing grinding, and another kind is the thinning method of chemical milling, wherein, the thinning method of chemical milling with its distinctive advantage by comparatively widespread use.The aqueous solution of the hydrofluoric acid that existing chemical milling thining method normally directly adopts is as chemical milling reducer, chemical milling is carried out to glass substrate thinning, but after thinning in etching reducer, the surface of glass substrate can produce a large amount of concave point and cut, even cause thinning glass substrate uneven, thus have impact on the good article rate of liquid crystal display, add production cost.
[summary of the invention]
Based on this, be necessary to provide a kind of thinning pretreatment fluid of liquid crystal display that can improve the good article rate of liquid crystal display.
The thinning pretreatment fluid of a kind of liquid crystal display, comprise weight percentage be the silanol of 5% ~ 20%, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing; Surplus is water; Wherein, described alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt.
In a preferred embodiment, described silanol is R
3siOH or R
2si (OH)
2, wherein R is methyl, ethyl or propyl group.
In a preferred embodiment, described inorganic silicate is potassium silicate or water glass.
In a preferred embodiment, described metal hydroxides is at least one in sodium hydroxide and potassium hydroxide; Described strong base-weak acid salt is at least one in sodium carbonate, sodium bicarbonate, salt of wormwood and saleratus.
In addition, there is a need to provide a kind of thining method that can improve the liquid crystal display of the good article rate of liquid crystal display.
A thining method for liquid crystal display, comprises the steps:
The ratio being 5% ~ 20%: 0.1% ~ 5%: 0.01% ~ 1% according to weight percent mixes with water after taking silanol, inorganic silicate and alkaline activation material, obtains the thinning pretreatment fluid of liquid crystal display; Wherein, described alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt;
Glass substrate is soaked in the thinning pretreatment fluid of described liquid crystal display; And
Described glass substrate after soaking is put into hydrofluoric acid solution chemical reduction.
In a preferred embodiment, the processing parameter be soaked in by described glass substrate in the thinning pretreatment fluid of described liquid crystal display is: soaking temperature is 30 DEG C ~ 60 DEG C, and soak time is 0.5 hour ~ 2 hours.
In a preferred embodiment, the processing parameter glass substrate after immersion being put into described hydrofluoric acid solution chemical reduction is: temperature is 20 DEG C ~ 40 DEG C.
In a preferred embodiment, the hydrofluoric mass percentage in described hydrofluoric acid solution is 5% ~ 20%.
In a preferred embodiment, described metal hydroxides is at least one in sodium hydroxide and potassium hydroxide; Described strong base-weak acid salt is at least one in sodium carbonate, sodium bicarbonate, salt of wormwood and saleratus.
Main component to be weight percentage the be silanol of 5% ~ 20% in the thinning pretreatment fluid of above-mentioned liquid crystal display, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing, wherein, alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt, by the inside of the fine crack on filling glass surface, and be combined with the siloxane bond of glass surface, thus prevent crackle from amplifying in the process of chemical reduction, thus improve the good article rate of liquid crystal display.Before glass substrate carries out chemical reduction in HF solution, first chemical substrate is soaked in the thinning pretreatment fluid of above-mentioned liquid crystal display, prevent the amplification of the crackle in HF solution in chemical reduction process on glass substrate, the technique that the thinning pretreatment fluid of above-mentioned liquid crystal display is applied to reducer crystal display screen not only preparation technology is simple, and improves the good article rate of liquid crystal display.
[accompanying drawing explanation]
Fig. 1 is the schema of the thining method of an embodiment liquid crystal display;
Fig. 2 is the test set of embodiment 1 to the thinning effect of embodiment 10.
[embodiment]
Mainly in conjunction with the drawings and the specific embodiments the thining method of the thinning pretreatment fluid of liquid crystal display and liquid crystal display is described in further detail below.
The thinning pretreatment fluid of liquid crystal display of one embodiment, comprises silanol, inorganic silicate and alkaline activation thing, and surplus is water.
The weight percentage of silanol is 5% ~ 20%.In the present embodiment, silanol is R
3siOH or R
2si (OH)
2, wherein R is methyl (CH
3-), ethyl (CH
3cH
2-) or propyl group (CH
3cH
2cH
2-).Silanol is attached to glass micro-crack surface by-OH, and form protective layer, and be filled with tiny crack to a certain extent, R group has certain hydrophobic nature, and the fluorion of electrolysis is not easy close to tiny crack inside, thus reduces the expansion of tiny crack.If R carbochain increases or there is side chain, the ability forming protective layer dies down, and can be deteriorated to the restraining effect of glass surface tiny crack.
The weight percentage of inorganic silicate is 0.1% ~ 5%.In the present embodiment, inorganic silicate is potassium silicate (K
2siO
3) or water glass (Na
2siO
3).Inorganic silicate Main Function is the fine crack on filling glass surface, and is combined with the siloxane bond of glass surface, simultaneously activated glass surface.
The general name of the compound that the inorganic silicate that it is pointed out that in the present embodiment is silicon, oxygen and other chemical element (mainly aluminium, iron, calcium, magnesium, potassium, sodium etc.) are combined into.
The weight percentage of alkaline activation thing is 0.01% ~ 1%.Alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt.In the present embodiment, metal hydroxides is at least one in sodium hydroxide (NaOH) and potassium hydroxide KOH; Strong base-weak acid salt is sodium carbonate (Na
2cO
3), sodium bicarbonate (NaHCO
3), salt of wormwood (K
2cO
3) and saleratus (KHCO
3) at least one.In a preferred embodiment, alkaline activation thing is at least one in sodium hydroxide and potassium hydroxide.The effect of alkaline activation thing is that the siloxane bond in the fine crack of glass surface is disconnected, and simultaneously activated glass.
All the other compositions in the thinning pretreatment fluid of liquid crystal display are water.Water is deionized water.
Main component to be weight percentage the be silanol of 5% ~ 20% in the thinning pretreatment fluid of above-mentioned liquid crystal display, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing, and alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt, by the inside of the fine crack on filling glass surface, and be combined with the siloxane bond of glass surface, thus prevent crackle from amplifying in the process of chemical reduction, thus improve the good article rate of liquid crystal display.
As shown in Figure 1, the thining method of the liquid crystal display of an embodiment, comprises the steps:
Step S1: the ratio being 5% ~ 20%: 0.1% ~ 5%: 0.01% ~ 1% according to weight percent mixes with water after taking silanol, inorganic silicate and alkaline activation material, obtains the thinning pretreatment fluid of liquid crystal display; Wherein, alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt.
Step S2: glass substrate is soaked in the thinning pretreatment fluid of liquid crystal display.In the present embodiment, the processing parameter that glass substrate is soaked in the thinning pretreatment fluid of liquid crystal display is: soaking temperature is 30 DEG C ~ 60 DEG C, and soak time is 0.5 hour ~ 2 hours.
Step S3: the glass substrate after soaking is put into hydrofluoric acid solution chemical reduction.By the processing parameter that hydrofluoric acid solution chemical reduction put into by the glass substrate after immersion be: temperature is 20 DEG C ~ 40 DEG C.The time of chemical reduction needs thinning thickness according to glass and determines, and as glass is thinned to 0.6mm from 1.0mm, the chemical reduction time is 1 hour ~ 5 hours.Wherein, the hydrofluoric mass percentage in hydrofluoric acid (HF) solution is 5% ~ 20%.Hydrofluoric mass percentage in hydrofluoric acid (HF) solution easily causes higher than 5% ~ 20% the liquid crystal display uneven thickness produced, and production efficiency can be caused to decline lower than 5% ~ 20%.
In the present embodiment, after glass substrate soaks in the thinning pretreatment fluid of liquid crystal display, first glass substrate water is cleaned up, and carry out 30 DEG C ~ 60 DEG C degree dryings 5 minutes ~ 20 minutes, and then glass basis is carried out chemical reduction in the etching bath containing HF solution.
Before glass substrate carries out chemical reduction in HF solution, first chemical substrate is soaked in the thinning pretreatment fluid of liquid crystal display, prevent the amplification of the crackle in HF solution in chemical reduction process on glass substrate, the technique that the thinning pretreatment fluid of above-mentioned liquid crystal display is applied to reducer crystal display screen not only preparation technology is simple, and improves the good article rate of liquid crystal display.
Be below specific embodiment part, in following embodiment, adopt TFT (thin film transistor) glass substrate to be example, the thickness of the TFT glass substrate becoming box is thinned to 0.6mm from 1.0mm.
Embodiment 1
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 5%: 0.1%: 0.01% according to weight percentage takes (CH
3)
3siOH, Na
2siO
3and mix with water after NaOH, be mixed with the thinning pretreatment fluid of liquid crystal display.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 30 DEG C, and soak time is 2 hours, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 5%, and the temperature of chemical reduction is 40 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 1 is the test result of TFT glass substrate.
Table 1
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 33 | 9 | 1 | 0 | 43 |
Embodiment 2
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 5%: 1%: 0.1% according to weight percentage takes (CH
3)
2si (OH)
2, K
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein, alkaline activation thing is NaOH and KOH.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 60 DEG C, and soak time is 0.5 hour, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 15%, and the temperature of chemical reduction is 30 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 2 is the test result of TFT glass substrate.
Table 2
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 26 | 11 | 1 | 0 | 38 |
Embodiment 3
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 5%: 5%: 1% according to weight percentage takes (CH
3cH
2)
3siOH, K
2siO
3and mix with water after KOH, be mixed with the thinning pretreatment fluid of liquid crystal display.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 40 DEG C, and soak time is 1.5 hours, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 20%, and the temperature of chemical reduction is 20 DEG C, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 3 is the test result of TFT glass substrate.
Table 3
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 48 | 17 | 5 | 0 | 70 |
Embodiment 4
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 10%: 0.1%: 0.1% according to weight percentage takes (CH
3cH
2cH
2)
3siOH, Na
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein, alkaline activation thing is Na
2cO
3and KHCO
3.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 50 DEG C, and soak time is 1 hour, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 10%, and the temperature of chemical reduction is 35 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 4 is the test result of TFT glass substrate.
Table 4
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 24 | 9 | 2 | 0 | 35 |
Embodiment 5
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 20%: 5%: 0.1% according to weight percentage takes (CH
3cH
2)
2si (OH)
2, Na
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein, alkaline activation thing is NaOH and KOH.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 55 DEG C, and soak time is 1 hour, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 5%, and the temperature of chemical reduction is 40 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 5 is the test result of TFT glass substrate.
Table 5
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 8 | 3 | 0 | 0 | 11 |
Embodiment 6
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 20%: 1%: 0.01% according to weight percentage takes (CH
3cH
2cH
2)
2si (OH)
2, K
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein, alkaline activation thing is NaOH and KOH.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 30 DEG C, and soak time is 2 hours, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 10%, and the temperature of chemical reduction is 25 DEG C, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 6 is the test result of TFT glass substrate.
Table 6
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 9 | 2 | 0 | 0 | 11 |
Embodiment 7
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 10%: 1%: 1% according to weight percentage ratio takes (CH
3cH
2)
2si (OH)
2, Na
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein, alkaline activation thing is K
2cO
3and KOH.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 45 DEG C, and soak time is 1.5 hours, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 15%, and the temperature of chemical reduction is 30 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 7 is the test result of TFT glass substrate.
Table 7
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 27 | 11 | 0 | 0 | 38 |
Embodiment 8
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 10%: 5%: 0.01% according to weight percent takes (CH
3)
3siOH, K
2siO
3and NaHCO
3mix with water afterwards, be mixed with the thinning pretreatment fluid of liquid crystal display.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 30 DEG C, and soak time is 2 hours, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 15%, and the temperature of chemical reduction is 30 DEG C, and the time is 2 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 8 is the test result of TFT glass substrate.
Table 8
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 19 | 4 | 0 | 0 | 23 |
Embodiment 9
(1) the thinning pretreatment fluid of liquid crystal display is prepared: the ratio being 10%: 5%: 0.01% according to weight percent takes (CH
3)
2si (OH)
2, Na
2siO
3and mix with water after alkaline activation thing, be mixed with the thinning pretreatment fluid of liquid crystal display, wherein alkaline activation thing is K
2cO
3and KHCO
3.
(2) be soaked in by TFT glass substrate in the thinning pretreatment fluid of above-mentioned liquid crystal display, soaking temperature is 60 DEG C, and soak time is 0.5 hour, then that TFT cleaning glass substrate is clean, and carries out drying.
(3) then by TFT glass substrate, the mass percentage put into containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 20%, and the temperature of chemical reduction is 20 DEG C, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 9 is the test result of TFT glass substrate.
Table 9
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 14 | 4 | 0 | 0 | 18 |
Comparative example
The mass percentage put into by TFT glass substrate containing HF is that chemical reduction is carried out in the etching bath of the hydrofluoric acid solution of 10%, and the temperature of chemical reduction is 25 DEG C, and the time is 3 hours.
As shown in Figure 2, the testing method of the TFT glass substrate after thinning is: be the sand paper of 100 by 10mm × 10mm size, order number, be positioned on horizontal checkout platform, TFT glass substrate after thinning is placed on sand paper, apply the pressure of 5Kg thereon, characterize effect by the quantity of the concave point causing the different lengths on TFT glass substrate after statistical test.Table 10 is the test result of TFT glass substrate.
Table 10
| Less than 100 μm | 100～150μm | 150～200μm | More than 200 μm | Add up to |
| 126 | 34 | 8 | 2 | 170 |
The above embodiment only have expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (8)
1. the thinning pretreatment fluid of liquid crystal display, is characterized in that, comprise weight percentage be the silanol of 5% ~ 20%, the inorganic silicate of 0.1% ~ 5% and 0.01% ~ 1% alkaline activation thing, surplus is water; Wherein, described alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt; Described metal hydroxides is at least one in sodium hydroxide and potassium hydroxide; Described strong base-weak acid salt is at least one in sodium carbonate, sodium bicarbonate, salt of wormwood and saleratus.
2. the thinning pretreatment fluid of liquid crystal display according to claim 1, is characterized in that, described silanol is R
3siOH or R
2si (OH)
2, wherein R is methyl, ethyl or propyl group.
3. the thinning pretreatment fluid of liquid crystal display according to claim 1, is characterized in that, described inorganic silicate is potassium silicate or water glass.
4. a thining method for liquid crystal display, is characterized in that, comprises the steps:
The ratio being 5% ~ 20%:0.1% ~ 5%:0.01% ~ 1% according to weight percent mixes with water after taking silanol, inorganic silicate and alkaline activation material, obtains the thinning pretreatment fluid of liquid crystal display; Wherein, described alkaline activation thing is at least one in metal hydroxides and strong base-weak acid salt;
Glass substrate is soaked in the thinning pretreatment fluid of described liquid crystal display; And
Described glass substrate after soaking is put into hydrofluoric acid solution chemical reduction;
Described metal hydroxides is at least one in sodium hydroxide and potassium hydroxide; Described strong base-weak acid salt is at least one in sodium carbonate, sodium bicarbonate, salt of wormwood and saleratus.
5. the thining method of liquid crystal display according to claim 4, it is characterized in that, the processing parameter be soaked in by described glass substrate in the thinning pretreatment fluid of described liquid crystal display is: soaking temperature is 30 DEG C ~ 60 DEG C, and soak time is 0.5 hour ~ 2 hours.
6. the thining method of liquid crystal display according to claim 4, is characterized in that, is: temperature is 20 DEG C ~ 40 DEG C by the processing parameter that described hydrofluoric acid solution chemical reduction put into by the glass substrate after immersion.
7. the thining method of liquid crystal display according to claim 4, is characterized in that, the hydrofluoric mass percentage in described hydrofluoric acid solution is 5% ~ 20%.
8. the thining method of liquid crystal display according to claim 4, is characterized in that, described silanol is R
3siOH or R
2si (OH)
2, wherein R is methyl, ethyl or propyl group.
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| CN101215099A (en) * | 2008-01-16 | 2008-07-09 | 京东方科技集团股份有限公司 | Flat glass substrate attenuation etching liquid |
| CN101634026A (en) * | 2009-08-26 | 2010-01-27 | 北京市太阳能研究所有限公司 | Corrosive liquid for preparing monocrystal silicon textured surface and method thereof |
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| CN103253868A (en) | 2013-08-21 |
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