CN103246160B - The production method of microfilm of characters picture - Google Patents
The production method of microfilm of characters picture Download PDFInfo
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- CN103246160B CN103246160B CN201210031536.0A CN201210031536A CN103246160B CN 103246160 B CN103246160 B CN 103246160B CN 201210031536 A CN201210031536 A CN 201210031536A CN 103246160 B CN103246160 B CN 103246160B
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- microfilm
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Abstract
A kind of production method of microfilm of characters picture, its feature is that word picture is first inputted computer and makes film, dry plate mother matrix is made using optics micropatterning and Step-and-repeat technology, then by modern microlithography processes, dry plate mother matrix is turned over and is carved into chromium plate mother matrix.It will be on the microfilm of characters picture batch duplicating to target workpiece by the method that photoetching corrosion, lithography stripping, photoetching electroforming and electroforming are molded with gained mother matrix.Producing efficiency of the present invention is high, technological process is short, equipment investment is few.Can be by the reduced height of Chinese character to 150 microns hereinafter, more than 44 Chinese characters can be arranged on 1 square millimeter of area using the present invention, the ratio of micro is more suitable for appreciating and differentiate.The microfilm of characters picture product produced can keep the style and features of original paper well, can be not only used for the making of high-end craftwork, be also used as the encryption anti-counterfeiting of general merchandise.
Description
Technical field：
The present invention relates to a kind of production methods of microfilm of characters picture, more particularly to use microlithography processes to make miniature text
The method of word picture.
Background technology：
Microscopic carvings miniature carving is exactly the predecessor of present microfilm of characters picture.During it originates from as a kind of ancient traditional handicraft
State, it is with a history of thousands of years so far.In starting the course that develops till now microscopic carvings miniature carving almost it is mostly be it is hand-made and
At high to the skill requirement of creator.
There is " making process of micro text and pattern mold " application number 01111132.1 not to therein in existing document
The mechanical production method of micro text and pattern carries out disclosure.Have document and " is made the side of miniature Chinese character of microlithography technology
Method " application number 200510011686.5 and " micro Character array anticounterfeit mark and preparation method thereof " application number
200510086954.X both using electron beam exposure apparatus or laser direct writing equipment.Figure when being made a plate using both equipment
Digitlization with word is gathered and edited, and very time-consuming, equipment is very expensive, to the plate-making of large area complex figure, time-consuming, and cost is very high,
And it has overemphasized the small of figure and word, and ignore the viewing and discriminating of user.And a kind of document " photoetching
Technology disclosed in encryption antiforgery method " application number 201010219607.0 needs to divide character pattern, is not suitable for a large amount of texts
The micro of word and large scale figure.Document above is all made of plastic mould pressing reprography figure, makes the material being replicated by very
Big limitation.《Artistic science and technology》Magazine the 4th phase in 2009《Micro-nano scuoptor and micro-nano engraving technology》In report
Micro-nano sculpture is gone out using the high-tech means batch making such as scanning probe microscopy and dual-beam polymerization, but because it makes material
The oxidizable and volatilization of material, it is impossible to become craftwork or product in general sense, it is impossible to be spread in ordinary populace.
Microfilm of characters is being made using modern printing technology, such as " the RMB people as anti-counterfeiting mark on the 5th set of RMB of new edition
People's coin RMB ... " word height is about 400 microns, can also visually be differentiated, the effect also unobvious of micro.By this
The product that class technology is produced the considerations of due in terms of equipment and cost, is relatively more suitable for high-volume and manufactures anti-fake product, no
The production anti-fake product of too suitable small lot is also not suitable for requiring the making of diversification and high performance-price ratio craftwork.
Invention content：
The technical problem to be solved by the present invention is to：It is novel to overcome the deficiencies of the prior art and provide a kind of mastering method
Simplicity, obtained mother matrix can in target workpiece batch duplicating, ensure make precision while can embody it is abundanter
The production method of the microfilm of characters picture of detail characteristic.
The present invention solution be：Modern microlithography processes are combined using optics micropatterning technology, first by image text
Word inputs computer, makes film using existing technology, micro figure is formed on dry plate by optical reduction technology,
Dry plate is turned over again and is carved into chromium plate, it then will be described by the method that photoetching corrosion, lithography stripping, photoetching electroforming, electroforming are molded
On microfilm of characters picture batch duplicating to target workpiece.
Its main technological steps is as follows：
(1) miniature word picture is wanted with computer input, layout is carried out to word and picture as required, narrows down to requirement
Size,
(2) data file is input to the making apparatus of the film, film is exported according to certain scaling,
Film can be positive or negative film, and the scaling is related with the actual size of final mother matrix；
(3) dry plate is made with optics micropatterning technology in the film, there are two types of methods：One is by the phenanthrene
Forest tract carries out optical reduction imaging with mask plate first minification machine, and is made comprising the film by processes such as development, fixings
Upper all figures and the first minification dry plate that reduces by a certain percentage and as dry plate mother matrix；The second is by first minification dry plate with covering
Template final reaction system carries out optical reduction imaging according still further to the ratio of calculating, and the technique that Step-and-repeat may be used depending on actual needs exposes
Light.The processes such as development, fixing are finally also passed through at the final minification dry plate of final design size and as dry plate mother matrix；
It (4) will using the technological process including the step that exposes, develops, corrodes and remove photoresist in existing microlithography technology
Chromium plate mother matrix is made on graph copying to sol evenning chromium plate on the dry plate mother matrix；
(5) figure on the mother matrix is replicated with microlithography pattern or plastic mould pressing graph copying reprography is to target
On workpiece, the batch duplicating product of microfilm of characters picture is obtained.
Further, the needs of the actual size made according to microfilm of characters picture, pass through above step (1), (2), (3)
The process that gained first minification dry plate passes through Step-and-repeat can obtain one or more identical figures on final minification dry plate.
Further, the mother matrix as obtained by above step (3) or (4) continues using the electroformed metal mould in prior art
Plate obtains the mother matrix of plastic mould pressing.Using plastic mould pressing reproduction technology by microfilm of characters picture batch duplicating to plastic film
On.
Further, the target workpiece has lower area structure character：Target workpiece is at least made one there are one mirror polish
Smooth working face；Plate layer of metal film with vacuum coating equipment on the working face, as chromium film, aluminium film, golden film,
Silverskin or platinum film；One layer photoresist of sol evenning machine even application is used on the metal film plated again.The target workpiece of this spline structure can
The method copy pattern of suitable photoetching corrosion and photoetching electroforming.
Further, the target workpiece has lower area structure character：Target workpiece is at least made one there are one mirror polish
Smooth working face；Again with one layer of photoresist for being used for photoetching of sol evenning machine even application on the working face.It ties in this way
The target workpiece of structure can be suitble to workpiece itself be that metal, workpiece itself are easy to be corroded, lithography stripping technique or to make electricity
Ingot metal template.
Further, the microlithography pattern duplication process includes photoetching corrosion, photoetching electroforming, lithography stripping or in which two
Kind process combination.
Further, the word picture includes word, picture, figure or combination thereof.
Further, the sol evenning chromium plate includes：It is applied in chromium film layer and chromium film layer on transparent substrate, transparent substrate
Photoresist layer.
Further, the dry plate is that silver emulsion is coated on smooth transparent substrate, silver halide emulsion therein
Agent is emulsion.
The present invention compared with the prior art the advantages of be：Shorten picture and word digital collection and layout when
Between, it can quickly handle graphic file with existing common software.The present invention is written with face replaces existing point write-in miniature to make
The mother matrix of word picture, makes efficiency greatly improve；The details of original picture (containing calligraphy) can ideally be presented simultaneously, especially
It is suitble to the micro of large complicated painting and calligraphy to replicate, the miniature carving for being also suitable for the books of ten thousand words or more makes.The present invention can be by Chinese character
Reduced height is to 150 microns hereinafter, more than 44 Chinese characters can be arranged on 1 square millimeter of area, and not by font
Limitation, the basic None- identified of naked eyes.Observer perfect can reappear original calligraphy and painting by microscope or the magnifying glass to match
Style and features.The present invention makes the Production Time of a whole set of micro text picture greatly shorten, and existing equipment can be used, and reduces equipment and throws
Enter and production cost；Reproducible target workpiece material also has more selections, available technique also more flexible.Not only
It can be used for the making of high-end craftwork, while can be used for the encryption anti-counterfeiting of general merchandise.
Description of the drawings：
Fig. 1 is the making technical process figure of microfilm of characters picture of the present invention；
Fig. 2 is microfilm of characters picture photoetching corrosion duplication process schematic diagram of the present invention；
Fig. 3 is microfilm of characters picture photoetching electroforming duplication process schematic diagram of the present invention.
Specific implementation method：
The specific implementation of the present invention is divided into two parts, and first part is the making of mother matrix, that is, photo mask board
It makes, second part is will be on the graph copying to target workpiece on photo mask board.
It is the fabrication processing figure of microfilm of characters picture of the present invention as shown in Figure 1.Word picture is first inputted into computer,
Layout is carried out by computer software again.Designed data file is loaded into film output equipment and makes film, using optics
First minification dry plate is made through overexposure, development, fixing in micropatterning technology, and first minification dry plate is carried out light again with mask plate final reaction system
It learns and reduces imaging, exposed by the process of Step-and-repeat, multiple identical figures are made in same version, are finally also passed through
The final minification dry plate mother matrix of final design size is made in the processes such as development, fixing.The purpose of final minification and Step-and-repeat is to improve micro
Pattern precision and density.By final minification dry plate mother matrix by microlithography processes, turns over and be carved into chromium plate mother matrix, this completes photoetching to cover
The making of template.If image can suit the requirements by first minification, it is also possible to which it carves chromium plate mother matrix to turn over.Gained dry plate mother matrix
Photo mask board use is all can serve as, only dry plate is easier to scratch, and service life is shorter.
It can pass through photoetching corrosion, photoetching electroforming, lithography stripping and electroforming plastic mould pressing after obtaining photo mask board
Method will be on the microfilm of characters picture batch duplicating to target workpiece.Photoetching corrosion, photoetching electroforming, lithography stripping and electricity
It is the prior art to cast plastic mould pressing.
If Fig. 2 is the process schematic representation of photoetching corrosion image replica method, by the target workpiece 1 of surfacing in vacuum coating
Layer of metal film 2 is plated in machine.Preferably, using chromium film, golden film, aluminium film.With sol evenning machine in 3000~3500 rev/min
Rotating speed under on institute's metal-coated membrane of workpiece one layer of 1~2 micron of thick photoresist of even application.Baking by workpiece at 120 degree
It is dried 10 minutes in case.Relief type photoresist 3 will be formed after workpiece exposure imaging, be positive photoresist with photoresist, through ultraviolet light 5
Photoresist after exposure in development it is developed fall.It puts the workpiece in corresponding metal erosion liquid, exposed metal is just rotten
It loses, the micro figure 6 (6 region of micro figure is to the effect of blocking of ultraviolet light 5) on such photo mask board 4 is just replicated
Onto target workpiece 1.
Such as the process schematic representation that Fig. 3 is photoetching electroforming image replica method.By the target workpiece 1 of surfacing in vacuum coating
Vapor deposition last layer metal film 2 in machine.Preferably, using chromium film, golden film.With sol evenning machine turning in 3000~3500 rev/min
The photoresist of one thickness of even application is generally 4~6 microns of thick photoresists on institute's metal-coated membrane of workpiece under speed.By work
Part dries 15 minutes in 120 degree of baking oven.Relief type photoresist 3 is obtained after photoetching, development, then by target workpiece into
Row plating.Preferably, using dedicated nickel electroplating technology.Exposed metal film is just plated after plating after a period of time
Metallic nickel is gone up.It can be obtained by the relief type copy pattern 7 of institute's nickel-plated metal after removing photoresist.
Embodiment 1：
The rubbing image scanner of ' teacher of the older generation hole sub-line teaches picture ' of Wu's line Tang Dynasty is inputted into computer.And it uses
Photoshop makees adjustment appropriate to picture.Again by Confucius's《The Analects of Confucius》Computer is inputted by keyboard, is included in punctuation mark
With space number of words in 20,004 K words or so.Layout is carried out to word and picture with CorelDRAW again, Confucius is whole as placed in the middle
《The Analects of Confucius》It lies around.Target size by last figure typesetting squarely, final products figure is 2.5 lis of 2.5 cm x
Rice, by the pattern reduction of data file at the size of 2.5 centimetres of 2.5 cm x.With film output equipment by the length and width of figure
10 times of output films of each amplification, using attached technological process shown in FIG. 1 with optics micropatterning technology first by film length of a film and
First minification dry plate is made in wide diminution 10 or so, first minification dry plate is carried out optical reduction imaging again with mask plate final reaction system, by figure
Accurate size is adjusted to 2.5 centimetres of 2.5 cm x, is exposed by the process of Step-and-repeat, is made on four inches of dry plates of same
Make the final minification dry plate mother matrix of 4 identical figures, the development and fixing of dry plate are all in accordance with special operation sequence.It will be by above
The final minification dry plate mother matrix that step obtains is positioned on sol evenning chromium plate contact exposure under ultraviolet light, then special with photo mask board
The photoetching offset plate figure of relief type is obtained with developing process, is just put into the special corrosive liquid of chromium after 80 degree of baking oven post bake,
There is no the chromium metal film of photoresist covering part to be just corroded, become the window of light transmission, has thus obtained the light of chromium plate
Carve mask plate.
Prepare 2 millimeters thick sheet glass of polylith surfacing as target workpiece, is put into vacuum coating equipment that plate 0.1 micro-
The chromium film of rice, using the technical process as described in Fig. 2 microfilm of characters picture photoetching corrosion duplication process, finally at every piece
The target workpiece last time can obtain 4 sets of miniature versions for carrying Confucius's picture《The Analects of Confucius》Book.Amplifying sem observations with 15 times：Word
Very clear, the beard and hair root root of Confucius's picture is distinguishable.The height for measuring Chinese character under the microscope is 150 microns, the height of Confucius's picture
It is 3 millimeters.Such product can be made into craftwork by post-production.
Embodiment 2：
By the Feng Chengsu Tang Dynasty copy the king legendary ruler of great antiquity, the first of the Three August Ones《The Orchid Pavilion sequence》Calligraphy original handwriting process plate pass through scanner input calculate
Machine, this calligraphy contribution original paper are that size is high 24.5 centimetres 69.9 centimetres wide, and full text amounts to 28 rows, 324 words, with Photoshop pairs
Picture contrast is adjusted and to the processing appropriate of the profile of font, while original seal above being removed, by Shanghai day
The scan image for making the seal cutting seal of Electronic Science and Technology Co., Ltd. and the print of Wu Qiang is compiled in above-mentioned handwriting image as special
Label.Image above is copied into five row, ten row and amounts to 50 repetitive units on same file.In the output equipment of the film
On by the output of the content of image file in the region of 50 centimetres of 50 cm x.Then use optics micropatterning technology by the film
Just dry plate is made in length of a film and wide diminution 10 or so, by gained first minification dry plate directly as photo mask board.
Prepare 0.3 millimeter or so of sheet glass of polylith surfacing as target workpiece, is put into vacuum coating equipment and plates
The chromium film of upper 0.1 microns, using the technical process as described in Fig. 3 microfilm of characters picture photoetching electroforming duplication process,
50 sets finally can be once obtained in every piece of target workpiece carries special marking《The Orchid Pavilion sequence》.The product that single-piece replicates is big
Small is 3 × 8 square millimeters, and it is 4 to measure figure to obtain the thickness of the copy pattern 7 of embossment by electroforming process with step instrument
Microns.With 15 times of amplification sem observations：The calligraphy three-dimensional sense is very strong, and " cluster " between word and word is still very clear, complete
All risk insurance stays the romantic charm of original works.50 identical products are just can be obtained into the sheet glass after cutting, can be embedded in
It is used as anti-counterfeiting mark on special commodity, kills two birds with one stone, good social and economic benefit can be obtained.
Claims (9)
1. the production method of microfilm of characters picture, it is characterised in that including following steps：
(1) word picture that will be miniature inputs computer, carries out layout to word and picture as required, narrows down to the ruler of requirement
It is very little, form data file；
(2) data file is input to the making apparatus of the film, film is exported according to certain scaling；
(3) dry plate is made with optics micropatterning technology in the film, there are two types of methods：One is with mask plate first minification
Machine, it includes all figures and the first minification dry plate reduced by a certain percentage on the film to make, and the first minification dry plate is made
For dry plate mother matrix；The second is the first minification dry plate is further reduced with mask plate final reaction system and uses Step-and-repeat that final minification is made
Dry plate, and using the final minification dry plate as dry plate mother matrix；
(4) figure on the dry plate mother matrix is answered using the technological process including the step that exposes, develops, corrodes and remove photoresist
It makes and chromium plate mother matrix is made on sol evenning chromium plate；
(5) by the microlithography pattern reproduction technology of the figure on the mother matrix or plastic mould pressing graph copying reprography to target
On workpiece, the batch duplicating product of microfilm of characters picture is obtained.
2. the production method of microfilm of characters picture according to claim 1, it is characterised in that：By above step (1),
(2), include one or more identical figures on final minification dry plate obtained by (3).
3. the production method of microfilm of characters picture according to claim 1, it is characterised in that：By above step (3) or
(4) gained mother matrix continues, using the electroforming metal template in prior art, to obtain the mother matrix of plastic mould pressing.
4. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The target workpiece is at least
One smooth working face；On the working face layer of metal film is plated with vacuum coating equipment；Again in the metal plated
One layer photoresist of sol evenning machine even application is used on film, the metal film includes chromium film, aluminium film, golden film, silverskin or platinum film.
5. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The target workpiece is at least
There are one smooth working faces；One layer photoresist of sol evenning machine even application is used on the working face again.
6. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The microlithography pattern replicates
Technology includes photoetching corrosion, photoetching electroforming, lithography stripping or in which two kinds of technical combinations.
7. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The word picture includes text
Word, picture, figure or combination thereof.
8. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The sol evenning chromium plate includes saturating
The photoresist layer applied in chromium film layer and chromium film layer on bright substrate, transparent substrate.
9. the production method of microfilm of characters picture according to claim 1, it is characterised in that：The dry plate is smooth
Silver emulsion is coated on transparent substrate.
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| CN201210031536.0A CN103246160B (en) | 2012-02-13 | 2012-02-13 | The production method of microfilm of characters picture |
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| CN201210031536.0A CN103246160B (en) | 2012-02-13 | 2012-02-13 | The production method of microfilm of characters picture |
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| CN103921576B (en) * | 2014-04-11 | 2016-02-03 | 李海良 | A kind of method making amplification seal rubbing |
| CN106406030A (en) * | 2016-10-14 | 2017-02-15 | 王宝根 | Metal film and production method |
| CN109440029B (en) * | 2018-12-12 | 2020-09-11 | 西安工业大学 | Preparation method of ultrathin copper mesh |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1246773A2 (en) * | 2000-01-07 | 2002-10-09 | President And Fellows Of Harvard College | Fabrication of metallic microstructures via exposure of photosensitive composition |
| CN1687846A (en) * | 2005-05-09 | 2005-10-26 | 中国科学院光电技术研究所 | Method for making micro-Chinese character by micro-photoetching technique |
| CN1769073A (en) * | 2004-10-27 | 2006-05-10 | 中国科学院光电技术研究所 | Laser direct writing anti-counterfeit label |
| CN101788768A (en) * | 2009-01-23 | 2010-07-28 | 中芯国际集成电路制造(上海)有限公司 | Exposure method |
| CN101907825A (en) * | 2010-07-07 | 2010-12-08 | 湖北联合天诚防伪技术有限公司 | Photoetching encrypted anti-counterfeiting method |
-
2012
- 2012-02-13 CN CN201210031536.0A patent/CN103246160B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1246773A2 (en) * | 2000-01-07 | 2002-10-09 | President And Fellows Of Harvard College | Fabrication of metallic microstructures via exposure of photosensitive composition |
| CN1769073A (en) * | 2004-10-27 | 2006-05-10 | 中国科学院光电技术研究所 | Laser direct writing anti-counterfeit label |
| CN1687846A (en) * | 2005-05-09 | 2005-10-26 | 中国科学院光电技术研究所 | Method for making micro-Chinese character by micro-photoetching technique |
| CN101788768A (en) * | 2009-01-23 | 2010-07-28 | 中芯国际集成电路制造(上海)有限公司 | Exposure method |
| CN101907825A (en) * | 2010-07-07 | 2010-12-08 | 湖北联合天诚防伪技术有限公司 | Photoetching encrypted anti-counterfeiting method |
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