CN103236382A - Method for determining process parallel rationalization of manufacturing process of plasma display screen - Google Patents

Method for determining process parallel rationalization of manufacturing process of plasma display screen Download PDF

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CN103236382A
CN103236382A CN2013101611879A CN201310161187A CN103236382A CN 103236382 A CN103236382 A CN 103236382A CN 2013101611879 A CN2013101611879 A CN 2013101611879A CN 201310161187 A CN201310161187 A CN 201310161187A CN 103236382 A CN103236382 A CN 103236382A
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yield
parallel
display screen
plasma display
manufacturing process
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CN103236382B (en
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郑理
李涛
王鹏年
雷鸣
段冰
顾尚林
伍勇
皮家任
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HUZHOU ZHONGCHUANG XIAOWEI PIONEER PARK ENTERPRISE MANAGEMENT Co.,Ltd.
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Sichuan COC Display Devices Co Ltd
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Abstract

The invention discloses a method for determining the process parallel rationalization of the manufacturing process of a plasma display screen. A comparison relation model of parameter set values of parallel equipment in the manufacturing process of the plasma display screen is established by utilizing the historical data of the manufacturing process; the influence degree of the parameter set values on the quality of the plasma display screen is reflected by utilizing yield difference between different set values under the same parameter between the parallel equipment; and finally, the method for determining the process parallel rationalization of the manufacturing process of the plasma display screen is formed. The method has the positive effects that the accuracy of determining the process parallel rationalization of the manufacturing process mattering the quality of the plasma display screen is promoted; by accumulation of the regulated new historical data, suggestions on the process parallel rationalization of the manufacturing process of the plasma display screen are found by a method which spirally reuses an analysis model; and meanwhile, the method cannot be related to the interruption of production of a production line and avoids unnecessary line stop loss.

Description

The parallel definite method rationalized of plasma panel manufacturing processes
Technical field
The present invention relates to have the data mining technology analytical method of plasma panel manufacture process characteristic, is core with this method, by software development and curing.Form the parallel definite method rationalized of a kind of plasma panel manufacturing processes.
Background technology
In the plasma panel manufacture process, the reason of (or technology convergence time compactness) up and down tends to same operation because production capacity pressure, arranges that many identical devices are parallel to be produced, and has possessed the relatively more parallel rational hardware condition of working procedure parameter.But how to rationalize definite, be in the past by the EXPERIMENTAL DESIGN of construction period and repeatedly checking come to determine.Along with production programming extension and 7*24 hour uninterrupted volume production, if need to continue traditional test design method will waste great amount of manpower and kinetic energy consuming cost, also need production line to stop the debugging design that line (stopping volume production) carries out the test parameters value simultaneously.This method has reduced the production efficiency of volume production on the one hand, will expend great amount of manpower and kinetic energy consuming cost simultaneously.Therefore need a kind of new method dynamically to carry out the definite of the parallel rationalization of manufacturing processes and optimize.
Along with the large quantities of volume productions of plasma panel, face data magnanimity situation again.In the plasma panel manufacture process volume production process, separate unit plasma panel process of producing product device parameter is included the storage of MES system in and is reached 1.2 ten thousand, more than the every day data volume 10G, the parameter that relates to is above 9000, in quantity, have the big data characteristics of magnanimity on dimension and the data generation speed, press for a kind of new method of invention more and dynamically carry out the definite of the parallel rationalization of manufacturing processes and optimize.
The present invention launches under should this background.
Summary of the invention
The invention provides the definite and optimization method of LPT device parameter in a kind of plasma panel manufacture process, by utilizing the manufacture process historical data, set up the relativity model of the pre-set parameter of LPT device in the plasma panel manufacture process, utilization is in the yield difference between the different settings under the identical parameters between LPT device, the influence degree that reflects pre-set parameter article on plasma display screen quality, and find the lifting PDP display to produce the regulation and control strategy of the apparatus parameter setting value of yield, finally form the parallel definite method rationalized of a kind of plasma panel manufacturing processes.
The technical solution adopted for the present invention to solve the technical problems is: the parallel definite method rationalized of a kind of plasma panel manufacturing processes comprises the steps:
Step 1, according to operation the LPT device in the operation is divided into groups;
Step 2, to the different LPT devices in every group in the yield statistics that guarantees to carry out respectively under the approximate production status PDP display;
Step 3, the different LPT devices in every group are carried out the conspicuousness test, calculate actual performance difference;
Step 4, the result of calculation interval of actual performance difference is judged:
(1) if the result of calculation interval comprises 0, illustrate that then the actual performance difference of individual device under the current set point is significantly not different, the parameter of individual device remains unchanged;
(2) if the result of calculation interval does not comprise 0, the actual performance significant difference difference of individual device under the current set point is described then, the pre-set parameter of equipment that need yield is low is adjusted into the corresponding pre-set parameter of the high equipment of yield.
Compared with prior art, good effect of the present invention is: save by mode spent time and the resources costs of repetition test design with checking, promoted and determined concerning the parallel accuracy of rationalizing of the manufacturing processes of plasma panel quality; And by the new historical data accumulation after adjusting, carrying out this analytical model method of screw type recycling seeks out plasma panel and makes the parallel conductive suggestion of process operation, manufacturing technology personnel are according to recommended value, the processing apparatus parameter value that walks abreast is set, not only reach the purpose that continues spiral lifting plasma panel yields, but also reduce the percent defective of manufacture process indirectly.Simultaneously, in the use of method model, can not relate to the breaks in production of production line, avoid the unnecessary line loss of stopping to lose.
Embodiment
The parallel definite method rationalized of a kind of plasma panel manufacturing processes comprises the steps:
Step 1, according to operation the LPT device in the operation is divided into groups, the equipment in each group is the identical production equipment of function under same operation, because also have identical parameter group.In the production process of PDP display, an equipment group comprises 2 to 3 LPT devices usually;
Step 2, at the equipment group of above generation, the different LPT devices in each group are being guaranteed that (be the identical period, kinetic parameter is similar) under the approximate production status carries out the yield statistics of PDP display respectively;
Step 3, the different LPT devices in each group are carried out conspicuousness test:
Compare at the pre-set parameter of the LPT device yield with the PDP display on the distinct device, distinguish the LPT device that possesses remarkable performance difference based on screen quantity and yield by each LPT device, concrete conspicuousness method of testing is as follows:
(1) be calculated as follows variance:
The approximate account form of list portion equipment variance is:
Figure 2013101611879100002DEST_PATH_IMAGE001
1-e wherein iBe yield;
(2) calculate the accumulation variance
Figure 2013101611879100002DEST_PATH_IMAGE002
:
(3) be calculated as follows actual performance difference:
Possess (1-α) on reliability, the actual performance difference of two equipment is:
Figure 2013101611879100002DEST_PATH_IMAGE003
Wherein, the observation yield difference between the d indication equipment, α is the yield of expectation, Z α/2Be illustrated under the current yield condition, be distributed as the probability of benchmark with current yield.
Step 4, the result of calculation interval of actual performance difference is judged:
(1) if the result of calculation interval comprises 0, illustrate that then the actual performance difference of individual device under the current set point is significantly not different, the parameter of individual device remains unchanged;
(2) if the result of calculation interval does not comprise 0, the actual performance significant difference difference of individual device under the current set point is described then, the pre-set parameter of equipment that need yield is low is adjusted into the corresponding pre-set parameter of the high equipment of yield.
The inventive method illustrates as follows:
With two LPT device M 1And M 2Be example, it is as follows to carry out the conspicuousness method of testing:
Equipment M 1Yield (g in a measurement period 1) be 85%, pass through M 1Screen quantity n 1It is 30;
Equipment M 2Yield (g in a measurement period 2) be 75%, pass through M 2Screen quantity n 2It is 5000;
When the quantity of screen reaches certain value (usually 30) when above, yield be scattered in a normal distribution, that is:
e 1=1-g 1~N (μ 1, σ 1), wherein, μ 1Be the average on the M1, σ 1Be the variance on the M1;
e 2=1-g 2~N (μ 2, σ 2), wherein, μ 2Be the average on the M2, σ 2Be the variance on the M2;
The approximate account form of variance is:
Figure 2013101611879100002DEST_PATH_IMAGE004
For testing the statistical significance of two LPT device performance differences, namely real yield difference needs to calculate the variance of accumulation
Figure 2013101611879100002DEST_PATH_IMAGE005
Possess (1-α) on reliability, the actual performance difference of two kinds of equipment is:
Figure 2013101611879100002DEST_PATH_IMAGE006
Wherein, the observation yield difference between the d indication equipment, α is the yield of expectation, Z α/2Be illustrated under the current yield condition, be distributed as the probability of benchmark with current yield.
Wherein the value of Z can be learnt by following self-confident kilsyth basalt:
1-α 0.99 0.98 0.95 0.90
[0041]?
Z 2.58 2.33 1.96 1.65
This table is by supposing that yield is the ready-made form under the normal distribution.
Therefore to possess 95% from reliability, namely 1-α=0.95 is shown to obtain by inquiring about: Z α/2=1.96, the value of each computational element has in this example:
d=|e 1-e 2|=0.1
σ ^ t = 0.15 ( 1 - 0.15 ) 30 + 0.25 ( 1 - 0.25 ) 5000 = 0.0043
95% under reliability, with Z α/2=1.96 substitution actual performance difference computing formula can get:
d t = 0.100 ± 1.96 × 0.0043 = 0.100 ± 0.128 ,
Find that following formula result of calculation interval comprises 0, significantly not different under actual performance difference although can determine that two equipment are variant on the yield statistics under the current set point, therefore do not have M 2Set point is to M 1Change.
On three equipment, can as above compare any two equipment wherein, obtain having the equipment that has parameter to arrange most at last.

Claims (2)

1. the parallel definite method of rationalizing of plasma panel manufacturing processes is characterized in that: comprise the steps:
Step 1, according to operation the LPT device in the operation is divided into groups;
Step 2, to the different LPT devices in every group in the yield statistics that guarantees to carry out respectively under the approximate production status PDP display;
Step 3, the different LPT devices in every group are carried out the conspicuousness test, calculate actual performance difference;
Step 4, the result of calculation interval of actual performance difference is judged:
(1) if the result of calculation interval comprises 0, illustrate that then the actual performance difference of individual device under the current set point is significantly not different, the parameter of individual device remains unchanged;
(2) if the result of calculation interval does not comprise 0, the actual performance significant difference difference of individual device under the current set point is described then, the pre-set parameter of equipment that need yield is low is adjusted into the corresponding pre-set parameter of the high equipment of yield.
2. the parallel definite method rationalized of plasma panel manufacturing processes according to claim 1 is characterized in that: step 3 is described, and that different LPT devices in every group are carried out the method for conspicuousness test is as follows:
(1) variance of calculating single device;
(2) calculate the accumulation variance
Figure 2013101611879100001DEST_PATH_IMAGE001
:
(3) be calculated as follows actual performance difference:
Figure 2013101611879100001DEST_PATH_IMAGE002
In the formula, the observation yield difference between the d indication equipment, α is the yield of expectation, Z α/2Be illustrated under the current yield condition, be distributed as the probability of benchmark with current yield.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113168170A (en) * 2019-05-22 2021-07-23 株式会社东芝 Manufacturing condition output device, quality management system, and program
WO2021237748A1 (en) * 2020-05-29 2021-12-02 西门子(中国)有限公司 Production line planning method and device thereof

Citations (5)

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Publication number Priority date Publication date Assignee Title
WO2004055877A1 (en) * 2002-12-17 2004-07-01 Tokyo Electron Limited Processing method and device
CN1916796A (en) * 2005-08-16 2007-02-21 力晶半导体股份有限公司 System and method for controlling batches in layers of reaction chamber
CN101794115A (en) * 2010-03-08 2010-08-04 清华大学 Scheduling rule intelligent excavating method based on rule parameter global coordination optimization
CN102360178A (en) * 2011-08-16 2012-02-22 上海交通大学 Dynamic control method for grouping of hybrid parallel machine and work shop
CN102929148A (en) * 2012-10-26 2013-02-13 西安电子科技大学 Multiple product production mode statistical process control method based on T-K control chart

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004055877A1 (en) * 2002-12-17 2004-07-01 Tokyo Electron Limited Processing method and device
CN1916796A (en) * 2005-08-16 2007-02-21 力晶半导体股份有限公司 System and method for controlling batches in layers of reaction chamber
CN101794115A (en) * 2010-03-08 2010-08-04 清华大学 Scheduling rule intelligent excavating method based on rule parameter global coordination optimization
CN102360178A (en) * 2011-08-16 2012-02-22 上海交通大学 Dynamic control method for grouping of hybrid parallel machine and work shop
CN102929148A (en) * 2012-10-26 2013-02-13 西安电子科技大学 Multiple product production mode statistical process control method based on T-K control chart

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113168170A (en) * 2019-05-22 2021-07-23 株式会社东芝 Manufacturing condition output device, quality management system, and program
WO2021237748A1 (en) * 2020-05-29 2021-12-02 西门子(中国)有限公司 Production line planning method and device thereof

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Address before: Changhong Industrial Park, 186 No. 621000 Sichuan city in Mianyang Province Economic Development Zone Avenue in the middle of mianzhou

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Denomination of invention: Determination method of process parallel rationalization in plasma display panel manufacturing process

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