CN103230892B - Self-cleaning system for hydrophilicity and hydrophobicity analysis resin and cleaning method - Google Patents
Self-cleaning system for hydrophilicity and hydrophobicity analysis resin and cleaning method Download PDFInfo
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- CN103230892B CN103230892B CN201310118023.8A CN201310118023A CN103230892B CN 103230892 B CN103230892 B CN 103230892B CN 201310118023 A CN201310118023 A CN 201310118023A CN 103230892 B CN103230892 B CN 103230892B
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Abstract
The invention relates to a self-cleaning system for a hydrophilicity and hydrophobicity analysis resin and a cleaning method, and belongs to the technical field of analysis resin cleaning. The self-cleaning system comprises a cleaning column, a PLC (programmable logic controller), an alkali liquor tank, an acid liquor tank, a pure water tank, a cleaning solution delivery pump, an on-line pH instrument and a waste liquor tank. An upward flow cleaning mode is adopted for the resin in the cleaning column; alternate cleaning is performed in a sequence of alkali, water, acid and water; electromagnetic valves are used for switching cleaning solutions and controlling the cleaning time of the different cleaning solutions; and water outlet of each cleaning solution is detected by the on-line pH instrument, if the concentration of the cleaning solution reaches the standard, feedback is performed to the PLC which starts timing for the cleaning solution, and the cleaning solution is switched until set time is over. In order to ensure that the cleaned resin is not exposed in the air, the cleaning water outlet is discharged in an overflow mode, and the cleaning waste liquor is discharged after thorough mixing and neutralization in the waste liquor tank, so that waste liquor pollution is reduced.
Description
Technical field
The invention belongs to and analyze resin cleaning technique field, particularly a kind of for the resin analyzed with detect organic matter hydrophilic and hydrophobic in water body, the present invention is exactly a kind of automatic cleaning system for cleaning this special resin and cleaning method.
Background technology
Hydrophilic and hydrophobic analyze resin for detecting the hydrophilic and hydrophobic of Organic substance in water, due to this kind of resin price costly, so usually by cleaning resin reach reusable object.Traditional cleaning method is, by resin to be cleaned wet dress post, alternately embathed below the different cleaning fluids such as alkali, water, acid to the mode of stream by cleaning fluid delivery pump, wherein the switching alternation procedure of cleaning fluid and the control of cleaning volume all need manual operation, it is loaded down with trivial details that this cleaning way is subject to cleaning process, cleaning airtight condition difference and clean the restriction of the problems such as insufficient, make the conventional method of manual cleaning resin need to drop into a large amount of energy and times, and still there will be the not good situation of cleaning performance.Therefore, the automatic cleaning system designing a kind of hydrophilic and hydrophobic analysis resin can solve this kind of problem.
Summary of the invention
The object of the invention is, provide a kind of automatic cleaning system and the cleaning method of hydrophilic and hydrophobic being analyzed to resin, to improve resin cleaning performance and efficiency.
A kind of hydrophilic and hydrophobic of the present invention analyzes resin automatic cleaning system for achieving the above object, it is characterized in that, comprise cleaning post, Programmable Logic Controller, alkali liquid tank, acid solution tank, pure water tank, cleaning fluid delivery pump, online pH instrument and waste liquid tank, alkali liquid tank, acid solution tank, pure water tank is respectively by magnetic valve-1, magnetic valve-2, magnetic valve-3 arranged side by side connection with cleaning fluid delivery pump communicates, cleaning fluid delivery pump is connected with the water inlet of cleaning post, the delivery port of cleaning post is connected with waste liquid tank by online pH instrument, with online pH instrument while of Programmable Logic Controller, cleaning fluid delivery pump, magnetic valve-1, magnetic valve-2, magnetic valve-3 connects,
Cleaning post comprises four part upper covers, cylinder, collet, screen cloth.
Upper cover center is provided with delivery port, has height space in lid, still has liquid above the resin expanded during for ensureing to clean, and avoid resin drying and by air pollution, be provided with Kato to push down screen cloth in simultaneously at the bottom of upper cover lid, when avoiding cleaning, liquid stream makes screen cloth float.
Cylinder is provided with graduation mark from bottom to top, distance is also left in the upper end of the maximum scale linear distance cylinder on top, column body is respectively provided with holder layer up and down with device screen cloth, two drag for cleaning space between layer, and during the post cleaning of resin dress, resin humid volume is no more than maximum groove, ensure resin dress post quiet heavy after water surface elevation higher than resin height, in case the air-dry pollution of resin, leave certain expansion space when cleaning simultaneously, resin is fully contacted with cleaning fluid.
The center of collet is provided with water inlet, water inlet is also provided with check-valves, collet inner upper end is also provided with Kato in order to fixed grit, leave in collet after spatial altitude makes cleaning fluid enter and be evenly distributed, at the end of cleaning, close check-valves, to avoid liquid in post to flow back to cleaning fluid storage tank, pollute cleaning fluid.
Screen cloth is respectively put one up and down prevent resin from flowing out cylinder, namely between the Kato and the Kato on cylinder top of upper cover, is equipped with a screen cloth; Another screen cloth is equipped with between the Kato of the Kato on collet top and cylinder bottom.Hydrophilic and hydrophobic analyzes the particle diameter of resin roughly in 40 ~ 60 orders (being greater than 250 μm) scope, and in case situations such as resin breaks, dissolving deformations, mesh size generally gets 200 orders (being about 75 μm) below, and screen thickness is preferably 0.1 ~ 0.3 times of column diameter.
Above-mentioned hydrophilic and hydrophobic analysis resin automatic cleaning system is adopted to carry out the method for cleaning, its cleaning process is shown in accompanying drawing 1, resin adopts the cleaning way of upward flow in cleaning post, alternately cleaning is carried out with the order of alkali, water, acid, water, cleaning fluid and the scavenging period regulating and controlling different cleaning fluid is switched by magnetic valve, the water outlet of cleaning fluid detects through online pH instrument, if concentration of lotion is up to standard, feeds back to Programmable Logic Controller and starts timing to cleaning fluid, until switch cleaning fluid after completing setting-up time.For resin after ensureing cleaning does not expose in atmosphere, cleaning water outlet is discharged with the form of overflow, cleaning waste liquid in waste liquid tank fully in mixing with rear discharge to reduce waste liquor contamination, concrete operations comprise the steps:
(1) first resin to be cleaned and pure water mixing are loaded in resin cleaning post, to ensure after settlement stability liquid level higher than 1 ~ 2cm above resin and resin humid volume V below maximum scale line, there are enough expansion spaces during to guarantee cleaning, resin is contacted with cleaning fluid fully;
(2) clean alkali lye and adopt 0.1-1M(preferred 0.1M) NaOH or KOH, cleaning acid solution adopts 0.1-1M(preferred 0.1M) HCl, pure water is in order to wash away organic impurities and the acid of stripping, alkaline cleaner, cleaning process is, cleaning fluid in storage tank enters cleaning post with the constant speed of 15 ~ 30V/h under the effect of delivery pump, the consumption of cleaning fluid is at least followed successively by NaOH or the KOH cleaning fluid of 6V, the pure water of 3V, the HCl cleaning fluid of 2V, the pure water of 8V, complete a cleaning process since then, check before each system cloud gray model whether cleaning fluid storage tank cleaning liquid inside volume is greater than 55V, ensure the fluency of cleaning, the volume of cleaning fluid is regulated by time of delivery, time of delivery is realized by the feedback of online pH instrument and keying magnetic valve by Programmable Logic Controller, concrete regulation process is as follows: when cleaning starts, all magnetic valves are all in closed condition, then opens solenoid valve-1, cleaning alkali lye in alkali liquid tank is transported to cleaning post, as cleaning fluid water outlet pH>12, Programmable Logic Controller starts timing, when reaching the setting-up time of cleaning alkali lye when running, shut electromagnetic valve-1, opens solenoid valve-2, in pure water tank, pure water is transported to cleaning post, as cleaning fluid water outlet pH<8, Programmable Logic Controller starts timing, when reaching the setting-up time of pure water running time, shut electromagnetic valve-2, opens solenoid valve-3, clean acid solution in acid solution tank and be transported to cleaning post, as cleaning fluid water outlet pH<2, Programmable Logic Controller starts timing, when reaching the setting-up time of cleaning acid solution running time, shut electromagnetic valve-3, opens solenoid valve-2, pure water is transported to cleaning post again, as cleaning fluid water outlet pH>6, Programmable Logic Controller starts timing, operation reaches setting-up time, complete wash phase since then one time, cleaning fluid setting-up time=cleaning fluid volume/cleaning fluid setting flow velocity,
(3) often carry out UV detection all over the overflow water outlet taking-up at the end of cleaning process, if still have organic matter to detect, then show that cleaning is thorough, step (2) need be repeated, if detect without organic matter, then clean thoroughly, cleaning can be stopped; At the end of cleaning, close check-valves, to avoid liquid in post to flow back to cleaning fluid storage tank, pollute cleaning fluid.
After this can take identical wash number to the resin of pollution situation of the same race, wash number is different because of resinous type and resin stain degree.
(4) clean waste liquid in waste liquid tank in and dilution after discharge again, reduce cleaning waste liquid exhaust emission, all need after each system cloud gray model completes to carry out toppling over of waste liquid tank.
Advantage of the present invention:
1, the present invention adopts whole-process automatic cleaning process, and while saving a large amount of manpower, the quality that improve resin cleaning is quantity.
2, in cleaning process, the flow direction of cleaning fluid is upward flow, has compared following advantage to stream down: 1. bubble can be driven out of in lessivation, to avoid the contaminating impurity resin in bubble with traditional.2. resin is owing to being subject to and the Action of Gravity Field of upward flow pressure reversal and more easily disperseing in lessivation, the contact area between leacheate and resin is greater than lower to stream drip washing, cleans more abundant.3. the control of cleaning just can be completed by means of only a cleaning fluid delivery pump, wherein water inlet cleaning rate is by the rotational speed regulation of intake pump, and the discharge of cleaning fluid can directly have been come by overflow, to avoid additionally installing the Inlet and outlet water speed difference problem that draining pump brings, save the arrangement of positive displacement pump simultaneously.
3, for the entire flow of a resin cleaning, the feed liquor constant airspeed of cleaning fluid, therefore device only need be provided with a cleaning fluid delivery pump without the need to changing rotating speed, the switching of different cleaning fluid and feed liquor volume are then by opening and closing lower-cost magnetic valve to control.
4, after cleaning post, be provided with online pH instrument, can detect cleaning fluid and whether reach cleaning concentration, occur back mixing and cutout when avoiding cleaning fluid to replace, thus cause concentration of lotion inadequate, cleaning performance is undesirable.
5, alkali, sour cleaning fluid can better neutralize and dilute by waste liquid tank arrange mutually, and the pollution of discharging of waste liquid is reduced.
Accompanying drawing explanation
Accompanying drawing 1 is the service chart of this contrive equipment, and accompanying drawing 2 is design diagrams of cleaning post
Detailed description of the invention
Lift two examples below and the specific embodiment of the present invention is described, but claim scope of the present invention is not limited thereto.Purging system and the flow process of following examples are shown in Fig. 1, and Fig. 2 is shown in by cleaning post used.
Example 1:
In this example, resin to be cleaned is the XAD-4 type resin that Rhom and Hass produces, and resin humid volume is 1L, and the cleaning post that maximum scale is 1L chosen by cleaning post.Resin is mixed with pure water and fills post and make resin humid volume be no more than maximum scale line and make pure water liquid level higher than resin settled stabilising surface at least 2cm.After dress post completes, after opening cleaning post check-valves, starting cleaning fluid delivery pump makes cleaning fluid flow velocity be 15L/h, now enter wash phase: opens solenoid valve-1, the cleaning alkali lye NaOH of 0.1M is transported to cleaning post, as cleaning fluid water outlet pH>12, Programmable Logic Controller starts timing, after 24min, NaOH passes through 6L, shut electromagnetic valve-1, opens solenoid valve-2, pure water is transported to cleaning post, as cleaning fluid water outlet pH<8, Programmable Logic Controller starts timing, after 12min, pure water passes through 3L, shut electromagnetic valve-2, opens solenoid valve-3, the cleaning acid solution HCl of 0.1M is transported to cleaning post, as cleaning fluid water outlet pH<2, Programmable Logic Controller starts timing, after 8min, HCl passes through 2L, shut electromagnetic valve-3, opens solenoid valve-2, pure water is transported to cleaning post again, as cleaning fluid water outlet pH>6, Programmable Logic Controller starts timing, after 32min, pure water passes through 8L, complete wash phase since then one time.After completing cleaning, UV detection is carried out to the water outlet of pure water cleaning fluid, if there is organic matter to detect in water sample, then the complete repeated washing stage, until detect without organic matter, now stop cleaning, after this XAD-4 resin of pollution condition of the same race all cleans identical pass and qualified.In cleaning process, the keying of each device is by Controlled by Programmable Controller.
Example 2:
In this example, resin to be cleaned is the XAD-8 type resin that Rhom and Hass produces, and resin humid volume is 10mL, and the cleaning post that maximum scale is 10mL chosen by cleaning post.Resin is mixed with pure water and fills post and make resin humid volume be no more than maximum scale line and make pure water liquid level higher than resin settled stabilising surface at least 2cm.After dress post completes, after opening cleaning post check-valves, starting cleaning fluid delivery pump makes cleaning fluid flow velocity be 30mL/h, now enter wash phase: opens solenoid valve-1, the cleaning alkali lye NaOH of 0.1M is transported to cleaning post, as cleaning fluid water outlet pH>12, Programmable Logic Controller starts timing, after 12min, NaOH passes through 60mL, shut electromagnetic valve-1, opens solenoid valve-2, pure water is transported to cleaning post, as cleaning fluid water outlet pH<8, Programmable Logic Controller starts timing, after 6min, pure water passes through 30mL, shut electromagnetic valve-2, opens solenoid valve-3, the cleaning acid solution HCl of 0.1M is transported to cleaning post, as cleaning fluid water outlet pH<2, Programmable Logic Controller starts timing, after 4min, HCl passes through 20mL, shut electromagnetic valve-3, opens solenoid valve-2, pure water is transported to cleaning post again, as cleaning fluid water outlet pH>6, Programmable Logic Controller starts timing, after 16min, pure water passes through 80mL, complete wash phase since then one time.After completing cleaning, UV detection is carried out to the water outlet of pure water cleaning fluid, if there is organic matter to detect in water sample, then the complete repeated washing stage, until detect without organic matter, now stop the XAD-8 resin of cleaning after this pollution condition of the same race all to clean identical pass and qualified.In cleaning process, the keying of each device is by Controlled by Programmable Controller.
Claims (5)
1. a hydrophilic and hydrophobic analyzes resin automatic cleaning system, it is characterized in that, comprise cleaning post, Programmable Logic Controller, alkali liquid tank, acid solution tank, pure water tank, cleaning fluid delivery pump, online pH instrument and waste liquid tank, alkali liquid tank, acid solution tank, pure water tank is respectively by magnetic valve-1, magnetic valve-2, magnetic valve-3 arranged side by side connection with cleaning fluid delivery pump communicates, cleaning fluid delivery pump is connected with the water inlet of cleaning post, the delivery port of cleaning post is connected with waste liquid tank by online pH instrument, with online pH instrument while of Programmable Logic Controller, cleaning fluid delivery pump, magnetic valve-1, magnetic valve-2, magnetic valve-3 connects,
Cleaning post comprises upper cover, cylinder, collet, screen cloth;
Upper cover center is provided with delivery port, has height space in lid, is provided with Kato to push down screen cloth in simultaneously at the bottom of upper cover lid, and when avoiding cleaning, liquid stream makes screen cloth float;
Cylinder is provided with graduation mark from bottom to top, distance is also left in the upper end of the maximum scale linear distance cylinder on top, column body is respectively provided with holder layer up and down with device screen cloth, be cleaning space between two holder layers, during the post cleaning of resin dress, resin humid volume is no more than maximum groove, ensure resin dress post quiet heavy after water surface elevation higher than resin height;
The center of collet is provided with water inlet, and water inlet is also provided with check-valves, and collet inner upper end is also provided with Kato in order to fixed grit, leaves after spatial altitude makes cleaning fluid enter and be evenly distributed in collet;
Screen cloth is respectively put one up and down prevent resin from flowing out cylinder, namely between the Kato and the Kato on cylinder top of upper cover, is equipped with a screen cloth; Another screen cloth is equipped with between the Kato of the Kato on collet top and cylinder bottom.
2. analyze resin automatic cleaning system according to a kind of hydrophilic and hydrophobic of claim 1, it is characterized in that, mesh size gets below 200 orders.
3. analyze resin automatic cleaning system according to a kind of hydrophilic and hydrophobic of claim 1, it is characterized in that, screen thickness is 0.1 ~ 0.3 times of column diameter.
4. adopt the hydrophilic and hydrophobic of claim 1 analysis resin automatic cleaning system to carry out the method for cleaning, it is characterized in that, resin adopts the cleaning way of upward flow in cleaning post, alternately cleaning is carried out with the order of alkali, water, acid, water, cleaning fluid and the scavenging period regulating and controlling different cleaning fluid is switched by magnetic valve, the water outlet of cleaning fluid detects through online pH instrument, if concentration of lotion is up to standard, feeds back to Programmable Logic Controller and timing is started to cleaning fluid, until switch cleaning fluid after completing setting-up time; Cleaning water outlet is discharged with the form of overflow, cleaning waste liquid in waste liquid tank fully in mixing with rear discharge to reduce waste liquor contamination, concrete operations comprise the steps:
(1) first resin to be cleaned and pure water mixing are loaded in resin cleaning post, to ensure after settlement stability liquid level higher than 1 ~ 2cm above resin and resin humid volume V below maximum scale line;
(2) NaOH or KOH that alkali lye adopts 0.1-1M is cleaned, cleaning acid solution adopts the HCl of 0.1-1M, pure water is in order to wash away organic impurities and the acid of stripping, alkaline cleaner, cleaning process is, cleaning fluid in storage tank enters cleaning post with the constant speed of 15 ~ 30V/h under the effect of delivery pump, the consumption of cleaning fluid is at least followed successively by the NaOH cleaning fluid of 6V, the pure water of 3V, the HCl cleaning fluid of 2V, the pure water of 8V, complete a cleaning process since then, check before each system cloud gray model whether cleaning fluid storage tank cleaning liquid inside volume is greater than 55V, ensure the fluency of cleaning, the volume of cleaning fluid is regulated by time of delivery, time of delivery is realized by the feedback of online pH instrument and keying magnetic valve by Programmable Logic Controller, concrete regulation process is as follows: when cleaning starts, all magnetic valves are all in closed condition, then opens solenoid valve-1, cleaning alkali lye in alkali liquid tank is transported to cleaning post, as cleaning fluid water outlet pH>12, Programmable Logic Controller starts timing, when reaching the setting-up time of cleaning alkali lye when running, shut electromagnetic valve-1, opens solenoid valve-2, in pure water tank, pure water is transported to cleaning post, as cleaning fluid water outlet pH<8, Programmable Logic Controller starts timing, when reaching the setting-up time of pure water running time, shut electromagnetic valve-2, opens solenoid valve-3, clean acid solution in acid solution tank and be transported to cleaning post, as cleaning fluid water outlet pH<2, Programmable Logic Controller starts timing, when reaching the setting-up time of cleaning acid solution running time, shut electromagnetic valve-3, opens solenoid valve-2, pure water is transported to cleaning post again, as cleaning fluid water outlet pH>6, Programmable Logic Controller starts timing, operation reaches setting-up time, complete wash phase since then one time, cleaning fluid setting-up time=cleaning fluid volume/cleaning fluid setting flow velocity,
(3) often carry out UV detection all over the overflow water outlet taking-up at the end of cleaning process, if still have organic matter to detect, then show that cleaning is thorough, step (2) need be repeated, if detect without organic matter, then clean thoroughly, stop cleaning; At the end of cleaning, close check-valves, to avoid liquid in post to flow back to cleaning fluid storage tank, pollute cleaning fluid;
(4) clean waste liquid in waste liquid tank in and dilution after discharge again, all need after each system cloud gray model completes to carry out toppling over of waste liquid tank.
5. according to the method for claim 4, it is characterized in that, the concentration of cleaning alkali lye is 0.1M, and the concentration of cleaning acid solution is 0.1M.
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| CN110095331A (en) * | 2018-01-29 | 2019-08-06 | 中国辐射防护研究院 | A kind of the experiment pretreatment unit and preprocess method of unused resin |
| CN110563085A (en) * | 2019-09-19 | 2019-12-13 | 西安热工研究院有限公司 | Intelligent resin scrubbing end point detection device and method |
| CN110860517B (en) * | 2019-12-03 | 2023-09-15 | 浙江华康药业股份有限公司 | Ion exchange resin cleaning system and cleaning method |
| CN112092236A (en) * | 2020-05-06 | 2020-12-18 | 北京机械设备研究所 | Resin pretreatment device and method |
| CN112691971B (en) * | 2020-12-10 | 2022-08-05 | 深圳信息职业技术学院 | Deep cleaning device and method for microporous resin |
| CN113716749A (en) * | 2021-09-09 | 2021-11-30 | 胡建康 | Method for removing COD (chemical oxygen demand) in high-salinity wastewater |
| CN114235910A (en) * | 2021-12-21 | 2022-03-25 | 重庆文理学院 | Elastomer pH meter |
| CN115178543B (en) * | 2022-07-22 | 2023-08-18 | 东风柳州汽车有限公司 | Cleaning method of water-based paint conveying system |
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| EP0599003A1 (en) * | 1992-11-26 | 1994-06-01 | Gütling Gmbh | Apparatus and process for regeneration of an ion-exchange installation |
| JP4167257B2 (en) * | 2001-02-09 | 2008-10-15 | エア プロダクツ アンド ケミカルズ インク． | Residue removal composition |
| TW200426117A (en) * | 2002-12-18 | 2004-12-01 | Rohm & Haas | Water treatment system with low waste volume |
| JP4671419B2 (en) * | 2003-12-15 | 2011-04-20 | 旭化成ケミカルズ株式会社 | Porous molded body and method for producing the same |
| CN102285704B (en) * | 2010-07-30 | 2013-07-03 | 深圳东江华瑞科技有限公司 | Ion exchange resin arsenic removal method for acidic etching liquid, resin regeneration method and treatment system thereof |
| CN201912794U (en) * | 2010-09-17 | 2011-08-03 | 北京工业大学 | Tower plate ion exchange or adsorbent resin column suitable for industrial scale |
| CN102489346B (en) * | 2011-11-16 | 2013-11-27 | 兰州陇能电力科技有限公司 | Method for separation and regeneration of anion and cation resin in exhausted mixed bed |
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