CN103205682A - Indirect alignment method for mask assembly - Google Patents
Indirect alignment method for mask assembly Download PDFInfo
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- CN103205682A CN103205682A CN2012100106952A CN201210010695A CN103205682A CN 103205682 A CN103205682 A CN 103205682A CN 2012100106952 A CN2012100106952 A CN 2012100106952A CN 201210010695 A CN201210010695 A CN 201210010695A CN 103205682 A CN103205682 A CN 103205682A
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- mask
- contraposition
- registration holes
- plate
- mask frame
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Abstract
The invention discloses an indirect alignment method for a mask assembly. The method comprises the steps of: placing a mask frame on an alignment base, and bringing the mask frame and alignment pins into alignment; placing an alignment auxiliary plate on the mask frame and making it fixed relatively to the alignment base, and making alignment holes on the alignment auxiliary plate correspond to an alignment hole on the mask frame; capturing the position images of the alignment holes on the alignment auxiliary plate and the mask frame through CCD, and measuring the positional deviation L of corresponding two positioning holes; adjusting positions of the alignment pins to slightly adjust the mask frame position so as to make L less than or equal to 15 micrometers; removing the alignment auxiliary plate, putting a mask plate on the mask frame and fixing the mask plate on the alignment base; and capturing position images of mask plate alignment holes and the corresponding mask frame alignment holes through CCD, detecting whether the former are shielded by rims of the latter, and if the former are shielded, repeating the above steps till the mask plate alignment holes become through holes completely.
Description
Technical field
The present invention relates to a kind of mask assembly to method for position, relate in particular to the method for the indirect contraposition of a kind of mask assembly.
Background technology
Organic electroluminescent device (OLED) is wide because of its visual angle, cost is low, manufacturing process is simple, resolving power is high and provide characteristics such as luminous for oneself, receives much concern, and is regarded as making the emerging utilisation technology of follow-on flat-panel screens.
Aspect the vacuum deposition apparatus of making organic electroluminescent device, in the bottom crucible that holds organic materials is set, the well heater that uses organic materials heating, evaporation is set in the outside of crucible.In evaporation coating device, the insulating element of the chuck of relative configuration with crucible and double team glass substrate is set and makes this substrate installation remain on the substrate fixture of the bottom surface of chuck.Chuck is to be plane flat board be used to keeping glass substrate, in the substrate folder hoisting appliance is set, and is provided with anchor clamps at hoisting appliance, by anchor clamps permanent mask framework, makes it with respect to position deviation control of substrate within the specific limits, has limitation.Lift dog makes mask assembly near substrate.
And when making organic illuminating element, on substrate, the pixel of every 10um width must be arranged side by side with the luminescent part of red, green, blue, each locations of pixels precision is necessary for ± and the degree of 5um; Because it is in the evaporate process, temperature constantly raises, and is subjected to the influence of sheet material expanded by heating, and mask assembly can produce position deviation with respect to substrate, therefore very high to the position accuracy demand of vacuum deposition apparatus mask again.
Be to carry out contraposition by the loci on the mask plate and substrate during evaporated device on the mask assembly, because there is limitation in the position debugging scope of mask frame, mask plate is welded on the mask frame again, make that only carrying out contraposition by mask plate loci and substrate can't satisfy position accuracy demand, so must guarantee that the position deviation of mask plate and mask frame also will control within the specific limits.
When mask plate and mask frame carry out contraposition, the general employing made the Mark(loci respectively on mask plate 03 and mask frame 02) method of A, B, the site plan by the A of CCD, B looks like to catch, as shown in Figure 1, the two center of A, B is overlapped, finish the contraposition of the two.
Owing to be to carry out contraposition by the loci A on the mask plate 03 and substrate during evaporated device on the mask assembly, Mark point on the mask plate 03 of Mark point B on the mask frame 02 produces and blocks, just require the diameter of the Mark point A on the mask plate 03 to be less than the diameter of the Mark point B on the mask frame 02, Mark point A in the time of could guaranteeing the evaporation contraposition like this on the mask plate 03 is entirely through hole, contrast gradient is obvious, thereby makes the aligning accuracy height of mask plate 03 and substrate.
Yet, when mask plate and mask frame carry out contraposition, carrying out location graphic by the A of CCD, B catches, the CCD visual angle from top to bottom, at first capture the site plan picture of A, if the diameter of B greater than the diameter of A, the difficult site plan picture that captures B of CCD, just brought difficulty for mask plate 03 and the contraposition of mask frame 02, so that influence the aligning accuracy of mask plate and mask frame like this.
Summary of the invention
The present invention is intended to solve the technical problem that makes mask plate and the accurate contraposition of mask frame when the diameter of mask plate registration holes during less than the diameter of mask frame registration holes.
For solving the problems of the technologies described above, the invention discloses a kind of method for the indirect contraposition of mask assembly, may further comprise the steps: S1, mask frame is lain in a horizontal plane on the contraposition base station, mask frame is alignd with contraposition pin on the contraposition base station; S2, the contraposition accessory plate lain in a horizontal plane on the mask frame and with contraposition base station relative fixed, and make the registration holes A of contraposition accessory plate
1Corresponding with corresponding registration holes B on the mask frame; S3, catch the site plan picture of registration holes on contraposition accessory plate and the mask frame from top to bottom by CCD, and measure registration holes A
1Relative position deviation L with registration holes B; S4, if L 15 μ m, the position of then adjusting the contraposition pin with the position of trim mask framework until L≤15 μ m, if L≤15 μ m then directly carry out subsequent step; S5, the contraposition accessory plate is taken off from the contraposition base station, and lie in a horizontal plane in mask plate on the mask frame and be fixed on the contraposition base station; And S6, the site plan picture of registration holes A and corresponding mask frame registration holes B that catches mask plate from top to bottom by CCD, detecting registration holes A and whether blocked by the edge of registration holes B, repeating step S2～S6 is entirely through hole until registration holes A if be blocked then.Wherein, the diameter of the registration holes A of mask plate is less than the diameter of the registration holes B of mask frame, and the registration holes A of contraposition accessory plate is identical with the diameter of registration holes B.
Provided by the inventionly indirectly can guarantee mask plate and the accurate contraposition of mask frame under diameter in the mask plate registration holes is less than the situation of the diameter of mask frame registration holes to method for position, thereby the mask plate registration holes is through hole when mask assembly and the contraposition of evaporation substrate.
Description of drawings
The synoptic diagram of the registration holes when Fig. 1 illustrates the direct contraposition of mask plate and mask frame, the wherein registration holes of the registration holes on the A-mask plate, B-mask frame;
Fig. 2 illustrates a synoptic diagram contraposition base station of mask assembly direct contraposition on base station, wherein
The 01-mask frame
The 02-mask plate
04A-mask plate registration holes
04B-mask frame registration holes
05A-mask plate registration holes
05B-mask frame registration holes
06～08-finely tunes pin;
Fig. 3 illustrates another synoptic diagram of mask assembly direct contraposition on base station, wherein 01-contraposition base station
The 02-mask frame
The 03-mask plate
04A-mask plate registration holes
05A-mask plate registration holes
06～08-finely tunes pin;
Fig. 4 illustrates the synoptic diagram of the registration holes of the indirect contraposition of mask assembly, wherein A according to an embodiment of the invention
1-aligning plate registration holes
B-mask frame registration holes
The position deviation of L-aligning plate registration holes and mask frame registration holes; And
Fig. 5 illustrate aligning plate according to an embodiment of the invention on base station with the synoptic diagram of the indirect contraposition of mask frame, wherein 01-contraposition base station
The 02-mask frame
04A
1-aligning plate registration holes
05A
1-aligning plate registration holes
06～08-finely tunes pin
The 11-aligning plate.
?
Embodiment
Each preferred embodiment of the present invention below will be discussed.But it will be appreciated by those skilled in the art that herein detailed description not as limiting the scope of the invention, the present invention also can be achieved by modification or other equivalent way of following each embodiment.
The present invention relates to the method for the indirect contraposition of a kind of mask assembly, this method is carried out indirect contraposition by the contraposition accessory plate, makes the position deviation of mask plate and mask frame control at ± 15 μ m.In an example of the present invention, mask assembly can comprise mask plate and mask frame.
According to an embodiment, the method for the indirect contraposition of mask assembly can may further comprise the steps:
S1, as shown in Figure 5 mask frame is lain in a horizontal plane on the contraposition base station 01, and mask frame is close to contraposition pin 06～08 places, namely align with these contraposition pins;
S2, lie in a horizontal plane in aligning plate 11 on the mask frame 02 and both are close to, make aligning plate 11 and contraposition base station 01 relative fixed, and make the corresponding Mark point of aligning plate and mask frame corresponding;
S3, catch the site plan picture that Mark is ordered on aligning plate 11 and the mask frame 02 from top to bottom by CCD, and by graphical measurement aligning plate Mark point A
1Relative position deviation L with mask frame Mark point B;
S4, adjust the position of the contraposition pin 06～08 on the contraposition base station, so that the mask frame that is adjacent to the contraposition pin is finely tuned, make aligning plate Mark point A
1Relative position deviation L≤15 μ m with mask frame Mark point B;
S5, behind relative position deviation L≤15 μ m that mask frame 02 and the Mark of aligning plate 11 are ordered, aligning plate is taken off from the contraposition base station, lie in a horizontal plane in mask plate 03 on the mask frame 02 again and make it to be fixed on the contraposition base station 01; And
S6, catch the site plan picture of the Mark point B of mask plate Mark point A and mask frame from top to bottom by CCD, whether detect Mark point A blocks at the edge of the Mark point B of masked framework, if be blocked then repeating step S2～S6, A is entirely through hole until the Mark point.
Wherein, if before mask frame is finely tuned L≤15 μ m, then need not carry out step S4, but directly carry out subsequent step; If fine setting once can't be accomplished L≤15 μ m, then need repeating step S4 until reaching L≤15 μ m.
The plate mask of mask plate has and satisfies the opening figure zone that evaporation requires.In one example, contraposition Mark point A is two at least.In addition, the Mark of mask plate point A can be in diagonal position and be in outside the opening figure zone.The diameter of mask plate Mark point A is less than the diameter of mask frame Mark point B.Preferably, diameter≤0.5mm of Mark point A.Mask plate and mask frame are close to, and the outer edge of mask plate extends beyond the outer edge of mask frame, and can be fixed on the contraposition base station.
Position corresponding with mask plate Mark point A on the frame of mask frame has Mark point B.In one example, the diameter of B is preferably 2-3mm.
Aligning plate, except not having the opening figure that satisfies the evaporation requirement, other features are identical with mask plate.For example, aligning plate and mask plate measure-alike, aligning plate Mark point A is identical with the relative position of the Mark point A of mask plate, etc.But the diameter of aligning plate Mark point A is identical with the diameter of the Mark point B of mask frame, is beneficial to the position contraposition of mask frame and aligning plate.
Behind trim mask framework 02, the position deviation of control mask frame 02 and aligning plate 11 is at ± 15 μ m.Because aligning plate and mask plate all are fixed on the contraposition base station with the same manner, so aligning plate is consistent with the position of mask plate.When taking off after aligning plate puts mask plate 03, because the position of mask plate 03 is identical with the position of aligning plate, so the position deviation of mask plate and mask frame also is controlled in ± 15 μ m, thus the accurate contraposition of realization mask plate and mask frame.
Claims (7)
1. method that is used for the indirect contraposition of mask assembly may further comprise the steps:
S1, mask frame is lain in a horizontal plane on the contraposition base station, mask frame is alignd with contraposition pin on the contraposition base station;
S2, the contraposition accessory plate lain in a horizontal plane on the mask frame and with contraposition base station relative fixed, and make the registration holes A of contraposition accessory plate
1Corresponding with corresponding registration holes B on the mask frame;
S3, catch the site plan picture of registration holes on contraposition accessory plate and the mask frame from top to bottom by CCD, and measure registration holes A
1Relative position deviation L with registration holes B;
S4, if L 15 μ m, the position of then adjusting the contraposition pin with the position of trim mask framework until L≤15 μ m, if L≤15 μ m then directly carry out subsequent step;
S5, the contraposition accessory plate is taken off from the contraposition base station, and lie in a horizontal plane in mask plate on the mask frame and be fixed on the contraposition base station; And
Whether S6, the site plan picture of registration holes A and corresponding mask frame registration holes B that catches mask plate from top to bottom by CCD detect registration holes A and are blocked by the edge of registration holes B, and repeating step S2～S6 is entirely through hole until registration holes A if be blocked then,
Wherein, the diameter of the registration holes A of mask plate is less than the diameter of the registration holes B of mask frame, and the registration holes A of contraposition accessory plate is identical with the diameter of the registration holes B of mask frame.
2. the method for claim 1 is characterized in that, the registration holes A of mask plate is two at least.
3. method as claimed in claim 2 is characterized in that, the registration holes A of mask plate is in diagonal position, and is in outside the opening figure zone on the mask plate.
4. as each described method among the claim 1-3, it is characterized in that the registration holes A of contraposition accessory plate
1Identical with the relative position of the registration holes A of mask plate.
5. as each described method among the claim 1-3, it is characterized in that the diameter of the registration holes A of mask plate is not more than 0.5mm.
6. method as claimed in claim 5 is characterized in that, the diameter of the registration holes B of mask frame is 2-3mm.
7. the method for claim 1 is characterized in that, contraposition accessory plate and mask plate measure-alike, and this size greater than the size of mask frame so that contraposition accessory plate or mask plate can be fixed on the contraposition base station.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010695.2A CN103205682B (en) | 2012-01-16 | 2012-01-16 | The method of the indirect para-position of mask assembly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210010695.2A CN103205682B (en) | 2012-01-16 | 2012-01-16 | The method of the indirect para-position of mask assembly |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103205682A true CN103205682A (en) | 2013-07-17 |
| CN103205682B CN103205682B (en) | 2017-03-15 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210010695.2A Expired - Fee Related CN103205682B (en) | 2012-01-16 | 2012-01-16 | The method of the indirect para-position of mask assembly |
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| Country | Link |
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| CN (1) | CN103205682B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107682477A (en) * | 2017-09-25 | 2018-02-09 | 捷开通讯(深圳)有限公司 | A kind of CCD camera assembly and terminal |
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| US20050287897A1 (en) * | 2004-06-25 | 2005-12-29 | Chi Mei Optoelectronics Corp. | Method of producing display using mask alignment method |
| CN1755528A (en) * | 2004-09-27 | 2006-04-05 | 精工爱普生株式会社 | Alignment method of exposure mask and manufacturing method of thin film element substrate |
| JP2006249544A (en) * | 2005-03-14 | 2006-09-21 | Dainippon Printing Co Ltd | Reference position indicator, and metal mask position alignment device |
| CN1856743A (en) * | 2003-08-04 | 2006-11-01 | 麦克罗尼克激光***公司 | Psm alignment method and device |
| CN101090997A (en) * | 2005-02-23 | 2007-12-19 | 三井造船株式会社 | Mask aligning mechanism for film forming apparatus, and film forming apparatus |
| JP2008007857A (en) * | 2006-06-02 | 2008-01-17 | Sony Corp | Alignment device, alignment method, and manufacturing method of display device |
| CN101533225A (en) * | 2008-03-11 | 2009-09-16 | 株式会社阿迪泰克工程 | Glass mask and position alignment apparatus of mask retainer |
| JP4341385B2 (en) * | 2003-11-26 | 2009-10-07 | 凸版印刷株式会社 | Manufacturing method of vapor deposition mask |
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2012
- 2012-01-16 CN CN201210010695.2A patent/CN103205682B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1856743A (en) * | 2003-08-04 | 2006-11-01 | 麦克罗尼克激光***公司 | Psm alignment method and device |
| JP4341385B2 (en) * | 2003-11-26 | 2009-10-07 | 凸版印刷株式会社 | Manufacturing method of vapor deposition mask |
| US20050287897A1 (en) * | 2004-06-25 | 2005-12-29 | Chi Mei Optoelectronics Corp. | Method of producing display using mask alignment method |
| CN1755528A (en) * | 2004-09-27 | 2006-04-05 | 精工爱普生株式会社 | Alignment method of exposure mask and manufacturing method of thin film element substrate |
| CN101090997A (en) * | 2005-02-23 | 2007-12-19 | 三井造船株式会社 | Mask aligning mechanism for film forming apparatus, and film forming apparatus |
| JP2006249544A (en) * | 2005-03-14 | 2006-09-21 | Dainippon Printing Co Ltd | Reference position indicator, and metal mask position alignment device |
| JP2008007857A (en) * | 2006-06-02 | 2008-01-17 | Sony Corp | Alignment device, alignment method, and manufacturing method of display device |
| CN101533225A (en) * | 2008-03-11 | 2009-09-16 | 株式会社阿迪泰克工程 | Glass mask and position alignment apparatus of mask retainer |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107682477A (en) * | 2017-09-25 | 2018-02-09 | 捷开通讯(深圳)有限公司 | A kind of CCD camera assembly and terminal |
| CN107682477B (en) * | 2017-09-25 | 2021-02-26 | 捷开通讯(深圳)有限公司 | Camera assembly and terminal |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103205682B (en) | 2017-03-15 |
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