CN1030233C - Thin-film split one-to-one refracting-reflecting optical system - Google Patents
Thin-film split one-to-one refracting-reflecting optical system Download PDFInfo
- Publication number
- CN1030233C CN1030233C CN 92113811 CN92113811A CN1030233C CN 1030233 C CN1030233 C CN 1030233C CN 92113811 CN92113811 CN 92113811 CN 92113811 A CN92113811 A CN 92113811A CN 1030233 C CN1030233 C CN 1030233C
- Authority
- CN
- China
- Prior art keywords
- optical system
- film
- reflection mirror
- optical axis
- principal reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
The present invention relates to a film light split one-to-one refracting and reflecting optical system which comprises two aberration eliminating refractor sets, a film beam splitter and a main reflector, wherein the aberration eliminating refractor sets have complete identical structures; one aberration eliminating refractor set and the main reflector share an optical axis, the optical axis of the other aberration eliminating refractor set is perpendicular to an optical axis of the main reflector, and the two aberration eliminating refractor sets are symmetrically placed by using the center face of the film beam splitter as the symmetrical face. The optical system of the present invention is mainly used for the photographic copy of a fine pattern, for example, the optical system is used for a photoetching machine. The present invention has the advantage that the working viewing field can be fully used.
Description
The present invention is a kind of 1: 1 refractive and reflective optical system that utilizes the film beam split, is mainly used in the fine pattern photocopying, as is used on the litho machine of making large scale integrated chip.
Prior art:
1: 1 refractive and reflective optical system that aberration correction is arranged of Shanghai Optics and Precision Mechanics institute, Chinese Academy of Sciences's inventor king Zhijiang River invention, number of patent application: 91107489.9, disappearing image difference refracting set 2 and principal reflection mirror 3 that lens combination 4 that this system is made of triangular prism group 1, two meniscus lens and plano-convex lens 5 are formed constitute.Triangular prism group 1 is glued on first of disappearing image difference refracting set 2, and two triangular prisms respectively account for half of first bore, is used for making image to separate, structural representation as shown in Figure 1, obj represents object plane among the figure, img represents the face of resembling.The visual field of this system utilizes situation as shown in Figure 2, though the utilization ratio of visual field of this system made moderate progress than in the past, as can be seen from Figure 2, also has quite a few working field of view not to be utilized.
The objective of the invention is provides a kind of optical system that can make full use of working field of view in order to overcome the defective of said system.
Optical system of the present invention contains two groups of identical in structure disappearing image difference refracting set 6,8, film beam splitter 7 and principal reflection mirror 3.Disappearing image difference refracting set is to be made of a lens combination 4 that contains two meniscus lens and a plano-convex lens 5.Because system of the present invention has replaced triangular prism group in original technology with the film beam split, but in order to compensate owing to losing the aberration that the triangular prism group is introduced, native system can suitably be thickeied plano-convex lens 5.First group of disappearing image difference refracting set 6 and principal reflection mirror 3 common optical axis in the native system, film beam splitter 7 places between principal reflection mirror 3 and the disappearing image difference refracting set 6, its center is on the optical axis of principal reflection mirror 3, the optical axis of its central plane and principal reflection mirror 3 presss from both sides suitable angle [alpha], common α=45 °, the reflecting surface of film beam splitter 7 is facing to principal reflection mirror 3.The optical axis of second group of disappearing image difference refracting set 8 and first group of disappearing image difference refracting set 6 is that the axial plane of symmetry places on the position perpendicular to the principal reflection mirror optical axis symmetrically with the central plane of film beam splitter 7.Film beam splitter 7 of the present invention is the semi-permeable and semi-reflecting mirror that adopt a kind of film to make, the face type error of its film is preferably less than λ/4, and thickness h is very little usually, preferably h＜0.8 μ m, this beam splitter makes thing and resembles two parts separately in light path, its working field of view can be fully utilized.The structure of native system as shown in Figure 3, wherein obj represents object plane, img represents the face of resembling.Because before the film beam splitter places principal reflection mirror, and the reflecting surface of film beam splitter is again facing to principal reflection mirror, so the parasitic light that first group of aberroscope group 6 that disappears produced can not arrive second group of disappearing image difference refracting set 8, thereby it is better to resemble matter, again because film thickness h is very little, the face type is better than λ/4, so the aberration that is produced by film can be left in the basket.Therefore such structure is fully utilized the working field of view of system.
Advantage of the present invention:
There is 1: 1 refractive and reflective optical system of aberration correction to compare with prior art, under onesize physical dimension situation, satisfy same resolution and delineate when requiring, working field of view utilizes 6 times of enlarged areas, thereby has improved the throughput rate of unit interval litho machine greatly.
Description of drawings:
Fig. 1 is 1: 1 refractive and reflective optical system synoptic diagram that existing patented technology has aberration correction, and Fig. 2 has 1: 1 refractive and reflective optical system visual field of aberration correction to utilize the situation synoptic diagram for existing patented technology, and Fig. 3 is an optical system synoptic diagram of the present invention.Fig. 4 utilizes the situation synoptic diagram for system of the present invention visual field.
Embodiment:
Used operation wavelength is 308nm among the embodiment, and groove is wide to be 0.8 μ m, and the working field of view of utilization is 60 * 60mm
2, numerical aperture is 0.45, sequence number is wherein pressed the sequence arrangement of light by system.
Embodiment 1
Sequence number radius spacing material
1 (thing) plane, 2.00 air
2 planes, 52.09 CaF
2
3-55.00 10.00 fused quartzs
4-161.33 2.00 air
5-140.00 98.50 fused quartzs
6-165.00 200.00 air
7 planes, 0.0008 film
8 planes, 366.70 air
9-730.00-366.70 air
10 planes-0.0008 film
11 planes-200.00 air
12-165.00-98.50 fused quartzs
13-140.00-2.00 air
14-161.33-10.00 fused quartzs
15 -55.00 -52.09 CaF
2
16 planes-2.06 air
17 resemble face
Sequence number radius spacing material
1 (thing) plane, 2.00 air
2 planes, 52.09 CaF
2
3-55.00 10.00 fused quartzs
4-161.33 2.00 air
5-140.00 98.50 fused quartzs
6-165.00 200.00 air
7 planes, 0.0006 film
8 planes, 366.70 air
9-730.00-366.70 air
10 planes-0.0006 film
11 planes-200.00 air
12-165.00-98.50 fused quartzs
13-140.00-2.00 air
14-161.33-10.00 fused quartzs
15 -55.00 -52.09 CaF
2
16 planes-2.04 air
17 resemble face
Sequence number radius spacing material
1 (thing) plane, 2.00 air
2 planes, 52.09 CaF
2
3-55.00 10.00 fused quartzs
4-161.33 2.00 air
5-140.00 98.50 fused quartzs
6-165.00 200.00 air
7 planes, 0.0005 film
8 planes, 366.70 air
9-730.00-366.70 air
10 planes-0.0005 film
11 planes-200.00 air
12-165.00-98.50 fused quartzs
13-140.00-2.00 air
14-161.33-10.00 fused quartzs
15 -55.00 -52.09 CaF
2
16 planes-2.04 air
17 planes
Sequence number radius spacing material
1 (thing) plane, 2.00 air
2 planes, 31.44 fused quartzs
3 planes, 130.65 fused quartzs
4-162.60 0.0 air
5 1154.00 11.78 fused quartzs
6 1105.00 150 air
7 planes, 0.0006 film
8 planes, 168.10 air
9-491.80-168.10 air
10 planes-0.0006 film
11 planes-150.00 air
12 1105.00-11.78 fused quartzs
13 1154.00 0.0 air
14-162.6-130.65 fused quartzs
15 planes-31.44 fused quartz
16 planes-2.04 air
17 (elephant) plane
Claims (4)
1,1: 1 refractive and reflective optical system of a kind of film beam split, contain principal reflection mirror (3) and disappearing image difference refracting set, it is characterized in that having two groups of identical in structure disappearing image difference refracting set (6), (8), wherein one group of disappearing image difference refracting set (6) and principal reflection mirror (3) common optical axis, the optical axis of another group disappearing image difference refracting set (8) is perpendicular to the optical axis of principal reflection mirror (3), one film beam splitter (7) is arranged between principal reflection mirror (3) and disappearing image difference refracting set (6), the center of film beam splitter (7) is on the optical axis of principal reflection mirror (3), the optical axis of its central plane and principal reflection mirror (3) accompanies angle [alpha], and its central plane is again the axial plane of symmetry of the symmetric position of two groups of disappearing image refracting set (6) and (8).
2,, it is characterized in that film beam splitter (7) is the semi-permeable and semi-reflecting mirror that a kind of film is made according to 1: 1 refractive and reflective optical system of a kind of film beam split of claim 1.
3, according to 1: 1 refractive and reflective optical system of a kind of film beam split of claim 1 or 2, the reflecting surface that it is characterized in that film beam splitter (7) is facing to principal reflection mirror (3), optical axis included angle α=45 of its central plane and principal reflection mirror (3) °.
4,, it is characterized in that two groups of disappearing image difference refracting set (6) and (8) constitute by a lens combination that contains two meniscus lens (4) and a plano-convex lens (5) according to 1: 1 refractive and reflective optical system of a kind of film beam split of claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 92113811 CN1030233C (en) | 1992-12-17 | 1992-12-17 | Thin-film split one-to-one refracting-reflecting optical system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 92113811 CN1030233C (en) | 1992-12-17 | 1992-12-17 | Thin-film split one-to-one refracting-reflecting optical system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1088313A CN1088313A (en) | 1994-06-22 |
| CN1030233C true CN1030233C (en) | 1995-11-08 |
Family
ID=4946600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 92113811 Expired - Fee Related CN1030233C (en) | 1992-12-17 | 1992-12-17 | Thin-film split one-to-one refracting-reflecting optical system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1030233C (en) |
-
1992
- 1992-12-17 CN CN 92113811 patent/CN1030233C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1088313A (en) | 1994-06-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1222808C (en) | Prism system for DMD and projector therewith | |
| CN1132039C (en) | Image display device and head-mounted display comprising same | |
| CN1437041A (en) | Projector | |
| CN1384383A (en) | Projecting zoom lens | |
| CN1902525A (en) | Optical pattern generator using a single rotating component | |
| CN1906504A (en) | Fresnel lens and projection display device using one such lens | |
| CN1831484A (en) | Photoelectric encoder | |
| CN1405633A (en) | Lighting device and method for producing exposure device using same and device thereof | |
| CN1831483A (en) | Photoelectric encoder | |
| CN1504829A (en) | Catadioptric lithographic projection apparatus with a non-inverting beamsplitter system | |
| CN1303476C (en) | Improved lighting system for micro-offset printing | |
| CN1030233C (en) | Thin-film split one-to-one refracting-reflecting optical system | |
| CN1456904A (en) | Exposuring device for illuminating sensitive substrate | |
| CN1888948A (en) | Combined wave-front corrector based on conjugate imaging | |
| CN1809765A (en) | Resin optical component and process for producing the same | |
| CN1704797A (en) | Projection optical system and pattern drawing device | |
| CN1564958A (en) | Method and system for correction of intrinsic birefringence in UV microlithography | |
| CN1692306A (en) | Projector | |
| JPS5722218A (en) | Scanning optical system using plural beams | |
| CN1029533C (en) | Refracting reflecting optical system with polarized light imaging | |
| CN1280643C (en) | Reflector for converting polarization direction of polarized light and component element thereof | |
| TW200416476A (en) | Light source of a projector | |
| CN1123419A (en) | Optical projecting device and focus adjusting method of same | |
| CN100343722C (en) | Projection display system | |
| TW201918801A (en) | Maskless laser direct imaging system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |