CN103000760A - Preparation method of titanium dioxide solar cell antireflection film - Google Patents
Preparation method of titanium dioxide solar cell antireflection film Download PDFInfo
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- CN103000760A CN103000760A CN2012104016527A CN201210401652A CN103000760A CN 103000760 A CN103000760 A CN 103000760A CN 2012104016527 A CN2012104016527 A CN 2012104016527A CN 201210401652 A CN201210401652 A CN 201210401652A CN 103000760 A CN103000760 A CN 103000760A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The invention discloses a preparation method of a titanium dioxide solar cell antireflection film. The method includes the steps: (1) vacuumizing a diffusion furnace and keeping the temperature inside the furnace to be 420 DEG C; (2) depositing a titanium dioxide film by taking oxygen gas as reaction gas and argon gas as sputtering gas at the temperature of 460 DEG C, wherein a sputtering target is a titanium target with the diameter of 8cm, the oxygen gas flow is 8-15mL/min, the argon gas flow is 100-120mL/min, the sputtering power ranges from 200 watts to 400 watts, and sputtering time is 4-180min; and (3) performing annealing treatment for a titanium dioxide film sample under the protection of nitrogen gas. The titanium dioxide film is capable of obviously reducing reflection of the cell surface to light so as to improve photoelectric conversion efficiency of a solar cell, and is high in refractive index and low in absorptivity so as to have obvious superiority when applied to solar cells in glass package. The preparation method is simple and suitable for large-scale production.
Description
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Technical field
The present invention relates to a kind of preparation method of antireflective coating, be specifically related to a kind of preparation method of titanium dioxide solar battery antireflective film.
Background technology
Antireflective coating claims again anti-reflection film, and it is the lower film of one deck refractive index that is plated on the optical element optical surface.At present, what large-scale production was adopted is the standby nitrogen silicon fiml of PEVCD legal system, but its reflectivity also is not very low.Antireflective coating is the optical thin film most widely used, that output is maximum, and therefore, it is appointed so far so is research topic important in the optical film technique.
Because the refraction coefficient of silicon and the refraction coefficient of air differ greatly, light wave becomes the key factor that affects solar battery efficiency in reflection at the interface, therefore, must add coated with antireflection film and graded index antireflective film at battery surface.Titanium deoxid film has good chemical stability to the most of chemical substances in the cell piece production process, and its refractive index is high and absorptivity is low, and is with the obvious advantage in the solar cell application of glass packaging.At present, the research of titanium deoxid film concentrates on the aspects such as dye-sensitized cell, photocatalysis, to the application study of solar energy antireflective coating seldom.
Summary of the invention
The object of the present invention is to provide a kind of preparation method of titanium dioxide solar battery antireflective film.
Purpose of the present invention can be achieved through the following technical solutions:
A kind of preparation method of titanium dioxide solar battery antireflective film is characterized in that it comprises the steps:
(1) diffusion furnace is vacuumized, keep 420 ℃ of the interior temperature of stove;
(2) deposition of titanium oxide film, temperature are 460 ℃, take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 8-15mL/min, and argon flow amount is 100-120mL/min, sputtering power 200-400 watt, sputtering time 4-180min;
(3) the titanium deoxid film sample carries out annealing in process under nitrogen protection.
Described step (2) oxygen flow is 8-12mL/min, and argon flow amount is 100-110mL/min.
Described step (2) oxygen flow is 10mL/min, and argon flow amount is 100mL/min.
Described step (2) sputtering time 50-100min.
Described step (2) sputtering time 70min.
The condition of described annealing in process is: temperature is 350 ℃, insulation 5min.
Beneficial effect of the present invention: the titanium deoxid film that the present invention obtains can obviously reduce battery surface to reflection of light, improves the photoelectric conversion efficiency of solar cell; Its refractive index is high and absorptivity is low, and is with the obvious advantage in the solar cell application of glass packaging; Preparation method of the present invention is simple, is fit to large-scale production.
Embodiment
The invention will be further described below in conjunction with specific embodiment.
Embodiment 1
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, and take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 8mL/min, and argon flow amount is 100mL/min, 400 watts of sputtering powers, sputtering time 4min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Embodiment 2
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 10mL/min, and argon flow amount is 120mL/min, 200 watts of sputtering powers, sputtering time 80min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Embodiment 3
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 12mL/min, and argon flow amount is 110mL/min, 300 watts of sputtering powers, sputtering time 180min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Embodiment 4
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, and take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 15mL/min, and argon flow amount is 105L/min, 250 watts of sputtering powers, sputtering time 70min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Embodiment 5
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, and take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 13mL/min, and argon flow amount is 115L/min, 350 watts of sputtering powers, sputtering time 50min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Embodiment 6
A kind of preparation method of titanium dioxide solar battery antireflective film comprises the steps: that (1) vacuumizes diffusion furnace, keeps 420 ℃ of the interior temperature of stove; (2) deposition of titanium oxide film, temperature are 460 ℃, and take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 9mL/min, and argon flow amount is 110L/min, 280 watts of sputtering powers, sputtering time 100min; (3) the titanium deoxid film sample carries out annealing in process under nitrogen protection, and temperature is 350 ℃, insulation 5min.
Claims (6)
1. the preparation method of a titanium dioxide solar battery antireflective film is characterized in that it comprises the steps:
(1) diffusion furnace is vacuumized, keep 420 ℃ of the interior temperature of stove;
(2) deposition of titanium oxide film, temperature are 460 ℃, take oxygen as reacting gas, argon gas is sputter gas, sputtering target is that diameter is the titanium target of 8cm, and oxygen flow is 8-15mL/min, and argon flow amount is 100-120mL/min, sputtering power 200-400 watt, sputtering time 4-180min;
(3) the titanium deoxid film sample carries out annealing in process under nitrogen protection.
2. the preparation method of titanium dioxide solar battery antireflective film according to claim 1 is characterized in that described step (2) oxygen flow is 8-12mL/min, and argon flow amount is 100-110mL/min.
3. the preparation method of titanium dioxide solar battery antireflective film according to claim 2 is characterized in that described step (2) oxygen flow is 10mL/min, and argon flow amount is 100mL/min.
4. the preparation method of titanium dioxide solar battery antireflective film according to claim 1 is characterized in that described step (2) sputtering time 50-100min.
5. the preparation method of titanium dioxide solar battery antireflective film according to claim 4 is characterized in that described step (2) sputtering time 70min.
6. the preparation method of titanium dioxide solar battery antireflective film according to claim 1, it is characterized in that the condition of described annealing in process is: temperature is 350 ℃, insulation 5min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2012104016527A CN103000760A (en) | 2012-10-22 | 2012-10-22 | Preparation method of titanium dioxide solar cell antireflection film |
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| CN2012104016527A CN103000760A (en) | 2012-10-22 | 2012-10-22 | Preparation method of titanium dioxide solar cell antireflection film |
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| CN103000760A true CN103000760A (en) | 2013-03-27 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105568229A (en) * | 2016-03-09 | 2016-05-11 | 无锡南理工科技发展有限公司 | Preparation method of nitrogen-doped titanium dioxide film |
| CN105648414A (en) * | 2016-03-05 | 2016-06-08 | 无锡南理工科技发展有限公司 | Method for preparing nitrogen-contained titanium dioxide film by using magnetron sputtering method |
-
2012
- 2012-10-22 CN CN2012104016527A patent/CN103000760A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105648414A (en) * | 2016-03-05 | 2016-06-08 | 无锡南理工科技发展有限公司 | Method for preparing nitrogen-contained titanium dioxide film by using magnetron sputtering method |
| CN105648414B (en) * | 2016-03-05 | 2018-10-30 | 无锡南理工科技发展有限公司 | A method of nitrogenous titanium deoxid film is prepared using magnetron sputtering method |
| CN105568229A (en) * | 2016-03-09 | 2016-05-11 | 无锡南理工科技发展有限公司 | Preparation method of nitrogen-doped titanium dioxide film |
| CN105568229B (en) * | 2016-03-09 | 2018-10-30 | 无锡南理工科技发展有限公司 | A kind of preparation method of nitrogen doped titanium dioxide film |
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Application publication date: 20130327 |