CN102929106B - Photoetching illuminating system for ultraviolet photoetching machine - Google Patents
Photoetching illuminating system for ultraviolet photoetching machine Download PDFInfo
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Abstract
The invention relates to a photoetching illuminating system for an ultraviolet photoetching machine, and the system comprises an ultraviolet laser, a one-dimensional continuous zoom beam-expanding lens group, a diffractive optical element rotating-disc mechanism, a Fourier transform lens, a dodging system and a controller, wherein the diffractive optical element rotating-disc mechanism is circumferentially uniformly provided with a plurality of diffractive optical elements; the ultraviolet laser generates parallel light beams; and the one-dimensional continuous zoom beam-expanding lens group, the diffractive optical elements of the diffractive optical element rotating-disc mechanism, the Fourier transform lens and the dodging system are sequentially arranged along the transmission direction of the light beams. The photoetching illuminating system disclosed by the invention has the characteristics of simple structure, high optical transmission rate, no problem of pupil degradation caused by a tapered lens group, effective reduction of the production cost of the ultraviolet photoetching machine, and the like.
Description
Technical field
The present invention relates to litho machine, particularly a kind of lithography illuminating system for ultraviolet photolithographic machine.
Background technology
Along with the development of large scale integrated circuit, the resolution requirement of optical patterning is more and more higher, correspondingly, also more and more higher to the requirement of lithography illuminating system.In the illuminator of advanced litho machine, by selecting the pupil plane illumination intensity corresponding with size with the structure of mask figure to distribute, particularly by changing internal diameter size and the endless belt width of the endless belt of ring illumination on pupil plane, improve the resolution of litho machine, improve the contrast of litho pattern, thereby realize accurately copying of hyperfine litho pattern.
In current ultraviolet photolithographic illuminator, the formation that pupil plane illumination intensity distributes mainly realizes by diffraction optical element, continuous magnification lens group and conical mirror group; The pupil plane light distribution style (as light illumination modes such as tradition, annular, two utmost points and four utmost points) that diffraction optical element throws light on required for generation of photoetching, in litho machine, design of diffractive optical element can be referring to Jerry Leonard, JamesCarriere, Jared Stack, Rich Jones, Marc Himel, John Childers, Kevin Welch, Proc.SPIE.6924, Optical Microlithography XXI 69242O, March 14,2008; Described conical mirror group is generally made up of two conical mirrors of concave, convex, realizes the adjusting of endless belt internal diameter on pupil plane by changing two distances between conical mirror.Continuous magnification lens group is for regulating the adjusting of pupil plane pressed on ring bandwidth.Adopt the major defect of the method to have: the introducing of conical mirror group, by making optical system produce the off-axis aberration that is difficult to correction, makes pupil plane light distribution deteriorated, changed the size of the tangential utmost point subtended angle of pupil plane, and radially light distribution also can be affected; The introducing of conical mirror group has reduced the transmitance of whole optical system, cannot effectively utilize the energy of laser ultraviolet laser; The difficulty of processing of conical mirror that is operated in deep ultraviolet wave band is large, causes the manufacturing cost of litho machine high.
In the prior art, in " a kind of reshaping structure of micro-photoetching illumination iris " (referring to patent CN101320216A), the illuminating pupil reshaping structure of a kind of photoetching is disclosed, compare with traditional lithography illuminating system, this invention still utilizes diffraction element and continuous vari-focus mirror group to produce different endless belt width, and difference is to utilize two male conical mirrors to regulate the size of endless belt internal-and external diameter.But this invention does not change the integral layout of traditional apparatus for shaping.
Summary of the invention
The object of the invention is to overcome the deficiency of above-mentioned formerly technology, a kind of illuminator for ultraviolet photolithographic machine is provided.Illuminator of the present invention is not containing conical mirror group, but the mode that adopts one dimension continuous zoom beam expanding lens group to combine with diffraction optical element, produce various light illumination modes, and regulate partial coherence factor, have simple in structure, optical transmittance is high, do not have the deteriorated problem of pupil that conical mirror group introduces, the feature such as production cost that can effectively reduce litho machine.
Technical solution of the present invention is as follows:
For a lithography illuminating system for ultraviolet photolithographic machine, feature is that its formation comprises: ultraviolet laser, one dimension continuous zoom beam expanding lens group, rotating disk mechanism, Fourier transform lens, even photosystem and controller, and the position relationship of above-mentioned component is as follows:
The cross section that described ultraviolet laser produces is square parallel beam, is described one dimension continuous zoom beam expanding lens group, rotating disk mechanism, Fourier transform lens and even photosystem successively along this beam Propagation direction;
Described rotating disk mechanism contains multiple diffraction optical elements, and described controller is accurately controlled the rotation of rotating disk mechanism by circle scrambler, select required diffraction optical element, realizes required light illumination mode; Each diffraction optical element is arranged and is formed by multiple subregions, and the diffraction optical element described in described controller control moves along its subregion orientation, realizes the adjusting of illumination iris face upper inner ring size;
The annular beam that described Fourier transform lens is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face is carried out homogenising processing through described even photosystem, and projects on mask face.
Described rotating disk mechanism along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element, directions X two utmost point illumination diffraction optical elements, Y-direction two utmost point illumination diffraction optical element, quadrupole illuminating diffraction optical element and traditional lighting diffraction optical elements, on described pupil plane, form ring illumination, directions X two utmost point illuminations, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting accordingly.
Described diffraction optical element is made up of the subregion of a series of one dimension partition types, the orientation of this subregion is identical with the moving direction of described diffraction optical element, every sub regions corresponds respectively to and produces different-diameter and the identical illumination endless belt of endless belt width, the subregion of described diffraction optical element is corresponding with the endless belt on described pupil plane, the illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, when work, by irradiating several continuous subregions, obtain a total illumination endless belt, the number that the width of this total illumination endless belt equals illuminated subregion is multiplied by the width of an illumination endless belt.
Described one dimension continuous zoom beam expanding lens group, by the first spherical mirror successively, the second spherical mirror, the first cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror form, the first described spherical mirror, the second spherical mirror maintains static, the first described cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror are positioned on a guide rail, the controller of dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel by scrambler and is driven the first described cylindrical mirror, the second cylindrical mirror and the 3rd cylindrical mirror move along guide rail, change the position relationship along direction of beam propagation between three cylindrical mirrors, the parallel beam of ultraviolet laser output is expanded into: in y direction, size is fixed, the parallel beam of dimension adjustable in x direction.
Described diffraction optical element rotating disk mechanism is accurately controlled rotating disk mechanism by circle scrambler and is rotated, and switch the exact position of realizing between multiple diffraction optical elements.Rotary turnplate mechanism, forwards required diffraction optical element in light path to, and the diffraction optical element in light path is positioned at Fourier transform lens front focal plane, and forms specific illumination iris distribution at the back focal plane of Fourier transform lens; And each diffraction optical element is placed perpendicular to optical axis, and by the accurate control of guide rail, screw mandrel and displacement encoder, each diffraction optical element can accurately move along its subregion orientation.
The Main Function of described diffraction optical element is on illumination iris face, to produce required illumination style, can change the size of endless belt internal diameter on illumination iris face by moving diffraction optical element along subregion orientation; And change the multiplying power that expands of one dimension continuous zoom beam expanding lens group, can regulate the size of ring width on illumination iris cross section.By the multiplying power that expands of mobile diffraction optical element and change one dimension continuous zoom beam expanding lens group, can realize the big or small adjusting of ring in illumination iris face pressed on ring bandwidth and endless belt.Continuous magnification lens group in traditional approach and the model of conical mirror are changed.
Described diffraction optical element adopts one dimension partition type structure, subregion can be according to the requirement design of illumination style, what inside and outside numerical aperture of every sub regions generation differences different and inside and outside numerical aperture were fixing disperses annular beam, the annular beam of dispersing that adjacent subarea territory produces just in time joins, the moving direction of diffraction optical element is identical with subregion orientation, through Fourier transform lens, every sub regions corresponds respectively on illumination iris face and produces different-diameter and the identical illumination endless belt of endless belt width, and the illumination endless belt of every sub regions and the generation of adjacent subarea territory just in time joins.
When work, the parallel beam that one dimension continuous zoom beam expanding lens group is sent ultraviolet laser expands, in the subregion orientation perpendicular to diffraction optical element, expand size and fix, and with diffraction optical element measure-alike in this direction; In the subregion orientation that is parallel to diffraction optical element, beam sizes changes with expanding multiplying power variation, thereby changes the number of irradiating the continuous subregion of diffraction optical element.By being irradiated to the several continuous subregions of diffraction optical element, on Fourier transform lens back focal plane, can produce several illumination endless belt that join continuously, in the time changing the number of irradiating continuous subregion, the width of total endless belt also changes thereupon, and the number that its total endless belt width equals to irradiate subregion is multiplied by the width of each illumination endless belt.In the time that one dimension continuous zoom beam expanding lens group zoom ratio is fixing, diffraction optical element is changed incident beam and is irradiated to the position of diffraction optical element subregion by movement, the determining positions of light beam irradiates disperse the concrete numerical value of the inside and outside numerical aperture of annular beam, again after Fourier transform lens conversion, on its back focal plane, realize and in illumination intensity, encircle big or small adjusting, but do not change endless belt width.
In sum, by adjusting the multiplying power that expands of one dimension continuous zoom beam expanding lens group, to change endless belt width total on illumination iris face; By moving diffraction optical element along subregion orientation, to change the interior ring size of endless belt.Thereby realize the internal diameter size of the endless belt that throws light on illumination iris face and the adjustment of endless belt width, improved the resolution of litho machine.
Described diffraction optical element is being D perpendicular to the overall dimensions of subregion orientation
y, the overall dimensions that is parallel to subregion orientation is D
x.In diffraction optical element, the selection range of the size l of every sub regions is that 0.5mm is to 1mm.Its overall dimensions D
xcomputing formula be
wherein
the maximum gauge of illumination iris cross section outer shroud,
be the minimum diameter of ring in illumination iris cross section, Δ d is the adjusting resolution of ring in illumination iris cross section, also equals the width of an illumination endless belt.
Described diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square position facies unit, and these square position facies units are combined into a position phase distribution matrix, produce required illumination iris and distribute; The size t of square position facies unit is for being not more than
wherein
be the maximum gauge of illumination iris cross section outer shroud, λ is the wavelength of incident laser, and f is the focal length of fourier lense under wavelength X.
Every sub regions of described diffraction optical element, distributes according to required illumination iris, and every sub regions row's position phase distribution matrix obtains by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm.The concrete steps of lid Shi Beige-Sa Ke stone (G-S) iterative algorithm can be referring to R.W.Gershberg, W.O.Saxton, Optik, 35,237-246,1972.Obtain successively after the position phase distribution matrix of every sub regions, obtain the position phase distribution matrix of this diffraction optical element entirety.
Compared with technology formerly, the present invention has following technological merit:
(1) lithography illuminating system of the present invention adopts partition type diffraction optical element, realize the function of endless belt internal diameter on the conical mirror group adjusting pupil plane in traditional pupil Shaping Module, thereby without conical mirror group, the overall transmitance of system is improved.
(2) the present invention, without conical mirror group, has reduced the difficulty of optical design, and the deteriorated problem of the pupil that does not exist conical mirror group to cause; Without the fourier lense group of design zoom, simplified design step and time.
(3) the present invention has saved the processing charges of conical mirror group, has reduced system manufacturing cost.
Brief description of the drawings
Fig. 1 is the structured flowchart of lithography illuminating system of the present invention.
Fig. 2 and Fig. 3 are the embodiment of one dimension Zooming expander group of the present invention.
Fig. 4 and Fig. 5 are that one of the present invention realizes the embodiment that ring illumination pupil regulates.
Fig. 6 is the structural drawing of diffraction optical element of the present invention and subregion.
Fig. 7 is a kind of turntable structure figure that changes diffraction optical element of the present invention.
Embodiment
Below in conjunction with accompanying drawing and example, the present invention is further illustrated, but should not limit the scope of the invention with this.
First refer to Fig. 1, Fig. 1 is a kind of lithography illuminating system structural drawing of the present invention, as seen from the figure, the present invention comprises for the formation of the lithography illuminating system of ultraviolet photolithographic machine: ultraviolet laser 11, one dimension continuous zoom beam expanding lens group 12, rotating disk mechanism 13, Fourier transform lens 14, even photosystem 16 and controller 18, and the position relationship of above-mentioned component is as follows:
The cross section that described ultraviolet laser 11 produces is square parallel beam, is described one dimension continuous zoom beam expanding lens group 12, rotating disk mechanism 13, Fourier transform lens 14 and even photosystem 16 successively along this beam Propagation direction;
Described rotating disk mechanism 13 contains multiple diffraction optical elements, and described controller 18 is accurately controlled the rotation of rotating disk mechanism 13 by circle scrambler, select required diffraction optical element, realizes required light illumination mode; Each diffraction optical element is arranged and is formed by multiple subregions, and described controller 18 is controlled described diffraction optical element and moved along its subregion orientation, realizes the adjusting of illumination iris face 15 upper inner ring sizes;
The annular beam that described Fourier transform lens 14 is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face 15 is carried out homogenising processing through described even photosystem 16, and projects on mask face 17.
Described rotating disk mechanism 13 along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element 401, directions X two utmost point illumination diffraction optical elements 402, Y-direction two utmost point illumination diffraction optical element 403, quadrupole illuminating diffraction optical element 404 and traditional lighting diffraction optical elements 405, on described pupil plane 15, form ring illumination, directions X two utmost point illuminations, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting accordingly.
Comprise successively from the object side to image side: ultraviolet laser 11, one dimension continuous zoom beam expanding lens group 12, diffraction optical element rotating disk mechanism 13, Fourier transform lens 14, even photosystem 16, controller 18.
Described ultraviolet laser 11, built-in colimated light system, is square parallel ultraviolet for generation of cross section.
Refer to Fig. 2 and Fig. 3, described one dimension continuous zoom beam expanding lens group 12, by the first spherical mirror 121 successively, the second spherical mirror 122, the first cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 form, described the first spherical mirror 121 and the second spherical mirror 122 maintain static, the first described cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 are positioned on a guide rail 126, the controller 128 of dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel 127 by scrambler and is driven the first described cylindrical mirror 123, the second cylindrical mirror 124 and the 3rd cylindrical mirror 125 move along guide rail 126, change the position relationship along direction of beam propagation between three cylindrical mirrors, the parallel beam that ultraviolet laser 11 is exported expands into: in y direction, size is fixed, the parallel beam of dimension adjustable in x direction.
Rotating disk mechanism 13 contains five diffraction optical elements 401 ~ 405, refers to Fig. 7, and Fig. 7 is the schematic diagram of turntable structure 13 of the present invention.Described rotating disk mechanism 13 along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element 401, directions X two utmost point illumination diffraction optical elements 402, Y-direction two utmost point illumination diffraction optical element 403, quadrupole illuminating diffraction optical element 404 and traditional lighting diffraction optical elements 405, on described pupil plane 15, form ring illumination, directions X two utmost point illuminations, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting accordingly.
Each diffraction optical element is to be arranged and formed by a series of subregions, by move to change the size of illumination iris face upper inner ring diameter along its subregion orientation.Refer to Fig. 1, taking ring illumination diffraction optical element 401 as example, ring illumination diffraction optical element 401 is controlled screw mandrel 4012 by controller 18 and is driven ring illumination diffraction optical element 201 accurately to move along guide rail 4011, in like manner, other diffraction optical element also can accurately move along its subregion orientation in this way, when described diffraction optical element 401 ~ 405 is during along its subregion orientation mobile, can be for realizing the adjusting of illumination iris face upper inner ring size.
Meanwhile, controller 18 can also accurately be controlled the rotation of rotating disk mechanism 13 by circle scrambler, realizes five switchings between diffraction optical element, realizes the switching (as light illumination modes such as tradition, annular, two utmost points and four utmost points) of multiple light illumination mode with this.
As shown in Figure 1, taking diffraction optical element 401 as example, the light beam that one dimension continuous zoom beam expanding lens group 12 expands is for being radiated at diffraction optical element 401; Diffraction optical element 401 is placed perpendicular to optical axis, and is positioned at the front focal plane of Fourier transform lens 14, and its function is to form specific illumination iris distribution (as light illumination modes such as tradition, annular, two utmost points and four utmost points) at illumination iris face 15; On illumination iris face 15, different spatial light intensity distributes and enters even photosystem 16 and carry out homogenising processing, and projects on mask face 17.When work, by adjusting the multiplying power that expands of one dimension continuous zoom beam expanding lens group 12, can change endless belt width total on pupil plane; By moving diffraction optical element 401 along subregion orientation, can change the inner and outer ring size of the total endless belt of illumination iris face 15.Distribution on illumination iris face enters even photosystem 16 and carries out homogenising processing, and projects on mask face 17.
Describing ring illumination diffraction optical element below in conjunction with Fig. 4 and Fig. 5 is how to change interior ring diameter on illumination iris face.As shown in Figure 4, the subregion of diffraction optical element 401 and identical numeral for corresponding relation in endless belt, for example subregion 6 is for generation of endless belt 6.The illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, and the number that its width equals illuminated subregion is multiplied by the width of an illumination endless belt.As shown in Figure 4, adjust the multiplying power that expands of one dimension continuous zoom beam expanding lens group 12, make light beam irradiates arrive five sub regions of diffraction optical element 401, the subregion 4 ~ 8 being irradiated to has produced the ring width of 5* Δ d on illumination iris face 15 through Fourier transform lens 14, corresponding numeral is also 4 ~ 8, and the style correspondence that subregion 8 produces the endless belt 8 on illumination iris face 15, the style correspondence that subregion 4 produces the endless belt 4 on illumination iris face 15, the style correspondence that subregion 6 produces middle endless belt 6 on illumination iris face 15, the interior ring size that 8 corresponding ring width diameters are endless belt, as shown in Figure 5, adjust the zoom ratio of one dimension continuous zoom beam expanding lens group 12, make light beam irradiates become 3 sub regions sizes to the area of diffraction optical element 401 from 5 sub regions sizes, then along the accurate mobile diffraction optical element 401 of x direction of principal axis, make the subregion irradiating become n-2, n-1 and n tri-sub regions, subregion n-2, the n-1 being irradiated to and n have produced the ring width of 3* Δ d on illumination iris face 15 through Fourier transform lens 14.Because subregion 1 correspondence on illumination iris face
ring width, subregion n correspondence on illumination iris face
ring width, be 0 traditional lighting graphic pattern so produced interior ring diameter.
In sum, by adjusting the zoom ratio of one dimension continuous zoom beam expanding lens group 12, change incident beam width, can change the ring width on illumination iris face, by along the mobile diffraction optical element of x direction of principal axis (subregion orientation), can change the interior ring size on illumination iris face.Both coordinate, and have realized the adjusting of the ring width on illumination iris face and interior ring size in lithography illuminating system.
Diffraction optical element shown in Fig. 6 is in the dimension D of the overall dimensions perpendicular to subregion orientation and square incident beam
yidentical, the overall dimensions that is parallel to subregion orientation is D
x.In diffraction optical element, the selection range of the size l of every sub regions is that 0.5mm is to 1mm.Its overall dimensions D
xcomputing formula be
wherein
the maximum gauge of illumination iris cross section outer shroud,
be the minimum diameter of ring in illumination iris cross section, Δ d is the adjusting resolution of ring in illumination iris cross section, equals the width of an illumination endless belt.
As shown in Figure 6, diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square morpheme facies unit 311, and these square morpheme facies units are combined into a position phase distribution matrix, produces required illumination iris and distributes; The size t of square morpheme facies unit 311 is not more than
wherein
be the maximum gauge of illumination iris cross section outer shroud, λ is the wavelength of incident laser, and f is the focal length of Fourier transform lens during corresponding to λ.
Fig. 7 is the schematic diagram of turntable structure 13, has five removable diffraction optical elements, and changes to required diffraction optical element by converting mechanism more, realizes specific light illumination mode.For example, diffraction optical element 401-405 produces annular, directions X two utmost points, Y-direction two utmost points, four utmost points, traditional lighting successively.In concrete application, need the specific requirement according to litho pattern, select suitable light illumination mode and corresponding diffraction optical element.By accurate control rotating disk, needed diffraction optical element is rotated to the position of laser beam irradiation.And each diffraction optical element can move to change along own subregion orientation the size of illumination iris face upper inner ring.When work, there is pinpoint rotating disk by rotation, as shown in Fig. 4 or Fig. 5, ring illumination diffraction optical element 401 is rotated to the position of laser beam irradiation.Laser beam irradiation is on annular is movably thrown light on the several continuous subregion of diffraction optical element 401, and laser beam optical axis direction is along Z-direction, direction along optical axis is placed Fourier transform lens after 401, produces the ring illumination of certain ring width at illumination iris face.In the time that ring illumination diffraction optical element 401 moves along subregion orientation, the interior ring diameter of illumination iris face changes thereupon.
Below by a specific embodiment, further illustrate the principle of work of lithography illuminating system of the present invention.
First determine designing requirement and parameter, designing requirement distributes for realizing ring illumination pupil, and parameter is that laser wavelength of incidence λ is 248nm, the maximum gauge of illumination iris cross section outer shroud
for 25mm, the minimum diameter of ring in illumination iris cross section
for 0mm.Pass through computing formula
obtain D
xfor 62.5mm, the number of movable diffractive-optical element subregion
wherein subregion size l is taken as 0.5mm, and in illumination iris cross section, the adjusting resolution ax d of ring is 0.2mm, D
xand D
yit is the Two-dimensional Maximum size of diffraction optical element.
To on illumination iris face, obtain now outer ring diameter 15mm, the pupil illumination pattern of interior ring diameter 10mm, Fourier transform lens focal length is 500mm.Calculate by formula, the x direction of one dimension continuous zoom beam expanding lens group expands size and should be S
x=l × (15mm-10mm)/Δ d=12.5mm, the subregion that outer ring diameter is corresponding is counted n
out=(25mm-15mm)/Δ d=50, the subregion that interior ring diameter is corresponding is counted n
in=(25mm-10mm)/Δ d=75.The course of work is as follows, by regulating one dimension continuous zoom beam expanding lens group, makes incident beam be of a size of 10mm (y) × 12.5mm (x), and y direction beam expander size constancy is 10mm, and x direction beam expander is of a size of 12.5mm.Then mobile diffraction optical element in the x-direction, drops in the subregion of number of regions 50 ~ 75 light beam, obtains outer ring diameter 15mm, and the pupil illumination of interior ring diameter 10mm distributes.
Diffraction optical element adopts one dimension partition type structure, and every sub regions contains M*N square position facies unit, and these square position facies units are combined into a position phase distribution matrix, produce required ring illumination pupil and distribute; The size t of square position facies unit is for being not more than
calculating rear morpheme facies unit size t is 2 μ m.
Diffraction optical element adopts one dimension partition type structure, distributes according to required illumination iris, and the position phase distribution matrix in every sub regions can obtain by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm.The concrete steps of lid Shi Beige-Sa Ke stone (G-S) iterative algorithm can be referring to Optik, 35,237-246,1972.For example design several the 4th sub regions from top to bottom, the ring illumination light field that this subregion produces is of a size of external diameter 24.4mm, internal diameter 24.2mm, the corresponding ring illumination light field producing of the 5th sub regions is of a size of external diameter 24.2mm, internal diameter 24mm.Can obtain by lid Shi Beige-Sa Ke stone (G-S) iterative algorithm the position phase distribution matrix of this subregion according to these conditions.Obtain successively after the position phase distribution matrix of every sub regions, obtain the position phase distribution matrix of this diffraction optical element entirety, i.e. complete design.
Compared with technology formerly, the present invention has following technological merit:
(1) the present invention adopts pupil Shaping Module to adopt partition type diffraction optical element, realize the function of endless belt internal diameter on the conical mirror group adjusting pupil plane in traditional pupil Shaping Module, thereby without conical mirror group, the overall transmitance of system is improved.
(2) the present invention, without conical mirror group, has reduced the difficulty of optical design, and the deteriorated problem of the pupil that does not exist conical mirror group to cause; Without the fourier lense group of design zoom, simplified design step and time.
(3) the present invention has saved the processing charges of conical mirror group, has reduced system manufacturing cost.
Claims (4)
1. the lithography illuminating system for ultraviolet photolithographic machine, be characterised in that its formation comprises: ultraviolet laser (11), one dimension continuous zoom beam expanding lens group (12), rotating disk mechanism (13), Fourier transform lens (14), even photosystem (16) and controller (18), the position relationship of above-mentioned component is as follows: the cross section that described ultraviolet laser (11) produces is square parallel beam, described one dimension continuous zoom beam expanding lens group (12) successively along this beam Propagation direction, rotating disk mechanism (13), Fourier transform lens (14) and even photosystem (16), described rotating disk mechanism (13) contains multiple diffraction optical elements, described controller (18) is accurately controlled the rotation of rotating disk mechanism (13) by circle scrambler, select required diffraction optical element, realize required light illumination mode, each diffraction optical element is arranged and is formed by multiple subregions, and described controller (18) is controlled described diffraction optical element and moved along its subregion orientation, realizes the adjusting of illumination iris face (15) upper inner ring size, the annular beam that described Fourier transform lens (14) is dispersed described diffraction optical element circularizes hot spot at its back focal plane illumination iris face up conversion, obtain required light illumination mode, the light distribution of this illumination iris face (15) is carried out homogenising processing through described even photosystem (16), and projects on mask face (17).
2. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described rotating disk mechanism (13) along even circumferential be provided with five diffraction optical elements, be followed successively by respectively ring illumination diffraction optical element (401), directions X two utmost point illumination diffraction optical elements (402), Y-direction two utmost point illumination diffraction optical elements (403), quadrupole illuminating diffraction optical element (404) and traditional lighting diffraction optical element (405), accordingly at the upper ring illumination that forms of described pupil plane (15), directions X two utmost point illuminations, Y-direction two utmost point illuminations, quadrupole illuminating and traditional lighting.
3. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described diffraction optical element is made up of the subregion of a series of one dimension partition types, the orientation of this subregion is identical with the moving direction of described diffraction optical element, every sub regions corresponds respectively to and produces different-diameter and the identical illumination endless belt of endless belt width, the subregion of described diffraction optical element is corresponding with the endless belt on described pupil plane, the illumination endless belt that every sub regions and adjacent subarea territory produce just in time joins, when work, by irradiating several continuous subregions, obtain a total illumination endless belt, the number that the width of this total illumination endless belt equals illuminated subregion is multiplied by the width of an illumination endless belt.
4. the lithography illuminating system of ultraviolet photolithographic machine according to claim 1, it is characterized in that described dimension continuous zoom beam expanding lens group (12), by the first spherical mirror (121) successively, the second spherical mirror (122), the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) form, described the first spherical mirror (121), the second spherical mirror (122) maintains static, described the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) are positioned on a guide rail (126), the controller (128) of one dimension continuous zoom beam expanding lens group is accurately controlled screw mandrel (127) by scrambler and is driven described the first cylindrical mirror (123), the second cylindrical mirror (124) and the 3rd cylindrical mirror (125) are mobile along guide rail (126), change the position relationship along direction of beam propagation between three cylindrical mirrors, the parallel beam of ultraviolet laser (11) output is expanded into: in y direction, size is fixed, the parallel beam of dimension adjustable in x direction.
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| CN109708756B (en) * | 2018-12-11 | 2022-02-08 | 南京邮电大学 | Imaging spectrometer based on diffraction effect and high spatial resolution spectral imaging method |
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| JP4798489B2 (en) * | 2006-01-23 | 2011-10-19 | 株式会社ニコン | Optical characteristic measuring method and apparatus, and exposure apparatus |
| CN101408285B (en) * | 2008-08-14 | 2010-06-02 | 上海微电子装备有限公司 | Illuminating apparatus generating continuous variable pupil |
| CN102109676B (en) * | 2011-02-25 | 2012-05-23 | 中国科学院上海光学精密机械研究所 | Designing method for multi-partition optical phase plate in photo-etching illumination |
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Effective date of registration: 20190925 Address after: Room 601-10, 6th floor, No. 2, Jingyuan Beijie, Beijing Economic and Technological Development Zone, Daxing District, Beijing, 100176 Patentee after: Beijing Guowang Optical Technology Co., Ltd. Address before: 800-211 201800 post office box, Shanghai, Jiading District Patentee before: Shanghai Optical Precision Machinery Inst., Chinese Academy of Sciences |
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