CN102898040A - Triple-silver low-emissivity coated glass and preparation method thereof - Google Patents
Triple-silver low-emissivity coated glass and preparation method thereof Download PDFInfo
- Publication number
- CN102898040A CN102898040A CN2011102120822A CN201110212082A CN102898040A CN 102898040 A CN102898040 A CN 102898040A CN 2011102120822 A CN2011102120822 A CN 2011102120822A CN 201110212082 A CN201110212082 A CN 201110212082A CN 102898040 A CN102898040 A CN 102898040A
- Authority
- CN
- China
- Prior art keywords
- layer
- silver
- dielectric combination
- coated glass
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
The invention relates to a triple-silver low-emissivity coated glass, which comprises a glass body and a coating film coated on the glass body. The coating film comprises two dielectric combination layers, three silver layers and two spacing layer dielectric combination layers. The two dielectric combination layers are respectively arranged at the upper layer and the lower layer of a coating layer. The three silver layers and the two spacing layer dielectric combination layers are alternately arranged between the two dielectric combination layers in order. The dielectric combination layers and the spacing layer dielectric combination layers are all composed of one or more film layers of SSTOx, CrNx, CdO, MnO2, InSbOx, TxO, SnO2, ZnO, ZnSnOx, ZnSnPbOx, ZrO2, AZO, Si3N4, SiO2, SiOxNy, BiO2, Al2O3, Nb2O5, Ta2O5, In2O3 and MoO3. The triple-silver low-emissivity coated glass disclosed in the invention abolishes a metal barrier layer in a traditional film layer structure, and employs novel material dielectric combination layers to conduct silver layer protection, so that the influence of film layers on visible light transmittance can be effectively reduced, and consequently, high visible light transmittance, low emissivity, and a good photothermal ratio can be obtained. Besides, with diverse color options, the triple-silver low-emissivity coated glass has a wide range of application.
Description
Technical field
The present invention relates to a kind of glass, be specifically related to a kind of Three-silver-layer low-radiation coated glass and preparation method thereof.
Background technology
Low radiation coated glass (claiming again LOW-E glass) is that to plate the film that multiple layer metal or other compounds form at glass surface be product.Low radiation coated glass is that a kind of outdoor sun power, visible light of can allowing as simple glass sees through, again can be as ir reflector (especially the centering far infrared rays has very high reflectivity), the coated glass of new generation that object secondary rays heat reflection is gone back.Under any climatope, use, all can reach the effect of controlling sunlight, save energy heat regulating and controlling and improving environment.
Three-silver low radiation glass (being Triple-silver LOW-E), as the high-end product in the low radiation coated glass, by nearly three layers silver layer and multiple layer metal oxidation or nitride compound form, have higher visible light transmissivity, very high infrared reflection rate, can obtain splendid heat insulation and preservation effect.
Yet, traditional with the low radiation coated glass of Ag as the infrared external reflection rete, usually before and after the Ag layer, increase metal barrier, to prevent that the Ag layer is etched, yet because the adding of metal barrier so that light transmission rate obviously reduce, Three-silver-layer low-radiation coated glass particularly, traditional low emissivity glass is in order to obtain lower U value (heat transfer coefficient), the SC(shading coefficient) and good photo-thermal than (LSG), just must reduce by the thickness that increases silver layer the radiant ratio of rete, to obtain desirable LSG, but the increase along with silver layer, just mean the reduction of visible light transmissivity, appearance color presents interference color, color is selected limited, can't satisfy the growing demand of client.
Therefore, the coated glass that a kind of visible light transmissivity is higher, cost is lower, the optional scope of color is wider is demanded urgently occurring.
Summary of the invention
For solving existing Three-silver-layer low-radiation coated glass to increase the silver layer that produces when silver layer improves the coated glass performance blocked up, visible light transmissivity is lower, appearance color presents interference color, color is selected the problems such as limited, the invention discloses a kind of Three-silver-layer low-radiation coated glass, to reach the purpose that improves visible light transmissivity, improving product performance, enlarges the optional scope of color.
Technical scheme of the present invention is as follows:
A kind of Three-silver-layer low-radiation coated glass comprises glass body and coats plated film on the described glass body that described plated film comprises two-layer dielectric combination layer, three layers of silver layer and two-layer wall dielectric combination layer;
Described two-layer dielectric combination layer lays respectively at the two-layer up and down of described coatings, and described three layers of silver layer and described two-layer wall dielectric combination layer be alternate being arranged between the described two-layer dielectric combination layer successively;
Described dielectric combination layer, wall dielectric combination layer are by SSTOx, CrNx, CdO, MnO
2, InSbOx, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3In one or more retes form, and described every kind of rete can arrange 1 layer or multilayer.
Preferably, the thickness of described dielectric combination layer is 10-80nm.
Preferably, the thickness of described wall dielectric combination layer is 10-200nm.
Preferably, the thickness of described silver layer is 5-40nm.
A kind of manufacture method of Three-silver-layer low-radiation coated glass adopts the vacuum magnetron sputtering coating film mode, and the concrete technology step is as follows:
(1), behind the glass body cleaning-drying, is placed on the vacuum sputtering district;
(2), formation of deposits the first dielectric combination layer on described glass body;
(3), at described the first dielectric combination layer formation of deposits the first silver layer;
(4), formation of deposits the first wall dielectric combination layer on described the first silver layer;
(5), formation of deposits the second silver layer on described the first wall dielectric combination layer;
(6), formation of deposits the second wall dielectric combination layer on described the second silver layer;
(7), formation of deposits the 3rd silver layer on described the second wall dielectric combination layer;
(8), formation of deposits the second dielectric combination layer on described the 3rd silver layer;
(9), form product.
Preferably, described dielectric combination layer all adopts with the wall dielectric combination layer and exchanges dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, the magnetically controlled DC sputtering mode deposits.
Preferably, described silver layer adopts planar cathode, magnetically controlled DC sputtering mode to deposit.
Preferably, described interchange dual rotary negative electrode, MF reactive magnetron sputtering mode are to carry out in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere.
Preferably, described planar cathode, magnetically controlled DC sputtering mode are to carry out in straight argon, argon oxygen or argon nitrogen atmosphere.
Three-silver-layer low-radiation coated glass disclosed by the invention, compare the metal barrier of having cancelled in the three-silver low radiation rete with traditional coated glass, adopt the dielectric combination layer of type material that silver layer is protected, so just, can effectively reduce rete to the impact of visible light transmissivity, thereby obtain higher visible light transmissivity, low-E, reach good photo-thermal ratio, improve the performance of product; And avoided to a certain extent the generation of interference color; Adopt the high hardness material close with glass material not only can between glass body and silver layer, play good bonding effect as the wall dielectric combination layer, and can offset the internal stress of composite film, particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious, and color is selected variation, and the scope of application is wider.
Description of drawings
In order to be illustrated more clearly in the embodiment of the invention or technical scheme of the prior art, the below will do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art, apparently, accompanying drawing in the following describes only is some embodiments of the present invention, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain according to these accompanying drawings other accompanying drawing.
Fig. 1 is the structural representation of a kind of Three-silver-layer low-radiation coated glass disclosed by the invention;
Fig. 2 is a kind of Three-silver-layer low-radiation coated glass preparation technology's disclosed by the invention schema.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the invention, the technical scheme in the embodiment of the invention is clearly and completely described, obviously, described embodiment only is the present invention's part embodiment, rather than whole embodiment.Based on the embodiment among the present invention, those of ordinary skills belong to the scope of protection of the invention not making the every other embodiment that obtains under the creative work prerequisite.
The invention discloses a kind of Three-silver-layer low-radiation coated glass, to reach the purpose that improves visible light transmissivity, improving product performance, enlarges the optional scope of color.
As shown in Figure 1, 2, a kind of Three-silver-layer low-radiation coated glass, comprise glass body 1 and coat plated film on the glass body, this plated film comprises two-layer dielectric combination layer 1-1 and 1-2, three layers of silver layer 2-1,2-2,2-3 and two-layer wall dielectric combination layer 3-1,3-2, and dielectric combination layer, wall dielectric combination layer are by SSTOx, CrNx, CdO, MnO
2, InSbOx, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3In the combination layer that forms of one or more retes, and every kind of rete can arrange 1 layer or multilayer.
Dielectric combination layer 1-1,1-2 lay respectively at the upper and lower two-layer of coatings, and silver layer 2-1,2-2,2-3 and wall dielectric combination layer 3-1,3-2 be alternate being arranged between the two-layer dielectric combination layer successively.The thickness of dielectric combination layer is 10-80nm, and the thickness of wall dielectric combination layer is 10-200nm, and the thickness of silver layer is 5-40nm.Dielectric combination layer all adopts with the wall dielectric combination layer and exchanges dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, magnetically controlled DC sputtering mode formation of deposits rete, and silver layer adopts planar cathode, magnetically controlled DC sputtering mode formation of deposits rete.Wherein the thickness of dielectric combination layer also can be 15,20,30,50,70 etc., and the thickness of wall dielectric combination layer is 25,40,60,80,120,160nm etc., and the thickness of silver layer is 5,10,16,20,26,8,35nm etc.Concrete thicknesses of layers all is determined on a case-by-case basis, and does not limit at this.
Interchange dual rotary negative electrode, MF reactive magnetron sputtering mode are to carry out in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, and planar cathode, magnetically controlled DC sputtering mode are to carry out in straight argon, argon oxygen or argon nitrogen atmosphere, and IF-FRE can be 20-40KHZ.
A kind of manufacture method of Three-silver-layer low-radiation coated glass adopts the vacuum magnetron sputtering coating film mode, and the concrete technology step is as follows:
(1), behind the glass body cleaning-drying, is placed on the vacuum sputtering district;
(2), adopt interchange dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, magnetically controlled DC sputtering mode formation of deposits first dielectric combination layer on glass body;
(3), adopt planar cathode, magnetically controlled DC sputtering mode at described the first dielectric combination layer formation of deposits the first silver layer;
(4), adopt interchange dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, magnetically controlled DC sputtering mode formation of deposits first wall dielectric combination layer on described the first silver layer;
(5), adopt planar cathode, magnetically controlled DC sputtering mode formation of deposits second silver layer on described the first wall dielectric combination layer;
(6), adopt interchange dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, magnetically controlled DC sputtering mode formation of deposits second wall dielectric combination layer on described the second silver layer;
(7), adopt planar cathode, magnetically controlled DC sputtering mode formation of deposits the 3rd silver layer on described the second wall dielectric combination layer;
(8), adopt interchange dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, magnetically controlled DC sputtering mode formation of deposits second dielectric combination layer on described the 3rd silver layer;
(9), form product.
Implementation of the present invention uses magnetron sputtering coater, comprise that 23 exchange the rotation double cathode, 8 direct current planar negative electrodes, the processing parameter that adopts following table to list, use 14 to exchange the rotation double cathode, 3 direct current planar negative electrodes are made Three-silver-layer low-radiation coated glass of the present invention, and the list of locations of its processing parameter and target is as follows:
Three-silver-layer low-radiation coated glass target position and processing parameter
All silicon nitride (Si in the table
3N
4) rete use sial (92:8) target, adopting to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-110kw, frequency is 20-40kHz;
All silicon oxynitrides (SiOxNy) rete uses sial (92:8) target in the table, adopts to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and frequency is 20-30kHz;
Zinc oxide (ZnO) retes all in the table use zinc-aluminium (98:2) target, adopt to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and frequency is 20-40kHz;
AZO retes all in the table use the AZO target, adopt to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw, and frequency is 20-40kHz;
All functions rete Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target in the table, and power is 2-10kw.
In the Three-silver-layer low-radiation coated glass described above, dielectric combination layer 1-1 is by SiOxNy, Si
3N
4, the combination rete that forms of ZnO trilamellar membrane, its combined films layer thickness is 25nm; Dielectric combination layer 1-2 is by AZO, SiOxNy, Si
3N
4The combination rete that trilamellar membrane forms, its combined films layer thickness is 34.6nm; The combination rete that wall dielectric combination layer 3-1 is comprised of AZO, two-layer SiOxNy, ZnO four tunics, its combined films layer thickness is 74.2nm; The combination rete that wall dielectric combination layer 3-2 is comprised of AZO, two-layer SiOxNy, ZnO four tunics, its combined films layer thickness is 69.8nm.
Wherein form the combination rete the number of plies, put in order and the material thickness of each rete, all be determined on a case-by-case basis, do not limit at this.
The glass optics properties that uses above-mentioned processing parameter to make following (glass is 6mm common white glass):
A, glass visible light transmissivity T=68.0%
Visible light glass surface reflectivity=11.0%
Visible light glass surface chromaticity coordinates a* value=-2.5
Visible light glass surface chromaticity coordinates b* value=-5.5
Visible light face reflectivity=8.0%
Visible light face chromaticity coordinates a*=1.0
Visible light face chromaticity coordinates b*=-5.1
Glass radiant ratio E=0.022
B, use the present invention to make the 6mm+12A+6mm(rete at outdoor inner face) double glazing of structure, as follows according to the data of ISO10292 standard test:
Visible light transmissivity T=62%
Visible light glass surface reflectivity (out)=13%
Visible light glass surface reflectivity (in)=10%
Sun power transmitance T=22%
Solar reflectance (out)=56%
G-value=0.26
Shading coefficient SC=0.30
U value=1.55W/m2K
Photo-thermal compares LSG=2.38.
Embodiment 2
All the other are identical with embodiment 1, and difference is, each makes up composition material, the number of plies, the thickness of rete, and the list of locations of its processing parameter and target is as follows:
Three-silver-layer low-radiation coated glass target position and processing parameter
Niobium oxides (Nb in the table
2O
5) layer use niobium oxides target, adopting to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, oxygen atmosphere, power is 50-100kw, frequency is 20-40kHz;
Titanium oxide (TiO in the table
2) the ceramic titanium oxide target of layer use, adopting to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, oxygen atmosphere, power is 50-100kw, frequency is 20-40kHz;
Zinc oxide in the table (ZnO) layer uses zinc-aluminium (98:2) target, adopts to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and frequency is 20-40kHz;
All silicon nitride (Si in the table
3N
4) layer use sial (92:8) target, adopting to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-110kw, frequency is 20-40kHz;
All silicon oxynitrides (SiOxNy) layer uses sial (92:8) target in the table, adopts to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and frequency is 20-30kHz;
All AZO layers use the AZO target in the table, adopt to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in the straight argon atmosphere;
Zinc-tin oxide in the table (ZnSnOx) layer uses zinc-tin (50:50) target, adopts to exchange dual rotary negative electrode, MF reactive magnetron sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-50kw, and frequency is 20-40kHz;
All functions layer Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target in the table, and power is 2-10kw;
In the Three-silver-layer low-radiation coated glass described above, dielectric combination layer 1-1 is by Nb
2O
5, TiO
2, the combination rete that forms of ZnO trilamellar membrane, its combined films layer thickness is 25nm; Dielectric combination layer 1-2 is by AZO, ZnSnOx, Si
3N
4The combination rete that trilamellar membrane forms, its combined films layer thickness is 34.6nm; The combination rete that wall dielectric combination layer 3-1 is comprised of AZO, two-layer SiOxNy, ZnO four tunics, its combined films layer thickness is 74.2nm; The combination rete that wall dielectric combination layer 3-2 is comprised of AZO, two-layer SiOxNy, ZnO four tunics, its combined films layer thickness is 69.8nm.
Wherein form the combination rete the number of plies, put in order and the material thickness of each rete, all be determined on a case-by-case basis, specifically do not limit.
The glass optics properties that uses above-mentioned processing parameter to make following (glass is 6mm common white glass):
A, glass visible light transmissivity T=72.0%
Visible light glass surface reflectivity=10.1%
Visible light glass surface chromaticity coordinates a* value=-2.1
Visible light glass surface chromaticity coordinates b* value=-4.8
Visible light face reflectivity=7.2%
Visible light face chromaticity coordinates a*=0.5
Visible light face chromaticity coordinates b*=-6.7
Glass radiant ratio E=0.020
B, use the present invention to make the 6mm+12A+6mm(rete at outdoor inner face) double glazing of structure, as follows according to the data of ISO10292 standard test:
Visible light transmissivity T=65%
Visible light glass surface reflectivity (out)=12%
Visible light glass surface reflectivity (in)=9%
Sun power transmitance T=23%
Solar reflectance (out)=45%
G-value=26.8
Shading coefficient SC=0.298
U value=1.55W/m2K
Photo-thermal compares LSG=2.42.
The present embodiment is the optimum rete array mode of Three-silver-layer low-radiation coated glass, by adopting the rete array mode of the present embodiment, so that the U value (heat transfer coefficient) of coated glass, SC, photo-thermal are than having obtained good improvement, and cancelled the metal barrier in the plated film, dielectric combination layer with type material is protected silver layer, so just, can reduce the impact on visible light transmissivity, thereby obtain good thermal property; And owing to not using metal barrier, thereby avoided to a certain extent the generation of interference color, add the control to the film layer spectrum curve, can guarantee that coated product is pure in the color of 0-45 ° of scope observation, disturb without red, purple, visible light transmissivity is higher, product performance are better, the optional scope of color is wider.And have good optical stability, weathering resistance, color is various, can satisfy different clients' demand, can extensively be generalized to vehicle glass and building glass market, and can obtain splendid heat insulation and preservation effect.
Except above-described embodiment, the thickness of each rete of composition plated film, the number of plies, plated film sequencing etc. also can be other situation, are determined on a case-by-case basis, and do not limit at this.
Three-silver-layer low-radiation coated glass disclosed by the invention, cancelled the metal barrier in traditional film layer structure, adopt the dielectric combination layer of type material that silver layer is protected, so just, rete be can effectively reduce on the impact of visible light transmissivity, thereby higher visible light transmissivity, low-E, and good photo-thermal ratio obtained; And avoided to a certain extent the generation of interference color, improve the performance of product; Adopt the high hardness material close with glass material not only can between glass body and silver layer, play good bonding effect as wall dielectric layer combination layer, and can offset the internal stress of composite film, particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious, and the variation that color is selected, the scope of application is wider.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the present invention.Multiple modification to these embodiment will be apparent concerning those skilled in the art, and General Principle as defined herein can be in the situation that do not break away from the spirit or scope of the present invention, in other embodiments realization.Therefore, the present invention will can not be restricted to these embodiment shown in this article, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (9)
1. a Three-silver-layer low-radiation coated glass is characterized in that, comprises glass body and coats plated film on the described glass body, and described plated film comprises two-layer dielectric combination layer, three layers of silver layer and two-layer wall dielectric combination layer;
Described two-layer dielectric combination layer lays respectively at the two-layer up and down of described coatings, and described three layers of silver layer and described two-layer wall dielectric combination layer be alternate being arranged between the described two-layer dielectric combination layer successively;
Described dielectric combination layer, wall dielectric combination layer are by SSTOx, CrNx, CdO, MnO
2, InSbOx, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO
2, AZO, Si
3N
4, SiO
2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3In one or more layers rete form, and described every kind of rete can arrange 1 layer or multilayer.
2. Three-silver-layer low-radiation coated glass according to claim 1 is characterized in that, the thickness of described dielectric combination layer is 10-80nm.
3. Three-silver-layer low-radiation coated glass according to claim 1 is characterized in that, the thickness of described wall dielectric combination layer is 10-200nm.
4. Three-silver-layer low-radiation coated glass according to claim 1 is characterized in that, the thickness of described silver layer is 5-40nm.
5. the manufacture method of a Three-silver-layer low-radiation coated glass adopts the vacuum magnetron sputtering coating film mode, it is characterized in that, the concrete technology step is as follows:
(1), behind the glass body cleaning-drying, is placed on the vacuum sputtering district;
(2), formation of deposits the first dielectric combination layer on described glass body;
(3), at described the first dielectric combination layer formation of deposits the first silver layer;
(4), formation of deposits the first wall dielectric combination layer on described the first silver layer;
(5), formation of deposits the second silver layer on described the first wall dielectric combination layer;
(6), formation of deposits the second wall dielectric combination layer on described the second silver layer;
(7), formation of deposits the 3rd silver layer on described the second wall dielectric combination layer;
(8), formation of deposits the second dielectric combination layer on described the 3rd silver layer;
(9), form product.
6. the manufacture method of Three-silver-layer low-radiation coated glass according to claim 5, it is characterized in that, described dielectric combination layer all adopts with the wall dielectric combination layer and exchanges dual rotary negative electrode, MF reactive magnetron sputtering mode or planar cathode, the magnetically controlled DC sputtering mode deposits.
7. the manufacture method of Three-silver-layer low-radiation coated glass according to claim 5 is characterized in that, described silver layer adopts planar cathode, magnetically controlled DC sputtering mode to deposit.
8. the manufacture method of Three-silver-layer low-radiation coated glass according to claim 6 is characterized in that, described interchange dual rotary negative electrode, MF reactive magnetron sputtering mode are to carry out in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere.
9. according to claim 6 or the manufacture method of 7 described Three-silver-layer low-radiation coated glass, it is characterized in that, described planar cathode, magnetically controlled DC sputtering mode are to carry out in straight argon, argon oxygen or argon nitrogen atmosphere.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102120822A CN102898040A (en) | 2011-07-27 | 2011-07-27 | Triple-silver low-emissivity coated glass and preparation method thereof |
| TW101110010A TW201305078A (en) | 2011-07-27 | 2012-03-23 | Triple-silver low radiation coating glass and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102120822A CN102898040A (en) | 2011-07-27 | 2011-07-27 | Triple-silver low-emissivity coated glass and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102898040A true CN102898040A (en) | 2013-01-30 |
Family
ID=47570567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011102120822A Pending CN102898040A (en) | 2011-07-27 | 2011-07-27 | Triple-silver low-emissivity coated glass and preparation method thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102898040A (en) |
| TW (1) | TW201305078A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103643210A (en) * | 2013-11-14 | 2014-03-19 | 中山市创科科研技术服务有限公司 | Low-cost low-radiant ratio membrane preparation method |
| CN103643209A (en) * | 2013-11-07 | 2014-03-19 | 中山市创科科研技术服务有限公司 | Method for preparing film with infrared shielding function |
| CN104441815A (en) * | 2014-11-12 | 2015-03-25 | 揭阳市宏光镀膜玻璃有限公司 | Golden-class double-silver LOW-E glass with high light transmittance, and preparation method of glass |
| CN109052989A (en) * | 2018-07-16 | 2018-12-21 | 信义节能玻璃（四川）有限公司 | The low radiation coated glass and preparation method thereof of dark brown substrate effect |
| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
| CN111072290A (en) * | 2019-11-29 | 2020-04-28 | 宁波瑞凌新能源科技有限公司 | Low-emissivity colorful film and preparation method thereof |
| CN111196683A (en) * | 2020-03-23 | 2020-05-26 | 中山市格兰特实业有限公司 | Three-silver temperable three-property gray Low-E glass |
| CN111253082A (en) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | Super-shielding heat-insulation type three-silver temperable Low-E glass and preparation method thereof |
| CN111517669A (en) * | 2020-06-09 | 2020-08-11 | 吴江南玻华东工程玻璃有限公司 | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108385063B (en) * | 2018-03-30 | 2020-01-14 | 江西泽发光电有限公司 | Coating method for quicksand texture ice drilling black |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070082219A1 (en) * | 2003-11-28 | 2007-04-12 | Saint-Gobain Glass France | Transparent substrate which can be used alternatively or cumulatively for thermal control, electromagnetic armour and heated glazing |
| CN101497500A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass capable of being subsequently processed |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
| CN201825868U (en) * | 2010-08-24 | 2011-05-11 | 中国南玻集团股份有限公司 | Silver-containing low emissivity glass |
-
2011
- 2011-07-27 CN CN2011102120822A patent/CN102898040A/en active Pending
-
2012
- 2012-03-23 TW TW101110010A patent/TW201305078A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070082219A1 (en) * | 2003-11-28 | 2007-04-12 | Saint-Gobain Glass France | Transparent substrate which can be used alternatively or cumulatively for thermal control, electromagnetic armour and heated glazing |
| CN101497500A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass capable of being subsequently processed |
| CN101497501A (en) * | 2009-03-06 | 2009-08-05 | 中国南玻集团股份有限公司 | Three-silver low radiation film glass |
| CN201825868U (en) * | 2010-08-24 | 2011-05-11 | 中国南玻集团股份有限公司 | Silver-containing low emissivity glass |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103643209A (en) * | 2013-11-07 | 2014-03-19 | 中山市创科科研技术服务有限公司 | Method for preparing film with infrared shielding function |
| CN103643210A (en) * | 2013-11-14 | 2014-03-19 | 中山市创科科研技术服务有限公司 | Low-cost low-radiant ratio membrane preparation method |
| CN104441815A (en) * | 2014-11-12 | 2015-03-25 | 揭阳市宏光镀膜玻璃有限公司 | Golden-class double-silver LOW-E glass with high light transmittance, and preparation method of glass |
| CN104441815B (en) * | 2014-11-12 | 2016-04-13 | 揭阳市宏光镀膜玻璃有限公司 | A kind of two silver-colored LOW-E glass of golden class of high transmission rate and preparation method |
| CN109052989A (en) * | 2018-07-16 | 2018-12-21 | 信义节能玻璃（四川）有限公司 | The low radiation coated glass and preparation method thereof of dark brown substrate effect |
| CN109052989B (en) * | 2018-07-16 | 2021-12-14 | 信义节能玻璃（四川）有限公司 | Low-emissivity coated glass with brown substrate effect and preparation method thereof |
| CN110092594A (en) * | 2019-05-31 | 2019-08-06 | 中国建材国际工程集团有限公司 | Three silver coating glass of one kind and preparation method thereof |
| CN111072290A (en) * | 2019-11-29 | 2020-04-28 | 宁波瑞凌新能源科技有限公司 | Low-emissivity colorful film and preparation method thereof |
| CN111196683A (en) * | 2020-03-23 | 2020-05-26 | 中山市格兰特实业有限公司 | Three-silver temperable three-property gray Low-E glass |
| CN111253082A (en) * | 2020-03-23 | 2020-06-09 | 中山市格兰特实业有限公司 | Super-shielding heat-insulation type three-silver temperable Low-E glass and preparation method thereof |
| CN111253082B (en) * | 2020-03-23 | 2023-11-14 | 中山市格兰特实业有限公司 | Super-shielding heat-insulating three-silver toughened Low-E glass and preparation method thereof |
| CN111517669A (en) * | 2020-06-09 | 2020-08-11 | 吴江南玻华东工程玻璃有限公司 | High-transmittance low-reflection steel three-silver low-emissivity glass and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201305078A (en) | 2013-02-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102898040A (en) | Triple-silver low-emissivity coated glass and preparation method thereof | |
| AU2012232886B2 (en) | Transparent substrate equipped with a thin-film multilayer | |
| CN101497501B (en) | Three-silver low radiation film glass | |
| CN101830643B (en) | Double silver coating glass and manufacturing method thereof | |
| EP2797743B1 (en) | Low-e panels with ternary metal oxide dielectric layer and method for forming the same | |
| US8728634B2 (en) | Appliance transparency | |
| US11149486B2 (en) | Nickel-aluminum blocker film multiple cavity controlled transmission coating | |
| JP6847350B2 (en) | Low reflection coated glass | |
| CN102490408A (en) | Temperable three-silver low radiation coated glass and production technology thereof | |
| CN110028251B (en) | Copper-containing double-silver low-emissivity coated glass capable of being subsequently processed and preparation method thereof | |
| CN105269893B (en) | A kind of low reflection high temperature resistant can tempering wear-resisting coated glass and production method | |
| US10563451B2 (en) | Nickel-aluminum blocker film controlled transmission coating | |
| TWI501931B (en) | Can strengthen the three silver low-emission coated glass | |
| CN102514279A (en) | Four-silver coated glass with low radiation and manufacturing technique thereof | |
| CN101935169A (en) | Film glass structure adopting TiO2 ceramic target magnetron sputtering and method thereof | |
| CN202157011U (en) | Low-radiation coating glass with three silver layers | |
| CN111704369A (en) | Panoramic gray double-silver low-emissivity coated glass and preparation method thereof | |
| CN110092594A (en) | Three silver coating glass of one kind and preparation method thereof | |
| CN202344934U (en) | Offsite-processing four-silver low-radiation coated glass | |
| CN201999858U (en) | Low-reflectivity coated glass coated with double silver layers and with TiO2 (titanium dioxide) serving as base layer | |
| CN202344954U (en) | Four-silver-layer low-radiation film-coated glass | |
| CN212833492U (en) | Panoramic gray double-silver low-emissivity coated glass | |
| CN210030460U (en) | Copper-containing double-silver low-emissivity coated glass capable of being subsequently processed | |
| CN102501449A (en) | Four-silver low emissivity coated glass capable of being processed in foreign places and manufacturing method thereof | |
| CN202344935U (en) | Three-silver low emissivity coated glass capable of being tempered |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C12 | Rejection of a patent application after its publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20130130 |