CN102764722B - Reverse dip-coating method and device thereof - Google Patents
Reverse dip-coating method and device thereof Download PDFInfo
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- CN102764722B CN102764722B CN201210272871.XA CN201210272871A CN102764722B CN 102764722 B CN102764722 B CN 102764722B CN 201210272871 A CN201210272871 A CN 201210272871A CN 102764722 B CN102764722 B CN 102764722B
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Abstract
The invention relates to a reverse dip-coating method and a device thereof. The device comprises a direct current regulated power supply, an electric push rod, a sol container and a substrate fixing device, wherein the sol container is a thermostatic container and is installed on a lifting push rod of the electric push rod, the electric push rod is controlled by the direct current regulated power supply, the advancing speed of the electric push rod is regulated through the voltage, and the substrate fixing device which is used for fixing a substrate is also arranged on one side of the sol container. The device has the advantages of being wide in control range of lifting speed, high in precision, good in stability, convenient to operate, good in continuity of coating, low in manufacturing cost of the device and the like, by the aid of the device, thin films with thicknesses in a range of dozens of nanometers to microns can be prepared on substrates which can be in any shape and of various sizes, and the uniformity and the consistency of prepared thin films are good.
Description
Technical field
The invention belongs to technical field of film preparation, relate to a kind of anti-method of pulling up for film forming and device thereof.
Background technology
Preparation of Thin Films by Sol-Gel Method has simple process, equipment requirement is low and be easy to prepare the advantages such as uniform multi-component film, is subject to extensive concern in field of film preparation.During with Preparation of Thin Films by Sol-Gel Method, its film technique mainly contains spin-coating method, spraying process and czochralski method.Wherein, spin-coating method is only applicable to undersized planar substrates, and its purposes is only limitted to the research and development in laboratory substantially; And spraying process and czochralski method can prepare film on difform large size substrate, laboratory and industrial production all has practical value.
The main processes of spraying process is: be put in special heating furnace by clean substrate, then with certain pressure and speed, colloidal sol is sprayed onto hot substrate surface with spray gun special and forms gel mould.Therefore, the thickness of film is by the impact of multiple parameters such as dissolved adhesiveness, pressure, spraying rate and spray time, and the uniformity of film depends on the effect of spray gun atomization colloidal sol uniformly fine drop.Comparatively speaking, czochralski method immerses among previously prepared good colloidal sol by whole clean substrate, then with the speed accurately controlled, substrate is lifted out reposefully from colloidal sol, the uniform gel mould of one deck is formed at the effect lower substrate surface of viscosity and gravity, film thickness depends primarily on viscosity and pull rate, and established technology process comparatively spraying process is simple.But drive in substrate traveling process at transmission device, if the precision and stability of transmission device is inadequate, substrate is easily shaken, and the uniformity of film is affected thus.Adopt the transmission device of high accuracy and high stability no doubt can address this problem, but this also make the cost of pulling apparatus extremely high.
In order to solve the vibration problems of substrate in czochralski method, patent CN200410022550.X proposes that one is counter lifts thinking, and namely fixed substrate is motionless, realizes the relative movement of substrate by discharging colloidal sol, solves the problem that substrate swings.But in discharge opeing process, what patent CN200410022550.X adopted is gravity or pressure is to control drain age velocity, and along with the discharge of colloidal sol, gravity reduces, and cause drain age velocity to reduce thus, film thickness is uneven up and down; During with Stress control drain age velocity, the accurate control of pressure also extremely not easily.In addition, colloidal sol must add colloidal sol during film after discharging again in container, and this makes the continuity being coated with membrane process not good.
Summary of the invention
The object of the present invention is to provide a kind of reverse dip-coating method and device thereof, it has the advantages such as pull rate controlled range is wide, precision is high, good stability, continuity that is easy to operate, film cost of manufacture that is good and device are cheap, thickness can be prepared from tens nanometers to the film of several microns on the substrate of arbitrary shape, sizes with this device, and preparation uniformity of film and uniformity good.
Technical program of the present invention lies in: a kind of reverse dip-coating method, comprise and contain collosol container and substrate holding apparatus, Sheng collosol container is arranged on a lowering or hoisting gear, substrate holding apparatus is fixed in the static structure of lowering or hoisting gear side, Sheng collosol container is driven to move up and down by lowering or hoisting gear, make to contain collosol container and produce relative motion, to realize reverse dip-coating with the substrate be arranged on substrate holding apparatus.
Above-mentioned lowering or hoisting gear is the vertical electric pushrod arranged, and described electric pushrod is driven by D.C. regulated power supply, and described D.C. regulated power supply is provided with voltage-regulation knob and LED display panel.Also comprise a casing, described D.C. regulated power supply, electric pushrod are arranged in casing, and described substrate holding apparatus is fixed on the upper lateral part of casing.
Above-mentioned substrate holding apparatus forms by the fixed bar be arranged on casing with for the geometrical clamp of clamping substrate.
Above-mentioned Sheng collosol container has the interlayer for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container.
Another technical scheme of the present invention is: a kind of reverse dip-coating device, this device includes D.C. regulated power supply, electric pushrod, Sheng collosol container and substrate holding apparatus, described Sheng collosol container is thermostatic container, described Sheng collosol container is arranged on the lifting push rod of electric pushrod, described electric pushrod is controlled by D.C. regulated power supply and by its gait of march of voltage-regulation, described Sheng collosol container side is also provided with the substrate holding apparatus for fixed substrate.Fixed substrate is motionless, with the gait of march of D.C. regulated power supply control electric pushrod, the container that colloidal sol is housed is driven to move up and down with electric pushrod, thus realize treating that the relative movement of coating base is to realize film, thus avoid transmission device and drive jitter problem in substrate moving process, thus obtain uniformity and the good film of uniformity.
In one embodiment, this device also comprises a casing, and described D.C. regulated power supply, electric pushrod are arranged in casing, and described substrate holding apparatus is fixed on the upper lateral part of casing.
In one embodiment, described substrate holding apparatus forms by the fixed bar be arranged on casing with for the geometrical clamp of clamping substrate.
In one embodiment, described Sheng collosol container has the interlayer for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container.
In one embodiment, described D.C. regulated power supply is provided with voltage-regulation knob and LED display panel.
The invention has the advantages that: because reverse dip-coating device provided by the invention no longer drives substrate to move with transmission device, but drive the movement that the container of colloidal sol is housed to realize the relative movement of substrate by electric pushrod, avoid the jitter problem in substrate moving process; Simultaneously, the gait of march of electric pushrod can be controlled easily and accurately by D.C. regulated power supply, therefore, this reverse dip-coating device has the advantages such as pull rate controlled range is wide, precision is high, good stability, continuity that is easy to operate, film cost of manufacture that is good and device are cheap, thickness can be prepared from tens nanometers to the film of several microns on the substrate of arbitrary shape, sizes with this device, and preparation uniformity of film and uniformity good.
Accompanying drawing explanation
Fig. 1 is the reverse dip-coating device schematic front view in embodiment.
Fig. 2 is the reverse dip-coating device schematic side view in embodiment.
Fig. 3 is for being reverse dip-coating process schematic.
Label declaration: 1-D.C. regulated power supply 1.1-voltage-regulation knob 1.2-LED display floater 1.3-current adjusting knob 2-electric pushrod 3-contains collosol container 3.1-interlayer 4-substrate holding apparatus 5-casing 5.1-fixed bar 5.2-geometrical clamp.
Detailed description of the invention
For above-mentioned feature and advantage of the present invention can be become apparent, special embodiment below, and coordinate accompanying drawing, be described in detail below, but the present invention is not limited to this.
Reverse dip-coating method of the present invention, comprise and contain collosol container and substrate holding apparatus, Sheng collosol container is arranged on a lowering or hoisting gear, substrate holding apparatus is fixed in the static structure of lowering or hoisting gear side, Sheng collosol container is driven to move up and down by lowering or hoisting gear, make to contain collosol container and produce relative motion, to realize reverse dip-coating with the substrate be arranged on substrate holding apparatus.
Above-mentioned lowering or hoisting gear is the vertical electric pushrod arranged, and described electric pushrod is driven by D.C. regulated power supply, and described D.C. regulated power supply is provided with voltage-regulation knob and LED display panel.Also comprise a casing, described D.C. regulated power supply, electric pushrod are arranged in casing, and described substrate holding apparatus is fixed on the upper lateral part of casing.
Above-mentioned substrate holding apparatus forms by the fixed bar be arranged on casing with for the geometrical clamp of clamping substrate.
Above-mentioned Sheng collosol container has the interlayer for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container.
Referring to accompanying drawing 1 ~ 2, reverse dip-coating device of the present invention, this device includes D.C. regulated power supply 1, electric pushrod 2, contains collosol container 3 and substrate holding apparatus 4, described Sheng collosol container 3 is thermostatic container, this thermostatic container has upper cover, described Sheng collosol container 3 is arranged on the lifting push rod of electric pushrod 2, and described electric pushrod 2 is controlled by D.C. regulated power supply 1, and described Sheng collosol container 3 side is also provided with the substrate holding apparatus 4 for fixed substrate.Fixed substrate is motionless, with the gait of march of D.C. regulated power supply control electric pushrod, the container that colloidal sol is housed is driven to move up and down with electric pushrod, thus realize treating that the relative movement of coating base is to realize film, thus avoid transmission device and drive jitter problem in substrate moving process, thus obtain uniformity and the good film of uniformity.
In the present embodiment, this device also comprises a casing 5, and described D.C. regulated power supply 1, electric pushrod 2 are arranged in casing 5, and described substrate holding apparatus 4 is fixed on the upper lateral part of casing.
In the present embodiment, described substrate holding apparatus forms by the fixed bar 5.1 be arranged on casing 5 with for the geometrical clamp 5.2 of clamping substrate.
In the present embodiment, described Sheng collosol container 3 has the interlayer 3.1 for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container 3.
In the present embodiment, described D.C. regulated power supply 1 is provided with voltage-regulation knob 1.1 and LED display panel 1.2.
Reverse dip-coating process schematic referring to accompanying drawing 3, Fig. 3.Wherein, A → C is the process that electric pushrod drives the container rising of containing colloidal sol, and C → E is the process that the container of electric pushrod drive Sheng colloidal sol declines, and the course of work of the present invention is:
Logical thermostatted water, to make the temperature of colloidal sol (i.e. viscosity) constant, thus avoids room temperature difference on the impact of film thickness, obtains consistent film;
1., after collosol temperature reaches setting value, on substrate geometrical clamp after fixing process, coating base is treated;
2., after adjustment current knob to maximum, regulation voltage to setting value (LED panel display), be transferred to I grade (path rises) by O shelves (open circuit stops) by switch, electric pushrod starts to drive container to move upward (accompanying drawing 3A);
3., after colloidal sol submergence substrate (namely arriving accompanying drawing 3C), manually switch is transferred to O shelves, or pre-designed height, automatically stop when push rod arrives accompanying drawing 3C position;
4. according to the needs of practical systems, push rod can stop the different time in accompanying drawing 3C position;
5. after regulation voltage to setting value, be transferred to by switch II grade (path declines), electric pushrod drives container to move downward, and this process is the control step of film thickness;
6. electric pushrod arrives behind accompanying drawing 3E position, and according to the needs of practical systems, the substrate after film can leave standstill and stop the different time and put into heating furnace again on substrate folder.
The foregoing is only preferred embodiment of the present invention, all equalizations done according to the present patent application the scope of the claims change and modify, and all should belong to covering scope of the present invention.
Claims (9)
1. a reverse dip-coating method, comprise and contain collosol container and substrate holding apparatus, it is characterized in that: Sheng collosol container is arranged on a lowering or hoisting gear, substrate holding apparatus is fixed in the static structure of lowering or hoisting gear side, Sheng collosol container is driven to move up and down by lowering or hoisting gear, make to contain collosol container and produce relative motion, to realize reverse dip-coating with the substrate be arranged on substrate holding apparatus.
2. reverse dip-coating method according to claim 1, it is characterized in that: described lowering or hoisting gear is the vertical electric pushrod arranged, described electric pushrod is driven by D.C. regulated power supply and by its gait of march of voltage-regulation, described D.C. regulated power supply is provided with voltage-regulation knob and LED display panel.
3. reverse dip-coating method according to claim 2, it is characterized in that: also comprise a casing, described D.C. regulated power supply, electric pushrod are arranged in casing, and described substrate holding apparatus is fixed on the upper lateral part of casing.
4. reverse dip-coating method according to claim 1, is characterized in that: described substrate holding apparatus forms by the fixed bar be arranged on casing with for the geometrical clamp of clamping substrate.
5. reverse dip-coating method according to claim 1, is characterized in that: described Sheng collosol container has the interlayer for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container.
6. a reverse dip-coating device, it is characterized in that: this device includes D.C. regulated power supply, electric pushrod, Sheng collosol container and substrate holding apparatus, described Sheng collosol container is thermostatic container, described Sheng collosol container is arranged on the lifting push rod of electric pushrod, described electric pushrod is controlled by D.C. regulated power supply and by its gait of march of voltage-regulation, described Sheng collosol container side is also provided with the substrate holding apparatus for fixed substrate; Described Sheng collosol container has the interlayer for passing into thermostatted water, with the collosol temperature in constant Sheng collosol container.
7. a kind of reverse dip-coating device according to claim 6, it is characterized in that: this device also comprises a casing, described D.C. regulated power supply, electric pushrod are arranged in casing, and described substrate holding apparatus is fixed on the upper lateral part of casing.
8. a kind of reverse dip-coating device according to claim 6 or 7, is characterized in that: described substrate holding apparatus forms by the fixed bar be arranged on casing with for the geometrical clamp of clamping substrate.
9. a kind of reverse dip-coating device according to claim 6, is characterized in that: described D.C. regulated power supply is provided with voltage-regulation knob and LED display panel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210272871.XA CN102764722B (en) | 2012-08-02 | 2012-08-02 | Reverse dip-coating method and device thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210272871.XA CN102764722B (en) | 2012-08-02 | 2012-08-02 | Reverse dip-coating method and device thereof |
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| CN102764722A CN102764722A (en) | 2012-11-07 |
| CN102764722B true CN102764722B (en) | 2015-04-15 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5386780A (en) * | 1977-01-12 | 1978-07-31 | Gunze Kk | Excellent lowwtemperature heattsealable twooaxis oriented composite film |
| CN1698974A (en) * | 2004-05-17 | 2005-11-23 | 电子科技大学 | Reversed dip coating device |
| CN2835205Y (en) * | 2005-09-09 | 2006-11-08 | 张青龙 | Automatic lifting-pulling apparatus for sample |
| CN201169560Y (en) * | 2008-02-01 | 2008-12-24 | 西安理工大学 | Lifting type collosol and gel film-making machine |
| CN102615015A (en) * | 2012-03-26 | 2012-08-01 | 天津城市建设学院 | Compound nano film preparation instrument |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202700765U (en) * | 2012-08-02 | 2013-01-30 | 福州大学 | Reverse pulling coating device |
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2012
- 2012-08-02 CN CN201210272871.XA patent/CN102764722B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5386780A (en) * | 1977-01-12 | 1978-07-31 | Gunze Kk | Excellent lowwtemperature heattsealable twooaxis oriented composite film |
| CN1698974A (en) * | 2004-05-17 | 2005-11-23 | 电子科技大学 | Reversed dip coating device |
| CN2835205Y (en) * | 2005-09-09 | 2006-11-08 | 张青龙 | Automatic lifting-pulling apparatus for sample |
| CN201169560Y (en) * | 2008-02-01 | 2008-12-24 | 西安理工大学 | Lifting type collosol and gel film-making machine |
| CN102615015A (en) * | 2012-03-26 | 2012-08-01 | 天津城市建设学院 | Compound nano film preparation instrument |
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| CN102764722A (en) | 2012-11-07 |
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