CN102738590A - Metamaterial with high dielectric constant - Google Patents
Metamaterial with high dielectric constant Download PDFInfo
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- CN102738590A CN102738590A CN2011100911364A CN201110091136A CN102738590A CN 102738590 A CN102738590 A CN 102738590A CN 2011100911364 A CN2011100911364 A CN 2011100911364A CN 201110091136 A CN201110091136 A CN 201110091136A CN 102738590 A CN102738590 A CN 102738590A
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Abstract
The invention relates to a metamaterial with a high dielectric constant. The metamaterial comprises at least one metamaterial sheet layer. The each metamaterial sheet layer possesses a first substrate and second substrate which are oppositely arranged. A plurality of artificial microstructures are attached to a surface of the first substrate, wherein the surface faces the second substrate. A gap distance between the first substrate and the second substrate roughly equals to a thickness of the artificial microstructures. The first substrate and the second substrate which are arranged on two sides of the artificial microstructures are roughly and tightly contacted with the artificial microstructures so that the number of electric field lines which pass through the substrates is increased and an effective dielectric constant of the metamaterial is effectively increased too.
Description
Technical field
The present invention relates to ultra field of materials, more particularly, relate to the ultra material of a kind of high-k.
Background technology
Dielectric constant (permittivity) is the parameter of material to electric field response, and material can produce charge inducing and weaken electric field when extra electric field, and the ratio of electric field is dielectric constant in extra electric field in the former vacuum and the final material, claims permitivity again.
Occurring in nature, any material all have its specific dielectric constant values or dielectric constant curve under given conditions.Conventional dielectric constant range is between 1～30, and dielectric constant promptly belongs to high dielectric constant material above 30 material.The higher material of dielectric constant is placed in the electric field, and the intensity of field can have considerable decline in dielectric substance.Therefore, the material that dielectric constant is high is commonly used to make electric capacity.
Along with technology development with rapid changepl. never-ending changes and improvements; People are increasingly high to the application requirements of material; In some occasion; Needed dielectric constant values is far above the dielectric constant values of the existing material of nature, and the higher insulator of existing dielectric constant can not reach requirement, and this will cause bottleneck for technological and research and development of products.In fact, the material that exists naturally is difficult to all realize this requirement that therefore, people turn to made ultra material, in the hope of realizing above-mentioned technical purpose.
Ultra material is a kind of can the novel artificial synthetic material of electromagnetism generation response the composition by substrate with attached to the artificial micro-structural on the substrate.Because artificial micro-structural is generally certain geometric structure that has that metal wire is arranged into, therefore can produce response by electromagnetism, thereby make ultra material monolithic embody the electromagnetic property that is different from substrate, for example dielectric constant is different with magnetic permeability.But existing ultra material receives the influence of its architectural feature, can not obtain very high dielectric constant, for example is higher than 30 even 50 dielectric constant values.
Summary of the invention
The technical problem that the present invention will solve is, to the defective of prior art, provides a kind of high-k ultra material.
The technical solution adopted for the present invention to solve the technical problems is: provide a kind of high-k ultra material; Comprise at least one ultra sheet of material; Each ultra sheet of material has first substrate and second substrate that is provided with in opposite directions; Said first substrate on the surface of second substrate, be attached with a plurality of artificial micro-structurals, the clearance distance between said first, second substrate equals the thickness of said artificial micro-structural.
In the ultra material of high-k of the present invention, the ultra material of said high-k comprises a plurality of ultra sheet of material, and said a plurality of ultra sheet of material are along being superposed to one perpendicular to its surperficial direction.
In the ultra material of high-k of the present invention, said a plurality of artificial micro-structurals array arrangement on said first substrate surface.
In the ultra material of high-k of the present invention, the thickness of said ultra sheet of material is not more than 1/10th of a preset electromagnetic wavelength.
In the ultra material of high-k of the present invention, said artificial micro-structural is the wire that is arranged into geometrical pattern.
In the ultra material of high-k of the present invention, said artificial micro-structural is " worker " font or plane snowflake shape.
In the ultra material of high-k of the present invention, said artificial micro-structural is the derived structure of said plane snowflake shape.
In the ultra material of high-k of the present invention, the clearance distance between said first, second substrate is less than 0.1mm.
In the ultra material of high-k of the present invention, the thickness of said artificial micro-structural is at 0.005～0.05mm.
In the ultra material of high-k of the present invention, the thickness of said artificial micro-structural is 0.018mm.
The ultra material of the high-k of embodiment of the present invention has following beneficial effect: because first substrate of artificial micro-structural both sides contacts with second substrate and its are tight, make the electric field line quantity of passing substrate increase, effectively improved the effective dielectric constant of ultra material.
Description of drawings
To combine accompanying drawing and embodiment that the present invention is described further below, in the accompanying drawing:
Fig. 1 is the structural representation of a ultra sheet of material of the present invention;
Fig. 2 is the structural representation that is piled up the ultra material of high-k that forms by ultra sheet of material shown in Figure 1;
Fig. 3 is the fractionation structure chart of each ultra sheet of material;
Fig. 4 is the structural representation of each ultra material cell of ultra sheet of material shown in Figure 1;
Fig. 5 is the disassembled perspective view of ultra material cell shown in Figure 4;
Fig. 6 is the structural representation of the ultra material cell of prior art.
Embodiment
The present invention relates to the ultra material of a kind of high-k, comprise at least one ultra sheet of material 1, as shown in Figure 1.When ultra sheet of material 1 has when a plurality of, each ultra sheet of material 1 is along the direction stack perpendicular to lamella, and is assembled into one through mechanical connection, welding or bonding mode, and is as shown in Figure 2.
Consult Fig. 1, Fig. 3 can know, ultra sheet of material 1 comprises the plate shape substrates of two identical even uniform thickness, is respectively first substrate 2 and second substrate 3.Two substrates superpose in opposite directions, and the artificial micro-structural 4 that is attached with a plurality of array arrangements on the surface of second substrate 3 of first substrate 2.Among this paper; The surface of substrate is refered in particular to and is parallel to each other in the substrate outline and two planes that area is maximum; Be defined as the thickness direction of substrate and whole ultra material perpendicular to the direction on this plane; Then the length on the substrate thickness direction is the thickness of substrate, and the plane that a circle parallel with thickness direction connects successively is the lateral edges of substrate.
With one group of spacing equate and a plurality of first planes of being parallel to each other and another group all perpendicular to first plane and a plurality of second planes of having same spacing, being parallel to each other; Two substrates are divided into a plurality of identical side's bodily form grids respectively virtually, and wherein vertical each other and while of first plane and second plane is perpendicular to the surface of substrate.
Each grid of first substrate 2 is first base board unit 20; Each grid of second substrate 3 is second base board unit 30; And make and be attached with an artificial micro-structural 4 on the surface of each first base board unit 20; Then the artificial micro-structural 4 on each first relative base board unit 20 and second base board unit 30 and first base board unit 20 constitutes a ultra material cell 5 jointly, and is as shown in Figure 4.Whole ultra sheet of material 1 can be regarded as by a plurality of ultra material cell 5 and is row, serves as the arrays formed of row with the other direction perpendicular to this direction with a direction.
Ultra material is to be applied in the specific electromagnetic field environment, and electromagnetic wavelength is known in advance or sets in this electromagnetic field environment.The ultra material cell 5 of each side's bodily form among the present invention, preferably the length of its length and width, thickness is not more than 1/10th of above-mentioned electromagnetic wavelength; Certainly, the length of its length and width, thickness is not more than and all can two of electromagnetic wavelength/a period of time.
The concrete structure of ultra material cell 5 is as shown in Figure 5, comprises artificial micro-structural 4, second base board unit 30 on first base board unit 20, first base board unit 20.Artificial micro-structural 4 is the wires that are arranged into certain geometrical shape or topology, and material wiry is selected non-ferrous metals such as the good silver of electrical conductance, copper usually for use.The artificial micro-structural 4 of present embodiment is " worker " font wire, comprises linear first wire and is vertically connected on two second wires at the first wire two ends respectively.
Artificial micro-structural 4 also can be other shapes, and like the two-dimentional snowflake shape on plane, it comprises two four second wires that intersect vertically first wire of " ten " font each other and be vertically connected on each first wire two ends respectively.Artificial micro-structural 4 can also be the derived structure of plane snowflake shape; Be it except that two first wires that comprise that plane snowflake shape had and four second wires; Also comprise the 3rd wire that is vertically connected on each second wire two ends respectively, be vertically connected on the 4th wire at each the 3rd wire two ends respectively;, the rest may be inferred.
Certainly, artificial micro-structural 4 of the present invention also has multiple implementation, as long as had certain geometric figure and can be produced the structure of response to electromagnetic field by what wire or metal wire constituted, all can be used as artificial micro-structural 4 of the present invention.
Because on the surface of artificial micro-structural 4 attached to the first base material unit; And the wire that constitutes artificial micro-structural 4 has certain thickness; Therefore the thickness (the also thickness of promptly ultra sheet of material 1) of ultra material cell 5 equals the thickness of first substrate 2, the thickness of second substrate 3 and the spacing distance sum between the two, and the spacing distance between first substrate 2 and second substrate 3 equals the thickness of artificial micro-structural 4 and adds that artificial micro-structural 4 outer surfaces arrive the surperficial distance of second substrate 3 on the other side.
Preferably, first, second substrate 3 of the present invention clamps, and makes artificial micro-structural 4 directly fit with second substrate, 3 surfaces and contact that then the spacing distance between first, second substrate equals the thickness of artificial micro-structural 4.
But, because artificial micro-structural 4 is extremely thin, when having certain error in manufacturing, processing, the assembling process, artificial micro-structural 4 can not directly be fitted with second substrate 3, but has the gap, and within the specific limits, this gap allows.
Therefore, in the present invention, artificial micro-structural 4 outer surfaces are fitted with second substrate 3 basically, also are the thickness that spacing distance between first, second substrate equals said artificial micro-structural 4 basically.Equaling basically here is meant that the thickness s of above-mentioned spacing distance d and artificial micro-structural 4 is suitable, quite is meant the two in the same order of magnitude on the common meaning, and promptly s≤d≤10s is further defined to s≤d≤2s among the present invention, preferred d=s.
Usually, the thickness s of the artificial micro-structural 4 of ultra material is preferably 0.018mm among the present invention between 0.005～0.05mm, and then the spacing distance d of first, second substrate is preferably less than 0.1mm in the scope of 0.005～0.5mm.
Known ultra material is a kind of novel artificial synthetic material that can produce specific response to electromagnetic wave; Existing ultra material is to be formed by stacking a plurality of identical substrates; And all be provided with artificial micro-structural 4 on every substrate; Gap between the adjacent substrate is thicker (not being on the same order of magnitude usually) with respect to the thickness of artificial micro-structural 4, so the sphere of action of each artificial micro-structural 4 is only at the substrate that is adhered to.
And among the present invention,, the two is all contacted or basic contact with artificial micro-structural 4 because first substrate 2 and second substrate 3 clamp, make artificial micro-structural 4 when electromagnetic wave is produced response, can act on simultaneously on first substrate 2 and second substrate 3.
For example in the embodiment shown in fig. 5, artificial micro-structural 4 is " worker " font, can equivalence is an electric capacity and the connecting of inductance; Electric capacity exists the edge effect meeting to produce electric field; All there is substrate artificial micro-structural 4 both sides, and then a part of electric field line can pass substrate, and the electric field line that passes substrate can be to the electron production response of substrate inside; Make its resonance, the effective dielectric constant of then whole ultra material cell 5 changes.The effective dielectric constant of ultra material cell 5 is directly proportional with the product of the dielectric constant of field wire that passes substrate and substrate self, and the electric field line that promptly passes is many more, and the dielectric constant of substrate self is big more, and effective dielectric constant is also big more.
Artificial micro-structural on the existing ultra material has only the field wire of artificial micro-structural one side to pass the substrate that is adhered to when electromagnetic wave is produced response, and opposite side is not because of leaving unused with the opposite side substrate contacts; Among the present invention, the field wire of artificial micro-structural 4 both sides makes the electric field line quantity of passing increase with passing first substrate 2 and second substrate 3 respectively, thereby improves the dielectric constant of ultra material cell 5, finally improves the dielectric constant of whole ultra material.
For example, in a contrast embodiment, like Fig. 5, shown in Figure 6; It is 4.8 FR-4 material that prior art and substrate of the present invention are dielectric constant; Artificial micro-structural 4 is selected copper for use, and the thickness a of ultra sheet of material 1 is 1mm, and long b, the wide c of each ultra material cell 5 are 1mm; Artificial micro-structural 4 is " worker " font, and thickness s is 0.018mm, and the live width w of metal wire is 0.1mm, the first vertical metal filament length H=0.8mm, the two parallel second metal filament length L=0.8mm.The electromagnetic wave measurement frequency of choosing is between 2.4～2.6GHz.
Among the present invention shown in Figure 5, the thickness of first, second substrate is 0.49mm, and the spacing distance d between the two is 0.02mm.The dielectric constant that records this ultra material cell 5 is between 30～35.
In the prior art shown in Figure 5, the thickness of substrate is 0.982mm, and the dielectric constant that is somebody's turn to do ultra material cell that records is between 4～10.
It is thus clear that, the ultra material cell 5 with double layer substrate of the present invention, its dielectric constant is higher than the ultra material cell 5 of the single layer substrate of prior art far away, compares with the ultra material of prior art, will demonstrate very large advantage.
In addition,, for example select for use pottery as substrate if adopt the high substrate of dielectric constant, dielectric constant even can reach about 80 then, this is nature material and the inaccessiable value of existing ultra material, thereby satisfies the specific demand of some special occasions.
Therefore, combine accompanying drawing that embodiments of the invention are described above, but the present invention is not limited to above-mentioned embodiment; Above-mentioned embodiment only is schematic; Rather than restrictive, those of ordinary skill in the art is not breaking away under the scope situation that aim of the present invention and claim protect under enlightenment of the present invention; Also can make a lot of forms, these all belong within the protection of the present invention.
Claims (10)
1. ultra material of high-k; It is characterized in that; Comprise at least one ultra sheet of material; Each ultra sheet of material has in opposite directions first substrate and second substrate that is provided with, said first substrate on the surface of second substrate, be attached with a plurality of artificial micro-structurals, the clearance distance between said first, second substrate equals the thickness of said artificial micro-structural basically.
2. the ultra material of high-k according to claim 1 is characterized in that the ultra material of said high-k comprises a plurality of ultra sheet of material, and said a plurality of ultra sheet of material are along being superposed to one perpendicular to its surperficial direction.
3. the ultra material of high-k according to claim 1 is characterized in that, said a plurality of artificial micro-structurals array arrangement on said first substrate surface.
4. the ultra material of high-k according to claim 1 is characterized in that, the thickness of said ultra sheet of material is not more than 1/10th of a preset electromagnetic wavelength.
5. the ultra material of high-k according to claim 1 is characterized in that said artificial micro-structural is the wire that is arranged into geometrical pattern.
6. the ultra material of high-k according to claim 5 is characterized in that, said artificial micro-structural is " worker " font or plane snowflake shape.
7. the ultra material of high-k according to claim 6 is characterized in that, said artificial micro-structural is the derived structure of said plane snowflake shape.
8. the ultra material of high-k according to claim 1 is characterized in that the clearance distance between said first, second substrate is less than 0.1mm.
9. the ultra material of high-k according to claim 8 is characterized in that the thickness of said artificial micro-structural is at 0.005～0.05mm.
10. the ultra material of high-k according to claim 9 is characterized in that the thickness of said artificial micro-structural is 0.018mm.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110091136.4A CN102738590B (en) | 2011-04-12 | 2011-04-12 | Metamaterial with high dielectric constant |
| EP11863605.9A EP2698872B1 (en) | 2011-04-12 | 2011-10-27 | Artificial dielectric material |
| ES11863605T ES2962234T3 (en) | 2011-04-12 | 2011-10-27 | Artificial dielectric material |
| US14/111,498 US9799431B2 (en) | 2011-04-12 | 2011-10-27 | Artificial electromagnetic material |
| PCT/CN2011/081385 WO2012139367A1 (en) | 2011-04-12 | 2011-10-27 | Artificial dielectric material |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201110091136.4A CN102738590B (en) | 2011-04-12 | 2011-04-12 | Metamaterial with high dielectric constant |
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| CN102738590A true CN102738590A (en) | 2012-10-17 |
| CN102738590B CN102738590B (en) | 2015-04-22 |
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| CN201110091136.4A Active CN102738590B (en) | 2011-04-12 | 2011-04-12 | Metamaterial with high dielectric constant |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107331970A (en) * | 2017-06-30 | 2017-11-07 | 东南大学 | A kind of super surface of two waveband high wave transmission rate |
| CN110416737A (en) * | 2019-07-25 | 2019-11-05 | 重庆邮电大学 | A kind of super surface beam splitter of Terahertz |
| CN110518362A (en) * | 2019-09-03 | 2019-11-29 | 山东大学 | A kind of microstrip antenna and application based on metamaterial |
| CN110609422A (en) * | 2018-06-15 | 2019-12-24 | 京东方科技集团股份有限公司 | Metamaterial structure unit, metamaterial and electronic device |
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| JPH09181521A (en) * | 1995-12-27 | 1997-07-11 | Kyocera Corp | Plate type dielectric lens structure and its production |
| CN101494310A (en) * | 2008-11-27 | 2009-07-29 | 电子科技大学 | Tunable microwave material with negative refractive index |
| CN201515017U (en) * | 2009-11-04 | 2010-06-23 | 东南大学 | lens antenna |
| CN101826657A (en) * | 2009-03-06 | 2010-09-08 | 财团法人工业技术研究院 | Dual-polarized antenna structure, antenna housing and designing method thereof |
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2011
- 2011-04-12 CN CN201110091136.4A patent/CN102738590B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09181521A (en) * | 1995-12-27 | 1997-07-11 | Kyocera Corp | Plate type dielectric lens structure and its production |
| CN101494310A (en) * | 2008-11-27 | 2009-07-29 | 电子科技大学 | Tunable microwave material with negative refractive index |
| CN101826657A (en) * | 2009-03-06 | 2010-09-08 | 财团法人工业技术研究院 | Dual-polarized antenna structure, antenna housing and designing method thereof |
| CN201515017U (en) * | 2009-11-04 | 2010-06-23 | 东南大学 | lens antenna |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107331970A (en) * | 2017-06-30 | 2017-11-07 | 东南大学 | A kind of super surface of two waveband high wave transmission rate |
| CN110609422A (en) * | 2018-06-15 | 2019-12-24 | 京东方科技集团股份有限公司 | Metamaterial structure unit, metamaterial and electronic device |
| CN110609422B (en) * | 2018-06-15 | 2021-01-22 | 京东方科技集团股份有限公司 | Metamaterial structure unit, metamaterial and electronic device |
| CN110416737A (en) * | 2019-07-25 | 2019-11-05 | 重庆邮电大学 | A kind of super surface beam splitter of Terahertz |
| CN110518362A (en) * | 2019-09-03 | 2019-11-29 | 山东大学 | A kind of microstrip antenna and application based on metamaterial |
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