CN102621602A - Preparation method of biplane super-resolution imaging lens - Google Patents
Preparation method of biplane super-resolution imaging lens Download PDFInfo
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- CN102621602A CN102621602A CN2012101079596A CN201210107959A CN102621602A CN 102621602 A CN102621602 A CN 102621602A CN 2012101079596 A CN2012101079596 A CN 2012101079596A CN 201210107959 A CN201210107959 A CN 201210107959A CN 102621602 A CN102621602 A CN 102621602A
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- 238000003384 imaging method Methods 0.000 title claims abstract description 39
- 238000002360 preparation method Methods 0.000 title claims description 17
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052709 silver Inorganic materials 0.000 claims abstract description 35
- 239000004332 silver Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims abstract description 13
- 239000002243 precursor Substances 0.000 claims abstract description 12
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 238000004528 spin coating Methods 0.000 claims description 13
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 11
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 11
- 239000010453 quartz Substances 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 10
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 3
- 230000000644 propagated effect Effects 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 2
- 230000008034 disappearance Effects 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims description 2
- 239000000243 solution Substances 0.000 claims 4
- 239000011259 mixed solution Substances 0.000 claims 1
- 238000001259 photo etching Methods 0.000 abstract description 5
- 101710134784 Agnoprotein Proteins 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000004026 adhesive bonding Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
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Abstract
The invention provides a method for preparing a biplane super-resolution imaging lens, which comprises the following steps: preparing a flat-bottomed groove with submicron depth on an ultraviolet transparent substrate, wherein the cross section of the groove parallel to the surface of the substrate is in a shape of a circle, a square, a regular octagon or a rectangle; coating a layer of silver precursor solution on a substrate, wherein the silver precursor solution can form an arc surface film layer at the position of a groove under the action of surface tension, and the precursor solution is solidified into a silver film after being heated or irradiated by ultraviolet light; then coating a layer of sol-like medium on the silver film layer, wherein the sol-like medium forms another cambered surface film layer at the position of the groove under the action of surface tension, and the sol-like medium is solidified into a medium film after being heated; and repeating the steps until the grooves are filled, and obtaining the zoom-magnification super-resolution imaging lens with the object plane and the image plane both being planes. The biplane zoom magnification super-resolution imaging lens can be used for two-dimensional or one-dimensional reduction photoetching or magnification imaging.
Description
Technical field
The present invention relates to the technical field of lens preparation; Relate in particular to a kind of preparation method of biplane super-resolution imaging lens; It is a kind of convergent-divergent multiplying power super-resolution imaging lens preparation method, and it prepares the method for biplane convergent-divergent multiplying power super-resolution imaging lens through alternately coating, curing silver film and dielectric layer in flat bottomed recess.
Background technology
Convergent-divergent multiplying power super-resolution imaging lens utilize the surface plasma bundle to die characteristic that ripple propagates perpendicular to medium/metal rete interface direction in the medium/metal multilayer film; The medium/metal rete is prepared into curved-surface structure; The surface plasma bundle ripple that dies is propagated by predetermined route is crooked, realized the amplification of image or dwindle.Convergent-divergent multiplying power super-resolution imaging lens can be applicable to aspects such as ultra diffraction imaging, nano-photoetching, have a extensive future.But the object plane and the image planes of the convergent-divergent multiplying power super-resolution imaging lens of the type are generally curved surface, and this makes it be difficult to combine with projection lithography system, the carrying out of photoetching processes such as also inconvenient gluing, development.
A kind of plane convergent-divergent multiplying power super-resolution imaging lens that the dielectric layer by the silverskin of vapor deposition and spin coating of the researchist of photoelectric technology research institute of Chinese Academy of Sciences design is alternately formed can and be practised physiognomy and all make the plane the object plane of lens.The thickness of silverskin each position in groove of vapor deposition equates in these plane convergent-divergent multiplying power super-resolution imaging lens, and the dielectric layer of spin coating can form cambered surface in groove location under capillary effect, and same rete each position thickness in groove is unequal.Thereby, be difficult to make the thickness of adjacent silverskin and dielectric layer each position in groove all to meet matching condition.Improve the image quality of plane convergent-divergent multiplying power super-resolution imaging lens, need make the thickness of every layer of silverskin optional position in groove and the thickness of adjacent dielectric remain on certain proportion, with Satisfying Matching Conditions in this position.
Summary of the invention
The technical matters that the present invention will solve is: to the restriction part of existing plane convergent-divergent multiplying power super-resolution imaging lens making; The preparation method of biplane super-resolution imaging lens is provided; This method only need be used conventional photoetching, plated film and gluing technology; Just can prepare object plane and image planes and be the convergent-divergent multiplying power super-resolution imaging lens on plane, have huge application potential aspect photoetching and the amplification imaging dwindling.
The technical solution adopted for the present invention to solve the technical problems is: a kind of preparation method of biplane super-resolution imaging lens, and the step of this method is following:
Step (1) prepares the flat bottomed recess of the submicron order degree of depth on the substrate of UV transparent, the cross sectional shape that groove is parallel to substrate surface is circular, square, octagon or rectangle;
The precursor solution of step (2) spin coating one deck silver on substrate; Precursor solution can form the cambered surface rete in groove location under capillary effect; Precursor solution is cured as silverskin behind heating or UV-irradiation, and the thickness of said silver film is 8nm to 50nm;
Step (3) adopts the method for spin coating in the groove that has deposited one deck silver film, to be coated with the curable medium sol layer of one deck; The medium sol layer can form the cambered surface rete in groove under capillary effect, the medium sol layer is cured as dielectric layer after heat treated; Thickness after said dielectric layer solidifies is 8nm to 50nm;
Step (4) is alternately coating, curing silver film and coating, curing medium layer in said groove; Obtain the multilayer cambered surface rete that silver layer and dielectric layer are alternately formed; Up to groove is filled and led up, promptly prepare the convergent-divergent multiplying power super-resolution imaging lens that the two sides is the plane.
Substrate material is quartz, glass, silicon nitride or polyimide in the said step (1), and the diameter of groove or the length of side are 400nm to 2000nm, and the degree of depth of groove is 50nm to 500nm.
The precursor solution of silverskin can be the suspending liquid of Nano silver grain in the said step (2), or the WS of silver nitrate, or the potpourri of silver nitrate and organic solvent.
The material of said step (3) medium sol layer can be slim photoresist such as SOG, PMMA or AR3170, AR7700 etc.; The thickness of every layer of dielectric layer optional position in groove and the adjacent silver rete thickness in this position remains in the certain proportion scope, and ratio is 0.8-1.25.
Total number of plies of the multilayer cambered surface rete that silver layer and dielectric layer are alternately formed in the said step (4) is 9 to 80 layers; According to the characteristic that the disappearance ripple is propagated perpendicular to silver layer surface, utilize the globoidal structure of multilayer cambered surface rete can realize the curve propagation of light wave, thereby reach convergent-divergent multiplying power super resolution imaging function.
The present invention is with the advantage that existing method is compared:
The present invention can prepare the convergent-divergent multiplying power super-resolution imaging lens that object plane and image planes are the plane, and the scope of the convergent-divergent multiplying power of super-resolution imaging lens is 0.3-3; For the preparation of convergent-divergent multiplying power super-resolution imaging lens provides a kind of novelty, convenience, has processed approach efficiently.
Description of drawings
Fig. 1-7 is the decomposing schematic representation of the realization flow of the inventive method:
Fig. 1 is in the embodiment of the invention 1, in the cross-sectional view of quartz substrate;
Fig. 2 is in the embodiment of the invention 1, the quartz substrate cross-sectional view behind the preparation circular groove;
Fig. 3 is in the embodiment of the invention 1, the cross-sectional view of quartz substrate behind substrate surface spin coating silverskin;
Fig. 4 is in the embodiment of the invention 1, the cross-sectional view of quartz substrate behind substrate surface spin coating silverskin;
Fig. 5 is in the embodiment of the invention 1, the cross-sectional view of quartz substrate behind substrate surface spin coating PMMA;
Fig. 6 is in the embodiment of the invention 1, the cross-sectional view of quartz substrate after substrate surface prepares multilayer silver layer and PMMA layer;
Fig. 7 is in the embodiment of the invention 1, alternately coating, curing silver film and coated media layer, and up to groove is filled and led up, the two sides that obtains is the cross-sectional view of the convergent-divergent multiplying power super-resolution imaging lens on plane;
Among the figure: 1 represents backing material quartzy; 2 represent the precursor solution of silver; 3 represent silverskin; 4 represent PMMA.
Embodiment
Introduce the present invention in detail below in conjunction with accompanying drawing and embodiment.But following embodiment only limits to explain the present invention, and protection scope of the present invention should comprise the full content of claim, and promptly can realize the full content of claim of the present invention to the technician in field through following examples.
(1) 1 circular groove of preparation on the quartz substrate of smooth cleaning as shown in Figure 1: as shown in Figure 2, the bottom surface of circular groove is parallel with substrate surface, and the diameter that the diameter of circular groove upper base is 800nm, go to the bottom is that 600nm, the degree of depth are 200nm.
(2) as shown in Figure 3, on substrate, use the alcohol dispersion liquid of spin coating one deck silver concentration as the Nano silver grain of 0.3g/ml, remove ethanol after 160 ℃ of oven dry after Nano silver grain be combined into silver film, wherein the thickness of the silver film in circular groove is the 15-30 nanometer.The thickness distribution rule of ground floor silver film in groove is: the groove central area is thin, and the recess edge zone is thick.
(3) as shown in Figure 4, adopt the method for spin coating on substrate, to be coated with one deck PMMA, the PMMA layer can form cambered surface in groove under capillary effect, and PMMA solidifies after heating; The thickness of PMMA rete is the 20-30 nanometer in the groove.
(4) like Fig. 5,6, shown in 7, in groove, alternately prepare 11 layers of silver film and coating, solidify 10 layers of PMMA layer, groove is filled and led up, just can obtain being the convergent-divergent multiplying power super-resolution imaging lens on plane by the two sides that silver/PMMA multilayer cambered surface rete is formed.
(1) 1 square indentations of preparation on the quartz substrate of smooth cleaning as shown in Figure 1, the bottom surface of groove is parallel with substrate surface, and the diameter that the length of side of groove upper base is 1500nm, go to the bottom is that 1000nm, the degree of depth are 400nm.
(2) on substrate, use the AgNO of spin coating one deck concentration as 2g/ml
3The WS carries out the back baking with 80 ℃ then and evaporates AgNO
3Moisture in the WS carries out ultraviolet lighting to substrate and makes AgNO
3Resolve into silver film, wherein the thickness of the silver film in square indentations is the 10-20 nanometer.The thickness distribution rule of ground floor silver film in groove is: the groove central area is thin, and the recess edge zone is thick.
(3) adopt the method for spin coating on substrate, to be coated with one deck SOG, the SOG layer can form cambered surface in groove under capillary effect, and SOG curing and reaction generate SiO after heating
2Rete; SiO in the groove
2The thickness of rete is the 10-20 nanometer.
(4) in groove, alternately prepare 29 layers of silver film and coating, 28 layers of SiO of curing
2Rete is filled and led up groove, just can obtain by silver/SiO
2The two sides that multilayer cambered surface rete is formed is the convergent-divergent multiplying power super-resolution imaging lens on plane.
The part that the present invention does not set forth in detail belongs to techniques well known.
Claims (6)
1. the preparation method of biplane super-resolution imaging lens, it is characterized in that: this method step is following:
Step (1) prepares the flat bottomed recess of the submicron order degree of depth on the substrate of UV transparent, the cross sectional shape that groove is parallel to substrate surface is circular, square, octagon or rectangle;
The precursor solution of step (2) spin coating one deck silver on substrate; Precursor solution can form the cambered surface rete in groove location under capillary effect; Precursor solution is cured as silverskin behind heating or UV-irradiation, and the thickness of said silver film is 8nm to 50nm;
Step (3) adopts the method for spin coating in the groove that has deposited one deck silver film, to be coated with the curable medium sol layer of one deck; The medium sol layer can form the cambered surface rete in groove under capillary effect, the medium sol layer is cured as dielectric layer after heat treated; Thickness after said dielectric layer solidifies is 8nm to 50nm;
Step (4) is alternately coating, curing silver film and coating, curing medium layer in said groove; Obtain the multilayer cambered surface rete that silver layer and dielectric layer are alternately formed; Up to groove is filled and led up, promptly prepare the convergent-divergent multiplying power super-resolution imaging lens that the two sides is the plane; According to the characteristic that the disappearance ripple is propagated perpendicular to silver layer surface, utilize the globoidal structure of multilayer cambered surface rete can realize that the curve of light wave propagates, reach convergent-divergent multiplying power super resolution imaging function.
2. the preparation method of biplane super-resolution imaging lens according to claim 1 is characterized in that: the material of substrate is quartz, glass, silicon nitride or polyimide in the said step (1).
3. the preparation method of biplane super-resolution imaging lens according to claim 1 is characterized in that: the diameter or the length of side of said step (1) further groove are 400nm to 2000nm, and the degree of depth of groove is 50nm to 500nm.
4. the preparation method of biplane super-resolution imaging lens according to claim 1; It is characterized in that: the precursor solution of silverskin can be the suspending liquid of Nano silver grain in the said step (2); Or the WS of silver nitrate, or the mixed solution of silver nitrate and organic solvent.
5. the preparation method of biplane super-resolution imaging lens according to claim 1; It is characterized in that: the material of said step (3) medium sol layer can be SOG, PMMA or photoresists such as ARP3170, ARN7520; The thickness of every layer of dielectric layer optional position in groove and the adjacent silver rete thickness in this position remains in the certain proportion scope, and ratio is 0.8-1.25.
6. the preparation method of biplane super-resolution imaging lens according to claim 1 is characterized in that: the number of plies of the multilayer cambered surface rete that silver layer and dielectric layer are alternately formed in the said step (4) is 5 to 80 layers.
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| CN2012101079596A CN102621602A (en) | 2012-04-13 | 2012-04-13 | Preparation method of biplane super-resolution imaging lens |
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| CN2012101079596A CN102621602A (en) | 2012-04-13 | 2012-04-13 | Preparation method of biplane super-resolution imaging lens |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103353627A (en) * | 2013-07-12 | 2013-10-16 | 厦门理工学院 | Manufacturing method of micro lens array mold |
| CN114114481A (en) * | 2021-12-15 | 2022-03-01 | 中国科学院光电技术研究所 | Preparation method and application of super-resolution lens based on metal-dielectric strip array |
| JP2022057624A (en) * | 2020-09-30 | 2022-04-11 | Ａｇｃ株式会社 | Optical element and method for manufacturing the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080309813A1 (en) * | 2007-06-18 | 2008-12-18 | Sony Corporation | Imaging device and method |
| CN101349771A (en) * | 2008-09-03 | 2009-01-21 | 中国科学院光电技术研究所 | Metal dielectric film structure for realizing super-resolution imaging function |
| CN102096123A (en) * | 2010-12-22 | 2011-06-15 | 中国科学院光电技术研究所 | Method for preparing planar zoom magnification super-resolution imaging lens |
-
2012
- 2012-04-13 CN CN2012101079596A patent/CN102621602A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080309813A1 (en) * | 2007-06-18 | 2008-12-18 | Sony Corporation | Imaging device and method |
| CN101349771A (en) * | 2008-09-03 | 2009-01-21 | 中国科学院光电技术研究所 | Metal dielectric film structure for realizing super-resolution imaging function |
| CN102096123A (en) * | 2010-12-22 | 2011-06-15 | 中国科学院光电技术研究所 | Method for preparing planar zoom magnification super-resolution imaging lens |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103353627A (en) * | 2013-07-12 | 2013-10-16 | 厦门理工学院 | Manufacturing method of micro lens array mold |
| JP2022057624A (en) * | 2020-09-30 | 2022-04-11 | Ａｇｃ株式会社 | Optical element and method for manufacturing the same |
| JP7511126B2 (en) | 2020-09-30 | 2024-07-05 | Ａｇｃ株式会社 | Method for manufacturing optical elements |
| CN114114481A (en) * | 2021-12-15 | 2022-03-01 | 中国科学院光电技术研究所 | Preparation method and application of super-resolution lens based on metal-dielectric strip array |
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Application publication date: 20120801 |