CN102566314B - Lithography machine chemical interface system and application thereof - Google Patents
Lithography machine chemical interface system and application thereof Download PDFInfo
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- CN102566314B CN102566314B CN201210014981.6A CN201210014981A CN102566314B CN 102566314 B CN102566314 B CN 102566314B CN 201210014981 A CN201210014981 A CN 201210014981A CN 102566314 B CN102566314 B CN 102566314B
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Abstract
The invention provides a lithography machine key code system. Hardware is improved, a detachable key ring is arranged on the top of a long tube at the end of a machine table; the key ring is provided with protrusions same as the originally designed built-in protrusions; the thickness of the built-in protrusions is increased; and the chemical bottle opening is provided with two rings with consistent notches, namely an upper ring and a lower ring, wherein the upper ring can rotate. When the chemicals are replaced, the key ring is detached and inserted into the upper ring, when the protrusions of the key ring are matched with the notches of the upper ring, the upper ring can be rotated by using the key ring, so that the notches of the upper ring are superposed with those of the lower ring; and the key ring is removed, the long tube at the end of the machine table can be inserted into a novel chemical bottle so as to finish mounting novel chemicals.
Description
Technical field
The present invention relates to a kind of litho machine chemicals interface, particularly relate to and a kind ofly can ensure that chemicals is changed errorless lithography machine key code system and used described interface system to carry out the method for chemicals replacing.
Background technology
Photoetching technique utilizes optics-chemical principle and chemistry, physical etchings method in IC manufacturing, is delivered to by circuitous pattern on single-crystal surface or dielectric layer, forms the technology of effective graphical window or functional graphic; Photoetching process is one of most crucial operation of ic manufacturing technology.Along with IC manufacturing extends toward smaller szie, photoetching technique is from normal optical technical development to new technologies such as applying electronic bundle, X ray, ion microbeam, laser; Wavelength is used to expand to 0.1 dust order of magnitude scope from 4000 dusts.Photoetching technique has become a kind of Micrometer-Nanometer Processing Technology of precision, and becomes the weathervane leading whole industry to move towards gradually.Just because of this, the emphasis that the technical research Ye Shige major company that links is correlated with in photoetching pays close attention to.
In semiconductor processing industry, photoetching process chemical kind used is various, has photoresist, antireflection material, packing material etc., each manufacturing company just have with regard to photoresist twenties kinds even more, and these materials packaging is similar, the care label on bottle is only had to distinguish.When using these chemicals of replacing, because human factor easily changes mistake, cause the waste on time and cost.Each manufacturing company appears such accident.
At present for preventing the generation of this type of accident, prevent the chemicals changing mistake, people improve on hardware, chemicals packaging adds a kind of interface, and different chemicals interfaces (key code) is different, and a built-in projection annulus is arranged at board end long tube top, and on chemicals bottle, be a notched annulus, when long tube inserts after in bottle, on built-in projection and bottle, namely breach coincide, and chemicals is errorless, completes installation.
But this kind of hardware Prevention method imperfection, because when the long tube of board end inserts after in bottle, discovery interface correspondence does not go up, and just can know chemicals and whether change mistake.Once discovery mistake, the board pipe line parts of the Pollution by Chemicals in bottle, needs to clean board, and the chemical liquid in the long tube of board end simultaneously also pollutes the chemicals in bottle, huge waste when causing machine and on chemicals cost.
Summary of the invention
The problem easily occurring mistake in chemicals process is changed for litho machine, the invention provides a kind of novel lithography machine key code system and use this interface system to carry out the method for chemicals replacing, before chemical contact, whether correct just can carry out confirmation chemicals, install and change the front generation just effectively preventing mistake of chemicals.
Therefore, the object of this invention is to provide a kind of lithography machine key code system, comprise the bottleneck and junctor you long tube and long tube top that connect chemicals bottle.
Particularly, in lithography machine key code system of the present invention, described bottleneck is designed to two neighbouring donuts, and top annulus can rotate around the center of circle, top annulus and bottom annulus are provided with the breach of alignment, and the breach of top annulus is communicated with the breach of bottom annulus; Described long tube top is provided with removable key annulus; Key annulus is provided with the projection matched with described donut breach; Described long tube top also comprises built-in projection annulus, and the built-in projection of built-in projection annulus is identical with the projection of key annulus.
Wherein, described key annulus projection thickness is more preferably greater than the thickness of top annulus, and such projection can be inserted in the breach of bottom annulus, and most preferably, projection thickness equals the degree of depth sum of top annulus and bottom annular indentation.
In principle, the quantity of projection can than top annulus or bottom annular indentation negligible amounts, but the present invention is most preferably, the quantity of projection can than top annulus or bottom annular indentation quantity identical.
Wherein, top annulus or bottom annular indentation quantity are preferably 3 ~ 6.
In principle, thickness and the length dimension of described each projection can be identical or different, but identical with length dimension with the thickness of corresponding breach.
Second object of the present invention is to provide a kind of connection method using above-mentioned lithography machine key code system to carry out chemicals bottle and board segment length pipe.
Described method step comprises: unloaded from board end long tube top by key annulus, insert in the annulus of top, projection and the top annulus through hole of key annulus match, key annulus is used to rotate top annulus, the through hole of top annulus is alignd with bottom ring groove, proves that chemicals is errorless, remove key annulus, the built-in projection of board end long tube built-in projection annulus is inserted in through hole and groove, will complete the abutting joint of chemicals bottleneck and long tube in long tube insertion chemistry product bottle.
Lithography machine key code system provided by the invention improves hardware, adds removable title key annulus at board end long tube top, and key annulus is also the same with the built-in projection of former design with projection; And add built-in projection thickness.Chemicals bottleneck is designed to the consistent annulus of two breach: top annulus, bottom annulus, top annulus is rotatable.When changing chemicals, key annulus is pulled down and inserts top annulus, when the projection of key annulus and top annular indentation coincide, available key annulus rotates top annulus, makes it breach and the coincidence of bottom annular indentation, namely proves that chemicals is errorless, remove key annulus, the long tube of board end can insert in new chemicals bottle, built-in protrudes through top annulus, bottom annular indentation can be inserted into the end, complete and install new chemicals.This design is equivalent to first open bottle with a key, just carries out being confirmed whether correctly before chemical contact, installs and just effectively prevents wrong generation before replacing chemicals.
Accompanying drawing explanation
Fig. 1 is lithography machine key code system key circular ring structure schematic diagram of the present invention;
Fig. 2 is lithography machine key code system bottleneck plan structure schematic diagram of the present invention;
Fig. 3 is lithography machine key code system bottleneck upper and lower part of the present invention annulus composition structural representation;
Fig. 4 is upper and lower part annular indentation alignment structures schematic diagram described in Fig. 3;
Fig. 5 is upper and lower part annular indentation structural representation described in Fig. 3 before bottleneck uses;
Fig. 6 is lithography machine key code system of the present invention docking chemicals bottle and long tube structure schematic diagram.
Embodiment
The invention provides a kind of lithography machine key code system, and the method using described lithography machine key code system to carry out litho machine and chemicals bottle to carry out docking, add removable title key annulus at board end long tube top, key annulus is also the same with the built-in projection of former design with projection; And add built-in projection thickness.Chemicals bottleneck is designed to the consistent annulus (top annulus is called for short A annulus, and bottom annulus is called for short B annulus) of two breach, and A annulus is rotatable.When changing chemicals, key annulus is pulled down and inserts A annulus, when the projection of key annulus and A annular indentation coincide, available key annulus rotates A annulus, makes it breach and the coincidence of B annular indentation, namely proves that chemicals is errorless, remove key annulus, the long tube of board end can insert in new chemicals bottle, built-in protrude through A, B annular indentation and can be inserted into the end, completes and installs new chemicals.This design is equivalent to first open bottle with a key, just carries out being confirmed whether correctly before chemical contact, installs and just effectively prevents wrong generation before replacing chemicals.
With reference to the accompanying drawings, by specific embodiment, be described in detail lithography machine key code system of the present invention and application thereof and describe, to make better to understand the present invention, but should be understood that, following embodiment does not limit the scope of the invention.
With reference to Fig. 1 ~ Fig. 6, lithography machine key code system provided by the invention, comprises the bottleneck 2 connecting chemicals, is provided with bottleneck breach 20 in bottleneck 2.
Bottleneck 2 is designed to two neighbouring donuts: top annulus 21 and bottom annulus 22, top annulus 21 can rotate around the center of circle, top annulus 21 and bottom annulus 22 are provided with the breach of alignment, and the breach of top annulus is communicated with the breach of bottom annulus, thus composition bottleneck breach 20.
Lithography machine key code system provided by the invention, also comprises the long tube 5 connecting board hollow tubular 3, and the top of long tube 5 is provided with removable key circle 1 ring; Bottleneck breach 20 matches with the projection 10 of key annulus 1.
The top of long tube 5 also comprises built-in projection annulus 4, and the built-in projection of built-in projection annulus 4 is identical with the projection 10 of key annulus 1.
The height of projection 10 is greater than the thickness of top annulus 21, preferably equals the degree of depth of bottleneck breach 20.
The quantity of bottleneck breach 20 has 3 ~ 6, and the number of the number of the projection 10 of key annulus 1 and the built-in projection of built-in projection annulus 4 is identical with the number of bottleneck breach 20.
The position of each projection 10, length, fineness can be different, and now, correspondingly, the degree of depth of each breach 20 also can not be identical, and correspond respectively to a projection 10.
With reference to Fig. 5 ~ Fig. 6, before lithography machine key code system of the present invention uses, the upper notch 210 that bottleneck 2 is positioned at top annulus 21 with and be positioned at the down gap 220 of bottom annulus 22 and do not line up, but mutually stagger, the projection 10 of key annulus 1 is inserted in upper notch 210, when the projection 10 of key annulus 1 with upper notch 210 to time identical, first time proves that chemicals is errorless, rotates top annulus 21.Top annulus 21 rotates, and upper notch 210 is alignd with down gap 220, composition breach 20.
Remove key annulus 1, in the hollow tubular 3 insertion chemistry product bottle of board end, the built-in of built-in projection annulus 4 protrudes through the bottom that upper notch 210 is inserted to down gap 220, second time confirms that interface coincide, and finally conventionally completes other step of the abutting joint of chemicals bottle and litho machine.
Be described in detail specific embodiments of the invention above, but it is just as example, the present invention is not restricted to specific embodiment described above.To those skilled in the art, any equivalent modifications that the present invention is carried out and substituting also all among category of the present invention.Therefore, equalization conversion done without departing from the spirit and scope of the invention and amendment, all should contain within the scope of the invention.
Claims (7)
1. a lithography machine key code system, it is characterized in that, comprise the bottleneck connecting chemicals, described bottleneck is designed to two neighbouring donuts, top annulus can rotate around the center of circle, top annulus and bottom annulus are provided with the breach of alignment, and the breach of top annulus is communicated with the breach of bottom annulus;
Also comprise the long tube top of junctor director pipe, described long tube top is provided with removable key annulus; Key annulus is provided with the key annulus projection matched with described donut breach;
Described long tube top also comprises built-in projection annulus, and the built-in projection of built-in projection annulus is identical with key annulus projection;
Wherein, described key annulus is in order to confirm whether described chemicals mates with described board first; In order to second time, described built-in projection annulus confirms whether described chemicals mates with described board.
2. lithography machine key code system according to claim 1, is characterized in that, described key annulus rising height is greater than top annulus thickness.
3. lithography machine key code system according to claim 2, is characterized in that, described key annulus rising height is identical with the degree of depth sum of the breach of bottom annulus with top annulus.
4. lithography machine key code system according to claim 1, is characterized in that, described key annulus projection is identical with top annulus or bottom annular indentation quantity.
5. the lithography machine key code system according to claim 1 or 4, is characterized in that, described top annulus or bottom annular indentation quantity are 3 ~ 6.
6. lithography machine key code system according to claim 1, is characterized in that, position, the size of described each key annulus projection are different.
7. the connection method using lithography machine key code system described in claim 1 to carry out chemicals bottle and board segment length pipe, it is characterized in that, key annulus is unloaded from board end long tube top, insert in the annulus of top, projection and the top annulus through hole of key annulus match, key annulus is used to rotate top annulus, the through hole of top annulus is alignd with bottom ring groove, proof chemicals is errorless, remove key annulus, the built-in projection of board end long tube built-in projection annulus is inserted in through hole and groove, the abutting joint of chemicals bottleneck and long tube will be completed in long tube insertion chemistry product bottle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210014981.6A CN102566314B (en) | 2012-01-18 | 2012-01-18 | Lithography machine chemical interface system and application thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210014981.6A CN102566314B (en) | 2012-01-18 | 2012-01-18 | Lithography machine chemical interface system and application thereof |
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| CN102566314A CN102566314A (en) | 2012-07-11 |
| CN102566314B true CN102566314B (en) | 2015-02-11 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN201302581Y (en) * | 2008-09-24 | 2009-09-02 | 王悦 | Probe device |
| CN101600468A (en) * | 2006-12-21 | 2009-12-09 | 诺沃-诺迪斯克有限公司 | Injection device |
| CN102159265A (en) * | 2008-07-15 | 2011-08-17 | Shl集团有限责任公司 | Medicament delivery device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3532204B2 (en) * | 1991-03-05 | 2004-05-31 | アラダイム コーポレーション | Method and apparatus for correcting drift offset of a flow sensor pressure sensor |
| GB0129187D0 (en) * | 2001-12-06 | 2002-01-23 | Dca Design Int Ltd | Improvements in and relating to a medicament cartridge |
| CN101023905A (en) * | 2006-02-20 | 2007-08-29 | 陈庆昌 | Device for distinguishing using object of articles in container |
| CN200964230Y (en) * | 2006-06-23 | 2007-10-24 | 胡政宏 | Container |
| US20100042054A1 (en) * | 2006-11-17 | 2010-02-18 | Novo Nordisk A/S | Medical Delivery System Comprising a Coding Mechanism Between Dosing Assembly and Medicament Container |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101600468A (en) * | 2006-12-21 | 2009-12-09 | 诺沃-诺迪斯克有限公司 | Injection device |
| CN102159265A (en) * | 2008-07-15 | 2011-08-17 | Shl集团有限责任公司 | Medicament delivery device |
| CN201302581Y (en) * | 2008-09-24 | 2009-09-02 | 王悦 | Probe device |
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| CN102566314A (en) | 2012-07-11 |
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