CN102540753A - Pulse optical signal generating device - Google Patents
Pulse optical signal generating device Download PDFInfo
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- CN102540753A CN102540753A CN2010106212087A CN201010621208A CN102540753A CN 102540753 A CN102540753 A CN 102540753A CN 2010106212087 A CN2010106212087 A CN 2010106212087A CN 201010621208 A CN201010621208 A CN 201010621208A CN 102540753 A CN102540753 A CN 102540753A
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- aperture diaphragm
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- pulsed optical
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Abstract
The invention discloses a pulse optical signal generating device, which comprises a laser source, a first aperture diaphragm, a second aperture diaphragm and a movement motor system, wherein the laser source is used for generating continuous visible light; at least one light hole is distributed on the first aperture diaphragm; the second aperture diaphragm is matched with the first aperture diaphragm; and the movement motor system is used for driving the second aperture diaphragm and the first aperture diaphragm to rotate around an optical axis, so that the second aperture diaphragm moves relative to the first aperture diaphragm. Through the pulse optical signal generating device, amplitude modulation and frequency modulation are performed on the continuous visible light to convert the continuous visible light into a pulse optical signal meeting the test requirement of a photoelectric sensor of a photomask processor. The pulse optical signal generating device disclosed by the invention is simple and convenient, and is capable of solving the problems that the photoelectric sensor in a coaxial alignment system of the photomask processor has high test difficulty and high cost.
Description
Technical field
The present invention relates to a kind of pulsed optical signals generating means, relate in particular to the pulsed optical signals generating means that uses in a kind of litho machine five quadrant photoelectric sensors test.
Background technology
Lithographic equipment of the prior art is mainly used in the manufacturing of IC or other microdevices.Through lithographic equipment, the multilayer mask with different mask patterns is imaged on the silicon chip that is coated with photoresist under accurately aiming at successively, for example semi-conductor silicon chip or LCD plate.Lithographic equipment is divided into two types substantially; One type is the stepping lithographic equipment; The mask pattern single exposure is imaged on an exposure area of silicon chip, and silicon chip moves with respect to mask subsequently, and next exposure area is moved to mask pattern and projection objective below; Again mask pattern is made public in another exposure area of silicon chip, repeat the picture that this process all exposure areas on silicon chip all have mask pattern.Another kind of is the step-scan lithographic equipment, and in said process, mask pattern is not single exposure imaging, but the scanning mobile imaging through the projection light field.In the mask pattern imaging process, mask and silicon chip move with respect to optical projection system and projected light beam simultaneously.
Critical step is that mask is aimed at silicon chip in the lithographic equipment.After making public on silicon chip, the ground floor mask pattern from device, removes; After the PROCESS FOR TREATMENT that silicon chip is correlated with; Carry out the exposure of second layer mask pattern; But for guarantee second layer mask pattern and subsequently the picture of mask pattern need mask and silicon chip accurately be aimed at respect to the accurate location of exposed mask pattern image on the silicon chip.IC device by the photoetching technique manufacturing needs multiexposure, multiple exposure in silicon chip, to form multilayer circuit, so needs the configuration alignment system in the lithographic equipment, realizes the accurate aligning of mask and silicon chip.When characteristic dimension requires more hour, the requirement of alignment precision and consequent requirement to alignment precision are become strict more.
The alignment system of lithographic equipment, its major function are before the alignment exposure, to realize mask and silicon pad alignment, promptly measure the coordinate (X of silicon chip in coordinate system of machine
W, Y
W, Ф
WZ), and the coordinate (X of mask in coordinate system of machine
R, Y
R, Ф R
Z), and calculate the position of mask with respect to silicon chip, to satisfy the requirement of alignment precision.Prior art has two kinds of alignment scheme.Wherein a kind of is the coaxial alignment technology that sees through camera lens; Laser lighting is at the alignment mark that is arranged on the periodic phase optical grating construction on the silicon chip; Diffraction light or scattered light by the collected silicon chip alignment mark of the projection objective of lithographic equipment shine on mask alignment mark, and this alignment mark can be amplitude or phase grating.Behind the mask mark, detector is set, when scanning silicon chip under projection objective, detector is surveyed the light intensity that sees through the mask mark, and the maximal value of detector output is represented correct alignment position.This aligned position is that the position measurement of the laser interferometer that is used for moving monitoring wafer platform position provides zero reference.
Critical component system in the typical coaxial alignment system comprises: exposure light source (comprising lighting source), and mask and mask platform, optical projection system, work stage and silicon chip, photoelectric sensor etc., as shown in Figure 1.
In the actual process process, the coaxial alignment system adopts transmissive mask to carry out coaxial alignment, and (for example: 193nm) carry out coaxial alignment, in alignment procedures, exposure light source is a pulsed light, and pulsed frequency is between 1kHz～4kHz, and is as shown in Figure 3 to adopt exposure light source.Yet; Photodiode ripe on the current market all is at visible light wave range basically, therefore, and in the coaxial alignment system; Adopt corresponding optical instrument that the ultraviolet light of 193nm is converted into visible light; Adopt the photon conversion crystal in shown in Figure 1, it is the visible light of centre wavelength that the ultraviolet light of exposure light source wavelength 193nm is converted into 530nm, and adopts sensor to carry out corresponding signals collecting and detection.
Because the singularity of lithographic equipment system; Before actual product is integrated; Must test fully the photoelectric sensor and the corresponding signal processing circuit thereof that adopt in the coaxial alignment system; The dynamic property that comprises repeatable accuracy, checking photoelectric sensor and the corresponding signal processing circuit thereof of test macro runnability, testing photoelectronic sensor and corresponding signal processing circuit thereof; Guarantee the reliability of photoelectric sensor (and corresponding signal processing circuit), therefore, need to adopt suitable proving installation and method.Based on the difficulty of fit on, photoelectric sensor that adopts in the coaxial alignment system and corresponding signal processing circuit thereof can not be assemblied in the corresponding lithographic equipment and test, thereby, need to adopt the off-line test method to test.In the off-line test process, need simulate according to working environment, the signal input form of reality.The off-line test device need include the light-source system that possesses the effect of analogue exposure light source.Preceding text are mentioned; In the lithographic equipment of reality; The photoelectric sensor that adopts in the coaxial alignment system and the input signal of corresponding signal processing circuit thereof are light signal (the 530nm pulse signal for example of pulsed visible light wave range; Signal form is as shown in Figure 4), visible light wave range light source ripe on the current market all is continuous light basically, the cost of products of pulsed light is high.Therefore, need a kind of existing continuous visible light source capable of using to realize the device that the photoelectric sensor that adopts in the coaxial alignment system and corresponding signal processing circuit thereof are tested.
Summary of the invention
The technical matters that the present invention solves is a simulated light engraving device exposure light source light signal, so that the light signal in the measurement of lithographic equipment coaxial alignment system off-line to be provided.
For addressing the above problem, the present invention provides a kind of pulsed optical signals generating means, comprising:
LASER Light Source produces continuous visible light;
First aperture diaphragm, at least one light hole distributes on said first aperture diaphragm;
Second aperture diaphragm is complementary with first aperture diaphragm;
The motion motor system; Drive second aperture diaphragm and first aperture diaphragm rotates around optical axis, second aperture diaphragm is moved with respect to first aperture diaphragm, periodically let above-mentioned visible light; Part forms pulsed light through said first aperture diaphragm and second aperture diaphragm.
Preferably, said second aperture diaphragm is in the period of motion with respect to first aperture diaphragm, and there are coupling area S in said second aperture diaphragm and said first aperture diaphragm.
Preferably, said first aperture diaphragm is a light hole.
Preferably, said first aperture diaphragm is a light hole identical shaped more than two, and said light hole identical shaped more than two is that the center evenly distributes with the intersection point that said first aperture diaphragm belongs to plane and optical axis.
Preferably, said light hole is circular or rectangle.
Preferably, said second aperture diaphragm is a light hole.
Preferably, said second aperture diaphragm is a light hole identical shaped more than two, and said light hole identical shaped more than two is that the center becomes central distribution with plane, said second aperture diaphragm place with the intersection point of optical axis.
Preferably, said light hole is an irregular figure.
Preferably, the light hole figure center section glazed area of second aperture diaphragm is greater than the two end portions glazed area.
Preferably, the light hole pore size distribution of the light hole of the speed of related movement of relative first aperture diaphragm with second aperture diaphragm of the pulsed frequency of said pulsed optical signals, said first aperture diaphragm distribution interval and said second aperture diaphragm is relevant at interval.
Preferably, the amplitude of said pulsed optical signals and coupling area S are in direct ratio.
Preferably, said motion motor system comprises:
First motion motor drives the motion of first aperture diaphragm;
Second motion motor drives the motion of second aperture diaphragm;
Motor driver is controlled first motion motor and second motion motor.
Further; Also comprise host computer; Host computer is electrically connected with said motor driver and signal processing circuit; Convert digital signal into through said signal processing circuit after the pulsed optical signals that the pulsed optical signals generating means produces incides photoelectric sensor, host computer is according to the said motor driver of said Digital Signals.
Compared with prior art, pulsed optical signals generating means of the present invention is simulated the pulsed optical signals in the actual light engraving device, has realized the off-line measurement of photoelectric sensor in the lithographic equipment coaxial alignment system, and is simple and convenient, and reduced the difficulty and the cost of test.
Description of drawings
Can graphicly further be understood through following detailed Description Of The Invention and appended about advantage of the present invention and spirit.
Fig. 1 is a lithographic equipment coaxial alignment system architecture synoptic diagram;
Fig. 2 is a kind of embodiment synoptic diagram of pulse signal generation device of the present invention;
Fig. 3 is the pulsed optical signals synoptic diagram that exposure light source sends in the litho machine actual exposure process;
Fig. 4 is the pulsed optical signals synoptic diagram of pulsed optical signals after the photon conversion crystal transition shown in Figure 3;
Fig. 5 is a kind of embodiment synoptic diagram of first aperture diaphragm;
Fig. 6 is the another kind of embodiment synoptic diagram of first aperture diaphragm;
Fig. 7 is a kind of embodiment synoptic diagram of second aperture diaphragm;
Fig. 8 is the coupling area funtcional relationship synoptic diagram of pulsed optical signals intensity and first aperture diaphragm and second aperture diaphragm.
Embodiment
Specify specific embodiment of the present invention below in conjunction with accompanying drawing.
With reference to shown in Figure 2, optical signal generating apparatus of the present invention comprises LASER Light Source 1, first aperture diaphragm 2, second aperture diaphragm 3 successively along optical path direction;
The laser beam that LASER Light Source 1 sends incides on the photoelectric sensor 4 as tested object after passing through first aperture diaphragm 2 and second aperture diaphragm 3, and photoelectric sensor also comprises treatment circuit 8.The mounting bracket 7 of said first aperture diaphragm 2, second aperture diaphragm 3, said photoelectric sensor 4 and said treatment circuit 8.As a kind of preferred implementation, also comprise host computer 6, be electrically connected with motor driver 5 and signal processing circuit 8;
LASER Light Source 1 is continuous visible light source, is complementary with photoelectric sensor corresponding response wavelength as tested object.
With reference to Fig. 5 and Fig. 6, distribute on first aperture diaphragm 2 hole or plural hole are circle or rectangle, perhaps other shapes, and its clear aperature area is less than the effective photosurface area of photoelectric sensor.When being distributed with plural hole on first aperture diaphragm 2, said plural hole is that the center evenly distributes with the intersection point of first aperture diaphragm plane, place and optical axis.
With reference to Fig. 7, second aperture diaphragm 3 is quadrilateral or other irregular figures, and in this embodiment, its axial clear aperature full-size L is smaller or equal to first aperture diaphragm, 2 axial clear aperature full-size H.
Below be described further through the concrete course of work of specific embodiment above-mentioned pulsed optical signals generating means.
With reference to shown in Figure 2, the laser beam that LASER Light Source 1 sends through behind first aperture diaphragm 2, second aperture diaphragm 3, incides on the photoelectric sensor 4 successively.
The coupling area size of second aperture diaphragm, 3 clear aperatures and first aperture diaphragm, 2 clear aperatures has determined the light intensity signal size through this analog optical signal generating means, thereby has determined the light intensity signal form.With reference to Fig. 7; The preferred implementation of first clear aperature 2 is a plurality of holes in this embodiment; And each hole is rectangle, and a kind of preferred implementation of second clear aperature 3 is the quadrilateral that has two groups of adjacent sides to equate respectively, and the glazed area of intermediate portion is greater than the glazed area of two end portions.The length of side of said second clear aperature 3 is respectively L1 and L2, and wherein one group of adjacent side and axial cornerwise angle are θ
1, another group adjacent side and axial cornerwise angle are θ
2, the horizontal maximum clear aperature in the hole of second aperture diaphragm is w, supposes that second aperture diaphragm 3 is V with respect to the relative scanning speed of first aperture diaphragm 2, is convenience of calculation, makes θ
1=60 °, be t sweep time, and relative coupled motions length is x, then x=vt between first aperture diaphragm 2 and second aperture diaphragm 3.Relation is as follows between then logical light area S and speed x and each parameter of diaphragm.
Can find out from above relational expression, suitably adjust speed of related movement x, can obtain the light intensity signal waveform of needs, thereby solve the problem that light signal analog simulation difficulty of test is big, cost is high in the lithographic equipment coaxial alignment system.
Wherein, the optical signal frequency of simulation can distribute through the light hole of controlled motion motor rotation speed and first aperture diaphragm, first aperture diaphragm and realize that the amplitude of light signal can realize through the clear aperature shape of adjusting second aperture diaphragm.
The electric signal of photoelectric sensor 4 outputs is handled by signal processing circuit 8.Signal processing circuit 8 comprises electric current changes voltage link, analog bandpass filtering and signal amplifying element, AD conversion links.
Wherein, electric current changes the voltage link and changes into voltage signal to the current signal of five quadrant sensors output through a switching amplifier, is convenient to follow-up processing of circuit; In analog bandpass filtering and the signal amplifying element, the analog bandpass filtering link is used for other noise signals outside the frequency signal that filtering allows; The signal amplifying element is used to amplify the small-signal that detects, and makes it to reach comparatively reasonable range; The AD conversion links is used for being digital signal through the analog signal conversion after analog bandpass filtering and the signal amplifying element, and this signal is sent to host computer, carries out data by host computer and judges.
Pulsed optical signals generating means of the present invention scans coupling through the relative motion between two aperture diaphragms; Realization is to the decay of the different multiplying of light intensity in a big way; Pulsed optical signals in the simulation actual light engraving device is to be used for the off-line measurement of lithographic equipment coaxial alignment system photoelectric sensor.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within scope of the present invention under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (13)
1. a pulsed optical signals generating means is characterized in that, comprising:
LASER Light Source produces continuous visible light;
First aperture diaphragm, at least one light hole distributes on said first aperture diaphragm;
Second aperture diaphragm is complementary with first aperture diaphragm;
The motion motor system; Drive second aperture diaphragm and first aperture diaphragm rotates around optical axis, second aperture diaphragm is moved with respect to first aperture diaphragm, periodically let above-mentioned visible light; Part forms pulsed light through said first aperture diaphragm and second aperture diaphragm.
2. pulsed optical signals generating means according to claim 1 is characterized in that, said second aperture diaphragm is in the period of motion with respect to first aperture diaphragm, and there are coupling area in said second aperture diaphragm and said first aperture diaphragm.
3. pulsed optical signals generating means according to claim 1 is characterized in that, said first aperture diaphragm is a light hole.
4. pulsed optical signals generating means according to claim 1; It is characterized in that; Said first aperture diaphragm is a light hole identical shaped more than two, and said light hole identical shaped more than two is that the center evenly distributes with the intersection point that said first aperture diaphragm belongs to plane and optical axis.
5. according to claim 3 or 4 described pulsed optical signals generating meanss, it is characterized in that the light hole of said first aperture diaphragm is circular or rectangle.
6. pulsed optical signals generating means according to claim 1 is characterized in that, said second aperture diaphragm is a light hole.
7. pulsed optical signals generating means according to claim 1; It is characterized in that; Said second aperture diaphragm is a light hole identical shaped more than two, and said light hole identical shaped more than two is that the center becomes central distribution with plane, said second aperture diaphragm place with the intersection point of optical axis.
8. according to claim 6 or 7 described pulse signal generation devices, it is characterized in that the light hole of said second aperture diaphragm is an irregular figure.
9. according to claim 6 or 7 described pulse signal generation devices, it is characterized in that the light hole figure center section glazed area of said second aperture diaphragm is greater than the two end portions glazed area.
10. pulsed optical signals generating means according to claim 1; It is characterized in that the light hole pore size distribution of the speed of related movement of relative first aperture diaphragm with second aperture diaphragm of the pulsed frequency of said pulsed optical signals, the light hole of said first aperture diaphragm distribution interval and said second aperture diaphragm is relevant at interval.
11. pulsed optical signals generating means according to claim 2 is characterized in that, the amplitude and the coupling area of said pulsed optical signals are in direct ratio.
12. pulsed optical signals generating means according to claim 1 is characterized in that, said motion motor system comprises:
First motion motor drives the motion of first aperture diaphragm;
Second motion motor drives the motion of second aperture diaphragm;
Motor driver is controlled first motion motor and second motion motor.
13. pulsed optical signals generating means according to claim 11; It is characterized in that; Also comprise host computer; Host computer is electrically connected with said motor driver and signal processing circuit, converts digital signal into through said signal processing circuit after the pulsed optical signals that the pulsed optical signals generating means produces incides photoelectric sensor, and host computer is according to the said motor driver of said Digital Signals.
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| CN2010106212087A CN102540753A (en) | 2010-12-31 | 2010-12-31 | Pulse optical signal generating device |
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| CN2010106212087A CN102540753A (en) | 2010-12-31 | 2010-12-31 | Pulse optical signal generating device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114019769A (en) * | 2021-11-25 | 2022-02-08 | 罗刚 | Laser-regulated nano-imprinting alignment device and regulation method |
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| CN2205005Y (en) * | 1994-07-08 | 1995-08-09 | 张乃聪 | Optical device of infrared multiple gas analyser |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114019769A (en) * | 2021-11-25 | 2022-02-08 | 罗刚 | Laser-regulated nano-imprinting alignment device and regulation method |
| CN114019769B (en) * | 2021-11-25 | 2023-12-26 | 苏州新维度微纳科技有限公司 | Laser regulation and control nano-imprint alignment device and regulation and control method |
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Application publication date: 20120704 |