CN102534581A - Ultrafast bright dipping chemical nickel-plating solution - Google Patents
Ultrafast bright dipping chemical nickel-plating solution Download PDFInfo
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- CN102534581A CN102534581A CN2012100526022A CN201210052602A CN102534581A CN 102534581 A CN102534581 A CN 102534581A CN 2012100526022 A CN2012100526022 A CN 2012100526022A CN 201210052602 A CN201210052602 A CN 201210052602A CN 102534581 A CN102534581 A CN 102534581A
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Abstract
The invention discloses an ultrafast bright dipping chemical nickel-plating solution which comprises nickel salt, a stabilizing agent and a brightening agent, wherein the brightening agent adopts tellurium dioxide. The ultrafast bright dipping chemical nickel-plating solution is designed for meeting the special performance requirements of a nickel-plating layer on the surface of an aluminium heat sink. The ultrafast bright dipping chemical nickel-plating solution generates the full-bright nickel-plating layer in less than three minutes under an appropriate pH value and an appropriate using temperature so as to meet the technical requirements of products.
Description
Technical field
The present invention relates to the chemical nickel-plating solution of a kind of chemical nickel-plating solution, particularly a kind of ultrafast bright dipping.
Background technology
Chemical nickel plating can be described as electroless nickel plating again, is the process for treating surface that in the solution that contains nickel salt, reductive agent and other ancillary component, relies on chemical reaction nickel deposited, nickel alloy plating layer in the metallic surface of autocatalysis.The coating that above technology obtains has that hardness is higher, solidity to corrosion good, wear-resisting, advantage such as thickness of coating is even, is used widely at numerous areas such as electronics, machinery, chemical industry, mining, medical treatment.
Many decades in the past is in the time; Chemical plating nickel technology has had very quantum jump; Its more long-standing problems have obtained preliminary solution like bath life, stability etc., have realized the automatic control of plating bath basically; Make the large-scale production of serialization that possibility arranged, the range of application and the scale of chemical nickel plating further enlarge.
Wherein, The Aluminium Radiator industry is that chemical plating nickel technology is used one of industry the most widely; Aluminium Radiator does not lie in the thickness and the solidity to corrosion of coating to the requirement of chemical Ni-plating layer; And be the light and the weldability of coating, in other words, the nickel chemical plating technology that Aluminium Radiator requires to be adopted must obtain chemical Ni-plating layer light, that have certain weldability being not more than in time of 3 minutes.And existing sophisticatedly relatively can not satisfy people's requirement as the nickel chemical plating technology of stablizer and brightening agent with heavy metal lead, cadmium, can't satisfy product technology and require and the environmental emission requirement.
Summary of the invention
To the problems referred to above; The present invention has designed a kind of chemical nickel-plating solution of ultrafast bright dipping; Its time that obtains the bright chemical nickel plating layer is short especially, can in less than 3 minutes time, produce the nickel coatings of full light, is specially adapted to the product that electroless nickel layer thickness is not more than 2um.
For realizing above-mentioned purpose, the present invention adopts following technical scheme:
A kind of chemical nickel-plating solution of ultrafast bright dipping comprises nickel salt, stablizer and brightening agent, it is characterized in that: said brightening agent adopts tellurous oxide.
Further, the content of above-mentioned tellurous oxide in solution is 0.01-50mg/L.
Further, above-mentioned nickel salt is a single nickel salt, and its content in solution is 18-35g/L.
Further, said stablizer comprises has multiple composition, and the content of each composition in solution is:
Sodium hypophosphite 16-37g/L
Hydrocerol A 2.5-8g/L
Lactic acid 12-70 g/L
Propionic acid 5-40 g/L
Oxysuccinic acid 2-10 g/L
Succinic Acid 2-8 g/L
3-sulphur-isothiourea propanesulfonic acid inner salt 0.01-40mg/L
Potassium Iodate 0.1-60mg/L
Antimonypotassium tartrate 0-40mg/L
Ammonium molybdate 0-35mg/L
Sulfothiorine 0-20mg/L
Sodium Thiocyanate 99 (potassium) 0-45mg/L
Ammonium molybdate 0-44mg/L
Thiocarbamide 0-80mg/L
Urea 0-65mg/L
Sulfydryl benzo pyridine 0-100mg/L
Further, comprise the wetting agent sodium laurylsulfonate in the above-mentioned solution, its content in solution is 0-200mg/L.
Further, the pH value of above-mentioned nickel plating solution is 4.2～5.2.
Temperature when further, above-mentioned nickel plating solution uses is controlled at 80～95 ℃.
Solution of the present invention adopts single nickel salt as nickel salt, and tellurous oxide is as brightening agent, adds the stablizer of multiple composition simultaneously and as the sodium laurylsulfonate of wetting agent.
This solution is applicable to that electroless nickel layer thickness is not more than the product of 2um, and it is short especially that its characteristics are to obtain time of chemical Ni-plating layer of light, can be in less than the time of 3min produces the nickel coatings of full light on the Aluminium Radiator surface.
Embodiment
Instance 1, each component concentration in the nickel plating solution is following:
Single nickel salt 5 g/L
Sodium hypophosphite 30 g/L
Hydrocerol A 5 g/L
Lactic acid 35 g/L
Propionic acid 25 g/L
Oxysuccinic acid 4.5 g/L
Succinic Acid 4 g/L
Tellurous oxide 1mg/L
Antimonypotassium tartrate 35mg/L
Potassium Iodate 15mg/L
3-sulphur-isothiourea propanesulfonic acid inner salt 14mg/L
Sodium laurylsulfonate 45mg/L
The nickel plating solution that obtains according to this proportioning can produce complete bright nickel coatings in solution PH=4.8, use temperature under 88 ℃ the operating mode about 2 minutes and 40 seconds.
Instance 2, each component concentration in the nickel plating solution is following:
Single nickel salt 5 g/L
Sodium hypophosphite 30 g/L
Hydrocerol A 5 g/L
Lactic acid 35 g/L
Propionic acid 25 g/L
Oxysuccinic acid 4.5 g/L
Succinic Acid 4 g/L
Sulfothiorine 0.53mg/L
Potassium Iodate 11mg/L
Tellurous oxide 0.8mg/L
Antimonypotassium tartrate 38mg/L
Sodium Thiocyanate 99 0.32mg/L
Sodium laurylsulfonate 40mg/L
The nickel plating solution that obtains according to this proportioning can produce complete bright nickel coatings in solution PH=4.8, use temperature under 88 ℃ the operating mode about 2 minutes and 55 seconds.
To sum up; The present invention is directed to the property requirement of Aluminium Radiator plating nickel on surface layer; Designed a kind of chemical nickel-plating solution of ultrafast bright dipping; It can be implemented in less than the nickel coatings that produces full light in 3 minutes time, to satisfy the product technology requirement under suitable substance P H value and suitable use temperature.
The above; It only is the preferred embodiments of this practicality invention; Be not that any pro forma restriction is done in invention, every foundation know-why of the present invention still belongs in the scope of technical scheme of the present invention any simple modification, equivalent variations or modification that above embodiment did.
Claims (6)
1. the chemical nickel-plating solution of a ultrafast bright dipping comprises nickel salt, stablizer and brightening agent, it is characterized in that: said brightening agent adopts tellurous oxide.
2. chemical nickel-plating solution as claimed in claim 1 is characterized in that: the content of said tellurous oxide in solution is 0.01-50mg/L.
3. chemical nickel-plating solution as claimed in claim 1 is characterized in that: said nickel salt is a single nickel salt, and its content in solution is 18-35g/L.
4. like the described chemical nickel-plating solution of the arbitrary claim of claim 1-3, it is characterized in that: said stablizer comprises has multiple composition, and the content of each composition in solution is:
Sodium hypophosphite 16-37g/L
Hydrocerol A 2.5-8g/L
Lactic acid 12-70 g/L
Propionic acid 5-40 g/L
Oxysuccinic acid 2-10 g/L
Succinic Acid 2-8 g/L
3-sulphur-isothiourea propanesulfonic acid inner salt 0.01-40mg/L
Potassium Iodate 0.1-60mg/L
Antimonypotassium tartrate 0-40mg/L
Ammonium molybdate 0-35mg/L
Sulfothiorine 0-20mg/L
Sodium Thiocyanate 99 (potassium) 0-45mg/L
Ammonium molybdate 0-44mg/L
Thiocarbamide 0-80mg/L
Urea 0-65mg/L
Sulfydryl benzo pyridine 0-100mg/L
Chemical nickel-plating solution as claimed in claim 4 is characterized in that: comprise the wetting agent sodium laurylsulfonate in the said solution, its content in solution is 0-200mg/L.
5. chemical nickel-plating solution as claimed in claim 4 is characterized in that: the pH value of said nickel plating solution is 4.2～5.2.
6. chemical nickel-plating solution as claimed in claim 4 is characterized in that: the temperature when said nickel plating solution uses is controlled at 80～95 ℃.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2012100526022A CN102534581A (en) | 2012-03-02 | 2012-03-02 | Ultrafast bright dipping chemical nickel-plating solution |
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| Application Number | Priority Date | Filing Date | Title |
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| CN2012100526022A CN102534581A (en) | 2012-03-02 | 2012-03-02 | Ultrafast bright dipping chemical nickel-plating solution |
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| CN102534581A true CN102534581A (en) | 2012-07-04 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102953054A (en) * | 2012-11-19 | 2013-03-06 | 鲁东大学 | Chemical nickel-phosphorus alloy plating solution |
| CN108611626A (en) * | 2018-05-10 | 2018-10-02 | 中山市美仑化工有限公司 | A kind of no ammonia nitrogen chemical nickel treatment process |
| CN110172685A (en) * | 2019-05-23 | 2019-08-27 | 南京宁甬天星汽车电器有限公司 | Magnetic switch metal conditioner and magnetic switch process of surface treatment |
| CN113652678A (en) * | 2021-08-12 | 2021-11-16 | 苏州市汉宜化学有限公司 | Chemical nickel-tungsten-phosphorus plating solution and chemical plating method using same |
| CN114059053A (en) * | 2021-11-09 | 2022-02-18 | 苏州汉宜纳米新材料有限公司 | Chemical plating Ni-W-P plating solution and preparation method thereof, and Ni-W-P plating layer and preparation method thereof |
| CN115418631A (en) * | 2022-09-05 | 2022-12-02 | 吉安宏达秋科技有限公司 | Environment-friendly bright medium-phosphorus chemical nickel plating solution and application thereof |
Citations (5)
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| JPS59232262A (en) * | 1983-06-16 | 1984-12-27 | Noritoshi Honma | Brightener for electroless nickel plating solution |
| JPS6353285A (en) * | 1986-08-22 | 1988-03-07 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating solution |
| CN1922343A (en) * | 2004-02-26 | 2007-02-28 | 爱托特奇德国股份有限公司 | Baths, systems and processes for electroplating zinc-nickel ternary and higher alloys and articles so electroplated |
| CN101302614A (en) * | 2008-01-17 | 2008-11-12 | 中山大学 | Environment-protective plating solution for preparing high-hardness chemical plating Ni-P-SiC coating |
| CN102644066A (en) * | 2011-02-17 | 2012-08-22 | 朱从亚 | Environment-friendly chemical nickel plating brightener and application thereof |
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2012
- 2012-03-02 CN CN2012100526022A patent/CN102534581A/en active Pending
Patent Citations (5)
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| JPS59232262A (en) * | 1983-06-16 | 1984-12-27 | Noritoshi Honma | Brightener for electroless nickel plating solution |
| JPS6353285A (en) * | 1986-08-22 | 1988-03-07 | Nippon Hyomen Kagaku Kk | Zinc-nickel alloy plating solution |
| CN1922343A (en) * | 2004-02-26 | 2007-02-28 | 爱托特奇德国股份有限公司 | Baths, systems and processes for electroplating zinc-nickel ternary and higher alloys and articles so electroplated |
| CN101302614A (en) * | 2008-01-17 | 2008-11-12 | 中山大学 | Environment-protective plating solution for preparing high-hardness chemical plating Ni-P-SiC coating |
| CN102644066A (en) * | 2011-02-17 | 2012-08-22 | 朱从亚 | Environment-friendly chemical nickel plating brightener and application thereof |
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| 张学铭等。: "《化学小辞典》", 31 August 1994, 科学技术文献出版社 * |
| 陈嘉甫，谭光薰主编: "《磷酸盐的生产与应用》", 31 December 1989, 成都科技大学出版社 * |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102953054A (en) * | 2012-11-19 | 2013-03-06 | 鲁东大学 | Chemical nickel-phosphorus alloy plating solution |
| CN108611626A (en) * | 2018-05-10 | 2018-10-02 | 中山市美仑化工有限公司 | A kind of no ammonia nitrogen chemical nickel treatment process |
| CN110172685A (en) * | 2019-05-23 | 2019-08-27 | 南京宁甬天星汽车电器有限公司 | Magnetic switch metal conditioner and magnetic switch process of surface treatment |
| CN113652678A (en) * | 2021-08-12 | 2021-11-16 | 苏州市汉宜化学有限公司 | Chemical nickel-tungsten-phosphorus plating solution and chemical plating method using same |
| CN114059053A (en) * | 2021-11-09 | 2022-02-18 | 苏州汉宜纳米新材料有限公司 | Chemical plating Ni-W-P plating solution and preparation method thereof, and Ni-W-P plating layer and preparation method thereof |
| CN114059053B (en) * | 2021-11-09 | 2023-10-10 | 苏州汉宜纳米新材料有限公司 | Electroless Ni-W-P plating solution and preparation method thereof, ni-W-P plating layer and preparation method thereof |
| CN115418631A (en) * | 2022-09-05 | 2022-12-02 | 吉安宏达秋科技有限公司 | Environment-friendly bright medium-phosphorus chemical nickel plating solution and application thereof |
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Application publication date: 20120704 |