CN102486478A - Atomic force microscope imaging method capable of realizing dynamic adjustable height and aberration resolution - Google Patents
Atomic force microscope imaging method capable of realizing dynamic adjustable height and aberration resolution Download PDFInfo
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- CN102486478A CN102486478A CN2010105739609A CN201010573960A CN102486478A CN 102486478 A CN102486478 A CN 102486478A CN 2010105739609 A CN2010105739609 A CN 2010105739609A CN 201010573960 A CN201010573960 A CN 201010573960A CN 102486478 A CN102486478 A CN 102486478A
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Abstract
The invention relates to an atomic force microscope (AFM) imaging method capable of realizing a dynamic adjustable height and a dynamic adjustable aberration resolution. The method comprises the following steps that: a model of a relation between AFM scanning data and bitmap image data is established; a sample surface predicted height H is introduced into the relation model; and according to the established relation model and the predicted height H, the AFM scanning data are dynamically converted into aberration bitmaps with different aberration resolutions, so that sample morphology visual graphical display with the dynamic aberration resolutions is realized. According to the method provided in the invention, the established relation model is simple; the calculated amount is small; and the method is easy to realize; moreover, on-line dynamic adjustment of height and aberration resolution of an image can be carried out.
Description
Technical field
The present invention relates to a kind of nano collimation technology, a kind of specifically atomic force flying-spot microscope formation method of height aberration resolution dynamic adjustable.
Background technology
At present; Nano collimation technology based on AFM (atomic force flying-spot microscope) is observed in nano material, the nano-device manufacturing; Nano science research and nanoprocessing have a very important role in using, and have become an important directions in the present nano science research.Nano collimation principle based on AFM is; Control cantilever beam structure probe produces contact or contactless state effect to sample surfaces; Utilize photoelectric sense technology to detect the stress deformation of probe under this state, and feed back to piezoelectric ceramic actuator, it is risen and fallen with sample surfaces move up and down; Just can obtain the shape characteristic of sample according to the altitude information of piezoelectric ceramics, to reach nanoscale pattern observation to sample.In the middle of this process, a very important process be to the altitude information (being scan-data) of scanner driver be converted into can visual observation bitmap image data, being transformed into bitmap image data from scan-data needs a relational model.And at present, the technical scheme operand that is converted into view data that can visual observation by scan-data is big, and process is comparatively complicated, realizes difficulty.
Summary of the invention
The technical scheme operand that converts view data that can visual observation to the atomic force flying-spot microscope scan-data that exists in the prior art into is big; Process is weak point such as complicacy comparatively, and the technical matters that the present invention will solve provides that a kind of relational model is simple, calculated amount is little, the atomic force flying-spot microscope formation method of the height aberration resolution dynamic adjustable of easy realization.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is:
The atomic force flying-spot microscope formation method of a kind of height aberration of the present invention resolution dynamic adjustable may further comprise the steps:
Set up the relational model between atomic force flying-spot microscope scan-data and the bitmap image data;
In relational model, introduce sample surfaces pre-computed altitude H;
According to relational model of being set up and pre-computed altitude H, dynamically atomic force flying-spot microscope scan-data is converted to the aberration bitmap of different aberration resolution, realize sample topography visual pattern demonstration with dynamic aberration resolution.
Relational model between said atomic force flying-spot microscope scan-data and the bitmap image data is:
Wherein, L (i j) is capable, the j column scan data of i in the atomic force flying-spot microscope scan-data, and f (i, j) for the line scanning data being carried out the curvilinear function after the least square curve fitting, C is a bitmap palette maximum index value; R is an atomic force flying-spot microscope scanner driver displacement resolution, and p (i j) is converted to the color index value of bitmap palette for scan-data, i.e. bitmap view data, and m is a constant.
It is following that scan-data is set up process to the relational model between the bitmap view data:
(1) relation through scan-data variable quantity and scanner driver actual displacement obtains the actual displacement (L (i of the scan-data after eliminating dip deviation; J)-f (i, j)) r, wherein L (i; J) be capable, the j column scan data of i in the atomic force flying-spot microscope scan-data; F (i, j) for the line scanning data being carried out the curvilinear function after the least square curve fitting, r is an atomic force flying-spot microscope scanner driver displacement resolution;
(2) be sample surfaces pre-computed altitude H through the true altitude of setting bitmap palette index value difference (C-m) representative, obtain height aberration resolution (C-m/H); C is a bitmap palette maximum index value; M is a constant.
(3) actual displacement through scan-data (L (i, j)-f (i, j)) r and height aberration resolution (C-m/H), obtain the relational model between atomic force flying-spot microscope scan-data and the bitmap image data:
(i j) is converted to the color index value of bitmap palette, i.e. the bitmap view data to p for scan-data.
The present invention has following beneficial effect and advantage:
1. the relational model built of this method is simple, and calculated amount is little, and efficient is high, realizes easily, can onlinely carry out picture altitude aberration resolution and dynamically adjust.
Description of drawings
Figure 1A is a standard grid scan image when sample pre-computed altitude H=600nm;
Figure 1B is the corresponding view data curve map of certain delegation among Figure 1A;
Fig. 2 A is a standard grid scan image when sample pre-computed altitude H=400nm;
Fig. 2 B is the corresponding view data curve map of certain delegation among Fig. 2 A;
Fig. 3 A is a standard grid scan image when sample pre-computed altitude H=200nm;
Fig. 3 B is the corresponding view data curve map of certain delegation among Fig. 3 A.
Embodiment
Below in conjunction with accompanying drawing the inventive method is done further explain.
The atomic force flying-spot microscope formation method of the present invention's height aberration resolution dynamic adjustable may further comprise the steps:
Set up the relational model between atomic force flying-spot microscope scan-data and the bitmap image data;
In relational model, introduce sample surfaces pre-computed altitude H;
According to relational model of being set up and pre-computed altitude H, dynamically atomic force flying-spot microscope scan-data is converted to the aberration bitmap of different aberration resolution, realize sample topography visual pattern demonstration with dynamic aberration resolution.
Relational model between said atomic force flying-spot microscope scan-data and the data bitmap is:
Wherein, L (i j) is capable, the j column scan data of i in the atomic force flying-spot microscope imaging data, and f (i, j) for the line scanning data being carried out the curvilinear function after the least square curve fitting, C is a bitmap palette maximum index value; R is an atomic force flying-spot microscope scanner driver displacement resolution, and p (i j) is converted to the color index value of bitmap palette for scan-data, i.e. bitmap view data, and m is a constant.
The present invention sets up such model exactly, solves the conversion from the scanner driver altitude information to data bitmap; In addition; Atomic force flying-spot microscope user is when the sample scanning imagery; Usually need zoom in or out some minutia color aberration in interesting areas, so that better observation sample surface appearance feature, so scan image needs to realize height aberration resolution dynamic adjustable.
It is following that scan-data is set up process to the relational model of data bitmap:
(1) relation through scan-data variable quantity and scanner driver actual displacement obtains the actual displacement (L (i of the scan-data after eliminating dip deviation; J)-f (i, j)) r, wherein L (i; J) be the capable j row of i AFM scan-data; F (i, j) for the line scanning data being carried out the curvilinear function value after the least square curve fitting, r is an atomic force flying-spot microscope scanner driver displacement resolution;
(2) be sample surfaces pre-computed altitude H through the true altitude of setting bitmap palette index value difference (C-m) representative, obtain height aberration resolution (C-m/H);
(3) the scanner driver actual displacement through obtaining in (1) (L (i, j)-f (i, j)) r and (2) in height aberration resolution (C-m/H), obtain the relational model of scan-data to the bitmap view data:
M is a constant in the formula, is that to make the color of sample substrate be the color of index value m representative.(i, j) value is to reach the purpose of real-time regulated picture altitude aberration resolution can to increase or dwindle p through adjusting H value.
Figure 1A, Fig. 2 A and Fig. 3 A are respectively at sample pre-computed altitude H to utilize the formed scan image of above-mentioned model under 600nm, 400nm and the 200nm situation; Figure 1B, Fig. 2 B reach and Fig. 3 B is the image data lines curve map that corresponds respectively among scan image Figure 1A, Fig. 2 A and Fig. 3 A, and the imaging sample is the standard grid of height 100nm.Can draw the linear successively increase of three width of cloth picture altitude aberration resolution according to height aberration resolution formula (C-m/H), can find out also that from the actual visual effect of three width of cloth scan images aberration of the high lower part of standard grid strengthens successively; In addition; Selected RP A and the view data difference of B are respectively 28,42 and 84 from three width of cloth images; Be linear successively increase of image aberration between A and the B; This result has proved through above-mentioned model not only can realize the conversion of scan-data to the bitmap view data; And the user can be worth method to come the height aberration resolution of adjustment image in real time through regulating H, thus finally regulate scan-data the image imaging aberration, realize the sample topography visual pattern demonstration of height aberration resolution dynamic adjustable.
Claims (3)
1. the atomic force flying-spot microscope formation method of a height aberration resolution dynamic adjustable is characterized in that may further comprise the steps:
Set up the relational model between atomic force flying-spot microscope scan-data and the bitmap image data;
In relational model, introduce sample surfaces pre-computed altitude H;
According to relational model of being set up and pre-computed altitude H, dynamically atomic force flying-spot microscope scan-data is converted to the aberration bitmap of different aberration resolution, realize sample topography visual pattern demonstration with dynamic aberration resolution.
2. by the atomic force flying-spot microscope formation method of the described height aberration of claim 1 resolution dynamic adjustable, it is characterized in that:
Relational model between said atomic force flying-spot microscope scan-data and the bitmap image data is:
Wherein, L (i j) is capable, the j column scan data of i in the atomic force flying-spot microscope scan-data, and f (i, j) for the line scanning data being carried out the curvilinear function after the least square curve fitting, C is a bitmap palette maximum index value; R is an atomic force flying-spot microscope scanner driver displacement resolution, and p (i j) is converted to the color index value of bitmap palette for scan-data, i.e. bitmap view data, and m is a constant.
3. by the atomic force flying-spot microscope formation method of the described height aberration of claim 1 resolution dynamic adjustable, it is characterized in that scan-data to the relational model between the bitmap view data, it is following to set up process:
(1) relation through scan-data variable quantity and scanner driver actual displacement obtains the actual displacement (L (i of the scan-data after eliminating dip deviation; J)-f (i, j)) r, wherein L (i; J) be capable, the j column scan data of i in the atomic force flying-spot microscope scan-data; F (i, j) for the line scanning data being carried out the curvilinear function after the least square curve fitting, r is an atomic force flying-spot microscope scanner driver displacement resolution;
(2) be sample surfaces pre-computed altitude H through the true altitude of setting bitmap palette index value difference (C-m) representative, obtain height aberration resolution and be (C-m/H); C is a bitmap palette maximum index value; M is a constant.
(3) actual displacement through scan-data (L (i, j)-f (i, j)) r and height aberration resolution (C-m/H), obtain the relational model between atomic force flying-spot microscope scan-data and the bitmap image data:
(i j) is converted to the color index value of bitmap palette, i.e. the bitmap view data to p for scan-data.
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CN109387670A (en) * | 2017-08-07 | 2019-02-26 | 中国科学院沈阳自动化研究所 | A kind of SICM voltage modulated imaging device and method based on difference noise reduction |
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JP2004191277A (en) * | 2002-12-13 | 2004-07-08 | Hitachi Ltd | Scanning probe microscope and its measurement method |
US6818891B1 (en) * | 1998-04-03 | 2004-11-16 | Brookhaven Science Associates | Sensing mode atomic force microscope |
CN101441160A (en) * | 2008-12-29 | 2009-05-27 | 北京航空航天大学 | Continuous imaging automatic area-selecting method suitable for atomic force microscope |
CN101855534A (en) * | 2007-09-12 | 2010-10-06 | 威科仪器公司 | Method and apparatus of automatic scanning probe imaging |
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Publication number | Priority date | Publication date | Assignee | Title |
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US6818891B1 (en) * | 1998-04-03 | 2004-11-16 | Brookhaven Science Associates | Sensing mode atomic force microscope |
JP2004191277A (en) * | 2002-12-13 | 2004-07-08 | Hitachi Ltd | Scanning probe microscope and its measurement method |
CN101855534A (en) * | 2007-09-12 | 2010-10-06 | 威科仪器公司 | Method and apparatus of automatic scanning probe imaging |
CN101441160A (en) * | 2008-12-29 | 2009-05-27 | 北京航空航天大学 | Continuous imaging automatic area-selecting method suitable for atomic force microscope |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN109387670A (en) * | 2017-08-07 | 2019-02-26 | 中国科学院沈阳自动化研究所 | A kind of SICM voltage modulated imaging device and method based on difference noise reduction |
CN109387670B (en) * | 2017-08-07 | 2020-12-29 | 中国科学院沈阳自动化研究所 | SICM voltage modulation imaging device and method based on differential noise reduction |
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