CN102446673A - Glass substrate for display and manufacturing method thereof - Google Patents
Glass substrate for display and manufacturing method thereof Download PDFInfo
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- CN102446673A CN102446673A CN2010105024343A CN201010502434A CN102446673A CN 102446673 A CN102446673 A CN 102446673A CN 2010105024343 A CN2010105024343 A CN 2010105024343A CN 201010502434 A CN201010502434 A CN 201010502434A CN 102446673 A CN102446673 A CN 102446673A
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Abstract
The invention provides a glass substrate for a display and a manufacturing method thereof, and the glass substrate for the display is not easy to have stripping electrification when being striped from an adsorption station. The glass substrate for the display with 0.8 to 2.0nm of the average surface roughness calculated by an interatomic force microscope of the surface at one side and the manufacturing method of the glass substrate for the display are characterized in that grinding fluid containing fluid and grains and compressed air are blown to the surface at one side of a glass substrate (1) together from a nozzle (14) for roughening treatment.
Description
Technical field
The present invention relates to glass substrate for display and manufacturing approach thereof.
Background technology
In Plasmia indicating panel (PDP), liquid crystal indicator (LCD), electroluminescent display (ELD), Field Emission Display flat-panel monitors such as (FED), the structure that on glass substrate, is formed with transparency electrode, semiconductor element etc. is used as substrate and uses.TFT) etc. for example, in LCD, (Thin Film Transistor: structure is used as substrate and uses on glass substrate, to be formed with transparency electrode, TFT.
Transparency electrode, semiconductor element etc. are fixed in glass substrate under the state on the absorptive table to being formed on through vacuum suction on the glass substrate and carry out.
But because the surface smoothing of glass substrate, so glass substrate is attached on the absorptive table powerfully, glass substrate is difficult to peel off from absorptive table, if peel off by force, then can cause glass substrate to damage.
In addition because glass substrate is charged easily, so at the glass substrate that will be formed with transparency electrode, semiconductor element etc. when absorptive table is peeled off, glass substrate can be charged.The electrostatic breakdown of semiconductor elements such as initiation TFT has taken place at glass substrate under the situation of stripping charge.
Therefore, roughened is carried out on the surface of the glass substrate of the side that contacts with absorptive table, reduce the contact area of glass substrate and absorptive table.If reduced this contact area, then can be easy to peel off glass substrate from absorptive table.In addition, can suppress the generation of stripping charge, reduce the stripping charge amount.As the method for roughened, well-knownly be that the lapping liquid that for example will comprise liquid and abrasive particle is to the face winding-up of a side of glass substrate and by the method (patent documentation 1) on the surface of brush grinding glass substrate.
But, utilizing existing method to carry out in the glass substrate of roughened, can not fully suppress the generation of stripping charge, cause the electrostatic breakdown of semiconductor element sometimes.In addition, glass substrate can be attached on the absorptive table etc. because of stripping charge once again, and glass substrate is difficult to peel off from absorptive table etc., if peel off by force, then can cause glass substrate to damage.
Patent documentation 1: (Japan) spy opens the 2001-343632 communique
Summary of the invention
Therefore, the present invention is provided at glass substrate for display and the manufacturing approach thereof that when absorptive table is peeled off, is difficult for producing stripping charge.
Glass substrate for display of the present invention is characterised in that, the average surface roughness of the face of a side of being obtained by following method is 0.8～2.0mm.
(average surface roughness)
On the face of a side of glass substrate for display, select any more than 2; Use atomic force microscope to measure the mensuration zone of 5 μ m * 5 μ m to each point, obtain the arithmetic average height Ra of JIS B0601 (calendar year 2001) defined thus and obtain the mean value of Ra.
In the glass substrate for display of the present invention, preferably, average surface roughness is that the face of 0.8～2.0nm is the face that has carried out roughened.
The manufacturing approach of glass substrate for display of the present invention is characterised in that, the lapping liquid that will comprise liquid and abrasive particle with compressed air from nozzle to the face winding-up of glass substrate one side and carry out roughened.
Preferred said compressed-air actuated pressure (gauge pressure) is 0.3～0.5MPa.
The flow of preferred said lapping liquid is average nozzle a 5～10L/ minute.
Preferred said abrasive particle is a cerium oxide.
Preferred said abrasive particle to pass through the average grain diameter that dynamic light scattering determination goes out be 0.5～3 μ m.
Carry out said roughened when preferably carrying glass substrate with 80～400cm/ minute speed.
Glass substrate for display of the present invention is being difficult for producing stripping charge when absorptive table is peeled off.
According to glass substrate for display manufacturing approach of the present invention, can be manufactured on the glass substrate for display that when absorptive table is peeled off, is difficult for producing stripping charge.
Description of drawings
Fig. 1 is the side view of one of the roughened device of expression glass substrate example;
Fig. 2 is the side view of one of expression nozzle example;
Fig. 3 is the average surface roughness of expression glass substrate and the curve chart of the relation between the stripping charge amount.
Embodiment
The average surface roughness of the face of one side of glass substrate for display of the present invention is 0.8～2.0nm, is preferably 1.0～1.5nm.If average surface roughness is more than the 0.8nm, then, absorptive table is difficult for producing stripping charge when peeling off.
Average surface roughness calculates with following method.
On the face of a side of glass substrate for display, selecting arbitrarily more than 2, measure their arithmetic average height Ra respectively, is average surface roughness with the mean value of each value.
Arithmetic average height Ra is the arithmetic average height Ra of JIS B0601 (calendar year 2001) defined, obtains through the mensuration zone that utilizes atomic force microscope to measure the 5 μ m * 5 μ m of each point.
Average surface roughness is that the face of 0.8～2.0nm is preferably the face that carries out roughened.The face of the side that the face that has carried out roughened contacts with absorptive table when forming transparency electrode, semiconductor element etc.On the other hand, the face of opposition side that has carried out the face of roughened utilizes milled processed etc. to make its smoothing usually, becomes the face that forms transparency electrode, semiconductor element etc.
Glass substrate for display of the present invention can be processed through following mode, the lapping liquid that is about to comprise liquid and abrasive particle with compressed air from nozzle to the face winding-up of glass substrate one side and carry out roughened.
Fig. 1 be the expression glass substrate the roughened device one the example side view.The summary of roughened device 10 constitutes and possesses: with glass substrate 1 with carry from the state of clamping up and down, by a pair of constitute many up and down to conveying roller 12; Reach lapping liquid with the nozzle 14 of compressed air to the upper surface winding-up of glass substrate 1.
As shown in Figure 2, nozzle 14 has: lapping liquid stream 22, the lapping liquid flow therein that said lapping liquid stream 22 connects nozzle 14 and supplies with from lapping liquid supply pipe 16; And compressed air stream 24, make from compressed air supply pipe 18 compressed and supplied air and lapping liquid stream 22 and converge.
It also can be a plurality of that nozzle 14 can be 1.Nozzle is under 1 the situation, and nozzle 14 can move horizontally on the direction with respect to the direct of travel quadrature of glass substrate 1.Under nozzle 14 was a plurality of situation, nozzle 14 was arranged side by side with predetermined distance on the direction with respect to the direct of travel quadrature of glass substrate 1.
The diameter of the ejiction opening of nozzle 14 (diameter of the outlet of lapping liquid stream 22) is preferably 8～12mm.The diameter of compressed air stream 24 is preferably 3～6mm before converging tightly with lapping liquid stream 22.If the diameter of diameter and compressed air stream 24 of ejiction opening that makes nozzle 14 then can be easy to the average surface roughness of glass substrate 1 is adjusted into the scope of 0.8mm～2.0nm in this scope.
As glass substrate 1, can enumerate alkali-free glass substrates such as glass substrate that soda-lime glass substrate etc. contains alkali, pyrex substrate etc.
The size of glass substrate 1 preferably laterally vertically is 100～3000mm.In addition, the thickness of glass substrate 1 is preferably 0.3～3mm.
Particularly under the situation of alkali-free glass substrate, form and represent in fact by SiO with mole %
2: 60～70%, Al
2O
3: 9～14%, B
2O
3: 6～9.5%, MgO:1～5%, CaO:1～6%, SrO:2～8%, MgO+CaO+SrO:9～16% constitute, and do not contain BaO in fact, and is if thickness is 0.5～1.0mm, then preferred especially.
Lapping liquid is that abrasive particle is dispersed in the dispersion liquid in the liquid.
As liquid, can enumerate water, organic solvent.
As abrasive particle, can enumerate cerium oxide, silica, aluminium oxide, calcium carbide, titanium oxide, cubic boron nitride, diamond etc., from the efficient of roughened, be preferably cerium oxide.
The average grain diameter of abrasive particle is preferably 0.5～3.0 μ m, more preferably 0.8～2.0 μ m.If average grain diameter is more than the 0.5 μ m, roughened glass substrate 1 expeditiously then.If average grain diameter is below the 3.0 μ m, then be easy to the average surface roughness of glass substrate 1 is adjusted into the scope of 0.8～2.0nm.
The average grain diameter of abrasive particle is passed through dynamic light scattering determination.
The concentration of abrasive particle is preferably 8～20 quality % in lapping liquid (100 quality %).If the concentration of abrasive particle is more than the 8 quality %, roughened glass substrate 1 efficiently then.If the concentration of abrasive particle is below the 20 quality %, then be easy to the average surface roughness of glass substrate 1 is adjusted into the scope of 0.8～2.0nm.
The flow of preferred lapping liquid is average nozzle a 145～10L/ minute, more preferably 6～10L/ minute.If the flow of lapping liquid is more than 5L/ minute, roughened glass substrate 1 efficiently then.If the flow of lapping liquid is below 10L/ minute, then be easy to the average surface roughness of glass substrate 1 is adjusted into the scope of 0.8～2.0nm.
Compressed-air actuated pressure (gauge pressure) is preferably 0.3～0.5MPa, more preferably 0.4～0.5MPa.If compressed-air actuated pressure is more than the 0.3MPa, roughened glass substrate 1 efficiently then.If compressed-air actuated pressure is below the 0.5MPa, then be easy to the average surface roughness of glass substrate 1 is adjusted into the scope of 0.8～2.0nm.
The transporting velocity of glass substrate 1 is preferably 80～400cm/ minute, more preferably 80～250cm/ minute.If the transporting velocity of glass substrate 1 is more than 80cm/ minute, roughened glass substrate 1 efficiently then, and be easy to the average surface roughness of glass substrate 1 is adjusted into below the 2.0nm.If the transporting velocity of glass substrate 1 is below 400cm/ minute, then be easy to the average surface roughness of glass substrate 1 is adjusted into more than the 0.8nm.
For the glass substrate 1 that carries out roughened, in order to remove the lip-deep abrasive particle that remains in glass substrate 1, can carry out lapping liquid as required and clean, and then also can carry out water and grind.
Lapping liquid cleans and for example can use the device for grinding and processing of putting down in writing among Fig. 1 of patent documentation 1 to carry out.
As the water abrasive method, for example can be set forth in when supplying with water and to apply certain pressure through nonwoven fabrics and the method on grinding glass substrate surface etc.
Carried out the glass substrate for display of roughened for the face of a side, utilized known method on the face of the opposition side of the face that carries out roughening, to form transparency electrode, semiconductor element etc., used as base plate for displaying thus.
As display, can enumerate PDP, LCD, ELD, FED etc.
In the glass substrate for display of the present invention of above-mentioned explanation, because the average surface roughness of the face of a side is 0.8～2.0nm, so when absorptive table is peeled off, be difficult for producing stripping charge.Therefore, the stripping charge amount of glass substrate is 0 basically, and the electrostatic breakdown of semiconductor element is suppressed, and in addition, the breakage of glass substrate is suppressed.Relevant average surface roughness is made as the basis of 0.8～2.0nm, in following instance, is described in detail.
In addition; In the manufacturing approach of the glass substrate for display of the present invention of above-mentioned explanation; Owing to the lapping liquid that will comprise liquid and abrasive particle carries out roughened from nozzle to the face winding-up of a side of glass substrate with compressed air, be the glass substrate for display of 0.8～2.0nm so can make the average surface roughness of the face of a side.
On the other hand, having carried out the glass substrate of roughened with the method for record in the patent documentation 1, owing to lapping liquid is not jetted with compressed air, is about 0.5nm so carried out the average surface roughness of the face of roughened.Therefore, think that the inhibition effect of the stripping charge when absorptive table is peeled off is insufficient.In addition; In patent documentation 1; The small concavo-convex concavo-convex difference that forms through roughened be 100～150
(10～15nm); This thinks because it obtains surface roughness through using mensuration such as contact roughmeter to measure the zone on a large scale, so " bending " of glass substrate also is added into.Using atomic force microscope to measure under the situation in small zone of 5 μ m * 5 μ m, " bending " of glass substrate is not added into, and can accurately measure " roughness " of glass substrate.
[embodiment]
Below, enumerating embodiment and specify the present invention, the present invention is not limited to these examples.
(example 1～4)
At first, carry out the checking of relation of average surface roughness and the stripping charge amount of glass substrate.
Use roughened device 10 shown in Figure 1, carry out the roughened of the upper surface of glass substrate with the condition shown in the table 1.
If the diameter of the ejiction opening of nozzle 14 (diameter of the outlet of lapping liquid stream 22) is 12mm, the diameter of compressed air stream 24 is 6mm before converging tightly with lapping liquid stream 22.The quantity of nozzle 14 is 8.If the distance from the front end of nozzle 14 to glass substrate is 20cm.
Use LCD with alkali-free glass substrate (Asahi Glass manufactured: AN100, long 550mm * wide 440mm * thick 0.7mm) as glass substrate.
As lapping liquid, use in water, be dispersed with the average grain diameter that goes out through dynamic light scattering determination be 1.8 μ m cerium oxide, cerium oxide concentration is the dispersion liquid of 20 quality %.
The average surface roughness of the face behind the roughening of mensuration glass substrate and the stripping charge amount of the glass substrate behind the roughening.Result such as table 1 and shown in Figure 3.In addition, intensity in the face of the glass substrate behind the mensuration roughening.The result is as shown in table 1.
(average surface roughness)
Selecting arbitrarily more than 2 on the face behind the roughening of glass substrate, measuring their arithmetic average height Ra respectively, is average surface roughness with the mean value of each value.
Arithmetic average height Ra is the arithmetic average height Ra of JIS B0601 (calendar year 2001) defined, by atomic force microscope (Pacific Nanotechnology corporate system, Nano Scope III a; Scan Rate 1.0Hz, Sample Lines 256, Off-line Modify Flatten order-2, Planefit order-2) measure each point 5 μ m * 5 μ m the mensuration zone and obtain.
(stripping charge amount)
The value that will be described below is as the stripping charge amount: with glass substrate vacuum suction certain hour on absorptive table, afterwards through promoting the minimum value (maximum of the absolute value of carried charge (with voltage)) of the carried charge (with voltage) that produces when pin is peeled off glass substrate.
(intensity in the face)
Make facing up behind the glass baseplate surface roughening, with glass baseplate surface with ring the load capacity during to the plastic deformation of ring (ring-on-ring) mode as intensity in the face.
(example 5,6)
Use device for grinding and processing as shown in Figure 1 in the patent documentation 1, under condition shown in the table 1, carry out the roughened of the lower surface of glass substrate.Glass substrate, lapping liquid use the material same with routine 1.
The average surface roughness of the face behind the surface roughening of mensuration glass substrate and the stripping charge amount of the glass substrate behind the surface roughening.Result such as table 1 and shown in Figure 3.In addition, intensity in the face of the glass substrate behind the mensuration surface roughening, the result is as shown in table 1.
Table 1
Result according to Fig. 3 learns, when average surface roughness is 0.8nm when above, the stripping charge amount is 0 basically.In addition, even learn that according to the results presumption of table 1 and Fig. 3 it also is 0 basically that average surface roughness surpasses 2.0nm stripping charge amount, but when average surface roughness surpasses 2.0nm, carry out roughened and expend time in, and the intensity in the face might be insufficient.According to above result, the average surface roughness scope that determines glass substrate for display of the present invention is 0.8～2.0nm.
(example 7～9)
Then, carry out the checking of relation of the average surface roughness of compressed-air actuated pressure and glass substrate.
Except that condition shown in the table 2 produces change, carry out the roughened of the upper surface of glass substrate with example 1 identically.
The average surface roughness of the face behind the surface roughening of mensuration glass substrate.The result is as shown in table 2.
[table 2]
Result according to table 2 learns, if compressed-air actuated pressure (gauge pressure) in the scope of 0.3～0.5MPa, then the average surface roughness of the face behind the surface roughening of glass substrate is 0.8～2.0nm.
(example 10～12)
Then, carry out the checking of relation of the average surface roughness of lapping liquid flow and glass substrate.
Except that condition shown in the table 3 produces change, carry out the roughened of the upper surface of glass substrate with example 1 identically.
The average surface roughness of the face behind the surface roughening of mensuration glass substrate.The result is as shown in table 3.
[table 3]
Result according to table 3 learns that if the flow of lapping liquid is average nozzle a 5～10L/ minute a scope, then the average surface roughness of the face behind the surface roughening of glass substrate is 0.8～2.0nm.
(example 13～15)
Then, carry out the checking of relation of average surface roughness of transporting velocity and the glass substrate of glass substrate.
Except that condition shown in the table 4 produces change, carry out the roughened of the upper surface of glass substrate with example 1 identically.
The average surface roughness of the face behind the surface roughening of mensuration glass substrate.The result is as shown in table 4.
[table 4]
Result according to table 4 learns, if the transporting velocity of glass substrate in 80～400cm/ minute scope, then the average surface roughness of the face behind the surface roughening of glass substrate is 0.8～2.0nm.
Industrial applicability
Glass substrate for display of the present invention is useful as the substrate of the display of PDP, LCD, ELD, FED etc.
Claims (8)
1. glass substrate for display, the average surface roughness of the face of a side of being obtained by following method is 0.8～2.0nm:
(average surface roughness)
On the face of a side of glass substrate for display, select any more than 2; Use atomic force microscope to measure the mensuration zone of 5 μ m * 5 μ m to each point, obtain the arithmetic average height Ra of JIS B0601 (calendar year 2001) defined thus and obtain the mean value of Ra.
2. glass substrate for display as claimed in claim 1, wherein, average surface roughness is that the face of 0.8～2.0nm is the face that has carried out roughened.
3. the manufacturing approach of a glass substrate for display is made claim 1 or 2 described glass substrate for display, wherein,
The lapping liquid that will comprise liquid and abrasive particle with compressed air from nozzle to the face winding-up of glass substrate one side and carry out roughened.
4. the manufacturing approach of glass substrate for display as claimed in claim 3, wherein, said compressed-air actuated pressure (gauge pressure) is 0.3～0.5MPa.
5. like the manufacturing approach of claim 3 or 4 described glass substrate for display, wherein, the flow of said lapping liquid is average nozzle a 5～10L/ minute.
6. like the manufacturing approach of each described glass substrate for display in the claim 3～5, wherein, said abrasive particle is a cerium oxide.
7. like the manufacturing approach of each described glass substrate for display in the claim 3～6, wherein, said abrasive particle to pass through the average grain diameter that dynamic light scattering determination goes out be 0.5～3 μ m.
8. like the manufacturing approach of each described glass substrate for display in the claim 3～7, wherein, carry out said roughened when carrying glass substrate with 80～400cm/ minute speed.
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| CN2010105024343A CN102446673A (en) | 2010-09-30 | 2010-09-30 | Glass substrate for display and manufacturing method thereof |
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|---|---|---|---|
| CN2010105024343A CN102446673A (en) | 2010-09-30 | 2010-09-30 | Glass substrate for display and manufacturing method thereof |
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| CN102446673A true CN102446673A (en) | 2012-05-09 |
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| CN104209867A (en) * | 2013-08-27 | 2014-12-17 | 东旭集团有限公司 | Method and system for carrying out surface treatment on glass substrate |
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| CN107532877A (en) * | 2015-05-25 | 2018-01-02 | 日本电气硝子株式会社 | Surface roughness evaluation method, surface roughness evaluating apparatus and glass substrate |
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| CN110872000A (en) * | 2018-08-29 | 2020-03-10 | 日本电产三协株式会社 | Transfer robot |
| JP2021155320A (en) * | 2020-03-27 | 2021-10-07 | Ａｇｃ株式会社 | Glass sheet and manufacturing method thereof |
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Application publication date: 20120509 |