CN102442741A - 1+1 protection system for etching solution recycling equipment - Google Patents

1+1 protection system for etching solution recycling equipment Download PDF

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Publication number
CN102442741A
CN102442741A CN2010105011292A CN201010501129A CN102442741A CN 102442741 A CN102442741 A CN 102442741A CN 2010105011292 A CN2010105011292 A CN 2010105011292A CN 201010501129 A CN201010501129 A CN 201010501129A CN 102442741 A CN102442741 A CN 102442741A
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electrolyzer
master control
subsequent use
electronics valve
mutual conductance
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CN102442741B (en
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韦建敏
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Chengdu Honghua Environmental Protection Technology Co Ltd
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Abstract

The invention relates to a 1+1 protection system for an etching solution recycling equipment, comprising a component adjusting system, an electrolysis system, and a temperature control system, wherein, the electrolysis system comprises a master control electrolysis unit and a spare electrolysis unit which are independent of each other, a key connection point between the two electrolysis units is provided with a source node electronic valve, a host node electronic valve and a mutual conductance electronic valve. The master control electrolysis unit, the spare electrolysis unit, the source node electronic valve, the host node electronic valve, and the mutual conductance electronic valve are controlled separately, so that various types of alarms are processed by various motions, wherein, the alarms can be divided into an external signal alarm and a master control electrolysis unit starting protection alarm. According to the system, the flexibility of the system for processing different waste liquid quantities, the safety and reliability of the system are increased, and the advantages of high automaticity and convenient operation and control are achieved.

Description

Be applied to " 1+1 " securing system of etching solution cyclic regeneration equipment
Affiliated technical field
The present invention relates to the treatment technology of etching waste liquor (comprising acidic etching liquid, alkaline etching liquid and microetch liquid) cyclic regeneration, concrete relate to a kind of " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment.
Background technology
Printed substrate (Printed Circuit Board; PCB) be the significant components of electrical equipment and electronic product; Use very general; Wherein etching work procedure is the maximum part of proportion in the PCB Production Flow Chart, when etching solution when being lower than processing requirement, promptly becomes etching waste liquor owing to dissolved substances makes etching index (comprising speed, lateral erosion coefficient, surface cleaning property etc.) too much.
Its structure of etching solution indirect regeneration that present numerous colleague adopts mainly is to be master's closed cycle with strand shape, polyphone; Wherein electrolytic system is an etching solution indirect regeneration necessary part, also is particularly crucial part, is determining the efficient of system's operation; Undertaking electrolytic copper and the task of producing the sub-liquid of regeneration; Direct relation the quality of electrolytic copper and the sub-liquid of regeneration, and the replacing of pole plate, the maintaining of electrolytic system or electrolytic process go wrong and can interrupt whole flow process, thereby increase when the groove time; Influence progress of etching, also can influence the quality of electrolytic copper and regeneration etching solution simultaneously.
Advance people people's production and life along with increasing electrical equipment and electronic product; And constantly update; The etching waste liquor amount that the PCB industry is discharged is increases progressively trend rapidly every year; This makes also increasingly high to the requirement of etching solution indirect regeneration, as a whole, and problem such as general etching solution indirect regeneration exists that operational efficiency is not high, level of automation is on the low side at present, safe reliability can ensure and safeguard comparatively complicacy.
Summary of the invention
The purpose of this invention is to provide a kind of " 1+1 " guard method that is applied to etching solution cyclic regeneration equipment; It can realize in the printed substrate etching work procedure that etching solution is in the entire treatment process in the material closed cycle regenerated using; Improve the handiness of the different waste liquid amount of system handles; The security of increase system and safety, and level of automation is high, convenient operation and control.
On this basis; Another object of the present invention provides a kind of device of realizing aforesaid method; Make printed substrate etching work procedure neutral and alkali etching solution material in the entire treatment process realize improving " 1+1 " securing system device that is applied to the etching waste liquor cyclic regeneration of running efficiency of system, level of automation and safety and reliability in the closed cycle regenerated using.
The present invention is achieved in that " 1+1 " securing system of etching solution cyclic regeneration equipment is made up of component regulation system (2), electrolytic system (3) and temperature control system (4).Wherein electrolytic system (3) is formed in parallel by two separate electrolyzers; Two separate electrolyzers are respectively master control electrolyzer (A) and subsequent use electrolyzer (B); Wherein, Component regulation system (2), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with source node electronics valve (a); Temperature control system (4), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with destination node electronics valve (b); Be provided with pipeline between master control electrolyzer (A) and the subsequent use electrolyzer (B) and connect, be provided with mutual conductance electronics valve (c) in the pipeline, described source node electronics valve (a), destination node electronics valve (b) and mutual conductance electronics valve (c) are controlled the connection and the disconnection of its place pipeline respectively.Respectively master control electrolyzer (A), subsequent use electrolyzer (B), source node electronics valve (a), destination node electronics valve (b) and mutual conductance electronics valve (c) are controlled setting; Make that the difference action is carried out in dissimilar alarms to be handled, alarm can be divided into the external signal alarm and the master control electrolyzer starts the protection alarm.
The control setting that above-mentioned master control electrolyzer (A) and subsequent use electrolyzer (B) are carried out comprises: under system's normal operation; System does not produce alarm; Source node electronics valve (a) and destination node electronics valve (b) are communicated with master control electrolyzer (A) simultaneously; Master control electrolyzer (A) is in opened condition, and subsequent use electrolyzer (B) is in closing condition, and mutual conductance electronics valve (c) is closed; When the etching waste liquor amount of needs processing increases suddenly; System sends the external signal alarm, and source node electronics valve (a) and destination node electronics valve (b) are communicated with master control electrolyzer (A) and subsequent use electrolyzer (B) simultaneously, and the opened condition of master control electrolyzer (A) is constant; Subsequent use electrolyzer (B) is opened automatically and is carried out work; Mutual conductance electronics valve (c) is closed, and both are connected in parallel, and carries out work simultaneously; At master control electrolyzer (A) when needing maintaining; System sends the master control electrolyzer and starts the protection alarm; Source node electronics valve (a) and destination node electronics valve (b) are communicated with subsequent use electrolyzer (B) simultaneously; Master control electrolyzer (A) cuts out, and subsequent use electrolyzer (B) is opened automatically and carried out work, and mutual conductance electronics valve (c) is opened automatically; Liquid in the master control electrolyzer (A) is imported subsequent use electrolyzer (B), treat that whole subsequent use electrolyzer (B) the back mutual conductance electronics valves (c) that import of liquid are closed automatically in the master control electrolyzer (A); At master control electrolyzer (A) when breaking down; Source node electronics valve (a) and destination node electronics valve (b) are communicated with subsequent use electrolyzer (B) simultaneously; Master control electrolyzer (A) cuts out automatically, and subsequent use electrolyzer (B) is opened and carried out work, and mutual conductance electronics valve (c) is opened automatically; Liquid in the master control electrolyzer (A) is imported subsequent use electrolyzer (B), treat that whole subsequent use electrolyzer (B) the back mutual conductance electronics valves (c) that import of liquid are closed automatically in the master control electrolyzer (A).
Description of drawings
Fig. 1 is the composition structural representation that is applied to " 1+1 " securing system of etching solution cyclic regeneration equipment according to the invention;
Fig. 2 is under system's normal operation, electrolytic system work synoptic diagram;
When Fig. 3 alarms for external signal takes place, electrolytic system work synoptic diagram;
When Fig. 4 starts the protection alarm for the master control electrolyzer takes place, electrolytic system work synoptic diagram.
1. etching baths among the figure, 2. component regulation system, 3. electrolytic system, 4. temperature control system, A. master control electrolyzer, the subsequent use electrolyzer of B., a. source node electronics valve, b. destination node electronics valve, c. mutual conductance electronics valve.
Embodiment
Further specify the present invention with reference to the accompanying drawings.
With reference to Fig. 1, " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment comprises component regulation system (2), electrolytic system (3) and temperature control system (4), and described electrolytic system (3) comprises master control electrolyzer (A) and subsequent use electrolyzer (B).
Component regulation system (2) is provided with the pipeline that is connected with etching bath (1); Component regulation system (2) is connected with electrolytic system (3) through pipeline; Electrolytic system (3) is connected with temperature control system (4) through pipeline; Temperature control system (4) is connected with component regulation system (2) through pipeline; Master control electrolyzer (A) in the above-mentioned electrolytic system (3) and subsequent use electrolyzer (B) are in and are connected in parallel; Wherein component regulation system (2), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with source node electronics valve (a), and temperature control system (4), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with destination node electronics valve (b), are provided with pipeline between master control electrolyzer (A) and the subsequent use electrolyzer (B) and connect; Be provided with mutual conductance electronics valve (c) in the pipeline, described source node electronics valve (a), destination node electronics valve (b) and mutual conductance electronics valve (c) are controlled the connection and the disconnection of its place pipeline respectively.
With reference to Fig. 2, under system's normal operation, system does not produce alarm; Source node electronics valve (a) and destination node electronics valve (b) are communicated with master control electrolyzer (A) simultaneously; Master control electrolyzer (A) is in opened condition, and subsequent use electrolyzer (B) is in closing condition, and mutual conductance electronics valve (c) is closed; At this moment, master control electrolyzer (A) is connected with temperature control system (4).
With reference to Fig. 3, when the etching waste liquor amount of needs processing increased suddenly, system sent the external signal alarm; Source node electronics valve (a) and destination node electronics valve (b) are communicated with master control electrolyzer (A) and subsequent use electrolyzer (B) simultaneously; The opened condition of master control electrolyzer (A) is constant, and subsequent use electrolyzer (B) is opened automatically and carried out work, and mutual conductance electronics valve (c) is closed; Both are connected in parallel master control electrolyzer (A) and subsequent use electrolyzer (B); Carry out work simultaneously, at this moment, master control electrolyzer (A) is connected with temperature control system (4) with subsequent use electrolyzer (B) parallel connection back.
With reference to Fig. 4, when needing maintaining, system sends the master control electrolyzer and starts the protection alarm at master control electrolyzer (A); Source node electronics valve (a) and destination node electronics valve (b) are communicated with subsequent use electrolyzer (B) simultaneously; Master control electrolyzer (A) cuts out automatically, and subsequent use electrolyzer (B) is opened automatically and carried out work, and mutual conductance electronics valve (c) is opened automatically; Liquid in the master control electrolyzer (A) is imported subsequent use electrolyzer (B); Treat that whole subsequent use electrolyzer (B) the back mutual conductance electronics valves (c) that import of liquid are closed automatically in the master control electrolyzer (A), at this moment, subsequent use electrolyzer (B) is connected with temperature control system (4).
With reference to Fig. 4, when breaking down, system sends the master control electrolyzer and starts the protection alarm at master control electrolyzer (A); Source node electronics valve (a) and destination node electronics valve (b) are communicated with subsequent use electrolyzer (B) simultaneously; Master control electrolyzer (A) cuts out automatically, and subsequent use electrolyzer (B) is opened automatically and carried out work, and mutual conductance electronics valve (c) is opened automatically; Liquid in the master control electrolyzer (A) is imported subsequent use electrolyzer (B); Treat that whole subsequent use electrolyzer (B) the back mutual conductance electronics valves (c) that import of liquid are closed automatically in the master control electrolyzer (A), at this moment, subsequent use electrolyzer (B) is connected with temperature control system (4).

Claims (6)

1. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment is made up of component regulation system (2), electrolytic system (3), temperature control system (4); It is characterized in that: described electrolytic system (3) is formed in parallel by two separate electrolyzers; Two separate electrolyzers are respectively master control electrolyzer (A) and subsequent use electrolyzer (B); Wherein, Component regulation system (2), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with source node electronics valve (a); Temperature control system (4), master control electrolyzer (A) and subsequent use electrolyzer (B) three tie point are provided with destination node electronics valve (b); Be provided with pipeline between master control electrolyzer (A) and the subsequent use electrolyzer (B) and connect, be provided with mutual conductance electronics valve (c) in the pipeline, described source node electronics valve (a), destination node electronics valve (b) and mutual conductance electronics valve (c) are controlled the connection and the disconnection of its place pipeline respectively.Respectively master control electrolyzer (A), subsequent use electrolyzer (B), source node electronics valve (a), destination node electronics valve (b) and mutual conductance electronics valve (c) are controlled setting; Make that the difference action is carried out in dissimilar alarms to be handled, alarm can be divided into the external signal alarm and the master control electrolyzer starts the protection alarm.
2. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment according to claim 1 is characterized in that: described dissimilar alarms comprise that external signal alarm and master control electrolyzer start the protection alarm.
3. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment according to claim 1; It is characterized in that: under system's normal operation; System does not produce alarm, and described source node electronics valve (a) and described destination node electronics valve (b) are communicated with described master control electrolyzer (A) simultaneously, and described master control electrolyzer (A) is in opened condition; Described subsequent use electrolyzer (B) is in closing condition, and described mutual conductance electronics valve (c) is closed.
4. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment according to claim 1 is characterized in that: when the etching waste liquor amount of needs processing increased suddenly, system sent described external signal alarm, described source node electronics valve
(a) and described destination node electronics valve (b) be communicated with described master control electrolyzer (A) and described subsequent use electrolyzer (B) simultaneously; The opened condition of described master control electrolyzer (A) is constant; Described subsequent use electrolyzer (B) is opened automatically and is carried out work; Described mutual conductance electronics valve (c) is closed, and both are connected in parallel described master control electrolyzer (A) and described subsequent use electrolyzer (B), carry out work simultaneously.
5. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment according to claim 1; It is characterized in that: at described master control electrolyzer (A) when needing maintaining; System sends described master control electrolyzer and starts the protection alarm; Described source node electronics valve (a) and described destination node electronics valve (b) are communicated with described subsequent use electrolyzer (B) simultaneously; Described master control electrolyzer (A) cuts out, and described subsequent use electrolyzer (B) is opened automatically and carried out work, and described mutual conductance electronics valve (c) is opened automatically; Liquid in the described master control electrolyzer (A) is imported described subsequent use electrolyzer (B), and described mutual conductance electronics valve (c) was closed automatically after liquid all imported described subsequent use electrolyzer (B) in the described master control electrolyzer (A).
6. " 1+1 " securing system that is applied to etching solution cyclic regeneration equipment according to claim 1; It is characterized in that: at described master control electrolyzer (A) when breaking down; System sends described master control electrolyzer and starts the protection alarm; Described source node electronics valve (a) and described destination node electronics valve (b) are communicated with described subsequent use electrolyzer (B) simultaneously; Described master control electrolyzer (A) cuts out automatically, and described subsequent use electrolyzer (B) is opened and carried out work, and described mutual conductance electronics valve (c) is opened automatically; Liquid in the described master control electrolyzer (A) is imported subsequent use described electrolyzer (B), and described mutual conductance electronics valve (c) was closed automatically after liquid all imported described subsequent use electrolyzer (B) in the described master control electrolyzer (A).
CN 201010501129 2010-10-09 2010-10-09 1+1 protection system for etching solution recycling equipment Active CN102442741B (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103588330A (en) * 2012-08-17 2014-02-19 成都虹华环保科技有限公司 Low copper content wastewater comprehensive treatment and cyclic regeneration system
CN103588262A (en) * 2012-08-17 2014-02-19 成都虹华环保科技有限公司 Low copper content wastewater comprehensive treatment apparatus

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000005782A (en) * 1998-06-18 2000-01-11 Kantou Regional Constr Bureau Ministry Of Constr Cleaning treatment of river water and device therefor
CN1489967A (en) * 2003-08-25 2004-04-21 林 杨 Process flow for multifunctional bottled water works
CN1267364C (en) * 2002-12-05 2006-08-02 彭昌盛 Method and apparatus for preparing pure water by continuous electricity deionizing
CN2913343Y (en) * 2006-04-28 2007-06-20 浙江四通环境工程有限公司 Energy-saving second level reverse osmosis apparatus
CN101003394A (en) * 2006-01-16 2007-07-25 陈尚林 System and method for treating waste solution from acidity etching printed circuit board
JP4239876B2 (en) * 2004-03-30 2009-03-18 三浦工業株式会社 Water treatment method
CN201390684Y (en) * 2009-04-17 2010-01-27 湖州森蓝环境工程有限公司 System for recycling etching wastewater and heavy metal
JP2010131578A (en) * 2008-10-27 2010-06-17 Miura Co Ltd System for improving water quality
JP2010162500A (en) * 2009-01-16 2010-07-29 Miura Co Ltd Water quality modification system

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000005782A (en) * 1998-06-18 2000-01-11 Kantou Regional Constr Bureau Ministry Of Constr Cleaning treatment of river water and device therefor
CN1267364C (en) * 2002-12-05 2006-08-02 彭昌盛 Method and apparatus for preparing pure water by continuous electricity deionizing
CN1489967A (en) * 2003-08-25 2004-04-21 林 杨 Process flow for multifunctional bottled water works
JP4239876B2 (en) * 2004-03-30 2009-03-18 三浦工業株式会社 Water treatment method
CN101003394A (en) * 2006-01-16 2007-07-25 陈尚林 System and method for treating waste solution from acidity etching printed circuit board
CN2913343Y (en) * 2006-04-28 2007-06-20 浙江四通环境工程有限公司 Energy-saving second level reverse osmosis apparatus
JP2010131578A (en) * 2008-10-27 2010-06-17 Miura Co Ltd System for improving water quality
JP2010162500A (en) * 2009-01-16 2010-07-29 Miura Co Ltd Water quality modification system
CN201390684Y (en) * 2009-04-17 2010-01-27 湖州森蓝环境工程有限公司 System for recycling etching wastewater and heavy metal

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103588330A (en) * 2012-08-17 2014-02-19 成都虹华环保科技有限公司 Low copper content wastewater comprehensive treatment and cyclic regeneration system
CN103588262A (en) * 2012-08-17 2014-02-19 成都虹华环保科技有限公司 Low copper content wastewater comprehensive treatment apparatus

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Denomination of invention: 1+1 protection system for etching solution recycling equipment

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