CN102373598A - Atmospheric pressure plasma treatment system for cleaning and sizing yarn - Google Patents
Atmospheric pressure plasma treatment system for cleaning and sizing yarn Download PDFInfo
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- CN102373598A CN102373598A CN2010102554831A CN201010255483A CN102373598A CN 102373598 A CN102373598 A CN 102373598A CN 2010102554831 A CN2010102554831 A CN 2010102554831A CN 201010255483 A CN201010255483 A CN 201010255483A CN 102373598 A CN102373598 A CN 102373598A
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Abstract
The present invention relates to an atmospheric pressure plasma treatment system for cleaning and sizing yarn. The system comprises plural groups of plasma discharge plates, power supply, guidance shafts, a support and the like. The system is characterized in that: the device is the plasma yarn treatment apparatus, wherein the apparatus is arranged before the yarn is sized; in the plasma yarn treatment apparatus, plural groups of yarns parallelly pass through a plurality of plasma discharge areas, wherein the upper parts and the lower parts of the plasma discharge areas are provided with the guidance shafts; a plurality of the plasma discharge areas adopt dielectric barrier discharge forms, one electrode is connected with a housing and the ground, the other electrode is connected with a high voltage output end of the power supply; a gas inlet pipeline is arranged between the discharge electrodes to introduce the work gas to improve the luminosity of the plasma; plural groups of the plasmas are arranged inside the housing; a gas exhaust pipeline is arranged outside the housing. The device of the present invention is mainly used for the surface pre-treatment of the yarn before sizing, the improvement of the hydrophilic property of the yarn, the reduction of the use amount of the PVA during the sizing process so as to realize clean sizing.
Description
[technical field]
The present invention relates to a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Especially set up before the yarn sizing one with the plasma treatment yarn device of starching machine processing with the width yarn; Be in order to improve the hydrophilicity of yarn; Reduce PVA consumption in the starching process, thereby realize the cleaning starching.
[background technology]
In textile industry, textile mills will be with warp sizing to improve brute force and anti-wear performance in order to weave cotton cloth smoothly.In traditional sizing technique; Owing to limited by the yarn hydrophily; Especially height is knitted yarn and some polyester-cotton blend products; People have to add PVA (polyvinyl alcohol) and some expensive auxiliary agents are realized starching, and such one is to bring production cost to increase, and the 2nd, serious environmental that chemical composition is brought such as destarch PVA are polluted.
Adopt the normal-pressure plasma device yarns treated; Can directly use common cornstarch slurry starching; Substitute PVA slurry and other auxiliary agent that traditional starching has to adopt; So not only save expensive PVA slurry and auxiliary agent, also administered because the disposal of pollutants that chemicals PVA is brought from the source.
One of the plasma that is adopted at present is under the condition of vacuum chamber, although yarns treated can significantly reduce the use amount of PVA, owing to can't realize continuous production, this method uses too that costliness can't let enterprise accept.Both at home and abroad, people pay close attention to the method that adopts atmospheric plasma at present, but the plasma area that is produced is little, and are inhomogeneous, blow the inreal now realization industrialization of yarn easily.
The present invention adopts unique dielectric impedance technology, makes the generation area of plasma big; Realize synchronously with the starching function and with the processing of width; The yarns treated hydrophilicity is improved greatly, thereby significantly reduced the employed PVA amount of traditional starching, realized the purpose of cleaner production.
[summary of the invention]
In order to achieve the above object; The object of the present invention is to provide a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc., it is characterized by: this equipment is a plasma treatment yarn device of before yarn sizing, setting up, and in this device, makes the parallel a plurality of plasma discharge regions that have the axis of guide that pass of many group yarns; These a plurality of plasma discharge regions are the discharge types that adopt dielectric impedance; One of them electrode is connected with housing and ground connection, and another electrode is connected with the high-voltage output end of power supply, between sparking electrode, can introduce the aura degree that working gas improves plasma through admission line; Should many group plasmas be in a housing, outside housing, be provided with discharge duct.
Described a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: this equipment is a plasma treatment yarn device of before yarn sizing, setting up, and the width of parallel processing is simultaneously handled with wide the same many groups yarn with starching machine.
Described a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: in this device, make the parallel a plurality of plasma discharge regions that have the axis of guide that pass of many group yarns; These a plurality of plasma discharge regions are the discharge types that adopt dielectric impedance, can be single dielectric barrier discharges, also can be double-dielectric barrier discharges.
Described a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: the connected mode of these many group plasma discharge electrodes is: an electrode is connected with housing and ground connection; Another electrode is connected with the high-voltage output end of power supply, and the discharge frequency of this power supply is 1-30KHz.
Described a kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: between sparking electrode, can introduce the aura degree that working gas improves plasma through admission line, this working gas is to adopt argon gas.
Described a kind of atmospheric plasma treatment system that is used to clean the starching yarn comprises many group plasma discharge plates, power supply, the axis of guide and support etc., and it is characterized by: these many group plasmas are in a housing, outside housing, are provided with discharge duct.
Main application of the present invention is: the yarns treated hydrophilicity is improved greatly, thereby significantly reduced the employed PVA amount of traditional starching, realized the cleaner production of starching process.
[description of drawings]
Fig. 1 is used to clean the atmospheric plasma treatment system Facad structure sketch map of starching yarn for embodiments of the invention one.
Fig. 2 is used to clean the atmospheric plasma treatment system side structure cross-sectional schematic of starching yarn for embodiments of the invention one.
Fig. 3 is used to clean the atmospheric plasma treatment system side structure cross-sectional schematic of starching yarn for embodiments of the invention two.
Fig. 4 is used to clean the atmospheric plasma treatment system side structure cross-sectional schematic of starching yarn for embodiments of the invention three.
Fig. 5 is the atmospheric plasma treatment system side structure cross-sectional schematic of embodiments of the invention four-function in cleaning starching yarn.
The specific embodiment:
A kind of atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharges unit; See also Fig. 1 and Fig. 2; Each plasma discharge unit 111 is to be made up of a high-field electrode 104 and ground electrode 106, is provided with a dielectric barrier 107 between these two electrodes, and yarn 100 is to pass between medium 107 and the metallic plate electrode 104.
Consult Fig. 1 and Fig. 3; Second embodiment for the atmospheric plasma treatment system of cleaning starching yarn; Plasma discharge unit 111 is the discharge types that adopt bi-medium to block; Promptly between electrode 104 and 106, adopt two media to be respectively: 107 and 110, discharge is carried out between these two electrodes, and yarn 100 is to pass between medium 107 and the medium 110.
Consult Fig. 1 and Fig. 4; The 3rd embodiment for the atmospheric plasma treatment system of cleaning starching yarn; The plasma discharge form of each discharge cell is the discharge type of single dielectric impedance; As shown in Figure 4, this form is to adopt to be carried out between 301 electrode surrounded rods 302 of medium and a metallic plate electrode 304, and yarn 100 is to pass between medium 301 and the metallic plate electrode 304.
Consult Fig. 1 and Fig. 5; Be the 3rd embodiment of the atmospheric plasma treatment system of cleaning starching yarn, the plasma discharge form of each discharge cell is to adopt the discharge type of bi-medium to block, and is as shown in Figure 5; This discharge type adopts respectively between electrode rod 402 and the electrode roller 403 and carries out; Medium 401 and 405 is coated on respectively on these two electrode rollers 402 and 403, and yarn 100 is to pass between two media 401 and 405.
In above four kinds of embodiments, high voltage source 103 is connected with two electrodes respectively, and one of them ground electrode is to connect shell body and 101 to be connected with ground connection.The discharge frequency of high voltage source is 1-30KHz, and the output peak-peak voltage is greater than 8000 volts.
A plurality of plasma discharge groups are mounted in the shell body 101; In shell body 101; Also have the built-in housing 108 of another one, between shell body 101 and built-in housing 108, can introduce the aura degree that the working gas argon gas improves plasma through admission line 109.
Case material is processed with iron plate, aluminium sheet or corrosion resistant plate, and electrode roller 302,402,403 and battery lead plate 104,107 and 304 are to process with metallic aluminium or copper product.
Invention has been described to combine concrete embodiment above; For a person skilled in the art; Do not breaking away under the spirit and scope of the present invention situation, can make change and modification to the foregoing description, these changes and modification are all in claim limited range of the present invention.
Claims (6)
1. atmospheric plasma treatment system that is used to clean the starching yarn; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: this equipment is a plasma treatment yarn device of before yarn sizing, setting up; In this device, make the parallel a plurality of plasma discharge regions that have the axis of guide that pass of many group yarns, these a plurality of plasma discharge regions are the discharge types that adopt dielectric impedance, and one of them electrode is connected with housing and ground connection; Another electrode is connected with the high-voltage output end of power supply; Between sparking electrode, can introduce the aura degree that working gas improves plasma through admission line, these many group plasmas are in a housing, outside housing, are provided with discharge duct.
2. a kind of atmospheric plasma treatment system that is used to clean the starching yarn as claimed in claim 1; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: this equipment is a plasma treatment yarn device of before yarn sizing, setting up, and the width of parallel processing is simultaneously handled with wide the same many groups yarn with starching machine.
3. a kind of atmospheric plasma treatment system that is used to clean the starching yarn as claimed in claim 1; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: in this device, make the parallel a plurality of plasma discharge regions that have the axis of guide that pass of many group yarns; These a plurality of plasma discharge regions are the discharge types that adopt dielectric impedance, can be single dielectric barrier discharges, also can be double-dielectric barrier discharges.
4. a kind of atmospheric plasma treatment system that is used to clean the starching yarn as claimed in claim 1; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: the connected mode of these many group plasma discharge electrodes is: an electrode is connected with housing and ground connection; Another electrode is connected with the high-voltage output end of power supply, and the discharge frequency of this power supply is 1-30KHz.
5. a kind of atmospheric plasma treatment system that is used to clean the starching yarn as claimed in claim 1; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: between sparking electrode, can introduce the aura degree that working gas improves plasma through admission line, this working gas is to adopt argon gas.
6. a kind of atmospheric plasma treatment system that is used to clean the starching yarn as claimed in claim 1; Comprise many group plasma discharge plates, power supply, the axis of guide and support etc.; It is characterized by: these many group plasmas are in a housing, outside housing, are provided with discharge duct.
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| Application Number | Priority Date | Filing Date | Title |
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| CN2010102554831A CN102373598A (en) | 2010-08-18 | 2010-08-18 | Atmospheric pressure plasma treatment system for cleaning and sizing yarn |
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| CN2010102554831A CN102373598A (en) | 2010-08-18 | 2010-08-18 | Atmospheric pressure plasma treatment system for cleaning and sizing yarn |
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| CN102373598A true CN102373598A (en) | 2012-03-14 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103215802A (en) * | 2012-12-10 | 2013-07-24 | 武汉纺织大学 | Textile size recovering and recycling method |
| ITMI20120951A1 (en) * | 2012-06-01 | 2013-12-02 | Navetta S R L | METHOD AND EQUIPMENT FOR PLASMA TREATMENT OF YARNS. |
| CN106223007A (en) * | 2016-08-12 | 2016-12-14 | 江苏宋和宋智能科技有限公司 | A kind of plasma improves yarn strength devices and methods therefor |
| CN107124812A (en) * | 2017-06-26 | 2017-09-01 | 苏州大学 | Atmosphere pressure glow discharge plasma producing apparatus and textile material processing unit |
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| CN1932133A (en) * | 2006-10-11 | 2007-03-21 | 武汉科技学院 | Pretreating equipment for improving yarn sizing performance |
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2010
- 2010-08-18 CN CN2010102554831A patent/CN102373598A/en active Pending
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| CN1932133A (en) * | 2006-10-11 | 2007-03-21 | 武汉科技学院 | Pretreating equipment for improving yarn sizing performance |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20120951A1 (en) * | 2012-06-01 | 2013-12-02 | Navetta S R L | METHOD AND EQUIPMENT FOR PLASMA TREATMENT OF YARNS. |
| CN103215802A (en) * | 2012-12-10 | 2013-07-24 | 武汉纺织大学 | Textile size recovering and recycling method |
| CN106223007A (en) * | 2016-08-12 | 2016-12-14 | 江苏宋和宋智能科技有限公司 | A kind of plasma improves yarn strength devices and methods therefor |
| CN107124812A (en) * | 2017-06-26 | 2017-09-01 | 苏州大学 | Atmosphere pressure glow discharge plasma producing apparatus and textile material processing unit |
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Application publication date: 20120314 |